TWI225227B - A displaying filter, a display device and a manufacturing method thereof - Google Patents

A displaying filter, a display device and a manufacturing method thereof Download PDF

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Publication number
TWI225227B
TWI225227B TW90102016A TW90102016A TWI225227B TW I225227 B TWI225227 B TW I225227B TW 90102016 A TW90102016 A TW 90102016A TW 90102016 A TW90102016 A TW 90102016A TW I225227 B TWI225227 B TW I225227B
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Taiwan
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layer
transparent
display
film
filter
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TW90102016A
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Chinese (zh)
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Katsuhiko Koike
Tomoyuki Okamura
Toshihisa Kitagawa
Hiroaki Saigo
Shin Fukuda
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Mitsui Chemicals Inc
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Abstract

A displaying filter is constructed by laminating in sequence a transparent binding layer (C) 31 having a coloring material, a polymer film (B) 20, a transparent conductive layer (D) 10, a transparent binding layer (E) 40, and a functional transparent layer (A) 60 being characterized by anti-reflection, hard coating, gas harrier, anti-static electrical charge and anti-fouling, and bound on a display screen 00, the transparent conductive layer (D) 10 is grounded via an electrode 50, a conductive copper foil binding tape 80 to a ground terminal of the display device.

Description

1225227 五、發明說明(1 ) [技術領域] 本發明係關於設置在’例如,電漿顯示器(p 1 a s m a D isplay)(PDP),布朗管(Braun Tube)( CRT),液晶顯示 裝置(Liquid Crystal Display Device)(LCD)等之顯 示器之顯示面上,具有遮蔽顯示器之顯示面所產生之電 磁波中除可視光以外之電磁波之濾光特性,及/或能 補正可視光譜之濾光特性之顯示器用濾光器,和裝設該 濾光器之顯示裝置及其製造方法。 隨著社會之高度資訊化,光電子關聯之部品,機器 顯著地進步,普及。其中使用於電視機,個人電腦上等 之顯示器甚爲普及,且被要求薄型化,及大型化。大型 之薄型顯示器最受注目者則爲電漿顯示器。電漿顯示器 ,依其構造和動作原理’會自顯示面產生強的洩漏電磁 場,近紅外線。 近年,有關電子機器產生之洩漏電磁波對人體和其 它機器之影響之議論益形增多’例如’須將洩漏電磁波 抑制在依日本之 VCCI(Voluntary control council fo r Interference by data Processing equipment ele -ctronic office machine:控制資料處理設備電子辦 公機器干擾之無報酬性評議委員會)製定之基準値內。 另外,顯示器顯示面產生之近紅外線’可能會對無 線電話機(cord-less phone)等週邊電子機器產生作用 而引起誤動作。遙控(remote contr〇l)和傳送系統上 -3- 1225227 五、發明說明(2) 之光通訊係使用波長爲820nm,8 8 0nm,980nm等之近紅 外光線,因此,須將屬於近紅外光領域之800〜1 1 00nm 之波長領域之光之位準(1 e v e 1 )抑制到實用上無問題之 程度。 有關近紅外線之減低(c u t )’以往所知者係使用藉近 紅外線吸收色素製作之近紅外光吸收濾光器。但是’近 紅外線吸收色素容易受到濕度,熱,光等周圍環境之影 響而劣化,使用色素之近紅外線吸收濾光器隨著老化(a g i n g )而降低紅外線減低能力’從而具有產生濾光器透 射色變化等之光學特性之變化傾向。 尤其,電漿顯示器在寬廣之波長領域上產生強的近 紅外線,因此,須使用在寬廣之波長領域上近紅外線領 域之吸收率大之近紅外線吸收濾光器。以往實現之近紅 外線吸收濾光器只屬於可視光線透射率低者。 另外,有關洩漏電磁波之低減,須以導電性高之導 電物覆蓋顯示器之顯示面。所用之方法係採用透明導電 層,此透明導電層大別分爲導電性網和導電性薄膜兩種 。導電性網有採用接地之金屬網,以金屬被覆在合成纖 維或金屬纖維網上,或者形成金屬膜後施予浸蝕處理使 成格柵型樣(grid pattern)之浸蝕膜等。 也有採用金屬薄膜和氧化物半導體薄膜等作成之透 明導電性薄膜以替代導電性網作爲電磁波遮蔽層之方法 。金屬薄膜雖能獲得良好之導電性,但由於金屬在寬廣 -4- 1225227 五、發明說明(3) 波長領域上之反射及吸收而無法獲得高可視光線透射率 。氧化物半導體薄膜相較於金屬薄膜透明性優,導電性 劣,另外無具近紅外線之反射能力。如上述那樣,以低 減洩漏電磁場爲目的之透明導電層大部份是若重視遮蔽 性能時使用導電性網,重視成本性時則使用透明導電性 薄膜。 另外,嘗試改善顯示器之色純度而使用色素之方法 係記載於,例如,日本專利公報特開昭5 8 - 1 5 3 904號, 特開昭60-22102號特開昭5 9 - 22 1 943號等上。特開昭 58-153904號言及適用於電漿顯示板(Plasma Displa y Panel)0 但是,這些以往之技術,使用於電漿顯示板之際對 電磁波遮蔽上須用之透明導電層,與色素之組合皆未提 及,而使用之色素也未具體言及。 電漿顯示器用濾光器係與顯示器分別形成其係爲了 近紅外線,電磁波遮蔽顯示面之保護而設置作爲顯示器 之前面板。但是,前面板之方式,因其構成部件數,製 造步驟數多,故導致成本高漲,且難於作爲薄型、輕量 〇 再者,電漿顯示器顯示部之表面反射一般因未被低 減,且具有玻璃基板之反射率,故從熱設計等之觀點考 量而將前面板隔顯示部一距離設置時由於顯示器表面之 外光反射和前面板之外光反射,以致反射影像變成多重 -5- 1225227 五、發明說明(4) ,從而降低顯示器之視認性。另外,電漿顯示器,由於 顯示面上玻璃之反射和螢光體之反射,降低明處之階調 (Con t r as t ),同時具有發光之色再現範圍窄狹之特性。 另外,日本國專利公報JPA 1 0 - 1 5699 1,JPA 10- 1 888 22,2000-98131等倡議拿掉前面板而直接在顯示器板 面上粘貼光學薄膜。但是,這些以往技術皆對透明高分 子薄膜整體之合計厚度未規定,同時對賦與耐衝擊性方 面未具體言及。 再者,JPA 1 0 - 2 1 1 668提議將直接粘貼用之光學薄膜 疊積在厚度爲1mm以上之透明高分子薄片(Sheet)上。 但是,厚度lmm以上之透明高分子薄片自捲筒(roll)形 態進行連續粘貼之步驟或直接粘貼於顯示器,在實用上 有困難,前述專利公報之實施例,係粘貼在厚度爲3mm 之丙烯基(acryl)之薄片上,顯然係欲改良逐頁粘貼型 之以往前面板型濾光器。 一般,具有本發明之利用領域上之各功能之透明高 分子薄膜,係以捲筒形態使用,自作業效率等之觀點考 量,通常係使用厚度爲75〜ΙΟΟμπι之薄膜。因此,粘 貼具有單純功能之兩張透明高分子薄膜之情形,其厚度 之合計係未滿0 . 3mm。另外,反射防止薄膜甚至部份使 用厚度爲188μηι之薄膜,基底膜(base f i lm)係用聚對 苯二甲酸乙二醇酯(polyethylene terephtha-late)(P ET),相較於良好地被使用之80μπι之三乙醯基纖維素( -6 - 1225227 五、發明說明(5) triacetyl cellulose )(TAC)之基底膜,反射防止性不 良,故其未被積極地使用於薄膜族之貼合上。 另外,直接將薄膜粘貼於顥示器板面本體之情形, 顯示器本身價昂,且當產生異常時必須執行薄膜之剝離 處理,有關此作業性,上述以往之專利公報上並未提及 。另外,關於將薄膜粘貼於顯示器一事,在液晶顯示器 和平面電視機(f 1 a t t e 1 e v i s i ο η )上已實施,但是,電 漿顯示器因面積大幅地增大,必須以大於自目前既存之 顯示器剝離薄膜之力進行剝離故麻煩,且易於在顯示器 表面上殘留粘糊,以致具有作業上之問題。 再者,於電磁波遮蔽體上,必須使用電極以將電磁 波用電流之形態取出外部俾獲得透明導電層和外部之導 通。其作法可有爲了保護之目的而於透明導電層上粘貼 薄膜之際,將該透明導電層之一部份露出於濾光器之周 圍,而將此部份作爲電極,從而作爲執行與外部導通之 部位。以往,藉將薄膜粘貼於前面板而得出之電磁波遮 蔽體係藉此作法而獲得與外部之導通。使透明導電層露 出之方可採用將粘貼於透明導電層上之薄膜之面積作得 比透明導電層之面積小等之方法。 使用此方法,係逐張將具有透明導電層之薄膜粘貼 於剛性高之薄板等上,接著再將較小面積之保護膜逐張 粘貼於導電層之薄膜上,如此需要兩次逐張粘貼之步驟 ,以致在生產性上產生問題。 -7 - 1225227 五、發明說明(6) 另外,以往藉在前面板上粘貼薄膜以得出之電磁波 遮蔽體係在周圍全部設置電極。使用此種方法’必須執 行逐張形成電極之步驟,故生產性有問題。 本發明之目的,係鑑於上述以往技術,提供具有所 要之濾光器特性以改善電磁波遮蔽功能和近紅外線低減 功能,畫質改善功能,能期獲得低成本,輕量薄型化, 改善板面保護性,異常發生時之作業性,以及裝設該濾 光器之顯示裝置及其製造方法。 (發明之揭示) 本發明者等爲了解決上述問題,累積銳意檢討之結 果,發現1)爲了遮蔽自電漿顯示器產生之非常強之電 磁波,需使用面電阻爲0.01〜30Ω/□之透明導電層, 2)藉具備這種透明導電層之電磁波遮蔽體直接形成在電 漿顯示器表面,能得出使用電磁波遮蔽功能,近紅外線 低減功能,影像視認性。成本上優良之電漿顯示器之顯 示裝置,3)具有特定之層構成,含有色素,且藉將可視 光線透射率爲30〜8 5%之調光薄膜直接形成於顯示器表 面,得出使用影像·視認性•成本皆佳之顯示器之顯示 裝置’ 4 )藉將構成光學濾光器之透明高分子薄膜之合計 厚度作成〇· 3mm以上,並將此濾光器直接粘貼於顯示器 之前面’除了獲得量輕薄型化和板面之保護性外,也提 高作業性,5 )限制形成電極之位置,例如,若係爲長方 形之光學濾光器之情形,規劃使電極只形成在一組相互 -8- 1225227 五、發明說明(7) 對向之兩邊,以及電極之形狀,藉此,能執行以具有高 生產效率之輥對輥(r 〇 1 1 t 〇 r ο 1 1 )方式形成電極等, 從而創作出本發明。 本發明係爲能粘結於顯示器顯示面,具有既定之濾 光器特性之顯示器用之濾光器,其特徵係爲具備設在外 氣側,具有反射防止性及/或防眩性之功能性透明層( A), 設於顯示器側,用於粘結於顯示面之透明粘結層(C), 設在功能性透明層(A )和透明粘結層(C )之間作爲基 體之高分子膜(B)之顯示器用濾光器。 另外,本發明係良好地在功能性透明層(A )和高分子 膜(B )之間,及/或高分子膜(B )和透明粘結層(C )之間設 置具有0.01〜30Ω/□之透明導電層(D)。 再者,本發明良好的是透明導電層(D)之一部份或全 部係用導電性網構成。 另外,本發明良好的是透明導電層(D )係以高折射率 透明導電膜(Dt )及金屬薄膜層(Dm)之組合(Dt ) / ( Dm)作 爲重複循環單位,經2〜4次重複疊積後,再於其上疊 積高折射率薄膜層(D t )而構成。 再者,本發明良好的是在多數之高折射率透明薄膜 層(D t )中至少有一層係以銦,錫,及鋅之任一種以上作 主成份之氧化物所形成。 另外,本發明良好的是,在多數之金屬薄膜層(Dm ) -9 - 1225227 五、發明說明(8) 中至少有一層係藉銀或銀合金形成。 另外,本發明良好的是功能性透明層(A )另具有硬塗 性,靜電防止性,防污性,氣體遮斷性及紫外線低減性 中之至少一種功能。 另外,本發明良好的是在功能性透明層(A )和高分子 膜(B )之間設置粘結層(E )。 另外,本發明良好的是在高分子膜(B)之兩面或單面 上形成硬塗層(F )。 另外,本發明良好的是在功能性透明層(A ),高分子 膜(B),透明粘結層(C),透明導電層(D),粘結層(E) ,及硬塗層(F)中至少有一層含有1種以上之色素。 另外,本發明良好的是含有對波長5 7 0〜605nm範圍 內之光具有極大吸收之色素。 另外,本發明良好的是前述色素係爲四氮雜卟啉(t e trazaporphyrin)化合物 ° 、 另外,本發明良好的是四氮雜卟啉化合物係爲用下 列之化學式(1 )表示之化合物。1225227 V. Description of the Invention (1) [Technical Field] The present invention relates to a device that is installed in, for example, a plasma display (p 1 asma D isplay) (PDP), a Braun Tube (CRT), and a liquid crystal display device (Liquid The display surface of a display such as a Crystal Display Device (LCD) has a filtering characteristic that shields the electromagnetic waves generated by the display surface of the display except visible light, and / or a display that can correct the filtering characteristic of the visible spectrum An optical filter, a display device equipped with the optical filter, and a manufacturing method thereof. With the high informationization of the society, the parts and components related to optoelectronics have significantly improved and spread. Among them, displays used in televisions, personal computers, etc. are very popular, and are required to be thinner and larger. Large and thin displays are attracted most attention by plasma displays. Plasma displays, based on their structure and operating principle, ’will generate a strong leaking electromagnetic field from the display surface, near-infrared. In recent years, discussions about the effects of leaking electromagnetic waves generated by electronic equipment on human bodies and other equipment have increased. For example, the leakage electromagnetic waves must be suppressed in accordance with Japan's VCCI (Voluntary control council fo r Interference by data Processing equipment ele -ctronic office machine : In the benchmark set by the Unpaid Evaluation Committee to control the interference of data processing equipment and electronic office equipment. In addition, near-infrared rays' generated on the display surface of the monitor may cause malfunction to peripheral electronic devices such as cord-less phones. Remote contr0l and transmission system -3- 1225227 V. Description of the invention (2) The optical communication system uses near-infrared light with a wavelength of 820nm, 880nm, 980nm, etc., so it must be near-infrared light. The level of light in the wavelength range of 800 to 1 100 nm (1 eve 1) is suppressed to a practically no problem. What is known about the reduction of near-infrared rays (c u t) is a near-infrared light absorption filter made of a near-infrared absorbing pigment. However, 'Near-infrared absorbing pigments are easily degraded by the surrounding environment such as humidity, heat, light, etc. The near-infrared absorbing filters using pigments reduce the infrared reduction ability with aging', so that they can produce filter transmission colors The tendency of the optical characteristics to change. In particular, plasma displays generate strong near-infrared rays over a wide range of wavelengths. Therefore, a near-infrared absorption filter with a large absorptivity in the near-infrared range over a wide range of wavelengths must be used. The near-infrared absorption filters realized in the past only belong to those with low visible light transmittance. In addition, to reduce the leakage of electromagnetic waves, the display surface of the display must be covered with a conductive material with high conductivity. The method used is a transparent conductive layer. This transparent conductive layer is largely divided into two types: conductive mesh and conductive film. The conductive mesh includes a grounded metal mesh, a metal coated on a synthetic fiber or a metal fiber mesh, or an etching film formed by applying an etching treatment to form a grid pattern after forming a metal film. There is also a method in which a transparent conductive film made of a metal thin film, an oxide semiconductor thin film, or the like is used instead of a conductive mesh as an electromagnetic wave shielding layer. Although the metal thin film can obtain good conductivity, it cannot obtain high visible light transmittance due to the reflection and absorption of the metal in a wide range of wavelengths. Compared with metal thin films, oxide semiconductor thin films have better transparency and poor conductivity, and have no near-infrared reflection ability. As described above, most of the transparent conductive layer for the purpose of reducing the leakage electromagnetic field is to use a conductive mesh when shielding performance is important, and a transparent conductive film when cost is important. In addition, a method of using a pigment to improve the color purity of a display is described in, for example, Japanese Patent Laid-Open No. Sho 5 8-1 5 3 904 and Japanese Patent Laid-Open No. 60-22102. No. Wait. Japanese Patent Application Laid-Open No. 58-153904 states that it is applicable to plasma display panels. However, these conventional technologies are used in the plasma display panel to shield electromagnetic waves from the transparent conductive layer and pigment. None of the combinations were mentioned, nor were the pigments used. The filter for the plasma display is formed separately from the display, and is provided as a front panel of the display for the protection of near-infrared rays and electromagnetic waves shielding the display surface. However, the method of the front panel has a high number of components due to the number of components and manufacturing steps, and is difficult to be thin and lightweight. Furthermore, the surface reflection of the display part of the plasma display is generally not reduced, and it has The reflectivity of the glass substrate, so from the perspective of thermal design, etc., when the front panel is set at a distance from the display, the reflected image becomes multiple due to light reflection outside the display surface and light outside the front panel. -5- 1225227 2. Description of the invention (4), thereby reducing the visibility of the display. In addition, the plasma display, due to the reflection of the glass on the display surface and the reflection of the phosphor, reduces the tone of the bright place (Con t r as t), and at the same time has the characteristics of narrow color reproduction range. In addition, the Japanese Patent Gazette JPA 1 0-1 5699 1, JPA 10-1 888 22, 2000-98131 and others have proposed to remove the front panel and directly attach an optical film on the surface of the display panel. However, in these conventional technologies, the total thickness of the transparent high-molecular film as a whole is not specified, and the impact resistance is not specifically described. In addition, JPA 1 0-2 1 1 668 proposes to stack an optical film for direct bonding on a transparent polymer sheet (Sheet) having a thickness of 1 mm or more. However, the transparent polymer sheet with a thickness of 1 mm or more is continuously applied in a roll form or directly attached to a display, which is difficult in practice. The embodiment of the aforementioned patent publication is attached to an acrylic base with a thickness of 3 mm. (Acryl) sheet is obviously to improve the conventional front-panel type filter. Generally, a transparent high-molecular film having various functions in the field of use of the present invention is used in the form of a roll, and from the viewpoint of working efficiency, it is generally a film having a thickness of 75 to 100 μm. Therefore, in the case of sticking two transparent polymer films having a simple function, the total thickness is less than 0.3 mm. In addition, the anti-reflection film even partially uses a film with a thickness of 188 μηι. The base film (poly film) is made of polyethylene terephtha-late (P ET). The base film of 80μπι triacetyl cellulose (-6-1225227 V. Description of the invention (5) triacetyl cellulose) (TAC) has poor anti-reflection properties, so it is not actively used in the lamination of film families. on. In addition, in the case where the film is directly stuck to the panel body of the display, the display itself is expensive, and the film must be peeled off when an abnormality occurs. This workability has not been mentioned in the above-mentioned prior patent publications. In addition, the application of a thin film to a display has been implemented on liquid crystal displays and flat-screen televisions (f 1 atte 1 evisi ο η). However, due to the large increase in area of the plasma display, it must be larger than the existing display. Peeling by the force of a peeling film is troublesome, and sticky paste is easy to remain on the surface of the display, resulting in problems in operation. Furthermore, on the electromagnetic wave shielding body, it is necessary to use an electrode to take out the electromagnetic wave in the form of an electric current to obtain the transparent conductive layer and the external conduction. The method may be to stick a thin film on the transparent conductive layer for the purpose of protection, and expose a part of the transparent conductive layer around the filter, and use this part as an electrode to perform conduction with the outside. Of the part. In the past, an electromagnetic wave shielding system obtained by pasting a film on a front panel was used to obtain conduction with the outside. In order to expose the transparent conductive layer, a method such as making the area of the thin film pasted on the transparent conductive layer smaller than the area of the transparent conductive layer can be used. Using this method, a film with a transparent conductive layer is pasted on a sheet with high rigidity one by one, and then a protective film of a smaller area is pasted on the film on the conductive layer one by one, so it is necessary to paste two sheets Steps so as to cause problems in productivity. -7-1225227 V. Description of the invention (6) In addition, in the past, the electromagnetic wave shielding system obtained by pasting a thin film on the front panel provided electrodes all around. In this method ', the steps of forming the electrodes one by one must be performed, so productivity is problematic. The object of the present invention is to provide the required filter characteristics to improve the electromagnetic wave shielding function and the near-infrared reduction function, the image quality improvement function in view of the above-mentioned conventional technology, and to achieve low cost, light weight and thinness, and improved surface protection. Performance, workability when abnormality occurs, display device equipped with the filter and manufacturing method thereof. (Disclosure of the invention) In order to solve the above problems, the inventors accumulated the results of an intensive review and found that 1) In order to shield the very strong electromagnetic waves generated from the plasma display, a transparent conductive layer with a surface resistance of 0.01 to 30 Ω / □ needs to be used 2) An electromagnetic wave shielding body having such a transparent conductive layer is directly formed on the surface of the plasma display, and an electromagnetic wave shielding function, a near-infrared reduction function, and an image visibility can be obtained. The display device of plasma display with excellent cost 3) has a specific layer structure, contains pigments, and directly forms a light-adjusting film with a visible light transmittance of 30 to 8 5% on the display surface to obtain a use image · The display device of the display with good visibility and cost. 4) The total thickness of the transparent polymer film constituting the optical filter is 0.3 mm or more, and the filter is directly pasted on the front of the display. In addition to reducing the thickness and the protection of the board surface, it also improves the workability. 5) Limit the position where the electrodes are formed. For example, if it is a rectangular optical filter, plan to make the electrodes only in a group of -8- 1225227 V. Description of the invention (7) The two sides facing each other and the shape of the electrode, whereby the formation of electrodes, etc. in a roll-to-roll (r 〇1 1 t 〇r ο 1 1) manner with high production efficiency can be performed, thereby Invented the invention. The present invention is a filter for a display that can be adhered to the display surface of a display and has predetermined filter characteristics, and is characterized in that it is provided on the outside air side and has the function of preventing reflection and / or anti-glare. The transparent layer (A) is provided on the display side, and the transparent adhesive layer (C) for adhering to the display surface is provided between the functional transparent layer (A) and the transparent adhesive layer (C) as the height of the substrate. Filter for display of molecular film (B). In addition, the present invention is preferably provided between the functional transparent layer (A) and the polymer film (B), and / or between the polymer film (B) and the transparent adhesive layer (C). □ The transparent conductive layer (D). Furthermore, it is favorable in the present invention that a part or all of the transparent conductive layer (D) is made of a conductive mesh. In addition, the present invention is good in that the transparent conductive layer (D) uses a combination (Dt) / (Dm) of a high refractive index transparent conductive film (Dt) and a metal thin film layer (Dm) as a repeating cycle unit, after 2 to 4 times After repeated stacking, a high refractive index thin film layer (D t) is stacked thereon. Furthermore, the present invention is favorable in that at least one of most of the high-refractive-index transparent thin-film layers (Dt) is formed of an oxide containing indium, tin, and zinc as one or more main components. In addition, the present invention is good in that most of the metal thin film layers (Dm) -9-1225227 V. At least one layer in the description of the invention (8) is formed by silver or a silver alloy. In addition, the present invention is advantageous in that the functional transparent layer (A) has at least one of functions of hard coatability, antistatic property, antifouling property, gas blocking property, and ultraviolet reducing property. Further, the present invention is advantageous in that an adhesive layer (E) is provided between the functional transparent layer (A) and the polymer film (B). Further, the present invention is advantageous in that a hard coat layer (F) is formed on both or one side of the polymer film (B). In addition, the present invention is good in functional transparent layer (A), polymer film (B), transparent adhesive layer (C), transparent conductive layer (D), adhesive layer (E), and hard coat layer ( F) At least one layer contains at least one pigment. In addition, the present invention is advantageous in that it contains a pigment having a great absorption of light in a wavelength range of 5 7 to 605 nm. In the present invention, it is preferable that the pigment is a t e trazaporphyrin compound, and it is also preferable that the present invention is that the tetrazoporphyrin compound is a compound represented by the following chemical formula (1).

