WO2007100921A2 - Improved thin-film coatings, electro-optic elements and assemblies incorporating these elements - Google Patents

Improved thin-film coatings, electro-optic elements and assemblies incorporating these elements Download PDF

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Publication number
WO2007100921A2
WO2007100921A2 PCT/US2007/005494 US2007005494W WO2007100921A2 WO 2007100921 A2 WO2007100921 A2 WO 2007100921A2 US 2007005494 W US2007005494 W US 2007005494W WO 2007100921 A2 WO2007100921 A2 WO 2007100921A2
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WO
WIPO (PCT)
Prior art keywords
layer
reflectance
electro
ito
approximately
Prior art date
Application number
PCT/US2007/005494
Other languages
English (en)
Other versions
WO2007100921A3 (fr
Inventor
William L. Tonar
John S. Anderson
Jeffrey A. Forgette
George A. Neuman
Gary J. Dozeman
David J. Cammenga
Henry A. Luten
G. Bruce Poe
Nelson F. Brummel
Lansen M. Perron
Original Assignee
Gentex Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gentex Corporation filed Critical Gentex Corporation
Priority to KR1020127005055A priority Critical patent/KR101275450B1/ko
Priority to KR1020087024293A priority patent/KR101278371B1/ko
Priority to MX2008011009A priority patent/MX2008011009A/es
Priority to CA2644218A priority patent/CA2644218C/fr
Priority to CN2007800076526A priority patent/CN101395521B/zh
Priority to EP07752210A priority patent/EP2035886A4/fr
Priority to JP2008558324A priority patent/JP5570730B2/ja
Publication of WO2007100921A2 publication Critical patent/WO2007100921A2/fr
Publication of WO2007100921A3 publication Critical patent/WO2007100921A3/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60R—VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
    • B60R1/00—Optical viewing arrangements; Real-time viewing arrangements for drivers or passengers using optical image capturing systems, e.g. cameras or video systems specially adapted for use in or on vehicles
    • B60R1/02—Rear-view mirror arrangements
    • B60R1/08—Rear-view mirror arrangements involving special optical features, e.g. avoiding blind spots, e.g. convex mirrors; Side-by-side associations of rear-view and other mirrors
    • B60R1/083—Anti-glare mirrors, e.g. "day-night" mirrors
    • B60R1/088—Anti-glare mirrors, e.g. "day-night" mirrors using a cell of electrically changeable optical characteristic, e.g. liquid-crystal or electrochromic mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • E—FIXED CONSTRUCTIONS
    • E06—DOORS, WINDOWS, SHUTTERS, OR ROLLER BLINDS IN GENERAL; LADDERS
    • E06B—FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDINGS, VEHICLES, FENCES OR LIKE ENCLOSURES IN GENERAL, e.g. DOORS, WINDOWS, BLINDS, GATES
    • E06B9/00—Screening or protective devices for wall or similar openings, with or without operating or securing mechanisms; Closures of similar construction
    • E06B9/24—Screens or other constructions affording protection against light, especially against sunshine; Similar screens for privacy or appearance; Slat blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G02F1/155—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/163—Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/48—Flattening arrangements

Definitions

  • Electro-optic elements are becoming commonplace in a number of vehicular and architectural applications.
  • Various electro-optic element configurations provide variable transmittance and or variable reflectance for windows and mirrors.
  • the present invention relates to various thin-film coatings, electro-optic elements and assemblies incorporating these elements.
  • Fig. 1 depicts an airplane having variable transmittance windows
  • Figs. 2a and 2b depict a bus and a train car, respectively, having variable transmittance windows
  • Fig. 3 depicts a building having variable transmittance and or variable reflectivity windows
  • Fig. 4 depicts a vehicle having variable transmittance windows and variable reflectance rearview mirrors
  • Figs. 5a-5e depict various views of exterior rearview mirror assemblies and related variable reflectance elements
  • Figs. 6a-6d depict various views of interior rearview mirror assemblies and related variable reflectance elements
  • Fig. 7 depicts a profile view of a cross section of a variable reflectance element
  • Figs. 8a-8d depict profile views of cross sections of various elements; [0013] Figs. 9a-9j depict various electrical contacts for various elements; [0014] Fig. 10 depicts an electrical control schematic for multiple elements; [0015] Figs. 11a-11c depict various electrical control schematics; [0016] Fig. 12 depicts a graph of element wrap v. oxygen flow for various argon process gas pressures utilized in an element manufacturing process; [0017] Fig. 13 depicts a graph of thin film bulk resistance v. oxygen flow for various process gas pressures utilized in an element manufacturing process; [0018] Fig. 14 depicts a graph of thin film thickness v.
  • Fig. 15 depicts a graph of thin film sheet resistance v. argon flow for various process gas pressures utilized in an element manufacturing process
  • Fig. 16 depicts a graph of thin film bulk resistance v. argon flow for various process gas pressures utilized in an element manufacturing process
  • Fig. 17 depicts a graph of thin film absorption v. oxygen flow for various process gas pressures utilized in an element manufacturing process
  • Fig. 18 depicts a graph of element wrap v. oxygen flow for various process gas pressures utilized in an element manufacturing process
  • Fig. 19 depicts a graph of element wrap v.
  • Fig. 20 depicts a graph of element wrap v. thin film transmittance for various process gas pressures utilized in an element manufacturing process
  • Figs. 21-32 depict various thin film surface morphologies
  • Figs. 33a and 33b depict thin film peak-to-peak surface roughness
  • Fig. 34 depicts a graph of sputtering yield v. ion energy for various thin film materials
  • Fig. 35 depicts a graph of sputter yield v. sputter gas mass/target mass
  • Figs. 36 and 37 depict enlarged ion-milling results
  • Fig. 38 depicts a graph of thin film surface roughness v. inverse of line speed
  • Fig. 39 depicts a graph of thin film reflectance v. ion beam current;
  • Fig. 40 depicts a graph of thin film reflectance v. inverse of line speed;
  • Fig. 41 depicts a graph of thin film b* v. inverse of line speed;
  • Fig. 42 depicts a graph of thin film reflectance v. ion beam residence time;
  • Fig. 43 depicts a graph of thin film reflectance v. thickness;
  • Fig. 44 depicts a graph of thin film reflectance v. wavelength;
  • Fig. 45 depicts a graph of thin film transmission v. wavelength; [0038] Fig.
  • Figs. 46 depicts a graph of thin film reflectance v. thickness; [0039] Fig.47 depicts a graph of thin film transmission v. reflectance; [0040] Figs. 48a-53c depict various graphs of thin film reflectance and or transmission v. wavelength; and [0041] Figs. 54-62 depict various embodiments of elements having graded thin-film coatings.
  • Figs. 1 , 2a and 2b depict multi-passenger vehicles 102, 202a, 202b employing variable transmittance windows 110, 210a, 210b.
  • Multi-passenger vehicles employing variable transmittance windows 110, 21Oa 1 210b include, for example, aircraft 102, buses 202a, and trains 202b. It should be appreciated that other multi-passenger vehicles, some of which are described in more detail elsewhere herein, may employ variable transmittance windows 110, 210a, 210b.
  • the multi-passenger vehicles generally illustrated in Figs.
  • variable transmittance windows Another application of variable transmittance windows is depicted in Fig. 3.
  • Architectural windows 302 of buildings 301 may advantageously incorporate variable transmission functionality. It should be understood that these variable transmission architectural windows may be included in residential, commercial and industrial facilities.
  • Fig.4 depicts a controlled vehicle 400 comprising various variable transmittance and variable reflectance elements.
