WO2009051199A1 - 光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法 - Google Patents
光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法 Download PDFInfo
- Publication number
- WO2009051199A1 WO2009051199A1 PCT/JP2008/068792 JP2008068792W WO2009051199A1 WO 2009051199 A1 WO2009051199 A1 WO 2009051199A1 JP 2008068792 W JP2008068792 W JP 2008068792W WO 2009051199 A1 WO2009051199 A1 WO 2009051199A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lens barrel
- optical member
- device manufacturing
- section
- member cooling
- Prior art date
Links
- 238000001816 cooling Methods 0.000 title abstract 6
- 230000003287 optical effect Effects 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/065—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements provided with cooling means
Abstract
ミラー(41)のような光学部材を冷却する冷却装置は、冷却部材(51)と、ミラー(41)の裏面(41B)に冷却部材(51)の接触面(51A)を密着させる係合機構(52)とを含む。裏面(41B)と接触面(51A)は平坦化されている。ミラー(41)の裏面(41B)には、溝部(46)と張出部(48)とを有する係止部(44)が形成されている。係合機構(52)の軸部(57)が係止部(44)の張出部(48)と係合した状態で、係合機構(52)の係合部材(60)は、ばね(58)により冷却部材(51)側に付勢される。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009538148A JPWO2009051199A1 (ja) | 2007-10-18 | 2008-10-16 | 光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-271328 | 2007-10-18 | ||
JP2007271328 | 2007-10-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009051199A1 true WO2009051199A1 (ja) | 2009-04-23 |
Family
ID=40563167
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/068792 WO2009051199A1 (ja) | 2007-10-18 | 2008-10-16 | 光学部材冷却装置、鏡筒及び露光装置ならびにデバイスの製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090103063A1 (ja) |
JP (1) | JPWO2009051199A1 (ja) |
TW (1) | TW200931194A (ja) |
WO (1) | WO2009051199A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015151152A1 (ja) * | 2014-03-31 | 2015-10-08 | ギガフォトン株式会社 | ミラー装置 |
CN109812994A (zh) * | 2019-02-14 | 2019-05-28 | 浙江中控太阳能技术有限公司 | 一种用于定日镜的反射镜支撑组件及定日镜 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2002907A1 (nl) * | 2008-06-10 | 2009-12-11 | Asml Netherlands Bv | Method and system for thermally conditioning an optical element. |
DE102011005778A1 (de) * | 2011-03-18 | 2012-09-20 | Carl Zeiss Smt Gmbh | Optisches Element |
WO2013062104A1 (ja) * | 2011-10-28 | 2013-05-02 | 旭硝子株式会社 | Euvリソグラフィ用反射型マスクブランクの製造方法 |
DE102012201221B4 (de) | 2012-01-27 | 2022-03-03 | Carl Zeiss Smt Gmbh | Optische Spiegel-Baugruppe zur Strahlführung sowie Spiegel-Temperiervorrichtung mit einer derartigen Spiegel-Baugruppe |
US8969836B1 (en) | 2013-11-26 | 2015-03-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for electron beam lithography |
DE102014219770A1 (de) | 2014-09-30 | 2016-03-31 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, sowie Verfahren zur Ableitung eines Wärmestromes aus dem Bereich einer Spiegelanordnung |
DE102020206697A1 (de) * | 2020-05-28 | 2021-12-02 | Carl Zeiss Smt Gmbh | Vorrichtung und Verfahren zum Temperieren von Elementen in mikrolithographischen Projektionsbelichtungsanlagen |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH05506517A (ja) * | 1990-05-28 | 1993-09-22 | マシネンファブリック カール エイチ.アーノルド ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント カンパニー ケージー | レーザ材料加工装置用の偏向鏡ハウジング及び光線分離フィルター |
JP2000036449A (ja) * | 1998-07-17 | 2000-02-02 | Nikon Corp | 露光装置 |
JP2004039851A (ja) * | 2002-07-03 | 2004-02-05 | Nikon Corp | ミラー冷却装置及び露光装置 |
JP2004246030A (ja) * | 2003-02-13 | 2004-09-02 | Canon Inc | 光学素子、光学素子保持装置、温度調節装置、露光装置及びデバイスの製造方法 |
JP2006317913A (ja) * | 2005-04-12 | 2006-11-24 | Xtreme Technologies Gmbh | プラズマに基づく短波長放射線源用の集光鏡 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4783034A (en) * | 1985-08-13 | 1988-11-08 | General Datacomm, Inc. | Slide lock mechanism |
AU1053199A (en) * | 1997-11-14 | 1999-06-07 | Nikon Corporation | Exposure apparatus and method of manufacturing the same, and exposure method |
US20040051984A1 (en) * | 2002-06-25 | 2004-03-18 | Nikon Corporation | Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments |
JP4018564B2 (ja) * | 2003-03-14 | 2007-12-05 | キヤノン株式会社 | 光学系、及びそれを用いた露光装置、デバイスの製造方法 |
-
2008
- 2008-10-16 WO PCT/JP2008/068792 patent/WO2009051199A1/ja active Application Filing
- 2008-10-16 TW TW097139717A patent/TW200931194A/zh unknown
- 2008-10-16 US US12/253,099 patent/US20090103063A1/en not_active Abandoned
- 2008-10-16 JP JP2009538148A patent/JPWO2009051199A1/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05506517A (ja) * | 1990-05-28 | 1993-09-22 | マシネンファブリック カール エイチ.アーノルド ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント カンパニー ケージー | レーザ材料加工装置用の偏向鏡ハウジング及び光線分離フィルター |
JP2000036449A (ja) * | 1998-07-17 | 2000-02-02 | Nikon Corp | 露光装置 |
JP2004039851A (ja) * | 2002-07-03 | 2004-02-05 | Nikon Corp | ミラー冷却装置及び露光装置 |
JP2004246030A (ja) * | 2003-02-13 | 2004-09-02 | Canon Inc | 光学素子、光学素子保持装置、温度調節装置、露光装置及びデバイスの製造方法 |
JP2006317913A (ja) * | 2005-04-12 | 2006-11-24 | Xtreme Technologies Gmbh | プラズマに基づく短波長放射線源用の集光鏡 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015151152A1 (ja) * | 2014-03-31 | 2015-10-08 | ギガフォトン株式会社 | ミラー装置 |
JPWO2015151152A1 (ja) * | 2014-03-31 | 2017-04-13 | ギガフォトン株式会社 | ミラー装置 |
US9882334B2 (en) | 2014-03-31 | 2018-01-30 | Gigaphoton Inc. | Mirror device |
CN109812994A (zh) * | 2019-02-14 | 2019-05-28 | 浙江中控太阳能技术有限公司 | 一种用于定日镜的反射镜支撑组件及定日镜 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2009051199A1 (ja) | 2011-03-03 |
US20090103063A1 (en) | 2009-04-23 |
TW200931194A (en) | 2009-07-16 |
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