-10- 1225227 五、發明說明(9) (式中,A1〜A8係分別各自表示氫原子,鹵原子,硝 基,氰基,羥基,磺酸基,碳數1〜20之烷基,鹵化 院基’院氧基’院氧基院基’方氧基,單院基胺基, 一院基胺基’芳院基’方基’雜方基,院硫基,或者 芳硫基 ,A1和A2,A3和A4,A5和A6,A7和A8也可分 別各自經連結基形成除芳香族環以外之環,Μ係表示M 個氫原子,兩價之金屬原子,三價的一個置換金屬原子 ,四價的兩個置換金屬原子,或羥基(Oxy)金屬原子)。 另外,本發明良好的是含有對波長800〜llOOnm之 範圍內之光具有吸收極大之近紅外線吸收色素。 另外,本發明良好的是功能性透明層(A )之表面上之 可視光線之反射率係在2%以下。 另外,本發明良好的是具有30〜8 5%之可視光線透射 率 〇 另外’本發明良好的是在波長800〜llOOnm範圍內 之透射率極小係爲20%以下。 另外’本發明良好的是濾光器整體之高分子膜之合 計厚度約爲0 . 3 m m以上。 另外’本發明良好的是具備色素能含有之厚度墊高 用之高分子膜。 另外,本發明良好的是形成與透明導電層(D)行電氣 連接之電極。 -11- 1225227 五、發明說明(1 o ) 另外’本發明良好的是與透明導電層(D )行電氣連接 之電極係在濾光器之周緣部沿著周圍方向連續形成。 另外’本發明良好的是在一部份露出之導電部上形 成電極。 另外’本發明良好的是濾光器之形狀係爲長方形, 在對向之兩個周邊上形成電極。 另外’本發明良好的是與透明導電層(D)行電氣連接 之電極係形成在濾光器之周緣端面上。 另外’本發明良好的是沿著濾光器之厚度方向形成 從最外部表面至少聯通至透明導電層(D )之聯通孔, 在該聯通孔之內部,形成與透明導電層(D)行電氣連 接之電極。 另外,本發明良好的是在透明導電層(D)和與其鄰接 之層之間有插設導電性帶。 另外,本發明之特徵係爲具備用於顯示影像之顯示 器和設在顯示器顯示面上,作爲上述顯示器用之濾光器 之顯示裝置。 另外,本發明之特徵係爲包括將上述之顯示器用濾 光器經透明粘結層(C )粘貼於顯示裝置之顯示器顯示面 上之粘貼步驟,及 將顯示裝置之接地導體和透明導電層(D)之電極行電 氣連接之步驟之顯示裝置之製造方法。 另外,本發明之特徵係爲包括將含有高分子膜(B ), -12- 1225227 五、發明說明(彳1 ) 透明導電層(D ),及透明粘結層(C )之積層濾光器經透明 粘結層(C )粘貼於顯示裝置之顯示器顯示面上粘貼步驟 ,和 直接或經第2粘結層將具有反射防止性及/或防眩 性之功能性透明層(A)配置在該積層濾光器上之步驟, 及 將顯示裝置之接地導體和透明導電層(D )行電氣連接 之步驟之顯示裝置之製造方法。 另外,本發明之特徵係爲包括將粘結層設於顯示裝 置之顯示器顯示面上之步驟, 將含有高分子膜(B),透明導電層(D),及具有反射 防止性及/或防眩性之功能性透明層(A )之積層濾光器 經前述粘結層粘合之步驟,及 將顯示裝置之接地導體和透明導電層(D)行電氣連接 之步驟之顯示裝置之製造方法。 另外,本發明之特徵係爲包括將粘結層設於顯示裝 置之顯示器顯示面上之步驟, 將含有高分子膜(B),及透明導電層(D)之積層濾光 器經前述粘結層粘合之步驟, 直接或經第2粘結層將具有反射防止性及/或防眩 性之功能性透明層配置於該積層濾光器上之步驟,及 將顯示裝置之接地導體和透明導電層(D )行電氣連接 之步驟之顯示裝置之製造方法。 -13- 1225227 五、發明說明(12 ) (圖面之簡單說明) 本發明及上述那些目的和其它目的’特色和優點將 因下面參照附圖所作之詳細說明更形淸楚。. 第1圖係示出本發明之高分子膜(B) /透明導電層(D) 之一例之斷面圖。 第2圖係示出本發明之電磁波遮蔽體之一例之平面 圖。 第3圖係示出本發明之電磁波遮蔽體和其裝設狀態 之一例(實施例1 )之斷面圖。 第4圖係示出本發明之電磁波遮蔽體和其裝設狀態 之一例(實施例2 )之斷面圖。 第5圖係示出本發明之電磁波遮蔽體之一例之平面 圖。 第6圖係示出本發明之電磁波遮蔽體和其裝設狀態 之一例(實施例3 )之斷面圖。 第7圖係示出本發明之電磁波遮蔽體和其裝設狀態 之一例(實施例4 )之斷面圖。 第8圖係示出電磁波遮蔽體形成前後之色再現範圍 之X - y色度圖。 第9圖係示出本發明之調光膜和其裝設狀態之一例( 實施例5 )之斷面圖。 第1 0圖係示出本發明之調光膜和其裝設狀態之一例 (實施例6 )之斷面圖。 -14- 1225227 五、發明說明(13) 第11圖係示出調光膜形成前後之色再現範圍之X - y 色度圖。 第12圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第1 3圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第14圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第15圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第16圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第17圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第1 8圖係示出表示第1 6圖所示之電磁波遮蔽功能 之透明高分子膜(B)23之構成之斷面圖。 第1 9圖係示出表示第1 7圖所示之電磁波遮蔽功能 之透明高分子膜(B)26之構成之斷面圖。 第20圖係爲第16或第17圖所示之顯示器用濾光器 之平面圖。 第21圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第22圖係示出本發明有關之顯示器用濾光器之構成 -15- 1225227 五、發明說明(14) 例之斷面圖。 第23圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第24圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第25圖係示出本發明有關之顯示器用濾光器之構成 例之斷面圖。 第26圖係爲第21〜25圖所示之顯示器用濾光器之 平面圖。 第27圖係示出金屬型樣(metal pattern)之一例。 (實施本發明之最佳形態) 下面將參照附圖說明依本發明之顯示器用濾光器, 顯示裝置及其製造方法之最佳實施形態。 本發明有關之顯示器用濾光器係藉含有對波長570〜 60 5 nm範圍內之光具有吸收極大之色素,作爲具有補正 顯示器兩面之可視光譜之濾光器特性之調光膜而運作。 另外,本發明有關之顯示器用濾光器係藉具備面電 阻爲0.01〜30Ω/□之透明導電層,作爲具有遮斷自顯 示器顯示面發射之電磁波之濾光器特性之電磁波遮蔽體 而運作。 另外,本發明有關之顯示器用濾光器係藉含有對波 長800〜1 lOOnm之範圍內之光具有吸收極大之近紅外線 吸收色素,作爲具有遮斷自顯示器顯示面射出之近紅外 -16- 1225227 五、發明說明(15 ) 線之濾光器特性之近紅外線濾光器而運作。 藉將具有這些功能之顯示器用濾光器直接粘貼於電 漿顯示器等之顯示器表面,能達到低成本,輕量薄型化 ,並提高板面之保護性,異常產生時之作業性,及生產 性。 本發明有關之電磁波遮蔽體至少含有形成在高分子 膜(B)之一側之主面上,面電阻至少爲〇.〇1〜30Ω/Π 之透明導電層(D),及形成於高分子膜(B)之另一側主面 上之透明粘結層(C),在該透明導電層(D)上另具有導通 部,及直接或經透明粘結層形成之功能性透明層(A )。 另外,本發明有關之電磁波遮蔽體至少含有形成在 高分子膜(B)之一側之主面上,面電阻至少爲〇.〇1〜30 Ω / □之透明導電層(D),和形成在高分子膜(B)之另一 側主面上之功能性透明層(A ),另在該透明導電層(D )上 形成導電性粘結層及透明粘結層(C )。 另外,本發明有關之電磁波遮蔽體至少具有高分子 膜(B),形成在該高分子膜(B)之一側之主面上,面電阻 至少爲0.01〜30 Ω / □之透明導電層(D),透明粘結層 (C ) ’及形成在高分子膜(B )之另一側主面上之功能性透 明層(A )。 另外,本發明有關之調光膜至少具有高分子膜(B), 形成於該高分子膜(B)之一側主面上,具有反射防止性 及/或防眩性之功能性透明層(A ),形成於該高分子膜 -17- 1225227 五、發明說明(16) (B)之另一側之主面上之透明粘結層(c),且含有色素, 可視光線透射率係爲5 5〜9 0 %。 1 ·高分子膜(B) 高分子膜(B )係作爲濾光器之基體,例如,形成透明 導電層(B)用之基體,而且,本發明之顯示器用濾光器 因係直接形成於顯示器之表面上,故使用透明之高分子 作爲高分子膜(B ),只要在可視波長領域上係爲透明 即可。具體上,可包括聚對苯二甲酸乙二醇酯,聚醚碾 (polyether sulfone),聚苯乙烯(polystyrene),聚 奈酸乙一醇酯(polyethylene naphthalate),聚嫌 丙酸酯(polyallylate),聚醚醚酮(polyether eth erketone),聚碳酸酯(p〇iycarbonate),聚乙烯(p olyethylene),聚丙烯(p〇lypropyiene),尼龍-6( Nylon 6)等之聚醯胺(p〇iyamide),聚醯亞胺(poly imide),三乙醯基纖維素等之纖維系樹脂,聚氨基甲酸 酯(polyurethane),聚四氟乙烯(polytetrafluoroethy lene)寺氟系樹脂’聚氯乙燒(p〇iyChl〇rinated vinyl) #之乙儲基化合物’聚丙嫌酸(p〇lyacryl acid),聚 丙烯酸酯(polyacry 1 e s t e r ),聚丙烯腈(p 〇 1 y a c r y 1 〇 η itrille),丙烯基化合物之加聚物(additive polymer) ’聚甲基丙嫌酸酯(polymethacryl),聚異甲基丙嫌酸 酯(polyisomethacryl),聚氯化亞乙烯基(p〇iychl〇rina -18- 1225227 五、發明說明(17 ) ted vinylidene)等之亞乙燦基(vinylidene)化合物, 氟化亞乙嫌(fluor ated vinylidene) /三氧乙嫌(trif luoroethylene)共聚合物(copolymer),乙燒(ethylene) /乙嫌乙酸酯(vinyl acetate)共聚合物等之乙嫌基化 合物或氟化合物之共聚合物,聚環氧乙烷等之聚醚,環 氧樹脂,聚乙嫌醇(polyvinyl alcohol),聚乙綠丁縮 醒(polyvinyl butyral)等,但不限定於這些。 高分子膜通常厚度係爲10〜250 μιη。太薄的話,不易 直接在顯示器表面上形成濾光器,可撓性也受到限制。 因此,高分子膜(Β)之厚度最好係爲50μπι以上,而75μ m以上則更佳。另外,若厚度超過250μπι以上時可撓性 則過於不足,不適於將膜捲成捲筒使用。另外,如本發 明之情形,在要求高透明性之領域上係廣泛使用膜厚1 ΟΟμπι程度之高分子膜。 本發明使用之高分子膜具有可撓性,能藉輥對輥之 方法連續地形成,因此,效率佳,另外,還能生產長條 大面積之透明積層體。再者,膜狀之濾光器能藉疊積(1 am inate)方式容易直接形成在顯示器表面上。另外,以 直接粘貼在顯示器表面上之高分子膜作爲基體之濾光器 當顯示器之基板玻璃破損時能防止玻璃之飛散,故爲理 想。 本發明,也可藉對高分子膜(B)之表面施予濺射處理 ,電暈處理,火焰處理,紫外線照射,電子照射等之浸 -19- 1225227 五、發明說明(18 ) 蝕處理和底塗(undercoat)處理,事先提高形成在高分 子膜(B )上之透明導電層(D )對高分子膜(B )之密接性。 另外,也可在高分子膜(B )和透明導電層(D )間形成任意 之金屬等之無機物層,在透明導電膜成膜之前視需要也 可施予溶劑洗淨和超音波洗淨等之防塵處理。 另外,爲了提高透明積層體之耐擦傷性,也可在高 分子膜(B)之至少一側之主面上形成硬塗層(F)。 2 ·硬塗層(F ) 作爲硬塗層(F)之硬塗膜可包括丙烯基系樹脂,矽系 樹脂,三聚氰胺(me 1 ami ne )系樹脂,氨基甲酸酯系樹脂 ,醇酸(alky d)系樹脂,氟系樹脂等之熱硬化型或光硬 化型樹脂等,但其種類,形成方法皆無特別限定。這些 膜之厚度係爲1〜ΙΟΟμπι程度。另外,硬塗層(F)內能 含有1種以上之後述色素。 3 ·透明導電層(D ) 本發明之電磁波遮蔽體係在高分子膜(Β)之一側之主 面上形成透明導電層(D)。本發明之透明導電層(D)係爲 由單層或多層薄膜作成之透明導電膜。另外,本發明, 在高分子膜(Β)之主面上形成之透明導電層(D)之物係稱 爲透明積層體(Η )。 單層之透明導電膜包含前述金屬網和導電性格子狀 型樣膜等之導電性金網,金屬薄膜和氧化物半導體薄膜 等之透明導電性薄膜。 -20- 1225227 五、發明說明(19 ) 多層之透明導電膜含有由金屬薄膜和高折射率透明 薄膜疊積而成之多層薄膜。疊積金屬薄膜和高折射率薄 膜而成之多層薄膜藉銀等之金屬固有之導電性及其之自 由電子所產生之近紅外線反射特性,及高折射率透明薄 膜對在某波長領域上金屬所產生之反射的防止,具有導 電性,近紅外線低減能力,可視光線透射率任一項皆爲 良好之特性。 爲了獲得具有電磁波遮蔽能力,近紅外線低減能力 之顯示器用濾光器,疊積具有多數電磁波吸收用之高導 電性和電磁波反射用之反射界面之金屬薄膜和高折射率 透明薄膜而成之多層薄膜係爲最最理想。 依VCCI之規定,表示辦公用途之規定値之Class A 係爲放射電場強度未滿50dBpV/m,表示民生用途之規 定値之Cl as s B係爲未滿40dBuV/m。但是,電漿顯示 器之放射電場強度在20〜90MHz頻寬內,對角20吋型 程度度者係大於40dBpV/m,對角40吋型程度者則超過 5 0 d Βμ V / m。因此照原樣無經處理係無法用於家庭上。 電漿顯示器之放射電場強度係隨其顯示面之大小及 消耗電力愈大而愈強,須用遮蔽效果高之電磁波遮蔽材 〇 本發明者等銳意檢討之結果,爲了在具有高可視光 線透射率和低可視光線反射率外,另加上電漿顯示器上 必要之電磁波遮蔽能力,發現透明導電層(D)須具有低 -2 1- 1225227 五、發明說明(2〇) 電阻之導電性,亦即,面電阻最好爲0 . 〇 1〜30 Ω /□, 而0.1〜15Ω/□較佳,0.1〜5Ω/□則更佳。本發明之 可視光線透射率,可視光線反射率係依JIS (R-3106) 自透射率及反射率對波長之依存性算出。 另外,本發明者等發現爲了將電漿顯示器發出之強 近紅外線遮斷到在實用上不會造成問題之位準,須將顯 不器用濾光器在近紅外線波長領域8 0 0〜1 1 0 〇 n m上之光 線透射率極小作成在20%以下,爲了滿足此要求,自構 件數低減之要求和使用色素之近紅外線吸收之界限考量 ,透明導電層自身須具有近紅外線低減性。藉透明導電 層低減近紅外線係能利用金屬之自由電子所產生之反射 而達成。 金屬薄膜層厚的話,可視光透射率變低,薄的話近 紅外線之反射則變弱。但是,若將高折射率透明薄膜層 夾設具有某厚度之金屬薄膜層之積層構造重疊一段以上 的話,可視光線透射率則會提高,另能增加整體金屬薄 膜之厚度。另外,藉控制層數及/或各層厚度能在某範 圍內改變可視光線透射率,可視光線反射率,近紅外線 之透射率,透射色,反射色等。 一般,可視光線反射率高的話,照明器具等映入顯 示面則變大,降低防止顯示部表面之反射,從而降低視 認性和階調。另外’反射色最好係白色、藍色、紫色系 等之不顯眼之顏色。自上述這些事項觀之,透明導電層 -22- 1225227 五、發明說明(21 ) 最好係爲光學上容易設計,控制之多層積層。 本發明之電磁波遮蔽體良好的是使用在高分子膜(B ) 之一側之主面上形成多層薄膜之透明導電層(D)之透明 積層體(H)。 本發明之良好透明導電層(D)係在高分子膜(B)之一 側之主面上,依高折射率透明薄膜層(D t ),金屬薄膜層 (Dm)之順序,以(Dt )/(Dm)爲一重複循環單位,重複作 2〜4次之疊積,然後,另在其上至少疊積一層高折射 率透明薄膜層(Dt)而形成,該透明導電層之面電阻之特 徵係爲0.1〜5Ω/□具有優良之電磁波遮蔽能力所需之 低電阻性,近紅外線低減能力,透明性,可視光線反射 率之性能。再者,本發明,多層薄膜,除特別註明外, 係指將高折射率透明薄膜層夾設金屬薄膜層之積層構造 疊積一段以上而成之多層積層之透明導電膜。 本發明之透明導電層,重複之積層最好爲2〜4次。 亦即,在高分子膜(B)之主面上疊積透明導電層之本發 明之透明積層體係具有(B) / (Dt ) / (Dm) / (Dt ) / (Dm) / (Dt ) ,或(B)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt),或(B) /(Dt)/(Dm)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt)/(Dm)/(Dt)之 層結構。重複積層數若爲5次以上時,因生產裝置之限 制,會增大生產性之問題,另外,具有產生可視光線透 射率降低和可視光線反射率增加之趨勢。另外,重複之· 次數若是〗次時則難於同時作成充份具有低電阻性,近 -23- 1225227 五、發明說明(22 ) 紅外線低減能力,可視光射反射率。 再者;重複積層數爲2〜4次之多層薄膜,本發明者 等發現爲了同時將近紅外線低減能力,可視光線透射率 ,可視光線反射率作成適於電漿顯示器之良好特性,其 面電阻須爲0 . 1〜5 Ω / □。 另外,推測將來電漿顯示器放射之電磁波會降低。 在這種情形下,推測縱然電磁波遮蔽體之面電阻係爲5 〜1 5 Ω / □,仍能獲得充份之電磁波遮斷特性。另外, 推測電漿顯示器放射之電磁波會更進一步降低。這種情 形,推測電磁波遮蔽體之面電阻即使係15〜30 Ω /□也 能獲得充份之電磁波遮斷特性。另外一方面,自不同於 放射電磁波強度之觀點考量,爲追求電漿顯示器顯示面 之更大化,薄型化,推測電磁波遮蔽體之面電阻須爲〇 . 01 〜1 Ω /□。 金屬薄膜層(Dm)之材料,銀因具有優良之導電性, 紅外線反射性及多層積層後之可視光線透射性,故係爲 理想之材料,但是,銀在化學上,物理上之安定性不佳 ,會受環境中之污染物質,如水蒸氣,熱,光等之影響 而劣化,但是,能良好地使用在銀內添加金’白金’鈀 (Palladium),銅,銦(Indium),鍚等對環境安定之金 屬一種以上之合金,和也能良好地使用對這些環境安定 之金屬。特別是,金和鈀具有優良之耐環境性’光學特 性,係爲理想之金屬。 -24- 1225227 五、發明說明(23 ) 含有銀之合金中之銀含有率並無特別限制,但不欲 使銀薄膜之導電性,光學性產生大變化,其含有率應爲 50重量%以上,100重量%以下。但是,若添加其它金屬 於銀內,其優良之導電性,光學特性即會受到損害,故 具有多數金屬薄膜層之情形時可能的話希至少有一層銀 不使用合金,及從基體看只有最初之層及/或最外層 使用合金。 金屬薄膜層(Dm )之厚度係依導電性,光學特性等藉 光學設計加上實驗求出,雖然只要具有透明導電層要求 之特性的話,並無特別限定,但是自導電性等方面考量 ,薄膜非爲島狀構造而必須爲連續狀態,且希爲4nni以 上。另外,金屬薄膜層過厚的話透明性則會有問題,故 希不超過30nm。金屬薄膜層若是多數時並不限定各層 之厚度皆需一樣,另外,也可不是全部是銀,或含相同 銀之合金。 金屬薄膜層(Dm)之形成方法,能採用濺射,離子鍍 敷(Ion-Plating),真空蒸著;電鍍等以往熟知之方法 之任一種方法。 形成高折射率透明薄膜層(Dt)之透明導電膜’只要 在可視領域上具有透明性,在金屬薄膜層之可視領域上 具有防止光線反射之效果的話並無特別之規定,使用對 可視光線具有高折射率之材料,其折射率係爲1 · 6以上 ,最好係爲1 . 8以上,而2 . 0以上則更佳。形成這種透 -25- 1225227 五、發明說明(24 ) 明薄膜之具體材料包含銦,欽(Titan),鉻(Zirconium) ,祕(Bismuth),錫,鉢(Zinc),銻(Anti-mony),鉬( Tantalum),鈽(Cerium),銳(Neodymium),鑭(Lanthanum) ,钍(Thorium),鎂(Magnesium),鎵(Gallium)等之氧化物 ,或這些氧化物之混合物和硫化鋅等。 這些氧化物或硫化物,在金屬,氧原子或硫原子之 化學計量(Stoichiometry)上之組成方面即使有偏差, 只要是在不大幅改變光學特性之範圍內的話即無礙。其 中也有氧化鋅,氧化鈦,氧化銦和氧化銦與氧化錫之混 合物(I TO )除了具有良好之透明性,折射率外,另加上 成膜速度快,與金屬薄膜層之密著性良好等,因此也能 良好地被採用。 高折射率透明薄膜層(Dt)之厚度只要能依高分子膜( B)[稱爲透明基體]之光學特性,金屬薄膜之厚度,光學 特性,及透明薄膜層之折射率,藉光學設計加上實驗求 出的話雖無特別限定,但最好係5nm以上, 200nm以下,而10nm以上,lOOnm以下則更佳。另外, 高折射率透明薄膜第1層…第(n+1)層(η- 1)之厚度並 不一定需同一厚度,也可使用不同透明薄膜材料。 形成高折射率透明薄膜層(D t )之方法也能採用濺射 ,離子鑛敷,離子束助塗(Ion-Beam Assist),真空蒸 著;濕式塗佈等以往熟知之方法中之任一種方法。 爲了提高上述透明導電層(D)之耐環境性,也可在透 -26- 1225227 五、發明說明(25 ) Μ導電層之表面上,在不嚴重損及導電性,光學特性之 胃度下,設置有機物或無機物之任意保護層。另外,爲 高金屬薄膜層之耐環境性和與金屬薄膜層及高折射 $ @明薄膜層之密接性等,也可在金屬薄膜層和高折射 $透明薄膜層之間,在不損及導電性,光學特性之程度 τ ’形成任意之無機物層。作爲這些層之具體材料可包 括銅,鎳,鉻,金,白金,鋅,鉻,鈦,鎢,錫,鈀等 ’或這些材料兩種以上作成之合金。其厚度最好係爲0. 2nm〜2nm程度。 欲獲得所要之光學特性之透明導電層(D ),考量所要 2電磁波遮蔽能所需之導電性,亦即金屬薄膜材料厚度 ’藉使用高分子膜(B)及薄膜材料之光學常數(折射率, 消光係數)之向量法,使用導納(Admi t tance)圖之方法 等執行光學設計,以決定各層之薄膜材料及層數,膜厚 等。此際,考慮形成在透明導電層(D)上之鄰接層即可 。此係考慮因光對形成在高分子膜(B )上之透明導電層 之入射媒質係與空氣或真空等之折射率爲1之入射媒質 不同而會導致透射色(及透射率,反射色,反射率)產生 變化之故。換言之,在透明導電層(D )上形成功能性透 明層(A )之際若係經透明粘接層(C )進行的話則考慮透明 粘接層(C )之光學常數以行設計。另外,若直接在透明 導電層(D )上形成功能性透明層(A )時則考慮與透明導電 層(D)接鄰之材料之光學常數以行設計。 -27- 1225227 五、發明說明(26) 如上述,藉執行透明導電層(D )之設計,高折射率透 明薄膜層(Dt),從高分子膜(B)看最下層和最上層係比 其等之間的層薄,而金屬薄膜層(Dm ),從高分子膜(B ) 看最下層係比其它層薄,若接鄰層係折射率爲1.45〜1. 65,消光係數約爲〇,厚度爲1〇〜5 Ομιη之粘接材的話 ’發現透明積層體之反射未顯著地增加,亦即,因接.鄰 層之形成造成之界面反射之增加係在2%以下。 特別是,重複次數爲三次,亦即,由總計7層作成 之透明導電層,發現3層之金屬薄膜層(Dm)之正中間之 第2層若比其它層厚,且接鄰層係爲前述之粘接材時則 透明積層體之反射未顯著地增加。 再者,光學常數能藉橢圓偏光解析法(El 1 ipsome t ry ) 和阿貝(Abbe’s )折射計測定,另外,能一邊觀察光學特 性,一邊控制層數膜厚等而進行成膜。 藉上述之方法形成之透明導電層之原子組成能藉奧 格電子分光法(Auger Electron Spectroscopy) :AES ,感應結合電漿法(ICP),盧射福(Rutherford)後向散 亂法(RBS )等測定。另外,層構成及膜厚能藉奧格電子 分光之深度方向觀察,透射型電子顯微鏡執行之斷面觀 察等測定。 再者,膜厚係俟事先瞭解成膜條件和成膜速度之關 係後才進行成膜步驟和藉晶體振盪器等監視成膜中之膜 厚而予以控制。 -28- 1225227 五、發明說明(27 ) 除了使用上述透明導電性薄膜之方法外,也有將導 電性網作爲透明導電層使用之方法。導電性網之一例係 如下文述及之單層金屬網,但本發明之導電性網並不限 定於單層金屬網。 單層之金屬網一般係爲在高分子膜上形成銅網層者 。通常係在高分子膜上粘貼銅箔,然後加工使成爲網狀 〇 本發明使用之銅箔雖得以使用軋延銅,電場銅’但 金屬層最好使用多孔性者;其孔徑最好爲〇 · 5〜5 μπι,〇 . 5〜3μπι更佳,而0.5〜Ιμιη則更優。孔徑若大於前述之 孔徑的話則有妨礙濺射之虞,相反地若小於前述孔徑的 話則難於提高光透射率。另外,銅箔之氣孔性(P〇 r 〇 s i t y )最好係爲0 · 〇 1〜2 0 %之範圍,而0 · 0 2〜5 %則更佳。本 發明所謂之氣孔性,若設體積爲R,孔容積爲P時’係 指P / R所定義之値。例如,以水銀氣孔性測定對應體積 0 . 1 c c之銅箔之孔容積,係爲〇 . 〇 〇 1 c c的話則能稱氣孔 性係爲1 %。使用之銅箔也可施予各種表面處理。具體 的例係爲鍍鉻(chromed)處理,粗面化處理’酸洗’鍍 鋅•鉻處理等。 銅箔之厚度最好係爲3〜30μΐΏ,5〜20μηι較佳,而7 〜1 ΟμίΏ更佳。大於此厚度的話浸飩之時間長,相反地 ,小於此厚度時則會產生電磁波遮蔽能力降低之問題。 光透射部份之開口率最好係爲60%以上,95%以下’ 6 -29- 1225227 五、發明說明(28 ) 5%以上,90%以下較佳,而70%以上,85%以下則更佳。 開口部之形狀並無特別限定,可有正三角形,正四角形 ,正六角形,圓形,長方形,菱形等之形狀,最好係在 面內倂列。光透射部份之開口部之典型大小,一邊或者 直徑最好在5〜200μηι之範圍。而10〜150μηι則更佳。 此値若遇大時則會降低電磁波遮蔽能力,相反地若過小 時會對顯示器之影像有不良之影響。另外,未形成開口 部之金屬之寬度最好係爲5〜50μηι。亦即,節矩最好爲 1 0〜2 5 ΟμίΏ。若比此寬度窄時則加工會變爲極困難,相 反地若比此寬度寬時則對影像會有不好之影響。 具有光透射部份之金屬層之實質上之面電阻(Sheet Resistance)係指使用上述型樣之5倍大以上之電極, 上述型樣之重複循環單位之5倍以上之電極間隔之四端 子法測定之面電阻。例如,若具有開口部之形狀爲正方 形,一邊爲ΙΟΟμπι,寬度爲20μπι之金屬層規則地列倂 成之正方形的話則能將直徑爲1 mm之電極間隔1 mm排列 以執行測定。或者將形成型樣之膜加工成長方形,在其 長方向之兩端設置電極,以測定其電阻(R ),設長方向 之長度爲a,短方向之長度爲b,則能以Rxb/a求出實 質之面電阻。如此測定之値最好是0 . 0 1 Ω / □以下, 〇 · 5 Ω / □以下,而〇 · 〇 5 Ω / □以上,0 . 3 Ω / □以下則更 佳。若要獲得比前述値小之値時則膜厚會過大,且開口 部無法充份取得,相反地,若欲取得大於前述値之値時 -30- 1225227 五、發明說明(29 ) 則無法獲得充份之電磁波遮蔽能力。 將銀箔疊積於高分子膜之方法係使用透明之粘接劑 。粘接劑之種類有丙烯基系,氨基甲酸酯系,矽系,聚 酯系等,但粘接劑並無特別限制。兩液系及熱硬化型可 良好地使用。再者,最好係爲耐藥品性優之粘接劑。粘 接劑塗佈於高分子膜後才粘貼銀箔,也可將粘接劑粘貼 於銀箔。 形成光透射部份之方法能使用印刷法和光致抗蝕劑( Pho t 〇 Re s i s t )。印刷法一般係使用印刷抗蝕材料藉網 版印刷法將掩蔽(Mask)層形成型樣之方法。使用光致抗 蝕材料之方法係藉輥塗法(RqI 1 - Coat ing),旋轉塗佈法 (Spin-Coat ing),全面印刷法,描繪法等在金屬箔上粘 貼形成光致抗蝕材料,使用光掩蔽(Photo-mask)進行曝 光顯影以執行抗蝕劑之型樣化。完成抗蝕劑型樣化後藉 濕式浸蝕除去作爲開口部之金屬部份,得出具有所要開 口形狀和開口率之光透射部份之金屬網。 4 .透射特性 電磁波遮蔽體之透光部上之可視光線透射率,最好 係爲80〜85%。50〜80%則更佳。若未滿30%時亮度會過 度下降,致視認性不佳。另外,爲了獲得階調,透射率 須在85%以下,80%以下則更好。 另外,調光膜上之可視光線透射率最好係爲55〜90% ,60〜8 5%則更佳。若未滿55%時亮度過於降低,以致 -31- 1225227 五、發明說明(3〇) 視認性變壤。另外,爲獲得階調,透射率須在85%以下 ,而80%以下則更佳。 再1胃’本發明之可視光透射率(T v i s ),可視光線反 射率(Rvis)係依透射率及反射率之波長藉ns(R_31〇6) 計算。 5 ·色特性、色素 但是’顯示器用濾光器之透射色,若黃綠〜綠色成 份強時顯示器之階調會降低,另外色純度也會降低,顯 示白色時則帶有綠色。此點是因屬於黃綠〜綠色之550 nm前後之波長之光視感度爲最高所致。 多層薄膜若重視可視光線透射率,可視光線反射率 的話’一般透射色調會變不良。愈提高電磁波遮蔽能力 ’亦即導電性和近紅外線低減能力,金屬薄膜之總膜厚 則須愈厚。但是,金屬薄膜之總膜厚愈大,愈具有變成 綠色〜黃綠色之傾向。因此,使用於電漿顯示器之電磁 波遮蔽體其透射色被要求須爲中性灰色(Neutral Gray) 或藍灰色。這是,因綠色透射過強造成階調降低和相較 於紅色及綠色發光色,藍色發光弱,及比標準白色色溫 度高若干之白色較爲理想等之故。另外,電磁波遮蔽體 之透射特性,電漿顯示器,白色顯示之色度座標希極力 接近黑體軌跡。 使用多層薄膜於透明導電層(D )之情形’補正多層薄 膜之色調,使電磁波遮蔽體之透射色成爲中性灰色或藍 -32- 1225227 五、發明說明(31 ) 灰色係爲重要。補正色調上,只要使用在可視波長領域 上有吸收光之色素即可。例如,透明導電層(D)之透射 色有綠色成份時則使用紅色之色素以補正成灰色,若透 射色有黃色成份時則使用藍〜紫色之色素補正。 彩色電漿顯示器,以稀有氣體藉直流或交流放電產 生之真空紫外光激勵發光之(¥,〇(1』11)603等之紅色 (Red)發光螢光體,(Zn,Mn)2Si04等之綠色(Green)發光 螢光體,(Ba,Eu)MgAl1Q017:Eu等之藍色(Blue)發光螢 光體係形成在構成影素之顯示胞(Cell)上。螢光體除了 色純度外,另就對放射胞之塗佈性,殘光時間之短小度 ,發光效率,耐熱性等選定指標,實用化之螢光體大都 須改良其色純度。特別是紅色發光螢光體之發光光譜係 顯示自波長580nm至700nm程度範圍之多條發光高峰(P e ak ),較強之短波長側之發光高峰因係發出黃〜橙色之 光,故,發出之紅色光具有接近橙色之色純度不良之情 事之問題。稀有氣體若係使用氙(Xe)和氖(Ne)之混合氣 體之情形時Ne激發狀態之發光緩和所發出之橙色光亦 同樣產生色純度降低之情事。另有關綠色,藍色發光, 其高峰波長位置,發光之寬度係爲色純度降低之主要原 因。 色純度之高度,例如能在國際照明委員會(C I E )製定 分別表示色相和彩度之橫軸色度X,縱軸色度y之座標 上以藉RGB三色作頂點之三角形之寬度表示之色再現範 -33- 1225227 五、發明說明(32 ) 圍之寬度表示。自低度色純度到電漿顯示器之發光之色 再現範圍通常係比以NTSC(National Television system Committee國家電視系統委員會) 方式決定之:RGB三色之色度所表示之色再現範圍窄。 另外,除了顯示胞間之發射之滲出光外,各色之發 光含有涵蓋寬廣範圍之不必要之光,以致無法凸顯發出 之需要之光,不僅係造成色純度,而且係電漿顯示器之 階調降低之主要。再者,電漿顯示器,一般在有室內照 明等之外光存在之明亮時相較於暗時其階調會變壞。這 是因基板玻璃,螢光體等之反射外光,以致不必要之光 使必要之光無法凸顯所引起者。電漿顯示器板面之階調 在暗時係100〜200,在周圍照度爲ΙΟΟΙχ程度之明亮 時係爲1 0〜3 0,提高階調係爲課題。另外,階調低也 是窄化色再現範圍之主因。 爲提高階調,在顯示器前面有採用如中性密度 (Neutral Density)(ND)之濾光器那樣,降低視波長領 域整體之透射率,減少基板玻璃,螢光體之外光反射 等之透射之方法,但是可視光線透射率過於降低時亮度 •影像之鮮明度則會降低,另外,色純度未見有所改善 〇 本發明者發現提高彩色電漿顯示器之發光色之色純 度及階調,能藉減低成爲發光色之色純度及階調降低之 原因之不要發光及外光反射而達成。 -34- 1225227 五、發明說明(33 ) 另外,本發明者也發現藉使用色素不僅將電磁波遮 蔽體調色成中性灰或中性藍灰而且能減少成爲降低發光 色之色純度及階調之原因之不要發光及外光反射。特別 是,紅色發光接近於橙色者,尤爲顯著,發現藉減低屬 於其原因之波長5 80nm〜605nm之發光,能提高紅色發 光之色純度。 本發明之顯示器用濾光器,能藉使遮蔽體含有對波 長570nm〜6 0 5 nm範圍之光具有極大吸收之色素而低減 不要之發光及外光反射。此際必須藉顯示器用濾光器使 不致對屬於紅色之發光高峰之波長61 5nm〜640 nm之光線透射有明顯不良影響。 一般,色素具有寬廣之吸收範圍,具有所要之吸收 高峰之色素也有吸收自谷底起至良好波長之發光止之情 形。若有存在由Ne所造成之發光的話,因能執行橙色 光之低減,故能提昇RGB顯示胞發出之光的色純度。 另外,彩色電漿顯示器之綠發光係寬廣,其高峰位 置,例如係位在比以NTSC方式要求之綠色長若干之波 長側,亦即位在黃綠側。 本發明者等發現藉對波長570nm〜60 5 nm有極大吸收 之色素對短波長側之吸收,將綠色發光之長波長側予以 吸收截斷,尤有進者藉截斷不要之發光,及/或移動 高峰位置,能提高色純度。 在提高紅色發光,及綠色發光之色純度上,最好是 -35- 1225227 五、發明說明(34 ) 藉使用對波長5 7 0nm〜6 0 5nm具有極大吸收之色素’使 電磁波遮蔽體在波長5 70nm〜60 5 nm之範圍之最低透射 率對在必要之紅色發光之高峰位置上之透射率低於80% 〇 若藍色發光之色純度低時也是與紅色發光,綠色發 光相同地,使用減低不要之發光,另外,移動其之高峰 波長之位置,以吸收藍綠發光之色素即可。再者,藉色 素進行之吸收,能因低減外光射入螢光體,故能低減螢 光體上之外光反射。藉上述情事亦能提高色純度及階調 〇 使本發明之顯示器用濾光器含有色素之方法具有作 成(1 )至少有一種以上之色素與透明之樹脂混練之高分 子膜,(2 )至少有一種以上之色素分散,溶解於樹脂或 樹脂單體(Monomer)/有機系溶媒之濃稠液裡,藉澆鑄 (Casting)法製成之高分子膜,(3)至少有一種以上之色 素加於樹脂粘接劑和有機系溶媒作成塗料塗佈於透明之 基體上者’及(4)含有至少一種以上之色素之透明粘接 材之任何一種形態而使用之方法。 本發明所謂之含有當然係指含於基材或塗膜等之層 或粘接材內部之情事,但也意指塗佈於基材或層之表面 上之狀態。 色素只要係爲在可視領域上具有所要之吸收波長之 一般染料或顏料即可,其種類並無特別限定,例如有蒽 -36- 1225227 五、發明說明(3 5 ) 酿(anthraquinone)系,酞菁(phthalocyanine)系,甲 川(methine)系,甲亞胺(azomethine)系,D惡卩井(oxaziny 1)系,偶氮基(azo)系,苯乙嫌基(styryl)系,香豆 素(coumarinyl)系,P卜啉(p〇rphyrin)系,二苯并呋 喃(dibenzofuran)系,二酮代焦吡咯(diketo pyropy rrole)系’鹼性蕊香紅(rhodamine)系,黃原酸(xant hatic)系’卩比略亞甲基(pyrromethic)系等一般販售之 有機色素。其種類•濃度係依色素之吸收波長•吸收係 數,透明導電層之色調及電磁波遮蔽體所要之透射特性 •透射率以及分散之媒體或塗膜之種類•厚度而定,並 無特別限定。 透明導電層(D)若使用多層薄膜時除了電磁波遮蔽能 力外另具有近紅外線低減能力’但若需要更闻之近紅外 線減低能力,或透明導電層未具有近紅外線低減能力之 情形時,爲了賦與顯示器用濾光器近紅外線低減能力, 前述色素可倂用一種以上之近紅外線吸收色素。 近紅外線吸收色素只要是補塡透明導電層之近紅外 線之低減能力而將電漿顯示器發出之強度之近紅外線吸 收,使成充份實用之程度者則無特別之限定,濃度也無 限定。作爲近紅外線吸收色素,例如,可包括酞菁系化 合物,蒽醌系化合物,二硫醇(d i t h i ο 1 )系化合物,二 亞錢鐵(diiminium)系化合物。 電漿顯示板當表面之溫度高,特別是環境的溫度高 -37- 1225227 五、發明說明(36 ) 時電磁波遮蔽體之溫度也上昇,因此本發明使用之色素 良好的是具有耐熱性’例如,以8 0 °C分解等而不會顯 著地劣化之耐熱性。 另外,依色素之不同也有除缺少耐熱性外另缺少耐 光性。若因電漿顯示器之發光和外光之紫外線,可視光 線而造成劣化之問題時則重要的是藉使用含有紫外線吸 收劑之部材和不透射紫外線之部材以低減色素因紫外線 所引起之劣化,或使用不會因紫外線和可視光線造成顯 者劣化之色素。除了熱,光外,另對溫度和這些複合之 環境,也是要同樣處理。色素一旦劣化,電磁波遮蔽體 之透射特性即變掉。 實際上,電漿顯示板之表面溫度爲70 °C至80 °C —事 係明列於日本國專利公報特開平第8-220303號上。另 外,從電漿顯示板發出之光例如,記載爲300cd/m2(富 士通股份有限公司Image Site型錄AD25-000061C 0 c t · 1 9 9 7M ),設立體角爲2 7Γ,經被照射兩萬小時後得2 7Γ X20000X300 = 3800萬(1χ·小時),自此得知實用上須 具有數仟萬(1 X ·小時)程度之耐光性。 再者,爲了將色素分散於媒體或塗膜中對適宜之溶 媒之溶解性也是重要。也可將具有不同吸收波長之色素 兩種以上含於一種媒體或塗膜中。 本發明之電漿顯示器用濾光器具有不顯著傷害彩色 電漿顯示器之亮度•視認性之優良透射特性•透射率, -38- 1225227 五、發明說明(37) 能提高彩色電漿顯示器之發光色之色純度及階調。本發 明者等發現被含有的1種以上之色素中至少一種若係爲 四氮雜卟啉(tetraazaporphyrine)化合物時則具有與特 別要低減之570〜6 0 5 nm之不要之發光之波長相同或鄰 近波長之主要吸收波長,且,吸收波長比較窄,因此能 藉皈收適當之發光而減少亮度之損失,從而能得出具有 優良之透射特性透射率•發光色之色純度及提高階調之 能力之優良顯示器用濾光器。 本發明使用之四氮雜卟啉化合物能以前述式(1 )表示 。下面,係將式(1 )簡化成下述構造式(2 )-10- 1225227 V. Description of the invention (9) (where A1 to A8 respectively represent a hydrogen atom, a halogen atom, a nitro group, a cyano group, a hydroxyl group, a sulfonic acid group, an alkyl group having 1 to 20 carbon atoms, and halogenation Academies' Academic Oxygen 'Academies' Aminyl' Square Oxygen, Single Aminylamine Amine, One Aminylamine 'Aromatic Atomyl' Squaryl 'Heterosquare, Aminethio, or Arylthio, A1 And A2, A3 and A4, A5 and A6, A7 and A8 can also form a ring other than an aromatic ring through a linking group, respectively, where M represents M hydrogen atoms, a bivalent metal atom, and a trivalent replacement metal Atom, two quaternary substitution metal atoms, or hydroxyl (Oxy) metal atom). In addition, the present invention is advantageous in that it contains a near-infrared absorbing pigment having a maximum absorption of light in a wavelength range of 800 to 110 nm. In addition, the present invention is favorable in that the reflectance of visible light on the surface of the functional transparent layer (A) is 2% or less. In addition, the present invention is advantageous in that it has a visible light transmittance of 30 to 8 5%. In addition, the present invention is advantageous in that the transmittance in the wavelength range of 800 to 110 nm is extremely small at 20% or less. In addition, the present invention is good in that the total thickness of the polymer film of the entire filter is about 0.  Above 3 m m. In addition, the present invention is advantageous in that it has a polymer film having a thickness that can be contained in a pigment for heightening. In addition, the present invention is advantageous in forming an electrode electrically connected to the row of the transparent conductive layer (D). -11- 1225227 V. Description of the invention (1 o) In addition, it is good in the present invention that the electrode electrically connected to the transparent conductive layer (D) is continuously formed along the peripheral direction of the peripheral portion of the filter. In addition, the present invention is advantageous in that an electrode is formed on a partially exposed conductive portion. In addition, the present invention is advantageous in that the shape of the filter is rectangular, and electrodes are formed on the two peripheral edges facing each other. In addition, the present invention is advantageous in that an electrode system electrically connected to the row of the transparent conductive layer (D) is formed on the peripheral end surface of the filter. In addition, the present invention is good in forming a communication hole from the outermost surface to at least the transparent conductive layer (D) along the thickness direction of the filter, and within the communication hole, an electrical connection with the transparent conductive layer (D) is formed. Connected electrode. Further, the present invention is advantageous in that a conductive tape is interposed between the transparent conductive layer (D) and a layer adjacent thereto. In addition, the present invention is characterized by a display device including a display for displaying an image and a filter provided on the display surface of the display as the filter for the display. In addition, the present invention is characterized by including a step of pasting the above-mentioned filter for display via a transparent adhesive layer (C) on the display surface of the display of the display device, and attaching the ground conductor and the transparent conductive layer of the display device ( D) A method for manufacturing a display device in which the electrodes are electrically connected. In addition, the present invention is characterized by including a multilayer filter including a polymer film (B), -12-1225227 5. Description of the invention (彳 1) a transparent conductive layer (D), and a transparent adhesive layer (C) The transparent adhesive layer (C) is pasted on the display surface of the display device, and the functional transparent layer (A) having antireflection and / or anti-glare properties is disposed directly or via the second adhesive layer. The manufacturing method of the step of the laminated filter and the step of electrically connecting the ground conductor and the transparent conductive layer (D) of the display device. In addition, the present invention is characterized by including a step of providing an adhesive layer on a display surface of a display of a display device, including a polymer film (B), a transparent conductive layer (D), and having antireflection properties and / or Method for manufacturing a glare functional transparent layer (A) laminated filter through the aforementioned bonding layer, and a method for manufacturing a display device in which the ground conductor of the display device and the transparent conductive layer (D) are electrically connected . In addition, the present invention is characterized in that it includes a step of providing an adhesive layer on a display surface of a display of a display device, and a laminated filter including a polymer film (B) and a transparent conductive layer (D) is bonded as described above. The step of layer bonding, the step of disposing a functional transparent layer having antireflection and / or anti-glare properties on the multilayer filter directly or via a second bonding layer, and the ground conductor and the transparent of the display device A manufacturing method of a display device in which the conductive layer (D) is electrically connected. -13- 1225227 V. Description of the invention (12) (Simplified description of the drawings) The present invention, the above-mentioned objects and other objects' features and advantages will be made even more detailed by the following detailed description with reference to the accompanying drawings. .  FIG. 1 is a cross-sectional view showing an example of the polymer film (B) / transparent conductive layer (D) of the present invention. Fig. 2 is a plan view showing an example of an electromagnetic wave shielding body of the present invention. Fig. 3 is a cross-sectional view showing an example of an electromagnetic wave shielding body and its installation state (Embodiment 1) of the present invention. Fig. 4 is a sectional view showing an example of an electromagnetic wave shielding body and its installation state (Embodiment 2) of the present invention. Fig. 5 is a plan view showing an example of an electromagnetic wave shielding body of the present invention. Fig. 6 is a cross-sectional view showing an example of the electromagnetic wave shielding body and its installation state (Embodiment 3) of the present invention. Fig. 7 is a cross-sectional view showing an example of an electromagnetic wave shielding body and its installation state (Embodiment 4) according to the present invention. Fig. 8 is an X-y chromaticity diagram showing the color reproduction range before and after the electromagnetic shielding body is formed. Fig. 9 is a cross-sectional view showing an example of the light control film of the present invention and its installation state (Embodiment 5). Fig. 10 is a cross-sectional view showing an example of the light control film of the present invention and its installation state (Embodiment 6). -14- 1225227 V. Description of the invention (13) Figure 11 is an X-y chromaticity diagram showing the color reproduction range before and after the formation of the light control film. Fig. 12 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 13 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 14 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 15 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 16 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 17 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 18 is a sectional view showing the structure of the transparent polymer film (B) 23 showing the electromagnetic wave shielding function shown in Fig. 16. Fig. 19 is a sectional view showing the structure of a transparent polymer film (B) 26 showing the electromagnetic wave shielding function shown in Fig. 17. Fig. 20 is a plan view of the display filter shown in Fig. 16 or 17. Fig. 21 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 22 is a sectional view showing an example of the structure of a filter for a display according to the present invention. Fig. 23 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 24 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 25 is a sectional view showing an example of the configuration of a display filter according to the present invention. Fig. 26 is a plan view of the display filter shown in Figs. 21 to 25. Figs. FIG. 27 shows an example of a metal pattern. (Best Mode for Carrying Out the Invention) A preferred embodiment of a filter for a display, a display device, and a manufacturing method thereof according to the present invention will be described below with reference to the drawings. The display filter according to the present invention operates as a light-adjusting film having a filter characteristic that corrects the visible spectrum of both sides of the display by containing a pigment having a maximum absorption of light in a wavelength range of 570 to 60 5 nm. In addition, the filter for display related to the present invention has a surface resistance of 0. The transparent conductive layer of 01 to 30 Ω / □ operates as an electromagnetic wave shielding body having a filter characteristic that blocks electromagnetic waves emitted from the display surface of the display. In addition, the filter for a display according to the present invention contains a near-infrared absorbing pigment having a maximum absorption of light in a wavelength range of 800 to 100 nm as a near-infrared -16-1225227 that blocks the light emitted from the display surface of the display. V. Description of the invention (15) The characteristics of the line filter are near-infrared filters. By directly attaching a display filter with these functions to the display surface of a plasma display, etc., it can achieve low cost, light weight and thinness, and improve the protection of the board surface, workability when abnormality occurs, and productivity. . The electromagnetic wave shielding body according to the present invention contains at least a main surface formed on one side of the polymer film (B), and the surface resistance is at least 0. 〇1 ~ 30Ω / Π transparent conductive layer (D), and a transparent adhesive layer (C) formed on the main surface of the other side of the polymer film (B). The transparent conductive layer (D) has another Conducting portion, and a functional transparent layer (A) formed directly or via a transparent adhesive layer. In addition, the electromagnetic wave shielding body according to the present invention contains at least a main surface formed on one side of the polymer film (B), and the surface resistance is at least 0. 〇1 ~ 30 Ω / □ transparent conductive layer (D), and a functional transparent layer (A) formed on the main surface of the other side of the polymer film (B), and on the transparent conductive layer (D) A conductive adhesive layer and a transparent adhesive layer (C) are formed. In addition, the electromagnetic wave shielding body of the present invention has at least a polymer film (B) formed on a main surface of one side of the polymer film (B), and the sheet resistance is at least 0. A transparent conductive layer (D) of 01 to 30 Ω / □, a transparent adhesive layer (C) ', and a functional transparent layer (A) formed on the main surface of the other side of the polymer film (B). In addition, the light-adjusting film according to the present invention has at least a polymer film (B), and is formed on one main surface of the polymer film (B) and has a functional transparent layer having antireflection and / or antiglare properties ( A), a transparent adhesive layer (c) formed on the main surface of the other side of the polymer film-17-1225227 5. Description of the invention (16) (B), and containing pigment, the visible light transmittance is 5 5 ~ 90%. 1. Polymer film (B) The polymer film (B) is used as a substrate for a filter, for example, a substrate for forming a transparent conductive layer (B), and the filter for a display of the present invention is directly formed on On the surface of the display, a transparent polymer is used as the polymer film (B), as long as it is transparent in the visible wavelength range. Specifically, it may include polyethylene terephthalate, polyether sulfone, polystyrene, polyethylene naphthalate, polylate, Polyether eth erketone, polycarbonate (polycarbonate), polyethylene (polyolene), polypropylene (polypropylene), nylon-6 (Nylon 6) and other polyamines (polyamide) ), Fiber resins such as polyimide, triethyl cellulose, etc., polyurethane, polytetrafluoroethy lene, and fluororesin 'polyvinyl chloride ( p〇iyChl〇rinated vinyl) # of the ethylene-based compound 'polyacryl acid, polyacryl ester, polyacrylonitrile (polyacrylonitrile), acrylic compound Additive polymer 'polymethacryl, polyisomethacryl, polyvinylidene chloride (p〇iychlórina -18-1225227) V. Invention description (17) ted vinylidene) Ethylene vinylene compounds, fluorinated vinylidene / trif luoroethylene copolymers, ethylene / vinyl acetate (acetate) copolymers, such as ethylene compounds or fluorine compounds, polyethers, such as polyethylene oxide, epoxy resins, polyvinyl alcohol, polyvinyl alcohol, etc. butyral) and the like, but are not limited to these. The polymer film is usually 10 to 250 μm thick. If it is too thin, it is not easy to form a filter directly on the display surface, and the flexibility is also limited. Therefore, the thickness of the polymer film (B) is preferably 50 μm or more, and more preferably 75 μm or more. In addition, when the thickness exceeds 250 µm or more, the flexibility is too insufficient, and it is not suitable for rolling the film into a roll. In addition, as in the case of the present invention, a polymer film having a thickness of about 100 μm is widely used in a field requiring high transparency. The polymer film used in the present invention has flexibility and can be continuously formed by a roll-to-roll method. Therefore, the polymer film has high efficiency, and can also produce a long, large-area transparent laminated body. Moreover, the film-shaped filter can be easily formed directly on the display surface by a 1 am inate method. In addition, a filter using a polymer film directly adhered to the surface of the display as a substrate can prevent the glass from scattering when the substrate glass of the display is broken, which is ideal. In the present invention, the surface of the polymer film (B) can also be immersed by sputtering, corona treatment, flame treatment, ultraviolet irradiation, electron irradiation, etc.-19-1225227 V. Description of the invention (18) Etching treatment and The undercoat treatment improves the adhesion of the transparent conductive layer (D) formed on the polymer film (B) to the polymer film (B) in advance. In addition, an inorganic material layer such as any metal may be formed between the polymer film (B) and the transparent conductive layer (D). If necessary, solvent cleaning and ultrasonic cleaning may be applied before the transparent conductive film is formed. Protected against dust. In order to improve the scratch resistance of the transparent laminated body, a hard coat layer (F) may be formed on the main surface of at least one side of the polymer film (B). 2 Hard coating (F) The hard coating film as the hard coating (F) may include acrylic resin, silicon resin, melamine resin, urethane resin, alkyd ( Alky d) resins, thermosetting resins and photo-curing resins such as fluorine-based resins, but the types and formation methods are not particularly limited. The thickness of these films is about 1 to 100 μm. The hard coat layer (F) can contain one or more kinds of pigments described later. 3 · Transparent conductive layer (D) The electromagnetic wave shielding system of the present invention forms a transparent conductive layer (D) on the main surface of one side of the polymer film (B). The transparent conductive layer (D) of the present invention is a transparent conductive film made of a single layer or a multilayer film. In addition, in the present invention, the substance of the transparent conductive layer (D) formed on the main surface of the polymer film (B) is referred to as a transparent laminated body (Η). The single-layer transparent conductive film includes the aforementioned conductive metal meshes such as the metal mesh and the conductive grid-like pattern film, and transparent conductive films such as metal thin films and oxide semiconductor thin films. -20- 1225227 V. Description of the invention (19) The multilayer transparent conductive film contains a multilayer film formed by stacking a metal thin film and a transparent film with a high refractive index. A multilayer film made by stacking a metal film and a high-refractive-index film by virtue of the inherent conductivity of metals such as silver and its near-infrared reflection characteristics generated by free electrons, and the high-refractive-index transparent film is suitable for metals in a certain wavelength range. The prevention of the generated reflection has the characteristics of conductivity, near-infrared ray reduction ability, and visible light transmittance. In order to obtain an electromagnetic wave shielding capability and a near-infrared low-reduction display filter, a multilayer film is formed by stacking a metal film having a high conductivity for electromagnetic wave absorption and a reflective interface for electromagnetic wave reflection and a high refractive index transparent film Department is the most ideal. According to the regulations of VCCI, the Class A for office use is less than 50dBpV / m, and the Cl as s B for life use is less than 40dBuV / m. However, the intensity of the radiated electric field of the plasma display is within a frequency band of 20 to 90 MHz. A diagonal 20-inch type is greater than 40 dBpV / m, and a diagonal 40-inch type is greater than 50 d ΒμV / m. Therefore, the untreated system cannot be used in the home. The intensity of the radiated electric field of the plasma display increases with the size of the display surface and the larger the power consumption. The electromagnetic wave shielding material with a high shielding effect must be used. The results of the intensive review by the inventors and others, in order to have a high visible light transmittance In addition to the low visible light reflectivity, and the necessary electromagnetic wave shielding ability on the plasma display, it was found that the transparent conductive layer (D) must have a low -2 1-1225227. 5. Description of the invention (2) The electrical conductivity of the resistance, also That is, the area resistance is preferably 0.  〇 1 ~ 30 Ω / □, and 0. 1 ~ 15Ω / □ is better, 0. 1 ~ 5Ω / □ is more preferable. The visible light transmittance and visible light reflectance of the present invention are calculated in accordance with JIS (R-3106) self-transmittance and reflectance dependence on wavelength. In addition, the present inventors have discovered that in order to block the strong near-infrared light emitted by the plasma display to a level that does not cause practical problems, it is necessary to use a display filter in the near-infrared wavelength range of 8 0 to 1 1 0 The transmittance of light at 0nm is made to be less than 20%. In order to meet this requirement, the requirements of reducing the number of components and the limit of near-infrared absorption using pigments, the transparent conductive layer itself must have near-infrared reducing properties. The reduction of the near-infrared rays by the transparent conductive layer can be achieved by using the reflection of the free electrons of the metal. When the metal thin film layer is thick, the visible light transmittance becomes low, and when it is thin, the reflection of near-infrared rays becomes weak. However, if the laminated structure of a high-refractive-index transparent thin film layer sandwiched with a metal thin film layer having a certain thickness is overlapped for more than one stage, the visible light transmittance will be increased, and the thickness of the overall metal thin film can be increased. In addition, by controlling the number of layers and / or the thickness of each layer, the visible light transmittance, visible light reflectance, near-infrared transmittance, transmission color, and reflection color can be changed within a certain range. In general, if the reflectance of visible light is high, the reflection surface of a lighting device or the like becomes larger, which prevents reflection on the surface of the display portion, thereby reducing visibility and tone. The "reflective color" is preferably an inconspicuous color such as white, blue, or purple. From these matters, the transparent conductive layer -22-1225227 V. Description of the invention (21) It is best to be a multilayer buildup that is easy to design and control optically. The electromagnetic wave shielding body of the present invention is preferably a transparent laminated body (H) using a transparent conductive layer (D) in which a multilayer thin film is formed on the main surface of one side of the polymer film (B). The good transparent conductive layer (D) of the present invention is on the main surface of one side of the polymer film (B), in the order of high refractive index transparent thin film layer (D t), metal thin film layer (Dm), and (Dt ) / (Dm) is a repeating cycle unit, which is repeatedly stacked 2 to 4 times, and then is formed by laminating at least one high refractive index transparent thin film layer (Dt) thereon, and the surface resistance of the transparent conductive layer The characteristic is 0. 1 ~ 5Ω / □ It has the properties of low resistance, excellent near-infrared ray reduction ability, transparency, and visible light reflectance required for excellent electromagnetic wave shielding ability. Furthermore, in the present invention, unless otherwise specified, a multilayer film refers to a transparent conductive film of a multilayer laminated structure in which a high-refractive-index transparent thin-film layer is sandwiched by a metal thin-film layer and is laminated for more than one stage. In the transparent conductive layer of the present invention, the laminated layer is preferably repeated 2 to 4 times. That is, the transparent laminated system of the present invention in which a transparent conductive layer is laminated on the main surface of the polymer film (B) has (B) / (Dt) / (Dm) / (Dt) / (Dm) / (Dt) , Or (B) / (Dt) / (Dm) / (Dt) / (Dm) / (Dt) / (Dm) / (Dt), or (B) / (Dt) / (Dm) / (Dt) / (Dm) / (Dt) / (Dm) / (Dt) / (Dm) / (Dt). If the number of repeated laminations is 5 or more, the productivity will be increased due to the limitation of the production equipment. In addition, there is a tendency that the transmittance of visible light decreases and the reflectance of visible light increases. In addition, if the number of times is repeated, it is difficult to make it with sufficient low resistance at the same time. Nearly -23-1225227 V. Description of the invention (22) Infrared light reduction ability, visible light reflectance. Furthermore, the multilayer film with the number of repeated layers of 2 to 4 times, the present inventors found that in order to simultaneously reduce the near-infrared ray reduction ability, visible light transmittance, and visible light reflectance to make good characteristics suitable for plasma display, its surface resistance must be 0.  1 to 5 Ω / □. In addition, it is presumed that the electromagnetic waves emitted from the plasma display will decrease. In this case, it is estimated that even if the surface resistance of the electromagnetic wave shielding body is 5 to 15 Ω / □, sufficient electromagnetic wave blocking characteristics can be obtained. In addition, it is speculated that the electromagnetic waves emitted by the plasma display will be further reduced. In this case, it is presumed that even if the surface resistance of the electromagnetic wave shielding body is 15 to 30 Ω / □, sufficient electromagnetic wave blocking characteristics can be obtained. On the other hand, from a viewpoint different from the intensity of radiated electromagnetic waves, in order to pursue a larger and thinner display surface of the plasma display, it is estimated that the surface resistance of the electromagnetic wave shielding body must be 0.  01 to 1 Ω / □. The material of the metal thin film layer (Dm), silver is an ideal material because of its excellent electrical conductivity, infrared reflectivity, and visible light transmission after multilayer lamination. However, silver is not chemically or physically stable. Good, it will be degraded by the pollution of the environment, such as water vapor, heat, light, etc., but it can be used well in the addition of gold 'platinum', palladium, copper, indium, thallium, etc. More than one alloy of environmentally stable metals, and these environmentally stable metals can also be used well. In particular, gold and palladium have excellent environmental resistance 'optical characteristics and are ideal metals. -24- 1225227 V. Description of the invention (23) There is no particular limitation on the silver content in silver-containing alloys, but it is not intended to cause large changes in the electrical conductivity and optical properties of the silver thin film, and its content should be above 50% by weight , 100% by weight or less. However, if other metals are added to silver, its excellent electrical conductivity and optical properties will be impaired. Therefore, it is possible to have at least one layer of silver without using an alloy when there are most metal thin film layers. An alloy is used for the layer and / or the outermost layer. The thickness of the metal thin film layer (Dm) is determined by optical design and experiments based on conductivity and optical characteristics. Although there is no particular limitation as long as it has the characteristics required for a transparent conductive layer, it is considered in terms of conductivity and other aspects. Non-island structure must be continuous, and it is 4nni or more. In addition, if the metal thin film layer is too thick, transparency may be a problem. Therefore, the thickness does not exceed 30 nm. If there are many metal thin film layers, the thickness of each layer does not need to be the same, and it may not be all silver or an alloy containing the same silver. The method for forming the metal thin film layer (Dm) can be any one of conventionally known methods such as sputtering, Ion-Plating, vacuum evaporation, and electroplating. The transparent conductive film forming a high-refractive-index transparent thin film layer (Dt) is not particularly limited as long as it has transparency in the visible field and prevents light reflection in the visible field of the metal thin film layer. For materials with a high refractive index, the refractive index is 1.6 or more, preferably 1.  8 or more, and 2.  Above 0 is better. Forming this kind of transparent -25-1225227 V. Description of the invention (24) The specific materials of the thin film include indium, Titan, Chromium (Zirconium), Bismuth, tin, Zinc, Anti-mony ), Oxides of Tantalum, Cerium, Neodymium, Lanthanum, Thorium, Magnesium, Gallium, etc., or mixtures of these oxides and zinc sulfide Wait. These oxides or sulfides have no difference in the composition of the stoichiometry of the metal, oxygen atom, or sulfur atom, so long as they do not significantly change the optical characteristics. Among them are zinc oxide, titanium oxide, indium oxide and a mixture of indium oxide and tin oxide (I TO). In addition to good transparency and refractive index, it also has a fast film formation speed and good adhesion to the metal thin film layer. Etc., so it can be used well. The thickness of the high-refractive-index transparent thin-film layer (Dt) is based on the optical characteristics of the polymer film (B) [referred to as a transparent substrate], the thickness of the metal thin-film, the optical characteristics, and the refractive index of the transparent thin-film layer. Although it is not limited in particular, it is preferably 5 nm or more and 200 nm or less, and more preferably 10 nm or more and 100 nm or less. In addition, the thickness of the first layer of the high-refractive-index transparent film (the (n + 1) th layer (η-1)) does not necessarily need to be the same thickness, and different transparent film materials may also be used. The method of forming a high-refractive-index transparent thin film layer (D t) can also use any of the methods known in the past, such as sputtering, ion ore coating, ion beam assist coating (Ion-Beam Assist), vacuum evaporation, and wet coating. a way. In order to improve the environmental resistance of the above-mentioned transparent conductive layer (D), it can also be on the surface of the transparent conductive layer (26) 1225227 V. Description of the invention (25) M, without seriously impairing the conductivity and optical characteristics. , Set any protective layer of organic or inorganic matter. In addition, it has the environmental resistance of the high metal thin film layer and the adhesion with the metal thin film layer and the high refractive film layer. It can also be used between the metal thin film layer and the high refractive film layer without compromising conductivity. The degree τ ′ of the optical properties and optical characteristics forms an arbitrary inorganic material layer. Specific materials for these layers include copper, nickel, chromium, gold, platinum, zinc, chromium, titanium, tungsten, tin, palladium, or the like, or alloys of two or more of these materials. Its thickness is preferably 0.  2nm ~ 2nm. To obtain the transparent conductive layer (D) with the desired optical characteristics, consider the conductivity required for the shielding energy of 2 electromagnetic waves, that is, the thickness of the metal thin film material '. By using the polymer film (B) and the optical constant (refractive index) , Extinction coefficient) vector method, the use of admittance (Admittance) map method, etc. to perform optical design to determine the film material and number of layers, film thickness and so on. In this case, it is sufficient to consider an adjacent layer formed on the transparent conductive layer (D). This is considered to cause transmission color (and transmittance, reflection color, etc.) due to the difference between the incident medium of light to the transparent conductive layer formed on the polymer film (B) and the incident medium with a refractive index of 1 such as air or vacuum. Reflectivity). In other words, when the functional transparent layer (A) is formed on the transparent conductive layer (D), if it is performed through the transparent adhesive layer (C), the optical constant of the transparent adhesive layer (C) is taken into consideration to design. In addition, if the functional transparent layer (A) is directly formed on the transparent conductive layer (D), the optical constant of the material adjacent to the transparent conductive layer (D) is taken into consideration for design. -27- 1225227 V. Description of the invention (26) As mentioned above, by implementing the design of the transparent conductive layer (D), the high refractive index transparent thin film layer (Dt), the ratio of the lowermost layer to the uppermost layer is seen from the polymer film (B). The layers between them are thin, and the metal thin film layer (Dm), from the polymer film (B), the lower layer is thinner than the other layers, if the adjacent layer has a refractive index of 1. 45 ~ 1.  65, the extinction coefficient is about 0, the thickness of the adhesive material of 10 ~ 5 Ομιη ’found that the reflection of the transparent laminated body did not significantly increase, that is, due to the connection. The increase in interface reflection caused by the formation of adjacent layers is below 2%. In particular, the number of repetitions is three times, that is, a transparent conductive layer made of a total of seven layers, and it is found that the second layer in the middle of the three metal thin film layers (Dm) is thicker than the other layers, and the adjacent layer is In the case of the aforementioned bonding material, the reflection of the transparent laminate does not increase significantly. In addition, the optical constant can be measured by an elliptic polarization analysis method (El 1 ipsome try) and an Abbe's refractometer, and the film can be formed while controlling the number of layers and the thickness of the film while observing the optical characteristics. The atomic composition of the transparent conductive layer formed by the above method can be obtained by Auger Electron Spectroscopy: AES, Inductively Coupled Plasma Method (ICP), Rutherford Backward Scattering Method (RBS) And so on. In addition, the layer composition and film thickness can be measured by depth observation using Auger electron spectrometry, and cross-section observation by a transmission electron microscope. In addition, the film thickness is determined by understanding the relationship between the film formation conditions and the film formation speed in advance, and then performing the film formation step and controlling the film thickness in the film formation by a crystal oscillator or the like. -28- 1225227 V. Description of the invention (27) In addition to the method of using the above-mentioned transparent conductive film, there are also methods of using a conductive mesh as a transparent conductive layer. An example of the conductive mesh is a single-layer metal mesh as described below, but the conductive mesh of the present invention is not limited to a single-layer metal mesh. A single-layer metal mesh is generally a copper mesh layer formed on a polymer film. Generally, a copper foil is pasted on a polymer film, and then processed to form a network. Although the copper foil used in the present invention can use rolled copper and electric field copper, it is best to use a porous metal layer; its pore diameter is preferably 0. · 5 ~ 5 μπι, 〇.  5 ~ 3μπι is better, while 0. 5 ~ Ιμιη is even better. If the pore diameter is larger than the aforementioned pore diameter, sputtering may be hindered, and if it is smaller than the aforementioned pore diameter, it is difficult to improve the light transmittance. In addition, the porosity of the copper foil (P0 r 0 s i t y) is preferably in the range of 0 · 〇 1 to 20%, and more preferably 0 · 0 2 to 5%. The so-called porosity of the present invention means that if the volume is R and the pore volume is P, it means "値" defined by P / R. For example, the corresponding volume 0 is determined by mercury porosity.  The pore volume of the copper foil of 1 c c is 0.  〇 〇 1 c c can be said that the porosity is 1%. The copper foil used can also be subjected to various surface treatments. Specific examples are a chromed treatment, a roughening treatment, and an acid pickling treatment. The thickness of the copper foil is preferably 3 to 30 μΐΏ, 5 to 20 μηι is more preferable, and 7 to 10 μΏ is more preferable. If it is larger than this thickness, the immersion time will be longer. Conversely, if it is smaller than this thickness, the problem of electromagnetic wave shielding ability will be reduced. The aperture ratio of the light transmitting part is preferably 60% or more and 95% or less. 6 -29-1225227 V. Description of the invention (28) 5% or more, preferably 90% or less, and 70% or more, 85% or less Better. The shape of the opening is not particularly limited, and it may have a shape of regular triangle, regular quadrangle, regular hexagon, circle, rectangle, rhombus, etc., and it is preferably tied in-plane. The typical size of the opening of the light transmitting portion, preferably one side or diameter is in the range of 5 to 200 μm. 10 ~ 150μηι is even better. If it is too large, it will reduce the electromagnetic wave shielding ability. On the contrary, if it is too small, it will have an adverse effect on the display image. The width of the metal in which the opening is not formed is preferably 5 to 50 µm. That is, the pitch moment is preferably 1 0 ~ 2 5 ΟμίΏ. If it is narrower than this width, processing will become extremely difficult. Conversely, if it is wider than this width, it will adversely affect the image. The substantial sheet resistance of a metal layer with a light transmitting portion refers to a four-terminal method using an electrode with a size 5 times larger than the above pattern, and an electrode spacing of 5 times or more the repeating cycle unit of the above pattern. Measure the surface resistance. For example, if the shape of the opening has a square shape, one side is 100 μm, and a metal layer with a width of 20 μm is regularly arranged in a square shape, the electrodes with a diameter of 1 mm can be arranged at an interval of 1 mm to perform the measurement. Alternatively, the formed film is processed into a rectangle, and electrodes are arranged at both ends in the long direction to measure the resistance (R). If the length in the long direction is a and the length in the short direction is b, then Rxb / a Find the real surface resistance. The value of this determination is preferably 0.  0 1 Ω / □ or less, 0. 5 Ω / □ or less, and 0 · 〇 5 Ω / □ or more, 0.  3 Ω / □ is more preferable. If you want to obtain a 値 smaller than the above 膜, the film thickness will be too large, and the opening cannot be obtained sufficiently. On the contrary, if you want to obtain a 大于 larger than the above 値 -30-30 1225227 V. Invention description (29) cannot be obtained Full electromagnetic wave shielding ability. A method for laminating silver foil on a polymer film is to use a transparent adhesive. The type of the adhesive is propylene-based, urethane-based, silicon-based, polyester-based, etc., but the adhesive is not particularly limited. Two-liquid system and thermosetting type can be used well. Furthermore, it is preferably an adhesive having excellent chemical resistance. The silver foil is applied after the adhesive is applied to the polymer film, and the adhesive may be applied to the silver foil. The method of forming the light transmitting portion can use a printing method and a photoresist (Pho t 〇 Re s s t). The printing method is generally a method in which a mask layer is patterned by using a printing resist material and a screen printing method. The method of using a photoresist material is to apply a photoresist material on a metal foil by a roll coating method (RqI 1-Coat ing), a spin coating method (spin-coat ing), a full-print method, or a drawing method. , Photo-mask is used for exposure and development to perform patterning of the resist. After the resist patterning is completed, the metal portion serving as the opening portion is removed by wet etching to obtain a metal mesh having a light transmitting portion having a desired opening shape and aperture ratio. 4. Transmission characteristics The transmittance of visible light on the light-transmitting portion of the electromagnetic shielding body is preferably 80 to 85%. 50 ~ 80% is better. If it is less than 30%, the brightness will decrease excessively, resulting in poor visibility. In addition, in order to obtain the tone, the transmittance must be 85% or less, and more preferably 80% or less. In addition, the visible light transmittance on the dimming film is preferably 55 to 90%, and more preferably 60 to 8 5%. If it is less than 55%, the brightness will be too low, so that -31-1225227 V. Description of the invention (3〇) Visibility is soiled. In addition, in order to obtain the tone, the transmittance must be 85% or less, and 80% or less is better. According to the present invention, the visible light transmittance (T v i s) and visible light reflectance (Rvis) of the present invention are calculated according to the wavelength of transmittance and reflectance by ns (R_31〇6). 5 · Color characteristics and pigments However, if the transmission color of the filter for a display is strong, the tone of the display will decrease when the yellow-green to green components are strong, and the color purity will also decrease, and it will appear green when white is displayed. This is due to the highest visible sensitivity of light at wavelengths around 550 nm from yellow-green to green. If the multilayer film is focused on the transmittance of visible light, the transmittance of visible light is generally poor. The more the electromagnetic wave shielding ability is improved, that is, the conductivity and the near-infrared reduction ability, the greater the total film thickness of the metal thin film. However, the larger the total thickness of the metal thin film, the more it tends to turn green to yellow-green. Therefore, the transmission color of the electromagnetic wave shield used in the plasma display is required to be Neutral Gray or blue gray. This is because the transmission of green is too strong and the tone is lowered. Compared with red and green light emission colors, blue light emission is weak, and white which is slightly higher than the standard white color temperature is ideal. In addition, the transmission characteristics of the electromagnetic wave shielding body, the plasma display, and the chromaticity coordinates of the white display are extremely close to the black body locus. In the case of using a multi-layered film on the transparent conductive layer (D) ', the color tone of the multi-layered film is corrected so that the transmission color of the electromagnetic wave shielding body becomes neutral gray or blue -32-1225227 V. Description of the invention (31) The gray system is important. To correct the hue, it is sufficient to use a pigment that absorbs light in the visible wavelength range. For example, if the transmission color of the transparent conductive layer (D) has a green component, use a red pigment to correct it to gray, and if the transmission color has a yellow component, use a blue to purple pigment to correct it. Color plasma display, vacuum ultraviolet light generated by rare gas by direct current or alternating current excitation (¥, 〇 (1′11) 603) red (Red) light emitting phosphor, (Zn, Mn) 2Si04, etc. Green light-emitting phosphors, and (Ba, Eu) MgAl1Q017: Eu and other blue light-emitting phosphor systems are formed on the display cells (Cells) that make up the pixels. In addition to the color purity, In terms of coating properties of radiation cells, shortness of afterglow time, luminous efficiency, heat resistance and other selected indicators, most practical phosphors must improve their color purity. In particular, the emission spectrum of red light-emitting phosphors is displayed. There are multiple light emission peaks (P e ak) in the range of 580nm to 700nm. The light emission peaks on the stronger short wavelength side emit yellow to orange light. Therefore, the red light emitted has a color purity close to that of orange. The problem of the situation. If the rare gas is a mixture of xenon (Xe) and neon (Ne), the emission of orange light in the excited state of Ne will also reduce the purity of the orange light. Also related to green, blue Glow, its peak wave The position and width of light emission are the main reasons for the decrease in color purity. The height of color purity can be set on the coordinates of the horizontal axis chromaticity X and vertical axis chromaticity y, respectively, which are formulated by the International Lighting Commission (CIE) to indicate hue and chroma. The color reproduction range represented by the width of the triangle with the RGB three colors as the apex -33-1225227 V. The width of the invention description (32) range. The range of color reproduction from the low degree color purity to the light emission of the plasma display is usually ratio Determined by the NTSC (National Television System Committee) method: The color reproduction range represented by the chromaticity of the three RGB colors is narrow. In addition, the light emission of each color covers a wide range in addition to the exudation light that is displayed between cells. Unnecessary light, so that it cannot highlight the emitted light, not only causes color purity, but also mainly reduces the tone of the plasma display. Furthermore, the plasma display generally exists in the presence of light outside the room. When it is bright, its tone will be worse than when it is dark. This is because the substrate glass, phosphors, etc. reflect external light, so unnecessary light makes it necessary The light cannot highlight the cause. The tone of the plasma display panel is 100 ~ 200 in dark, and 10 ~ 30 in bright when the surrounding illumination is about 100 × χ. It is a problem to improve the tone. Lowering is also the main reason for narrowing the color reproduction range. In order to increase the tone, a filter such as Neutral Density (ND) is used in front of the display to reduce the overall transmittance in the visible wavelength range and reduce the substrate glass. , A method of transmission of light reflections other than phosphors, but when the visible light transmittance is too low, the brightness and sharpness of the image will decrease, and the color purity does not improve. The inventors found that the color plasma is improved. The color purity and gradation of the luminous color of the display can be achieved by reducing the emission of the color purity and gradation of the luminous color, and the reflection of external light. -34- 1225227 V. Description of the invention (33) In addition, the inventors also found that the use of pigments not only tints the electromagnetic wave shielding body into neutral gray or neutral blue gray, but also reduces the purity and tone of the reduced luminous color. The reason is not to emit light and reflect external light. In particular, those whose red luminescence is close to orange are particularly significant, and it has been found that reducing the luminescence at a wavelength of 5 80nm to 605nm, which is the cause, can improve the color purity of red luminescence. The filter for a display of the present invention can reduce unnecessary light emission and external light reflection if the shielding body contains a pigment that has a great absorption of light in the wavelength range of 570nm ~ 605nm. In this case, it is necessary to use a display filter to prevent the transmission of light with a wavelength of 61 5nm ~ 640 nm, which belongs to the red emission peak, from having a significant adverse effect. In general, pigments have a wide absorption range, and pigments with a desired absorption peak also absorb light from the bottom of the valley to a good wavelength. If there is light emission caused by Ne, since the reduction of orange light can be performed, the color purity of the light emitted by the RGB display cells can be improved. In addition, the color emission of the color plasma display is broad, and its peak position is, for example, on the wave length side longer than the green required by the NTSC method, that is, on the yellow-green side. The present inventors have discovered that the short wavelength side is absorbed by a pigment having a maximum absorption at a wavelength of 570 nm to 60 5 nm, and the long wavelength side of green light is absorbed and truncated. In particular, those who do not want to emit light by truncating and / or move The peak position can improve the color purity. In terms of improving the color purity of red light emission and green light emission, it is best to be -35-1225227. 5. Description of the invention (34) By using a pigment that has a great absorption to the wavelength 5 7nm ~ 6 0 5nm, the electromagnetic wave shielding body is at a wavelength 5 The minimum transmittance in the range of 70 nm to 60 5 nm is less than 80% at the peak position of the necessary red light emission. If the color purity of blue light emission is low, it is the same as red light emission and green light emission. Reduce unnecessary light emission, and move its peak wavelength to absorb blue-green light-emitting pigments. In addition, the absorption by the chromatic pigment can reduce the external light incident on the phosphor, so that the external light reflection on the phosphor can be reduced. The above-mentioned circumstances can also improve the color purity and tone. The method for making the display filter of the present invention contain a pigment has (1) a polymer film mixed with at least one or more pigments and a transparent resin, (2) at least More than one pigment is dispersed and dissolved in a thick liquid of resin or resin monomer (Monomer) / organic solvent. A polymer film made by the casting method. (3) At least one pigment is added. A method in which a resin adhesive and an organic solvent are used to form a coating on a transparent substrate, and (4) a transparent adhesive material containing at least one pigment is used. The term "contained" in the present invention means, of course, that the layer is contained in a substrate or a coating film or the inside of an adhesive material, but also means a state of being coated on the surface of the substrate or layer. As long as the pigment is a general dye or pigment having a desired absorption wavelength in the visible field, its type is not particularly limited. For example, there is anthracene-36-1225227. 5. Description of the invention (3 5) anthraquinone system, phthalate Phthalocyanine system, Methine system, Azomethine system, Doxaziny 1 system, Azo system, Styryl system, Coumarin (Coumarinyl) system, Porphyrin system, dibenzofuran system, diketo pyropy rrole system 'basic rhodamine system, xanthan acid ( xant hatic) is a commonly sold organic pigment such as 'pyrromethic'. Its type and concentration depend on the absorption wavelength and absorption coefficient of the pigment, the tint of the transparent conductive layer, and the required transmission characteristics of the electromagnetic wave shield. The transmittance and the type and thickness of the dispersed medium or coating film are not limited. The transparent conductive layer (D) has near-infrared ray reduction capability in addition to the electromagnetic wave shielding ability when using multilayer films. However, if a more near-infrared ray reduction capability is needed, or the transparent conductive layer does not have near-infrared reduction capability, Compared with the near-infrared ray reduction capability of display filters, the pigment can be absorbed by one or more near-infrared rays. The near-infrared absorbing pigment is not particularly limited, and the concentration is not limited as long as it absorbs the near-infrared ray emitted from the plasma display to reduce the near-infrared rays of the transparent conductive layer. Examples of the near-infrared absorbing pigment include a phthalocyanine-based compound, an anthraquinone-based compound, a dithiol (d i t h i ο 1) -based compound, and a diiminium-based compound. When the temperature of the surface of the plasma display panel is high, especially the temperature of the environment is high -37-1225227 V. Description of the invention (36) The temperature of the electromagnetic wave shielding body also rises, so the pigment used in the present invention has good heat resistance. , Heat resistance that does not degrade significantly at 80 ° C, etc. In addition, depending on the pigment, there is a lack of light resistance in addition to heat resistance. In the case of degradation caused by the light emission of the plasma display and the ultraviolet and visible light of the external light, it is important to reduce the degradation caused by ultraviolet rays by using materials containing ultraviolet absorbers and materials that do not transmit ultraviolet rays, or Use pigments that do not deteriorate significantly due to UV and visible light. In addition to heat and light, the same should be done for temperature and these composite environments. Once the pigment is degraded, the transmission characteristics of the electromagnetic wave shielding body are changed. In fact, the surface temperature of the plasma display panel is 70 ° C to 80 ° C-the event is listed in Japanese Patent Publication No. 8-220303. In addition, the light emitted from the plasma display board is described as, for example, 300cd / m2 (Fujitsu Co., Ltd. Image Site Catalog AD25-000061C 0 ct · 1 9 9 7M), the body angle is set to 2 7Γ, and it is irradiated with 20,000 After hours, we get 2 7Γ X20000X300 = 38 million (1 × · hour), and we know from this that it must have a light resistance of tens of thousands (1 X · hour) in practice. Furthermore, it is also important to dissolve the pigment in the medium or the coating film with respect to the solubility of a suitable solvent. Two or more pigments having different absorption wavelengths may be contained in one medium or coating film. The filter for a plasma display of the present invention has no significant damage to the brightness, visibility, and transmission characteristics of a color plasma display. -38-1225227 V. Description of the invention (37) It can improve the luminescence of a color plasma display. Color purity and tone. The present inventors have found that if at least one of the contained one or more pigments is a tetraazaporphyrine compound, it has a wavelength equal to or more than 570 to 60 nm, which is an unnecessary emission, which is particularly reduced. The main absorption wavelengths of adjacent wavelengths, and the absorption wavelengths are relatively narrow, so it can reduce the loss of brightness by collecting appropriate light emission, so that it can have excellent transmission characteristics, transmittance, color purity of luminous colors, and improve the tone Excellent display filter. The tetraazaporphyrin compound used in the present invention can be represented by the aforementioned formula (1). In the following, the formula (1) is simplified to the following structural formula (2)

