WO2008107105A3 - Abbildungsvorrichtung mit einem adaptiven optischen element und holographische projektionseinrichtung - Google Patents

Abbildungsvorrichtung mit einem adaptiven optischen element und holographische projektionseinrichtung Download PDF

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Publication number
WO2008107105A3
WO2008107105A3 PCT/EP2008/001563 EP2008001563W WO2008107105A3 WO 2008107105 A3 WO2008107105 A3 WO 2008107105A3 EP 2008001563 W EP2008001563 W EP 2008001563W WO 2008107105 A3 WO2008107105 A3 WO 2008107105A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
imaging device
projection apparatus
holographic projection
adaptive optical
Prior art date
Application number
PCT/EP2008/001563
Other languages
English (en)
French (fr)
Other versions
WO2008107105A2 (de
WO2008107105A8 (de
Inventor
Jean-Christophe Olaya
Sahm Hagen
Kranz Burkhard
Hans-Juergen Roscher
Volker Wittsctok
Klaus Wolf
Original Assignee
Seereal Technologies Sa
Jean-Christophe Olaya
Sahm Hagen
Kranz Burkhard
Hans-Juergen Roscher
Volker Wittsctok
Klaus Wolf
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seereal Technologies Sa, Jean-Christophe Olaya, Sahm Hagen, Kranz Burkhard, Hans-Juergen Roscher, Volker Wittsctok, Klaus Wolf filed Critical Seereal Technologies Sa
Priority to US12/529,946 priority Critical patent/US20100060973A1/en
Priority to JP2009552102A priority patent/JP2010521003A/ja
Publication of WO2008107105A2 publication Critical patent/WO2008107105A2/de
Publication of WO2008107105A3 publication Critical patent/WO2008107105A3/de
Publication of WO2008107105A8 publication Critical patent/WO2008107105A8/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2294—Addressing the hologram to an active spatial light modulator
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/0208—Individual components other than the hologram
    • G03H2001/0224—Active addressable light modulator, i.e. Spatial Light Modulator [SLM]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2202—Reconstruction geometries or arrangements
    • G03H1/2205—Reconstruction geometries or arrangements using downstream optical component
    • G03H2001/221—Element having optical power, e.g. field lens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2225/00—Active addressable light modulator
    • G03H2225/20—Nature, e.g. e-beam addressed
    • G03H2225/24—Having movable pixels, e.g. microelectromechanical systems [MEMS]

Abstract

Eine Abbildungsvorrichtung (1,100) zum Beeinflussen von auftreffendem Licht weist ein optisches Element (2) in Form eines Spiegels und eine Stelleinrichtung (3,103) zum Verformen des optischen Elements (2) auf. Das optische Element (2) besitzt eine dem auftreffenden Licht zugewandte Oberfläche. Die Stelleinrichtung (3,103) greift zur Verformung des optischen Elements (2) seitlich an der optischen Oberfläche des optischen Elements (2) an.
PCT/EP2008/001563 2007-03-05 2008-02-28 Abbildungsvorrichtung mit einem adaptiven optischen element und holographische projektionseinrichtung WO2008107105A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/529,946 US20100060973A1 (en) 2007-03-05 2008-02-28 Imaging Device for Influencing Incident Light
JP2009552102A JP2010521003A (ja) 2007-03-05 2008-02-28 入射光を誘導する表示装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007010906.9 2007-03-05
DE102007010906A DE102007010906A1 (de) 2007-03-05 2007-03-05 Abbildungsvorrichtung zum Beeinflussen von auftreffendem Licht

Publications (3)

Publication Number Publication Date
WO2008107105A2 WO2008107105A2 (de) 2008-09-12
WO2008107105A3 true WO2008107105A3 (de) 2008-11-13
WO2008107105A8 WO2008107105A8 (de) 2008-12-24

Family

ID=39471862

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/001563 WO2008107105A2 (de) 2007-03-05 2008-02-28 Abbildungsvorrichtung mit einem adaptiven optischen element und holographische projektionseinrichtung

Country Status (5)

