WO2008102480A1 - 含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置 - Google Patents

含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置 Download PDF

Info

Publication number
WO2008102480A1
WO2008102480A1 PCT/JP2007/070892 JP2007070892W WO2008102480A1 WO 2008102480 A1 WO2008102480 A1 WO 2008102480A1 JP 2007070892 W JP2007070892 W JP 2007070892W WO 2008102480 A1 WO2008102480 A1 WO 2008102480A1
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
separation wall
fluorine
resin composition
containing compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/070892
Other languages
English (en)
French (fr)
Inventor
Daisuke Arioka
Daisuke Kashiwagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of WO2008102480A1 publication Critical patent/WO2008102480A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

　フッ素原子を７つ以上有する繰り返し単位と、エステル基を３つ以上有する繰り返し単位と、を有する含フッ素化合物、並びに、該化合物を含む樹脂組成物及び感光性転写材料。該樹脂組成物及び該感光性転写材料は、カラーフィルターの製造に用いることができる。
PCT/JP2007/070892 2007-02-22 2007-10-26 含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置 Ceased WO2008102480A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007042887A JP2008202006A (ja) 2007-02-22 2007-02-22 含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2007-042887 2007-02-22

Publications (1)

Publication Number Publication Date
WO2008102480A1 true WO2008102480A1 (ja) 2008-08-28

Family

ID=39709763

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/070892 Ceased WO2008102480A1 (ja) 2007-02-22 2007-10-26 含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置

Country Status (5)

Country Link
JP (1) JP2008202006A (ja)
KR (1) KR20090125683A (ja)
CN (1) CN101511888A (ja)
TW (1) TW200848441A (ja)
WO (1) WO2008102480A1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010137724A1 (ja) * 2009-05-29 2010-12-02 日産化学工業株式会社 含フッ素高分岐ポリマー及びそれを含む樹脂組成物
JP5682573B2 (ja) * 2009-12-28 2015-03-11 旭硝子株式会社 感光性組成物、隔壁、カラーフィルタおよび有機ｅｌ素子
JP5431225B2 (ja) * 2010-03-29 2014-03-05 新日鉄住金化学株式会社 アルカリ現像性感光性樹脂組成物、及びこれを用いて形成した表示素子向け隔壁、並びに表示素子
JP5751929B2 (ja) * 2010-06-21 2015-07-22 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びカラーフィルター遮光膜
JP5823373B2 (ja) 2011-12-26 2015-11-25 富士フイルム株式会社 着色組成物、及び画像表示構造
JP5932512B2 (ja) * 2012-06-21 2016-06-08 東京応化工業株式会社 バンク形成用感光性樹脂組成物、バンク、及びバンクの形成方法
KR102361573B1 (ko) * 2018-03-09 2022-02-10 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 사용하여 제조된 블랙 매트릭스, 컬럼 스페이서 또는 블랙 컬럼 스페이서를 포함하는 컬러필터, 및 상기 컬러필터를 포함하는 표시장치