  • an interior rearview mirror assembly 415 is depicted, in at least one embodiment, the assembly 415 comprises a variable reflectance mirror element and an automatic vehicle exterior light control system.
  • automatic vehicle exterior light control systems are contained in commonly assigned U.S. Patent numbers 5,837,994, 5,990,469, 6,008,486, 6,130,448, 6,130,421 , 6,049,171 , 6,465,963, 6,403,942, 6,587,573, 6,611,610, 6,621,616, 6,631,316 and U.S.
  • the controlled vehicle is also depicted to include a driver's side outside rearview mirror assembly 410a, a passenger's side outside rearview mirror assembly 410b, a center high mounted stop light (CHMSL) 445, A-pillars 450a, 450b, B-pillars 455a, 455b and C-pillars 460a, 460b; it should be understood that any of these locations may provide alternate locations for an image sensor, image sensors or related processing and, or, control components.
  • CHMSL center high mounted stop light
  • a controlled vehicle may comprise variable transmittance windows 401, 402.
  • the controlled vehicle is depicted to include a host of exterior lights including headlights 420a, 42Ob 1 foil weather lights 430a, 430b, front turn indicator/hazard lights 435a, 435b, tail lights 425a, 425b, rear turn indicator lights 426a, 426b, rear hazard lights 427a, 427b and backup lights 440a, 440b.
  • exterior lights may be provided, such as, separate low beam and high beam headlights, integrated lights that comprise multipurpose lighting, etc. It should also be understood that any of the exterior lights may be provided with positioners (not shown) to adjust the associated primary optical axis of the given exterior light.
  • at least one exterior mirror assembly is provided with pivoting mechanisms to allow pivoting in directions 410a1 , 410a2, 410b1, 410b2. It should be understood that the controlled vehicle of Fig. 4 is generally for illustrative purposes and that suitable automatic dimming rearview mirrors, such as those disclosed in the patents and patent applications incorporated herein by reference, may be employed along with other features described herein and within disclosures incorporated herein by reference.
  • the controlled vehicle comprises an inside rearview mirror of unit magnification.
  • Unit magnification mirror as used herein, means a plane or flat mirror with a reflective surface through which the angular height and width of an image of an object is equal to the angular height and width of the object when viewed directly at the same distance with the exception for flaws that do not exceed normal manufacturing tolerances.
  • a prismatic day-night adjustment rearview mirror wherein at least one associated position provides unit magnification is considered herein to be a unit magnification mirror.
  • the mirror provides a field of view with an included horizontal angle measured from the projected eye point of at least 20 degrees and a sufficient vertical angle to provide a view of a level road surface extending to the horizon beginning at a point not greater than 61 m to the rear of the controlled vehicle when the controlled vehicle is occupied by a driver and four passengers or the designated occupant capacity, if less, based on an average occupant weight of 68 kg.
  • the line of sight may be partially obscured by seated occupants or by head restraints.
  • the location of the driver's eye reference points are preferably in accordance with regulation or a nominal location appropriate for any 95th percentile male driver.
  • the controlled vehicle comprises at least one outside mirror of unit magnification.
  • the outside mirror provides a driver of a controlled vehicle a view of a level road surface extending to the horizon from a line, perpendicular to a longitudinal plane tangent to the driver's side of the controlled vehicle at the widest point, extending 2.4 m out from the tangent plane 10.7 m behind the driver's eyes, with the seat in the rearmost position.
  • the line of sight may be partially obscured by rear body or fender contours of the controlled vehicle.
  • the locations of the driver's eye reference points are in accordance with regulation or a nominal location appropriate for any 95th percentile male driver.
  • the passenger's side mirror is not obscured by an u ⁇ wiped portion of a corresponding windshield and is preferably adjustable by tilting in both horizontal and vertical directions from the driver's seated position.
  • the controlled vehicle comprises a convex mirror installed on the passenger's side.
  • the mirror is configured for adjustment by tilting in both horizontal and vertical directions.
  • each outside mirror comprises not less than 126 cm of reflective surface and is located so as to provide the driver a view to the rear along an associated side of the controlled vehicle.
  • the average reflectance of any mirror is at least 35 percent (40% for many European countries).
  • an electro-optic mirror element may comprise a first substrate 521b secured in a spaced apart relationship with a second substrate 522b via a primary seal 523b to form a chamber there between.
  • At least a portion of the primary seal is left void to form at least one chamber fill port 523b1.
  • An electro-optic medium is enclosed in the chamber and the fill port(s) are sealingly closed via a plug material 523b2.
  • the plug material is a UV curable epoxy or acrylic material.
  • a spectral filter material 545a, 545b is located proximate a second surface of a first substrate, near the periphery of the mirror element. Electrical connectors 525b1, 525b2 are preferably secured to the element, respectively, via first adhesive material 526b1, 526b2.
  • the mirror element is secured to a carrier plate 575b via second adhesive material 570b.
  • Electrical connections from the outside rearview mirror to other components of the controlled vehicle are preferably made via a connecter 585b.
  • the carrier is attached to an associated housing mount 585b via a positioner 580b.
  • the housing mount is engaged with a housing 515a, 515b and secured via at least one fastener 534b4.
  • the housing mount comprises a swivel portion configured to engage a swivel mount 533b.
  • the swivel mount is preferably configured to engage a vehicle mount 530b via at least one fastener 531b. Additional details of these components, additional components, their interconnections and operation is provided herein. [0047] With further reference to Figs.
  • an outside rearview mirror assembly 510a is oriented such that a view of the first substrate 521b is shown with a spectral filter material 524b positioned between the viewer and the primary seal material 523b.
  • a blind spot indicator 550a, a keyhole illuminator 555a, a puddle light 560a, a supplemental turn signal 54Oa 1 or 541a, a photo sensor 565a, anyone thereof, a subcombination thereof or a combination thereof may be incorporated within the rearview mirror assembly such that they are positioned behind the element with respect to the viewer.
  • the devices 550a, 555a, 560a, 540a, or 541a, 565a are configured in combination with the mirror element to be at least partially covert as discussed in detail herein and within various references incorporated by reference herein. Additional details of these components, additional components, their interconnections and operation are provided herein.
  • Fig. 5c depicts a rearview mirror element 500c viewed from the first substrate 502c with a spectral filter material 596c positioned between the viewer and a primary seal material 578c.
  • a first separation area 540c is provided to substantially electrically insulate a first conductive portion 508c from a second conductive portion 530c.
  • a perimeter material 560c is applied to the edge of the element.
  • Fig. 5d depicts a rearview mirror element 50Od viewed from the second substrate 512d with a primary seal material 578d positioned between the viewer and a spectral filter material 596d.
  • a second separation area 586d is provided to substantially electrically insulate a third conductive portion 518d from a fourth conductive portion 587d.
  • a perimeter material 56Od is applied to the edge of the element.
  • Fig. 5e depicts a rearview mirror element 50Oe viewed from a section line Fig. 5e-Fig. 5e of either the element of Fig. 5c or 5d.
  • a first substrate 502e is shown to be secured in a spaced apart relation via a primary seal material 578e with a second substrate 512e.
  • a spectral filter material (in at least one embodiment referred to herein as "chrome ring") 596e is positioned between a viewer and the primary seal material 578e.
  • First and second electrical clips 563e, 584e, respectively, are provided to facilitate electrical connection to the element.
  • a perimeter material 56Oe is applied to the edge of the element.
  • the primary seal material may be applied by means commonly used in the LCD industry such as by silk-screening or dispensing.