(2) [式(2)中,Am & An係分別表示各自之氫原子,_原子 硝基’氰基’經基’氨基,殘基,磺酸基,碳數1〜 2〇之烷基,鹵化烷基,烷氧基,烷氧基烷氧基,芳氧 基,單烷基胺基,二烷基胺基,芳烷基,芳基,雜芳基 ’烷硫基,或芳硫基Am和An可分別各自經連結基形成 除芳香族環外之環,Μ係表示兩個氫原子,兩價之金屬 -39- 1225227 五、發明說明(38 ) 原子,三價之一個置換金屬原子,四價之兩個置換金屬 原子,或羥基金屬原子]。 下面將敘述式(1 )所示之四氮雜卟啉化合物之具體例 。式中A1〜A3之具體例係各自包括氫原子,氟,氯, 溴,碘等之鹵原子;硝基;氰基;羥基;胺基;羧基,· 磺酸基;甲基,乙基,正-丙基,異·丙基,正· 丁基, 異-丁基,第二丁基,第三-丁基,正-戊基(n-pentyl) ,2 -甲基-丁基,1-甲基-丁基,新戊基,1,2 -二甲基 丙基(1,2-dimethyl propyl),1,1-二甲基丙基,環戊 基,正己基1),4 -甲基丙基,3 -甲基丙基,2 -甲基丙 基,1-甲基丙基,3 ,3-二甲基丁基,2,3-二甲基丁基, 1,3-二甲基丁基,2,2·二甲基丁基,1,2-二甲基丁基, 1,1-二甲基丁基,3-乙基丁基,2-乙基丁基,丨_乙基丁 基,1,2,2-三甲基丁基,1,1,2-三甲基丁基,丨_2基-2 甲基丙基,環-己基,正庚基,2 -甲基己基,3 -甲基己 基,4 -甲基己基,5 -甲基己基,2 ,4-二甲基戊基,正辛 基,2-乙基己基,2,5-二甲基己基,2,5, 5-三甲基戊基 ,2,4-二甲基己基,2,2,4-三甲基戊基,正壬基,3,5, 5-三甲己基,正癸基(n-decyl),4-乙基辛基,4·乙基-4,5-二甲基己基,正十基’正十二基,1,3,5,7-三甲基 辛基,4-丁基辛基,6,6-二甲基辛基,正-三癸基,6-甲基-4-丁基辛基,正四癸基,正五癸基,3,5-二甲基 庚基,2,6-二甲基庚基,2,4-二甲基庚基,2,2, 5, 5-四 -40- 1225227 五、發明說明(39 ) 甲基己基’ 1 -環-戊基-2,2- 一甲基丙基’ 1 -環-己基-2, 2-二甲基丙基等之碳數1〜20直鏈,支鏈或環狀之烷基 , 氯甲基,二氯甲基,氟甲基,三氟甲基,五氟甲基 ’九氟丁基等之碳數1〜20之齒絡院基; 甲氧基,乙氧基,正丙氧基,異丙氧基,正丁氧基 ,異丁氧基,第二丁氧基,第三丁氧基,正戊氧基,異 戊氧基,新戊氧基,正己氧基,正十二氧基等之碳數1 〜2 0之烷氧基; 甲氧基乙氧基,乙氧基乙氧基,3-甲氧基丙氧基,3-(異丙氧基)丙氧基等之碳數2〜20之烷氧基烷氧基; 苯氧基,2 -甲基苯氧基,4 -甲基苯氧基,4-第三-丁 氧基,2 -甲基苯氧基,4-異丙基苯氧基等之碳數6〜20 之芳氧基; 甲基胺基,正丙基胺基,正丁基氨基,正己基胺基 等之碳數1〜20之單烷基胺基; 二甲基胺基,二乙基胺基,二-正丙基胺基,二·正 丁基胺基,N -甲基-N-環己基胺基等之碳數2〜20之二 烷基胺基; 苄基,硝基苄基,氰基苄基,羥基苄基,甲基苄基 ,二甲基苄基,三甲基苄基,二氯苄基,甲氧基苄基, 乙氧基苄基,三氟甲基苄基,萘基甲基,硝基萘甲基 ,氰基萘甲基,羥基萘甲基,甲基萘甲基,三氟甲基萘 -4 1- 1225227 五、發明說明(4〇) 甲基等之碳數7〜20之芳烷基; 苯基,硝基苯基,氰基苯基,羥基苯基,甲基苯基 ,二甲基苯基,三甲基苯基,二氯苯基,甲氧基苯基, 乙氧基苯基,三氟甲基苯基,N,N -二甲基氨基苯基,萘 基,硝基萘基,氰基萘基,羥基萘基,甲基萘基,三氟 甲基萘基等之碳數6〜20之烯丙基; 吡咯基,噻嗯基,呋喃基,噁唑基,異噁唑基,噁 二唑基,咪唑基,苯并噁唑基,苯并噻唑基,苯并咪 唑基,苯并呋喃基,吲哚基等之雜烯丙基; 甲硫基,乙硫基,正丙硫基,異丙硫基,正丁硫基 ,異丁硫基,第二丁硫基,第三丁硫基,正戊硫基’異 戊硫基,乙-甲基丁硫基,1 -甲基丁硫基,新戊硫基,1, 2-二甲基丙硫基,1,1-二甲基丙硫基等之碳數1〜20之 烷硫基; 苯硫基,4 -甲基苯硫基,2 -甲氧基苯硫基,4 -第三-丁基苯硫基等之碳數6〜20之芳硫基等。 A1和A2,A3和A4,A5和A6,A7和A8經連結基形成環 之例包括-CH2CH2CH2-、-CH2CH2CH(N02)CH2-, -CH2(CH3)CH2CH2-,·ΟΗ2(:Η((:1)(:Η2(:Η2-等。 Μ表示之兩價金屬之例包括銅(Cu),鋅(Ζη),鐵 (Fe),鈷(Co),鎳(Ni),釕(Ru),铑(Rh),鈀(Pd),鉑 (Pt),錳(Μη),汞(Hg),鎘(Cd),鋇(Ba),鈦(Ti),鈹 (Be),鈣(Ca)等。 -42- 1225227 五、發明說明(41 ) 一個置換之三價金屬之例包括Al-F,A1-C1,Al-Br ,Al-I,Ga-F,G a -C1,Ga-Br,Ga-I,In-F,In-Cl, In-Br, In-I , Tl-F, T1-Cl , Tl-Br, Tl-I , A1-C6H5, A1-C6H4(CH3),In-C6H5,In-C6H4(CH3),Mn(OH), Mn(〇C6H5),Mn[OSi(CH3)3],Fe-Cl,Ru-Cl 等。 兩個置換之四價金屬之例包括CrCl2,SiF2,SiCl2, SiBr2, Sil2, SnF2, SnCl2, SnBr2, ZrCl2, GeF2, GeCl2,GeBr2,Gel2,TiF2,T i C12,TiBr2,Si (0H)2, Sn(0H)2,Ge(0H)2,Zr(0H)2,Mn(0H)2,TiA2,CrA2,S i A2,SnA2,GeA2 [其中,A係表示烷基,苯基,萘基及 其衍生物],Si(0A’)2,Sn(0A’)2,Ge(0A,)2、Ti (0A’)2,C r(〇A’)2[其中,A’係表示烷基,苯基,萘基,三烷基甲 矽烷基二烷基烷氧基甲矽基及其衍生物],Si (SA”)2, Sn(SA”)2,Ge(SA”)2[其中,A”係表示烷基,苯基,萘 基及其衍生物]等。 氧金屬之例包括VO,MnO,TiO等。 最好係爲 Pd,Cu,Ru,P t,Ni,Co,Rh,Zn,VO,T iO,Si(Y)2,Ge(Y)2(其中Y係表示鹵原子,烷氧基, 芳氧基,醯氧基,經基,院基,芳基,院硫基,芳硫基 ’二院基甲砂院基氧,三院基錫氧或三院基鍺氧。更 良好的是係爲Cu,VO,Ni,Pd,Pt,Co。 本發明者等進一步發現式(1 )之氮雜卟啉化合物,例 如,若係爲四-第三丁基-四氮雜卟啉配位化合物(c〇mpl -43- 1225227 五、發明說明(42 ) e X )和四-新戊基-四氮雜卟啉配位化合物時則較容易製 造,對溶媒之溶解性,配位化合物安定,吸收特性優, 賦與第三-丁基和四-新戊基之結果,配位化合物具有立 體性,從而提高對溶媒之溶解性,使之容易含有色素, 藉此能得出優良之電磁波遮蔽體。 本發明之顯示器用濾光器,摻入前述色素之方法(1 ) 〜(4)可以在含有色素之高分子膜(B),含有色素之後述 之透明粘接層(C)或第2透明粘接層,含有色素之後述 之功能性透明層(A),含有色素之前述硬塗層(F)中任一 層以上之層上實施。含有色素之後述之功能性透明層(A ) 可爲含有色素且具有各種功能之膜者,可爲形成在高分 子膜上含有色素且具有各種功能之膜者,可爲形成在含 有色素之基材上具有各種功能之膜者之任一種情形皆可 〇 再者,也可將兩種以上具有不同吸收波長之色素含於 一個媒體或塗膜,另外也可具有兩個以上之色素層。 首先,說明將色素與樹脂混練,加熱成形之(1 )之方 法。 樹脂材料,若係作成塑膠板或高分子膜之情形時最 好係盡可能採用透明性高之材料,具體言之,可包括聚 對苯二甲酸乙二醇酯,聚醚碾,聚苯乙烯,聚萘酸乙二 醇酯’聚烯丙酸酯,聚醚酮醚,聚碳酸酯,聚乙烯,聚 丙烯,尼龍-6等之聚醯胺,聚亞胺,三乙醯基纖維素 -44- 1225227 五、發明說明(43 ) 等之纖維素樹脂,聚胺基甲酸酯,聚四氟乙烯等之氟系 樹脂,聚氯乙烯等之乙烯基化合物,聚丙烯酸,聚丙烯 酸酯,聚丙烯腈,乙烯基化合物之加聚物,聚甲基丙烯 酸,聚甲基丙烯酸酯,聚氯亞乙烯基等之亞乙烯基化合 物,氟化亞乙烯/三氟乙烯共聚合物,乙烯/醋酸乙 烯共聚合物等乙烯基化合物或氟化物之共聚合物,聚環 氧襦烷等之聚醚’環氧樹脂,聚乙烯醇,聚乙烯丁縮醛等 ,但不限定於這些樹脂。 有關製造方法,使用之色素依基體高分子,加工溫 度膜化條件等多少有差異,但通常,可包括(i)添加色 素於基體高分子粉體或小九(Pellet),以150〜350 °C 加熱,溶解後加工成形而製成塑膠板之方法,(i i )藉擠 壓機膜化之方法,(i i i )藉擠壓機製作中高輥筒,然後 在30〜120 °C下,以單軸或雙軸(定向)拉伸(biaxial orientation)2〜5倍以製作1〇〜200μηι厚之膜等。再 者,混練之際也可添加可塑劑等之通常樹脂成型用之添 加劑。色素之添加量係依色素之吸收係數,製作之高分 子成形體之厚度,目標之吸收強度,目標之透射特性, 透射率等而不同,通常,相對於基體高分子成形體之重 量係爲lppm〜20%。 (2 )之澆製方法,首先,將樹脂或樹脂單體溶解於有 機系溶媒以製成樹脂濃稠液,然後添加·溶解色素於樹 脂濃稠液內,視需要可再添加可塑劑,複合開始劑,氧 -45- 1225227 五、發明說明(44 ) 化防止劑,接著使之流入具有必要之面狀態之模具,和 滾筒,並進行溶劑揮發•乾燥或複合溶劑揮發·乾燥, 藉此,製成塑膠板,高分子膜。 通常係使用脂肪族酯系樹脂,丙烯酸系樹脂,三聚 氰胺樹脂,氨基甲酸酯系樹脂,芳香族酯系樹脂,聚碳 酸脂樹脂,脂肪族聚烯烴樹脂,芳香族聚烯烴樹脂,聚 乙烯樹脂,聚乙烯醇樹脂,聚乙烯系改質樹脂(PVB , EV A等)或這些樹脂之共聚合樹脂單體。溶媒係使用鹵系 ,醇系,酮系,酯系,脂肪族烴系,芳香族烴系,醚系 溶媒或這些之混合物系等。 色素之濃度係依色素之吸收係數,板或膜之厚度, 目標之吸收強度,目標之透射特性·透射率等而異,但 相對於樹脂單體之重量通常係爲 lppm〜20% 〇 另外,樹脂濃度,對塗料整體言,通常爲1〜90%。 塗料化後進行塗佈之方法(3 ),包含將色素溶解於粘 接劑樹脂及有機系溶媒以行塗料化之方法,將色素作成 微粉碎(50〜5 00nm)後分散於未著色之丙烯酸乳液(acryi emu 1 s i ο η )塗料以作成丙烯酸乳液系水性塗料之方法 〇 前者之方法,通常係使用脂肪族酯系樹脂,丙烯基 系樹脂,三聚氰胺樹脂,胺基甲酸酯樹脂,芳香族酯系 樹脂,聚碳酸酯樹脂,脂肪族聚烯烴樹脂,芳香族聚烯 烴樹脂,聚乙烯系樹脂,聚乙烯醇樹脂,聚乙烯改質樹 -46- 1225227 五、發明說明(45 ) 脂(PVB,EVA等)或這些樹脂之共聚合樹脂作爲粘接劑 樹脂。溶媒係使用鹵系,醇系,酮系,酯系,脂肪族烴 系,芳香族烴系,醚系溶媒,或這些之混合物系等。 色素之濃度係依色素之吸收係數,塗佈厚度,目標 之吸收強度,目標之可視光透射率等而異,但對粘接劑 樹脂之重量,通常爲0 . 1〜30%。 另外,粘接劑樹脂濃度對塗料整體言,通常爲1〜50%。 後者之丙烯酸乳液系水系塗料也與前述同樣將色素 微粉碎成50〜500ηιτι之微粒後分散於未著色之丙烯酸乳 液塗料而得出者。塗料中也可添加添加物以作爲氧化防 止劑等之通常塗料。 以上述之方法作成之塗料藉棒塗佈機(bar coater) ,刮板塗佈機(blade coater),旋轉塗佈機(spin coater),逆輕塗佈(revese roll coater),模塗佈機 (die coater),或噴霧(spray)等之以往眾所知悉之方 法塗佈於透明高分子膜,透明樹脂,透明玻璃等上以製 作含有色素之基材。 爲保護塗面設置保護層,也可粘貼電磁波遮蔽體之 其它構成部材於塗佈面上以保護塗佈面。 作爲含有色素之粘接材而使用之方法(4 ),係添加1 0 ppm〜3 0%於丙烯酸系粘接劑,聚矽氧系粘接劑,氨基甲 酸酯系粘接劑,聚乙烯醇縮丁醛粘接劑(PVB ),乙烯一 乙酸乙烯酯系粘接劑(EVA )等,聚乙烯醚,飽和無定形 -47- 1225227 五、發明說明(46 ) 聚酯,三聚氰胺樹脂等之薄片狀或液狀之粘接材或粘接 劑內使用。 再者,這些方法上,爲了提高含有色素之電磁波遮 蔽體之耐光性,也能作爲同時含有紫外線吸收劑和色素 。紫外線吸收劑之種類,濃度並無特別限定。 6 ·透明粘接層,導電性粘接層 本發明之粘貼(疊積)係經任意之透明枯接層爲之。 本發明之透明粘接層(C )等係由任意透明之接著劑或粘 接劑或粘接材作成之層。具體言之,丙烯酸系粘接劑, 聚矽氧系粘接劑,胺基甲酸酯系粘接劑,聚乙烯醇縮丁 醛粘接劑(PVB),乙烯一乙酸乙烯酯系接著劑(EVA)等, 聚乙烯醚,飽和無定形聚酯,三聚氰胺樹脂等。這時, 重要的是使用在屬於顯示器發出之光線之透射部之中心 部份之粘接材對可視光線必須充份透明。 導電性粘接層係爲用於使透明導電層(D)和顯示裝置 之接地部(接地導體)作電氣連接之粘接層,須爲導電性 ,但不必透明。電磁波遮蔽體,因透明導電層(D )須與 外部作電氣連接之故,透明粘接層不得明顯妨礙導電性 粘接層與外部作電氣之連接。亦即,透明導電層(D )上 必須有未形成透明粘接層之導通部。重要的是例如,透 明粘接層必須形成殘存在透明導電層(D)之周緣部,俾 餘留導通部。 使用於導電性粘接層之導電性粘接劑,導電性粘接 -48- 1225227 五、發明說明(47 ) 材係將丙烯系接著劑,矽系接著劑,胺基甲酸酯系接著 劑,聚乙烯醇縮丁醛接著劑(PVB ),乙烯一乙酸乙烯酯 系接著劑(EVA)等,聚乙烯醚,飽和無定形聚酯,三聚 氰胺樹脂等作爲基底劑,使碳和銅(Cu),鎳(Ni ),銀 (Ag),鐵(Fe)等之金屬粒子作爲導電性粒子分散於基底 劑內而形成者。若分散粒子之導電性低,且粒徑小又多 ,粒子群之接觸面積廣時則導電性接著劑,導電性粘接 材之體積固有電阻低而成爲良好之接著劑,粘接材。能 使用之導電性接著劑,導電性粘接材之體積固有電阻係 爲1X10-4〜1Χ103Ω · cm。只要具有實用上之接著強度 ,薄片狀或液狀皆無礙。 使用感壓型接著劑作成薄片狀之粘接材係最爲理想 。薄片狀粘接材粘貼後或接著材塗佈後再藉疊積以行貼 合。 液狀之接著劑係爲在塗佈,貼合後藉放置在室溫或 加熱或紫外線照射而硬化之接著劑。塗佈方法有網板印 刷法,棒塗佈法,逆輥塗佈法,照相凹板塗佈(g r a v u r e c o a t i n g ),模塗佈法,輥塗佈法(r 〇 π - c o a t i n g )等依接 著劑之種類,粘度,塗佈量等適宜地選定。層厚雖未特 別限定,但考慮必要之導電性,體積固有電阻係爲 0·5μπι〜50μπι,最好爲Ιμιη〜30μιη。另外,市售之兩面 皆具有導電性之兩面接著型之導電性帶也能良好地使用 。此導電性帶之厚度雖也未特別限定,但係爲數μιΏ〜 -49- 1225227 五、發明說明(48 ) 數mm之程度。 粘接材只要具有實用上之接著強度,薄片狀或液狀 皆無妨。但能良好使用的是係爲感壓型且成薄片狀之粘 接材。薄片狀粘接材粘貼後或接著材塗佈後再對各部材 進行疊積以行貼合。 液狀之粘接材係爲在塗佈,貼合後藉室溫放置或加 熱而硬化之接著劑。 塗佈方法有棒塗佈,逆輕塗佈,照相凹板塗佈,模 塗佈,輥塗佈等方法,依接著劑之種類,粘度,塗佈量 等之考量,適宜地選定。 層厚雖無特別限定,但係爲0.5μπι〜50μπι,而ΙμΐΏ〜 3 Ομιη更佳。形成透明粘接層之面,被貼合之面最好事 先執行易接著塗佈或電暈放電處理等之易接著處理以提 高濕潤性。 再者,經透明粘接層貼合後,爲了逸脫在貼合時進 入部材間之空氣,或固溶於粘接材俾進一步提高部材間 之密接力,重要的是可能的話在加壓,加溫之條件下進 行硬化(c u r i n g )。這時,加壓條件係數氣壓〜2 0氣壓 以下程度,加溫條件依各部材之耐熱性而定,爲室溫以 上80 °C以下之程度,但不特別受這些條件之限制。透 明粘接層中至少一層能含有色素。 7 .功能性透明層(A ) 本發明之顯示器用濾光器,對應對顯示器之設置方 -50- 1225227 五、發明說明(49) 法和要求功能而具有硬塗性,反射防止性,防眩性,靜 電防止性,防污性,氣體遮斷性,紫外線低減性之任一 種以上之功能,且,透射可視光線之功能性透明層(A ) 係直接或經第2透明粘接層形成在透明導電層(D)上。 一個功能性透明層(A)良好地具有多數之功能。 本發明之功能性透明層(A )可係爲具有一種以上之上 述各功能之功能膜,本身也可係爲藉塗佈或印刷或眾所 知悉之各種成膜法形成功能膜之透明基體,也可係爲具 有各種功能之透明基本。 本身係爲功能膜之情形,係將形成功能性透明層(A ) 之透明導電層(D )藉塗佈或印刷或眾所知悉之各種成膜 法直接形成在主面上。 形成功能膜之透明基體,具有各種功能之透明基體 之情形時也可經粘接材或含有色素之粘接材貼於透明導 電層(D)之主面。這些製作方法不受特別之限定。 透明之基體係爲透明之高分子膜,其種類,厚度也 不受特別之限定,也能使透明之基體含有色素。功能性 透明層(A )即使本身係爲功能膜,膜內也能含有色素。 電磁波遮蔽體係爲透明導電層(D )和外部作電氣連接 所需,功能性透明層(A )不得妨礙此項電氣連接。換言 之,在透明導電層(D )上須有未形成功能性透明層(A )之 導通部。例如,形成在透明導電層之周緣部殘存功能性 透明層(A ),而能以此周邊部作爲導通部。 -51- 1225227 五、發明說明(50) 顯示器因照明器具等映入而使顯示面不易觀看,因 此’功能性透明層(A )須具有抑制外光反射用之反射防 止(AR: anti reflection)性,防眩(AG: anti-glare) 性或具備此兩特性之反射防止防眩(ARAG )性之任一種特 性。電磁波遮蔽體表面之可視光線反射率若低時則如前 述那樣,減低外光射入電漿顯示器之螢光體或自螢光體 反射,不僅能防止映入,也連帶提高階調及色純度。 具有反射防止(AR )性之功能性透明層(A )係考慮形成 反射防止膜之基體的光學特性,藉光學設計,決定反射 防止膜之構成要素及各構成要素之膜厚。具體言之,藉 在可視區上折射率爲1 . 5以下,最好爲1 · 4以下之低氟 系透明高分子樹脂或氟化鎂,聚矽氧系樹脂和氧化矽之 薄膜等形成1/4波長之光學膜厚之單層膜,接著自基體 看將折射率不同之金屬氧化物,氟化物,矽化物,硼化 物,碳化物,氮化物,硫化物等之無機化合物或矽系樹 脂和丙烯基樹脂氟系樹脂等有機化合物之薄膜依高折射 率層,低折射率層之順序疊積雨層以上。 單層形成之膜雖容易製造,但反射防止性比疊積兩 層以上者劣。疊積四層之膜對寬廣之波長範圍具有反射 防止能力,光學設計受到基體之光學特性的限制少。 這些無機化合物薄膜之成膜能採用濺射,離子鍍敷 ,真空蒸著,濕式塗佈等以往眾所知悉方法中之任一種 。有機化合物薄膜之成膜能採用棒塗布,逆輥塗布,照 -52- 1225227 五、發明說明(51 ) 相凹板塗布,模塗布,輥塗布等法之濕式塗佈後再予以 乾燥硬化之方法等以往眾所知悉之方法。 具有反射防止性之功能性透明層U)之表面之可視光 線反射率係爲2%以下,最好係1.3%以下,而0.8%以下 則更佳。 具有防眩性(AG )之功能性透明層(A )係指對可視光線 具有0 . Ιμπι〜ΙΟμίΏ程度之微少凹凸表面狀態之透明層 。具體言之,係對丙烯酸系樹脂,聚矽氧系樹脂,三聚 氰胺系樹脂,胺基甲酸酯系樹脂,醇酸系樹脂,氟系樹 脂等之熱硬化型或光硬化型樹脂,將二氧化矽(S i 1 i c a ) ,有機矽化合物,三聚氰胺,丙烯酸酯等之無機化合物 或有機化合物之粒子分散,墨水化後之物,藉棒塗布, 逆輥塗布,照相凹板塗布,模塗布,輥塗布等法塗布, 硬化於基體上。粒子之平均粒徑爲1〜40μιη。或者,將 丙烯酸樹脂,聚矽氧系樹脂,三聚氰胺樹脂,胺基甲酸 酯系樹脂’醇酸系樹脂,氟系樹脂等之熱硬化型或光硬 化型樹脂塗布於基體上,然後壓擠硬化成具有所要之霧 度(haze)或表面狀態之型狀,藉此也能得出防眩性。重 要的是須有適當之凹凸,而不受限於上述之方法。 防眩性之霧度係爲〇 . 5%以上,20%以下,最好係爲 1 %以上’ 1 〇%以下。霧度太小的話,防眩性則不夠,而 過大時平行光線之透射率則降低,顯示器之視認性變成 不良。 -53- 1225227 五、發明說明(52 ) 具有反射防止防眩(ARAG )之功能性透明層(A )係藉在 具有防眩性之膜或基體上形成前述之反射防止膜而得出 。此時,具有防眩性之膜若係爲高折射率膜時即使反射 防止膜係爲單層膜也能賦與較高之反射防止性。 藉AR或ARAG執行之反射防止能提高顯示器用之濾 光器之光射透射率。 本發明之顯示器用之濾光器因係經透明粘接層(C )貼 合於顯示器顯示部上,故顯示部表面之基板玻璃反射逐 消失。因此,尤有進者,形成具有AR或ARAG功能之功 能性透明層(A )之濾光器,其表面之反射也低,從而能 提高顯示器之階調及色純度。具有AR或ARAG功能之功 能性透明層(A )之表面上之可視光線反射率係在2%以下 ,最好係1 . 3%以下,而0 . 8%以下則更佳。 爲了對顯示器用濾光器附加耐擦傷性,功能性透明 層(A)最好也具有硬塗性。硬塗膜包括丙烯酸系樹脂, 聚矽氧系樹脂,三聚氰胺系樹脂,胺基甲酸酯系樹脂, 醇酸系樹脂,氟系樹脂等之熱硬化型或光硬化型樹脂等 ,但其種類,形成方法皆無特別限定。這些膜之厚度係 爲1〜ΙΟΟμίΏ程度。硬塗膜係使用於具有反射防止性之 功能性透明層(A )之高折射率層或低折射率層,也可在 硬塗膜上形成反射防止膜以使功能性透明層(A )具有反 射防止性和硬塗性兩者。同樣地,也可兼具防眩性和硬 塗性雨者。這種情.形,硬塗膜只要依粒子之分散度等具 -54- 1225227 五、發明說明(53 ) 有凹凸即可,更甚者若再形成反射防止膜的話則能獲得 兼具反射防止防眩性和硬塗性兩者之功能性透明層(A) 。具有硬塗性之功能性透明層(A )之表面硬度係爲符合 113(1[-5400 )之鉛筆硬度之至少11,最好爲211,而311以 上則更佳。 再者,顯示器用濾光器,因靜電帶電導致容易附著 塵埃,人體接觸時則因放電而有受到電擊之虞,因此有 需要進行帶電防止處理之情形。爲了賦與靜電防止能力 也可使功能性透明層(A )具有導電性。這種情形,必要 之導電性只要面電阻在1 011 Ω / □程度以下即可,但是 不得損及顯示器顯示面之透明性和解析度。導電層包括 分散以ITO爲首之眾所知悉之透明導電膜,和ITO之超 微粒子,和以氧化錫超微粒子爲首之導電性超微粒子之 導電膜。 另外,構成具有前述反射防止性,防眩性,反射防 止防眩性,硬膜性之任何一種以上之功能之功能性透明 層(A )之層最好具有導電性。 另外,多層薄膜使用銀之情形,銀缺少化學上,物 理上之安定性,會因環境中之污染物質,水蒸氣等而劣 化,以致引起凝結,白化現象,因此重要的是在透明導 電性積層體之薄膜形成面上被覆一層具有氣體遮斷性之 功能性透明層(A )俾使薄膜不沾上使用環境中之污染物 質,水蒸氣。必要之氣體遮氣性係爲透濕度在1〇g/m2 -55- 1225227 五、發明說明(54 ) •曰以下。具有氣體遮斷性之膜之具體例包括氧化矽, 氧化錦’氧化錫’興化姻’興化銘(yttrium oxide), 氧化鎂等,或這些之混合物,或添加微量之其它元素於 這些氧化物內之金屬氧化物薄膜和,除了聚氯亞乙烯基 外,包括丙烯酸系樹脂,聚矽氧系樹脂,三聚氰胺系樹 月旨,胺基甲酸酯系樹脂,氟系樹脂等,但並非特別限定 於這些。這些膜之厚度若係金屬氧化物薄膜之情形時係 爲10〜200nm,若係樹脂之情形時則爲1〜ΐ〇〇μιη程度 ,單層或多層皆可,但也無特別之限定。另外,水蒸氣 透濕度低之高分子膜包括聚乙烯,聚丙烯,尼龍,聚氯 亞乙烯基和,氯亞乙烯基與氯乙烯,氯亞乙烯基與丙烯 腈(ac ry 1 oni t r i 1 e)之共聚合物,氟系樹脂等,但透濕 度若在1 0 g / m2 ·日以下的話則無特別限定。即使透濕 度比較高,可藉增加薄膜之厚度和添加適當之添加物以 降低透濕度。 另外,構成具有前述之反射防止性,防眩性,反射 防止防眩性,帶電防止性,抗牛頓圈液體(&111;1-N e u t ο η ’ s r i n g )性,硬塗性之任何一種以上功能之功能 性透明層(A )之層最好係爲具有氣體遮斷性之膜,或將 整體或與鄰接之透明粘接層一起作成具有上述之氣體遮 斷性。 例如,具有含有色素之反射防止性,硬塗性,帶電 防止性,及氣體遮斷性之功能性透明層(A )包括聚對苯 -56- 1225227 五、發明說明(55 ) 二甲酸乙二醇酯/硬塗膜/ I TO /含矽化合物/ I TO /含矽化 合物等。 另外,具有反射防止防眩性,硬塗性,帶電防止性 ,及氣體遮斷性透明層(A )包括三乙醯基纖維素/ I TO微 粒子分散硬塗膜/含矽化合物等。 再者,功能性透明層(A )表面最好具有防污性俾防止 指紋等之污染,和被沾污時能簡單地去除。具有防污性 之物包括對水及/或油脂具有非濕潤者;例如,氟化 合物和矽化合物若同時具有反射防止性和帶電防止性等 之其它功能時使用之化合物不得妨礙這些功能。這種情 形’藉使用低折射率之反射防止膜之構成材料和在最外 層表面塗布1〜數分子之氟系有機分子,能在維持反射 防止性和帶電防止性之外,另賦與防污性。 例如,具有防污性,反射防止性,硬塗性,帶電防 止性,及氣體遮斷性之功能性透明層(A )包括硬塗膜 / IT0/含矽化合物/ IT0/含矽化合物/氟有機分子之單分 子塗膜等。 尤有進者,含有電磁波遮蔽體之色素爲了防止因顯 不器放射之紫外線或含有外光之紫外線而劣化,功能性 透明層(A )最好具有紫外線低減性。例如,由吸收紫外 線之無機薄膜單層或多層作成之反射防止膜,或形成含 有紫外線吸收劑之功能性透明膜之基材,具有硬塗膜之 功能性透明層(A )。紫外線吸收劑之種類,濃度並無特 -57- 1225227 五、發明說明(56 ) 別限定。 另外’透明粘接層中至少有一層也可含有紫外線吸 收劑。 紫外線低減部材須配置在紫外線射入面和含有色素 之層之間’紫外線低減性係依色素之耐久性而異,並無 特別限定。 8 .厚度 依「接著•粘接辭典(日本朝倉書店)」,記載著有 關支撐體之厚度和粘接力之關係,「一般,支撐體之厚 度大時彎曲能量則變大,以致粘接力也變大,但增大到 某一點後因彎曲力矩(moment )等之影響,粘接力即降低 」。本發明者等發現若透明高分子膜之整體厚度超過 0 . 3mm以上時容易從光學濾光器薄膜之玻璃面剝離。光 學濾光器薄膜之剛性主要係受透明高分子膜之合計厚度 之支配,因此,本發明之效果係依上述彎曲矩之效果推 測。另外,藉增加光學濾光器薄膜之剛性,能以平均之 力連續地剝離,對以剝離中斷點爲起點之玻璃板殘留粘 糊之情事變少。 再者,藉增加透明高分子膜之合計厚度也可提高耐 衝擊性。透明高分子膜之合計厚愈大,雖愈提高耐衝擊 性,但薄膜之疊積張數增多,從而降低生產效率,另外 ,因剛性大幅地增加以致變成不易直接貼合於顯示器。 所以,對透明高分子膜之合計厚度未特別指定,但最好 -58- 1225227 五、發明說明(57 ) 係0.3〜1.0mm,而0.4mm〜0.8_則更佳。另外,有關 透明高分子膜之積層張數也未特別限定,但最好係2〜 6張,而2〜4張更佳。 第1 2〜第1 7圖係示出本發明有關之顯示器用之濾光 器構成例之斷面圖。 第1 2圖上,透明粘接層3 0,具有近紅外線遮蔽功能 之透明高分子膜(Β) 2 3 ( 1 50μπι),透明粘接層30,具有 顯出反射防止功能之功能性透明層(A )之透明高分子膜 (Β) 24( 188μπ〇依序疊積而構成顯示器用濾光器。 第13圖上,透明粘接層30,墊高用透明高分子膜 (Β) 2 5 ( 200μπι),透明粘接層30,具有近紅外線遮蔽功 能之透明高分子膜(Β) 2 3 ( 7 5μηι),透明粘接層30,具有 顯出反射防止功能之功能性透明層(A )之透明高分子膜 (Β) 24( 80μπι)依序疊積而構成顯示器用濾光器。 第1 4圖上,透明粘接層3 0,具有近紅外線遮蔽功能 之透明高分子膜(Β)23(75μπι),透明粘接層30,墊高用 之透明高分子膜(Β) 2 5 ( 200μιη),透明粘接層30,具有 顯出反射防止功能之功能性透明層(A )之透明高分子膜 (Β)24(80μηι)依序疊積而構成顯示器用濾光器。 第1 5圖上,透明粘接層3 0,墊高用透明高分子膜 (Β) 2 5 ( 2 0 0μπι),透明粘接層30,具有顯示反射防止功 能之功能性透明層(A )及紅外線遮蔽功能之透明高分子 膜(Β)26(150μπι),依序疊積而構成顯示器用濾光器。 -59- 1225227 五、發明說明(58 ) 第1 6圖上,透明粘接層3 0,墊高用透明高分子膜 (Β)25(200μηι),透明粘接層30,具有顯示電磁波遮蔽 功能之透明導電層(D)之透明高分子膜(Β)23(75 μπ〇, 透明粘接層3 0,具有顯示防眩性功能之功能性透明層 (Α)之透明高分子膜(Β) 24 ( 1 5 0μπ〇依序疊積,另在透明 高分子膜23之上形成電極50而構成顯示器用濾光器。 第17圖上,透明粘接層30,墊高用之透明高分子膜 (Β) 2 5 ( 2 00μπι),透明粘接層30,具有顯示反射防止功 能之功能性透明層及顯示電磁波遮蔽功能之透明導電層 (D)之透明高分子膜(Β)26(188μιη),依序疊積,另在透 明高分子膜2 5和2 6上形成電極5 0以構成顯示器用濾 光器。 第1 8圖係示出顯示第1 6圖所示之電磁波遮蔽功能 之透明高分子膜(Β)23之構成之斷面圖。顯示電磁波遮 蔽功能之透明導電層(D)10係形成在高分子膜(Β)20上 ,透明導電層(D ) 1 0係高折射率之透明薄膜層(D t ) 1 1和 由銀或銀合金作成之金屬薄膜層(Dni)12依 D t / Dm / D t / Dm / D t之順序疊積而成。透明粘接層3 0係設 在爐光器之裏面’能粘接於顯不器之顯示面。 第19圖係示出顯示第17圖所示之電磁波遮蔽功能 之透明高分子膜(B)26之構成之斷面圖。顯示電磁波遮 蔽功能之透明導電層(D)10係形成於高分子膜(b)20上 ,透明導電層(D ) 1 0係高折射透明薄膜層(d t ) 1 1和由銀 -60- 1225227 五、發明說明(59 ) 或銀合金作爲之金屬薄膜層(Dm ) 1 2係依 Dt/Dm/Dt/Dm/Dt/Dm/Dt之順序疊積而成。在高分子膜 (B ) 2 0之反面上設有反射防止膜6 1以作爲功能性透明 層(A )。透明粘接層30係設在濾光器之裏面,能粘接於 顯示器之顯示面。 第2 0圖係爲第1 6或第1 7圖所示之顯示器用濾光器 之平面圖。濾光器之平面形狀係爲長方形,顯示器顯示 之影像係透過濾光器之中央部觀察。於包含濾光器之長 邊及短邊之周邊部上形成與透明導電層行電氣連接之電 極50,電極50係接至顯示器之接地端子。 9 .電極 電要電磁波遮蔽之機器,在機器殼內設置金屬層, 或殻體使用導電性材料以遮斷電波。若需要如顯示器顯 示面那樣之透明性時則設置形成透明導電層之窗型電磁 波遮蔽體。電磁波在導電層上被吸收之後會產生電荷, 因此若不藉接地使電荷流失的話電磁波遮蔽體會變成天 線使電磁波振盪而降低電磁波遮蔽能力。因此,電磁波 遮蔽體和顯示器本體之接地部須施予電氣連接。因此之 故,如第3圖所示’若係在透明導電層(D)上形成透明 粘接層(C )及功能性透明層(A )之情形時,透明粘接層(c ) 及功能性透明層(A )最好在透明導電層(D )上餘留導通部 〇 導通部之形狀並無特別限定,但重要的是在電磁波 -61- 1225227 五、發明說明(6〇 ) 遮蔽體和顯示器本體間須無存在電磁波之洩漏間隙。 本發明之電極係指電磁波遮蔽體與外部行電氣連接 之導通部。此導通部可係爲透明導電層之露出部,也可 在露出部上印刷導電性金屬糊以作爲其之保護和良好之 電氣接觸用,也可貼合導電性帶,導電性粘接材等之導 電性材料。另外,也可在功能性透明層上形成與透明導 電層行電氣連接之型態。如上述那樣,電極之形狀和材 料無特別限定,但最好以導電性材料被覆透明導電層之 露出部那樣形成電極。 另外,本發明之電極也可藉導電性材料接觸於含有 透明導電層之本發明薄膜之斷面部而製得。所謂斷面部 ,含有透明導電層之薄膜之斷面部至少能觀察到形成透 明導電性層和其之保護用之薄膜係作成層狀,但只要以 適當之導電性材料接觸透明導電層和斷面部的話,即能 得出所要之電極。 這種情形,形成於透明導電層上之透明粘接層之端 部若比透明導電層之端部更縮進內側時則若使用導電糊 等形成電極之情形時良好的是導電糊會進入其之間隙部 份,從而增加透明導電層和電極之接觸面積。 第2 1〜第2 5圖係示出本發明有關之顯示器用濾光器 之構成例之斷面圖。 第2 1圖上,透明粘接層3 0,透明高分子膜(B ) 2 3, 透明導電層(D ) 1 0,係爲功能性透明層(A )之防眩性膜 -62- 1225227 五、發明說明(61 ) 71依序疊積,另在透明導電層(D)10之上形成電極50 而構成顯不器用濾光器。 第2 2圖上,從外氣側朝顯示器側,係爲功能性透明 層(A )之防眩性薄膜7 1,透明高分子膜(B ) 2 3,透明導 電層(D)10依序疊積,另在透明導電層(D)10之週邊形 成電極50。在透明導電層(D)10之裏面除電極50外之 中央部上設有透明粘接層3 0,藉此能粘接於顯示器顯 示面上。 第2 3圖上,透明粘接層3 0,透明高分子膜(B ) 2 3, 透明導電層(D ) 1 0,係爲功能性透明層(A )之防眩性薄膜 7 1依序疊積,另在積層體之側端面上形成電極50而構 成顯示器用爐光器。 第24圖上,透明粘接層30,透明導電層(D)10,透 明高分子膜(B)23,係爲功能性透明層(A)之防眩性薄膜 7 1依序疊積,另在透明粘接層3 0和透明導電層(D ) 1 0 之間,有銅帶等之導電帶5 1插置於濾光器之周邊部俾 確保與透明導電層(D)10之電氣連接。 第25圖上,透明粘接層30,透明導電層(D)10,透 明高分子膜(B ) 2 3,係爲功能性透明層(A )之防眩性薄膜 71依序疊積,另在濾光器之厚度方向形成貫通之通孔電 極52俾確保透明導電層(D)10之電氣連接。 第26圖係爲第21〜25圖所不之顯不器用滤光器之 平面圖。濾光器之平面形狀係爲長方形,顯示器顯示之 -63- 1225227 五、發明說明(62 ) 影像係透明濾光器之中央部觀察。在濾光器之兩個長邊 上設有與透明導電層行電氣連接之電極50,導電帶51 或通孔電極5 2,這些電極係接於顯示器之接地端子。 另外,第21〜25圖所示之顯示器用濾光器之電極當然 也能作成,如第20圖之平面圖所示那樣,沿著濾光器 之全周配置。 如第24圖所示,也可在透明導電層和其上貼合之透 明粘接層之間插置銅帶那樣之導電帶,將導電帶之一部 份引出電磁波遮蔽體外部,藉以形成電極。這種情形, 引出外部之導電性帶係實質地作爲電極。 如第2 5圖所示,也可設置從透明導電層通到電磁波 遮蔽體之最外部表面之間隙,以形成電極。從表面能看 到之間隙之形狀並無特別指定,圓型,角型皆可。另外 ,形成線狀也無礙。從表面能看到之各個間隙之大小並 無特別指定。但是,若過大時會碰到視認部份故不好。 間隙之形成位置只要避開視認部份的話並無特別指定。 必然地係位在端部附近。形成之間隙之數量,並無特別 限定’但最好係沿著全周盡量多設置俾提高電流之取出 效率。間隙只要設在透明導電層和電磁波遮蔽體之最外 部表面間的話即可,但自增加與形成之電極之接觸面積 之觀點看,最好貫通透明導電層(D)。 有關掩埋間隙之部份也無特別指定。可用金屬部材 掩埋’也可用導電性糊掩埋。這種情形,掩埋間隙之部 -64- 1225227 五、發明說明(63 ) 材係實質上成爲電極。 導通部最好係在透明導電層(D )之周緣部上連續地設 置。亦即,最好係設置除屬於顯示器之顯示部之中心部 份外之框狀導通部。 但是,即使不在透明導電層(D)之全周上形成導通部 也有一定之電磁波遮蔽能力,因此,綜合地考慮來自裝 置之電磁波產生量和容許之電磁波洩漏量,能就照原樣 使用之情形不少。 例如,若作成只在長方形之對向兩邊賦與導電材料 以形成電極之設計時能藉輥對輥方式形成電極,或形成 照捲筒狀態那樣之電極,因此能以非常良好之生產效率 製作光學濾光器,故很理想。另外,這種方法也能利用 於前述之使用導電性帶作爲電極之情形。 即使在長方形之對向兩邊以外之部份另形成電極, 或在對向之兩邊之一部份上存在有未形成電極之部份也 不會有特別之問題。 包覆導通部之電極也作爲耐環境性及耐擦傷性不佳 之透明導電層(D )之保護。電極使用之材料考慮導電性 ,耐蝕性及與透明導電膜之密接性等,能使用由銀,金 ,銅,白金,鎳,鋁,鉻,鐵,鋅,碳等之單體或2種 以上作成之合金,合成樹脂和這些單體或合金之混合物 ’或者,由硼矽酸(b ο 1· 〇 s i 1 i c a t e )玻璃和這些單體或合 金之混合物作成之糊。形成電極之方法能採用電鍍法, -65- 1225227 五、發明說明(64 ) 真空蒸著法,濺射法等,至於糊貼方法則能採用印刷, 塗佈之方法等以往眾所知悉之方法。 使用之導電性材料只要能導電者則無特別指定。通 常係使用將銀糊等之導電性材料作成糊狀之物。 電極之形成方法,若係爲糊狀之物時則塗佈於斷面 部並使其乾燥而行之。也可將導電性材料塗佈在捲筒狀 態之薄膜之側面,輥對輥之情形,則可在攤開薄膜之際 塗佈於側面。另外,也能利用帶狀之導電性材料。 另外’也能俟貼合形成在透明支撐基體上之透明導 電性薄膜層之透明高分子膜後塗佈於斷面部。 塗佈方法,自效率及精確度之觀點考慮,採用網板 印刷法之情形多。 另外’藉金屬部材掩埋間隙以形成電極之情形,電 磁波遮蔽體自身不預先施予加工也無礙。只要事先在顯 示裝置之外周部份設置形形螺絲孔之金屬性接地部份, 於電磁波遮蔽體粘貼於顯示裝置之顯示部份,包含金屬 性之接地部份,後貫通電磁波遮蔽體,然後將導電性之 螺絲埋入金屬性接地部份之螺絲孔內即可。這種情形, 導電性之螺絲係實質上作爲電極。使用這種方法,藉輥 對輥方式除了能以高生產性製作電磁波遮蔽體外,也容 易在電磁波遮蔽體之全周部份形成電極。 1 0 .電磁波遮蔽 爲了限制從電磁波遮蔽體和顯示裝置之間洩漏之電 -66- 1225227 五、發明說明(65 ) 磁波於最小須盡可能減小電磁波遮蔽體之導電層和顯示 裝置間之絕緣空間。不好的是若有空氣和其它之絕緣物 存在於間隙內則電磁波會從該處漏至外部。 以往那樣,將透明導電性膜貼合於支撐基體以製作 電磁波遮蔽體之情形,在透明導電層和顯示裝置間存在 有主要係爲絕緣物之支撐基體,若透明導電層和顯示裝 置間無沿著全周接觸以保持導電性的話則無法獲得充份 之電磁波遮斷效果。因此之故,於電磁波遮蔽體之製造 工程上需要逐張將薄膜粘貼於透明支撐基體上之步驟及 藉膜片於全外週部份上形成電極之步驟。 本發明上,將薄膜狀態之電磁波遮蔽體直接粘貼於 顯示裝置上之情形,因導電層和顯示裝置之距離非常近 之故,相較於以往之方法能大幅地窄化絕緣空間,即使 不在全周部份上形成電極也能充份地獲電磁波遮斷效果 ,故爲理想。此情事,電磁波遮蔽體之透明導電層形成 在顯示裝置側之情形尤爲顯著。亦即,能藉只在長方形 之兩個長邊形成電極即能獲得充份之電磁波遮斷效果。 這種情形,製造方法能使用屬於生產性高之輥對輥方法 ,故非常理想。 11.顯示裝置及其製造方法 本發明之顯示裝置具備粘接於裝置之顯示部作爲電 磁波遮蔽體及/或調光膜而作用之顯示器用濾光器。 電磁波遮蔽體係與顯示裝置行電氣之接觸。 -67- 1225227 五、發明說明(66) 本發明有關之顯示裝置之方法,主要包括下列(丨)〜 (1 〇 )方法,但並不限定於這些方法。 方法U ) ··將功能性透明層(A )及導通部(及電極)/ 透明導電層(D)/高分子膜(B)(及硬塗層(F))/透明粘 接層(C ),或功能性透明層(A )及導通部(及電極)/透 明粘接層(C)/透明導電層(D)/高分子膜(B)(及硬塗 層(F ) ) /透明粘接層(C )之本發明之電磁波遮蔽體在顯 示器之顯示部上以透明粘接層(C)爲貼合面而行貼合。 貼合後’本發明之電磁波遮蔽體之導通部或形成於 導通部上之電極,則藉導電性帶或導電性接著劑或導電 性塗料或導電性之成形部品與顯示裝置本體之導通部, 亦即接地部行電氣之連接。 方法(2):將透明導電層(D)/高分子膜(B)(及硬塗 層(F ) ) /透明粘接層(C )依序構成之積層體以透明粘接 層(C )作爲貼合面貼合於顯示器之顯示部,貼合後在透 明導電層(D )上餘留導通部,直接或經透明粘接層(c )形 成功能性透明層(A ),並藉導電性帶或導電性接著劑或 導電性塗料或導電性之成形部品將積層體之導通部和顯 示器本體之導通部,亦即接地部,行電氣的連接。 方法(3 ):將透明粘接層(C )塗佈或貼合於顯示裝置 之顯示部,功能性透明層(A )及導通部(及電極)/透明 導電層(D)/高分子膜(B)(及硬塗層(F))依序構成之積 層體以高分子膜(B )作爲貼合面貼合,貼合後藉導電性 -68- 1225227 五、發明說明(67 ) 帶或導電性接著劑或導電性塗料或導電性之成形部品將 積體層之導通部和顯示裝置本體之導通部,亦即接地部 ,作電氣的連接接。 方法(4 ) ··將透明粘接層(C )塗佈或貼合於顯示裝置 之顯示部,將透明導電層(D)/高分子膜(B)(及硬塗層 (F ))依序構成之透明積層體以高分子膜(B )爲貼合面貼 合,貼合後在透明導電層(D )上,除餘留導通部外直接 或經第2透明粘接層形成功能性透明層,並藉導電性帶 或導電性接著劑或導電性塗料或導電性之成形部品將積 層體之導通部和顯示器本體之導通部,亦即接地部,行 電氣的連接。 方法(5 ) ··將由功能性透明層(A ) /高分子膜(B ) /透 @導電層(D ) /透明粘接層(C )及導電性粘接層作成之 ^磁波遮蔽體以透明粘接層(C )爲貼合面至少貼合於顯 $裝置之顯示部上,並以導電性粘接層爲貼合面至少貼 合於顯示裝置之接地部。 方法(6 ):至少於顯示器之顯示部,或至少於透明導 _層(D ) /高分子膜(b ) /功能性透明層(a )依序構成之 _層體之透明導電層(D)上之透光部上形成透明粘接層 (C )’另外,於顯示裝置之至少接地部,或該積層體之 $ 0月導電層(D )上形成導電性粘接層後將該積層體和顯 不裝置貼合在一起。 $ & ( 7 ):將由功能性透明層(A ) /高分子膜(B ) /透 -69- 1225227 五、發明說明(68 ) 明導電層(D ) /透明粘接層(c )及導電性粘接層作成, 在端部上於透明導電層(D )和高分子膜(B )之間有插設銅 帶等之導電性帶之一部份之電磁波遮蔽體以透明粘接層 (C )爲貼合面貼合於顯不裝置之至少顯示部,且將導電 性帶之外部露出部份貼合於顯示裝置之至少接地部。 方法(8 ):於顯示裝置之至少顯示部,或至少於透明 導電層(D ) /高分子膜(B ) /功能性透明層(A )依序構成 ’在端部上於透明導電層(D )和高分子膜(B )間有插設銅 帶等之導電性帶之一部份之積層體之透明導電層(D)上 之透光部上形成透明粘接層(C ),另外,於顯示裝置之 至少接地部,或該積層體之透明導電層(D)上形成導電 性粘接層後將該積層體和顯示裝置貼合在一起。 本發明之電磁波遮蔽體,透射特性,透射率,可視 光線反射率皆優良,因此,不會因形成於電漿顯示器上 而顯著地損害電漿顯示器之亮度,卻能提昇其色純度及 階調。尤有進者,對電漿顯示器產生之有害人體健康之 所謂電磁波之遮斷能力優良,另外,對電漿顯示器產生 之8 00〜1 l〇〇nm附近之近紅外線能有效率地低減,因此 對電子機器之遙控,傳送系統之光通訊等使用之波長不 會有不良影響,從而能防止這些機器之誤動作。另外, 耐候性•耐環境性優良,並兼具反射防止性及/或防 眩性,耐擦傷性,防污性,帶電防止性等,及能以低成 本提供。藉使具備本發明之電磁波遮蔽體,能提供具有 -70- 1225227 五、發明說明(69 ) 優良特性之電漿顯示器。 本發明之電磁波遮蔽體,光學特性,電磁波遮蔽能 力,近紅外光線低減能力皆優,因此不但能良好地使用 於電漿顯示器,另亦能良好地使用於產生電磁波及/ 或近紅外線之FED(場射顯示器),CRT(陰極射線管)等 之各種顯示器。 關於具備調光膜之顯示裝置之製造方法,主要有下 述兩種方法,但並不限定於此兩種方法。 方法(9 ):將至少功能性透明層(A ) /高分子膜(B ) / 係爲透明粘接層(C )之本發明之調光膜以透明粘接層(C ) 爲貼合面貼合於顯示裝置之至少顯示部上。 方法(1 0 ):於顯示裝置之至少顯示部上形成透明粘 接層(C ),以至少透明導電層(D ) /高分子膜(B )依序構 成之積層體之高分子膜(B)面爲貼合面貼合於顯示裝置上。 本發明之調光膜,透射特性,透射率,反射特性皆 優,因此,不會因直接形成於彩色電漿顯示器等之顯示 器之顯示部而顯著地損害顯示器之亮度,另能提高其之 色純度及階調。另外,兼具耐擦傷性,防污性,靜電防 止性等,及能以低成本提供。 另外,使本發明之調光膜直接形成於顯示器表面上 ,藉此能提供具有優良特性之顯示裝置。 (實施例) 下面將藉實施例更具體地說明本發明。但本發明並 -7 1- 1225227 五、發明說明(70) 不限定這些實施例。 構成實施例中之透明導電層(D )之薄膜在基材之一側 之主面上藉磁控管(magnetron)直流(DC)濺射方法成膜 。薄膜之厚度係依成膜條件求出之値,並非實際測定之 膜厚。 高折射率透明薄膜層(D t )係以I TO薄膜形成,靶 (t a r g e t )薄膜係使用氧化銦·氧化錫燒結體(組成比 ln 2 0 3 : SnO2 = 90 : 10wt%)或氧化錫燒結體,濺射氣體係 使用氬。氧混合氣體(全壓266 mP a:氧分壓5mPa),以 成膜。 金屬薄膜層(Dm )係藉銀薄膜或銀-鈀合金薄膜形成, 靶係使用銀或銀-鈀合金(鈀1 0w t % ),濺射氣體使用氬 氣(全壓266mPa),以成膜。 再者,透明導電層之面電阻係藉四探針測定法測定( 探針間隔爲1 mm )。另外,表面之可視光線反射率(R v i s ) 係首先將測定對象物切出一小邊,取掉透明粘接層,接 著用砂紙粗化高分子膜(B )側之表面後消除光澤並噴黑 使此面無反射,藉使用反射積分球(光線入射角度6 ° ) 之(公司)日立製作所製之分光光度計(U- 3 400 )測定可視 領域之全光線反射率,然後依J ISR 3 106自此測定之反 射率求出。 (實施例1 ) 以雙軸(定向)拉伸之聚對苯二甲酸乙二醇酯(以下稱 -72- 1225227 五、發明說明(71 ) 爲PET)膜(厚度:188μιτι)作爲高分子膜(A),在ί 之主面上從PET膜開始順序疊積I TO膜膜(膜厚 ,銀薄膜(膜厚:1 lnm),IT0薄膜(膜厚:95nm) 膜(膜厚:14nm),IT0薄膜(膜厚:90nm),銀薄 厚:12nm),IT0薄膜(膜厚:40ηπι)計7層之透曰』 層,從而製成具有面電阻爲2.2Ω/□之透明導霄 之透明積層體1。 以PTE膜/透明導電層之斷面作爲表示本發明 分子膜(B)/透明導電層(D)之一例之斷面圖係示 圖。第1圖上,符號1 0係爲透明導電層(D ),符 係爲高折射率透明薄膜層(D t ),符號1 2係爲金I 層(D m ),符號2 0係爲高分子膜(B )。 將有機色素分散•溶解於醋酸乙酯/甲苯(5 0 5 Ow t % )溶劑,以作爲丙烯酸系粘接劑之稀釋液。 烯酸系粘接劑/色素摻入稀釋液(80 : 20wt%),華 布機(comma coateO於透明積層體1之高分子膜 之面塗佈乾燥膜厚達25μιη,然後乾燥並於粘接® 積疏離型膜,如此形成被夾置於疏離型膜和透明 之高分子膜(Β )之間之透明粘接層(C )(粘接材1 ) ,粘接材1之折射率係爲1 . 5 1,消光係數係爲0 有機色素係使用具有對波長5 9 5 nm吸收最大俾 電漿顯示器發射之不必要之發光部份之三井化學 製之色素PD-319,及用於補正白色發光之色度之 卜側 :4 0 nm ) ,銀薄 膜(膜 i導電 【層(B) 之局 於第1 號1 1 曙薄膜 混合丙 I點塗 (B )側 ί上疊 積層體 。再者 〇 吸收 (公司) 三井 -73 - 1225227 五、發明說明(72 ) 化學(公司)製之紅色色素PS-Red-G,然後調整丙烯酸 系粘接劑/色素摻入稀釋液俾使乾燥後之粘接材1分 別含有 1150(wt)ppm, 1050(wt)ppm。再者;PD-319 係 爲以下式(3)表示之四-第三-丁基-四氮雜卟啉氧釩 (v a n a d y 1 )之配位化合物。(2) [In the formula (2), Am & An represents each hydrogen atom, _ atom nitro 'cyano' via group 'amino group, residue, sulfonic acid group, alkane having 1 to 2 carbon atoms Alkyl, haloalkyl, alkoxy, alkoxyalkoxy, aryloxy, monoalkylamino, dialkylamino, aralkyl, aryl, heteroaryl 'alkylthio, or aryl The thio groups Am and An can each form a ring other than an aromatic ring via a linking group. M represents two hydrogen atoms, and the bivalent metal is -39-1225227. 5. Description of the invention (38) Atom, one of trivalent substitution Metal atom, two tetravalent substitution metal atom, or hydroxy metal atom]. Specific examples of the tetraazaporphyrin compound represented by the formula (1) will be described below. Specific examples of A1 to A3 in the formula are each including a halogen atom such as a hydrogen atom, fluorine, chlorine, bromine, iodine, etc .; a nitro group; a cyano group; a hydroxyl group; an amine group; a carboxyl group; a sulfonic acid group; a methyl group, an ethyl group, N-propyl, iso-propyl, n-butyl, iso-butyl, second butyl, third-butyl, n-pentyl, 2-methyl-butyl, 1 -Methyl-butyl, neopentyl, 1,2-dimethylpropyl, 1,1-dimethylpropyl, cyclopentyl, n-hexyl1), 4- Methylpropyl, 3-methylpropyl, 2-methylpropyl, 1-methylpropyl, 3,3-dimethylbutyl, 2,3-dimethylbutyl, 1,3- Dimethylbutyl, 2,2 · dimethylbutyl, 1,2-dimethylbutyl, 1,1-dimethylbutyl, 3-ethylbutyl, 2-ethylbutyl,丨 _ethylbutyl, 1,2,2-trimethylbutyl, 1,2,2-trimethylbutyl, 丨 _2yl-2 methylpropyl, cyclo-hexyl, n-heptyl, 2-methylhexyl, 3-methylhexyl, 4-methylhexyl, 5-methylhexyl, 2,4-dimethylpentyl, n-octyl, 2-ethylhexyl, 2,5-dimethyl Hexyl, 2,5,5-trimethylpentyl, 2,4-dimethylhexyl , 2,2,4-trimethylpentyl, n-nonyl, 3,5, 5-trimethylhexyl, n-decyl, 4-ethyloctyl, 4.ethyl-4,5 -Dimethylhexyl, n-decyl'-n-dodecyl, 1,3,5,7-trimethyloctyl, 4-butyloctyl, 6,6-dimethyloctyl, n-tridecyl Methyl, 6-methyl-4-butyloctyl, n-tetradecyl, n-pentadecyl, 3,5-dimethylheptyl, 2,6-dimethylheptyl, 2,4-dimethyl Heptyl, 2,2, 5, 5-tetra-40-1225227 V. Description of the invention (39) Methylhexyl '1 -cyclo-pentyl-2,2-monomethylpropyl' 1 -cyclo-hexyl- 2,2-Dimethylpropyl, etc. Carbon number 1 ~ 20 Linear, branched or cyclic alkyl, chloromethyl, dichloromethyl, fluoromethyl, trifluoromethyl, pentafluoromethyl 'Nine fluorobutyl and other dentitions with 1 to 20 carbon atoms; methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, second butoxy Alkyl, tertiary butoxy, n-pentyloxy, isopentyloxy, neopentyloxy, n-hexyloxy, n-dodecyl, etc. alkoxy groups having 1 to 20 carbon atoms; methoxyethoxy Ethoxy, ethoxyethoxy, 3-methoxypropoxy, 3- (iso (Oxy)) alkoxyalkoxy having 2 to 20 carbon atoms such as propoxy; phenoxy, 2-methylphenoxy, 4-methylphenoxy, 4-third-butoxy, 2-methylphenoxy, 4-isopropylphenoxy and other aryloxy groups having 6 to 20 carbon atoms; methylamino, n-propylamino, n-butylamino, n-hexylamino, etc. Monoalkylamino group with 1 to 20 carbon atoms; dimethylamino group, diethylamino group, di-n-propylamino group, di-n-butylamino group, N-methyl-N-cyclohexylamine Dialkylamino groups having 2 to 20 carbon atoms; benzyl, nitrobenzyl, cyanobenzyl, hydroxybenzyl, methylbenzyl, dimethylbenzyl, trimethylbenzyl, di Chlorobenzyl, methoxybenzyl, ethoxybenzyl, trifluoromethylbenzyl, naphthylmethyl, nitronaphthylmethyl, cyanonaphthylmethyl, hydroxynaphthylmethyl, methylnaphthylmethyl Trifluoromethylnaphthalene-4 1-1225227 V. Description of the invention (4〇) Arylalkyl having 7 to 20 carbons such as methyl; phenyl, nitrophenyl, cyanophenyl, hydroxyphenyl, Methylphenyl, dimethylphenyl, trimethylphenyl, dichlorophenyl, methoxyphenyl, ethoxyphenyl, trifluoro Carbon number of methylphenyl, N, N-dimethylaminophenyl, naphthyl, nitronaphthyl, cyanonaphthyl, hydroxynaphthyl, methylnaphthyl, trifluoromethylnaphthyl, etc. 6 ~ Allyl 20; pyrrolyl, thienyl, furyl, oxazolyl, isoxazolyl, oxadiazolyl, imidazolyl, benzoxazolyl, benzothiazolyl, benzimidazolyl, benzene Hexaallyl furfuryl, indolyl, etc .; methylthio, ethylthio, n-propylthio, isopropylthio, n-butylthio, isobutylthio, second butylthio, third Butylthio, n-pentylthio'isopentylthio, ethyl-methylbutylthio, 1-methylbutylthio, neopentylthio, 1,2-dimethylpropylthio, 1,1- Alkylthio groups having 1 to 20 carbon atoms such as dimethylpropylthio; phenylthio, 4-methylphenylthio, 2-methoxyphenylthio, 4-tert-butylphenylthio, etc. Arylthio groups having 6 to 20 carbon atoms. Examples of A1 and A2, A3 and A4, A5 and A6, A7 and A8 forming a ring via a linking group include -CH2CH2CH2-, -CH2CH2CH (N02) CH2-, -CH2 (CH3) CH2CH2-, · ΟΗ2 (: Η (( : 1) (: Η2 (: Η2- etc.) Examples of divalent metals represented by M include copper (Cu), zinc (Zη), iron (Fe), cobalt (Co), nickel (Ni), and ruthenium (Ru) , Rhodium (Rh), palladium (Pd), platinum (Pt), manganese (Μη), mercury (Hg), cadmium (Cd), barium (Ba), titanium (Ti), beryllium (Be), calcium (Ca) -42- 1225227 V. Description of the invention (41) An example of a substituted trivalent metal includes Al-F, A1-C1, Al-Br, Al-I, Ga-F, Ga-C1, Ga-Br , Ga-I, In-F, In-Cl, In-Br, In-I, Tl-F, T1-Cl, Tl-Br, Tl-I, A1-C6H5, A1-C6H4 (CH3), In- C6H5, In-C6H4 (CH3), Mn (OH), Mn (〇C6H5), Mn [OSi (CH3) 3], Fe-Cl, Ru-Cl, etc. Examples of two substituted tetravalent metals include CrCl2, SiF2, SiCl2, SiBr2, Sil2, SnF2, SnCl2, SnBr2, ZrCl2, GeF2, GeCl2, GeBr2, Gel2, TiF2, T i C12, TiBr2, Si (0H) 2, Sn (0H) 2, Ge (0H) 2, Zr (0H) 2, Mn (0H) 2, TiA2, CrA2, Si A2, SnA2, GeA2 [wherein A represents , Phenyl, naphthyl and its derivatives], Si (0A ') 2, Sn (0A') 2, Ge (0A,) 2, Ti (0A ') 2, Cr (〇A') 2 [ Among them, A ′ represents an alkyl group, a phenyl group, a naphthyl group, a trialkylsilyldialkylalkoxysilyl group and a derivative thereof], Si (SA ") 2, Sn (SA") 2, Ge (SA ") 2 [wherein A" represents an alkyl group, a phenyl group, a naphthyl group and a derivative thereof], etc. Examples of the oxygen metal include VO, MnO, TiO, etc. The most preferable ones are Pd, Cu, Ru, P t, Ni, Co, Rh, Zn, VO, T iO, Si (Y) 2, Ge (Y) 2 (where Y is a halogen atom, an alkoxy group, an aryloxy group, a fluorenyl group, a warp group, Yuan base, aryl group, Yuan thio group, aryl thio group 'Eryuan Kejiashayuan oxygen, Sanyuan base tin oxygen or Sanyuan base germanium oxygen. More preferably, it is Cu, VO, Ni, Pd, Pt Co. The present inventors have further discovered that the azaporphyrin compound of formula (1), for example, if it is a tetra-third butyl-tetraazaporphyrin complex (c0mpl -43-1225227 Description of the invention (42) e X) and tetra-neopentyl-tetraazaporphyrin complexes are easier to manufacture, solubility in solvents, coordination The compound is stable and has excellent absorption characteristics. As a result of the addition of tertiary-butyl and tetra-neopentyl, the coordination compound has three-dimensionality, thereby improving the solubility of the solvent and making it easy to contain pigments. Excellent electromagnetic shielding body. In the filter for a display of the present invention, the methods (1) to (4) incorporating the pigment described above may include a polymer film (B) containing a pigment, and a transparent adhesive layer (C) or a second transparent material as described later. The adhesive layer is implemented on a functional transparent layer (A) described later containing a pigment, and on any one or more of the aforementioned hard coat layers (F) containing a pigment. The functional transparent layer (A), which will be described later, may be a film containing a dye and having various functions, a film formed on a polymer film containing a dye and having various functions, or a film containing a dye. In any case, a film having various functions on the material may be used. Furthermore, two or more pigments having different absorption wavelengths may be contained in one medium or a coating film, and may also have two or more pigment layers. First, the method (1) of kneading a pigment and a resin and thermoforming will be described. For resin materials, if it is made of plastic plates or polymer films, it is better to use materials with high transparency as much as possible. Specifically, it may include polyethylene terephthalate, polyether mill, and polystyrene. , Polyethylene naphthalate 'polyallylate, polyether ketone ether, polycarbonate, polyethylene, polypropylene, nylon-6, etc. Polyamines, polyimines, triethyl cellulose- 44-1225227 V. Description of the invention (43) Cellulose resin, etc., Polyurethane, Fluorine resin such as polytetrafluoroethylene, Vinyl compounds such as polyvinyl chloride, Polyacrylic acid, polyacrylate, Poly Acrylonitrile, addition polymers of vinyl compounds, polymethacrylic acid, polymethacrylate, polyvinylidene compounds such as vinylidene chloride, fluorinated vinylidene / trifluoroethylene copolymers, ethylene / vinyl acetate Copolymers of vinyl compounds such as copolymers or fluorides, polyether 'epoxy resins such as polyalkylene oxide, polyvinyl alcohol, polyvinyl butyral, and the like are not limited to these resins. Regarding the manufacturing method, the pigment used varies slightly depending on the matrix polymer and the processing temperature and filming conditions, but generally, it can include (i) adding a pigment to the matrix polymer powder or Pellet, at 150 ~ 350 ° C The method of heating, dissolving and forming into a plastic plate after processing, (ii) the method of film forming by an extruder, (iii) the production of medium and high rollers by an extruder, and then at 30 ~ 120 ° C, Axial or biaxial orientation (biaxial orientation) is stretched 2 to 5 times to produce a film having a thickness of 10 to 200 μm, and the like. In addition, additives such as plasticizers for general resin molding may be added during kneading. The amount of pigment added varies depending on the absorption coefficient of the pigment, the thickness of the polymer formed body, the target's absorption strength, the target's transmission characteristics, and transmittance, etc. Generally, the weight relative to the base polymer formed body is 1 ppm ~ 20%. (2) The method of casting, first, dissolve the resin or resin monomer in an organic solvent to make a thick resin solution, then add and dissolve the pigment in the thick resin solution, and then add a plasticizer if necessary to compound Starter, oxygen-45-1225227 V. Description of the invention (44) Anti-chemical agent, and then flow it into the mold with the necessary surface state and the roller, and perform solvent evaporation and drying or compound solvent evaporation and drying. Made of plastic plate, polymer film. Commonly used are aliphatic ester resins, acrylic resins, melamine resins, urethane resins, aromatic ester resins, polycarbonate resins, aliphatic polyolefin resins, aromatic polyolefin resins, polyethylene resins, Polyvinyl alcohol resin, polyethylene modified resin (PVB, EV A, etc.) or copolymerized resin monomers of these resins. As the solvent system, halogen-based, alcohol-based, ketone-based, ester-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based, ether-based solvents or mixtures of these are used. The concentration of the pigment varies depending on the absorption coefficient of the pigment, the thickness of the plate or film, the target's absorption intensity, the target's transmission characteristics and transmittance, etc., but it is usually 1 ppm to 20% relative to the weight of the resin monomer. The resin concentration is usually 1 to 90% for the coating as a whole. The method of coating after coating (3) includes a method in which a pigment is dissolved in an adhesive resin and an organic solvent for coating, and the pigment is pulverized (50 to 500 nm) and dispersed in uncolored acrylic acid. Emulsion (acryi emu 1 si ο η) coating method to make acrylic emulsion water-based coatings 〇 The former method, usually using aliphatic ester resins, acrylic resins, melamine resins, urethane resins, aromatic Ester resins, polycarbonate resins, aliphatic polyolefin resins, aromatic polyolefin resins, polyethylene resins, polyvinyl alcohol resins, polyethylene modified trees -46-1225227 V. Description of the invention (45) Grease (PVB , EVA, etc.) or copolymer resins of these resins as adhesive resins. As the solvent system, halogen-based, alcohol-based, ketone-based, ester-based, aliphatic hydrocarbon-based, aromatic hydrocarbon-based, ether-based solvents, or a mixture of these are used. The concentration of the pigment varies depending on the absorption coefficient of the pigment, the coating thickness, the absorption intensity of the target, and the visible light transmittance of the target, etc., but the weight of the adhesive resin is usually 0.  1 ~ 30%. The concentration of the binder resin is generally 1 to 50% with respect to the entire paint. The latter acrylic emulsion-based water-based paint was obtained by finely pulverizing the pigment into fine particles of 50 to 500 μm in the same manner as described above and dispersing the pigment in an uncolored acrylic emulsion paint. Additives can also be added to paints as ordinary paints such as oxidation inhibitors. The coatings made by the above methods are bar coaters, blade coaters, spin coaters, reverse roll coaters, and die coaters. (die coater), spray (spray), and the like are conventionally known and applied to a transparent polymer film, transparent resin, transparent glass, or the like to produce a pigment-containing substrate. A protective layer is provided to protect the coating surface, and other constituent members of the electromagnetic wave shielding body may be pasted on the coating surface to protect the coating surface. Method (4) used as a pigment-containing adhesive material is to add 10 ppm to 30% to an acrylic adhesive, a polysiloxane adhesive, a urethane adhesive, polyethylene Polyvinyl Butyral Adhesive (PVB), Ethylene Vinyl Acetate Adhesive (EVA), etc., Polyvinyl Ether, Saturated Amorphous -47-1225227 5. Description of the Invention (46) Polyester, Melamine resin, etc. Used as a sheet or liquid adhesive or adhesive. In addition, in these methods, in order to improve the light resistance of the electromagnetic wave shielding body containing a pigment, they can also contain both an ultraviolet absorber and a pigment. The type and concentration of the ultraviolet absorber are not particularly limited. 6 · Transparent adhesive layer, conductive adhesive layer The paste (stacking) of the present invention is made by any transparent dry-bonding layer. The transparent adhesive layer (C) and the like of the present invention are layers made of any transparent adhesive, adhesive, or adhesive material. Specifically, an acrylic adhesive, a silicone adhesive, a urethane adhesive, a polyvinyl butyral adhesive (PVB), an ethylene-vinyl acetate adhesive ( EVA), etc., polyvinyl ether, saturated amorphous polyester, melamine resin, etc. At this time, it is important that the adhesive material used in the central portion of the transmission portion of the light emitted from the display must be sufficiently transparent to visible light. The conductive adhesive layer is an adhesive layer for electrically connecting the transparent conductive layer (D) and the ground portion (ground conductor) of the display device. It must be conductive, but not necessarily transparent. The electromagnetic wave shielding body, because the transparent conductive layer (D) must be electrically connected to the outside, the transparent adhesive layer must not significantly prevent the conductive adhesive layer from electrically connecting to the outside. That is, the transparent conductive layer (D) must have a conductive portion where a transparent adhesive layer is not formed. It is important that, for example, the transparent adhesive layer has a peripheral portion where the transparent conductive layer (D) remains, and a conductive portion remains. Conductive adhesive used for conductive adhesive layer, conductive adhesive -48-1225227 V. Description of the invention (47) Material is acrylic adhesive, silicon adhesive, urethane adhesive , Polyvinyl butyral adhesive (PVB), ethylene-vinyl acetate adhesive (EVA), etc., polyvinyl ether, saturated amorphous polyester, melamine resin, etc. as the base agent, carbon and copper (Cu), Metal particles such as nickel (Ni), silver (Ag), iron (Fe), etc. are formed as conductive particles dispersed in a base agent. If the dispersed particles have low conductivity and a small and large particle size, and a wide contact area of the particle group, a conductive adhesive and a conductive adhesive having a low volume intrinsic resistance are good adhesives and adhesives. The usable conductive adhesive and the volume resistivity of the conductive adhesive are 1X10-4 ~ 1 × 103Ω · cm. As long as it has practical bonding strength, it does not matter whether it is sheet or liquid. It is ideal to use a pressure-sensitive adhesive as a sheet-shaped adhesive material. After the sheet-shaped adhesive material is pasted or after the adhesive material is applied, the laminate is laminated to form the adhesive. The liquid adhesive is an adhesive that is hardened after being coated and bonded by being left at room temperature or being heated or irradiated with ultraviolet rays. Coating methods include screen printing, bar coating, reverse roll coating, gravure coating, die coating, and roll coating (r 〇π-coating). The kind, viscosity, coating amount, etc. are appropriately selected. Although the thickness of the layer is not particularly limited, considering the necessary conductivity, the volume inherent resistance is 0.5 μm to 50 μm, and preferably 1 μm to 30 μm. In addition, a commercially-available double-sided adhesive tape with both sides having conductivity can be used well. Although the thickness of this conductive tape is not particularly limited, it is several μιΏ ~ -49-1225227. V. Description of the invention (48) It is about several mm. As long as the bonding material has practical adhesive strength, it may be in a sheet or liquid form. However, it is a pressure-sensitive and sheet-shaped adhesive material that can be used well. After the sheet-shaped adhesive material is pasted or the adhesive material is applied, the respective members are stacked to form a line. The liquid bonding material is an adhesive that is hardened by being placed or heated at room temperature after being coated and bonded. The coating method includes methods such as bar coating, reverse light coating, gravure coating, die coating, and roll coating, and is appropriately selected in consideration of the type of the adhesive, viscosity, coating amount, and the like. Although the layer thickness is not particularly limited, it is 0. 5 μm to 50 μm, and 1 μm to 3 Ομιη is more preferable. The surface on which the transparent adhesive layer is to be formed, and the surface to be bonded are preferably subjected to easy adhesion treatment such as easy adhesion followed by corona discharge treatment to improve wettability. In addition, after the transparent adhesive layer is bonded, in order to escape the air that enters between the components during bonding, or solid-solve in the adhesive material, to further improve the adhesion between the components, it is important to pressurize if possible, Curing is performed under heating. At this time, the pressure condition coefficient is from about atmospheric pressure to less than 20 atmospheric pressure, and the heating conditions are determined by the heat resistance of each component and are about room temperature above 80 ° C, but they are not particularly limited by these conditions. At least one of the transparent adhesive layers can contain a pigment. 7. Functional transparent layer (A) The filter for display of the present invention, corresponding to the setting method of the display -50-1225227 V. Description of the invention (49) Method and required functions have hard coating, anti-reflection and anti-glare properties Any one or more of the functions of static prevention, antifouling, gas blocking, and low UV reduction, and the functional transparent layer (A) that transmits visible light is formed directly or through a second transparent adhesive layer on transparent On the conductive layer (D). A functional transparent layer (A) has many functions well. The functional transparent layer (A) of the present invention may be a functional film having more than one of the above functions, and may itself be a transparent substrate for forming a functional film by coating or printing or various known film-forming methods. It can also be a transparent base with various functions. In the case of a functional film, the transparent conductive layer (D) forming the functional transparent layer (A) is directly formed on the main surface by coating or printing or various known film forming methods. In the case of a transparent substrate forming a functional film and a transparent substrate having various functions, it may be pasted on the main surface of the transparent conductive layer (D) via an adhesive material or an adhesive material containing a pigment. These production methods are not particularly limited. The transparent base system is a transparent polymer film, and its type and thickness are not particularly limited. The transparent base can also contain a pigment. Functionality The transparent layer (A) can contain a pigment even if it is a functional film. The electromagnetic wave shielding system is required for the electrical connection between the transparent conductive layer (D) and the outside, and the functional transparent layer (A) must not hinder this electrical connection. In other words, there must be a conductive portion on the transparent conductive layer (D) where no functional transparent layer (A) is formed. For example, a functional transparent layer (A) remains on the peripheral portion of the transparent conductive layer, and the peripheral portion can be used as a conductive portion. -51- 1225227 5. Description of the invention (50) The display surface is difficult to see due to the reflection of lighting equipment, so the 'functional transparent layer (A) must have reflection prevention (AR: anti reflection) for suppressing external light reflection Either the anti-glare (AG: anti-glare) property or the anti-glare (ARAG) anti-glare property with these two characteristics. If the visible light reflectance on the surface of the electromagnetic wave shielding body is low, as described above, the external light can be reduced to reflect or reflect from the plasma display, which not only prevents reflection, but also improves the tone and color purity. . The functional transparent layer (A) having anti-reflection (AR) properties takes into consideration the optical characteristics of the substrate forming the anti-reflection film, and determines the constituent elements of the anti-reflection film and the thickness of each constituent by optical design. Specifically, the refractive index is 1.  5 or less, preferably 1-4 or less, low-fluoride transparent polymer resin or magnesium fluoride, polysiloxane resin, and silicon oxide film, etc. to form a single-layer film with an optical thickness of 1/4 wavelength, and then from Based on the substrate, thin films of inorganic compounds such as metal oxides, fluorides, silicides, borides, carbides, nitrides, sulfides, or organic compounds such as silicon-based resins and acrylic resins and fluorine-based resins with different refractive indexes are increased. The refractive index layer and the low refractive index layer are sequentially stacked above the rain layer. Although a single-layer film is easy to manufacture, its anti-reflection property is inferior to that of two or more layers. The four-layer film has anti-reflection ability for a wide wavelength range, and the optical design is less limited by the optical characteristics of the substrate. The film formation of these inorganic compound films can be performed by any of the methods known in the art such as sputtering, ion plating, vacuum evaporation, and wet coating. The film formation of organic compound film can be applied by bar coating, reverse roll coating, according to -52-1225227. V. Description of the invention (51) Wet coating by gravure coating, die coating, roll coating, etc. Methods and other methods known in the past. The visible light reflectance of the surface of the functional transparent layer (U) with anti-reflection property is 2% or less, preferably 1. 3% or less, and 0. Below 8% is better. The functional transparent layer (A) with anti-glare property (AG) means that it has 0 to visible light.  Ιμπι ~ ΙΟμίΏ Transparent layer with slight uneven surface state. Specifically, a thermosetting or light-curing resin such as an acrylic resin, a polysiloxane resin, a melamine resin, a urethane resin, an alkyd resin, or a fluorine resin is used to oxidize the resin. Silicon (S i 1 ica), organic silicon compound, melamine, acrylate and other inorganic or organic compound particles dispersed, ink after the thing, by rod coating, reverse roll coating, gravure coating, die coating, roll Apply by coating, etc., and harden on the substrate. The average particle diameter of the particles is 1 to 40 μm. Alternatively, a thermosetting or light curing resin such as acrylic resin, polysiloxane resin, melamine resin, urethane resin, alkyd resin, fluorine resin, etc. is coated on the substrate, and then squeeze-hardened By forming a shape having a desired haze or surface state, anti-glare properties can also be obtained. It is important to have appropriate bumps and not be limited to the methods described above. The anti-glare haze is 0.  5% or more and 20% or less, preferably 1% or more and 10% or less. If the haze is too small, the anti-glare property will be insufficient, and if the haze is too large, the transmittance of the parallel light will decrease, and the visibility of the display will be poor. -53- 1225227 5. Description of the invention (52) The functional transparent layer (A) with anti-glare anti-glare (ARAG) is obtained by forming the aforementioned anti-reflective film on a film or substrate with anti-glare properties. In this case, if the anti-glare film is a high-refractive-index film, even if the anti-reflection film is a single-layer film, high anti-reflection properties can be imparted. The reflection prevention performed by AR or ARAG can improve the light transmittance of a filter for a display. Since the filter for the display of the present invention is adhered to the display portion of the display via the transparent adhesive layer (C), the substrate glass reflection on the surface of the display portion disappears. Therefore, especially those who form a functional transparent layer (A) having an AR or ARAG function have a low reflection on the surface, thereby improving the tone and color purity of the display. The visible light reflectance on the surface of the functional transparent layer (A) with AR or ARAG function is below 2%, preferably 1.  3% or less, and 0.  Below 8% is better. In order to add abrasion resistance to the display filter, it is preferable that the functional transparent layer (A) also has a hard coat property. The hard coating film includes heat-curable or light-curable resins such as acrylic resin, polysiloxane resin, melamine resin, urethane resin, alkyd resin, fluorine resin, etc. The formation method is not particularly limited. The thickness of these films is about 1 to 100 μL. The hard coating film is used for a high refractive index layer or a low refractive index layer of a functional transparent layer (A) having antireflection properties, and an antireflection film may be formed on the hard coating film so that the functional transparent layer (A) has Both anti-reflection and hard coating properties. Similarly, it can be both anti-glare and hard-coat rain. This feeling. Shape, the hard coating film only needs to have -54- 1225227 according to the dispersion of the particles, etc. 5. The invention description (53) can be uneven, and even if the antireflection film is formed again, it can have both antireflection and antiglare properties. Functional transparent layer (A) with both hard coating properties. The surface hardness of the functional transparent layer (A) having a hard coating property is at least 11, preferably 211, and more preferably 311 or more in accordance with the pencil hardness of 113 (1 [-5400). In addition, the filter for a display is liable to attach dust due to electrostatic charging, and there is a possibility of receiving an electric shock due to electric discharge when the human body comes in contact with it. Therefore, it is necessary to perform a charging prevention treatment. The functional transparent layer (A) may be made conductive in order to impart antistatic ability. In this case, the necessary conductivity is only required if the surface resistance is below 1 011 Ω / □, but the transparency and resolution of the display surface of the display must not be impaired. The conductive layer includes a well-known transparent conductive film including ITO, ultrafine particles of ITO, and conductive films including conductive ultrafine particles such as tin oxide ultrafine particles. In addition, it is preferable that the layer constituting the functional transparent layer (A) having any one or more functions of the aforementioned anti-reflection properties, anti-glare properties, anti-glare properties for reflection prevention, and hard film properties has conductivity. In addition, when silver is used in multilayer films, silver lacks chemical and physical stability, and will be degraded by environmental pollutants, water vapor, etc., causing condensation and whitening. Therefore, it is important to use transparent conductive laminates. The film forming surface of the body is covered with a functional transparent layer (A) having a gas-barrier property, so that the film is not contaminated with pollutants and water vapor in the use environment. The necessary gas shielding property is that the moisture permeability is 10g / m2 -55-1225227. V. Description of the invention (54) • The following. Specific examples of the film having a gas-barrier property include silicon oxide, oxidized bromide, 'tin oxide', Xinghua marriage ', yttrium oxide, magnesium oxide, etc., or a mixture of these, or adding trace amounts of other elements to these oxide In addition to polyvinyl chloride, metal oxide films and acrylic resins, silicone resins, melamine resins, urethane resins, fluorine resins, etc. It is limited to these. The thickness of these films is about 10 to 200 nm in the case of a metal oxide thin film, and about 1 to 100 μm in the case of a resin, and it may be a single layer or multiple layers, but it is not particularly limited. In addition, polymer films with low water vapor permeability include polyethylene, polypropylene, nylon, polyvinylidene chloride, vinylidene chloride and vinyl chloride, vinylidene chloride and acrylonitrile (ac ry 1 oni tri 1 e ) Copolymers, fluororesins, etc., but the moisture permeability is not particularly limited as long as it is 10 g / m2 · day or less. Even if the moisture permeability is relatively high, you can reduce the moisture permeability by increasing the thickness of the film and adding appropriate additives. In addition, the composition has any of the aforementioned anti-reflection properties, anti-glare properties, anti-reflective properties, anti-charge properties, anti-Newton ring liquid (&111; 1-N eut ο η sring) properties, and hard coating properties. The layer of the functional transparent layer (A) having the above functions is preferably a film having a gas-barrier property, or the whole or together with an adjacent transparent adhesive layer can be made to have the gas-barrier property described above. For example, the functional transparent layer (A) with anti-reflection, hard-coating, anti-charging, and gas-barrier properties containing pigments includes poly-p-phenylene-56-1225227. 5. Description of the invention (55) Ethylene diformate Alcohol ester / hard coating film / I TO / Si compound / I TO / Si compound. In addition, it has anti-glare anti-reflective properties, hard coat properties, anti-charge properties, and gas-blocking transparent layers (A) including triethyl cellulose / ITO microparticle-dispersed hard coating films / silicon-containing compounds and the like. Furthermore, it is preferable that the surface of the functional transparent layer (A) has antifouling properties, prevents contamination of fingerprints, etc., and can be easily removed when contaminated. Antifouling substances include those that are non-wet to water and / or grease; for example, compounds that use fluoride and silicon compounds with other functions such as antireflection and antistatic properties must not interfere with these functions. In this case, by using a constituent material of an antireflection film with a low refractive index and coating 1 to several molecules of fluorine-based organic molecules on the outermost surface, it is possible to impart antifouling in addition to maintaining antireflection and antistatic properties. Sex. For example, functional transparent layer (A) with antifouling, anti-reflection, hard-coating, anti-charge, and gas-barrier properties includes hard-coating film / IT0 / silicon-containing compound / IT0 / silicon-containing compound / fluorine Single molecule coatings of organic molecules. In particular, in order to prevent the pigment containing electromagnetic wave shielding body from being deteriorated by ultraviolet rays radiated from the monitor or ultraviolet rays containing external light, the functional transparent layer (A) should preferably have a low ultraviolet reducing property. For example, an antireflection film made of a single layer or multiple layers of an inorganic thin film that absorbs ultraviolet rays, or a base material formed of a functional transparent film containing an ultraviolet absorber, and a functional transparent layer (A) having a hard coating film. The type and concentration of the UV absorber are not special -57-1225227 V. Description of the invention (56) Do not limit. In addition, at least one of the 'transparent adhesive layers' may contain an ultraviolet absorbent. The UV-reducing member must be disposed between the UV-incident surface and the pigment-containing layer. The UV-reducing property varies depending on the durability of the pigment, and is not particularly limited. 8 . The thickness is based on the "Adhesion Dictionary (Japan Asakura Bookstore)", which describes the relationship between the thickness of the support and the adhesive force. "Generally, when the thickness of the support is large, the bending energy increases, and the adhesive force increases However, when it is increased to a certain point, the adhesive force is reduced due to the influence of bending moment (moment) and the like. " The inventors have found that if the overall thickness of the transparent polymer film exceeds 0.  When it is 3 mm or more, it is easy to peel off from the glass surface of the optical filter film. The rigidity of the optical filter film is mainly dominated by the total thickness of the transparent polymer film. Therefore, the effect of the present invention is estimated based on the effect of the above-mentioned bending moment. In addition, by increasing the rigidity of the optical filter film, it can be peeled continuously with an average force, and there is less sticking to the glass plate with the peeling break point as a starting point. Furthermore, by increasing the total thickness of the transparent polymer film, the impact resistance can be improved. The larger the total thickness of the transparent polymer film, the more the impact resistance is improved, but the number of stacked films is increased, which reduces the production efficiency. In addition, the rigidity is greatly increased, which makes it difficult to directly attach to the display. Therefore, the total thickness of the transparent polymer film is not particularly specified, but preferably -58- 1225227 V. Description of the invention (57) is 0. 3 ~ 1. 0mm, while 0. 4mm ~ 0. 8_ is better. In addition, the number of sheets of the transparent polymer film is not particularly limited, but it is preferably two to six, and more preferably two to four. Figures 12 to 17 are cross-sectional views showing examples of the configuration of a filter for a display according to the present invention. In Figure 12, the transparent adhesive layer 30, a transparent polymer film (B) 2 3 (150 μm) with a near-infrared shielding function, and the transparent adhesive layer 30, a functional transparent layer exhibiting a reflection prevention function The transparent polymer film (B) 24 (188 μπ0) of (A) is sequentially stacked to form a filter for a display. In FIG. 13, the transparent adhesive layer 30 and the transparent polymer film (B) for padding 2 5 (200 μm), transparent adhesive layer 30, transparent polymer film (B) with near-infrared shielding function 2 3 (75 μm), transparent adhesive layer 30, functional transparent layer (A) with anti-reflection function The transparent polymer film (B) 24 (80 μm) is sequentially stacked to form a filter for a display. In Fig. 14, the transparent adhesive layer 30 is a transparent polymer film (B) with a near-infrared shielding function. 23 (75 μπι), transparent adhesive layer 30, transparent polymer film (B) 2 5 (200 μιη) for padding, transparent adhesive layer 30, transparent of functional transparent layer (A) having anti-reflection function A polymer film (B) 24 (80 μηι) is sequentially stacked to form a filter for a display. On the 15th figure, it is transparent and sticky Coupling layer 30, transparent polymer film (B) 25 (200 μm) for padding, transparent adhesive layer 30, a functional transparent layer (A) having a function of preventing reflection and a transparent polymer having an infrared shielding function The film (B) 26 (150 μm) is sequentially stacked to form a filter for a display. -59- 1225227 V. Description of the invention (58) On the 16th figure, the transparent adhesive layer 30 is used, and the pad height is used for the transparent high Molecular film (B) 25 (200 μηι), transparent adhesive layer 30, transparent polymer film (B) 23 (75 μπ〇), transparent conductive film (D) having a function of shielding electromagnetic waves, transparent adhesive layer 30, having The transparent polymer film (B) 24 (150 μπο) of the functional transparent layer (A) showing anti-glare function is sequentially stacked, and an electrode 50 is formed on the transparent polymer film 23 to constitute a filter for a display. In Figure 17, a transparent adhesive layer 30, a transparent polymer film (B) 25 (200 μm) for padding, a transparent adhesive layer 30, a functional transparent layer having a function of preventing reflection and a display of electromagnetic waves The transparent polymer film (B) 26 (188 μιη) of the transparent conductive layer (D) of the shielding function is sequentially stacked, and the other is transparent. Electrodes 50 are formed on the polymer films 25 and 26 to constitute a filter for a display. Fig. 18 is a view showing the structure of a transparent polymer film (B) 23 showing the electromagnetic wave shielding function shown in Fig. 16 A cross-sectional view. A transparent conductive layer (D) 10 showing an electromagnetic wave shielding function is formed on a polymer film (B) 20, and a transparent conductive layer (D) 1 0 is a transparent thin film layer (D t) of high refractive index 1 1 and a metal thin film layer (Dni) 12 made of silver or a silver alloy are stacked in the order of D t / Dm / D t / Dm / D t. The transparent adhesive layer 30 is provided on the inside of the burner and can be adhered to the display surface of the display. Fig. 19 is a sectional view showing the structure of a transparent polymer film (B) 26 showing the electromagnetic wave shielding function shown in Fig. 17. The transparent conductive layer (D) 10 showing the electromagnetic wave shielding function is formed on the polymer film (b) 20. The transparent conductive layer (D) 1 0 is a high-refractive transparent thin film layer (dt) 1 1 and silver-60-1225227 V. Description of the invention (59) or silver alloy as the metal thin film layer (Dm) 1 2 is stacked in the order of Dt / Dm / Dt / Dm / Dt / Dm / Dt. An antireflection film 61 is provided on the opposite surface of the polymer film (B) 20 as a functional transparent layer (A). The transparent adhesive layer 30 is provided inside the filter and can be adhered to the display surface of the display. Figure 20 is a plan view of the display filter shown in Figure 16 or Figure 17. The plane shape of the filter is rectangular, and the image displayed on the display is viewed through the center of the filter. An electrode 50 electrically connected to the transparent conductive layer is formed on the peripheral portion including the long side and the short side of the filter, and the electrode 50 is connected to the ground terminal of the display. 9 . Electrodes Electromagnetically shielded machines. A metal layer is placed inside the machine's case, or the case uses a conductive material to block the radio waves. If transparency such as the display surface of a display is required, a window-type electromagnetic wave shielding body forming a transparent conductive layer is provided. After electromagnetic waves are absorbed on the conductive layer, electric charges are generated. Therefore, if the electric charges are not lost by grounding, the electromagnetic wave shielding body will become an antenna to oscillate the electromagnetic waves and reduce the electromagnetic wave shielding ability. Therefore, the grounding part of the electromagnetic wave shielding body and the display body must be electrically connected. Therefore, as shown in FIG. 3, if the transparent adhesive layer (C) and the functional transparent layer (A) are formed on the transparent conductive layer (D), the transparent adhesive layer (c) and the function The transparent transparent layer (A) preferably has a conductive portion on the transparent conductive layer (D). The shape of the conductive portion is not particularly limited, but it is important that it is in the electromagnetic wave-61-1225227. 5. Description of the invention (6) The shield There must be no leakage gap between electromagnetic waves and the display body. The electrode of the present invention refers to a conducting portion where the electromagnetic wave shielding body is electrically connected to an external line. The conductive portion may be an exposed portion of the transparent conductive layer, or a conductive metal paste may be printed on the exposed portion for protection and good electrical contact, or a conductive tape, a conductive adhesive, etc. Conductive material. Alternatively, the functional transparent layer may be formed to be electrically connected to the transparent conductive layer. As described above, the shape and material of the electrode are not particularly limited, but it is preferable to form the electrode such that the exposed portion of the transparent conductive layer is covered with a conductive material. In addition, the electrode of the present invention can also be produced by contacting a conductive material with a fractured portion of the film of the present invention containing a transparent conductive layer. The so-called broken surface, at least the transparent conductive layer of the film containing the transparent conductive layer can be observed to form a transparent conductive layer and the protective film is formed into a layer, but as long as the transparent conductive layer and the broken surface are contacted with an appropriate conductive material , You can get the desired electrode. In this case, if the end portion of the transparent adhesive layer formed on the transparent conductive layer is more retracted inside than the end portion of the transparent conductive layer, it is good that the conductive paste enters the electrode if a conductive paste is used to form the electrode. The gap portion increases the contact area between the transparent conductive layer and the electrode. Figs. 21 to 25 are cross-sectional views showing a configuration example of a display filter according to the present invention. In Figure 21, the transparent adhesive layer 30, the transparent polymer film (B) 2 3, and the transparent conductive layer (D) 10 are anti-glare films of functional transparent layer (A) -62- 1225227 5. Description of the invention (61) 71 is sequentially stacked, and an electrode 50 is formed on the transparent conductive layer (D) 10 to form a filter for a display. In Fig. 22, from the outside air side to the display side, an anti-glare film 71, a functional transparent layer (A), a transparent polymer film (B) 2 3, and a transparent conductive layer (D) 10 are sequentially The electrodes are stacked on the periphery of the transparent conductive layer (D) 10. A transparent adhesive layer 30 is provided on the central portion of the transparent conductive layer (D) 10 except for the electrode 50, so that the transparent conductive layer (D) 10 can be adhered to the display surface of the display. In Fig. 23, the transparent adhesive layer 30, the transparent polymer film (B) 2 3, and the transparent conductive layer (D) 1 0 are anti-glare films 7 1 which are functional transparent layers (A). An electrode 50 is formed on the side end surface of the laminated body to form a lamination device for a display. In Fig. 24, the transparent adhesive layer 30, the transparent conductive layer (D) 10, and the transparent polymer film (B) 23 are anti-glare films 71 which are functional transparent layers (A), and are sequentially stacked, and Between the transparent adhesive layer 30 and the transparent conductive layer (D) 10, a conductive tape 5 having a copper tape or the like is inserted into the peripheral portion of the filter to ensure electrical connection with the transparent conductive layer (D) 10. . In FIG. 25, the transparent adhesive layer 30, the transparent conductive layer (D) 10, and the transparent polymer film (B) 2 3 are sequentially laminated anti-glare films 71 which are functional transparent layers (A). A through-hole electrode 52 ′ is formed in the thickness direction of the filter to ensure the electrical connection of the transparent conductive layer (D) 10. Fig. 26 is a plan view of a filter for a display device shown in Figs. 21 to 25; The plane shape of the filter is rectangular, which is displayed on the display -63- 1225227 V. Description of the invention (62) The image is viewed at the center of the transparent filter. On the two long sides of the filter, there are provided electrodes 50, a conductive tape 51 or a through-hole electrode 52, which are electrically connected to the transparent conductive layer, and these electrodes are connected to the ground terminal of the display. In addition, as a matter of course, the electrodes of the display filter shown in Figs. 21 to 25 can also be made, and as shown in the plan view of Fig. 20, arranged along the entire circumference of the filter. As shown in FIG. 24, a conductive tape such as a copper tape can also be inserted between the transparent conductive layer and the transparent adhesive layer bonded thereon, and a part of the conductive tape can be led out of the electromagnetic wave shielding body to form an electrode. . In this case, the external conductive tape system is substantially used as an electrode. As shown in FIG. 25, a gap may be provided from the transparent conductive layer to the outermost surface of the electromagnetic wave shielding body to form an electrode. The shape of the gap that can be seen from the surface is not particularly specified, and both round and angular shapes are acceptable. In addition, the formation of a line shape is not a problem. The size of each gap that can be seen from the surface is not specified. However, if it is too large, it will not meet the visual recognition part. The formation position of the gap is not particularly specified as long as it avoids the visual recognition part. Must be located near the end. The number of gaps to be formed is not particularly limited, but it is preferable to set as many as possible along the entire circumference to improve the efficiency of current extraction. The gap may be provided between the transparent conductive layer and the outermost surface of the electromagnetic wave shielding body, but it is preferable to penetrate the transparent conductive layer (D) from the viewpoint of increasing the contact area with the formed electrode. There is no special designation regarding the buried gap. It can be buried with a metal member 'or it can be buried with a conductive paste. In this case, the part where the gap is buried -64- 1225227 V. Description of the invention (63) The material system essentially becomes an electrode. The conductive portion is preferably provided continuously on the peripheral portion of the transparent conductive layer (D). That is, it is preferable to provide a frame-shaped conductive portion other than the central portion of the display portion belonging to the display. However, even if the conductive portion is not formed on the entire circumference of the transparent conductive layer (D), it has a certain electromagnetic wave shielding ability. Therefore, considering the amount of electromagnetic waves generated from the device and the amount of allowed electromagnetic wave leakage, it can be used as it is. less. For example, if a conductive material is applied to the opposite sides of a rectangle to form an electrode, an electrode can be formed by a roll-to-roll method, or an electrode in a roll-like state can be formed, so the optical can be produced with very good production efficiency. Filters are ideal. In addition, this method can also be applied to the case where the conductive tape is used as an electrode. There is no particular problem even if another electrode is formed on a portion other than the opposite sides of the rectangle, or a portion where no electrodes are formed on one of the opposite sides. The electrode covering the conductive portion also serves as a protection for the transparent conductive layer (D), which has poor environmental resistance and scratch resistance. The material used for the electrode considers the conductivity, corrosion resistance, and adhesion to the transparent conductive film, etc., and can use single or two or more monomers such as silver, gold, copper, platinum, nickel, aluminum, chromium, iron, zinc, and carbon. The prepared alloy, a synthetic resin, and a mixture of these monomers or alloys' or a paste made of a borosilicate (b ο 1 · si 1 icate) glass and a mixture of these monomers or alloys. The method of forming the electrode can be electroplating, -65-1225227 V. Description of the invention (64) Vacuum evaporation method, sputtering method, etc. As for the pasting method, printing, coating method and other known methods can be used. . The conductive material used is not particularly specified as long as it can conduct electricity. Usually, a conductive material such as a silver paste is used as a paste. If the electrode is formed in a paste form, it is applied to the section and dried. The conductive material can also be applied to the side of the roll-shaped film. In the case of roll-to-roll, it can be applied to the side when the film is spread. In addition, a strip-shaped conductive material can also be used. In addition, a transparent polymer film of a transparent conductive thin film layer formed on a transparent support substrate can also be bonded and applied to a fractured surface. In the coating method, the screen printing method is often used from the viewpoint of efficiency and accuracy. In addition, in the case where the gap is formed by the metal member to form an electrode, the electromagnetic shielding body itself may not be processed in advance. As long as a metal grounding part with a shaped screw hole is provided on the outer periphery of the display device in advance, the electromagnetic wave shielding body is pasted on the display part of the display device, including the metallic grounding part, and then the electromagnetic wave shielding body is penetrated, and then The conductive screw can be buried in the screw hole of the metal ground part. In this case, the conductive screw acts essentially as an electrode. With this method, the roll-to-roll method can be used not only to produce the electromagnetic wave shielding body with high productivity, but also to easily form electrodes on the entire periphery of the electromagnetic wave shielding body. 1 0. Electromagnetic wave shielding In order to limit the electricity leaked from the electromagnetic wave shielding body and the display device -66- 1225227 V. Description of the invention (65) The minimum amount of magnetic waves is to minimize the insulation space between the conductive layer of the electromagnetic wave shielding body and the display device. The disadvantage is that if air and other insulation are present in the gap, electromagnetic waves will leak from there to the outside. In the past, when a transparent conductive film was bonded to a supporting substrate to make an electromagnetic wave shielding body, a supporting substrate mainly composed of an insulator exists between the transparent conductive layer and the display device. If there is no edge between the transparent conductive layer and the display device, If it is contacted all the time to maintain conductivity, a sufficient electromagnetic wave blocking effect cannot be obtained. Therefore, in the manufacturing process of the electromagnetic wave shielding body, a step of pasting the film on the transparent support substrate one by one and a step of forming an electrode on the entire peripheral portion by the film are needed. In the present invention, when the electromagnetic wave shielding body in a thin film state is directly attached to a display device, the distance between the conductive layer and the display device is very close, compared with the previous method, the insulation space can be greatly narrowed, even if it is not The formation of an electrode on the peripheral portion is also ideal because it can fully obtain the electromagnetic wave blocking effect. In this case, the case where the transparent conductive layer of the electromagnetic wave shielding body is formed on the display device side is particularly remarkable. That is, a sufficient electromagnetic wave blocking effect can be obtained by forming electrodes only on the two long sides of the rectangle. In this case, the manufacturing method can be a highly productive roll-to-roll method, which is very desirable. 11. Display device and manufacturing method thereof The display device of the present invention includes a filter for a display which functions as an electromagnetic wave shielding body and / or a light control film adhered to a display portion of the device. The electromagnetic wave shielding system is in electrical contact with the display device. -67- 1225227 V. Description of the invention (66) The method of the display device related to the present invention mainly includes the following (丨) ~ (100) methods, but is not limited to these methods. Method U) ·· Functional transparent layer (A) and conductive portion (and electrode) / transparent conductive layer (D) / polymer film (B) (and hard coat layer (F)) / transparent adhesive layer (C ), Or functional transparent layer (A) and conductive portion (and electrode) / transparent adhesive layer (C) / transparent conductive layer (D) / polymer film (B) (and hard coat layer (F)) / transparent The electromagnetic wave shielding body of the present invention with the adhesive layer (C) is bonded on the display portion of the display with the transparent adhesive layer (C) as the bonding surface. After the bonding, the conductive part of the electromagnetic shielding body of the present invention or the electrode formed on the conductive part, the conductive part or the conductive part of the display device is formed by a conductive tape, a conductive adhesive, a conductive paint, or a conductive molded part. That is, the electrical connection of the grounding section. Method (2): A laminated body composed of a transparent conductive layer (D) / polymer film (B) (and a hard coat layer (F)) / a transparent adhesive layer (C) in order is a transparent adhesive layer (C) As the bonding surface, it is bonded to the display part of the display. After the bonding, the conductive part is left on the transparent conductive layer (D), and the functional transparent layer (A) is formed directly or through the transparent adhesive layer (c). A conductive tape, a conductive adhesive, a conductive coating, or a conductive molded part electrically connects the conductive portion of the laminated body and the conductive portion of the display body, that is, the ground portion. Method (3): coating or bonding the transparent adhesive layer (C) on the display portion of the display device, the functional transparent layer (A) and the conductive portion (and electrode) / transparent conductive layer (D) / polymer film (B) (and hard coat layer (F)) The laminated body is formed by using polymer film (B) as the bonding surface, and the conductivity is bonded after bonding. -68-1225227 V. Description of the invention (67) Or a conductive adhesive, a conductive paint, or a conductive molded part electrically connects the conductive part of the integrated layer and the conductive part of the display device body, that is, the ground part. Method (4) ·· Coating or bonding the transparent adhesive layer (C) to the display portion of the display device, and applying the transparent conductive layer (D) / polymer film (B) (and the hard coat layer (F)) The transparent laminated body composed of the sequence is bonded with the polymer film (B) as the bonding surface. After bonding, the transparent conductive layer (D) is used to form a functional layer directly or through a second transparent adhesive layer except for the remaining conductive portion. The transparent layer electrically connects the conductive portion of the laminated body and the conductive portion of the display body, that is, the grounding portion, by a conductive tape or a conductive adhesive or a conductive paint or a conductive molded part. Method (5) ·· A magnetic wave shielding body made of a functional transparent layer (A) / polymer film (B) / transparent conductive layer (D) / transparent adhesive layer (C) and a conductive adhesive layer is used to: The transparent adhesive layer (C) is an adhesive surface that is attached to at least the display portion of the display device, and a conductive adhesive layer is used to attach at least to the ground portion of the display device. Method (6): at least the display portion of the display, or at least the transparent conductive layer (D) of the transparent conductive layer (D) / polymer film (b) / functional transparent layer (a) in order A transparent adhesive layer (C) 'is formed on the light-transmitting portion on the top surface of the display device. In addition, a conductive adhesive layer is formed on at least the ground portion of the display device or the conductive layer (D) of the laminated body. Body and display device fit together. $ & (7): The functional transparent layer (A) / polymer film (B) / transparent-69-1225227 V. Description of the invention (68) Ming conductive layer (D) / transparent adhesive layer (c) and A conductive adhesive layer is formed, and an electromagnetic wave shielding body, which is a part of a conductive tape such as a copper tape, is inserted between the transparent conductive layer (D) and the polymer film (B) on the end portion, and the transparent adhesive layer is used. (C) is a bonding surface that is bonded to at least the display portion of the display device, and that the external exposed portion of the conductive tape is bonded to at least the ground portion of the display device. Method (8): forming at least the display portion of the display device, or at least the transparent conductive layer (D) / polymer film (B) / functional transparent layer (A) in sequence, 'on the end portion on the transparent conductive layer ( D) A transparent adhesive layer (C) is formed on the transparent part of the transparent conductive layer (D) of the laminated body in which a part of a conductive tape such as a copper tape is interposed between the polymer film (B) and the polymer film (B). After the conductive adhesive layer is formed on at least a ground portion of the display device or the transparent conductive layer (D) of the multilayer body, the multilayer body and the display device are bonded together. The electromagnetic wave shielding body of the present invention has excellent transmission characteristics, transmittance, and visible light reflectance. Therefore, it does not significantly damage the brightness of the plasma display because it is formed on the plasma display, but can improve its color purity and tone. . In particular, the excellent blocking ability of so-called electromagnetic waves that are harmful to human health generated by the plasma display is excellent. In addition, the near-infrared rays near the 800 to 1 100 nm generated by the plasma display can be effectively reduced, so The wavelengths used for remote control of electronic equipment, optical communication of transmission systems, etc. will not have an adverse effect, so that the malfunction of these machines can be prevented. In addition, it has excellent weather resistance and environmental resistance, and has both anti-reflection and / or anti-glare properties, scratch resistance, anti-fouling properties, and anti-charge properties, and can be provided at a low cost. With the electromagnetic wave shielding body of the present invention, it is possible to provide a plasma display having the excellent characteristics of -70-1225227 V. Invention Description (69). The electromagnetic wave shielding body of the present invention has excellent optical characteristics, electromagnetic wave shielding ability, and near-infrared light reduction ability. Therefore, it can be used not only in a plasma display, but also in a FED that generates electromagnetic waves and / or near-infrared rays. Field emission display), CRT (cathode ray tube) and other displays. As for the method of manufacturing a display device having a dimming film, there are mainly two methods described below, but they are not limited to these two methods. Method (9): At least a functional transparent layer (A) / polymer film (B) / the light modulating film of the present invention which is a transparent adhesive layer (C), and the transparent adhesive layer (C) is used as a bonding surface Laminated on at least the display portion of the display device. Method (10): forming a transparent adhesive layer (C) on at least a display portion of a display device, and a polymer film (B) of a laminated body composed of at least a transparent conductive layer (D) / polymer film (B) in order The) surface is bonded to the display device. The light-adjusting film of the present invention is excellent in transmission characteristics, transmittance, and reflection characteristics. Therefore, the brightness of the display is not significantly damaged by directly forming the display portion of the display such as a color plasma display, and the color of the display can be improved Purity and tone. In addition, it has both scratch resistance, antifouling properties, and antistatic properties, and can be provided at low cost. In addition, the light-adjusting film of the present invention is formed directly on the display surface, thereby providing a display device having excellent characteristics. (Embodiments) The present invention will be described more specifically with reference to the following examples. However, the present invention is not -7 1-1225227 5. The invention description (70) does not limit these embodiments. The thin film constituting the transparent conductive layer (D) in the embodiment is formed on the main surface on one side of the substrate by a magnetron direct current (DC) sputtering method. The thickness of the thin film is determined based on the film formation conditions, and is not the actual measured film thickness. The high-refractive-index transparent thin film layer (D t) is formed of an I TO thin film, and the target film is made of an indium oxide / tin oxide sintered body (composition ratio ln 2 0 3: SnO2 = 90: 10wt%) or tin oxide. Bulk, sputtering gas system uses argon. An oxygen mixed gas (total pressure: 266 mP a: oxygen partial pressure: 5 mPa) was used to form a film. The metal thin film layer (Dm) is formed by a silver thin film or a silver-palladium alloy thin film. The target is silver or a silver-palladium alloy (palladium 10 w t%), and the sputtering gas is argon (full pressure 266mPa) to form a film. . In addition, the surface resistance of the transparent conductive layer is measured by a four-probe measurement method (probe spacing is 1 mm). In addition, the visible light reflectance (R vis) on the surface is first cut out a small edge of the measurement object, removing the transparent adhesive layer, and then roughening the surface of the polymer film (B) side with sandpaper to eliminate gloss and spray. Black makes this surface non-reflective. Measure the total light reflectance in the visible field by using a spectrophotometer (U- 3 400) manufactured by (Company) Hitachi, Ltd. using a reflection integrating sphere (light incident angle 6 °). 106 Calculated from the measured reflectance. (Example 1) A biaxial (orientation) stretched polyethylene terephthalate (hereinafter referred to as -72-1225227) V. Description of the invention (71) is a PET film (thickness: 188 μm) as a polymer film (A), I TO film (film thickness, silver film (film thickness: 1 lnm)), IT0 film (film thickness: 95nm) film (film thickness: 14nm) are sequentially stacked on the main surface of PET from PET film. , IT0 thin film (film thickness: 90nm), silver thin thickness: 12nm), IT0 thin film (film thickness: 40ηπι) counts 7 layers, so that it has a sheet resistance of 2. 2Ω / □ Transparent laminated body with transparent guide 1 A cross-sectional view showing an example of the molecular film (B) / transparent conductive layer (D) of the present invention is taken as a cross-section of the PTE film / transparent conductive layer. In Figure 1, symbol 10 is a transparent conductive layer (D), symbol is a high refractive index transparent thin film layer (Dt), symbol 12 is a gold I layer (Dm), and symbol 20 is a high Molecular film (B). The organic pigment is dispersed and dissolved in a solvent of ethyl acetate / toluene (5 05 Owt%) to serve as a diluent for an acrylic adhesive. The enoic acid-based adhesive / pigment is mixed with a diluent (80: 20wt%), and a cloth machine (comma coateO is applied to the surface of the polymer film of the transparent laminated body 1 to apply a dry film thickness of 25 μm, and then dried and bonded. ® Separated film, thus forming a transparent adhesive layer (C) (adhesive 1) sandwiched between the isolating film and the transparent polymer film (B). The refractive index of the adhesive 1 is 1 .  5 1. The extinction coefficient is 0. Organic pigments are pigments made by Mitsui Chemicals, PD-319, which have unnecessary light-emitting parts that have the maximum absorption of wavelengths of 5 9 5 nm. Plasma displays. The chromaticity side: 40 nm), the silver thin film (film i is conductive [layer (B) is in No. 1 1 1 Shu film mixed with acrylic dot coating (B) side, superimposed on the laminated body. Furthermore. Absorption (Company) Mitsui-73-1225227 5. Description of the invention (72) Red pigment PS-Red-G made by Chemical (Company), and then adjust acrylic adhesive / pigment into the diluent to make the adhesive after drying. Material 1 contains 1150 (wt) ppm and 1050 (wt) ppm, respectively; further, PD-319 is a tetra-third-butyl-tetraazaporphyrin vanadium (vanady 1) represented by the following formula (3) Coordination compound.

