Classifications

• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B5/00—Optical elements other than lenses
  • G02B5/20—Filters
  • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B32—LAYERED PRODUCTS
  • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
  • B32B27/00—Layered products comprising a layer of synthetic resin
  • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
  • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
  • C08L101/00—Compositions of unspecified macromolecular compounds
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B5/00—Optical elements other than lenses
  • G02B5/20—Filters
  • G02B5/22—Absorbing filters
  • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
• • G—PHYSICS
  • G02—OPTICS
  • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
  • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
  • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
  • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
  • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
  • G02F1/1333—Constructional arrangements; Manufacturing methods
  • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
  • G02F1/133509—Filters, e.g. light shielding masks
  • G02F1/133512—Light shielding layers, e.g. black matrix
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
  • H01J11/20—Constructional details
  • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
  • H01J11/44—Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
• • C—CHEMISTRY; METALLURGY
  • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
  • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
  • C08J2300/00—Characterised by the use of unspecified polymers
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
  • H01J2211/20—Constructional details
  • H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
  • H01J2211/44—Optical arrangements or shielding arrangements, e.g. filters or lenses
  • H01J2211/442—Light reflecting means; Anti-reflection means
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
  • H01J2211/20—Constructional details
  • H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
  • H01J2211/44—Optical arrangements or shielding arrangements, e.g. filters or lenses
  • H01J2211/446—Electromagnetic shielding means; Antistatic means
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
  • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
  • H01J2211/20—Constructional details
  • H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
  • H01J2211/44—Optical arrangements or shielding arrangements, e.g. filters or lenses
  • H01J2211/448—Near infrared shielding means

Definitions

• the present invention relates to an optical filter for a display panel and a method of manufacturing same. More particularly, the preset invention relates to an optical filter for a plasma display panel (PDP), wherein an electromagnetic radiation-shielding layer is directly formed on a glass substrate by a gravure offset method.
• PDP plasma display panel
• Display panels are generally equipped with optical filters capable of, among others, blocking electromagnetic radiation and near-infrared rays (NIRs) which cause adverse effects on human health as well as malfunction of electronic equipment.
• optical filters capable of, among others, blocking electromagnetic radiation and near-infrared rays (NIRs) which cause adverse effects on human health as well as malfunction of electronic equipment.
• a metal mesh film produced by attaching a copper film on a polyester (e.g., polyethylene terephthalate) substrate film and patterning the copper film by an etching process
• a fiber mesh film produced by processing a metal fiber or a metal-coated organic fiber on a substrate film and patterning the fiber
• a multilayered conductive film produced by alternately stacking a metal (Ag) layer and a dielectric layer using a dry coating process such as sputtering.
• a method of manufacturing an optical filter for a display panel comprising a transparent glass substrate and an electromagnetic radiation-shielding layer, which comprises forming the electromagnetic radiation-shielding layer by directly printing a composition comprising (a) 5 to 30% by weight of an acrylate polymer resin, (b) 5 to 30% by weight of a crosslinkable oligomer, (c) 0.1 to 5% by weight of a photopolymerization initiator, and (d) 50 to 85% by weight of a metal powder, on the glass substrate.
• FIG. 1 is a sectional view illustrating the structure of a conventional optical filter
• FIG. 2 is a sectional view illustrating the structure of an optical filter according to an embodiment of the present invention.
• FIG. 3 is a sectional view illustrating the structure of an optical filter according to another embodiment of the present invention. ⁇ Brief description of the reference numerals in drawings>
• antireflection layer 1 10 substrate film
• substrate film 200 antireflection layer
• substrate film 220 adhesive layer
• electromagnetic radiation-shielding layer 300 antireflection layer 310: substrate film
• an electromagnetic radiation-shielding layer is formed by forming a conductive mesh pattern directly on a glass substrate, e.g., using a gravure offset printing process.
• the electromagnetic radiation- shielding layer thus-formed has excellent mechanical characteristics (e.g., film adhesion property) and electrical conductivity.
• the composition for forming the electromagnetic radiation-shielding layer according to the present invention comprises (a) 5 to 30% by weight of an acrylate polymer resin, (b) 5 to 30% by weight of a crosslinkable oligomer, (c) 0.1 to 5% by weight of a photopolymerization initiator, and (d) 50 to 85% by weight of a metal powder.
• the component (a), the acrylate polymer resin may be selected from aery late polymer resins commonly known in the art.