  • Electro-optic devices in accordance with the present invention may be made using a similar process. All coatings such as the transparent conductors, reflectors, spectral filters and in the case of solid state electro-optic devices the electro-optic layer or layers may be applied to a large substrate and patterned if necessary.
  • the coatings may be patterned using a number of techniques such as by applying the coatings through a mask, by selectively applying a patterned soluble layer under the coating and removing it and the coating on top of it after coating application, laser ablation or etching. These patterns may contain registration marks or targets used to accurately align or position the substrates throughout the manufacturing process.
  • the registration marks or targets may also be applied to the glass directly such as by sand blasting, laser or diamond scribing if desired.
  • Spacing media for controlling the spacing between the laminated substrates may be placed into the primary seal material or applied to a substrate prior to lamination. The spacing media or means may be applied to areas of the laminate that will be cut away from the finished singulated mirror assemblies.
  • the laminated arrays can be cut to shape before or after filling with electro-optic material and plugging the fill port if the devices are solution phase electro-optic mirror elements.
  • an inside rearview mirror, assembly 61Oa 1 610b as viewed looking at the first substrate 622a, 622b with a spectral filter material 645a or a bezel 645b positioned between a viewer and a primary seal material (not shown).
  • the mirror element is shown to be positioned within a movable housing 675a, 675b and optionally combined with a stationary housing 677a on a mounting structure 681a (w/stationary housing) or 681b (w/o stationary housing).
  • a first indicator 686a, a second indicator 687a, operator interfaces 691a, 691b and a first photo sensor 696a are positioned in a chin portion of the movable housing.
  • a first information display 688a, 688b, a second information display 689a and a second photo sensor 697a are incorporated within the assembly such that they are behind the element with respect to the viewer.
  • devices 688a, 688b, 689a, 697a at least partially covert as described in detail herein.
  • an interior rearview mirror assembly may comprise at least one or more illumination assemblies 670b at printed circuit board 665b, at least one microphone, a sub-combination thereof, a combination thereof, or other combinations along with aforementioned devices. It should be understood that aspects of the present invention may be individually or collectively incorporated in electro-optic windows or mirrors in a multitude of combinations. Fig.
  • FIG. 6c depicts a plan view of a second substrate 612c comprising a stack of materials on a third, fourth or both third and fourth surfaces.
  • at least a portion 62Od of a stack of materials, or at least the substantially opaque layers of a stack of materials are removed, or masked, beneath the primary seal material.
  • At least a portion 620c2 of at least a layer of the stack of materials extends substantially to the outer edge of the substrate or extends to an area to facilitate electrical contact between the third surface stack and an element drive circuit (not shown in fig. 6c).
  • Related embodiments provide for inspection of the seal and or plug viewing and or plug curing from the rear of the mirror or window element subsequent to element assembly.
  • At least a portion of an outer edge 62Od of a stack of materials 620c is located between an outer edge 678c 1 and an inner edge 678c2 of a primary seal material 678c.
  • the portion 620c1 of a stack of materials, or at least the substantially opaque layers of a stack of materials are removed, or masked, beneath the primary seal material between approximately 2mm and approximately 8mm wide, preferably approximately 5mm wide.
  • At least a portion 620c2 of at least a layer of the stack of materials extends substantially to the outer edge of the substrate or extends to an area to facilitate electrical contact between the third surface stack and an element drive circuit (not shown) between approximately 0.5mm and approximately 5mm wide, preferably approximately 1mm.
  • Fig. 6d depicts a plan view of a second substrate 612d comprising a third surface stack of materials.
  • at least a portion of an outer edge 62Od 1 of a third surface stack of materials 62Od is located between an outer edge 678d1 and an inner edge 678d2 of a primary seal material 678d.
  • a conductive tab portion 682d extends from an edge of the second substrate inboard of an outer edge 678d1 of a primary seal material 678d.
  • a conductive tab portion 682d1 overlaps with at least a portion of a third surface stack of materials beneath a primary seal material 678d.
  • a substantially transparent conductive layer (not shown individually), such as a conductive metal oxide, of a third surface stack of materials extends beyond an outer edge 620d1 of a remainder of the third surface stack as depicted in Fig. 8b to provide external electrical connection to the third surface.
  • a conductive tab may be deposited along any of the substrate peripheral areas as shown in Figs. 9c-9i.
  • a conductive tab portion comprises chrome.
  • the conductive tab portion improves conductivity over the conductive electrode; as long as a conductive electrode layer is provided with sufficient conductivity, the conductive tab portion is optional.
  • the conductive electrode layer imparts the desired color specific characteristics of the corresponding reflected light rays in addition to providing the desired conductivity. Therefore, when the conductive electrode is omitted, color characteristics are controlled via the underlayer material specifications.
  • any of the first, second, third and fourth surface layers or stacks of materials may be as disclosed herein or within the references incorporated elsewhere herein by reference.
  • Fig. 7 depicts rearview mirror element 700 which is an enlarged view of the element depicted in Fig. 5e to provide greater detail.
  • Element 700 comprises a first substrate 702 having a first surface 704 and a second surface 706.
  • a first conductive electrode portion 708 and a second conductive electrode portion 730 applied to the second surface 706 are substantially electrically insulated from one another via a first separation area 740.
  • the separation area is located such that the spectral filter material 796 and a corresponding adhesion promotion material 793 are also substantially electrically insulated to define first and second spectral filter material portions 724, 736, respectively, and first and second adhesion promotion material portions 727, 739, respectively.
  • a portion of the first separation area 740, 540c, 64Od, 54Oe is shown to be extending parallel within a portion of the primary seal material 778 located near the center thereof. It should be understood that this portion of the separation area 740 may lie such that a viewer would not readily perceive a line within the spectral filter material; for example, a portion of the separation area may be substantially aligned with an inboard edge 797 of spectral filter material 596. It should be understood that when any portion of the separation area 740 is located inboard of the primary seal material, as is described in more detail elsewhere herein, a discontinuity in the electro-optic material coloring and, or, clearing may be observed. This operational characteristic may be manipulated to derive a subjectively visually appealing element. With further reference to Fig.
  • the element 700 is depicted to comprise a second substrate 712 having a third surface 715 and a fourth surface 714. It should be noted that the first substrate may be larger than the second substrate to create an offset along at least a portion of the perimeter of the mirror. Third and fourth conductive electrode portions 718, 787, respectively, are shown proximate the third surface 715 substantially electrically insulated via second separation area 786. A portion of the second separation area 786, 586c, 586d, 586e is shown to be extending parallel within a portion of the primary seal material 778 located near the center thereof.
  • this portion of the separation area 786 may lie such that a viewer would not readily perceive a line within the spectral filter material; for example, a portion of the separation area may be substantially aligned with an inboard edge 797 of spectral filter material 796.
  • a reflective material 720 may be applied between an optional overcoat material 722 and the third conductive electrode portion 718. It should be understood that any of the materials as disclosed in commonly assigned U.S.
  • Patents/Applications 6,111,684, 6,166,848, 6,356,376, 6,441 ,943, 10/115,8605,825,527, 6,111 ,683, 6,193,378, 09/602,919, 10/260,741, 60/873,474 and 10/430,885, the disclosures of which are incorporated herein by reference, may be employed to define a unitary surface coating, such as a hydrophilic coating on a first surface, or a composite stack of coatings, such as conductive electrode material, spectral filter material, adhesion promotion material, reflective material, overcoat material applied to the first, second, third and fourth surfaces.
  • a hydrophobic coating such as, a fiuorinated alkyl saline or polymer, a silicone containing coating or a specially textured surface may be applied to the first surface.
