WO2008114471A1 - 膜厚計測方法及びその装置ならびに薄膜デバイスの製造システム - Google Patents
膜厚計測方法及びその装置ならびに薄膜デバイスの製造システム Download PDFInfo
- Publication number
- WO2008114471A1 WO2008114471A1 PCT/JP2007/071180 JP2007071180W WO2008114471A1 WO 2008114471 A1 WO2008114471 A1 WO 2008114471A1 JP 2007071180 W JP2007071180 W JP 2007071180W WO 2008114471 A1 WO2008114471 A1 WO 2008114471A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- film
- film thickness
- thin
- measuring method
- manufacturing system
- Prior art date
Links
- 239000010408 film Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
- 238000011156 evaluation Methods 0.000 abstract 3
- 239000012788 optical film Substances 0.000 abstract 2
- 230000002596 correlated effect Effects 0.000 abstract 1
- 230000000875 corresponding effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/206—Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Photovoltaic Devices (AREA)
Abstract
作業員の負担を軽減させるとともに、製造効率を向上させることを目的とする。ライン照明器3により、基板W上に製膜された透明導電膜または透明光学膜にライン照明光を照射し、透明導電膜または透明光学膜で反射されたライン反射光をカメラで検出し、検出した反射光の色評価値を計測し、色評価値と膜厚とが関連付けられている膜厚特性を用いて、計測した色評価値に対応する膜厚を求める。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2007800476073A CN101568796B (zh) | 2007-02-20 | 2007-10-31 | 膜厚计测方法及其装置、以及薄膜设备的制造系统 |
EP07830914A EP2124016A1 (en) | 2007-02-20 | 2007-10-31 | Film thickness measuring method, its apparatus, and manufacturing system for thin-film device |
US12/517,110 US8184303B2 (en) | 2007-02-20 | 2007-10-31 | Film-thickness measurement method and apparatus therefor, and thin-film device fabrication system |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007039595A JP2008205188A (ja) | 2007-02-20 | 2007-02-20 | 膜厚計測方法及びその装置ならびに薄膜製造システム |
JP2007-039595 | 2007-02-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008114471A1 true WO2008114471A1 (ja) | 2008-09-25 |
Family
ID=39765590
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/071180 WO2008114471A1 (ja) | 2007-02-20 | 2007-10-31 | 膜厚計測方法及びその装置ならびに薄膜デバイスの製造システム |
Country Status (5)
Country | Link |
---|---|
US (1) | US8184303B2 (ja) |
EP (1) | EP2124016A1 (ja) |
JP (1) | JP2008205188A (ja) |
CN (1) | CN101568796B (ja) |
WO (1) | WO2008114471A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010101116A1 (ja) * | 2009-03-03 | 2010-09-10 | シャープ株式会社 | 半導体層とその層厚測定部位を有する積層体、およびそれを用いた薄膜光電変換素子と集積型薄膜太陽電池 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101363768B (zh) * | 2008-09-28 | 2010-06-09 | 厦门大学 | 一种单层光学薄膜光学常数和厚度的检测方法 |
JP4796160B2 (ja) | 2009-02-27 | 2011-10-19 | 三菱重工業株式会社 | 薄膜の検査装置及び検査方法 |
US8334986B2 (en) | 2010-02-25 | 2012-12-18 | Corning Incorporated | Methods and apparatus for the measurement of film thickness |
RU2515123C1 (ru) * | 2010-05-19 | 2014-05-10 | Шарп Кабусики Кайся | Способ контроля формы |
CN102927918A (zh) * | 2010-07-01 | 2013-02-13 | 立晔科技股份有限公司 | 太阳能芯片的抗反射层的检测方法及检测装置 |
WO2012115643A1 (en) * | 2011-02-24 | 2012-08-30 | Corning Incorporated | Methods and apparatus for the measurement of film thickness |
CN102998471A (zh) * | 2012-03-28 | 2013-03-27 | 杨阳 | 柔性CuCNT复合纳米透明导电薄膜的检测方法 |
JP2014146704A (ja) * | 2013-01-29 | 2014-08-14 | Fuji Electric Co Ltd | 半導体装置 |
WO2015165503A1 (en) * | 2014-04-29 | 2015-11-05 | Hewlett-Packard Indigo B.V. | Transparent layer thickness measurement |
CN105444683B (zh) * | 2014-08-26 | 2018-07-03 | 达观科技有限公司 | 透光膜的检测系统及其检测方法 |
BR112017013219A2 (pt) * | 2014-12-30 | 2018-02-06 | Kimberly Clark Co | medição do compasso de calibre de trama e sistema de controle |
