WO2008129929A1 - ガス分析計 - Google Patents
ガス分析計 Download PDFInfo
- Publication number
- WO2008129929A1 WO2008129929A1 PCT/JP2008/056591 JP2008056591W WO2008129929A1 WO 2008129929 A1 WO2008129929 A1 WO 2008129929A1 JP 2008056591 W JP2008056591 W JP 2008056591W WO 2008129929 A1 WO2008129929 A1 WO 2008129929A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ion detection
- ionization
- detection part
- gas analyzer
- filter
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/0009—Calibration of the apparatus
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
- G01L21/30—Vacuum gauges by making use of ionisation effects
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
- H01J41/10—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas of particle spectrometer type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/0027—Methods for using particle spectrometers
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/595,821 US8296090B2 (en) | 2007-04-13 | 2008-04-02 | Gas analyzer |
JP2009510815A JP5087079B2 (ja) | 2007-04-13 | 2008-04-02 | ガス分析計 |
CN2008800068810A CN101627302B (zh) | 2007-04-13 | 2008-04-02 | 气体分析器 |
EP08739702A EP2141494A4 (en) | 2007-04-13 | 2008-04-02 | GAS ANALYZER |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-105648 | 2007-04-13 | ||
JP2007105648 | 2007-04-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008129929A1 true WO2008129929A1 (ja) | 2008-10-30 |
Family
ID=39875457
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/056591 WO2008129929A1 (ja) | 2007-04-13 | 2008-04-02 | ガス分析計 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8296090B2 (ja) |
EP (1) | EP2141494A4 (ja) |
JP (1) | JP5087079B2 (ja) |
CN (1) | CN101627302B (ja) |
TW (1) | TWI442041B (ja) |
WO (1) | WO2008129929A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011080959A1 (ja) * | 2009-12-28 | 2011-07-07 | キヤノンアネルバ株式会社 | 質量分析装置、質量分析装置の制御装置、および質量分析方法 |
WO2014103100A1 (ja) * | 2012-12-27 | 2014-07-03 | キヤノンアネルバ株式会社 | 質量分析装置 |
WO2015029449A1 (ja) | 2013-08-30 | 2015-03-05 | アトナープ株式会社 | 分析装置 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9373474B2 (en) * | 2009-03-27 | 2016-06-21 | Osaka University | Ion source, and mass spectroscope provided with same |
KR101296275B1 (ko) * | 2009-09-15 | 2013-08-14 | 캐논 아네르바 가부시키가이샤 | 평균 자유 경로를 측정하는 장치, 진공계 및 평균 자유 경로를 측정하는 방법 |
CN101975818B (zh) * | 2010-04-29 | 2012-12-26 | 中国计量科学研究院 | 特征物质的检测系统及方法 |
JP5422485B2 (ja) * | 2010-05-27 | 2014-02-19 | 株式会社堀場エステック | ガス分析計 |
CN103048377B (zh) * | 2011-10-17 | 2015-06-10 | 中国科学院化学研究所 | 极紫外(euv)光刻胶超高真空热处理检测装置与方法 |
US9534938B1 (en) * | 2015-01-30 | 2017-01-03 | Squadle, Inc. | System and method for automatic measurement and recording |
JP6730140B2 (ja) * | 2015-11-20 | 2020-07-29 | 株式会社日立ハイテクサイエンス | 発生ガス分析方法及び発生ガス分析装置 |
US10541122B2 (en) | 2017-06-13 | 2020-01-21 | Mks Instruments, Inc. | Robust ion source |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61128139A (ja) * | 1984-11-27 | 1986-06-16 | Anelva Corp | 圧力計 |
JPH1131473A (ja) | 1997-03-21 | 1999-02-02 | Leybold Inficon Inc | 質量分光計において分圧の測定を訂正する方法 |