• the acrylate polymer resin may be prepared by polymerizing an unsaturated carboxylic acid monomer, an aromatic monomer, and a monomer other than the unsaturated carboxylic acid monomer and the aromatic monomer.
• the unsaturated carboxylic acid monomer is used to increase the elasticity of the acrylate polymer resin through enhanced hydrogen bonding.
• the unsaturated carboxylic acid monomer may be acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, vinyl acetic acid, or an acid anhydride thereof.
• the unsaturated carboxylic acid monomer may be used in an amount of 20 to 50% by weight based on the total amount of monomers used in the preparation of the acrylate polymer resin.
• the content of the unsaturated carboxylic acid monomer is within the above range, it is possible to obtain desired elasticity characteristics of the polymer resin and a desired degree of polymerization, and also to prevent gelation upon polymerization.
• the aromatic monomer is an acrylic monomer which provides good adhesibility to a glass substrate to allow stable patterning, e.g., styrene, benzylmethacrylate, benzylacrylate, phenylacrylate, phenylmethacrylate, 2- nitrophenylacrylate, 4-nitrophenylacrylate, 2-nitrophenylmethacrylate, 4- nitrophenylmethacrylate, 4-chlorophenylacrylate, etc.
• the aromatic monomer may be used in an amount of 10 to 30% by weight, more preferably 15 to 20% by weight, based on the total amount of the monomers used in the preparation of the acrylate polymer resin. When the content of the aromatic monomer is within the above range, it is possible to satisfy all of the following requirements: good adhesion of a pattern to a substrate, good directionality of the pattern, stable patterning, and easy removal of organic materials upon sintering.
• the monomer other than the unsaturated carboxylic acid monomer and the aromatic monomer (hereinafter, referred to simply as "the other monomer"), which is used in the preparation of the acrylate polymer resin, serves to adjust the glass transition temperature and polarity of the acrylate polymer resin.
• the other monomer may be an acrylic monomer such as 2-hydroxyethyl (meth)acrylate, 2- hydroxyoctyl (meth)acrylate, methyl (meth)acrylate, ethyl (meth)acrylate, or n- butyl acrylate.
• the other monomer may be used in an amount of 20 to 60% by weight based on the total amount of the monomers used in the preparation of the acrylate polymer resin, which affect the glass transition temperature of the acrylate polymer resin, the heat resistance of the resultant pattern, and the intimate contact of the pattern with a substrate.
• the acrylate polymer resin may be prepared by polymerizing the unsaturated carboxylic acid monomer, the aromatic monomer, and the other monomer in the presence of a solvent to prevent gelation of these monomers and to provide an appropriate evaporation rate during an offset printing process.
• the solvent may be propylene glycol monomethylether, dipropylene glycol monomethylether, propylene glycol monomethylether propionate, ethylether propionate, terpineol, propyleneglycol monomethylether acetate, dimethylaminoformaldehyde, methyl ethyl ketone, butylcarbitol, butylcarbitol acetate, gammabutyrolactone, ethyl lactate, or a mixture thereof.
• the acrylate polymer resin obtained by polymerizing the unsaturated carboxylic acid monomer, the aromatic monomer, and the other monomer in the presence of a solvent may have a weight average molecular weight of 10,000 to 100,000, more preferably 20,000 to 50,000.
• the weight average molecular weight of the acrylate polymer resin is within the above range, the glass transition temperature of the acrylate polymer resin is lowered, and thus, the flowability of the acrylate polymer resin becomes satisfactory for transferring a pattern in a gravure groove to a blanket during an offset printing process, and the delivery of the composition into a gravure groove also becomes satisfactory owing to good elasticity characteristics of the acrylate polymer resin.
• the acrylate polymer resin is used in an amount of 5 to 30% by weight in the composition according to the present invention. If the content of the acrylate polymer resin is less than 5% by weight, the offset printing process may not be efficiently performed due to the lowered elasticity of the composition. On the other hand, if the content of the acrylate polymer resin exceeds 30% by weight, the electric resistivity of the resultant pattern may increase.
• the component (b), the crosslinkable oligomer may be an acrylate compound having at least two ethylenic double bonds.