  • a hydrophilic or hydrophobic coating will alter the contact angle of moisture impinging upon the first surface relative to glass with no such coating and will enhance rear vision when moisture is present.
  • both third surface and fourth surface reflector embodiments are within the scope of the present invention.
  • the materials applied to the third surface and, or, fourth surface are configured to provide a partially reflective/partially transmissive characteristic for at least a portion of the corresponding surface stack.
  • the materials applied to the third surface are integrated to provide a combination reflector/conductive electrode. It should be understood that additional "third surface” materials may extend outboard of the primary seal, in which case, it should be understood that the corresponding separation area extend through the additional materials. Having at least a portion of the primary seal visible from the fourth surface, as depicted in Fig. 6c for example, facilitates inspection and UV curing of plug material. In at least one embodiment, at least a portion of a stack of materials 620c, or at least the substantially opaque layers of a stack of materials, are removed, or masked, beneath the primary seal material to provide for inspection of at least 25% of the primary seal width around at least a portion of the perimeter.
  • Various embodiments of the present invention will incorporate portions of a particular surface having a coating or stack of coatings different from other portions; for example, a "window" in front of a light source, information display, a photo sensor, or a combination thereof may be formed to selectively transmit a particular band of light ray wavelengths or bands of light ray wavelengths as described in many of the references incorporated herein. With further reference to Figs.
  • the first separation area 740 cooperates with a portion of the primary seal material 775 to define the second conductive electrode portion 730, the second spectral filter material portion 736 and the second adhesion promotion material portion 739 substantially electrically insulated from the first conductive electrode portion 708, the first spectral filter material portion 724 and first adhesion promotion material portion 727.
  • This configuration allows for placement of an electrically conductive material 748 such that the first electrical clip 763 is in electrical communication with the third conductive electrode portion 718, the reflective material 720, the optional overcoat 722 and the electro-optic medium 710.
  • electrically conductive material 748 may at least partially separate the interfaces 757, 766, 772, 775.
  • the material, or composition of materials, forming the third conductive electrode portion 718, the first electrical clip 763 and the electrically conductive material 748 are chosen to promote durable electrical communication between the clip and the materials leading to the electro-optic medium.
  • the second separation area 786 cooperates with a portion of the primary seal material 775 to define the fourth conductive electrode portion 787 substantially electrically insulated from the third conductive electrode portion 718, the reflective layer 720, the optional overcoat material 722 and the electro-optic medium 710.
  • This configuration allows for placement of an electrically conductive material 790 such that the second electrical clip 784 is in electrical communication with the first adhesion promotion material portion 727, the first spectral filter material portion 724, the first conductive electrode portion 708 and the electro-optic medium 710. It should be apparent, particularly in embodiments wherein the electrically conductive material 790 is applied to the element prior to placement of the first electrical clip 784, that electrically conductive material may at least partially separate the interfaces 785, 788, 789.
  • the material, or composition of materials, forming the first conductive electrode portion 708, the first electrical clip 784, the adhesion promotion material 793, the spectral filter material 796 and the electrically conductive material 790 are chosen to promote durable electrical communication between the clip and the materials leading to the electro-optic medium. It is sometimes desirable to provide one or more optional flash over-coat layers 722 over reflective layer 720, such that it (and not the reflective layer 720) contacts the electrochromic medium. This flash over-coat layer 722 must have stable behavior as an electrode, it must have good shelf life, it must bond well to the reflective layer 720, and maintain this bond when the seal member 778 is bonded thereto.
  • the cover layer it must be sufficiently thin, such that it does not completely block the reflectivity of layer(s) beneath 720.
  • the reflective layer 720 may be silver metal or a silver alloy because the flash layer protects the reflective layer while still allowing the highly reflecting layer 720 to contribute to the reflectivity of the mirror.
  • the thickness of the flash layer is dependent on the material selected. For example, elements constructed with a third surface coating of chrome under ruthenium under rhodium under silver coated with a flash layer of as little as 10 .ANG. of ruthenium showed improved resistance compared to elements without the flash layer both to the formation of spot defects during processing and haze in the viewing area of the element when subjected to high temperature testing.
  • flash layer 722 may also be a silver alloy or an aluminum-doped zinc oxide.
  • the flash layer or a thicker cover layer may also be a transparent conductor such as a transparent metal oxide. Cover layer(s) may be chosen specifically to compliment the other layers for such factors as barrier properties, advantageous interferential optics, balancing of compressive or tensile stresses and the like. It should be understood that the flash layer as described above may be used in other embodiments described elsewhere in this document.
  • Such cover layers when made from the aforementioned list of metals or other metals / alloys/ semi-metals found to be compatible with the electrochromic system, when the metal or semi-metal layer(s) is thicker than 300 Angstroms tend to allow little optical effect from the layers beneath it. If it is considered more desirable that the appearance of the metallic cover layer it may be advantageous to use such a thicker cover layer.
  • Some description of such stacks is provided in commonly assigned European patent EP0728618A2 "Dimmable Rearview Mirror for Motor Vehicles" Bauer, et al., which is hereby incorporated by reference.
  • a mirror or window may not darken uniformly when an electrical potential is applied to the element.
  • the non-uniform darkening results from local differences in electrical potential across the solid state EC materials, fluid or gel in an EC element.
  • the electrical potential across the element varies with the sheet resistance of the electrodes, the bus bar configuration, the conductivity of the EC medium, the concentration of the EC medium, the cell spacing or distance between the electrodes, and the distances from the bus bars.
  • a commonly proposed solution to this problem is to make the coatings or layers composing the electrodes thicker thus reducing their sheet resistance and enabling a faster darkening element. As will be discussed below there are practical penalties that are imparted that restrict this simplistic approach to solving the problem.
  • the bus bars run parallel to the long dimension. This is to minimize the potential drop across the part between the electrodes.
  • the mirror also typically consists of a high sheet resistance transparent electrode and a lower sheet resistance reflector electrode. The mirror will darken most quickly near the bus bar for the higher sheet resistance electrode and slowest at some intermediate position between the two electrodes. Near the bus bar for the lower sheet resistance electrode will have a darkening rate between these two values. There is a variation in effective electrical potential as one moves between the two bus bars. In the case of two long parallel bus bars that have a relatively short distance between them (distance between the bus bars is less than half the length of the bus bars) the mirror will darken in a "window shade" fashion.
  • the mirror darkens faster near one bus and the darkening appears to move between the two bus bars in a gradual fashion.
  • the darkening rate is measured at the middle of the part and in the case of a mirror with a width to height ratio greater than 2, any non-uniformities in darkening rate are relatively minor.
  • the relative difference in the darkening rate across the parts also increases. This can be exacerbated when the mirrors are designed for an outside application.
  • the metals that can withstand the rigors of such an environment typically have lower conductivity than metals such as silver or silver alloys that are suitable and common for inside mirror applications.
  • a metal electrode for an outside application may therefore have a sheet resistance. up to 6 ohms/sq while an inside mirror may have a sheet resistance of ⁇ 0.5 ohms/sq.
  • the transparent electrode may be limited in thickness for various optical requirements.
  • the transparent electrode, such as ITO is often limited to a 14 wave thickness in the most common usage.
  • This limitation is due to properties of the ITO discussed herein but also due to the expense associated with making an ITO coating thicker. In other applications the coating is limited to 80% of the /4 wave thickness. Both of these thickness constraints limit the sheet resistance of the transparent electrode to greater than about 12 ohm/sq for a Vz wave and up to 17-18 ohms/sq for a coating that is 80% of a Vz wave coating. The higher sheet resistance of the metal and transparent electrodes results in a slower, less uniform darkening mirror. The darkening rate may be estimated from an analysis of the EC element in terms of an electrical circuit. The discussion below pertains to coatings that have uniform sheet resistance across the element.