(3) 在三乙醯基纖維素(TAC)膜(厚度:80μηι)之一側之主 面上添加光聚合開始劑於多官能甲基丙烯酸酯 (multifunctional methacrylate)樹脂,另藉照相凹板 塗布機進行塗佈其內有分散I TO微粒子(平均粒徑: 1 0 n m )之塗佈液,再藉紫外線硬化形成導電性硬塗膜(膜 厚:3μιη),另再藉微照相凹板塗佈機於其上塗佈含氟 有機化合物溶液,然後在9 0 °C下乾燥,熱硬化以形成 折射率爲1 · 4之反射防止膜(膜厚:lOOnm),從而製得 作爲具有硬塗性(nSK5 400規定鉛筆硬度:2H),氣體 遮斷性(ASTM-E96標準’ 1 . 8g/m2 ·日),反射防止性( 表面之Rvis: 1.0%),帶電防止性(面電阻:7χ109Ω /(3) Add a photopolymerization initiator to a multifunctional methacrylate resin on the main surface of one side of the triethyl cellulose (TAC) film (thickness: 80 μηι), and apply it by photogravure The coating liquid containing the dispersed I TO fine particles (average particle diameter: 10 nm) is applied by a machine, and then a conductive hard coating film (film thickness: 3 μιη) is formed by ultraviolet curing, and then coated by a microphotographic gravure plate. The cloth machine was coated with a fluorinated organic compound solution, and then dried at 90 ° C, and then heat-hardened to form an antireflection film (film thickness: 100 nm) with a refractive index of 1.4. (NSK5 400 prescribed pencil hardness: 2H), gas-blocking property (ASTM-E96 standard '1.8g / m2 · day), anti-reflection property (Rvis on surface: 1.0%), anti-charge property (area resistance: 7 × 109Ω /

