WO2009006284A2 - Dé semi-conducteur doté d'une couche de redistribution - Google Patents
Dé semi-conducteur doté d'une couche de redistribution Download PDFInfo
- Publication number
- WO2009006284A2 WO2009006284A2 PCT/US2008/068542 US2008068542W WO2009006284A2 WO 2009006284 A2 WO2009006284 A2 WO 2009006284A2 US 2008068542 W US2008068542 W US 2008068542W WO 2009006284 A2 WO2009006284 A2 WO 2009006284A2
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- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor die
- die
- recited
- adhesive layer
- semiconductor
- Prior art date
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- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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EP08796037.3A EP2179442A4 (fr) | 2007-06-28 | 2008-06-27 | Dé semi-conducteur doté d'une couche de redistribution |
CN2008800224541A CN101765911B (zh) | 2007-06-28 | 2008-06-27 | 具有重新分布层的半导体芯片 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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US11/769,927 US7772047B2 (en) | 2007-06-28 | 2007-06-28 | Method of fabricating a semiconductor die having a redistribution layer |
US11/769,927 | 2007-06-28 | ||
US11/769,937 | 2007-06-28 | ||
US11/769,937 US7763980B2 (en) | 2007-06-28 | 2007-06-28 | Semiconductor die having a distribution layer |
Publications (2)
Publication Number | Publication Date |
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WO2009006284A2 true WO2009006284A2 (fr) | 2009-01-08 |
WO2009006284A3 WO2009006284A3 (fr) | 2009-04-09 |
Family
ID=40226779
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Application Number | Title | Priority Date | Filing Date |
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PCT/US2008/068542 WO2009006284A2 (fr) | 2007-06-28 | 2008-06-27 | Dé semi-conducteur doté d'une couche de redistribution |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP2179442A4 (fr) |
KR (1) | KR101475467B1 (fr) |
CN (1) | CN101765911B (fr) |
TW (1) | TWI371807B (fr) |
WO (1) | WO2009006284A2 (fr) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015127486A1 (fr) * | 2014-02-28 | 2015-09-03 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Procédé de fabrication d'un circuit imprimé à puce de capteur incorporée ainsi que circuit imprimé |
WO2015138359A1 (fr) * | 2014-03-10 | 2015-09-17 | Deca Technologies Inc. | Dispositif semi-conducteur et procédé comprenant des couches de redistribution épaissies |
US9177926B2 (en) | 2011-12-30 | 2015-11-03 | Deca Technologies Inc | Semiconductor device and method comprising thickened redistribution layers |
US9576919B2 (en) | 2011-12-30 | 2017-02-21 | Deca Technologies Inc. | Semiconductor device and method comprising redistribution layers |
US9613830B2 (en) | 2011-12-30 | 2017-04-04 | Deca Technologies Inc. | Fully molded peripheral package on package device |
US9831170B2 (en) | 2011-12-30 | 2017-11-28 | Deca Technologies, Inc. | Fully molded miniaturized semiconductor module |
US9887103B2 (en) | 2010-02-16 | 2018-02-06 | Deca Technologies, Inc. | Semiconductor device and method of adaptive patterning for panelized packaging |
US10050004B2 (en) | 2015-11-20 | 2018-08-14 | Deca Technologies Inc. | Fully molded peripheral package on package device |
US10157803B2 (en) | 2016-09-19 | 2018-12-18 | Deca Technologies Inc. | Semiconductor device and method of unit specific progressive alignment |
US10373870B2 (en) | 2010-02-16 | 2019-08-06 | Deca Technologies Inc. | Semiconductor device and method of packaging |
US10573601B2 (en) | 2016-09-19 | 2020-02-25 | Deca Technologies Inc. | Semiconductor device and method of unit specific progressive alignment |
US10672624B2 (en) | 2011-12-30 | 2020-06-02 | Deca Technologies Inc. | Method of making fully molded peripheral package on package device |
US11056453B2 (en) | 2019-06-18 | 2021-07-06 | Deca Technologies Usa, Inc. | Stackable fully molded semiconductor structure with vertical interconnects |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106469657B (zh) * | 2015-08-14 | 2020-03-31 | 晟碟半导体(上海)有限公司 | 具有间隔体层的半导体装置、其形成方法和间隔体层带 |