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63189857A (ja) * 1987-02-02 1988-08-05 Nippon Paint Co Ltd ポジ型感光性樹脂組成物
JPH02160877A (ja) * 1988-12-15 1990-06-20 Mitsubishi Rayon Co Ltd 熱硬化性被覆組成物
JPH02169611A (ja) * 1988-10-08 1990-06-29 Bayer Ag パーフルオルアルキル基を含有する共重合体
JPH0418475A (ja) * 1990-05-11 1992-01-22 Kansai Paint Co Ltd 上塗用塗料組成物
JPH0940728A (ja) * 1995-07-31 1997-02-10 Nippon Paint Co Ltd 変性ブロック共重合体およびその応用
JP2003057806A (ja) * 2001-08-16 2003-02-28 Fuji Photo Film Co Ltd 平版印刷版用原版
WO2007108291A1 (ja) * 2006-03-23 2007-09-27 Fujifilm Corporation 感光性組成物並びにそれを用いた表示装置用遮光膜形成用材料及び感光性転写材料
JP2007256684A (ja) * 2006-03-23 2007-10-04 Fujifilm Corp 感光性組成物及び表示装置用遮光膜形成用材料
JP2007271938A (ja) * 2006-03-31 2007-10-18 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63189857A (ja) * 1987-02-02 1988-08-05 Nippon Paint Co Ltd ポジ型感光性樹脂組成物
JPH02169611A (ja) * 1988-10-08 1990-06-29 Bayer Ag パーフルオルアルキル基を含有する共重合体
JPH02160877A (ja) * 1988-12-15 1990-06-20 Mitsubishi Rayon Co Ltd 熱硬化性被覆組成物
JPH0418475A (ja) * 1990-05-11 1992-01-22 Kansai Paint Co Ltd 上塗用塗料組成物
JPH0940728A (ja) * 1995-07-31 1997-02-10 Nippon Paint Co Ltd 変性ブロック共重合体およびその応用
JP2003057806A (ja) * 2001-08-16 2003-02-28 Fuji Photo Film Co Ltd 平版印刷版用原版
WO2007108291A1 (ja) * 2006-03-23 2007-09-27 Fujifilm Corporation 感光性組成物並びにそれを用いた表示装置用遮光膜形成用材料及び感光性転写材料
JP2007256684A (ja) * 2006-03-23 2007-10-04 Fujifilm Corp 感光性組成物及び表示装置用遮光膜形成用材料
JP2007271938A (ja) * 2006-03-31 2007-10-18 Toyo Ink Mfg Co Ltd カラーフィルタ用着色組成物およびカラーフィルタ

Also Published As

Publication number Publication date
KR20090125683A (ko) 2009-12-07
TW200848441A (en) 2008-12-16
JP2008202006A (ja) 2008-09-04
CN101511888A (zh) 2009-08-19

Similar Documents

Publication Publication Date Title
WO2008102480A1 (ja) 含フッ素化合物、樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
EP2192968B8 (en) Centrifugal filter
GB2447741B (en) Method for making multilayer coating film
WO2008121445A3 (en) Parallel fabrication of nanogaps and devices thereof
SG136929A1 (en) A method for the manufacture of a coating
EG24893A (en) Apparatus for the connection of strips
WO2013012251A3 (ko) 고 명암비를 나타내는 눈부심 방지 필름 및 이의 제조 방법
FR2897795B1 (fr) Procede de fabrication d'un film multicouche
EP2157123A4 (en) METHOD FOR PRODUCING A POROUS FILM
EP2033997A4 (en) METHOD FOR PRODUCING A MULTILAYER FILM
EP2181989B8 (en) Process for the preparation of olopatadine
GB0708014D0 (en) Process for the manufacture of a polymer composition
WO2008045599A3 (en) Heavy metal adsorbent material, processes of making same, and methods of separating heavy metals from fluids
EP2019343B8 (en) Developing apparatus, image forming apparatus having the same, and assembling method of a developing apparatus
GB2437227B (en) Electrostatic deposition of polymeric films
PL1752276T3 (pl) Sposób wytwarzania zorientowanych taśm polimerowych
EP2110848A4 (en) MODIFYING A LOW DIELECTRICITY CONSTANT FILM AND MANUFACTURING METHOD THEREFOR
CA3281347A1 (en) Mass filter
WO2007132417A8 (en) The management of databases
PL381173A1 (pl) Sposób wytwarzania nanokompozytów polimerowych
EM02273270001S (it) Filtri per dispositivi di verniciatura
EM02273270002S (de) Filter für Lackiervorrichtungen
AU2004905260A0 (en) A Method of Determining the Difference Between Images
AU2006900870A0 (en) The gobwah audio filter
AU2005902810A0 (en) Electrostatic filter media and a process for the manufacture thereof

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200780033534.2

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 07830626

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 1020087030339

Country of ref document: KR

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 07830626

Country of ref document: EP

Kind code of ref document: A1