-74- 1225227 五、發明說明(73) □),防污性之功能性透明層(E )之反射防止膜1。於反 射防止膜1之另側之主面上塗佈與粘接材1相同素材, 未添加色素之粘接劑/稀釋液,並施予乾燥以形成厚 度爲25μιη之透明粘接層(粘接材2),另再疊積疏離型 膜。 將捲筒狀之透明積層體1 /粘接材1 /疏離型膜裁斷 成9 7 0mmX 5 7 0mni,接著將透明導電層(D)面置於玻璃製 之支撐板上並固定。然後,使用疊積器使透明導電層(D) 之周緣部20mm露出那樣僅在內側疊積反射防止膜,從 而餘留導通部。將自透明導電層(D)之面看到之平面圖 示於(第2圖)以作爲表示本發明之電磁波遮蔽體之一例 之平面圖。第2圖上,符號02係爲電磁波遮蔽體之透 光部,符號0 3係爲電磁波遮蔽體之導通部。 再者;藉網板印刷將銀糊(三井化學(公司)製之MSP-6 0 0F)印刷於周緣部之22mm寬之範圍內以被覆透明導電 層(D)露出之導通部,並施予乾燥後形成厚度爲15μιη 之電極。自支撐板拆離後在透明粘接層(C)上製成具有 疏離型膜之本發明之電磁波遮蔽體。 另外,剝離該電磁波遮蔽體之疏離型膜後藉逐張式 疊積器將其貼合於電漿顯示器之顯示板之前面(顯示部 9 2 0mm X 5 20mm ),接著,在 6 0°C , 2 X 1 05Pa 之力口壓力口溫 接 ve粘 la箔 OC銅 ut性 (a電 釜導 壓之 高製 行所 進作 下製 件岡 條寺 處 帶 用接 H7 ¢1 使遵 後R) 然 ο 司 公 波 磁 -75- 1225227 五、發明說明(74 ) 遮蔽體之電極部和該電漿顯示板之接地部,從而得出具 備本發明之電磁波遮蔽體之顯示裝置。作爲本發明之電 磁波遮蔽體和其之裝設狀態之一例之該電磁波遮蔽體之 斷面係示於第3圖。第3圖上,符號〇〇係爲顯示器顯 示部,符號1 0係爲透明導電層(D ),符號2 0係爲高分 子膜(B ),符號3 1係爲含有色素之透明粘接層(c ),符 號4 0係爲透明粘接層(E ),符號5 0係爲電極,符號6 0 係爲具有反射防止性,硬塗性,氣體遮斷性,靜電防止 性’防污性之功能性透明層(A ),符號6 1係爲具有防污 性之反射防止膜,符號62係爲具有帶電防止性之硬塗 膜,符號6 3係爲形成硬塗膜6 2及反射防止膜6 1之透 明基材,符號80係爲導電性銅箔粘接帶。 (實施例2 ) 將白色發光之色度補正用之三井化學(公司)製之紅 色色素PS-Red-G 0 . Olwt%,及前述相同公司製之紫色 色素PS - Vi ο 1 e t-RC 0 . 0 1 5w t %混合於聚對苯二甲酸乙二 醇酯糊1203(優尼佳(公司)製)內,然後,在260〜280 °C之溫度下使其溶融,接著,藉擠壓機製成厚度200μιτι 之膜。然後,將此膜執行雙軸拉伸以製成含有厚度爲 lOOpm之色素之色素摻入PET膜[高分子膜(Β)]。 藉照相凹板塗布機將以冰醋酸加水分解之烷氧基矽 烷(a lkoxy s i 1 ane )之物內添加矽系表面平滑劑之塗佈液 塗佈於該PET膜之一側之主面上,並在12(TC之溫熱硬 -76- 1225227 五、發明說明(75 ) 化以形成硬塗膜(膜厚:ΙΟμπι,鉛筆硬度:3H) ’從而 製成含有形成硬塗層(F)之色素之PET膜。於該硬塗膜 上依序形成Sn02薄膜(膜厚:40nm),銀薄膜(膜厚: 9nm),Sn02薄膜(膜厚:80nm),銀-銷合金薄膜(膜厚 :llnm),Sn02薄膜(膜厚:40nm)計5層,面電阻爲5.3 Ω/□之透明導電層(D),從而製成係爲含有色素之PET 膜/硬塗層(F)/透明導電層(D)之透明積層體2。 在透明積層體2之PET膜面上塗佈與粘接材1相同 之素材,不摻入色素之粘接劑/稀釋液,並施予乾燥 以形成厚度爲25μπι之透明粘接層(C)(粘接材3 ),接著 再疊積疏離型膜。 將捲筒狀之透明積層體2/粘接材3/疏離型膜裁斷 成9 70mmX 5 70mm之大小,將透明導電層(D)之面置於玻 璃製支撐板上並固定。 添加光聚合開始劑於多官能甲基丙烯酸酯樹脂,另 再調製分散有有機二氧化矽微粒子(平均粒徑:1 5μπι) 之塗佈液。 藉只在透明導電層(D )之內側進行撓曲印刷使露出 2 0mm寬之周緣部俾餘留導通部,然後施予紫外線硬化 以形成作爲具有防眩性(白度計(H a ζ 〇 m e t e r )測定之混濁 値:5%),硬塗性(鉛筆硬度:2H)之功能性透明層(A)之 防眩層。從支撐板拆離,如此則製成在透明粘接層(C ) 之面上具有疏離型膜之本發明之電磁波遮蔽體。 -77- 1225227 五、發明說明(76 ) 再者,剝離該電磁波遮蔽體之疏離型膜,藉逐張式 疊積器貼合於電漿顯示板之前面(顯示部9 2 0inm X 5 20mm) ,然後在60°C,2 X 105Pa之加壓加溫條件下進行高壓 釜處理。最後用(公司)寺岡製作所製之導電性銅箔粘接 帶(5 1 0FR )連接電磁波遮蔽體之導通部和該電漿顯示器 面盤之接地部,如此製成具備本發明之電磁波遮蔽體之 顯示裝置。 作爲本發明之電磁波遮蔽體和其裝設狀態之一例之 該電磁波遮蔽體之斷面係示於第4圖。第4圖上,符號 00係爲顯示器顯示部,符號1 〇係爲透明導電層(D ), 符號2 1係爲含有色素之高分子膜(B ),符號22係爲硬 塗層(F),符號30係爲透明粘接層(C),符號70係爲防 眩層(具有防眩性,硬塗性之透明粘接層(E )),符號80 係爲導電性銅箔粘接帶。 (實施例3) 與實施例1相同地製作高分子膜(B ) /透明導電層(D ) 之積層體。 另於捲成捲筒狀之上述PET膜/與透明導電層(D)相 反側之PET膜之主面上藉輥對輥連續地形成作爲下述功 能性透明膜1之功能性透明層(A )。亦即,添加光聚合 開始劑於多官能甲基丙烯酸酯樹脂,另再藉照相凹板塗 佈機進行塗佈分散有ITO微粒子(平均粒徑:10nm)之塗 佈液,然後施予紫外線硬化以形成導電性硬塗膜(膜厚 -78- 1225227 五、發明說明(77 ) 3μιη ),另外,再藉微照相凹板塗佈機塗佈含氟有機化 合物溶液,然後使之在9 0 °C下乾燥,硬化以形成具有 折射率爲丨.4之反射防止膜(膜厚:1 OOnm),硬塗性 (JIS K5 400標準之鉛筆硬度:2H),反射防止性(表面 之R v i s ·· 0 · 9 % ),帶電防止性(表面電阻:7 X 1 09 Ω / □) ,防污性之功能性透明層(A )。將上述之捲筒狀之功能 性透明層(A) /高分子膜(B) /透明導電層(D)裁斷成 9 7 0mmX 5 7 0_大小,將透明導電層(B)之面置於玻璃製 支撐板上並固定。將有機色素分散,溶解於醋酸乙酯/ 甲苯(5 0 : 5 Ow t % ),以作成丙烯酸系粘接劑之稀釋液。 混合丙烯酸系粘接劑/色素摻入稀釋液(80 : 2 Owt%),藉 分批(batch)式之模塗布機塗布在透明導電層(D)上,除 周緣部22mm寬外,塗布乾燥膜厚25μπι,然後使之乾燥 以形成作爲透明粘接層(C )之粘接材1。另外,粘接材1 之折射率係爲1 · 5 1,消光係數係爲〇。 有機色素係使用對波長5 9 5 n m具有極大吸收,用於 吸收電漿顯示器放射之光中不要之光之三井化學(公司) 製之色素PD-319,及補正白色發光之色度用之三井化 學(公司)製之紅色色素PS-Red-G,藉調整丙烯酸系粘 接劑/色素摻入稀釋液使在乾燥後之粘接材1內之含 量分別爲 1150(wt)ppm, 1050(wt)ppm。 PD-319 係爲以 式(3)表示之四-第三丁基-四氮雜卟啉氧釩之配位化合 物0 -79- 1225227 五、發明說明(78 )-74- 1225227 V. Description of the invention (73) □), antifouling anti-reflection film 1 of functional transparent layer (E). Apply the same material as the adhesive material 1 to the main surface on the other side of the anti-reflection film 1 without adding an pigment / dilution agent and dry it to form a transparent adhesive layer with a thickness of 25 μm (adhesion 2), and then stacked with a separation film. The roll-shaped transparent laminated body 1 / adhesive material 1 / isolated film was cut into 970 mm × 570 mm, and then the transparent conductive layer (D) surface was placed on a glass support plate and fixed. Then, the anti-reflection film was stacked only on the inner side of the transparent conductive layer (D) so that the peripheral portion of the transparent conductive layer (D) was 20 mm exposed using a stacker, leaving a conductive portion. A plan view seen from the surface of the transparent conductive layer (D) is shown in FIG. 2 as a plan view showing an example of the electromagnetic wave shielding body of the present invention. In Fig. 2, reference numeral 02 is a light transmitting portion of the electromagnetic wave shielding body, and symbol 0 3 is a conducting portion of the electromagnetic wave shielding body. Furthermore, a silver paste (MSP-6 0 0F manufactured by Mitsui Chemicals, Inc.) was printed on a 22 mm wide peripheral portion by screen printing so as to cover the conductive portion exposed by the transparent conductive layer (D) and apply it to After drying, an electrode having a thickness of 15 μm was formed. After the self-supporting plate is detached, the electromagnetic wave shielding body of the present invention having a detachable film is formed on the transparent adhesive layer (C). In addition, after peeling off the detachable film of the electromagnetic wave shielding body, it was attached to the front surface of the display panel of the plasma display (display part 9 20mm X 5 20mm) by a sheet laminator, and then at 60 ° C , 2 X 1 05Pa, the force port pressure port warm connection ve sticky la foil OC copper ut properties ) Ran 公 company magnetic wave-75-1225227 5. Description of the invention (74) The electrode part of the shielding body and the grounding part of the plasma display board, so as to obtain a display device provided with the electromagnetic wave shielding body of the present invention. The cross section of the electromagnetic wave shielding body as an example of the electromagnetic wave shielding body of the present invention and its installation state is shown in Fig. 3. In Figure 3, the symbol 〇 is a display portion, the symbol 10 is a transparent conductive layer (D), the symbol 20 is a polymer film (B), and the symbol 31 is a transparent adhesive layer containing a pigment. (C), the symbol 40 is a transparent adhesive layer (E), the symbol 50 is an electrode, and the symbol 60 is anti-reflection, hard-coating, gas-barrier, and anti-static. The functional transparent layer (A), symbol 6 1 is an anti-fouling anti-reflection film, symbol 62 is a hard coating film with anti-charge property, and symbol 6 3 is a hard coating film 62 and reflection prevention The transparent substrate of film 61, symbol 80 is a conductive copper foil adhesive tape. (Example 2) The red pigment PS-Red-G 0. Olwt% manufactured by Mitsui Chemicals (Co., Ltd.) and the purple pigment PS-Vi ο 1 e t-RC manufactured by the same company were used to correct the chromaticity of white light. 0. 0 1 5w t% is mixed in polyethylene terephthalate paste 1203 (manufactured by Unicam (company)), and then melted at a temperature of 260 to 280 ° C, and then extruded The press is made into a film with a thickness of 200 μm. Then, this film was subjected to biaxial stretching to make a pigment-doped PET film [polymer film (B)] containing a pigment having a thickness of 100 μm. A gravure coating machine was used to apply a coating solution containing a silicon-based surface smoothing agent to an alkoxy si 1 ane hydrolyzed with glacial acetic acid to the main surface of one side of the PET film. And at 12 (Temperature Hardening of TC-76-1225227 V. Description of the Invention (75) to form a hard coating film (film thickness: 10 μm, pencil hardness: 3H) 'to make a hard coating (F) A pigmented PET film. On this hard coating film, a Sn02 film (film thickness: 40nm), a silver film (film thickness: 9nm), a Sn02 film (film thickness: 80nm), and a silver-pin alloy film (film thickness) are sequentially formed. : llnm), 5 layers of Sn02 thin film (film thickness: 40nm), transparent conductive layer (D) with a surface resistance of 5.3 Ω / □, thus made into a PET film containing pigments / hard coating (F) / transparent Conductive layer (D) transparent laminated body 2. The PET film surface of the transparent laminated body 2 is coated with the same material as that of the adhesive material 1, and an adhesive / diluent without pigment is added, and dried to form The transparent adhesive layer (C) (adhesive material 3) with a thickness of 25 μm is then laminated with the release film. The roll-shaped transparent laminate 2 / adhesive material 3 / release film is cut The size is 9 70mmX 5 70mm, and the surface of the transparent conductive layer (D) is placed on a glass support plate and fixed. A photopolymerization initiator is added to the polyfunctional methacrylate resin, and the organic silicon dioxide is dispersed. Coating solution of fine particles (average particle size: 15 μπι). By performing flexographic printing only on the inner side of the transparent conductive layer (D), a 20 mm wide peripheral edge portion is exposed, leaving a conductive portion, and then subjected to ultraviolet curing to form As an anti-glare layer with anti-glare properties (turbidity measured by whiteness meter (H a ζ 〇meter): 5%), hard coating (pencil hardness: 2H), functional transparent layer (A). From the support plate Detach, so as to make the electromagnetic wave shielding body of the present invention with a detachable film on the surface of the transparent adhesive layer (C). -77- 1225227 V. Description of the invention (76) Furthermore, peel off the electromagnetic wave shielding body. The separation type film is attached to the front surface of the plasma display panel (display section 9 2 0inm X 5 20mm) by a sheet-by-sheet stacker, and then the autoclave is carried out under a pressure heating condition of 60 ° C and 2 X 105Pa. Disposal. Use conductive copper made by Teraoka The adhesive tape (5 1 0FR) connects the conducting part of the electromagnetic wave shielding body and the grounding part of the plasma display panel, so that a display device having the electromagnetic wave shielding body of the present invention is manufactured. The electromagnetic wave shielding body of the present invention and its equipment The cross section of the electromagnetic wave shielding body as an example is shown in Fig. 4. In Fig. 4, the symbol 00 is the display portion of the display, the symbol 10 is the transparent conductive layer (D), and the symbol 21 is the containing Pigment polymer film (B), symbol 22 is a hard coating (F), symbol 30 is a transparent adhesive layer (C), symbol 70 is an anti-glare layer (transparent with anti-glare and hard-coating properties) Adhesive layer (E)), symbol 80 is a conductive copper foil adhesive tape. (Example 3) A polymer film (B) / transparent conductive layer (D) laminate was produced in the same manner as in Example 1. In addition, a functional transparent layer (A, which is a functional transparent film 1 described below (A) ). That is, a photopolymerization initiator is added to a polyfunctional methacrylate resin, and a coating solution in which ITO fine particles (average particle diameter: 10 nm) are dispersed is coated by a gravure coater, and then UV-cured. In order to form a conductive hard coating film (film thickness -78-1225227 V. Description of the invention (77) 3μιη), in addition, a microphotographic gravure coater was applied to coat the fluorine-containing organic compound solution, and then it was set at 90 ° Dry at C and harden to form an anti-reflection film with a refractive index of 丨 .4 (film thickness: 100 nm), hard coatability (pencil hardness of JIS K5 400: 2H), anti-reflection properties (surface R vis · · 0 · 9%), antistatic property (surface resistance: 7 X 1 09 Ω / □), functional transparent layer (A) with antifouling properties. The above-mentioned roll-shaped functional transparent layer (A) / polymer film (B) / transparent conductive layer (D) is cut into a size of 970 mmX 5 7 0_, and the surface of the transparent conductive layer (B) is placed on It is fixed on a glass support plate. The organic pigment was dispersed and dissolved in ethyl acetate / toluene (50: 5 Owt%) to prepare a dilute solution of an acrylic adhesive. Mixed acrylic adhesive / pigment mixed with diluent (80: 2 Owt%), applied to the transparent conductive layer (D) by a batch type die coater, except that the peripheral part is 22 mm wide, and coated and dried The film thickness was 25 μm, and it was then dried to form an adhesive material 1 as a transparent adhesive layer (C). The refractive index of the adhesive material 1 was 1.51, and the extinction coefficient was 0. Organic pigments are pigments PD-319 manufactured by Mitsui Chemicals, Inc., which have a great absorption at a wavelength of 5 9 5 nm and are used to absorb unwanted light emitted from plasma displays. The red pigment PS-Red-G made by Chemical Co., Ltd. is adjusted by mixing the acrylic adhesive / pigment into the diluent so that the contents in the dried adhesive material 1 are 1150 (wt) ppm and 1050 (wt ) ppm. PD-319 is a coordination compound of tetra-third-butyl-tetraazaporphyrin vanadium oxide represented by formula (3) 0 -79-1225227 V. Description of the invention (78)