  • the potential at any location between parallel electrodes is simply a function of the sheet resistance of each electrode and the resistance of the EC medium.
  • Table 1 below the average potential across the element between the electrodes is presented along with the difference between the maximum and minimum potential. This example is for an element with a 10 cm spacing between the parallel bus bars, a 180 micron cell spacing, a 1.2 volt driving voltage and 100,000 Ohm*cm fluid resistivity. Six combinations of top and bottom electrode sheet resistance are compared.
  • the speed of darkening is fastest at the electrical contact to the highest sheet resistance electrode and is related to the effective potential at this position.
  • the fastest overall darkening time will occur when the potential is as high as possible across the part. This will drive the electrochemistry to darken at an accelerated rate.
  • the sheet resistance of the coatings on both the top and bottom substrates plays a role in determining the effective potential between the electrodes, but as can be seen from the table the high sheet resistance electrode plays a more critical role. In past electrochromic art the improvements were driven almost exclusively by lowering the sheet resistance of the low resistance electrode. This was because the use of materials such as silver gave substantive benefits and was relatively easy to implement.
  • the sheet resistance of the transparent electrode should be less than 11.5 ohms/sq, preferably less than 10.5 ohms/sq and more preferably less than 9.5 ohms/sq and due to the optical requirements discussed below, in some embodiments, the thickness of the transparent electrode should be less than about a half wave optical thickness.
  • the reflector electrode should be less than about 3 ohms/sq, preferably less than about 2 ohms/sq and most preferably less than 1 ohm/sq.
  • a mirror or EC element so constructed will also have a relatively uniform darkening such that the difference in darkening time between the fastest and slowest darkening rate is less than a factor of 3, preferably less than a factor of 2 and most preferably less than a factor of 1.5. Novel, high-performance, low-cost materials are discussed below that enable these fast, uniform darkening elements.
  • the sheet resistance of the transparent electrode (ITO) and the metal reflector were varied as noted in Table 2. Contact was made to the metal electrode with a point contact. A clip contact such as the so called J- clip was used with an Ag paste line approximately 1" long to provide electrical contact to the metal reflector along one of the short length sides of the mirror. Electrical contact was made to the transparent electrode via an Ag paste along the one side opposite the point contact and continuing down one third of the distance along both long sides of the mirror. The darkening time (T5515) was measured at three locations on the mirror. Position 1 is near the point contact, position 2 is at the edge of the transparent electrode bus opposite the point contact and position 3 is at the center of the mirror.
  • the T5515 time (in seconds) is the time it takes the mirror to go from 55% reflectance to 15% reflectance.
  • the max reflectance is the maximum reflectance of the mirror.
  • the delta T5515 is the time difference between either point 1 and point 2 or between point 2 and point 3. This is a measure of the difference in darkening rate between the fastest position and the other two locations on the mirror. As the darkening becomes more uniform these numbers become closer together.
  • the timing factor is the darkening time at a given position divided by the time at the fastest position. This shows the relative scaling of time between the different locations independent of the absolute rate at any given location. As noted above, it is preferred to have a timing factor less than 3 and preferable less than 2 and most preferably less than 1.5.
  • the timing factor is not affected by the sheet resistance of the third surface reflector the overall darkening rate is affected.
  • the sheet resistance of said reflector is less than or equal to 2 ohms/sq and the ITO is at approximately 9 ohms/sq the darkening rate for this mirror is less than 8 seconds in the center.
  • This value corresponds approximately to a mirror of similar size with a conventional bus arrangement. Therefore, by lowering the sheet resistance of the ITO a point contact is enabled with a relatively high sheet resistance reflector.
  • an electro-optic element comprises fast, uniform darkening with traditional bus bar arrangements with the optional point contact bus arrangements taught herein. Novel transflective coatings are described below that are particularly well suited to complement the bus arrangements described above.
  • U.S. Patent Application 20040032638A1 Electrochromic devices with thin bezel-covered edge
  • Tonar et. al. hereby incorporated by reference
  • mentions that " lower sheet resistance coating may be provided in an area proximate the associated electrical contact or around a perimeter area and allow the sheet resistance to increase as the distance from the electrical contact increases” and states that "this is particularly applicable when point contacts are utilized”.
  • Patent 5,535,056 "method for making elemental semiconductor mirror for vehicles" hereby incorporated by reference, where an opaque silicon layer would be covered by approximately one quarter wave optical thickness of Indium Tin Oxide covered by 20 to 25 nanometers of Silicon, covered by approximately 20nm of Indium Tin Oxide.
  • Such a coating stack being opaque could have additional materials placed beneath it in patterns with minimal effect on its appearance from the front. This stack would also be sufficiently conductive throughout to not lose the advantages of that patterning.
  • the ITO if found to still be too conductive when deposited under conditions that usually yield approximately 12 ohms per square at about 1400 Angstroms thickness, can be made less conductive by adjusting process conditions or by changing the indium to tin ratio.
  • contrasting regions on the third surface had less of an iris effect when darkening than the element with 12 ohm/sq to ⁇ A ohm/sq contrasting regions when viewed under these conditions.
  • Elements were made per the preceding paragraph except that additional coatings were used on the third surface. Those coatings consisted of : an additional flash layer of conductive oxide (put there for adhesion since the processing involved vacuum breaks in the coating process), approximately 300 nm Silicon, approximately 60 nm ITO, another 20 nm Silicon and then 10 nm ITO.
  • the silicon layer may be prone to surface oxidation which may in certain EC elements may form a surface oxide that then interferes with the uniformity and consistency of darkening.
  • the ITO or other TCO or another material described herein as a flash layer or overlayer may be used to inhibit the formation or negative effects of said oxide.
  • Those elements which had started with the initial layer (per the preceding example) of 40 ohms per square had resulting third surface conductivities that were about 24 ohms/ square in the top and bottom regions (per Figs. 5f and 7), and ⁇ 1 ohm /square in the center region as measured by four point probe.
  • the elements which had started with an initial ITO layer of 12 Ohms/ square had 10-12 ohms per square in the top and bottom regions.
  • the elements with higher ohmic contrast had the least iris effect or the most tendency to center to edge darken.
  • These elements also had the following optical characteristics in the unpowered state when using D65 2 degree observer, L* a* b* Y
  • Preferential darkening of certain areas of the electrochromic device may also be obtained by means of thin deletion lines in the second surface transparent conductor (stack) or third surface reflective (stack), as well as grading the thickness of the coatings as described elsewhere herein.
  • laser deletion as an example, in general, as one decreases the operating wavelength of a laser it is capable of creating a thinner laser line. 15 micron width deletion lines, have been produced using UV laser of wavelength 355nm. These lines are still discernable but much less so than those produced by using longer wavelength lasers. As shorter wavelength lasers continue to become more accessible one may fairly anticipate that deletion lines that are not cosmetically objectionable in the viewing area under normal conditions for an automotive mirror will be possible.
  • a profile view of a portion of a rearview mirror element comprising a first substrate 802a having at least one layer 808a of a substantially transparent conductive material deposited on the second surface and a second substrate 812a having a stack of materials deposited on the third surface secured in a spaced apart relationship with respect to one another via a primary seal material 878a to define a chamber there between.
  • an electro-optic medium 810a is located within said chamber.
  • the third surface stack of materials comprises an underlayer 818a, a conductive electrode layer 820a, a metallic layer 822a and a conductive tab portion 882a having an overlap portion 883a underneath the metallic layer and primary seal material. It should be noted that the conductive tab portion 882a could alternatively be deposited over the metallic coating 822a to create the overlap portion.