• the crosslinkable oligomer may be 1 ,4-buthanediol diacrylate, 1,3-butyleneglycol diacrylate, ethyleneglycol diacrylate, pentaerythritol tetraacrylate, triethyleneglycol diacrylate, a bisphenol A diacrylate derivative, an urethane bond-containing diacrylate derivative, trimethylpropane triacrylate, dipentaerythritol polyacrylate, methacrylate thereof, or a mixture thereof.
• the crosslinkable oligomer is used in an amount of 5 to 30% by weight, preferably 5 to 15% by weight, in the composition of the present invention. If the content of the crosslinkable oligomer is less than 5% by weight, patterning may become difficult due to the increased viscosity of the composition. On the other hand, if the content of the crosslinkable oligomer exceeds 30% by weight, off characteristics and the directionality of the resultant pattern may become poor due to the reduced elasticity of the composition.
• the component (c), the photopolymerization initiator may be at least one selected from compounds such as triazines, benzoinacetophenones, and imidazoles.
• the photopolymerizaton initiator is included in an amount of 0.1 to 5% by weight in the composition of the present invention. If the content of the photopolymerization initiator is less than 0.1% by weight, the adhesion property of the resultant pattern may become unsatisfactory. On the other hand, if the content of the photopolymerization initiator exceeds 5% by weight, the photopolymerization initiator may remain undissolved.
• the component (d), the metal powder is not particularly limited and it may be a powder of a metal which can be used in the formation of an electrode for a display or a metal powder which can be used for blocking electromagnetic radiation.
• the metal powder is a powder of silver, copper, nickel, ATO (antimony tin oxide), or an alloy thereof.
• the metal powder is used in an amount of 50 to 85% by weight in the composition of the present invention, If the content of the metal powder is less than 50% by weight, it may be difficult to achieve desired electromagnetic radiation-shielding property. On the other hand, if the content of the metal powder exceeds 85% by weight, poor dispersion may occur due to the increased viscosity of the composition.
• the composition of the present invention may further comprise an additive selected from a dispersant for dispersing the metal powder, a black pigment for adjusting the contrast ratio, a glass powder for increasing the adhesibility to the glass substrate upon sintering, etc.
• the additive may be used in an amount of 0.01 to 10% by weight, more preferably 0.1 to 3% by weight, in the composition of the present invention.
• the electromagnetic radiation-shielding layer formed of the composition according to the present invention has a low surface resistivity of about 0.2 to 1.2 ⁇ / ⁇ .
• the optical filter according to the present invention may comprise functional layers commonly known in the art, i.e., an antireflection layer and a near-infrared ray (NIR)-blocking and selective light-absorbing layer.
• NIR near-infrared ray
• the NIR-blocking and selective light-absorbing layer comprises a NIR- blocking material and a selective light-absorbing material.
• the NIR-blocking material may be a mixture of a nickel complex-based compound and a diammonium-based compound, a pigment compound containing a copper or zinc ion, an organic pigment, or the like
• the selective light- absorbing material may be a metal complex derivative pigment having a metal element positioned in the center of an octaplienyltetraazaporphyrin or tetraazaporphyrin ring, a material selected from the group consisting of ammonia, water, and halogen being coordinated to the metal element.
• the NIR-blocking and selective light-absorbing layer may be formed by mixing the above-described pigments for the NIR-blocking material and the selective light-absorbing material and a transparent plastic resin in a solvent to prepare a solution mixture and coating the solution mixture to a thickness of 1 to 20 ⁇ m on a transparent substrate.
• the transparent plastic resin may be poly(methyl methacrylate)(PMMA), polyvinylalcohol (PVA), polycarbonate (PC), ethylenevinylacetate (EVA), polyvinyl butyral)(PVB), polyethylene terephthalate (PET), or the like
• the solvent may be toluene, xylene, acetone, methyl ethyl ketone (MEK), propylalcohol, isopropylalcohol, methyl cellosolve, ethyl cellosolve, dimethylformamide (DMF), or the like.
• a monolayered low refractive index film may be formed by subjecting a substrate film to a scratch resistance treatment and then hard coating with an acryl resin, or alternatively, it may be a layer obtained by alternately stacking a high refractive index transparent film and a low refractive index transparent film.
• the antireflection layer may be formed by vacuum deposition or by wet coating (e.g., roll coating or die coating) using a solution containing the above materials.
• the antireflection layer and the NIR-blocking and selective light-absorbing layer may be formed on different substrates, or alternatively, may be formed on the front and back surfaces of a substrate, respectively.
