WO2008102868A1 - 透明導電膜を有するロール状樹脂フィルムの製造方法及びこれを用いる有機エレクトロルミネッセンス素子 - Google Patents

透明導電膜を有するロール状樹脂フィルムの製造方法及びこれを用いる有機エレクトロルミネッセンス素子 Download PDF

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Publication number
WO2008102868A1
WO2008102868A1 PCT/JP2008/053048 JP2008053048W WO2008102868A1 WO 2008102868 A1 WO2008102868 A1 WO 2008102868A1 JP 2008053048 W JP2008053048 W JP 2008053048W WO 2008102868 A1 WO2008102868 A1 WO 2008102868A1
Authority
WO
WIPO (PCT)
Prior art keywords
transparent conductive
roll
conductive film
shaped resin
film
Prior art date
Application number
PCT/JP2008/053048
Other languages
English (en)
French (fr)
Inventor
Kazuo Genda
Original Assignee
Konica Minolta Holdings, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Holdings, Inc. filed Critical Konica Minolta Holdings, Inc.
Priority to JP2009500245A priority Critical patent/JP5212356B2/ja
Publication of WO2008102868A1 publication Critical patent/WO2008102868A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/10—Transparent electrodes, e.g. using graphene
    • H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/81—Electrodes
    • H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
    • H10K77/10—Substrates, e.g. flexible substrates
    • H10K77/111—Flexible substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)

Abstract

　本発明は、ロールツーロールにて連続してバリア膜上に透明導電膜を備えたロール状樹脂フィルムを製造する方法を提供することにある。本発明の透明導電膜を有するロール状樹脂フィルムの製造方法は、少なくとも大気圧もしくはその近傍の圧力環境下にてバリア膜を成膜し、その後、圧力調整部を介して真空環境下にて前記透明導電膜を、樹脂フィルム基材上に、ロールツーロールにて連続して成膜することを特徴とする。
PCT/JP2008/053048 2007-02-23 2008-02-22 透明導電膜を有するロール状樹脂フィルムの製造方法及びこれを用いる有機エレクトロルミネッセンス素子 WO2008102868A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009500245A JP5212356B2 (ja) 2007-02-23 2008-02-22 透明導電膜を有するロール状樹脂フィルムの製造方法及びこれを用いる有機エレクトロルミネッセンス素子

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007043540 2007-02-23
JP2007-043540 2007-02-23

Publications (1)

Publication Number Publication Date
WO2008102868A1 true WO2008102868A1 (ja) 2008-08-28

Family

ID=39710139

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/053048 WO2008102868A1 (ja) 2007-02-23 2008-02-22 透明導電膜を有するロール状樹脂フィルムの製造方法及びこれを用いる有機エレクトロルミネッセンス素子

Country Status (2)

Country Link
JP (1) JP5212356B2 (ja)
WO (1) WO2008102868A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010165620A (ja) * 2009-01-19 2010-07-29 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子の製造方法
JP2011000747A (ja) * 2009-06-17 2011-01-06 Dainippon Printing Co Ltd 耐プラズマ性を有する透明フィルム及びそれを使用した透明ガスバリア性フィルム
JP2011192567A (ja) * 2010-03-16 2011-09-29 Rohm Co Ltd 有機ｅｌ装置
WO2012005290A1 (ja) * 2010-07-06 2012-01-12 日東電工株式会社 透明導電性フィルムの製造方法
WO2012005300A1 (ja) * 2010-07-06 2012-01-12 日東電工株式会社 透明導電性フィルムおよびその製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015063317A (ja) * 2013-09-24 2015-04-09 キリン株式会社 ガスバリア性プラスチックキャップの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06122973A (ja) * 1992-10-08 1994-05-06 Matsushita Electric Ind Co Ltd 透明電極薄膜形成方法
JPH0778526A (ja) * 1993-09-08 1995-03-20 Nippon Sheet Glass Co Ltd インライン型スパッタ装置
JP2007023304A (ja) * 2005-07-12 2007-02-01 Konica Minolta Holdings Inc 透明導電膜付ガスバリア性フィルムの製造方法及び有機エレクトロルミネッセンス素子の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3855307B2 (ja) * 1996-05-24 2006-12-06 東洋紡績株式会社 透明導電性フィルムおよびその製造法
JP2000238177A (ja) * 1999-02-23 2000-09-05 Teijin Ltd ガスバリア性フィルム及びそれを用いた透明導電積層体
JP2006175633A (ja) * 2004-12-21 2006-07-06 Konica Minolta Holdings Inc ガスバリア性薄膜積層体、及びガスバリア性樹脂基材、及び有機ｅｌデバイス
JP4946860B2 (ja) * 2005-02-17 2012-06-06 コニカミノルタホールディングス株式会社 ガスバリアフィルム及びその製造方法、並びに該ガスバリアフィルムを用いた、有機ｅｌ素子用樹脂基材、有機ｅｌ素子
JP4663381B2 (ja) * 2005-04-12 2011-04-06 富士フイルム株式会社 ガスバリア性フィルム、基材フィルムおよび有機エレクトロルミネッセンス素子
JP2006321127A (ja) * 2005-05-19 2006-11-30 Konica Minolta Holdings Inc バリアフィルム、及び有機エレクトロルミネッセンスデバイス

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06122973A (ja) * 1992-10-08 1994-05-06 Matsushita Electric Ind Co Ltd 透明電極薄膜形成方法
JPH0778526A (ja) * 1993-09-08 1995-03-20 Nippon Sheet Glass Co Ltd インライン型スパッタ装置
JP2007023304A (ja) * 2005-07-12 2007-02-01 Konica Minolta Holdings Inc 透明導電膜付ガスバリア性フィルムの製造方法及び有機エレクトロルミネッセンス素子の製造方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010165620A (ja) * 2009-01-19 2010-07-29 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子の製造方法
JP2011000747A (ja) * 2009-06-17 2011-01-06 Dainippon Printing Co Ltd 耐プラズマ性を有する透明フィルム及びそれを使用した透明ガスバリア性フィルム
JP2011192567A (ja) * 2010-03-16 2011-09-29 Rohm Co Ltd 有機ｅｌ装置
WO2012005290A1 (ja) * 2010-07-06 2012-01-12 日東電工株式会社 透明導電性フィルムの製造方法
WO2012005300A1 (ja) * 2010-07-06 2012-01-12 日東電工株式会社 透明導電性フィルムおよびその製造方法
JP2012033484A (ja) * 2010-07-06 2012-02-16 Nitto Denko Corp 透明導電性フィルムの製造方法
JP2012199215A (ja) * 2010-07-06 2012-10-18 Nitto Denko Corp 透明導電性フィルムおよびその製造方法
CN102985585A (zh) * 2010-07-06 2013-03-20 日东电工株式会社 透明导电性薄膜及其制造方法
TWI488751B (zh) * 2010-07-06 2015-06-21 Nitto Denko Corp Method for manufacturing transparent conductive film
JP2015193934A (ja) * 2010-07-06 2015-11-05 日東電工株式会社 透明導電性フィルムおよびその製造方法
TWI560071B (ja) * 2010-07-06 2016-12-01 Nitto Denko Corp

Also Published As

Publication number Publication date
JPWO2008102868A1 (ja) 2010-05-27
JP5212356B2 (ja) 2013-06-19

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