Country Link
US (1) US20100060973A1 (de)
JP (1) JP2010521003A (de)
DE (1) DE102007010906A1 (de)
TW (1) TW200844537A (de)
WO (1) WO2008107105A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL198719A0 (en) * 2009-05-12 2010-02-17 Orbotech Ltd Optical imaging system
US8633969B2 (en) * 2011-02-09 2014-01-21 Omnivision Technologies, Inc. Apparatus and method for three-dimensional image capture with extended depth of field
DE102012224022A1 (de) * 2012-12-20 2013-10-31 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung wenigstens eines optischen Elementes in einem optischen System
WO2014140047A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
JP6453780B2 (ja) 2013-03-12 2019-01-16 マイクロニック アーベーＭｙｃｒｏｎｉｃ Ａｂ 機械的に形成されるアライメント基準体の方法及び装置
JP6432744B2 (ja) * 2013-12-27 2018-12-05 パナソニックＩｐマネジメント株式会社 光学部材駆動装置及び投写型映像表示装置
DE102014103157B3 (de) 2014-03-10 2015-06-18 Jenoptik Optical Systems Gmbh Justierbarer deformierbarer Spiegel zum Ausgleich von Aberrationen eines Strahlenbündels
DE102014212710A1 (de) 2014-07-01 2016-01-07 Carl Zeiss Smt Gmbh Optischer Manipulator, Projektionsobjektiv und Projektionsbelichtungsanlage
EP3446171A2 (de) * 2016-04-21 2019-02-27 Mauro Pedretti Drehklemmvorrichtung
DE102017117468B3 (de) 2017-08-02 2018-09-20 Jenoptik Optical Systems Gmbh Vorrichtung zur variierbaren Beeinflussung der Wellenfront eines Strahlenbündels mit einer über ihre Umfangsfläche deformierbaren Planoptik
CN112327503B (zh) * 2020-11-11 2022-07-08 中国科学院上海光学精密机械研究所 一种光路指向精密调节装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5365379A (en) * 1993-03-30 1994-11-15 The United States Of America As Represented By The United States Department Of Energy Laser correcting mirror
DE19827603A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
US20040184163A1 (en) * 2003-02-13 2004-09-23 Olympus Corporation Optical apparatus
US20060104596A1 (en) * 2004-07-02 2006-05-18 Charles Askins Deformable mirror apparatus
DE102005023743A1 (de) * 2005-05-13 2006-11-16 Seereal Technologies Gmbh Projektionsvorrichtung und Verfahren zur holographischen Rekonstruktion von Szenen

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Publication number Priority date Publication date Assignee Title
DE2505112A1 (de) * 1975-02-07 1976-08-19 Kleinwaechter Hans Biegenplattenzylinderparabbol-speigel mit veraenderlicher geometrie
FR2343262A1 (fr) * 1976-03-05 1977-09-30 Anvar Miroirs a focale variable par elasticite et procedes d'obtention
DE19725353B4 (de) 1997-06-16 2004-07-01 Trumpf Gmbh & Co. Einrichtung zur Strahlbeeinflussung eines Laserstrahls
WO2002101442A1 (en) 2001-06-12 2002-12-19 California Institute Of Technology A pzt unimrphed based, deformable mirror with continuous membran e
DE10151919B4 (de) * 2001-10-20 2007-02-01 Carl Zeiss Smt Ag Belichtungsobjektiv in der Halbleiterlithographie
US7374302B2 (en) 2002-12-23 2008-05-20 Bae Systems Plc Deformable mirror
FR2850175B1 (fr) * 2003-01-17 2007-08-17 Europ De Systemes Optiques Soc Systeme deformable comportant une piece de forme parallelepipedique et un actionneur
US7224504B2 (en) 2003-07-30 2007-05-29 Asml Holding N. V. Deformable mirror using piezoelectric actuators formed as an integrated circuit and method of use
JP2006310577A (ja) 2005-04-28 2006-11-09 Canon Inc 反射ミラー装置およびそれを用いた露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5365379A (en) * 1993-03-30 1994-11-15 The United States Of America As Represented By The United States Department Of Energy Laser correcting mirror
DE19827603A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
US20040184163A1 (en) * 2003-02-13 2004-09-23 Olympus Corporation Optical apparatus
US20060104596A1 (en) * 2004-07-02 2006-05-18 Charles Askins Deformable mirror apparatus
DE102005023743A1 (de) * 2005-05-13 2006-11-16 Seereal Technologies Gmbh Projektionsvorrichtung und Verfahren zur holographischen Rekonstruktion von Szenen

Also Published As

Publication number Publication date
JP2010521003A (ja) 2010-06-17
WO2008107105A2 (de) 2008-09-12
DE102007010906A1 (de) 2008-09-11
WO2008107105A8 (de) 2008-12-24
US20100060973A1 (en) 2010-03-11
TW200844537A (en) 2008-11-16

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