接著’藉金屬掩蔽(m e t a 1 m a s k )將二液性常溫硬化 型接著劑((公司)斯利邦德製3 3 8 1 )印刷於周緣部寬 2 2mm之範圍俾被覆透明導電層(D)露出之導通部,接著 使之乾燥以形成厚度爲25μηι之導電性粘接層。 然後,從支撐體剝離,接著將疏離型膜疊積於透明 粘接層(C )及導電性粘接層之面,以製成單面上具有疏 離型膜之本發明之電磁波遮蔽體。 接著,剝離該電磁波遮蔽體之疏離型膜,使用逐張 式疊積器貼合於電漿顯示器面盤之前面(顯示部92〇mni X 5 20mm)。此際,透明粘接層(C )之位置至少與顯示器 配合俾至少使導電性粘接層貼合於接地部。貼合後,接 著在60°C,2 X 105Pa之加壓加溫條件下進行高壓釜處 理,從而得出具備本發明之電磁波遮蔽體之顯示裝置。 作爲本發明之電磁波遮蔽體之一例之平面,自該電 磁波遮蔽體之透明粘接層看到之平面係示於第5 ®。第 5圖上,符號3 1係爲含有色素之透明粘接層(C )’符號 4 1係爲導電性粘接層。 -80- 1225227 五、發明說明(79 ) 作爲示出本發明之電磁波遮蔽體及具裝設狀態之一 例之斷面圖’該電磁波遮蔽體之斷面係示於第6圖。第 6圖上,符號0 0係爲顯示器顯示部,符號1 〇係爲透明 導電層(D),符號20係爲高分子膜(B),符號31係爲含 有色素之透明粘接層(C ),符號4 1係爲導電性粘接層, 符號6 0係爲具有反射防止性,硬塗性,靜電防止性, 防污性之功能性透明層(A ),符號6 1係爲具有防污性之 反射防止膜,符號6 2係爲具有帶電防止性之硬塗膜。 (實施例4 ) 與實施例3同樣地製作高分子膜(b )。 將白色發光之色度補正用之三井化學(公司)製之紅 色色素PS-Red-G O.Olwt%,及前述相同公司製之紫色 色素PS-Violet-RC 0.015wt%混合於聚對苯二甲酸乙二 醇酯糊1203(優尼佳(公司)製)內,接著在260〜280° 之溫度下使其溶融,然後,藉擠壓機製成厚度爲200μιη 之膜。接著,對此膜施予雙軸拉伸以製成含有厚度爲 ΙΟΟμπι之色素之色素摻入PET膜[高分子膜(Β)]。 於PET膜-側之主面上依序形成Sn02薄膜(膜厚: 40nm),銀薄膜(膜厚:9nm),Sn02薄膜(膜厚:80nm) ,銀-鈀合金薄膜(膜厚:1 lnm),Sn02薄膜(膜厚: 40nm)計5層,面電阻爲5.3Ω/□之透明導電層(D), 然後藉輥對輥製成係爲含有色素之PET膜/透明導電 層(D )之透明積層體2。 -81- 1225227 五、發明說明(8〇) 接著,於捲成捲筒狀之上述PET膜/與透明導電層 (D )相反側之PET膜主面上藉輥對輥連續地形成作爲下 述之功能性透明膜2之功能性透明層(A )。添加光聚合 開始劑於多官能甲基丙烯酸酯樹脂,另調製分散有有機 二氧化矽微粒子(平均粒徑:15μηι)之塗布液,塗布後 施予紫外線硬化,以形成作爲具有防眩性(白度計混濁 値:5% ),硬塗性(鉛犛硬度:2Η )之功能性透明層(A )之 防眩層。 將上述捲筒狀之功能性透明層(A ) /高分子膜(B ) / 透明導電層(D)裁斷成970mmX570mm之大小,將透明導 電層(D)之面置於玻璃製支撐板上並固定。 在疏離型膜上形成厚度爲25μΐΏ之粘接材2,其係與 實施例1之粘接材1相同之素材,未摻入色素。藉框裝 疊積機以粘接材2之面作爲貼合面將粘接材2 /疏離型 膜疊積於透明導電層上距周緣部20mm之內側。另外, 在周緣部之20mm寬之範圍內粘貼導電性兩面粘接帶(寺 岡製作所製之WMFT791 )經剝離疏離型膜後之該單面俾被 覆透明導電層(D)之露出之導通部。 自支撐體剝離,如此製成在單面上具有疏離型膜之 本發明之電磁波遮蔽體。接著,剝離電磁波遮蔽體疏離 型膜,並使用逐張式疊積器將該遮蔽體貼合於電紫顯示 板前面(顯示部920mm X 520mm)。此際,透明粘接層至 少配合顯示部之位置使導電性粘接層至少貼合於接地部 -82- 1225227 五、發明說明(81 ) 。貼合後,再在60°C,2 X 105Pa之加壓加溫條件下進 行高壓釜處理,從而得出具備本發明之電磁波遮蔽體之 顯示裝置。 作爲本發明之電磁波遮蔽體和其裝設狀態之例之斷 面圖,該電磁波遮蔽體之斷面係示於第7圖。第7圖上 ’符號0 0係爲顯示器顯示部,符號1 0係爲透明導電層 (D ) ’符號2 1係爲含有色素之高分子膜(B ),符號3 0係 爲透明粘接層(C ),符號4 1係爲導電性粘接層,符號 7 〇係爲防眩層(具有防眩性,硬塗性之功能性透明層 (E ))。 (比較例1 ) 將PET膜(膜厚:188μη〇作爲高分子膜(B),在其一 側之主面上形成由ΙΤΟ薄膜(膜厚:400μπι)作成,面電 阻爲1 5 Ω /□之透明導電層,以製作透明積體層3。使 用透明積層體3,除不使用色素外,其餘與實施例丨相 同地製作電磁波遮蔽體,從而得出具備電磁波遮蔽體之 顯示裝置。 對係爲具有上述那樣得出之實施例1〜4之本發明之 電磁波遮蔽體之顯示裝置之電漿顯示器,進行以下之評 估。 1 )電磁波遮蔽體之透射率 使用米諾達(公司)製之CRT彩色分析儀(CA 100)求出 電磁波遮蔽體形成前後電漿顯示器之分光放射亮度,將 -83- 1225227Next, "Metal 1 mask" was used to print a two-liquid room temperature hardening type adhesive ((Company): 3 3 8 1 manufactured by Slipbond) on a peripheral edge with a width of 2 2 mm. The transparent conductive layer (D) was exposed. The conductive portion is then dried to form a conductive adhesive layer having a thickness of 25 μm. Then, it is peeled from the support, and then the separation-type film is laminated on the surfaces of the transparent adhesive layer (C) and the conductive adhesive layer to form the electromagnetic wave shielding body of the present invention having the separation-type film on one side. Next, the detachment type film of the electromagnetic wave shielding body was peeled off, and it was bonded to the front surface of the plasma display panel using a sheet-by-sheet laminator (the display portion was 92 mm x 5 20 mm). At this time, the position of the transparent adhesive layer (C) is at least matched with the display, and at least the conductive adhesive layer is bonded to the ground portion. After bonding, the autoclave was then processed under a pressure heating condition of 60 ° C and 2 X 105 Pa, thereby obtaining a display device having the electromagnetic wave shielding body of the present invention. As a plane of one example of the electromagnetic wave shielding body of the present invention, the plane viewed from the transparent adhesive layer of the electromagnetic wave shielding body is shown in Section 5®. In Fig. 5, reference numeral 31 is a transparent adhesive layer (C) 'containing a dye, and reference numeral 41 is a conductive adhesive layer. -80- 1225227 V. Description of the invention (79) As a sectional view showing an example of the electromagnetic wave shielding body and the installation state of the present invention ', the sectional view of the electromagnetic wave shielding body is shown in FIG. In FIG. 6, reference numeral 0 0 is a display display portion, reference numeral 10 is a transparent conductive layer (D), reference numeral 20 is a polymer film (B), and reference numeral 31 is a transparent adhesive layer (C) containing a pigment. ), Symbol 41 is a conductive adhesive layer, symbol 60 is a functional transparent layer (A) having anti-reflection, hard coating, antistatic, and antifouling properties, and symbol 61 is an anti- Antifouling anti-reflection film, symbol 6 2 is a hard coating film with anti-charge property. (Example 4) A polymer film (b) was produced in the same manner as in Example 3. The red pigment PS-Red-G O.Olwt% manufactured by Mitsui Chemicals (Company) and the purple pigment PS-Violet-RC 0.015wt% manufactured by Mitsui Chemicals Co., Ltd. for color correction of white light emission are mixed with polyparaphenylene terephthalate. In ethylene glycol formate paste 1203 (manufactured by Unicam), it was melted at a temperature of 260 to 280 °, and then a 200 μm thick film was formed by an extruder. Next, this film was subjected to biaxial stretching to produce a pigment-incorporated PET film [polymer film (B)] containing a pigment having a thickness of 100 μm. On the main surface of the PET film-side, a Sn02 film (film thickness: 40nm), a silver film (film thickness: 9nm), a Sn02 film (film thickness: 80nm), and a silver-palladium alloy film (film thickness: 1 lnm) were sequentially formed. ), 5 layers of Sn02 film (film thickness: 40nm), transparent conductive layer (D) with a surface resistance of 5.3Ω / □, and then made a PET film / transparent conductive layer (D) containing pigment by roll-to-roll The transparent laminated body 2. -81- 1225227 V. Description of the invention (80) Next, the main surface of the above-mentioned PET film rolled on a roll / PET film opposite to the transparent conductive layer (D) is continuously formed by roll-to-roll as the following Functional transparent layer (A) of the functional transparent film 2. A photopolymerization initiator is added to the polyfunctional methacrylate resin, and a coating liquid in which organic silica fine particles (average particle size: 15 μηι) are dispersed is prepared. After coating, UV curing is applied to form anti-glare (white) The haze of the meter is 5%: the anti-glare layer of the functional transparent layer (A) with a hard coating property (lead 牦 hardness: 2Η). The roll-shaped functional transparent layer (A) / polymer film (B) / transparent conductive layer (D) is cut into a size of 970 mm × 570 mm, and the surface of the transparent conductive layer (D) is placed on a glass support plate and fixed. An adhesive material 2 having a thickness of 25 ΐΏ was formed on the separation type film. The adhesive material 2 was the same material as the adhesive material 1 of Example 1, and no pigment was incorporated. By using a frame-mounting laminating machine, the surface of the adhesive material 2 is used as a bonding surface, and the adhesive material 2 / isolated film is laminated on the transparent conductive layer inside 20 mm from the peripheral edge portion. In addition, a conductive double-sided adhesive tape (WMFT791 manufactured by Teraoka Co., Ltd.) was affixed to the exposed conductive portion of the transparent conductive layer (D) after peeling off the release film within a 20 mm width of the peripheral portion. The self-supporting body was peeled off, and thus the electromagnetic wave shielding body of the present invention was provided with a detachable film on one side. Next, the electromagnetic wave shielding body separation type film was peeled off, and the shielding body was attached to the front of the electric purple display panel (display portion 920mm X 520mm) using a sheet-by-layer stacker. At this time, the transparent adhesive layer at least matches the position of the display portion so that the conductive adhesive layer is adhered to at least the ground portion. 82. Description of the invention (81). After lamination, the autoclave was processed under a pressure heating condition of 60 ° C and 2 X 105 Pa, thereby obtaining a display device provided with the electromagnetic wave shielding body of the present invention. As a sectional view of the electromagnetic wave shielding body of the present invention and an example of its installation state, a sectional view of the electromagnetic wave shielding body is shown in FIG. In Fig. 7, 'symbol 0 0 is a display display part, symbol 10 is a transparent conductive layer (D)' symbol 21 is a polymer film (B) containing a pigment, and symbol 30 is a transparent adhesive layer. (C), the symbol 41 is a conductive adhesive layer, and the symbol 70 is an anti-glare layer (a functional transparent layer (E) having anti-glare properties and hard coating properties). (Comparative Example 1) A PET film (film thickness: 188 μηι) was used as a polymer film (B), and a main surface of one side was made of an ITO thin film (film thickness: 400 μπι), and the sheet resistance was 15 Ω / □ The transparent conductive layer is used to make the transparent laminated layer 3. The transparent laminated layer 3 is used, except that no pigment is used, the electromagnetic wave shielding body is made in the same manner as in Example 丨, so as to obtain a display device having the electromagnetic wave shielding body. The plasma display having the display device of the electromagnetic wave shielding body of the present invention of Examples 1 to 4 obtained as described above was evaluated as follows: 1) The transmittance of the electromagnetic wave shielding body was CRT color manufactured by Minoda (Company) The analyzer (CA 100) determines the spectral emission brightness of the plasma display before and after the electromagnetic shielding body is formed.

五、發明說明(82 ) 形成後之亮度對形成前之亮度之比以百分率表示。 2 )電漿顯示器之明處階調比(最高最低亮度比) 形成電磁波遮蔽體前後進行評估。於周圍照度爲 ΙΟΟΙχ下,電漿顯示器顯示板顯示白色時之最高亮度 (cd/m2)和黑色時之最低亮度(cd/m2),使用米諾達(公 司)製之売度計(L S - 1 1 0 )測定,以求出其比(最高亮度/ 最低亮度)。 3 )電漿顯示器之發光色之色純度 在形成電磁波遮蔽體前後進行評估。對電漿顯示器 上未裝設顯示器用濾光器之情形和裝設實施例1及2之 顯示器用濾光器之情形進行測定。 在顯示白色(W ),紅色(R ),綠色(G ),藍色(B )時使 用米諾達(公司)製之CRT彩色分析儀(CA100)測定RGB 色度(X,y),及白色色度,色溫度,距黑體軌跡之白色 偏差。 PDP發光之三原色愈接近藉NTSC方式決定之RGB色 之色再現範圍愈佳。另外,pdp發光之三原色在χ-y色 度圖上連結之三角形面積對NTSC色再現範圍之面積之 比若接近100%的話則表示色再現範圍擴大。 4 )電磁波遮蔽能力 對未形成電磁波遮蔽體之電漿顯示器和設置實施例1 〜4及比較例1之電磁波遮蔽體之電漿顯示器執行下述 之測定。 -84- 1225227 五、發明說明(83 ) 將雙極天線設置於距顯示部中心位置之面水洗芳香 1 0 m之位置上,藉亞都邦測試性(Τ K八^亍只卜性)光譜 分析儀(Spectral analyzer)(TP4172)測定在 30〜 2 3 0MHz頻寬上之放射電場強度。依VCCI之3m法,此 頻寬內之容許値,Cl as s A係在50dBpV/m以下,Cl as s B係在40dBpV/m以下。評估係以33MHz、90MHz進行。 5 )電磁波遮蔽體之近紅外線透射率 對實施例1〜4及比較例1之電磁波遮蔽體進行評估 〇 將電磁波遮蔽體之透光部切成小片,藉(公司)日立 製作所之分光光度計(U-3400),測定800〜lOOOnm之平 行光線透射率,以評估820nm,850nm,950nm之透射率 〇 6 )近紅外線低減能力 對未形成電磁波遮蔽體之電漿顯示器和設置電磁波 遮蔽體之電漿顯示器之實施例1,2及比較例1執行以下 之測定。 將使用紅外線遙控器之電子機器之家庭用VTR置於 距顯示器0 . 2〜5m之處,以確認是否有誤動作。若有誤 動作時則求出其界限距離。實用上,至少係在3m以下 ,而理想的是係在1 . 5 m以下。 實施例1之本發明之電磁波遮蔽體,電漿顯示器發 光之透射率,可視光線透射率係爲5 0%,藉對有不要之 -85- 1225227 五、發明說明(84 ) 發光之波長5 9 5 nm吸收最大色素,5 9 5 nm之透射率對有 必要之發光之波長61 Onm之透射率之比率係爲38%。另 外’具備此特性之電漿顯示器,藉使用形成具有反射防 止性之功能性透明層(A )之電磁波遮蔽體,抑制顯示器 表面之反射,及藉電磁波遮蔽體之透射特性,在周圍照 度爲1 00 1 X之條件下之明處之階調係自形成電磁波遮蔽 體前之2 0提高至4 5。另外,映入之情形也少,從而得 出視認性佳之電漿顯示器。 實施例2之本發明之電磁波遮蔽體電漿顯示器發光 之透射率,可視光線透射率係爲5 8%,映入也少,故能 得出視認性佳之電漿顯示器。明處之階調係從20改善 到37。 實施例4之本發明之電磁波遮蔽體電漿顯示器發光 之透射率,可視光線透射率係爲5 9 %,映入也少,故能 得出視認性佳之電漿顯示器。明處之階調係從20改善 至37。 第8圖係示出表示電磁波遮蔽體形成前後之色再現 範圍之x-y色度圖。第8圖係爲在PDP(電漿顯示板)上 形成實施例1之電磁波遮蔽體前後白色(W ),紅色(R ), 綠色(G),藍色(B)發光之色度描繪於x-y色度圖上者。 另外,作爲目標之NTSC之色度也一倂繪出。 白色係能藉與係爲良好之白色色度軌跡之黑體軌跡 比較之位置評估。 -86- 1225227 五、發明說明(85 ) 採用本發明之電磁波遮蔽體,白色之色度偏 另外,自此圖瞭解,比形成實施例1之電磁波 色溫度係位在高位置。色溫度約上昇7000K至 10000K 。 另外,連結RGB點之三角形也示於圖中。其 NTSC愈好。自此圖瞭解藉使用實施例1之電磁 體,紅色,綠色之色度趨近NTSC表示之色度, 色再現範圍之三角形已擴大。求出三角形面積 表示之面積之比率,形成實施例1之電磁波遮 係爲74%,形成後則能改善至85%。 另外,上述之評估4 )〜6 )之結果係彙總列於 差少, 遮蔽體前 約 愈接近 波遮蔽 此表示 對 NTSC 蔽體之前 表1 〇 -87- 1225227 五、發明說明(㈣) [表1] 電磁波 遮蔽體 yfm: 無 實施例 1 實施例 2 實施例 3 實施例 4 比較例 1 透明導 電層之 面電阻 Ω /□ 2.2 5.3 2.2 5.3 15 放射電 場強度 ,dBp/m 33MHz 59 38 46 39 46 52 90MHz 52 34 42 33 40 49 近紅外 線透射 率,% 820nm - 9.8 24 10 25 79 850nm - 6.3 19 6.5 18 78 950nm - 2.1 9 2.0 8.5 70 誤動作 界限距 離,m 5以上 0.5 3.0 0.5 3.0 5以上 從表1,明白藉使用本發明之電磁波遮蔽體,能淸楚 判別VCC I規格之C U s s B或C 1 a s s A。透明導電層之 面電阻愈低,電磁波遮蔽愈佳。 另外,也明白藉使用本發明之電·磁波遮蔽體,能獲 得良好的近紅外線低減能力。使用金屬薄膜和高折射率 透明薄膜疊積而成之透明導電層之本發明之電磁波遮蔽 體,近紅外線之透射率低,近紅外線之低減能力優,其 透明導電層之面電阻愈低,近紅外線低減能力愈優。尤 有進者,本發明之電磁波遮蔽體,藉功能性透明層(D ) 具有各功能,能獲得良好之耐環境性及/或耐擦性及/ 或防污性及/或靜電防止性。 . (實施例5) 用三乙醯基纖維素(TAC)膜(厚度·· 80μιη)作爲高分子 -88- 1225227 五、發明說明(87 ) 膜(B ),於其一側之主面上藉輥對輥方式連續形成下述 功能性透明膜1以作爲功能性透明層(A ),另再藉照相 凹板塗布機塗布分散有ITO微粒子(平均粒徑:1 Onm )之 塗佈液’然後藉紫外線硬化以形成導電性硬塗膜(膜厚 :3 μιτι) ’接著藉微照相凹板塗佈機在其上塗佈含氟有 機化合物溶液,並在90°C下予以乾燥熱硬化以形成折 射率爲1 · 4之反射防止膜(膜厚:i〇〇nm),從而形成具 有硬塗性(;i IS K5400標準之鉛筆硬度:2H),反射防止 性(表面之R v i s ·· 0 · 9 % ),帶電防止性(表面電阻·· 7 X 1 〇9 Ω / □),防污性之功能性透明膜1。 將有機色素分散,溶解於醋酸乙酯/甲苯(5 0 : 5 0 w t % ) 溶劑以作爲丙烯酸系粘接劑之稀釋液。(80 : 20wt%),然 後藉點塗布機將前述混合液塗布於功能性透明膜1 / TAC 膜之TAC膜面上,經乾燥後形成作爲透明粘接層(C )之 粘接材1。接著將疏離型膜疊積於透明粘接層上並捲繞 成捲筒狀,如此即製成在透明粘接層面上具有疏離型膜 之捲筒狀之本發明之調光膜。 對波長5 9 5 nm具有最大吸收,並用於吸收電漿顯示 器放射之不需要之發光之三井化學(公司)製之色素PD-319,及白色發光之色度補正用之三井化學(公司)製之 紅色色素PS _ R e d - G,係藉調整丙烯酸系粘接劑/色素ί參 入稀釋液而被含於乾燥後之粘接材1中之量分別爲 1650(wt)ppm,450(wt)ppm。PD-319 係爲式(3)之四-第 -89- 1225227 五、發明說明(88 ) 三丁基-四氮雜卟啉·氧釩之配位化合物。5. Description of the invention (82) The ratio of the brightness after formation to the brightness before formation is expressed as a percentage. 2) The tone ratio (highest and lowest brightness ratio) of the bright place of the plasma display is evaluated before and after the electromagnetic wave shielding body is formed. When the ambient illumination is 100 × χ, the plasma display panel displays the highest brightness (cd / m2) when it is white and the lowest brightness (cd / m2) when it is black. 1 1 0) to determine the ratio (highest brightness / lowest brightness). 3) The color purity of the luminous color of the plasma display is evaluated before and after the electromagnetic wave shielding body is formed. The measurement was performed on a plasma display without a display filter and a display filter of Examples 1 and 2. When displaying white (W), red (R), green (G), blue (B) using a CRT color analyzer (CA100) manufactured by Minoda (Company) to measure the RGB chromaticity (X, y), and White chromaticity, color temperature, and white deviation from black body locus. The closer the three primary colors of the PDP are to the color reproduction range of the RGB colors determined by the NTSC method, the better. In addition, if the ratio of the area of the triangles connected to the three primary colors of pdp emission on the χ-y chromaticity diagram to the area of the NTSC color reproduction range is close to 100%, the color reproduction range is enlarged. 4) Electromagnetic wave shielding ability The following measurements were performed on the plasma display without the electromagnetic wave shielding body and the plasma display provided with the electromagnetic wave shielding bodies of Examples 1 to 4 and Comparative Example 1. -84- 1225227 V. Description of the invention (83) The dipole antenna is set at a position 10 meters away from the center of the display and washed with aromatic water, and analyzed by Yadubang test (T K 亍 亍 only) spectral analysis (Spectral analyzer) (TP4172) measures the radiation electric field intensity in the 30 ~ 230 MHz bandwidth. According to the 3m method of VCCI, the allowable bandwidth within this bandwidth is Cl as s A below 50dBpV / m and Cl as s B below 40dBpV / m. The evaluation was performed at 33 MHz and 90 MHz. 5) Near-infrared transmittance of the electromagnetic wave shielding body The electromagnetic wave shielding bodies of Examples 1 to 4 and Comparative Example 1 were evaluated. The light-transmitting part of the electromagnetic wave shielding body was cut into small pieces. U-3400), measuring the parallel light transmittance of 800 ~ 100nm, to evaluate the transmittance of 820nm, 850nm, 950nm. 6) Near-infrared low-reduction ability for plasma display without electromagnetic wave shield and plasma with electromagnetic wave shield In Examples 1,2 and Comparative Example 1 of the display, the following measurements were performed. Place the VTR for household use of electronic equipment using infrared remote control at a distance of 0.2 ~ 5m from the display to confirm whether there is any malfunction. If there is a malfunction, find the limit distance. In practice, it should be at least 3 m, and ideally, it should be 1.5 m or less. The electromagnetic wave shielding body of the present invention in Example 1, the transmittance of the plasma display light emission, the visible light transmittance is 50%, according to the need -85-1225227 V. Description of the invention (84) The wavelength of light emission 5 9 5 nm absorbs the largest pigment, and the ratio of the transmittance of 5 9 5 nm to the necessary emission of 61 Onm is 38%. In addition, the plasma display with this characteristic uses an electromagnetic wave shielding body that forms a functional transparent layer (A) with anti-reflection properties to suppress reflection on the display surface and the transmission characteristics of the electromagnetic wave shielding body. The surrounding illumination is 1 The tone of the bright place under the condition of 00 1 X is increased from 20 to 45 before forming the electromagnetic wave shielding body. In addition, there are few cases of reflection, so that a plasma display with excellent visibility can be obtained. The electromagnetic light shielding plasma display of the second embodiment of the present invention has a light transmittance of 58% with visible light transmittance and little reflection, so a plasma display with good visibility can be obtained. The tone of the bright place has been improved from 20 to 37. In the electromagnetic wave shielding plasma display of the present invention in Example 4, the transmittance of visible light is 59% and the reflection is small, so a plasma display with good visibility can be obtained. The tone of the bright place has been improved from 20 to 37. Fig. 8 is an x-y chromaticity diagram showing a color reproduction range before and after the electromagnetic shielding body is formed. FIG. 8 shows the chromaticities of white (W), red (R), green (G), and blue (B) emission before and after forming the electromagnetic wave shielding body of Example 1 on a PDP (plasma display panel). Chromaticity diagram. In addition, the chromaticity of the target NTSC is also plotted at a glance. The white line can be evaluated by comparing it with the black body line which is a good white chroma line. -86- 1225227 V. Description of the invention (85) Using the electromagnetic wave shielding body of the present invention, the chromaticity of white is biased. In addition, it is understood from this figure that the color temperature of the electromagnetic wave formed in Example 1 is higher. The color temperature rises approximately 7000K to 10000K. In addition, triangles connecting RGB points are also shown in the figure. The better its NTSC. It is understood from this figure that by using the electromagnet of Embodiment 1, the chromaticity of red and green approaches the chromaticity indicated by NTSC, and the triangle of the color reproduction range has been enlarged. The ratio of the area represented by the area of the triangle was determined. The electromagnetic wave shielding system of Example 1 was 74%, and it was improved to 85% after formation. In addition, the results of the above evaluations 4) to 6) are summarized and listed in a small difference. The closer the wave front is, the closer the wave is. This indicates that before the NTSC shield, Table 1 〇-87-1225227 V. Description of the invention (㈣) [Table 1] Electromagnetic wave shielding body yfm: None Example 1 Example 2 Example 3 Example 4 Comparative example 1 Surface resistance of transparent conductive layer Ω / □ 2.2 5.3 2.2 5.3 15 Radiated electric field intensity, dBp / m 33MHz 59 38 46 39 46 52 90MHz 52 34 42 33 40 49 Near infrared transmittance,% 820nm-9.8 24 10 25 79 850nm-6.3 19 6.5 18 78 950nm-2.1 9 2.0 8.5 70 Malfunction limit distance, m 5 or more 0.5 3.0 0.5 3.0 5 or more from the table 1. It is understood that by using the electromagnetic wave shielding body of the present invention, it is possible to discriminate CU ss B or C 1 ass A of VCC I specifications. The lower the surface resistance of the transparent conductive layer, the better the shielding of electromagnetic waves. In addition, it was also understood that by using the electric-magnetic shielding body of the present invention, it is possible to obtain a good near-infrared reducing ability. The electromagnetic wave shielding body of the present invention, which uses a transparent conductive layer laminated with a metal thin film and a high-refractive index transparent film, has low near-infrared transmittance and excellent near-infrared reducing ability. The better the infrared reduction ability. In particular, the electromagnetic shielding body of the present invention has various functions by the functional transparent layer (D), and can obtain good environmental resistance and / or abrasion resistance and / or antifouling and / or antistatic properties. (Example 5) A triethyl cellulose (TAC) film (thickness: 80 μm) was used as the polymer -88-1225227. 5. Description of the invention (87) The film (B) was on one side of the main surface. The following functional transparent film 1 was continuously formed as a functional transparent layer (A) by a roll-to-roll method, and a coating solution in which ITO fine particles (average particle diameter: 1 Onm) were dispersed was coated by a gravure coater. Then it is hardened by ultraviolet rays to form a conductive hard coating film (film thickness: 3 μιτι). Then, a fluorine-containing organic compound solution is coated thereon by a microphotogravure coater, and dried and heat-cured at 90 ° C to An anti-reflection film (film thickness: 100 nm) with a refractive index of 1 · 4 was formed to form a hard-coating property (; pencil hardness of the IS IS K5400 standard: 2H), anti-reflection property (surface R vis ··· 0 · 9%), antistatic property (surface resistance · 7 X 1 〇9 Ω / □), functional transparent film 1 with antifouling properties. The organic pigment is dispersed and dissolved in a solvent of ethyl acetate / toluene (50:50 wt%) as a diluent for an acrylic adhesive. (80: 20 wt%), and then apply the aforementioned mixed solution to the TAC film surface of the functional transparent film 1 / TAC film by a dot coater, and then dry the adhesive material 1 as a transparent adhesive layer (C). Next, the detachable film is laminated on the transparent adhesive layer and wound into a roll shape, so that a roll-shaped light-adjusting film of the present invention having the detachable film on the transparent adhesive layer is produced. Pigment PD-319 made by Mitsui Chemicals, Inc., which has the maximum absorption at a wavelength of 5 9 5 nm, and is used to absorb unwanted light emitted by plasma displays, and Mitsui Chemicals, Inc., which is used for color correction of white light emission The red pigment PS _ R ed-G is obtained by adjusting the acrylic adhesive / pigment ί into the diluent to be contained in the dried adhesive material 1 in amounts of 1650 (wt) ppm and 450 (wt ) ppm. PD-319 is the coordination compound of formula (3) Ⅳ-89-1225227 V. Description of the invention (88) tributyl-tetraazaporphyrin-vanadyl oxide.

(3) 接著將該調光膜裁斷成紙張狀,然後,剝離疏離型 膜,並藉逐張式疊積器將調光膜貼合於電漿顯示板之前 面(顯示部9 2 0 in m X 5 2 0 m m )。此際,須執行紙張裁斷, 貼合位置之對位俾使透明粘接層(C )貼合於至少顯示部 之整體上。貼合後,另在6 0 °C,2 X 1 0 5P a之加壓加溫 之條件下進行高壓釜處理,從而得出具備本發明之調光 膜之顯示裝置。 表示作爲本發明之調光膜和其裝設狀態之一例之斷 面圖,該調光膜之斷面係示於第9圖。第9圖上,符號 0 0係爲顯示器顯示部,符號2 0係爲高分子膜(B ),符 號3 1係爲含有色素之透明粘接層(C ),符號6 0係爲具 有反射防止性,硬塗性,靜電防止性,防污性之功能性 透明層(A ),符號6 1係爲具有防污性之反射防止膜,符 號6 2係爲具有靜電防止性之硬塗膜。 (實施例6 ) -90- 1225227 五、發明說明(89 ) 將前述式(3)表示之三井化學(公司)製之色素PD_319 ,0.018wt%,對波長585nm吸收最大之三井化學(公司) 製之色素PD-311,〇.〇18wt%,白色發光之色度補正用 之三井化學(公司)製之紅色色素PS-Red-G,0.004wt% 混合於聚對苯二甲酸乙二醇酯(PET )小九1 2 Ο 3 (優尼佳( 公司)製),在260〜28CTC下溶融,然後藉擠壓機製作 厚度爲2 50μιη之膜。接著,對此膜進行雙軸(定向)拉 伸,以製成係爲含有厚度爲125μηι之色素之高分子膜 (Β)之色素摻入PET膜。 PD- 311係式(4)之四-第三-丁基-四氮雜卟啉·銅之 配位化合物。(3) Then cut the dimming film into a paper shape, and then peel off the detachable film, and then attach the dimming film to the front surface of the plasma display panel by using a sheet-by-sheet laminator (display section 9 2 0 in m X 5 2 0 mm). In this case, it is necessary to perform paper cutting, and align the bonding positions so that the transparent adhesive layer (C) is bonded to at least the entire display portion. After lamination, an autoclave treatment was performed under the conditions of 60 ° C and 2 X 105 Pa in pressure heating, so as to obtain a display device having the light-adjusting film of the present invention. A cross-sectional view showing an example of the light-adjusting film of the present invention and its installation state is shown in FIG. 9. In FIG. 9, the symbol 0 0 is a display display portion, the symbol 20 is a polymer film (B), the symbol 31 is a transparent adhesive layer (C) containing a pigment, and the symbol 60 is a reflection prevention layer. The functional transparent layer (A) with anti-fouling properties, hard coating properties, antistatic properties, and antifouling properties, symbol 6 1 is an anti-fouling anti-reflection film, and symbol 6 2 is a hard coating film with anti-static properties. (Example 6) -90-1225227 V. Description of the invention (89) The pigment PD_319 manufactured by Mitsui Chemicals (Company) represented by the aforementioned formula (3) was 0.018 wt%, and the absorption maximum of the wavelength of 585 nm was Mitsui Chemicals (Company) Pigment PD-311, 0.018% by weight, and red pigment PS-Red-G made by Mitsui Chemicals, Inc. (0.004% by weight) mixed with polyethylene terephthalate ( PET) Xiaojiu 1 2 0 3 (made by Unicam (company)), melted at 260 ~ 28CTC, and then use an extruder to make a film with a thickness of 2 50 μιη. Next, the film was subjected to biaxial (orientation) stretching to prepare a pigment-doped PET film which is a polymer film (B) containing a pigment having a thickness of 125 μm. PD-311 is a tetra-third-butyl-tetraazaporphyrin · copper coordination compound of formula (4).