• the NIR-blocking and selective light-absorbing layer may also be formed of a mixture obtained by mixing an adhesive with an NIR-blocking pigment and a selective light-absorbing pigment.
• FIGS. 2 and 3 Preferable embodiments of the optical filter according to the present invention are illustrated in FIGS. 2 and 3.
• an antireflection layer 200 for preventing the reflection of external light is disposed on an NIR- blocking and selective light-absorbing layer 240 via a transparent adhesive layer 220 to face the outside, an electromagnetic radiation-shielding layer 270 is directly formed on a glass substrate 260 by the above-described method, and the NIR- blocking and selective light-absorbing layer 240 is stacked at the front side of the glass substrate 260 opposite to the electromagnetic radiation-shielding layer 270 via a transparent adhesion layer 250 to obtain an optical filter for a display panel.
• FIG. 2 an antireflection layer 200 for preventing the reflection of external light is disposed on an NIR- blocking and selective light-absorbing layer 240 via a transparent adhesive layer 220 to face the outside
• an electromagnetic radiation-shielding layer 270 is directly formed on a glass substrate 260 by the above-described method
• an antireflection layer 300 for preventing the reflection of external light is disposed to face the outside, an electromagnetic radiation-shielding layer 340 is directly formed on a glass substrate 330 by the above-described method, and an NIR-blocking and selective light-absorbing layer 360 is stacked at the rear side of the glass substrate 330 to face the electromagnetic radiation- shielding layer 340 via a transparent adhesion layer 350 to obtain an optical filter for a display panel.
• an optical filter for a display panel may also be formed by directly forming an antireflection layer and an NIR-blocking and selective light-absorbing layer on the front and back surfaces of a substrate film, respectively.
• an electromagnetic radiation-shielding layer and an antireflection layer may be disposed on a surface of a substrate film.
• an adhesive layer may have a NIR-blocking function and a selective light- absorbing function.
• the optical filter according to the present invention has a transmittance of 30 to 60% at a wavelength range of 380 to 780 nm.
• the optical filter exhibits a very low haze value of 1 to 6% as measured in a state wherein no transparent sheet is adhered to each layer.
• An optical filter manufactured as described above can be connected to a TV set by means of a fixing jig.
• An optical filter for a display panel manufactured according to the method of the preset invention employs an electromagnetic radiation-shielding layer formed by directly applying a paste suitable for gravure offset printing to a glass substrate, unlike a conventional optical filter comprising an electromagnetic radiation-shielding mesh film formed by a conventional etching process.
• the inventive method does not require the use of a polyester film and an adhesive layer, which markedly simplifies the filter structure and enhances the light transparency.
• an optical filter according to the present invention can be applied to common household PDP TVs since it has low resistivity owing to its simple manufacture process, which also markedly reduces the manufacturing cost.
• a paste composition was prepared as follows.
• an acrylate polymer resin which consisted of methacrylic acid (MA), benzyl methacrylate (BM), 2 -hydroxy ethyl (meth)acrylate (2-HEMA), and methyl (meth) acrylate (MMA) in a weight ratio of 30 : 20 : 10 : 40, where the weight average molecular weight was 25,000; 10% by weight of a crosslinkable oligomer composed of M310 (Miwon Co., Korea), DPHA (Japan Chemical Co., Ltd.), and U 108 A (Shin-Nakamura Chemical, Co., Ltd,) in a weight ratio of 1 : 2 : 1; 2% by weight of 1-107 (Ciba Specialty Chemicals) as a photopolymerization initiator; 71% by weight of silver powder as a metal powder; and 2% by weight of an amine group-containing organic dispersant, DS-IOl (San Nopco Korea, Ltd.) were mixed and stirred at room temperature
• the paste composition was gravure- offset printed on the surfaces of a glass substrate to form an electromagnetic radiation-shielding layer.
• the paste composition prepared above was coated on a gravure plate and evenly spread to a given thickness using a blade, and then transferred to a blanket ("off process).
• the pattern transferred to the blanket was subjected to a first curing process using a UV lamp, and the resulting pattern was transferred to a glass substrate ("set" process).
• the pattern transferred to the glass substrate was subjected to a secondary curing process using a UV lamp and thermally treated to remove impurities, to obtain an electromagnetic radiation-shielding layer.
• An electromagnetic radiation-shielding layer was formed using the same procedure as Example 1 except that the acrylate polymer resin and the crosslinkable oligomer were used in amounts of 10 and 15% by weight, respectively, based on the total weight of the composition.
