WO2008155959A1 - シンチレータパネルとその作製方法 - Google Patents

シンチレータパネルとその作製方法 Download PDF

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Publication number
WO2008155959A1
WO2008155959A1 PCT/JP2008/058833 JP2008058833W WO2008155959A1 WO 2008155959 A1 WO2008155959 A1 WO 2008155959A1 JP 2008058833 W JP2008058833 W JP 2008058833W WO 2008155959 A1 WO2008155959 A1 WO 2008155959A1
Authority
WO
WIPO (PCT)
Prior art keywords
scintillator panel
manufacturing
substrate
same
phosphor layer
Prior art date
Application number
PCT/JP2008/058833
Other languages
English (en)
French (fr)
Inventor
Yasushi Nagata
Mika Sakai
Original Assignee
Konica Minolta Medical & Graphic, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical & Graphic, Inc. filed Critical Konica Minolta Medical & Graphic, Inc.
Publication of WO2008155959A1 publication Critical patent/WO2008155959A1/ja

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Abstract

　蒸着法により蛍光体層を形成する際の蒸着材料の偏在に係る問題点を解決することができるシンチレータパネルの作製方法を実現し、それにより発光輝度の高いシンチレータパネルを提供する。本発明のシンチレータパネルの作製方法は、基板上に蒸着法によって形成された蛍光体層を有するシンチレータパネルの作製方法において、基板上に第１の蛍光体層を形成し、その後に蒸着装置内で基板以外の部分を少なくとも１回加熱することを特徴とする。
PCT/JP2008/058833 2007-06-19 2008-05-14 シンチレータパネルとその作製方法 WO2008155959A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007161230 2007-06-19
JP2007-161230 2007-06-19

Publications (1)

Publication Number Publication Date
WO2008155959A1 true WO2008155959A1 (ja) 2008-12-24

Family

ID=40156119

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/058833 WO2008155959A1 (ja) 2007-06-19 2008-05-14 シンチレータパネルとその作製方法

Country Status (1)

Country Link
WO (1) WO2008155959A1 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003050298A (ja) * 2001-08-06 2003-02-21 Fuji Photo Film Co Ltd 放射線像変換パネルおよびその製造方法
JP2006225733A (ja) * 2005-02-18 2006-08-31 Ulvac Japan Ltd 成膜装置及び成膜方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003050298A (ja) * 2001-08-06 2003-02-21 Fuji Photo Film Co Ltd 放射線像変換パネルおよびその製造方法
JP2006225733A (ja) * 2005-02-18 2006-08-31 Ulvac Japan Ltd 成膜装置及び成膜方法

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