JP2000097910A (ja) * | 1998-09-18 | 2000-04-07 | Ulvac Japan Ltd | ガス分析方法 |
JP2001165907A (ja) * | 1999-12-13 | 2001-06-22 | Anelva Corp | ガス分析装置 |
JP2001351568A (ja) * | 2000-06-06 | 2001-12-21 | Anelva Corp | イオン付着質量分析の方法および装置 |
JP2006266854A (ja) * | 2005-03-23 | 2006-10-05 | Shinku Jikkenshitsu:Kk | 全圧測定電極付き四重極質量分析計及びこれを用いる真空装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5834770A (en) * | 1997-03-21 | 1998-11-10 | Leybold Inficon, Inc. | Ion collecting electrode for total pressure collector |
US6870170B1 (en) * | 2004-03-04 | 2005-03-22 | Applied Materials, Inc. | Ion implant dose control |
-
2008
- 2008-04-02 US US12/595,821 patent/US8296090B2/en active Active
- 2008-04-02 CN CN2008800068810A patent/CN101627302B/zh not_active Expired - Fee Related
- 2008-04-02 WO PCT/JP2008/056591 patent/WO2008129929A1/ja active Application Filing
- 2008-04-02 EP EP08739702A patent/EP2141494A4/en not_active Withdrawn
- 2008-04-02 JP JP2009510815A patent/JP5087079B2/ja active Active
- 2008-04-09 TW TW097112785A patent/TWI442041B/zh not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61128139A (ja) * | 1984-11-27 | 1986-06-16 | Anelva Corp | 圧力計 |
JPH1131473A (ja) | 1997-03-21 | 1999-02-02 | Leybold Inficon Inc | 質量分光計において分圧の測定を訂正する方法 |
JP2000097910A (ja) * | 1998-09-18 | 2000-04-07 | Ulvac Japan Ltd | ガス分析方法 |
JP2001165907A (ja) * | 1999-12-13 | 2001-06-22 | Anelva Corp | ガス分析装置 |
JP2001351568A (ja) * | 2000-06-06 | 2001-12-21 | Anelva Corp | イオン付着質量分析の方法および装置 |
JP2006266854A (ja) * | 2005-03-23 | 2006-10-05 | Shinku Jikkenshitsu:Kk | 全圧測定電極付き四重極質量分析計及びこれを用いる真空装置 |
Non-Patent Citations (2)
Title |
---|
See also references of EP2141494A4 * |
TORU IKEDA: "Horiba Technical Reports", vol. 28, March 2004, HORIBA, LTD., article "Feature article: Microminiaturized residual gas analyzer, PressureMaster RGA series", pages: 12 - 15 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011080959A1 (ja) * | 2009-12-28 | 2011-07-07 | キヤノンアネルバ株式会社 | 質量分析装置、質量分析装置の制御装置、および質量分析方法 |
JPWO2011080959A1 (ja) * | 2009-12-28 | 2013-05-09 | キヤノンアネルバ株式会社 | 質量分析装置、質量分析装置の制御装置、および質量分析方法 |
WO2014103100A1 (ja) * | 2012-12-27 | 2014-07-03 | キヤノンアネルバ株式会社 | 質量分析装置 |
JP5922256B2 (ja) * | 2012-12-27 | 2016-05-24 | キヤノンアネルバ株式会社 | 質量分析装置 |
US9373491B2 (en) | 2012-12-27 | 2016-06-21 | Canon Anelva Corporation | Mass spectrometer |
WO2015029449A1 (ja) | 2013-08-30 | 2015-03-05 | アトナープ株式会社 | 分析装置 |
US9666422B2 (en) | 2013-08-30 | 2017-05-30 | Atonarp Inc. | Analyzer |
US10366871B2 (en) | 2013-08-30 | 2019-07-30 | Atonarp Inc. | Analyzer |
Also Published As
Publication number | Publication date |
---|---|
CN101627302A (zh) | 2010-01-13 |
JP5087079B2 (ja) | 2012-11-28 |
EP2141494A4 (en) | 2012-10-24 |
TW200916755A (en) | 2009-04-16 |
US20100076712A1 (en) | 2010-03-25 |
EP2141494A1 (en) | 2010-01-06 |
US8296090B2 (en) | 2012-10-23 |
TWI442041B (zh) | 2014-06-21 |
JPWO2008129929A1 (ja) | 2010-07-22 |
CN101627302B (zh) | 2013-10-09 |
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