接著,於捲繞成捲筒狀之上述PET膜之一側之主面 上,藉輥對輥之方式連續形成下述之功能性透明膜2以 作爲功能性透明層(A )。亦即,添加光聚合開始劑於多 官能甲基丙烯酸酯樹脂,另調製分散有有機二氧化矽微 粘子(平均粒徑·· 1 5 μ rii )之塗佈液,並塗佈,之後行紫 -9 1- 1225227 五、發明說明(90 ) 外線硬化以形成係爲具有防眩性(白度計測定之混濁値 :5%),硬塗性(鉛筆硬度:2H),之防眩層之功能性透 明膜2。在功能性透明膜2 /色素摻入PET膜之PET膜面 上形成與實施例1之粘接材1相同之素材但未摻入色素 之粘接材2。在透明粘接層上疊積疏離型膜並捲繞成捲 筒狀’以製得在透明粘接層面上具有疏離型膜之捲筒狀 之本發明之調光膜。 接著,將該調光膜裁斷成紙張狀,剝離疏離型膜後 藉逐張疊積器貼合於電漿顯示板之前面(顯示部920mm X 5 2 0mm)。此際,執行裁斷,貼合位置之對位俾使透明 粘接層(C)貼合於至少顯示部整體。貼合後,在60°C, 2 X 10 5Pa之加壓加溫條件下進行高壓釜處理以得出具備 本發明之調光膜之顯示裝置。 作爲表示本發明之調光膜和其裝設狀態之一例之斷 面圖,該調光膜之斷面係示於第10圖。第10圖上,符 號00係爲顯示器顯示部,符號2 1係爲含有色素之透明 粘接層(C),符號30係爲透明粘接層(C),符號70係爲 防眩層(具有防眩性,硬塗性之功能性透明層(A ))。 係爲具有如上述那樣製得之實施例5及6之本發明 之調光膜之顯示裝置之電漿顯示器與調光膜形成前之電 漿顯示器一起作如下之評估。 1 )調光膜之透射率 使用米諾達(公司)製之CRT彩色分析儀(CA 100),求 -92- 1225227 五.、發明說明(91 ) 出形成調光膜前後時電漿顯示器之分光放射亮度,以形 成後之亮度對形成前之亮度之比之百分率表示。 2 )電漿顯示器明處之階調(最高最低亮度比) 於形成調光膜之前後評估。周圍照度爲1 00 1 X下, 使用米諾達(公司)製之亮度計(LS - 1 1 0 )測定電漿顯示器 之板面作白色顯示時最高亮度(c d / m2)和作黑色顯示時 之最低亮度(cd/m2),並求出兩者之比(最高亮度/最低 亮度)。 3 )電漿顯示器之發光色之色純度 於形成調光膜前後進行評估。 在作白色(W ),紅色(R ),綠色(G ),藍色(B )等之顯 示時使用米諾達(公司)製之CRT彩色分析儀(CA1 00)測 定RGB色度(x,y)及白色色度,色溫度,距黑體軌跡之 白色偏差。 PDP發光之三原色愈接近NTSC方式所決定之RGB色 之色再現範圍愈好。另外,PDP發光之三原色在X,y色 度圖上連結之三角形之面積對NTSC之色再現範圍之面 積之比率接近100%時則表示色再現範圍擴大。 實施例5之本發明之調光膜電漿顯示器發光之透射 率在可視光線透射率方面係爲6 9%,藉對有不需要發光 之波長595nm吸收極大之色素,595nm之透射率對有需 要發光之波長61 Onm之透射率之百分比係爲21%。另外 ,具備此種特性之電漿顯示器藉使用形成具有反射防止 -93- 1225227 五、發明說明(92 ) 性之功能性透明層(A )之調光膜以抑制顯示器表面之反 射,及藉調光膜之透射特性,在周圍照度爲1 〇 〇 1 X之條 件下明處之階調係自形成調光膜前之20提昇至4 1。亮 度.並無顯著衰失,映入也少,因此能得出視認性佳之電 漿顯示器。尤有進者,紅色,綠色發光之色純度特別顯 著獲得改善。綠色發光之色純度之改善係依5 9 5 nm吸收 色素之黃綠色發光之低減而定。 -相同地,實施例6之本發明之調光膜,電漿顯示器 光之透射率在可視光線透射率方面係爲7 0%,和對有不 需要發光之波長5 9 5 ηηι吸收極大之色素相同,藉對波長 5 8 5 nm具有極大吸收之色素,5 8 5 nm之透射率對有需要 發光之波長61 Onm之透射率之百分比係爲30%。另外, 具備此種特性之電漿顯示器,藉調光膜之透射特性,在 周圍照度爲1 0 0 1 X之條件下之明處之階調係自形成調光 膜前之20提高至37。亮度不顯著地衰減,映入又少, 故能得出視認性佳之電漿顯示器。尤有進者,紅色,綠 色發光之色純度特別顯著地被改善。綠色發光之色純度 之改善係依5 9 5 ηπι及5 8 5 nm吸收色素之黃綠色發光之低 減而定。特別是藉吸收更短波長之5 8 5 n m吸收色素,其 效果大。 第1 1圖係示出本發明之調光膜形成前後之色再現範 圍之X - y色度圖。 第1 1圖係在PDP(電漿顯示板)上形成實施例5之調 -94- 1225227 五、發明說明(93 ) Μ ^前後描繪在X _ y色度圖上之白色(W ),紅色(R ),綠 色(G) ’藍色(B)發光之色度。另外,作爲目標之NTSC 之色度也一併描繪。 S €能在與屬於良好白色色度之軌跡之黑體軌跡比 較之位置上評估。 ί足ffl_h瞭解使用本發明之電磁波遮蔽體,白色之色 度偏差少’另外,色溫度係位在比形成實施例5或實施 例6之調光膜前者高之位置。色溫度上昇約7〇〇0K至約 950 0K’表示與黑體軌跡之偏離之白色偏差也幾乎爲零 〇 另外’圖中示出連結RGB點之三角形。此三角形愈 接近NTSC者愈佳。從圖上明白藉使用實施例5或實施 例6之調光膜,紅色,綠色之色度趨近NTSC所示之色 度,此表示色再現範圍之三角形已擴大。求出三角形面 積對NTSC表示之三角形面積之百分率,在形成實施例 5之調光膜前係爲74%,形成後則改善到86%。另外, 形成實施例6之調光膜的情形則係改善至8 8%。 尤有進者,本發明之調光膜,藉功能性透明層(A )具 有多功能,能獲得優良之耐擦傷性及/或防污性及/ 或靜電防止性。 (實施例7 ) 將係爲近紅外光吸收色素之三井化學(公司)製之 SIR-128,SIR-130各混合0· 15wt %於聚對苯二甲酸乙二 -95- 1225227 五、發明說明(94 ) 醇酯1 20 3 (優尼佳(公司)製)裡,在28(TC下溶融後,藉 雙軸擠壓(定向)拉伸以製成厚度爲15 Ομπι之近紅外光 遮蔽膜。另將醋酸乙酯/甲苯(5 0 : 5 0w t % )溶劑作爲稀釋 液,以8 0 : 2 0之比例混合丙烯酸系粘接劑和稀釋液,然 後藉點塗布機將之塗布於近紅外線遮蔽膜面上乾燥膜厚 達2 5 μ m,乾燥後形成粘接材層,接著,於其上疊積疏 離型膜。 在上述那樣製成之近紅外線遮蔽膜(B )上疊積作爲基 體膜,膜厚度188μπι之反射防止膜(日本油脂製之里阿 耳克1200),並將之裁斷成長爲960 mm X寬爲550 _, 藉此得出透明高分子膜之膜厚合計爲0 . 3 3 8之光學濾光 器膜。 然後,將此膜貼合於長爲9 80mmx寬爲5 80mmX厚爲 2 . 5 m m之半硬化玻璃板。 (實施例8 ) 將係爲近紅外線吸收色素之三井化學(公司)製之 SIR-128,SIR-130各以〇.3wt%混合於聚對苯二甲酸乙 二醇酯小九1 20 3 (優尼佳(公司)製)裡,在約2 8 0 °C之溫 度下溶融後,藉雙軸擠壓(定向)拉伸以製成厚度爲 7 5 μπι之近紅外線遮蔽膜。另將醋酸乙酯/甲苯 (5 0 : 5 0wt%)溶劑作爲稀釋液,以80 : 20之比例混合丙烯 酸系粘接劑和稀釋液,然後藉點塗佈機將其塗佈於近紅 外線遮蔽膜面上乾燥厚度達2 5 μηι,乾燥後形成粘接材 -96- 1225227 五、發明說明(95 ) 層,接著於其上疊積疏離型膜。 另外,不添加近紅外線吸收色素,以相同之方法製 作厚度爲200μιιι之墊高用透明高分子膜。 另於近紅外線遮蔽膜上疊積係爲基體膜,膜厚爲 80μπι之反射防止膜(日本油脂製之里阿耳克UOO),並 將其裁斷成長爲960mmX寬爲550mm,然後貼合於膜厚 爲200μπι之墊高用之透明高分子膜上。藉此,得出透 明高分子膜之合計厚度爲0 · 3 5 5mm之光學濾光器膜。接 著將此膜貼合於長爲980inmX寬爲5 80mmX厚爲2.5mm 之半硬化玻璃板上。 (實施例9 ) 藉輥對輥之方式連續地在實施例7所示之厚度爲 1 5 Ομπι之近紅外線遮蔽膜之主面上形成下述之功能性透 明膜以作爲功能性透明層(A )。亦即,添加光聚合開始 劑於多官能甲基丙烯酸酯樹脂,另調製分散有有機二氧 化矽微粒子(平均粒徑:1 5 μ m )之塗佈液,塗佈後施予 紫外線硬化,以形成具備具有防眩性(白度計測定之混 濁値:5 % ),硬塗性(鉛筆硬度:2H )之防眩性功能之透明 層。 將實施例14上所示之厚度爲2 0 0μηι之墊高用透明高 分子膜疊積於具有此近紅外線遮蔽功能和防眩性功能之 透明高分子膜上,之後將其裁斷成長爲96 0mm X寬爲 5 5 Omm ’藉此得出透明高分子膜之合計厚度爲〇 . 3 5 0mm -97- 1225227 五、發明說明(96 ) 之光學濾光器膜。然後將此膜貼合於長爲980mmX寬爲 580mmX厚爲2.5mm之半強化玻璃板上。 (實施例1 0 ) 藉擠壓雙軸(定向)拉伸製作厚度爲75μιη之聚對苯二 甲酸乙二醇酯膜,於此膜之一側之主面上從此膜開始依 序形成Sn02薄膜(膜厚:40nm),銀薄膜(膜厚:9nm), Sn〇2薄膜(fl旲厚· 80nm) ’銀-iG合金薄β旲(§旲厚:iinm) ,Sn02薄膜(膜厚:40nm)計5層,以製成具備具有面 電阻爲5.3Ω/□之透明導電性薄膜層(D)之電磁波遮蔽 功能之透明局分子膜。 對上述之電磁波遮蔽膜;藉下述之方法形成粘接材 層。 將有機色素分散,溶解於醋酸乙酯/甲苯(5 0 : 5 Ow t % )溶劑內以作爲丙烯酸系粘接劑之稀釋液。調整丙 烯系粘接劑/色素摻入稀釋液以便用於吸收電漿顯示 器放射之不需要之發光,對波長5 9 5 nm具有極大吸收之 三井化學製之色素PD- 319,及用於補正白色發光之色 度之三井化學製之紅色色素PS-Red-G之有機色素分別 以1150(wt)ppm, 1050(wt)ppm被含於乾燥之粘接材中 〇 混合丙烯酸系粘接劑/色素摻入稀釋液(80 : 20wt%) ,藉點塗佈機於電磁波遮蔽膜側之面上塗佈乾燥膜厚爲 2 5μπι之膜,乾燥後於粘接面上疊積疏離型膜以形成透 -98- 1225227 五、發明說明(97 ) 明粘接層。 將此膜疊積於實施例8所示之厚度爲2 Ο Ο μ m之墊高 用透明高分子膜之上俾作爲透明導電性薄膜,然後將其 裁斷成長爲960mmX寬爲550mm。 另外,將基體膜,膜厚爲188μπι之反射防止膜(曰本 油脂製之里阿耳克1 200 )裁斷成長爲920mmX寬爲 5 1 0mm,然後將其貼合於透明導電性薄膜層之內側而使 該薄膜層之周緣部露出20mm。再者,藉網板印刷在該 周緣部之22mm寬之範圍上印刷銀糊(三井化學 (公司)製MSP- 6 0 0F)俾被覆透明導電性薄膜層露出之導 通部,經乾燥後形成厚度爲1 5μπι之電極。藉此,得出 透明高分子膜之合計厚度爲0.463mm之光學濾光器膜。 然後將此膜貼合於長爲9 8 0mmX寬爲5 80mmX厚爲2.5mm 之半強化玻璃板上。 (實施例1 1 ) 藉擠壓雙軸(定向)拉伸製成厚度爲200μιη之聚對苯 二甲酸乙二醇酯之膜,並於其一側之主面上自該膜開始 依序形成ΙΤ0薄膜(膜厚:40nm),銀薄膜(膜厚·· 1 lnm) ,IT0薄膜(膜厚:95nm),銀薄膜(膜厚:14nm),IT〇 薄膜(膜厚·· 9 0nm),銀薄膜(膜厚·· 12nm),ΙΤ0薄膜( 膜厚:4〇nm)計7層之透明導電性薄膜層層(F),進而製 成具有面電阻爲2.2Ω/□之透明導電層之電磁波遮蔽 膜。 -99- 1225227 五、發明說明(98 ) 另於未形成此電磁波遮蔽膜之透明導電性薄膜層之 另一側之主面上藉輥對輥方法連續地形成下述之功能性 透明層。亦即,添加光聚和開始劑於多官能之甲基丙烯 酸酯樹脂,另藉照相凹板塗佈機塗佈分散有I TO微粒子 (平均粒徑:1 0nm )之塗佈液,並施予紫外線硬化以形成 導電性硬塗膜(膜厚:3μπι),再在其上藉微照相凹板塗 佈機塗佈含氟之有機化合物溶液,然後於90t下予以 乾燥,硬化,以形成折射率爲1 . 4之反射防止膜(膜厚 :l〇〇nm),進而製成具有硬塗性UISK5400標準之鉛筆 硬度:2H),反射防止性(表面Rv i s : 0 . 9%),帶電防止 性(表面電阻:7 X 1 Ο9 Ω / □),防污性之功能性透明層 〇 接著,將醋酸乙酯/甲苯(5 0 : 5 0wt%)溶液作爲稀釋 液,以80 : 20之比例混合丙烯系粘接劑和稀釋液,藉 點塗佈機塗佈乾燥膜25pm後予以乾燥,然後疊積疏離 型膜以形成透明粘接材層。 將粘附上述功能性透明層之電磁波遮蔽膜裁斷成長 度920mmX寬度510mni,並將其粘貼於裁斷成長度爲 9 60mniX寬度爲5 5 0mmX厚度爲200μπι之墊高用透明高 分子膜之內側而餘留2 0 m m寬之周緣部。 接著,藉網板印刷法將銀糊(三井化學(公司)製之 MSP- 6 00F)印刷於周緣部之22mm寬之範圍俾被覆透明導 電層之厚度方向上之斷面導通部,並予以乾燥以形成厚 -1 0 0 - 1225227 五、發明說明(99 ) 度爲1 5μηι之電極。藉此,得出透明高分二 爲〇 . 4mm之光學濾光器膜。然後將此膜貼 X寬5 80mmX厚2.5inm之半強化玻璃板。 (比較例2 ) 貼合實施例9所示,厚度爲150μΐΏ之近 膜和基體膜厚爲80μπι之反射防止膜以製令 〇·230πιπι之光學濾光器膜。然後將此膜貼1 X寬580mmX厚2.5mm之半強化玻璃板。 (比較例3 ) 貼合實施例10所示,厚度爲75μιτι之電 和基體膜厚爲188μπι之反射防止膜以得出 2 6 3μιη之光學濾光器膜。然後將此膜貼合] 寬580mmX厚2.5mm之半硬化玻璃板。 如上述那樣,將各光學濾光器膜貼合於 並對樣本就耐衝擊性之提昇和剝離性,粘 璃板之狀態進行測試。 耐衝擊性試驗係將貼合於玻璃板上之薄 放置從高1 . 5米處落下重爲5 00 g之鋼球, 玻璃之損傷狀態。各取5張樣本進行試驗 有關剝離性和玻璃上糊殘留試驗係在將 於玻璃板經1小時後將膜自玻璃板剝離, 態。 以上之結果係示於表2。 -10 1- F之合計厚度 合於長980mm 紅外線遮蔽 I整體膜厚爲 会於長980mm 磁波遮蔽膜 整體膜厚爲 ϊ令長 9 8 0mm X 玻璃板上, 接劑殘留在玻 膜樣本朝上 以調查基板 〇 光學膜貼合 然後檢查其狀 1225227 五、發明說明(1〇〇) [表2] 膜總厚(mm) 衝擊性試驗 膜剝離性 玻璃上殘留 粘接材 實施例 9 0.338 無問題 容易剝離 無 實施例 10 0.355 無問題 容易剝離 4be JWS 實施例 11 0.350 無問題 谷易剝離 無 實施例 12 0.413 無問題 容易剝離 ^\w 實施例 13 0.400 無問題 谷易剝離 無 比較例 2 0.155 部份裏面有 飛散玻璃 不易剝離 有 比較例 3 0.263 部份裏面有 飛散玻璃 不易剝離 有 從表2明白,所有的實施例皆提高耐衝擊性,剝離 性,及玻璃上之糊殘留狀態。 如上述那樣,依本發明能提供藉將構成光學濾光器 膜之透明高分子膜之合計厚度作成0 · 3mm以上,能提高 顯示板之保護功能及作業性,能直接貼合於顯示器顯示 面之光學濾光器膜。 (實施例1 4 ) 準備聚對苯二甲酸二乙醇酯膜捲[寬5 5 8mm,長 5 0 0m,厚75μπι]作爲透明高分子膜(B),使用輥塗佈, 藉直流磁控管濺射法,以形成透明導電性薄膜層(D )。 透明導電性薄膜層係將由銦和錫之氧化物作成之薄膜層 (Dt),銀薄膜層(Dm)依B/Dt[厚度40nm]/ Dm[厚度 15nm]/ Dt[厚度 80nm]/ Dm[厚度 20nm]/ Dt[厚度 -1 02- 1225227 五、發明說明(1〇1 ) 8〇nm]/ Dm[厚度 15nm]/ Dt[厚度 40nm]/ Dm[厚度 Unm] / Dt [厚度40nm]之順序疊積而成。銦和錫之氧化 %作成之薄膜層係構成透明高折射率薄膜層,銀薄膜層 係構成銀或銀合金作成之金屬薄膜層。於形成由銦和錫 之氧化物作成之薄膜層上,靶係使用氧化銦•氧化錫之 燒結體[In203:Sn02 = 90: 10(重量比)] ’濺射氣體係使用·氧混合氣體(全壓2 6 6 m P a )。另 外,於形成銀薄膜層上係使用銀作爲靶,濺射氣體係使 用氬氣(全壓266mPa)。於形成鈦層上,係使用鈦作爲 革巴,濺射氣體則使用Μ氣(全壓2 6 6 m P a )。 其次,準備處於透明粘接材[厚度ΙΟΟμιη]係貼在與防 眩性層之相反側之狀態之防眩性膜[寬548mm,長 5 00m,厚 ΙΟΟμιη]。 接著,藉輥對輥方式將上述防眩性膜經透明粘接材 粘貼於透明導電性薄膜之透明導電性薄膜層上以製成膜 捲。透明導電性膜和防眩性膜之寬度方向之中心位置係 成一致。另外,藉輥對輥方式將透明粘接材[厚度 1 ΟΟμίΏ ]貼合於與係爲透明導電性薄膜和防眩性膜之貼 合體之防眩層相反面上。接著在捲之兩端部各5mm寬之 透明導電性薄膜層部份以輥塗佈方式塗佈銀糊。移送膜 捲之速度係設定爲〇.5m/s。 將上述方式得出之薄膜切斷成9 5 8mm之長,以製成 電磁波遮蔽體。第21圖係示出其斷面圖。第21圖 -103- 1225227 五、發明說明(1〇2 ) 上’符號2 3係爲具有電磁波遮蔽能力之透明高分子膜 (B) ’符號30係爲透明粘接層(C),符號24係爲具有功 能性透明層(A )之透明高分子膜(B )。 其中,檢查在每張電磁波遮蔽體1上形成電極所需 之時間。 接著,將電磁波遮蔽體經透明粘接層貼合於電漿顯 示板[NEC製PX-42VP1]之顯示面上。 將平板上之金屬部材以配線接於位在視認面側之電 極俾將電流取出顯示器外部。 啓動電漿顯示板,並根據FCC規範p a r t 1 5〗測定釋 放至外部之電磁波之強度以檢查是否符合C 1 a s s A之基 準。第22圖係示出其斷面圖。 (實施例1 5 ) 準備防眩性膜捲[寬5 5 4mm,長5 00m,厚ΙΟΟμιη],在 與其之防眩性層相反面上與實施例1 4相同地形成透明 導電性薄膜層。接著,藉輥對輥方式將透明粘接材[寬 5 48mm,厚ΙΟΟμπι]及導電性粘接材[寬3mm,厚ΙΟΟμπι] 粘貼於透明導電性薄膜層上。導電性粘接材係貼合於膜 捲之兩端部之位置,以外之部份係貼合透明粘接材。藉 上述製成電磁波遮蔽體。 接著,將電磁波遮蔽體粘貼於電漿顯示板[NEC製 PX- 42VP1 ]之顯示面上。在電漿顯示板之兩個長邊上沿 著端部6mm寬上事先粘貼銅箔帶。導電性粘接材和銅箔 -104- 1225227 五、發明說明(1 〇3 ) 帶貼合之部份係成爲實質之電極。將平板上之金屬部材 以配線接至位在視認面側之電極俾將電流引出顯示器外 部。其它係與實施例1 4同樣地實施。 (實施例1 6 ) 與實施例1 4相同地準備透明導電性薄膜。 其次,準備防眩性膜捲[寬558mm,長500m,厚 1 ΟΟμπι ],並使透明導電性薄膜和防眩性膜之寬度方向 上之中心位置一致。然後在與係爲此透明導電性薄膜和 防眩性薄膜之貼合體之防眩層之相反面上藉輥對輥方式 貼合透明粘接材[厚ΙΟΟμπι]。 於膜捲之端面上塗佈銀糊。藉上述那樣,以製成電 磁波遮蔽體。第23圖係示出其斷面。 其中,檢查在每張電磁波遮蔽體上形成電極所需之 時間。 接著,將電磁波遮蔽體粘貼於電漿顯示板[NEC製 PX-42VP1 ]之顯示面上。然後將平板上之金屬部材藉配 線接至位在視認面側之電極俾將電流引出顯示器外部。 啓動電漿顯示板,並根據FCC規範p a r t 1 5〗測定釋 放至外部之電磁波強度,俾檢查是否符合C 1 a s s A之基 準。 (比較例4 ) 與實施例1 4同樣地,準備聚對苯二甲酸乙二醇酯之 膜捲(寬558 mm,長500m,厚75μπι)作爲透明高分子膜 -105- 1225227 五、發明說明(1〇4) (B ),並在其一側之主面上形成透明導電性薄膜層。 藉輥對輥方式將透明粘接材[厚度ΙΟΟμιπ]貼合於與上 述薄膜之透明導電性薄膜形成面相反之面上。 接著;——邊切斷製成之薄膜,一邊經弱粘接材貼合 於玻璃基板[大小爲560mmX960mmX厚3mm]上。 然後,準備處於透明粘接材係粘貼於與防眩性層相 反側之狀態之防眩性膜捲[寬5 4 8 m m,長5 0 0 m,厚 10 Ομηι],接著,一邊切斷,一邊貼合於上述貼合體之 透明導電性薄膜層上。此時,係貼合於位在端部距透明 導電性薄膜層之外周部份5mni之內側上。 接著,藉網板印刷法將銀糊塗佈包覆外周部份之透 明導電性薄膜層露出部份之全周,並予以乾燥。乾燥後 ,從玻璃基板剝離。如此,即製成電磁波遮蔽體。其它 ,則與實施例1 4相同地實施。 以上之結果係示於表3。 [表3 ] 電極形成時間(秒) [每張電磁波遮蔽體] 電磁波遮斷效果(是 否在FCC Cl as sA之 基準內) _ ΐ施例1 4 2 無問題 _ 實施例1 5 2 無問題 一 實施例1 6 0.5 無問題 _ 比較例4 180 無問題 一 從表3明白所有之實施例,有關電磁波遮斷效果’ 係與比較例所示之以往之情形相同地無問題。另外’形 成電極所需之時間也大幅地縮短,從而大幅地提高生_ -106- 1225227 五、發明說明(1〇5 ) 效果。 (實施例1 7 ) 準備寬5 6 5mm,長5 0 0m之聚對苯二甲酸二乙醇酯膜 捲[厚度75μηι]作爲透明高分子膜(B),接著,在其一側 之主面上使用輥塗佈機,藉磁控管濺射法形成透明導電 層(D )。透明導電性薄膜層係將銦和錫之氧化物作成之 薄膜層(Dt),銀薄膜層(Dm)依B/Dt[厚度40nm]/ Dm[厚 度 15nm]/ Dt[厚度 80nm]/ Dm[厚度 20nm]/ Dt[厚度 80nni]/ Dm[厚度 15nm]/ Dt[厚度 40nm]/ Dm[厚度 15nm]/ Dt[厚度40nm]之順序疊積而成。銦和錫之氧化 物作成之薄膜層係構成透明高折射率薄膜層,銀薄膜層 係構成銀或銀合金作成之金屬薄膜層。在形成銦和錫之 氧化物作成之薄膜層上,係以氧化銦•氧化錫之燒結體 [In203:Sn02 = 90:10(重量比)] 作爲?E,以Μ ·氧混合氣體(全壓266mPa,氧分壓5mPa) 作爲濺射氣體。另外,於形成銀薄膜層上,係使用銀作 爲靶,使用氬氣(全壓26 6mPa)作爲濺射氣體。於形成 鈦層上,係使用鈦作爲靶’使用氬氣(全壓2 6 6 m P a )作 爲濺射氣體。 其次,準備處於透明粘接材係粘貼於與防眩性層相 反側之狀態之寬5 6 5 mm ’長5 00m之防眩性膜捲。 接著,藉輥對輥方式將上述防眩性膜經透明粘接材 粘貼於透明導電性薄膜之透明導電性薄膜層’以製成一 -107- 1225227 五、發明說明(106) 個膜捲。另外,藉輥對輥方式將透明粘接材貼合於與係 爲此透明導電性薄膜和防眩性膜之貼合體之防眩層相反 之面上。 然後,一邊切斷藉上述得出之膜,一邊經透明粘接 材貼合於透明支撐基板上。 接著,藉網板印刷法將銀糊塗佈於端部全周俾包覆 膜側面,並予以乾燥。 如此則製成電磁波遮蔽體。第2 3圖係示出其斷面圖 〇 選擇在電極上相隔最遠之兩點,檢查此兩點間之電 阻値。 另外,也檢查電磁波遮蔽體每張貼合所需之時間。 再.者,透明導電性膜和防眩性膜之光學濾光器每張之貼 合時間可用能自膜捲切出之膜之張數除整個輥對輥方式 所用之整個貼合時間求出。 (實施例1 8 ) 準備寬5 6 5_,長5 00m之防眩性膜捲,與實施例17 同樣地在與其之防眩性層相反之面上形成透明導電性薄 膜層。接著,藉輥對輥方式將透明粘接材貼合於透明導 電性薄膜層上。 一邊切斷藉上述得出之薄膜,一邊將其經透明粘接 材貼合於透明支撐基板上。 然後,藉網板印刷法將銀糊塗佈於端部全周俾包覆 -108- 1225227 五、發明說明(107 ) 月旲之側面,並予以乾燥。如此則製成電磁波遮蔽體。 選擇電極上相隔最遠之兩點,測定其間之電阻。 另外,也檢查電磁波遮蔽體每張貼合所需之時間。 (實施例19) 準備寬565mm,長500m之防眩性膜捲,接著,與實 施例1 7相同地在與其之防眩性層相反之面上形成透明 導電性薄膜層,以製作長5 0 0 m之防眩性透明導電性膜 捲。 準備銅帶[寬15mm,厚75μιη,長500〇1,單面上有粘 貼導電性粘接材料]兩捲。 將銅帶貼合於防眩性透明導電膜之兩端部。銅帶之 導電性粘接材係接於形成爲防眩性透明導電性之透明導 電層那樣貼合。另外,各銅帶和防眩性透明導電薄膜之 重疊寬係爲1 0mm。貼合步驟係藉輥對輥方式進行。 準備透明粘接材[寬575mm,厚25mm,長500m] —捲 。一邊將此透明粘接材貼合於側面有貼合銅帶之防眩性 透明導電性膜,一邊將其裁斷成長爲9 5 8mm之薄片。粘 接材係粘合於未粘接透明導電層及銅帶之加工面上。貼 合步驟係藉輥對輥方式進行。如此則製成電磁波遮蔽體 。第24圖係示其斷面。 選擇電極上相隔最遠之兩點並測定其間之電阻値。 另外,也檢查電磁波遮蔽體每張貼合所需之時間。 (實施例2 0 ) -109- 1225227 五、發明說明(1〇8) 準備寬565inm’長500m之防眩性膜一捲,接著與實 施例1 7相同地在與其之防眩性層相反之面上形成透明 導電性薄膜層。然後,藉輥對輥方式一邊將透明粘接材 貼合於h明導電性薄膜層上’ 一邊將其裁斷成長958mm 之薄片,以製成電磁波遮蔽體。 準備玻璃基板[大小爲545mmX960mm,厚爲3mm],在 其兩長邊上設置銅板[大小爲10mmX 9 6 0mm,厚爲3mm] 。於銅板上開有螺絲孔。螺絲孔係在長向上端到端間隔 3 0mm設置。將電磁波遮蔽體貼合於合倂此玻璃基板和 銅板之支撐基體上。對形成於銅板上之螺絲孔鎖上螺絲 。螺絲係從電磁波遮蔽體之最外部表面貫穿電磁波遮蔽 體那樣鎖於螺絲孔。此時,螺絲成爲實質上之通孔電極 。如此則製成電磁波遮蔽體。第2 5圖係示出其斷面圖 〇 選擇電極上相隔最遠之兩點測定其間之電阻値。 另外,也測定電磁波遮蔽體每張貼合所需之時間。 (比較例5 ) 與實施例1 8相同地,準備作爲透明高分子膜(B )之 聚對苯二甲酸二乙醇酯膜(寬5 6 5mm,長5 00m,厚75μηι) 一捲,並在其一側之主面上形成透明導電性薄膜層。 藉輥對輥方式在與上述膜之透明導電性薄膜形成面 相反之面上貼合透明粘接材。 接著,一邊切斷得出之膜一邊將其經透明粘接材貼 -110- 1225227 五、發明說明(109 ) 合於透明支撐基板上。 另外,準備處於透明粘接材係粘貼於與防眩性層相 反側上之狀態之寬5 6 5 m m,長5 0 0 m之防眩性膜,一邊 切斷’ 一邊將其貼合於上述之貼合體之透明導電性薄膜 層上。此時係貼合於端部距透明導電性薄膜層之外周部 份5mm之內側之位置上。 接著;藉網板印刷法塗佈銀糊俾被覆外周部份之透 明導電性薄膜層露出部份之全周,並予乾燥。如此則製 成電磁波遮蔽體。 選擇電極上相隔最遠之雨點並測定其間之電阻値。 另外,也測定電磁波遮蔽體每張所需之貼合時間。 以上之結果係列於表4 [表4] 電磁波遮蔽體每張膜 貼合之時間(秒) 電極間之電阻値(Ω ) 實施例1 7 1 80 7.2 實施例1 8 120 7 . 3 實施例lTl 120 7 . 1 實施例2〇ι 1 20 7.3 比較例5 230 7 . 1 從表4明白所有之實施例,電極間之電阻値相較於 比較例所示以往之電極形狀者幾無降低。另外,所有之 實施例,電磁波遮蔽體每張膜貼合之時間大幅地縮短, 從而大幅地提昇電磁波遮蔽體之生產效果° (實施例2 1 ) 除了下述之點外,餘皆與實施例1相同地實施。 -111- 1225227 五、發明說明(1 1 0 ) 透明積層體1係如下述那樣製成。 將吸收近紅外線之色素,三井化學(公司)製之 SIR1 28,0 . 25重量%,SIRI 30,0 · 23重量%混合於聚對 苯二甲酸二乙醇酯小九1 2 0 3 (優尼佳(公司)製),並以 260〜2 80°C溫度使其溶融,然後藉雙軸軋延擠壓機製成 厚爲188μιτι之高分子膜(B)。 在藉上述製成之高分子膜(Β)之一側之主面上塗佈含 有交鏈(Cross-linked)材之聚酯系之粘接劑厚達ΙΟμπι 。其次,疊積厚度7μηι,孔徑Ιμπι,氣孔性12%之銀箔 。再者,在此銀箔之兩主面上事先藉濺射法形成厚爲 50μιη之鉬(molybdenum)膜。接著,使用熱硬化型之墨 ,藉網板印刷法在金屬層上印出格柵寬爲20μιη,網目 之大小爲1 50μπι X 1 50μπι之格柵型樣。然後在90°C下加 熱5分鐘使墨硬化後藉氯化鐵(f e r r i c c h 1 〇 r i d e )水溶 液除去未被墨保護之部份之金屬層,接著以溶劑除去墨 。如此能得出具有第2 7圖所示型樣之金屬層,開口率 爲7 5%之積層體。測得之可視光線之平均透射率係爲 6 7%。測出之面電阻係爲0 . 1 1 Ω / □。 (實施例2 2 ) 除了下述之點外餘與實施例3同樣地實施。 用下述之方法準備高分子膜(B)/透明導電層(D)。 將吸收近紅外線之色素,三井化學(公司)製S I R 1 2 8 ,0 . 2 5重量%,S I R 1 3 0,0 . 2 3重量%混合於聚對苯二甲 酸二乙醇酯之小九1 20 3 (優尼佳(公司)製),並以2 6 0〜 -112- 1225227 五、發明說明(1 1 1 ) 28〇°c之溫度使其溶融,然後藉雙軸軋延擠壓機製成厚 度爲1 88μπι之高分子膜(B)。 接著,藉丙烯酸系之粘接劑在上述製作之高分子膜 (Β)上疊積厚度7μπι,孔徑Ιμπι,氣孔性爲8%之銀箔。 另外’也是事先對此銀箔之兩面施予鍍鉻處理。其次, 將鹼性顯影型之光致抗蝕劑塗佈於銅層上,預先烘焙後 使用光遮蔽曝光,顯影以形成格柵寬爲25μπι,網目之 大小爲125μιτιχ125μηι之格柵型樣,然後藉氯化鐵水溶 液浸蝕未被抗蝕劑保護之1部份之金屬層,接著在鹼性 溶液中除去抗蝕劑。如此則能得出具有第2 7圖所示之 型樣之金屬層,開口率爲69%之積層體。測得可視光線 透射率爲65%,面電阻爲0.07Ω/Ε]。 從表5明白藉使用本發明之電磁波遮蔽體能區分 VCCI規格之Cl as s Β或Cl as s Α。透明導電層之面電阻 愈低,電磁波遮蔽體之能力愈優。 另外,藉使用本發明之電磁波遮蔽體,具有優良之 近紅外線低減能力。 使用金屬網層之本發明之電磁波遮蔽體,具有優良 之可視光透射性,電磁波遮蔽性,近紅外線遮蔽性。 更甚者,本發明之電磁波遮蔽體,藉功能性透明層 (A )具有各種功能,而有優良之耐環境性及/或耐擦傷 性及/或防污性及/或靜電防止性。 -113- 1225227 五、發明說明(112 ) [表5] 電磁波遮蔽 體 無 實施例21 實施例22 比較例Ί~ 透明導電層 之面電阻Ω /□ 0.11 0.07 Ϊ5 ^ 放射電%強 度,dBp/m 33MHz 59 21 19 52 ^ 90MHz 52 24 21 49 ^ 近紅外線透 射率,% 820nm 20 20 79 〜 850nm - 5 5 78 950nm - 10 [To 70 誤動作界限 距離,m 5以上 0.8 0.8 5以上〜 [發明效果] 如上g羊述’依本發明能以低成本實現作爲優良透射 特性’透射率’反射特性之調光膜而運作之顯示器用濾 光器。藉將此濾光器直接形成在電漿顯示器等之顯示裝 置之顯示面上,能不顯著損害顯示器之亮度下提高其色 純度及階調,從而能實現具有優良畫質之顯示裝置。 另外,能以低成本實現作爲具有優良之透射特性, 透射率,可視光線反射率,能遮斷自電獎顯示器等之顯 示裝置產生之電磁波而運作顯示器用濾光器。更甚者, 有效率地低減顯示器射出之800〜lOOOnm附近之近紅外 線,因此,不會對週邊電子機器之遙控,傳送系光通信 等使用之波長有不良影響,能防止其等之誤動作。另外 ,能實現具有兼備優良之耐候性•耐環境性,反射防止 性及/或防眩性,耐擦傷性’防污性’帶電防止性等 -1 14- 1225227 五、發明說明(113) ,之優良畫質之顯示裝置。 另外,將構成顯示器用濾光器之透明高分子膜之合 計厚度作爲0 . 3 Him以上,藉此能提供提昇電漿顯示板之 保護功能及作業性,能直粘貼於電漿顯示器之顯示面之 電磁波遮蔽體或調光膜。 另外,藉規劃電磁波遮蔽體之電極形狀,能具備充 份之電磁波遮蔽效果,且大幅地縮短形成電極所需之時 間’從而生產效率大幅地提昇。 [參考符號說明] 10· · · · ·透明導電層 Π * · · · •高折射率透明薄膜層 12 · · . · ·金屬薄膜層 2〇 · · . · ·高分子膜 21· · · · •含有色素之高分子膜 2 3,24 .....透明高分子膜 25· · · · ·墊高用透明高分子膜 41 · · · · ·導電性粘接層 3 0,40 .....透明粘接層 22 · · · · ·硬塗層 50 · · · · ·電極 6〇.....具有防污性之反射防止膜 6 1.....反射防止膜 62.....具有帶電防止性之硬塗膜 -115- 1225227 五、發明說明(114) 6 3.....硬塗膜 7 0.....防眩層 71.....防眩性膜 80.....導電性銅箔粘接帶 -116-Next, on the main surface of one side of the PET film wound into a roll shape, a functional transparent film 2 described below was continuously formed as a functional transparent layer (A) by a roll-to-roll method. That is, a photopolymerization initiator is added to the polyfunctional methacrylate resin, and a coating liquid in which organic silicon dioxide microviscous (average particle diameter ·· 15 μ rii) is dispersed is prepared and applied. Purple-9 1-1225227 5. Description of the invention (90) The outer line is hardened to form a system with anti-glare properties (turbidity measured by whiteness meter: 5%), hard coating properties (pencil hardness: 2H), the anti-glare layer Functional transparent film 2. On the PET film surface of the functional transparent film 2 / the pigment-doped PET film, the same material as the adhesive material 1 of Example 1 was formed, but the pigment-free adhesive material 2 was formed. The transparent adhesive layer is laminated with a separation film and wound into a roll shape to obtain a roll-shaped light-adjusting film of the present invention having a separation film on the transparent adhesion layer. Next, the dimming film was cut into a paper shape, and the separation-type film was peeled off, and then bonded to the front surface of the plasma display panel by a laminator (display portion: 920 mm X 520 mm). At this time, cutting is performed, and the alignment of the bonding position is such that the transparent adhesive layer (C) is bonded to at least the entire display portion. After lamination, the autoclave treatment was performed under a pressure heating condition of 60 ° C and 2 X 10 5 Pa to obtain a display device having the light-adjusting film of the present invention. As a cross-sectional view showing an example of the light-adjusting film of the present invention and its installation state, the cross-section of the light-adjusting film is shown in FIG. In FIG. 10, reference numeral 00 is a display display portion, reference numeral 21 is a transparent adhesive layer (C) containing a pigment, reference numeral 30 is a transparent adhesive layer (C), and reference numeral 70 is an anti-glare layer (with Anti-glare, hard-coating functional transparent layer (A)). Plasma displays, which are display devices having the dimming films of the present invention of Examples 5 and 6 prepared as described above, were evaluated together with the plasma display before the dimming film was formed as follows. 1) The transmittance of the dimming film Use a CRT color analyzer (CA 100) made by Minoda (Company), find -92- 1225227 2. Description of the invention (91) The spectral emission brightness of the plasma display before and after the formation of the dimming film is expressed as a percentage of the brightness after the formation to the brightness before the formation. 2) The tone of the bright part of the plasma display (the highest and lowest brightness ratio) is evaluated before and after the formation of the dimming film. When the ambient illumination is 1 00 1 X, use the brightness meter (LS-1 1 0) made by Minoda (the company) to measure the maximum brightness (cd / m2) of the plasma display panel for white display and black display The minimum brightness (cd / m2) and find the ratio (highest brightness / lowest brightness). 3) The color purity of the luminescent color of the plasma display is evaluated before and after the formation of the dimming film. When displaying white (W), red (R), green (G), blue (B), etc., use a CRT color analyzer (CA100) manufactured by Minoda (Company) to measure the RGB chromaticity (x, y) and white chromaticity, color temperature, and white deviation from the black body locus. The closer the three primary colors of the PDP are to the color reproduction range of the RGB colors determined by the NTSC method, the better. In addition, when the ratio of the area of the three primary colors emitted by the PDP in the X, y chromaticity diagram to the area of the color reproduction range of the NTSC is close to 100%, the color reproduction range is enlarged. The light transmittance of the light-adjusting plasma display of the present invention in Example 5 is 6 9% in terms of visible light transmittance. By using a pigment with a maximum absorption at 595nm, which does not need to emit light, the transmittance at 595nm is necessary. The percentage of light transmission with a wavelength of 61 Onm is 21%. In addition, the plasma display with such characteristics can be used to form a light-adjusting film with a functional transparent layer (A) that has anti-reflection prevention-93-1225227. V. INTRODUCTION (92) to suppress reflection on the display surface, and secondment The transmission characteristics of the light film have been increased from 20 before the light control film to 4 1 under the condition that the ambient illuminance is 001 X. Brightness. There is no significant loss and little reflection, so a plasma display with good visibility can be obtained. In particular, the purity of red and green luminous colors has been significantly improved. The improvement of the color purity of green light emission is determined by the decrease of the yellow-green light emission of the 5 9 5 nm absorption pigment. -Similarly, in the light-adjusting film of the present invention of Example 6, the transmittance of the plasma display light is 70% in terms of the visible light transmittance, and the pigment with a maximum absorption of the wavelength of 5 9 5 ηη unnecessary light emission. Similarly, by using a pigment having a maximum absorption at a wavelength of 5 8 5 nm, the percentage of the transmittance of 5 8 5 nm to the transmittance of a wavelength of 61 Onm that needs to emit light is 30%. In addition, the plasma display with such characteristics, based on the transmission characteristics of the light-adjusting film, the gradation of the bright place under the condition that the ambient illuminance is 100 1 X is increased from 20 to 37 before the light-adjusting film is formed. The brightness is not significantly attenuated, and there is little reflection, so a plasma display with good visibility can be obtained. In particular, the purity of red and green luminous colors has been significantly improved. The improvement of the color purity of green emission depends on the decrease of the yellow-green emission of 5 9 5 ηπ and 5 8 5 nm absorbing pigments. In particular, the effect of absorbing pigments with a shorter wavelength of 5 8 5 n m is large. FIG. 11 is an X-y chromaticity diagram showing a color reproduction range before and after the light control film of the present invention is formed. Figure 11 shows the tone of Example 5 formed on a PDP (plasma display panel) -94-1225227. V. Description of the invention (93) White (W), which is depicted on the X_y chromaticity diagram before and after, red (R), green (G) 'blue (B) chromaticity. In addition, the chromaticity of the target NTSC is also depicted. S € can be evaluated in comparison to the blackbody locus that is a locus of good white hue. It is understood that the use of the electromagnetic wave shielding body of the present invention has less chromaticity deviation of white color. In addition, the color temperature is higher than that of the former forming the light control film of the fifth or sixth embodiment. A color temperature rise of about 70000K to about 9500K 'indicates that the white deviation from the black body locus is almost zero. In addition, the triangle connecting RGB points is shown in the figure. The closer this triangle is to NTSC, the better. It is clear from the figure that by using the light control film of Embodiment 5 or Embodiment 6, the chromaticity of red and green approaches the chromaticity shown by NTSC, which indicates that the triangle of the color reproduction range has been enlarged. The percentage of the triangular area to the area of the triangle represented by NTSC was determined. It was 74% before the light-adjusting film of Example 5 was formed, and it was improved to 86% after formation. In addition, the situation of forming the light-adjusting film of Example 6 was improved to 88%. In particular, the light-adjusting film of the present invention has multifunctionality by virtue of the functional transparent layer (A), and can obtain excellent scratch resistance and / or antifouling properties and / or antistatic properties. (Example 7) SIR-128 and SIR-130 made by Mitsui Chemicals (Nippon Mitsui Chemicals), which are near-infrared light-absorbing pigments, were each mixed with 0.15 wt% of polyethylene terephthalate-95-1225227. 5. Description of the invention ( 94) Alcohol ester 1 20 3 (manufactured by Unicam (company)), melted at 28 (TC), and stretched by biaxial extrusion (orientation) to form a near-infrared light shielding film with a thickness of 15 μm. In addition, ethyl acetate / toluene (50:50 wt%) solvent was used as the diluent, and the acrylic adhesive and the diluent were mixed at a ratio of 80:20, and then applied to the near infrared by a dot coater. The thickness of the dry film on the masking film is 25 μm, and the adhesive layer is formed after drying. Then, a detachable film is stacked thereon. The near-infrared shielding film (B) produced as described above is stacked as a substrate. Film, anti-reflection film with a film thickness of 188 μm (Riacker 1200 made by Japan Grease), and cut it to 960 mm X width 550 _, thereby the total thickness of the transparent polymer film is 0.  3 3 8 optical filter film. Then, attach this film to a length of 9 80mmx width of 5 80mmX thickness of 2.  5 mm m semi-hardened glass plate. (Example 8) SIR-128 and SIR-130 manufactured by Mitsui Chemicals, Inc., which are near-infrared absorbing pigments, were each added. 3wt% is mixed with polyethylene terephthalate small nine 1 20 3 (manufactured by Unicam), melted at a temperature of about 280 ° C, and then biaxially squeezed (oriented) Stretch to make a near-infrared shielding film with a thickness of 7 5 μm. In addition, ethyl acetate / toluene (50:50 wt%) solvent was used as the diluent, and the acrylic adhesive and the diluent were mixed at a ratio of 80:20, and then applied to the near-infrared shielding by a dot coater. The film surface has a dry thickness of 25 μm. After drying, an adhesive material -96-1225227 is formed. 5. Description of the invention (95) layer, and then a detachable film is stacked thereon. In addition, without adding a near-infrared absorbing dye, a transparent polymer film for matting with a thickness of 200 µm was prepared in the same manner. On the other hand, a near-infrared shielding film is laminated to form a base film, and an anti-reflection film with a film thickness of 80 μm (Riaco UOO, made by Japan Oil Co., Ltd.) is cut to a length of 960 mm and a width of 550 mm. 200μm thick transparent polymer film for padding. Thus, an optical filter film having a total thickness of 0.35 5 mm of the transparent polymer film was obtained. Then attach this film to a length of 980inm × width of 5 × 80mm × thickness of 2. 5mm semi-hardened glass. (Example 9) The following functional transparent film was formed on the main surface of the near-infrared shielding film having a thickness of 15 μm as shown in Example 7 by a roller-to-roll method as a functional transparent layer (A ). That is, a photopolymerization initiator is added to the polyfunctional methacrylate resin, and a coating liquid in which organic silicon dioxide fine particles (average particle diameter: 15 μm) is dispersed is prepared. After coating, UV curing is applied to A transparent layer with anti-glare properties (turbidity measured by whiteness meter: 5%) and hard-coating properties (pencil hardness: 2H) is formed. The transparent polymer film with a thickness of 200 μηι as shown in Example 14 was laminated on the transparent polymer film having the near-infrared shielding function and the anti-glare function, and then cut and grown to 960 mm. The X width is 5 5 Omm ', so that the total thickness of the transparent polymer film is 0.  3 5 0mm -97- 1225227 V. Optical filter film of invention description (96). Then attach this film to a length of 980mm × width of 580mm × thickness of 2. 5mm half tempered glass. (Example 10) A polyethylene terephthalate film having a thickness of 75 μm was produced by extrusion biaxial (orientation) stretching, and a Sn02 film was sequentially formed from this film on the main surface on one side of the film (Film thickness: 40nm), silver thin film (film thickness: 9nm), Sn〇2 film (fl 旲 thickness · 80nm) 'Silver-iG alloy thin β 旲 (§ 旲 thickness: iinm), Sn02 thin film (thickness: 40nm ) Count 5 layers to make it with a surface resistance of 5. 3Ω / □ transparent conductive thin film layer (D). Transparent local molecular film with electromagnetic wave shielding function. For the above electromagnetic wave shielding film, an adhesive material layer was formed by the following method. The organic pigment is dispersed and dissolved in a solvent of ethyl acetate / toluene (50: 5 Owt%) as a diluent for an acrylic adhesive. Adjust the acrylic adhesive / pigment into the diluent so that it can absorb unwanted light emitted from plasma displays, and the pigment PD-319 made by Mitsui Chemicals, which has a maximum absorption of 5 9 5 nm, and is used to correct white Luminescent chromaticity: Mitsui Chemical's red pigment PS-Red-G organic pigments are contained in dry adhesive materials at 1150 (wt) ppm and 1050 (wt) ppm, respectively. 0 mixed acrylic adhesive / pigment Mix with diluent (80: 20wt%), apply a dry coater with a thickness of 25 μm to the surface of the electromagnetic wave shielding film side by a dot coater, and then deposit a detachable film on the adhesive surface to form a transparent layer. -98- 1225227 V. Description of the invention (97) The adhesive layer is explained. This film was laminated on a pad having a thickness of 200 μm as shown in Example 8. A transparent polymer film was used as a transparent conductive film, and then it was cut and grown to 960 mm × width 550 mm. In addition, a base film with an antireflection film with a thickness of 188 μm (Riaco 1200 made by Ben Grease) was cut and grown to 920 mm X 5 10 mm wide, and then bonded to the inside of the transparent conductive film layer The peripheral edge portion of the thin film layer was exposed by 20 mm. In addition, a silver paste (MSP-6 0F, manufactured by Mitsui Chemicals, Inc.) was printed on a 22 mm wide area of the peripheral portion by screen printing, and the conductive portion exposed by the transparent conductive film layer was covered to form a thickness after drying. It is an electrode of 15 μm. Thereby, the total thickness of the transparent polymer film is obtained as 0. 463mm optical filter film. Then attach this film to a length of 980mm, a width of 580mm, and a thickness of 2. 5mm half tempered glass. (Example 1 1) A film of polyethylene terephthalate having a thickness of 200 μm was made by biaxial (orientation) extrusion, and sequentially formed on the main surface of one side from the film ITO thin film (film thickness: 40 nm), silver thin film (film thickness · 1 lnm), IT0 thin film (film thickness: 95 nm), silver thin film (film thickness: 14 nm), IT thin film (film thickness · 90 nm), Silver thin film (film thickness · 12nm), ITO film (film thickness: 40nm) 7 transparent conductive thin film layers (F), and then made to have a sheet resistance of 2. Electromagnetic wave shielding film of 2Ω / □ transparent conductive layer. -99- 1225227 V. Description of the invention (98) In addition, the following functional transparent layer was continuously formed on the main surface of the other side of the transparent conductive film layer on which the electromagnetic wave shielding film was not formed by a roll-to-roll method. That is, a photopolymerization and starter is added to a polyfunctional methacrylate resin, and a coating liquid in which I TO fine particles (average particle diameter: 10 nm) are dispersed is applied by a gravure coater, and is applied. UV curing to form a conductive hard coating film (film thickness: 3 μm), and then apply a fluorine-containing organic compound solution by a micro gravure coater, and then dry and harden at 90 t to form a refractive index For 1.  4 anti-reflection film (film thickness: 100 nm), and then made into a pencil with a hard coating UISK5400 standard hardness: 2H), anti-reflection (surface Rv i s: 0.  9%), antistatic property (surface resistance: 7 X 1 〇9 Ω / □), a functional transparent layer with antifouling properties. Then, an ethyl acetate / toluene (50: 50 wt%) solution was used as a diluent. The acrylic adhesive and the diluent were mixed at a ratio of 80:20, and the dry film was applied by a dot coater for 25pm and then dried, and then the detachable film was stacked to form a transparent adhesive material layer. The electromagnetic shielding film adhered to the functional transparent layer was cut into a length of 920mmX and a width of 510mni, and it was pasted on the inside of the transparent polymer film for padding which was cut into a length of 960mniX and a width of 5 50mmX and a thickness of 200μm. Leave a 20 mm wide peripheral edge. Next, a silver paste (MSP-6 00F manufactured by Mitsui Chemicals, Inc.) was printed on a 22 mm wide area of the peripheral portion by a screen printing method, and the conductive section in the thickness direction of the transparent conductive layer was covered and dried. In order to form a thickness of -1 0 0-1225227. V. Description of the invention (99) The electrode is 15 μηι. From this, we get a transparent high score of two.  4mm optical filter film. Then attach this film X width 5 80mm X thickness 2. 5inm half strengthened glass plate. (Comparative Example 2) As shown in Example 9, a near-film having a thickness of 150 μ 近 and an anti-reflection film having a base film thickness of 80 μm were laminated to produce an optical filter film having a thickness of .230 μm. Then stick this film 1 X width 580mm X thickness 2. 5mm half strengthened glass plate. (Comparative Example 3) As shown in Example 10, an anti-reflection film having a thickness of 75 μm and an antireflection film with a base film thickness of 188 μm was laminated to obtain an optical filter film of 2 6 3 μm. Then attach this film] width 580mmX thickness 2. 5mm semi-hardened glass plate. As described above, each of the optical filter films was bonded to each other, and the samples were tested for improvement in impact resistance, peelability, and state of the glass plate. The impact resistance test is to place the thin layer attached to the glass plate from a height of 1.  At 5 meters, a steel ball weighing 500 g is dropped, and the glass is damaged. Five samples were taken for each test. The peelability test and the glass paste residue test were performed after the film had been peeled from the glass plate for 1 hour. The above results are shown in Table 2. The total thickness of -10 1-F is 980mm in length. The overall thickness of the infrared shielding I is about 980mm. The overall thickness of the magnetic shielding film is about 980mm in length. X The glass plate is left with the adhesive on the glass sample. To investigate the substrate 0 optical film lamination and check its state 1225227 V. Description of the invention (100) [Table 2] Total film thickness (mm) Impact test Residual adhesive material on the film peelable glass Example 90. 338 No problem Easy to peel off None Example 10 0. 355 No problem Easy to strip 4be JWS embodiment 11 0. 350 No problem Valley easy peeling None Example 12 0. 413 No problem Easy to peel off ^ \ w Example 13 0. 400 No problem Gu Yi peeling None Comparative Example 2 0. There are scattered glass in part 155, and it is not easy to peel off Yes Comparative example 30. There is scattered glass in part 263. It is difficult to peel off. Yes. As can be seen from Table 2, all the examples have improved impact resistance, peelability, and residual state of the paste on the glass. As described above, according to the present invention, by providing the total thickness of the transparent polymer film constituting the optical filter film to be greater than or equal to 0.3 mm, the protection function and workability of the display panel can be improved, and the display panel can be directly bonded to the display surface. Optical filter film. (Example 1 4) A polyethylene terephthalate film roll [5 5 8 mm in width, 500 m in length, and 75 μm in thickness] was prepared as a transparent polymer film (B), which was coated by a roller, and a DC magnetron was used. A sputtering method to form a transparent conductive thin film layer (D). The transparent conductive thin film layer is a thin film layer (Dt) made of an oxide of indium and tin. The silver thin film layer (Dm) is B / Dt [thickness 40nm] / Dm [thickness 15nm] / Dt [thickness 80nm] / Dm [ Thickness 20nm] / Dt [Thickness-1 02-1225227 5. V. Description of the invention (10) 80nm] / Dm [Thickness 15nm] / Dt [Thickness 40nm] / Dm [Thickness Unm] / Dt [Thickness 40nm] Sequentially stacked. The thin film layer formed by the oxidation of indium and tin constitutes a transparent high refractive index thin film layer, and the silver thin film layer constitutes a metal thin film layer made of silver or a silver alloy. On the formation of a thin film layer made of an oxide of indium and tin, the target is a sintered body using indium oxide and tin oxide [In203: Sn02 = 90: 10 (weight ratio)] 'Sputter gas system uses an oxygen mixed gas ( Total pressure 2 6 6 m P a). In addition, silver was used as a target for forming the silver thin film layer, and argon gas (full pressure 266 mPa) was used as the sputtering gas system. For forming the titanium layer, titanium was used as the Geba, and the sputtering gas was M gas (total pressure of 266 mPa). Next, prepare an anti-glare film [width 548 mm, length 500 m, thickness 100 μm] in a state in which a transparent adhesive material [thickness 100 μm] is stuck on the side opposite to the anti-glare layer. Next, the anti-glare film was pasted on a transparent conductive film layer of a transparent conductive film through a transparent adhesive material by a roll-to-roll method to form a film roll. The widthwise center positions of the transparent conductive film and the anti-glare film are aligned. In addition, a transparent adhesive material [thickness 1 ΟΟμίΏ] was laminated on the opposite side of the anti-glare layer of a laminated body made of a transparent conductive film and an anti-glare film by a roll-to-roll method. Next, a silver conductive paste was applied to the transparent conductive film layer portion having a width of 5 mm at each end portion of the roll by a roll coating method. The speed of the film roll is set to 0. 5m / s. The film obtained in the above manner was cut to a length of 958 mm to make an electromagnetic wave shielding body. Fig. 21 is a sectional view thereof. Figure 21-103-1225227 V. Description of the invention (102) The symbol "3" is a transparent polymer film with electromagnetic wave shielding ability (B) "The symbol 30 is a transparent adhesive layer (C), symbol 24 It is a transparent polymer film (B) with a functional transparent layer (A). Among them, the time required to form an electrode on each electromagnetic wave shielding body 1 was examined. Next, the electromagnetic wave shielding body was bonded to the display surface of the plasma display panel [PX-42VP1 by NEC] via a transparent adhesive layer. Connect the metal parts on the flat plate to the electrodes located on the viewing surface side with wires, and take the current out of the display. Activate the plasma display panel and measure the intensity of electromagnetic waves released to the outside in accordance with FCC specifications p a r t 1 5 to check whether it meets the C 1 a s s A standard. Fig. 22 is a sectional view thereof. (Example 15) An anti-glare film roll [5 5 4 mm in width, 500 m in length, and 100 μm in thickness] was prepared, and a transparent conductive film layer was formed on the side opposite to the anti-glare layer in the same manner as in Example 14. Next, a transparent adhesive material [width 5 48 mm, thickness 100 μm] and a conductive adhesive material [width 3 mm, thickness 100 μm] were adhered to the transparent conductive film layer by a roll-to-roll method. The conductive adhesive is bonded to the two ends of the film roll, and the other parts are bonded to the transparent adhesive. An electromagnetic wave shielding body is manufactured by the above. Next, the electromagnetic wave shielding body was stuck on the display surface of a plasma display panel [PX-42VP1, manufactured by NEC]. A copper foil tape was affixed in advance on two long sides of the plasma display panel along a 6 mm width of the end portion. Conductive adhesive material and copper foil -104- 1225227 V. Description of the invention (103) The part with the lamination becomes the substantial electrode. Connect the metal parts on the flat plate to the electrodes located on the viewing surface side with wires, and draw the current out of the display. The other parts are implemented in the same manner as in Example 14. (Example 16) A transparent conductive film was prepared in the same manner as in Example 14. Next, prepare an anti-glare film roll [558 mm wide, 500 m long, 100 μm thick], and align the centers of the transparent conductive film and the anti-glare film in the width direction. Then, a transparent adhesive material [thickness 100 μm] is laminated on the opposite side to the anti-glare layer of the laminated body of the transparent conductive film and the anti-glare film by a roll-to-roll method. Apply silver paste on the end surface of the film roll. By doing so, an electromagnetic wave shielding body is produced. Fig. 23 shows a cross section thereof. Among them, the time required to form an electrode on each electromagnetic wave shielding body was checked. Next, the electromagnetic wave shielding body was pasted on the display surface of a plasma display panel [PX-42VP1, manufactured by NEC]. Then, connect the metal parts on the flat plate to the electrodes located on the side of the viewing surface through the wires to draw the current out of the display. Start the plasma display panel, and measure the intensity of the electromagnetic waves released to the outside according to the FCC specifications p a r t 1 5〗, and check whether it meets the C 1 a s s A standard. (Comparative Example 4) As in Example 14, a polyethylene terephthalate film roll (558 mm in width, 500 m in length, and 75 μm in thickness) was prepared as a transparent polymer film -105-1225227 V. Description of the invention (104) (B), and a transparent conductive thin film layer is formed on the main surface of one side. A transparent adhesive material [thickness 100 μm] was bonded to the surface opposite to the transparent conductive film forming surface of the film by a roll-to-roll method. Next;-While cutting the produced film, adhere to the glass substrate [size: 560mmX960mmX thickness: 3mm] through a weak adhesive. Next, prepare an anti-glare film roll [5 4 8 mm in width, 50 0 m in length, 10 Ομηι] in a state where a transparent adhesive material is pasted on the side opposite to the anti-glare layer, and then cut while One side is bonded to the transparent conductive film layer of the above-mentioned bonded body. At this time, it is attached to the inner side of the transparent conductive thin film layer at an end portion 5 mm away from the outer peripheral portion. Next, the silver paste was applied to cover the entire periphery of the exposed portion of the transparent conductive film layer by the screen printing method and dried. After drying, it was peeled from the glass substrate. In this way, an electromagnetic wave shielding body is produced. Other operations are performed in the same manner as in Embodiment 14. The above results are shown in Table 3. [Table 3] Electrode formation time (seconds) [Each electromagnetic wave shielding body] The electromagnetic wave blocking effect (whether it is within the FCC Cl as sA standard) _ ΐ 例 1 4 2 No problem_ Example 1 5 2 No problem 1 Example 1 6 0. 5 No problem _ Comparative Example 4 180 No problem 1 It is understood from Table 3 that all examples are related to the electromagnetic wave blocking effect ′, which is the same as the conventional case shown in the comparative example. In addition, the time required for the formation of the electrode is also greatly reduced, thereby greatly improving the production. -106-1225227 V. Description of the Invention (105) The effect. (Example 17) A polyethylene terephthalate film roll [thickness 75 μm] with a width of 565 mm and a length of 500 m was prepared as a transparent polymer film (B), and then, on the main surface of one side thereof A roll coater was used to form a transparent conductive layer (D) by a magnetron sputtering method. The transparent conductive thin film layer is a thin film layer (Dt) made of an oxide of indium and tin. The silver thin film layer (Dm) is based on B / Dt [thickness 40nm] / Dm [thickness 15nm] / Dt [thickness 80nm] / Dm [ The thickness is 20nm] / Dt [thickness 80nni] / Dm [thickness 15nm] / Dt [thickness 40nm] / Dm [thickness 15nm] / Dt [thickness 40nm]. The thin film layer made of indium and tin oxides constitutes a transparent high refractive index thin film layer, and the silver thin film layer constitutes a metal thin film layer made of silver or a silver alloy. On a thin film layer formed of an oxide of indium and tin, is a sintered body of indium oxide / tin oxide [In203: Sn02 = 90:10 (weight ratio)]? E, an M · oxygen mixed gas (total pressure: 266 mPa, oxygen partial pressure: 5 mPa) was used as the sputtering gas. In addition, on the silver thin film layer, silver was used as a target, and argon gas (total pressure of 26 6 mPa) was used as a sputtering gas. On the formation of the titanium layer, titanium was used as a target ', and argon gas (full pressure of 266 mPa) was used as a sputtering gas. Next, an anti-glare film roll having a width of 565 mm 'and a length of 500 m in a state where the transparent adhesive material was pasted on the side opposite to the anti-glare layer was prepared. Next, the above-mentioned anti-glare film is adhered to the transparent conductive film layer of the transparent conductive film through a transparent bonding material by a roll-to-roll method to make one -107-1225227. V. Description of the invention (106) film rolls. In addition, a transparent adhesive material is laminated on a surface opposite to the anti-glare layer of the bonded body of the transparent conductive film and the anti-glare film by the roll-to-roll method. Then, the film obtained by the above was cut, and the transparent support substrate was bonded to the transparent support substrate. Next, a silver paste was applied to the side surface of the cover film by the screen printing method and dried. In this way, an electromagnetic wave shielding body is produced. Figure 23 shows the cross section. 〇 Select the two points that are farthest apart on the electrode and check the resistance between these two points. In addition, the time required for each attachment of the electromagnetic shielding body is also checked. again. In other words, the bonding time of each of the optical filters of the transparent conductive film and the anti-glare film can be obtained by dividing the number of sheets of film that can be cut from the film roll by the entire bonding time used in the roll-to-roll method. (Example 1 8) An anti-glare film roll having a width of 5 6 5_ and a length of 500 m was prepared, and a transparent conductive film layer was formed on the side opposite to the anti-glare layer in the same manner as in Example 17. Next, a transparent adhesive material was bonded to the transparent conductive film layer by a roll-to-roll method. While cutting the film obtained as described above, it was bonded to a transparent support substrate via a transparent adhesive material. Then, the silver paste is applied to the entire periphery of the end by screen printing method -108-1225227 V. Description of the invention (107) The side of the moon and dried. In this way, an electromagnetic wave shielding body is produced. Select the two points that are farthest apart on the electrode and measure the resistance between them. In addition, the time required for each attachment of the electromagnetic shielding body is also checked. (Example 19) An anti-glare film roll having a width of 565 mm and a length of 500 m was prepared, and then a transparent conductive film layer was formed on the side opposite to the anti-glare layer in the same manner as in Example 17 to produce a length of 50. 0 m anti-glare transparent conductive film roll. Two rolls of copper tape [15 mm in width, 75 μm in thickness, 50,000 in length, and a conductive adhesive material on one side] were prepared. Copper tapes were bonded to both ends of the anti-glare transparent conductive film. The conductive adhesive material of the copper tape is bonded to the transparent conductive layer formed as an anti-glare transparent conductive material. The overlapping width of each copper tape and the anti-glare transparent conductive film is 10 mm. The bonding step is performed by a roll-to-roll method. Prepare a transparent bonding material [575mm wide, 25mm thick, 500m long]-roll. This transparent adhesive was laminated to a transparent anti-glare conductive film with a copper tape on the side, and was cut into a thin sheet of 9 5 8 mm. The bonding material is bonded to the processed surface where the transparent conductive layer and the copper tape are not bonded. The bonding step is performed by a roll-to-roll method. In this way, an electromagnetic wave shielding body is made. Figure 24 shows its section. Select the two furthest points on the electrode and measure the resistance between them. In addition, the time required for each attachment of the electromagnetic shielding body is also checked. (Example 20) -109-1225227 V. Description of the invention (108) A roll of an anti-glare film having a width of 565 inm 'and a length of 500 m was prepared, and then the same as in Example 17 was opposite to its anti-glare layer. A transparent conductive thin film layer is formed on the surface. Then, the transparent adhesive material was laminated on the conductive thin film layer by the roll-to-roll method while cutting a 958-mm-thick sheet to make an electromagnetic wave shielding body. A glass substrate [size 545 mm × 960 mm, thickness 3 mm] was prepared, and copper plates [size 10 mm × 960 mm, thickness 3 mm] were provided on both long sides thereof. There are screw holes in the copper plate. The screw holes are set at 30 mm intervals from the top to the end. An electromagnetic wave shielding body is attached to a supporting substrate combining the glass substrate and the copper plate. Lock the screws to the screw holes formed on the copper plate. The screw is locked to the screw hole through the electromagnetic wave shield from the outermost surface of the electromagnetic wave shield. At this time, the screw becomes a substantially through-hole electrode. In this way, an electromagnetic wave shielding body is produced. Figure 25 shows a cross-sectional view. ○ Select the two points at the farthest points on the electrode to measure the resistance between them. In addition, the time required for each attachment of the electromagnetic shielding body was also measured. (Comparative Example 5) A roll of a poly (ethylene terephthalate) film (width 565 mm, length 500 m, thickness 75 μm) as a transparent polymer film (B) was prepared in the same manner as in Example 18, and rolled in A transparent conductive film layer is formed on the main surface of one side. A transparent adhesive material is laminated on the surface opposite to the transparent conductive film forming surface of the film by a roll-to-roll method. Then, while cutting the obtained film, paste it through a transparent adhesive material -110- 1225227 V. Description of the invention (109) on a transparent support substrate. In addition, an anti-glare film having a width of 56.5 mm and a length of 500 m in a state where the transparent adhesive material is pasted on the side opposite to the anti-glare layer is prepared, and it is bonded to the above while cutting. On the transparent conductive film layer of the bonded body. At this time, the end portion was attached to a position within 5 mm from the outer peripheral portion of the transparent conductive film layer. Next, the entire periphery of the exposed portion of the transparent conductive film layer covered with the silver paste on the outer periphery portion was coated by the screen printing method and dried. In this way, an electromagnetic wave shielding body is produced. Select the furthest rain point on the electrode and measure the resistance between them. In addition, the bonding time required for each sheet of the electromagnetic wave shielding body was also measured. The above series of results are shown in Table 4 [Table 4] Time for attaching each film of the electromagnetic shielding body (seconds) Resistance 値 (Ω) between the electrodes 2 Examples 1 8 120 7.  3 EXAMPLE lTl 120 7.  1 Example 20 1 20 7. 3 Comparative Example 5 230 7.  1 It is clear from Table 4 that in all the examples, the resistance 电极 between the electrodes is not reduced compared to the conventional electrode shape shown in the comparative example. In addition, in all the embodiments, the time for bonding each film of the electromagnetic wave shielding body is greatly shortened, thereby greatly improving the production effect of the electromagnetic wave shielding body. (Example 21) Except for the following points, the rest are the same as the examples 1 is carried out in the same manner. -111- 1225227 V. Description of the invention (1 1 0) The transparent laminated body 1 is made as follows. Pigments that will absorb near-infrared rays, SIR1 28.0 manufactured by Mitsui Chemicals, Inc.  25% by weight, SIRI 30,23.23% by weight is mixed with poly (ethylene terephthalate) small nine 1 2 0 3 (manufactured by Unicam (company)), and melted at a temperature of 260 to 2 80 ° C , And then made a polymer film (B) with a thickness of 188 μιτι by a biaxial rolling extruder. A polyester-based adhesive containing a cross-linked material was coated on the main surface of one side of the polymer film (B) prepared as described above to a thickness of 10 μm. Secondly, a silver foil with a thickness of 7 μm, a pore diameter of 1 μm, and a porosity of 12% was stacked. Furthermore, a molybdenum film having a thickness of 50 µm was formed on both main surfaces of the silver foil by a sputtering method in advance. Next, using a thermosetting ink, a grid pattern with a grid width of 20 μm and a mesh size of 1 50 μm × 1 50 μm was printed on the metal layer by screen printing. Then, heat the ink at 90 ° C for 5 minutes to harden the ink, and then remove the metal layer of the unprotected portion by using an aqueous solution of ferric chloride (f er r c c h 1 ore d e), and then remove the ink with a solvent. In this way, a laminated body having a metal layer having the pattern shown in Fig. 27 and an aperture ratio of 75% was obtained. The measured average transmittance of visible light was 6 7%. The measured surface resistance is 0.  1 1 Ω / □. (Example 2 2) Except for the following points, the same procedure as in Example 3 was performed. A polymer film (B) / transparent conductive layer (D) was prepared by the following method. A pigment that will absorb near-infrared rays, manufactured by Mitsui Chemicals, Inc. S I R 1 2 8, 0.  25% by weight, S I R 1 3 0, 0.  2 3% by weight is mixed with poly (ethylene terephthalate) Nine 1 20 3 (manufactured by Unicam (company)), and 2 6 0 ~ -112- 1225227 V. Description of the invention (1 1 1) 28 The polymer was melted at a temperature of 0 ° C, and then made into a polymer film (B) with a thickness of 1 88 μm by a biaxial rolling extruder. Next, a silver foil having a thickness of 7 μm, a pore diameter of 1 μm, and a porosity of 8% was stacked on the polymer film (B) prepared above by using an acrylic adhesive. In addition, chrome plating was applied to both sides of this silver foil in advance. Secondly, the alkaline developing type photoresist is coated on the copper layer, pre-baked and exposed with light shielding, and developed to form a grid pattern with a grid width of 25 μm and a mesh size of 125 μm τ 125 x 125 μm. An aqueous solution of ferric chloride etches a part of the metal layer that is not protected by the resist, and then the resist is removed in an alkaline solution. In this way, a laminated body having a metal layer having the shape shown in Fig. 27 and an opening ratio of 69% can be obtained. The measured visible light transmittance was 65% and the sheet resistance was 0. 07Ω / Ε]. It is clear from Table 5 that by using the electromagnetic wave shielding body of the present invention, it is possible to distinguish Cl as s B or Cl as s A of VCCI specifications. The lower the surface resistance of the transparent conductive layer, the better the ability of the electromagnetic wave shielding body. In addition, by using the electromagnetic wave shielding body of the present invention, it has excellent near-infrared reducing ability. The electromagnetic wave shielding body of the present invention using a metal mesh layer has excellent visible light transmission properties, electromagnetic wave shielding properties, and near-infrared shielding properties. Furthermore, the electromagnetic wave shielding body of the present invention has various functions by the functional transparent layer (A), and has excellent environmental resistance and / or abrasion resistance and / or antifouling and / or antistatic properties. -113- 1225227 V. Description of the invention (112) [Table 5] Electromagnetic wave shielding body None Example 21 Example 22 Comparative Example Ί ~ Surface resistance of transparent conductive layer Ω / □ 0. 11 0. 07 Ϊ5 ^% of radioactive intensity, dBp / m 33MHz 59 21 19 52 ^ 90MHz 52 24 21 49 ^ Near infrared transmittance,% 820nm 20 20 79 ~ 850nm-5 5 78 950nm-10 [To 70 Malfunction limit distance, m 5 above 0. 8 0. 8 or more 5 [Inventive effect] As described above, according to the present invention, a filter for a display that operates as a light-adjusting film with excellent transmission characteristics 'transmittance' and reflection characteristics can be realized at low cost. By forming this filter directly on the display surface of a display device such as a plasma display, the color purity and tone can be improved without significantly damaging the brightness of the display, thereby realizing a display device with excellent image quality. In addition, it can be realized at a low cost as a filter having excellent transmission characteristics, transmittance, visible light reflectance, and the ability to block electromagnetic waves generated from a display device such as an electric award display. What's more, the near-infrared rays in the vicinity of 800 to 100 nm emitted by the display are effectively reduced, so it will not adversely affect the wavelengths used in remote control of peripheral electronic devices, transmission systems, optical communications, etc., and prevent their malfunction. In addition, it can achieve both excellent weather resistance, environmental resistance, anti-reflection and / or anti-glare, scratch resistance, "anti-fouling" and anti-charge properties, etc. -1 14-1225227 5. Description of the invention (113), High-quality display device. In addition, the total thickness of the transparent polymer film constituting the filter for the display is taken as 0.  Above 3 Him, this can improve the protection function and workability of the plasma display panel, and can be directly pasted to the electromagnetic wave shielding body or dimming film on the display surface of the plasma display. In addition, by planning the shape of the electrodes of the electromagnetic wave shielding body, a sufficient electromagnetic wave shielding effect can be obtained, and the time required to form the electrodes can be greatly shortened ', thereby greatly improving production efficiency. [Description of reference symbols] 10 · · · · · transparent conductive layer Π * · · · • high refractive index transparent film layer 12 · ·.  Metal thin film layer 20  Polymer film 21 ... Polymer film containing pigment 2 3,24. . . . . Transparent polymer film 25 ····· Transparent polymer film for padding 41 ···· Conductive adhesive layer 3 0,40. . . . . Transparent adhesive layer 22 · · · · · Hard coating 50 · · · · · Electrode 60. . . . . Anti-fouling anti-reflection film 6 1. . . . . Anti-reflection film 62. . . . . Hard coating film with anti-charge property -115- 1225227 V. Description of the invention (114) 6 3. . . . . Hard coating film 7 0. . . . . Anti-glare layer 71. . . . . Anti-glare film 80. . . . . Conductive copper foil adhesive tape -116-

