WO2009004856A1 - 電磁界分布測定装置 - Google Patents

電磁界分布測定装置 Download PDF

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Publication number
WO2009004856A1
WO2009004856A1 PCT/JP2008/057829 JP2008057829W WO2009004856A1 WO 2009004856 A1 WO2009004856 A1 WO 2009004856A1 JP 2008057829 W JP2008057829 W JP 2008057829W WO 2009004856 A1 WO2009004856 A1 WO 2009004856A1
Authority
WO
WIPO (PCT)
Prior art keywords
electromagnetic field
field distribution
measuring apparatus
distribution measuring
δxd
Prior art date
Application number
PCT/JP2008/057829
Other languages
English (en)
French (fr)
Inventor
Norio Masuda
Original Assignee
Nec Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nec Corporation filed Critical Nec Corporation
Priority to JP2009521549A priority Critical patent/JP5435228B2/ja
Priority to US12/665,767 priority patent/US8447539B2/en
Publication of WO2009004856A1 publication Critical patent/WO2009004856A1/ja

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/004—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring coordinates of points
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/07—Non contact-making probes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2801—Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
    • G01R31/2805—Bare printed circuit boards
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/10—Plotting field distribution ; Measuring field distribution
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
    • G01R29/08—Measuring electromagnetic field characteristics
    • G01R29/0807—Measuring electromagnetic field characteristics characterised by the application
    • G01R29/0814—Field measurements related to measuring influence on or from apparatus, components or humans, e.g. in ESD, EMI, EMC, EMP testing, measuring radiation leakage; detecting presence of micro- or radiowave emitters; dosimetry; testing shielding; measurements related to lightning
    • G01R29/085—Field measurements related to measuring influence on or from apparatus, components or humans, e.g. in ESD, EMI, EMC, EMP testing, measuring radiation leakage; detecting presence of micro- or radiowave emitters; dosimetry; testing shielding; measurements related to lightning for detecting presence or location of electric lines or cables

Abstract

　本発明に係る電磁界分布測定装置１０は、電磁界分布を測定する電磁界プローブ２０と、電磁界プローブ２０を配線１２０近傍で走査する走査装置３０と、配線１２０の座標に対する電磁界プローブ２０の座標のオフセット値ΔＸｄを算出するデータ処理装置５０とを備える。データ処理装置５０は、測定された電磁界分布中の特徴点Ｅ１～Ｅ３を抽出し、抽出された特徴点Ｅ１～Ｅ３の座標に基づいてオフセット値ΔＸｄを算出する。
PCT/JP2008/057829 2007-06-29 2008-04-23 電磁界分布測定装置 WO2009004856A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009521549A JP5435228B2 (ja) 2007-06-29 2008-04-23 電磁界分布測定装置
US12/665,767 US8447539B2 (en) 2007-06-29 2008-04-23 Electromagnetic field distribution measurement apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-171953 2007-06-29
JP2007171953 2007-06-29

Publications (1)

Publication Number Publication Date
WO2009004856A1 true WO2009004856A1 (ja) 2009-01-08

Family

ID=40225913

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057829 WO2009004856A1 (ja) 2007-06-29 2008-04-23 電磁界分布測定装置

Country Status (3)

Country Link
US (1) US8447539B2 (ja)
JP (1) JP5435228B2 (ja)
WO (1) WO2009004856A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015222189A (ja) * 2014-05-22 2015-12-10 株式会社日本自動車部品総合研究所 電磁界計測装置
CN113359070A (zh) * 2021-06-17 2021-09-07 北京交通大学 一种低频磁场频谱测量方法及系统