  • the underlayer is titanium-dioxide. In at least one embodiment, the underlayer is not used.
  • the conductive electrode layer is indium-tin- oxide. In at least one embodiment, the conductive electrode layer is omitted.
  • the conductive electrode layer is omitted and the underlayer is either a thicker layer of titanium-dioxide or some other substantially transparent material having a relatively high index of refraction (i.e. higher index of refraction than ITO), such as, silicon carbide.
  • the conductive tab portion comprises chrome. It should be understood that the conductive tab portion may comprise any conductive material that adheres well to glass and/or other stack layers or the epoxy depending on the layers sequence and is resistant to corrosion under vehicular mirror testing conditions. As can be appreciated, when the third surface stack of materials, or at least those layers within the stack that are susceptible to corrosion, are kept within an area defined by an outer edge of the primary seal material, the element will be substantially immune to problems associated with third surface corrosion.
  • the layer, or layers, susceptible to corrosion may extend beyond the primary seal material provided a protective overcoat or sealant is incorporated, such as, conductive epoxy or an overcoat layer.
  • a protective overcoat or sealant such as, conductive epoxy or an overcoat layer.
  • any of the first, second, third and fourth surface layers or stacks of materials may be as disclosed herein or within the references incorporated elsewhere herein by reference.
  • the conductive tab portion improves conductivity over the conductive electrode; as long as a conductive electrode layer is provided with sufficient conductivity, the conductive tab portion is optional.
  • the conductive electrode layer imparts the desired color specific characteristics of the corresponding reflected light rays in addition to providing the desired conductivity. Therefore, when the conductive electrode is omitted color characteristics are controlled via the underlayer material specifications.
  • a profile view of a portion of a rearview mirror element comprising a first substrate 802b having at least one layer 808b of a substantially transparent conductive material deposited on the second surface and a second substrate 812b having a stack of materials deposited on the third surface secured in a spaced apart relationship with respect to one another via a primary seal material 878b to define a chamber there between.
  • an electro-optic medium 810b is located within said chamber.
  • the third surface stack of materials comprises an underlayer 818b, a conductive electrode layer 820b, a metallic layer 822b and a conductive tab portion underneath the primary seal material.
  • a void area 883c is defined between the metallic layer and the conductive tab portion, the conductive electrode provides electrical continuity there between.
  • the underlayer is titanium-dioxide. In at least one embodiment, the underlayer is not used.
  • the conductive electrode layer is indium-tin-oxide.
  • the conductive tab portion comprises chrome. It should be understood that the conductive tab portion may comprise any conductive material that adheres well to glass and/or other stack layers or the epoxy depending on the layers sequence and is resistant to corrosion under vehicular mirror testing conditions.
  • any of the first, second, third and fourth surface layers or stacks of materials may be as disclosed herein or within the references incorporated elsewhere herein by reference. With reference to Fig.
  • a profile view of a portion of a rearview mirror element comprising a first substrate 802c having at least one layer 808c of a substantially transparent conductive material deposited on the second surface and a second substrate 812c having a stack of materials deposited on the third surface secured in a spaced apart relationship with respect to one another via a primary seal material 878c to define a chamber there between.
  • an electro-optic medium 810c is located within said chamber.
  • a first metallic layer 818c is deposited over substantially the entire third surface.
  • a second metallic layer 820c is deposited over the first metallic layer such that an outer edge of the second metallic layer is located within an area defined by an outer edge of a primary seal material 878c.
  • the first metallic layer comprises chrome.
  • the second metallic layer comprises silver or a silver alloy. It should be understood that any of the first, second, third and fourth surface layers or stacks of materials may be as disclosed herein or within the references incorporated elsewhere herein by reference.
  • a second substrate 812d comprising a stack of materials having an eyehole 822d1 substantially in front of a light sensor or information display.
  • a first metallic layer 818d is provided with a void area in the eyehole area.
  • a second metallic layer 82Od is provided with a void area in the eyehole area.
  • a third metallic layer 822d is provided. In at least one embodiment, only the third metallic layer is deposited in the eyehole area.
  • the first metallic layer comprises chrome.
  • the second metallic layer comprises silver or silver alloy.
  • the third metallic layer comprises a thin silver, chrome or silver alloy. It should be understood that any of the first, second, third and fourth surface layers or stacks of materials may be as disclosed herein or within the references incorporated elsewhere herein by reference.
  • Figs. 9a-k there are shown various options for selectively contacting a particular portion of the second and third surface conductive electrode portions 922, 908.
  • the configuration of Fig. 7 results in the electrically conductive material contacting at least a portion of each the second and third surface conductive electrode portions. It should be understood that the contact configurations as shown may be rotated about the element in any fashion.
  • the element construction depicted in Fig. 9a comprises a first substrate 902a having a second surface stack of materials 908a and a second substrate 912a having a third surface stack of materials 922a.
  • the third surface stack of materials is shown to have an isolation area 983a such that a portion of the third surface stack of materials that is in contact with a conductive epoxy 948a is isolated from the remainder of the third surface stack of materials.
  • the first and second substrates are held in spaced apart relationship to one another via a primary seal material 978a. It should be understood that another side of the element may have a similar isolation area associated with the second surface stack of materials for providing contact to the third surface stack of materials within the viewing area. It should be understood that either the second or third surface stack of materials may be a single layer of materials as described elsewhere herein and within references incorporated herein by reference.
  • the element construction depicted in Fig. 9b comprises a first substrate 902b having a second surface stack of materials 908b and a second substrate 912b having a third surface stack of materials 922b.
  • the first and second substrates are held in a spaced apart relationship with respect to one another via a primary seal material 978b.
  • An electrically conductive epoxy 948b is in contact with the third surface stack of materials and electrically insulated from the second surface stack of materials via the insulating material 983b.
  • another side of the element may have a similar isolation area associated with the second surface stack of materials for providing contact to the third surface stack of materials within the viewing area.
  • either the second or third surface stack of materials may be a single layer of on materials as described elsewhere herein and within references incorporated herein by reference.
  • the element of Fig. 9c comprises a first substrate 902c having a second surface stack of materials 908c and a second substrate 912c having a third surface stack of materials 922c.
  • the first and second substrates are held in spaced apart relationship with respect to one another via a primary seal material 978c.
  • the second surface stack of materials extends toward the edge of the first substrate beyond the primary seal material such that it is in electrical contact with a first electrically conductive epoxy, or first solder, 948c1.
  • the third surface stack of materials extends toward the edge of the second substrate beyond the primary seal material such that it is in electrical contact with a second electrically conductive epoxy, or second solder, 948c2.
  • another side of the element may have a similar isolation area associated with the second surface stack of materials for providing contact to the third surface stack of materials within the viewing area. It should be understood that either the second or third surface stack of materials may be a single layer of on materials as described elsewhere herein and within references incorporated herein by reference.
  • Fig. 9d depicts the second surface electrical contact 948d1 being made on an opposite side of the element from a third surface electrical contact 948d2.
  • Fig. 9e depicts the second surface electrical contact 948e1 being made on a side of the element and the third surface electrical contact being made on an end of the element.
  • Fig. 9f depicts the second surface electrical contact 948f1 being made on one side and continuously with one end of the element and the third surface electrical contact 948f2 being made on an opposite side and continuously with an opposite end of the element.
  • Fig. 9g depicts the second surface electrical contact 948g1 being made on opposite sides of the element and the third surface electrical contact 948g2 being made on an end of the element.