Claims (1)

1225227 六、申請專利範圍 第90 1 020 1 6號「顯示器用濾光器、顯示裝置及其製造方 法」專利案 (93年2月20日修正) 六申請專利範圍: 1 . 一種顯示器用濾光器’可粘結於顯示器顯示面,並 具有既定之濾光特性’其特徵爲具備: 設在外氣側,具有反射防止性及/或防眩性之功能 性透明層(A ); 設在顯示器側,用於粘結於顯示面之透明粘接層( C); 作爲基體而設在功能性透明層(A )和透明粘接層(C ) 間之高分子膜(B ); 設在功能性透明層(A )和高分子膜(B )之間,及/ 或高分子膜(B )和透明粘接層(C )之間,具有〇 . 〇 1〜 30Ω/□之面電阻之透明導電層(D),該透明導電層( D )係由單層之透明導電性薄膜或由將高折射率透明 薄膜層(D t )和金屬薄膜層(Dm )疊層之多層薄膜所構 成。 2 ·如申請專利範圍第1項之顯示器用濾光器,其中高 分子膜(B)之厚度爲1〇〜250μιτι。 3 · —種顯示器用濾光器,可粘結於顯示器顯示面,並 具有既定之濾光特性,其特徵爲具備: 設在外氣側’具有反射防止性及/或防眩性之功能 1225227 六、申請專利範圍 性透明層(A ); 設在顯示器側,用於粘結於顯示面之透明粘接層( C); 作爲基體而設在功能性透明層(A )和透明粘接層(C ) 間之高分子膜(B ); 設在功能性透明層(A )和高分子膜(B )之間,及/ 或高分子膜(B )和透明粘接層(C )之間,具有〇 . 〇 1〜 30Ω /□之面電阻之透明導電層(D),該透明導電層( D )之一部份或全部係藉導電性網構成,而功能性透 明層(A )、高分子膜(B )、及透明粘接層(C )之中至少 一層含有1種以上之對波長5 70〜605nm範圍之光具 有極大吸收之色素。 4 .如申請專利範圍第1項之顯示器用濾光器,其中透 明導電層(D )係高折射率透明薄膜層(D t )及金屬薄膜 層(Dm)之組合,以(Dt )/(Dm)爲一重複循環單位重複 疊積2〜4次後,另在其上疊積高折射率薄膜層(Dt) 〇 5 .如申請專利範圍第4項之顯示器用濾光器,其中在 多數之高折射率透明薄膜層(D t )中至少有一層係以 銦,錫及鋅之任一種作爲主成份之氧化物形成者。 6 .如申請專利範圍第4項之顯示器用濾光器,其中在 多數之金屬薄膜層(Dm )中至少有一層係以銀或銀合 金形成者。 1225227 六、申請專利範圍 7 .如申請專利範圍第1項之顯示器用濾光器,其中功 能性透明層(A )另具有硬塗性,靜電防止性,防污性 ,氣體遮斷性及紫外線低減性中至少一種功能。 8 .如申請專利範圍第3項之顯示器用濾光器,其中功 能性透明層(A )另具有硬塗性,靜電防止性,防污性 ,氣體遮斷性及紫外線低減性中至少一種功能。 9 .如申請專利範圍第1項之顯示器用濾光器,其中在 功能性透明層(A )和高分子膜(B )間設有粘接層(E )。 1 〇 .如申請專利範圍第3項之顯示器用濾光器,其中在 功能性透明層(A )和高分子膜(B )間設有粘接層(E )。 1 1 .如申請專利範圍第1項之顯示器用濾光器,其中在 高分子膜(B)之兩面或單面上形成硬塗層(F)。 1 2 ·如申請專利範圍第3項之顯示器用濾光器,其中在 高分子膜(B)之兩面或單面上形成硬塗層(f)。 1 3 ·如申請專利範圍第1〜1 2項中任一項之顯示器用濾 光器,其中在功能性透明層(A ),高分子膜(B ),透 明粘接層(C) ’透明導電層(D),粘接層(£)及硬塗層 (F)中至少有一層含有一種以上之色素。 1 4 ·如申請專利範圍第1 3項之顯示器用濾光器,其中 前述色素係爲四氮雜卩卜啉化合物。 1 5 .如申請專利範圍第丨4項之顯示器用濾光器,其中 四氮雜吓啉化合物係爲用下列之化學式(丨)表示之化 1225227 六、申請專利範圍 合物, A a51225227 VI. Patent application scope No. 90 1 020 1 6 "Display filter, display device and manufacturing method thereof" patent case (Amended on February 20, 1993) Six patent application scope: 1. Filter for display The device can be adhered to the display surface of the display and has predetermined filtering characteristics. It is characterized by having: a functional transparent layer (A) provided on the outside air side and having anti-reflection and / or anti-glare properties; provided on the display Side, a transparent adhesive layer (C) for adhering to the display surface; a polymer film (B) provided between the functional transparent layer (A) and the transparent adhesive layer (C) as a substrate; provided in the function 〇1 ~ 30Ω / □ between the transparent layer (A) and the polymer film (B), and / or between the polymer film (B) and the transparent adhesive layer (C) A conductive layer (D), the transparent conductive layer (D) is composed of a single layer of a transparent conductive film or a multilayer film in which a high refractive index transparent film layer (Dt) and a metal film layer (Dm) are laminated. 2. The filter for a display as described in the first item of the patent application, wherein the thickness of the high molecular film (B) is 10 to 250 μm. 3 · —A kind of display filter, which can be adhered to the display surface of the display, and has predetermined filtering characteristics, which is characterized in that: it is provided on the outside air side and has the function of preventing reflection and / or anti-glare 1225227 6 2. Patent application scope transparent layer (A); transparent adhesive layer (C) provided on the display side for bonding to the display surface; functional transparent layer (A) and transparent adhesive layer (as a substrate) C) polymer film (B); provided between the functional transparent layer (A) and the polymer film (B), and / or between the polymer film (B) and the transparent adhesive layer (C), A transparent conductive layer (D) having a surface resistance of 〇1 ~ 30Ω / □, part or all of the transparent conductive layer (D) is formed by a conductive mesh, and the functional transparent layer (A), high At least one of the molecular film (B) and the transparent adhesive layer (C) contains one or more pigments that have a great absorption of light in the wavelength range of 5 70 to 605 nm. 4. The filter for a display as claimed in item 1 of the scope of patent application, wherein the transparent conductive layer (D) is a combination of a high refractive index transparent thin film layer (Dt) and a metal thin film layer (Dm), with (Dt) / ( Dm) is a repeating cycle unit which is repeatedly stacked 2 to 4 times, and then a high refractive index thin film layer (Dt) is stacked thereon. At least one of the high-refractive-index transparent thin-film layers (D t) is an oxide former containing any one of indium, tin, and zinc as a main component. 6. The filter for a display according to item 4 of the patent application, wherein at least one of the plurality of metal thin film layers (Dm) is formed of silver or silver alloy. 1225227 6. Application for patent scope 7. For the filter for display of item 1 of the scope of patent application, the functional transparent layer (A) also has hard coating property, antistatic property, antifouling property, gas blocking property and ultraviolet light. At least one of these functions. 8. The filter for display according to item 3 of the scope of patent application, wherein the functional transparent layer (A) has at least one of hard coating property, antistatic property, antifouling property, gas blocking property and low UV reduction property. . 9. The filter for a display according to item 1 of the patent application scope, wherein an adhesive layer (E) is provided between the functional transparent layer (A) and the polymer film (B). 10. The display filter according to item 3 of the patent application scope, wherein an adhesive layer (E) is provided between the functional transparent layer (A) and the polymer film (B). 1 1. The display filter according to item 1 of the patent application scope, wherein a hard coat layer (F) is formed on both or one side of the polymer film (B). 1 2 · The filter for a display according to item 3 of the patent application scope, wherein a hard coat layer (f) is formed on both or one side of the polymer film (B). 1 3 · The filter for a display according to any one of claims 1 to 12 in the scope of patent application, wherein the functional transparent layer (A), the polymer film (B), and the transparent adhesive layer (C) are transparent. At least one of the conductive layer (D), the adhesive layer (£) and the hard coat layer (F) contains more than one pigment. [14] The filter for a display according to item 13 of the patent application range, wherein the pigment is a tetraazapyrroline compound. 1 5. If the filter for display item No. 丨 4 of the scope of patent application, the tetraazaphosphaline compound is a chemical formula represented by the following chemical formula (丨) 1225227 6. The scope of patent application Compound, A a5 (式中’ A1〜Αδ係分別各自表示氫原子,鹵原子,硝 基’氰基’經基,磺酸基,碳數丨〜20之烷基,鹵 化院基’院氧基,烷氧基烷基,芳氧基,單烷基胺 基’二院基胺基,芳烷基,芳基,雜芳基,烷硫基 ’或者芳硫基,Α1和A2,Α3和A4,Α5和A6,Α7和Α8 也可分別各自經連結基形成除芳香族環外之環,Μ 係表示兩個氫原子,兩價之金屬原子,三價的一個 置換金屬原子,四價的兩個置換金屬原子,或羥基 金屬原子。 1 6 ·如申請專利範圍第1 3項之顯示器用濾光器,其中 含有對波長8 0 0〜1 1 0 〇 n m範圍之光吸收最大近紅外 線吸收之色素。 -4- 1225227 r、申請專利範圍 1 7 .如申請專利範圍第1〜6項中任一項之顯示器用濾 光器,其中功能性透明層(A )之表面之可視光線反射 率係在2%以下。 1 8 .如申請專利範圍第1項之顯示器用濾光器,其中具 有3 0〜8 5 %之可視光線透射率。 1 9 .如申請專利範圍第3項之顯示器用濾光器,其中具 有3 0〜8 5 %之可視光線透射率。 2 〇 ·如申請專利範圍第1項之顯示器用濾光器,其中# 波長8 0 0〜1 lOOnm範圍之最小透射率係在20%以下 〇 2 1 .如申請專利範圍第3項之顯示器用濾光器,其中# 波長8 00〜1 100nm範圍之最小透射率係在20%以下 〇 2 2 ·如申請專利範圍第1〜6項中任一項之顯示器用_ 光器,其中濾光器整體之高分子膜之厚度之合計{系胃 0 . 3 _以上。 2 3 ·如申請專利範圍第1項之顯示器用濾光器,其中胃 備有可含有色素、墊高用之高分子膜。 24 ·如申請專利範圍第3項之顯示器用濾光器,其中具 備有可含有色素、墊高用之高分子膜。 2 5 .如申請專利範圍第丨項之顯示器用濾光器,其中形 成與透明導電層(D)電氣連接之電極。 26 ·如申請專利範圍第3項之顯示器用濾光器,其中形 1225227 六、申請專利範圍 成與透明導電層(D)電氣連接之電極。 2 7 .如申請專利範圍第2 5項之顯示器用濾光器,其中 與透明導電層(D )電氣連接之電極係沿著濾光器周緣 部之周向連續地形成。 28 .如申請專利範圍第26項之顯示器用濾光器,其中 與透明導電層(D)電氣連接之電極係沿著濾光器周緣 部之周向連續地形成。 2 9 .如申請專利範圍第2 5項之顯示器用濾光器,其中 電極係形成在部份露出之導通部上。 3 〇 .如申請專利範圍第2 6項之顯示器用濾光器,其中 電極係形成在部份露出之導通部上。 3 1 .如申請專利範圍第2 7項之顯示器用濾光器,其中 濾光器形狀係爲長方形,電極係形成在對向之兩個 周邊上。 3 2 .如申請專利範圍第2 8項之顯示器用濾光器,其中 濾光器形狀係爲長方形,電極係形成在對向之兩個 周邊上。 3 3 .如申請專利範圍第2 9項之顯示器用濾光器,其中 濾光器形狀係爲長方形,電極係形成在對向之兩個 周邊上。 3 4 .如申請專利範圍第3 0項之顯示器用濾光器,其中 濾光器形狀係爲長方形,電極係形成在對向之兩個 周邊上。 1225227 六、申請專利範圍 3 5 .如申請專利範圍第2 7項之顯示器用濾光器,其中 與透明導電層(D )電氣連接之電極係形成在濾光器之 周緣端面上。 3 6 .如申請專利範圍第2 8項之顯示器用濾光器,其中 與透明導電層(D )電氣連接之電極係形成在濾光器之 周緣端面上。 3 7 .如申請專利範圍第2 9項之顯示器用濾光器,其中 與透明導電層(D )電氣連接之電極係形成在濾光器之 周緣端面上。 3 8 .如申請專利範圍第3 0項之顯示器用濾光器,其中 與透明導電層(D )電氣連接之電極係形成在濾光器之 周緣端面上。 3 9 .如申請專利範圍第1〜6項中任一項之顯示器用濾 光器,其中爲沿著濾光器之厚度方向從最外部表面 開始至少形成與透明導電層(D )連通之聯通孔, 與透明導電層(D )電氣連接之電極係形成在該聯通 孔之內部。 4 〇 .如申請專利範圍第1〜6項中任一項之顯示器用濾 光器,其中在透明導電層(D)和與其鄰接之層之間插 設導電性帶。 4 1 . 一種顯示裝置,其特徵爲具備顯示影像用之顯示器 和 設在顯示器顯示面上之申請專利範圍第1〜4 0項 1225227 r、申請專利範圍 中任一項之顯示器用濾光器。 42 . —種顯示裝置之製造方法,其特徵爲包括: 經透明粘接層(C )將申請專利範圍第2 5〜40項中 任一項之顯示器用濾光器貼合於顯示裝置之顯示面 上之步驟;及 將顯示裝置之接地導體和透明導電層(D )之電極行 電氣連接之步驟。 4 3 · —種顯示裝置之製造方法,其特徵爲包括·· 經透明粘接層(C )將高分子膜(Β ),透明導電層(D ) ,及含有透明粘接層(C )之積層濾光器貼合於顯示裝 置之顯示面上之步驟; 直接或經第2粘接層將具有反射防止性及/或防眩 性之功能性透明層(A )配置在該積層濾光器上之步驟 ;及 將顯示裝置之接地導體和透明導電層(D )電氣連 接之步驟。 44 . 一種顯示裝置之製造方法,其特徵爲包括: 將粘接層配置在顯示裝置之顯示面上之步驟; 經前述粘接層將含有高分子膜(B ),透明導電層(D ) ,及具有反射防止性及/或防眩性之功能性透明層(A ) 之積層濾光器貼合之步驟;及 將顯示裝置之接地導體和透明導電層(D )行電氣 連接之步驟。 1225227 六、申請專利範圍 4 5 · —種顯示裝置之製造方法,其特徵爲包括: 將粘接層配置在顯示裝置之顯示面上之步驟; 將含有高分子膜(B)及透明導電層(D)之積層濾光 器經前述粘接層貼合之步驟; 直接或經第2粘接層將具有反射防止性及/或防眩 性之功能性透明層(A )配置於該積層濾光器上之步驟 ;及 將顯示裝置之接地導體和透明導電層(D)行電氣連 接之步驟。 4 6 . —種顯示器用濾光器之製造方法,係用以製造可粘 結顯示器畫面且具有規定之濾光特性的濾光器,其 特徵爲包含有: 在作爲基體而設置的高分子膜(B )外氣側,形成具 有反射防止性及/或防眩性之功能性透明層(A )之步 驟; 在功能性透明層(A )與高分子膜(B )之間及/或在高 分子膜(B )與透明粘接層(C )之間,形成有具有 0 . 0 1〜3 Ο Ω / □的面電阻且一部分或全部爲以導電性 網所構成之透明導電層(D )之步驟;以及 在加溫加壓之條件下,執行高壓釜之步驟。 4 7 .如申請專利範圍第4 6項之顯示器用濾光器之製造 方法,其中高壓釜處理係在60。C、2 X 1 〇5Pa之加 溫加壓之條件下執行。(In the formula, 'A1 ~ Aδ' each represent a hydrogen atom, a halogen atom, a nitro'cyano group, a sulfonic acid group, an alkyl group having a carbon number of ˜20, a halogenated alkyl group, an alkyl group, and an alkoxy group. Alkyl, aryloxy, monoalkylamino 'diamylamino, aralkyl, aryl, heteroaryl, alkylthio' or arylthio, A1 and A2, A3 and A4, A5 and A6 , A7 and A8 may each form a ring other than an aromatic ring via a linking group. M represents two hydrogen atoms, a bivalent metal atom, a trivalent one substituted metal atom, and a tetravalent two substituted metal atom. Or a hydroxyl metal atom. 16 · The filter for display as described in item 13 of the scope of patent application, which contains a pigment that absorbs light with a maximum near-infrared absorption in the wavelength range of 800 to 1 100 nm. -4 -1225227 r. Application for patent scope 1 7. The filter for display as in any of the items 1 to 6 of the scope of patent application, in which the visible light reflectance of the surface of the functional transparent layer (A) is below 2% 1 8. The filter for display as shown in item 1 of the scope of patent application, which has 30% to 85% Apparent light transmittance. 1. For example, the filter for display of item 3 in the scope of patent application, which has a visible light transmittance of 30 to 85%. 2 〇 · For the filter of display in aspect 1 of patent application Optical device, where the minimum transmittance in the range of #wavelength 8 0 ~ 100nm is less than 20%. 2 For example, the filter for display of the scope of patent application item 3, in which the #wavelength 8 00 ~ 1 100nm range The minimum transmittance is less than 20%. 〇 2 2 As shown in any one of the scope of the patent application _ _ light device, in which the total thickness of the polymer film thickness of the entire filter {Department of stomach 0. 3 _above. 2 3 · If the filter for display of item 1 of the scope of patent application, the stomach is provided with a polymer film that can contain pigments and for heightening. 24 · For the filter of display of area 3 of patent application The optical device is provided with a polymer film which can contain pigments and be used for heightening. 2 5. The filter for a display as described in the patent application item No. 丨, wherein an electrode electrically connected to the transparent conductive layer (D) is formed. 26 · If the filter for display item 3 of the patent application scope, Shape 1225227 6. The scope of patent application is to be an electrode that is electrically connected to the transparent conductive layer (D). 27. The filter for display as shown in item 25 of the patent application scope, wherein the electrode is electrically connected to the transparent conductive layer (D). It is formed continuously along the circumferential direction of the peripheral portion of the filter. 28. The filter for a display as claimed in item 26 of the patent application, wherein the electrode electrically connected to the transparent conductive layer (D) is along the peripheral edge of the filter. The circumferential direction of the portion is continuously formed. 2 9. The filter for a display as claimed in item 25 of the patent application scope, wherein the electrode is formed on the conductive portion that is partially exposed. 30. The filter for a display according to item 26 of the patent application, wherein the electrode is formed on a partially exposed conducting portion. 31. The filter for display according to item 27 of the scope of patent application, wherein the shape of the filter is rectangular, and the electrodes are formed on two opposite peripheries. 32. The filter for a display according to item 28 of the patent application, wherein the shape of the filter is rectangular, and the electrodes are formed on two opposite peripheries. 33. The filter for a display according to item 29 of the patent application scope, wherein the shape of the filter is rectangular, and the electrodes are formed on two opposite peripheries. 34. The filter for a display according to item 30 of the patent application, wherein the shape of the filter is rectangular, and the electrodes are formed on two opposite peripheries. 1225227 6. Scope of patent application 3 5. The filter for display as shown in item 27 of the patent application scope, wherein the electrode electrically connected to the transparent conductive layer (D) is formed on the peripheral end surface of the filter. 36. The filter for display as claimed in item 28 of the patent application range, wherein the electrode electrically connected to the transparent conductive layer (D) is formed on the peripheral end surface of the filter. 37. The filter for a display according to item 29 of the patent application scope, wherein the electrode electrically connected to the transparent conductive layer (D) is formed on the peripheral end surface of the filter. 38. The filter for a display according to claim 30, wherein the electrode electrically connected to the transparent conductive layer (D) is formed on the peripheral end surface of the filter. 39. The filter for a display according to any one of claims 1 to 6 in the scope of patent application, wherein at least the communication with the transparent conductive layer (D) is formed from the outermost surface along the thickness direction of the filter. A hole, and an electrode electrically connected to the transparent conductive layer (D) is formed inside the communication hole. 40. The filter for a display according to any one of claims 1 to 6, wherein a conductive tape is interposed between the transparent conductive layer (D) and a layer adjacent thereto. 41. A display device comprising a display for displaying an image, and a filter for display in any one of the scope of application for patents Nos. 1 to 40 1225227r and any of the scope of application for patents provided on the display surface of the monitor. 42. A method for manufacturing a display device, comprising: applying a display filter according to any one of claims 25 to 40 to a display device via a transparent adhesive layer (C); Step on the surface; and step of electrically connecting the ground conductor of the display device and the electrode of the transparent conductive layer (D). 4 3 — A method for manufacturing a display device, characterized in that it comprises: a polymer film (B), a transparent conductive layer (D), and a transparent adhesive layer (C) through a transparent adhesive layer (C) The step of attaching the multilayer filter to the display surface of the display device; arranging a functional transparent layer (A) having antireflection and / or anti-glare properties directly or via a second adhesive layer on the multilayer filter The above steps; and the step of electrically connecting the ground conductor and the transparent conductive layer (D) of the display device. 44. A method for manufacturing a display device, comprising: a step of disposing an adhesive layer on a display surface of the display device; and comprising a polymer film (B) and a transparent conductive layer (D) through the aforementioned adhesive layer, And a step of attaching a laminated filter having a functional transparent layer (A) having antireflection and / or antiglare properties; and a step of electrically connecting a ground conductor and a transparent conductive layer (D) of a display device. 1225227 6. Application patent scope 4 5-A method for manufacturing a display device, comprising: a step of disposing an adhesive layer on the display surface of the display device; a polymer film (B) and a transparent conductive layer ( D) The step of laminating the laminated filter through the aforementioned adhesive layer; placing a functional transparent layer (A) having antireflection and / or anti-glare properties directly or via the second adhesive layer on the laminated filter A step on the monitor; and a step of electrically connecting the ground conductor and the transparent conductive layer (D) of the display device. 46. — A method for manufacturing a filter for a display, which is used to manufacture a filter that can adhere to a display screen and has predetermined filtering characteristics, and is characterized by comprising: a polymer film provided as a substrate (B) the step of forming a functional transparent layer (A) having antireflection and / or anti-glare properties on the outside air side; between the functional transparent layer (A) and the polymer film (B) and / or between Between the polymer film (B) and the transparent adhesive layer (C), a transparent conductive layer (D) having a sheet resistance of 0.01 to 3 0 Ω / □ and a part or all of which is formed of a conductive mesh is formed (D ) Step; and the step of performing the autoclave under the condition of heating and pressurizing. 47. The method for manufacturing a filter for a display according to item 46 of the patent application, wherein the autoclave treatment is at 60. C, 2 X 105 Pa under temperature and pressure.
TW90102016A 2000-02-01 2001-02-01 A displaying filter, a display device and a manufacturing method thereof TWI225227B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000024184 2000-02-01
JP2000024185 2000-02-01
JP2000024183 2000-02-01
JP2000180501 2000-06-15
JP2000213431 2000-07-13

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI424202B (en) * 2006-04-13 2014-01-21 Adeka Corp Optical filter
TWI775233B (en) * 2020-12-07 2022-08-21 矽統科技股份有限公司 Noise reduction touch light adjustment device and noise reduction method thereof
TWI784346B (en) * 2019-11-11 2022-11-21 美商夢想家控股股份有限公司 Optical filter, lens, device, electronic display, and functional light-transmitting material for reducing the amount of melatonin-inhibiting light and methods of making the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI424202B (en) * 2006-04-13 2014-01-21 Adeka Corp Optical filter
TWI784346B (en) * 2019-11-11 2022-11-21 美商夢想家控股股份有限公司 Optical filter, lens, device, electronic display, and functional light-transmitting material for reducing the amount of melatonin-inhibiting light and methods of making the same
TWI775233B (en) * 2020-12-07 2022-08-21 矽統科技股份有限公司 Noise reduction touch light adjustment device and noise reduction method thereof
US11520452B2 (en) 2020-12-07 2022-12-06 Silicon Integrated Systems Corp. Noise reduction touch light adjustment device and noise reduction method thereof

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