• An electromagnetic radiation-shielding layer was formed using the same procedure as Example 1 except that the acrylate polymer resin was not used and the amount of the crosslinkable oligomer was 25% by weight based on the total weight of the composition.
• the optical filter schematically illustrated in FIG. 2 was manufactured as follows.
• a hard coating layer, a zirconium oxide-based film having a high refractive index, and a fluorosiloxane-based low refractive index film were sequentially stacked on a polyester film by a wet coating process to obtain an antireflection layer.
• 300 mg of poly(methyl methacrylate) was completely dissolved in 1 ,000 ml of methyl ethyl ketone (MEK), and 100 g of octaphenyltetraazaporphyrin and 150 mg of IFG022 (Japan Chemical Co., Ltd.) were dissolved therein.
• an acrylic transparent adhesive was continuously coated on the silicone release layer of a release film using a comma coating method, and subjected to thermal wind drying. Then, another release film was attached to the other surface of the adhesive layer to obtain a double-side releasably-treated transparent adhesive layer in the form of a roll.
• the release film of the transparent adhesive layer was delaminated, the antireflection layer and the NIR-blocking and selective light-absorbing layer were attached to the glass substrate having thereon the electromagnetic radiation- shielding layer formed in Example 1 under a pressure of 3 kgf/m 2 .
• An optical filter for a display panel was manufactured by the procedure of
• Example 3 except that the electromagnetic radiation-shielding layer obtained in Example 2 was used.
• An optical filter for a display panel was manufactured by the procedure of Example 3 except that the electromagnetic radiation-shielding layer obtained in Comparative Example 1 was used.
• An antireflection layer, an adhesive layer, and an NIR-blocking and selective light-absorbing layer were formed by the procedure of Example 3, except that a transparent adhesive was coated on an etching type mesh film (Nippon Filcoii Co., Ltd.) having a linewidth of 10 M ⁇ , a line pitch of 300 ⁇ m, and an aperture ratio of about 93%, which was then dried, and a release film was laminated on the surface of the adhesive layer, to obtain an electromagnetic radiation-shielding layer.
• etching type mesh film Natural Filcoii Co., Ltd.
• the electromagnetic radiation-shielding layer thus obtained was attached to a glass substrate under a pressure of 3kgf/m 2 while the release film was delaminated, to obtain an optical filter for a display panel illustrated in FIG. 1.
• the optical filters manufactured in Examples 3 and 4 i.e., optical filters including electromagnetic radiation-shielding layers obtained by directly forming paste compositions according to the present invention on glass substrates using a gravure offset printing process, exhibited a haze value of about 3%, showing that the transparency of the optical filters manufactured in Examples 3 and 4 is better than that of the optical filters manufactured in Comparative Examples 2 and 3.
• the optical filters manufactured in Examples 3 and 4 exhibited a uniform 15 ⁇ 20/ ⁇ i linewidth.
• the optical filter manufactured in Comparative Example 2 exhibited poor appearance, such as a wide pattern linewidth of lOO ⁇ r ⁇ and poor pattern directionality.
• the optical filter manufactured in Comparative Example 2 exhibited a wide mesh linewidth and poor pattern directionality having a markedly low transmittance of 35%, which is less than the filter transmittance of the inventive NIR-blocking and selective light- absorbing layer.
• the optical filter manufactured in Comparative Examples 3, including etching type mesh films commonly employed in the art, exhibited a markedly high haze value due to the presence of the mesh film.
• the electromagnetic radiation-shielding layers of the optical filters manufactured in Examples 3 and 4 exhibited a surface resistivity of 0.4-0.7 ⁇ / ⁇ , which is slightly higher than that (0.05 ⁇ /D) of etching type mesh films used in conventional optical filters (Comparative Example 3).
• an electromagnetic radiation-shielding layer formed as a multilayered sputtering type conducting film currently employed for household PDP TVs has a surface resistivity of 0.8-1.2 ⁇ /D, it can be seen that the optical filters manufactured in Examples 3 and 4 have a better electromagnetic radiation-shielding effect.

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• Optics & Photonics (AREA)
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• Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
• Devices For Indicating Variable Information By Combining Individual Elements (AREA)

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• 2006
  • 2006-11-09 KR KR1020060110423A patent/KR100791205B1/ko not_active IP Right Cessation
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