  • FIG. 9h depicts the second surface electrical contact 948h1 being made on opposite sides of the element and the third surface electrical contact 948h2 being made on opposite ends of the element.
  • Fig. 9i depicts the second surface electrical contact 948i1 being made continuously on opposite ends and one side of the element and the third surface electrical contact 948i2 being made on one side of the element.
  • Fig. 9j depicts the second surface electrical contact 948J1 being made continuously on opposite ends, completely on one side and on at least one portion on the second side and the third surface electrical contact 948J2 being made on one side of the element. It should be understood that, in at least one embodiment, the longer electrical contact will correspond to the surface having the highest sheet resistance stack of materials.
  • Fig. 9k depicts an element comprising a first substrate 902k having a second surface stack of materials 908k and a second substrate 912k having a third surface stack of materials 922k.
  • the first and second substrates are held in spaced apart relationship with respect to one another via perimeter first and second primary seals 948k1, 948k2.
  • the first primary seal functions to make electrical contact with the second surface stack of materials and the second primary seal functions to make electrical contact with the third surface stack of materials.
  • the first and second primary seals hold the first and second substrates in a spaced apart relationship with respect to one another and preferably both primary seals are substantially outside the edge of each substrate.
  • Wire bonding is a welding process that is used in the electronics industry to establish reliable interconnections between electronic components (usually IC chips and chip carriers).
  • a wire bonding process is described in Chapter A by Zonghe Lai and Johan Liu in Nordic Electronics Packaging Guidelines. Electrical interconnections made by wire bonding employ a metal wire or ribbon and a combination of heat, pressure and/or ultrasonic energy to weld the wire or ribbon to an associated metal surface. Typically the wire or ribbon is welded using a special wedge or capillary bonding tool.
  • thermocompression bonding ultrasonic bonding
  • thermosonic bonding Typical bonding processes use heat and or ultrasonic energy and generally fall into three major categories: thermocompression bonding, ultrasonic bonding and thermosonic bonding.
  • a wire being bonded may be terminated at the bond or multiple bonds may be made with a continuous wire.
  • Common forms of wire bonds include a ball bond, wedge bond and stitch bond.
  • Wires and ribbons made of many different metals and alloys may be wire bonded including aluminum, gold, silver, copper and alloys thereof. These wires may be bonded to a number of metals or substrates coated with metal layers including but not limited to metal layers of gold, silver, nickel, aluminum and alloys made with these metals.
  • the preferred substrate is glass and the preferred metal deposition process is by a physical vapor deposition process such as magnetron sputtering.
  • a glue layer or layers such as of chrome, molybdenum, nichrome or nickel may be applied between the wire bonded metal layer and glass to obtain acceptable adhesion.
  • the deposited metal layer thickness may be between 5 Angstroms to 1000 microns. More preferably the metal layer thickness is between 100 Angstroms and 1 micron and most preferably the metal layer thickness is between 200 and 1000 Angstroms.
  • the wire diameter or ribbon thickness may be between 10 and 250 microns with diameters or thicknesses between 25 and 100 micron being preferred and diameters or thickness between 50 and 75 microns being most preferred.
  • a continuous wire may be wedge or stitch bonded along a perimeter edge of a substrate such as to a chrome ring on a second surface of an electrochromic mirror.
  • a wire or ribbon bus may be electrically connected to a clip such as a nickel J or L clip by welding the wire or ribbon to the clip and then looping the cup to the substrate and welding it to the associated electrode.
  • the wire or ribbon may start at the metal clip and progress along the EC electrode or start along the EC electrode and loop to the clip and back to the electrode.
  • a welded wire or ribbon bus may be protected from damage by encapsulating the wire and welds in a sealant.
  • a preferred method is to protect the bus by encapsulating the wire/ribbon and welded bonds in the perimeter seal of the associated element.
  • the metal wire/foil is chemically compatible with the EC media enclosing the bus in the device (inside the perimeter seal) is preferred.
  • a wire bus may also be used to supplement the conductivity of the associated electrode inside the element. Wires with diameters of 75 microns or less are not readily apparent to the human eye.
  • Wire bonding is attractive from a manufacturing perspective because it is a room temperature or low temperature process, there is no post cure or post processing operations required, the technology is well established with proven reliability and the bonds may be quickly (around 100 millisecond per bond) established.
  • Wire bonding may also be used to electrically connect electronic components to the substrate surfaces of an element. For example, many metals are electrochemically stable when used as a cathode but not as an anode in an element. It is desirable to provide protection such as by a diode to limit operation of the EC device when the polarity is reversed. (This is described in detail below with reference to Fig.
  • An electrical component such as a surface mount diode may be attached to the substrate or the bus clip and electrically connected to the substrate and/or the clip by wire bonding.
  • light emitting diodes LED's
  • LED's that are part of a signaling or warning system may be attached, for example in chip form, to an associated substrate and electrically connected to a circuit on the substrate formed by patterning metal coatings by etching, masking or laser ablation. These LED's or other electrical components may be mounted on or in the element on substrate surfaces one, two, three or four.
  • a thermistor and electronic components required for a temperature modulated variable voltage drive circuit may be mounted to an associated substrate surface and electrically connected to metal coatings on the substrate by wire bonding.
  • Bond strength of the wire was evaluated by pulling off the wire after bonding and after 1 hour exposure to 300 degrees centigrade and measuring the force.
  • Predominate failure after bonding was wire break at the end of first welded bond. After bake the predominate failure was wire break at mid span for "CN” and "CRN” groups and wire break at the end of first bond for the "CR” group. This example demonstrates multiple reliable welded bonds may be made to typical sputtered metal layers on glass.
  • Fig. 10 generally illustrates variable transmittance windows 1010 that may be employed in multi-passenger vehicles, along with a window control system 1008 electrically coupled to the variable transmittance windows 1010 for controlling the transmittance state of the variable transmittance windows 1010.
  • Window control system 1008 includes a window control unit 1009 coupled to each of the variable transmittance windows 1010 for controlling the transmittance of 7 each of the variable transmittance windows 1010.
  • Each window control unit 1009 includes slave control circuitry 1070 for controlling the transmittance state of an associated variable transmittance window 1010.
  • Each window control unit 1009 is also shown having user input mechanism 1060 coupled to slave control circuitry 1070 for providing a user input to slave control circuitry 1070 to change the transmittance state of the associated variable transmittance window 1010.
  • Each window control unit 1009 is also shown coupled to power and ground lines 1011 for providing power to slave control circuitry 1070, user input mechanism 1060, and variable transmittance window 1010. As shown, power is provided to variable transmittance window 1010 via slave control circuitry 1070 from the power and ground lines 1011.
  • Each window control unit 1009 is also shown coupled to a window control system bus 1013. Other devices also coupled to the window control system bus 1013 include master control circuitry 1090 and other electronic devices 1092.
  • Master control circuitry 1090 is configured to monitor signals provided on the window control system bus 1013 by each of window control units 1009 and to provide control signals on the bus to each of window control units 1009.
  • Master control circuitry 1090 includes processing circuitry, including logic, memory, and bus interface circuitry, to permit master control circuitry 1090 to generate, send, receive, and decode signals on the window control system bus 1013.
  • Slave control circuitry 1070 included in each of window control units 1009, is configured to receive a desired window transmittance state from user input mechanism 1060, and provide electrical signals to variable transmittance window 1010 to change the transmittance state of variable transmittance window 1010 to the state requested by the user via user input mechanism 1060.