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2544016B1 (en) * 2010-03-01 2020-04-15 KIMURA, Kenjiro Device and method for obtaining a potential
KR101376541B1 (ko) * 2012-05-22 2014-03-19 조선대학교산학협력단 이종 자기 센서를 이용하는 결함 탐상 장치
TWI540322B (zh) * 2012-09-08 2016-07-01 西凱渥資訊處理科技公司 關於近場電磁探針及掃描器之系統，裝置及方法
KR102231507B1 (ko) * 2014-03-17 2021-03-25 삼성디스플레이 주식회사 노이즈 검사 장치 및 이를 이용하는 표시 패널의 검사 방법
JP6885207B2 (ja) * 2017-06-14 2021-06-09 愛知製鋼株式会社 マーカ検出方法及び車両用システム
CN110261798B (zh) * 2019-07-22 2020-11-06 上海交通大学 非对称式差分磁场探头结构
CN117653178A (zh) * 2024-02-01 2024-03-08 上海奕瑞光电子科技股份有限公司 一种用于x光机的定位方法及定位装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11202009A (ja) * 1998-01-14 1999-07-30 Ricoh Co Ltd 近磁界プローブ及び近磁界プローブユニット及び近磁界プローブアレー及び磁界計測システム
JP2000214198A (ja) * 1999-01-25 2000-08-04 Hitachi Ltd 磁界プロ―ブ校正機能を有する近傍磁界測定装置および電磁波発生源探査装置
JP2001311756A (ja) * 2000-04-28 2001-11-09 Advantest Corp 界分布測定方法及び装置
JP2003185689A (ja) * 2001-12-21 2003-07-03 Canon Inc 電界測定装置、電界測定方法、プログラム、及び記憶媒体

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04230874A (ja) 1990-06-18 1992-08-19 Nec Corp ２次元電磁界強度測定装置
JPH04143677A (ja) * 1990-10-04 1992-05-18 Hioki Ee Corp 複数のｘ―ｙユニットを備えた装置のｘ―ｙ座標整合装置並びにそのｘ―ｙ座標整合装置用専用基板
JP2000171504A (ja) * 1998-12-04 2000-06-23 Nec Corp 半導体評価装置
JP3102420B2 (ja) 1998-12-04 2000-10-23 日本電気株式会社 磁界センサ
US6564158B1 (en) * 2000-08-17 2003-05-13 Holaday Industries, Inc. Broadband electromagnetic field component measurement system
US7945309B2 (en) * 2002-11-22 2011-05-17 Biosense, Inc. Dynamic metal immunity
JP2006003135A (ja) 2004-06-16 2006-01-05 Hitachi Ltd 半導体集積回路の不良診断方法
JP2006162290A (ja) * 2004-12-02 2006-06-22 Sharp Corp 磁界測定装置およびそれを備える電流測定装置、ならびに電界測定装置
US7541818B2 (en) * 2005-07-07 2009-06-02 Panasonic Corporation Method and apparatus of electromagnetic measurement

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11202009A (ja) * 1998-01-14 1999-07-30 Ricoh Co Ltd 近磁界プローブ及び近磁界プローブユニット及び近磁界プローブアレー及び磁界計測システム
JP2000214198A (ja) * 1999-01-25 2000-08-04 Hitachi Ltd 磁界プロ―ブ校正機能を有する近傍磁界測定装置および電磁波発生源探査装置
JP2001311756A (ja) * 2000-04-28 2001-11-09 Advantest Corp 界分布測定方法及び装置
JP2003185689A (ja) * 2001-12-21 2003-07-03 Canon Inc 電界測定装置、電界測定方法、プログラム、及び記憶媒体

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015222189A (ja) * 2014-05-22 2015-12-10 株式会社日本自動車部品総合研究所 電磁界計測装置
CN113359070A (zh) * 2021-06-17 2021-09-07 北京交通大学 一种低频磁场频谱测量方法及系统

Also Published As

Publication number Publication date
US20100174497A1 (en) 2010-07-08
JP5435228B2 (ja) 2014-03-05
US8447539B2 (en) 2013-05-21
JPWO2009004856A1 (ja) 2010-08-26

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