WO2008102480A1 - Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and display device - Google Patents

Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and display device Download PDF

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Publication number
WO2008102480A1
WO2008102480A1 PCT/JP2007/070892 JP2007070892W WO2008102480A1 WO 2008102480 A1 WO2008102480 A1 WO 2008102480A1 JP 2007070892 W JP2007070892 W JP 2007070892W WO 2008102480 A1 WO2008102480 A1 WO 2008102480A1
Authority
WO
WIPO (PCT)
Prior art keywords
color filter
separation wall
fluorine
resin composition
containing compound
Prior art date
Application number
PCT/JP2007/070892
Other languages
French (fr)
Japanese (ja)
Inventor
Daisuke Arioka
Daisuke Kashiwagi
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Publication of WO2008102480A1 publication Critical patent/WO2008102480A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Abstract

This invention provides a fluorine-containing compound comprising a repeating unit having not less than seven fluorine atoms and a repeating unit having not less than three ester groups, and a resin composition and a photosensitive transfer material comprising the fluorine-containing compound. The resin composition and photosensitive transfer material are usable for the manufacture of color filters.
PCT/JP2007/070892 2007-02-22 2007-10-26 Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and display device WO2008102480A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-042887 2007-02-22
JP2007042887A JP2008202006A (en) 2007-02-22 2007-02-22 Fluorine-containing compound, resin composition, photosensitive transfer material, partition wall and its forming method, color filter and its manufacturing method, and display device

Publications (1)

Publication Number Publication Date
WO2008102480A1 true WO2008102480A1 (en) 2008-08-28

Family

ID=39709763

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/070892 WO2008102480A1 (en) 2007-02-22 2007-10-26 Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and display device

Country Status (5)

Country Link
JP (1) JP2008202006A (en)
KR (1) KR20090125683A (en)
CN (1) CN101511888A (en)
TW (1) TW200848441A (en)
WO (1) WO2008102480A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101716816B1 (en) * 2009-05-29 2017-03-16 닛산 가가쿠 고교 가부시키 가이샤 Highly branched fluorinated polymer and resin composition containing same
JP5682573B2 (en) * 2009-12-28 2015-03-11 旭硝子株式会社 Photosensitive composition, partition, color filter, and organic EL device
JP5431225B2 (en) * 2010-03-29 2014-03-05 新日鉄住金化学株式会社 Alkali-developable photosensitive resin composition, partition wall for display element formed using the same, and display element
JP5751929B2 (en) * 2010-06-21 2015-07-22 新日鉄住金化学株式会社 Photosensitive resin composition for black resist and color filter light-shielding film
JP5823373B2 (en) 2011-12-26 2015-11-25 富士フイルム株式会社 Coloring composition and image display structure
JP5932512B2 (en) * 2012-06-21 2016-06-08 東京応化工業株式会社 Photosensitive resin composition for bank formation, bank, and method for forming bank
KR102361573B1 (en) * 2018-03-09 2022-02-10 동우 화인켐 주식회사 A black photo sensitive resin composition, a color filter comprising a black metrics, a column spacer or black column spacer prepared by using the composition, and a display device comprising the color filter

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63189857A (en) * 1987-02-02 1988-08-05 Nippon Paint Co Ltd Positive type photosensitive resin composition
JPH02160877A (en) * 1988-12-15 1990-06-20 Mitsubishi Rayon Co Ltd Thermosetting coating composition
JPH02169611A (en) * 1988-10-08 1990-06-29 Bayer Ag Copolymer containing perfluoroalkyl
JPH0418475A (en) * 1990-05-11 1992-01-22 Kansai Paint Co Ltd Top-coating composition
JPH0940728A (en) * 1995-07-31 1997-02-10 Nippon Paint Co Ltd Modified block copolymer and its application
JP2003057806A (en) * 2001-08-16 2003-02-28 Fuji Photo Film Co Ltd Original plate for planographic printing plate
WO2007108291A1 (en) * 2006-03-23 2007-09-27 Fujifilm Corporation Photosensitive composition, and material for formation of light-shield film for display device or photosensitive transfer material using the composition
JP2007256684A (en) * 2006-03-23 2007-10-04 Fujifilm Corp Photosensitive composition and material for forming light shielding film for display device
JP2007271938A (en) * 2006-03-31 2007-10-18 Toyo Ink Mfg Co Ltd Color composition for color filter and color filter

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63189857A (en) * 1987-02-02 1988-08-05 Nippon Paint Co Ltd Positive type photosensitive resin composition
JPH02169611A (en) * 1988-10-08 1990-06-29 Bayer Ag Copolymer containing perfluoroalkyl
JPH02160877A (en) * 1988-12-15 1990-06-20 Mitsubishi Rayon Co Ltd Thermosetting coating composition
JPH0418475A (en) * 1990-05-11 1992-01-22 Kansai Paint Co Ltd Top-coating composition
JPH0940728A (en) * 1995-07-31 1997-02-10 Nippon Paint Co Ltd Modified block copolymer and its application
JP2003057806A (en) * 2001-08-16 2003-02-28 Fuji Photo Film Co Ltd Original plate for planographic printing plate
WO2007108291A1 (en) * 2006-03-23 2007-09-27 Fujifilm Corporation Photosensitive composition, and material for formation of light-shield film for display device or photosensitive transfer material using the composition
JP2007256684A (en) * 2006-03-23 2007-10-04 Fujifilm Corp Photosensitive composition and material for forming light shielding film for display device
JP2007271938A (en) * 2006-03-31 2007-10-18 Toyo Ink Mfg Co Ltd Color composition for color filter and color filter

Also Published As

Publication number Publication date
TW200848441A (en) 2008-12-16
KR20090125683A (en) 2009-12-07
CN101511888A (en) 2009-08-19
JP2008202006A (en) 2008-09-04

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