JP6601950B2 (ja) * | 2015-10-01 | 2019-11-06 | 日産自動車株式会社 | 膜厚検査装置、膜厚検査方法、膜構造体の製造装置、および膜構造体の製造方法 |
CN105758318A (zh) * | 2016-02-25 | 2016-07-13 | 深圳市众诚达应用材料科技有限公司 | 基于机器视觉色差法在线检测CdS薄膜厚度的系统及方法 |
CN106441126A (zh) * | 2016-10-26 | 2017-02-22 | 电子科技大学 | 一种基于反射率光谱测量光学薄膜厚度的方法及系统 |
US11216928B2 (en) * | 2019-09-10 | 2022-01-04 | The Boeing Company | Method and apparatus for coating thickness inspection of a surface and coating defects of the surface |
US11703459B2 (en) * | 2019-11-04 | 2023-07-18 | Tokyo Electron Limited | System and method to calibrate a plurality of wafer inspection system (WIS) modules |
DE102021001955B4 (de) * | 2021-04-14 | 2023-03-23 | Baumer Inspection Gmbh | Vorrichtung und Verfahren zur fluoreszenzbasierten Inspektion sowie Prüfanordung mit einer solchen Vorrichtung |
CN116031334B (zh) * | 2023-03-29 | 2023-05-30 | 英利能源发展(保定)有限公司 | TOPCon电池生产过程中多晶硅层厚度的判断方法 |
CN116721074B (zh) * | 2023-06-07 | 2024-02-13 | 昊泽吉顺新材料(深圳)有限公司 | 基于图像分析的手机保护膜生产质量检测系统 |
CN117268270B (zh) * | 2023-11-23 | 2024-02-06 | 中国航发北京航空材料研究院 | 连续化学气相沉积界面层厚度的实时监控装置及其方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6242006A (ja) * | 1985-08-19 | 1987-02-24 | Nippon Soken Inc | 光学薄膜の膜厚測定装置 |
JPH07141703A (ja) * | 1993-11-19 | 1995-06-02 | Toray Ind Inc | 光記録媒体の検査方法および製造方法 |
JPH10311708A (ja) | 1997-05-13 | 1998-11-24 | Tokyo Seimitsu Co Ltd | 干渉式膜厚計 |
JP2004095731A (ja) * | 2002-08-30 | 2004-03-25 | Mitsubishi Heavy Ind Ltd | 太陽電池パネル色むら検査装置 |
JP2005134324A (ja) * | 2003-10-31 | 2005-05-26 | Mitsubishi Heavy Ind Ltd | 透明導電膜分析方法および透明導電膜品質管理方法ならびに太陽電池 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6428510A (en) | 1987-07-23 | 1989-01-31 | Mitsubishi Electric Corp | Micro gap measuring device |
JP2006071316A (ja) | 2004-08-31 | 2006-03-16 | Technos Kk | 膜厚取得方法 |
US20090107399A1 (en) * | 2007-10-29 | 2009-04-30 | Harald Bloess | System and Method of Measuring Film Height on a Substrate |
-
2007
- 2007-02-20 JP JP2007039595A patent/JP2008205188A/ja active Pending
- 2007-10-31 WO PCT/JP2007/071180 patent/WO2008114471A1/ja active Application Filing
- 2007-10-31 CN CN2007800476073A patent/CN101568796B/zh not_active Expired - Fee Related
- 2007-10-31 US US12/517,110 patent/US8184303B2/en not_active Expired - Fee Related
- 2007-10-31 EP EP07830914A patent/EP2124016A1/en not_active Withdrawn
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6242006A (ja) * | 1985-08-19 | 1987-02-24 | Nippon Soken Inc | 光学薄膜の膜厚測定装置 |
JPH07141703A (ja) * | 1993-11-19 | 1995-06-02 | Toray Ind Inc | 光記録媒体の検査方法および製造方法 |
JPH10311708A (ja) | 1997-05-13 | 1998-11-24 | Tokyo Seimitsu Co Ltd | 干渉式膜厚計 |
JP2004095731A (ja) * | 2002-08-30 | 2004-03-25 | Mitsubishi Heavy Ind Ltd | 太陽電池パネル色むら検査装置 |
JP2005134324A (ja) * | 2003-10-31 | 2005-05-26 | Mitsubishi Heavy Ind Ltd | 透明導電膜分析方法および透明導電膜品質管理方法ならびに太陽電池 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010101116A1 (ja) * | 2009-03-03 | 2010-09-10 | シャープ株式会社 | 半導体層とその層厚測定部位を有する積層体、およびそれを用いた薄膜光電変換素子と集積型薄膜太陽電池 |
US8962983B2 (en) | 2009-03-03 | 2015-02-24 | Sharp Kabushiki Kaisha | Laminated body having semiconductor layer and layer thickness measurement portion, and thin-film photoelectric conversion device and integrated thin-film solar cell having the same |
Also Published As
Publication number | Publication date |
---|---|
CN101568796B (zh) | 2013-03-27 |
JP2008205188A (ja) | 2008-09-04 |
US8184303B2 (en) | 2012-05-22 |
CN101568796A (zh) | 2009-10-28 |
EP2124016A1 (en) | 2009-11-25 |
US20100177326A1 (en) | 2010-07-15 |
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