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JP2001323228A (ja) * | 2000-05-15 | 2001-11-22 | Nitto Denko Corp | 加熱剥離型粘着シート |
JP2002076576A (ja) * | 2000-08-23 | 2002-03-15 | Nec Corp | 配線パターン形成方法およびその方法に用いられる原版 |
JP2005085799A (ja) * | 2003-09-04 | 2005-03-31 | Seiko Epson Corp | 成膜方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置、及び電子機器 |
US7410825B2 (en) * | 2005-09-15 | 2008-08-12 | Eastman Kodak Company | Metal and electronically conductive polymer transfer |
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2008
- 2008-06-27 CN CN2008800224541A patent/CN101765911B/zh active Active
- 2008-06-27 WO PCT/US2008/068542 patent/WO2009006284A2/fr active Application Filing
- 2008-06-27 KR KR1020107001950A patent/KR101475467B1/ko not_active IP Right Cessation
- 2008-06-27 TW TW097124363A patent/TWI371807B/zh not_active IP Right Cessation
- 2008-06-27 EP EP08796037.3A patent/EP2179442A4/fr not_active Withdrawn
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US6011314A (en) * | 1999-02-01 | 2000-01-04 | Hewlett-Packard Company | Redistribution layer and under bump material structure for converting periphery conductive pads to an array of solder bumps |
US6706557B2 (en) * | 2001-09-21 | 2004-03-16 | Micron Technology, Inc. | Method of fabricating stacked die configurations utilizing redistribution bond pads |
US6897096B2 (en) * | 2002-08-15 | 2005-05-24 | Micron Technology, Inc. | Method of packaging semiconductor dice employing at least one redistribution layer |
US20040191955A1 (en) * | 2002-11-15 | 2004-09-30 | Rajeev Joshi | Wafer-level chip scale package and method for fabricating and using the same |
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Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9887103B2 (en) | 2010-02-16 | 2018-02-06 | Deca Technologies, Inc. | Semiconductor device and method of adaptive patterning for panelized packaging |
US10373870B2 (en) | 2010-02-16 | 2019-08-06 | Deca Technologies Inc. | Semiconductor device and method of packaging |
US9576919B2 (en) | 2011-12-30 | 2017-02-21 | Deca Technologies Inc. | Semiconductor device and method comprising redistribution layers |
US9613830B2 (en) | 2011-12-30 | 2017-04-04 | Deca Technologies Inc. | Fully molded peripheral package on package device |
US9831170B2 (en) | 2011-12-30 | 2017-11-28 | Deca Technologies, Inc. | Fully molded miniaturized semiconductor module |
US9177926B2 (en) | 2011-12-30 | 2015-11-03 | Deca Technologies Inc | Semiconductor device and method comprising thickened redistribution layers |
US10373902B2 (en) | 2011-12-30 | 2019-08-06 | Deca Technologies Inc. | Fully molded miniaturized semiconductor module |
US10672624B2 (en) | 2011-12-30 | 2020-06-02 | Deca Technologies Inc. | Method of making fully molded peripheral package on package device |
WO2015127486A1 (fr) * | 2014-02-28 | 2015-09-03 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Procédé de fabrication d'un circuit imprimé à puce de capteur incorporée ainsi que circuit imprimé |
WO2015138359A1 (fr) * | 2014-03-10 | 2015-09-17 | Deca Technologies Inc. | Dispositif semi-conducteur et procédé comprenant des couches de redistribution épaissies |
US10050004B2 (en) | 2015-11-20 | 2018-08-14 | Deca Technologies Inc. | Fully molded peripheral package on package device |
US10157803B2 (en) | 2016-09-19 | 2018-12-18 | Deca Technologies Inc. | Semiconductor device and method of unit specific progressive alignment |
US10573601B2 (en) | 2016-09-19 | 2020-02-25 | Deca Technologies Inc. | Semiconductor device and method of unit specific progressive alignment |
US11056453B2 (en) | 2019-06-18 | 2021-07-06 | Deca Technologies Usa, Inc. | Stackable fully molded semiconductor structure with vertical interconnects |
Also Published As
Publication number | Publication date |
---|---|
CN101765911B (zh) | 2012-06-27 |
TWI371807B (en) | 2012-09-01 |
WO2009006284A3 (fr) | 2009-04-09 |
EP2179442A2 (fr) | 2010-04-28 |
CN101765911A (zh) | 2010-06-30 |
TW200910474A (en) | 2009-03-01 |
KR20100034756A (ko) | 2010-04-01 |
KR101475467B1 (ko) | 2014-12-22 |
EP2179442A4 (fr) | 2013-08-07 |
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