  • Slave control circuitry 1070 is also configured to monitor various characteristics of variable transmittance window 1010, including the power consumed by variable transmittance window 1010 and the transmittance state of variable transmittance window 1010. Slave control circuitry 1070 also includes circuitry for receiving signals from, and sending signals to, the window control system bus 1013.
  • Certain metal films can be less stable when configured as an anode when compared to transparent conductive oxides, such as, indium tin oxide films. This may be evidenced upon cycling in an electrochromic device by the metal deplating from the anode or by chemical changes in the metal surface such as oxidation, or by the surface becoming hazy from the mobile metal atoms rearranging into a rougher surface.
  • transparent conductive oxides such as, indium tin oxide films.
  • a circuit 1101a having a diode in series with an exterior mirror element 1102a prevents current flow with reversed polarity, as well as preventing electrochromic functionality.
  • the device may have compromised performance when operated in the correct polarity in that the mirror will darken upon application of the usual voltage however upon shorting of the circuit at the inside mirror circuitry for clearing , the exterior mirror will not be able to discharge via that route. Therefore the exterior mirror element will mainly discharge as the positive and negatively charged species neutralize each other in solution, however not as they discharge to the conductive surfaces of the device. This may result in a substantially slowed clearing speed for the device.
  • the circuit 1100b depicted in Fig. 11b comprises a diode 1101 b in parallel across the leads near an exterior mirror element 1102b.
  • a short circuit will be caused if the polarity of the current provided to that portion of circuit is reversed. Current will then flow through the diode and not the electrochromic element. The short is detected by the interior mirror circuitry 1103b and voltage is automatically disconnected. Therefore, even though allowing proper operation of the mirror when the polarity is correct, this circuit completely disables the electrochromic functionality of the mirror if the polarity is reversed.
  • Fig. 11d depicts an alternate configuration for an electro-optic drive circuit that provides automatic compensation for reverse polarity.
  • Diodes 1101d1, 1101d2, 1101d3, 1101d4 define a rectifier bridge which provides a dual current path. The actual path current flows will always have the desired orientation of anode and cathode of the electro-optic element 1102d.
  • circuits 1100a, 1100b, 1100c, 1100d of Figs. 11a-11d are depicted to a single outside mirror. Should it be desirable to protect more than a single exterior mirror the desired circuitry may be so adapted.
  • the magnitude of the reflected image (I R ) with no electrical potential difference is about 45 percent to about 85 percent of the incident light intensity (I 0 ).
  • the exact value depends on many variables outlined below, such as, for example, the residual reflection (I' R ) from the front face of the front element, as well as secondary reflections from the interfaces between the front element 702 and the front transparent electrode 708, the front transparent electrode 708 and the electrochromic medium, the electrochromic medium and the second transparent electrode 718, and the second transparent electrode 718 and the rear element 712.
  • These reflections are well known in the art and are due to the difference in refractive indices between one material and another as the light crosses the interface between the two.
  • inside mirrors preferably have a minimum high end reflectivity of at least 40 percent, and outside mirrors must have a minimum high end reflectivity of at least 35 percent.
  • the electrode layers 708 and 718 are connected to electronic circuitry, Figs. 10-11d for example, which is effective to electrically energize the electrochromic medium, such that when a potential is applied across the conductors 708 and 718, the electrochromic medium in chamber 710 darkens, such that incident light (lo) is attenuated as the light passes toward the reflector and as it passes back through after being reflected.
  • a preferred device functions as a "gray-scale" device, with continuously variable transmittance over a wide range.
  • the electro-optic medium may include materials that are solid metal oxides, redox active polymers, and hybrid combinations of solution-phase and solid metal oxides or redox active polymers; however, the above-described solution-phase design is typical of most of the electrochromic devices presently in use.
  • reducing the sheet resistance of an ITO layer may be accomplished by increasing the thickness of that layer.
  • the increased thickness of the ITO layer is accomplished with an undesirable increase in light absorption of that layer.
  • an increase in the thickness of the ITO layer has typically been restricted to quantums of half waves of a given wavelength range (typically centered at approximately 550 nm) so as to minimize the relative reflectance from the outer surface of the ITO layer.
  • increasing the thickness of the ITO layer may increase the bending of the substrate to which the ITO layer is applied.
  • the ITO layer includes an internal stress that is exerted on the substrate, which when applied to some thin substrates, may result in bending of such substrate.
  • the substrate comprises relatively thin glass, so as to reduce absorption of the glass and the weight associated therewith, such that unacceptable bending occurs as the thickness of the ITO layer is increased.
  • Bending of the associated substrate may effect the distance between the two electrodes within the overall assembly, thereby effecting clearing rates, color, relative uniformity darkness or brightness of the assembly at varying points across the surface thereof, and even causing optical distortions to the point of created multiple reflected images rather than a single image.
  • Previous approaches at reducing the intrinsic stress of the ITO layer have focused on the methods utilized to produce the electrochromic elements.
  • One method known in the art for applying the ITO layer to an associated substrate includes magnetic sputtering.
  • an electro-optic element is provided utilizing an ITO layer having reduced sheet resistance, reduced absorptivity, and low stress, while attaining a uniform darkness or brightness of the overall assembly, while reducing the weight of the overall assembly, any sub combination or combination thereof.
  • an electro-optic element having a relatively reduced sheet resistance while simultaneously providing a relatively reduced absorptivity, a relatively decreased bending of an associated substrate to which the associate ITO layer is applied, and provides a relatively uniform darkness or brightness for the overall assembly while reducing the total weight thereof.
  • Figs. 6a- d and the outside rearview mirror assemblies of Figs. 5a-5f may incorporate light- sensing electronic circuitry of the type illustrated and described in Canadian Patent No. 1,300,945, U.S. Patent No. 5,204,778, or U.S. Patent No. 5,451,822, and other circuits capable of sensing glare and ambient light and supplying a drive voltage to the electrochromic element; the disclosures of which are incorporated in their entireties herein by reference.
  • the different ITO coatings in this example have different imaginary refractive indices.
  • the example element construction consists of 1.7 mm glass, 50 nm Cr, 20 nm Ru, 140 microns of EC fluid, varying ITO and 1.7 mm of glass.
  • the thickness of different ITO layers is shown in Table 4. In many side mirror applications the customer specifications require that the reflectance is greater than 55%. The thickness is limited depending on the properties of the ITO and therefore the viable sheet resistance is also limited. In a typical manufacturing process it is not always possible to operate a process at the lowest absorption levels. Therefore, the practical upper thickness and lower sheet resistance limits are constrained by the variation in the manufacturing process. Additionally, it is common that ITO with lower absorption undesirably corresponds to higher sheet resistance. Thicker, low absorption, ITO may also correspond to one with a higher sheet resistance thereby limiting the benefit of the thicker coating. Table 4
  • EC elements Another design attribute desirably for EC elements is to have a low reflectance in the dark state. This results in a high contrast ratio for the mirror elements.
  • Table 5 depicts the dark state reflectance values for an EC mirror as a function of the ITO thickness.
  • the EC fluid is set to be substantially opaque. If the EC fluid is not completely opaque then the reflected light from the mirror coating will add to the reflectance in Table 5.
  • the dark state reflectance reaches a minimum at about 140 to 150 nm or a ⁇ A wave coating with a design wavelength of 550 nm. As the thickness deviates from this half wave thickness, the dark state reflectance rises and the contrast ratio degrades. Therefore, ITO thickness cannot be set to an arbitrary thickness to attain a given sheet resistance value. The ITO thickness is constrained by both absorption of the coating and the dark state reflectance requirements. Table 5
  • an electro-optic element includes at least one ITO transparent electrode 128 with reduced bulk resistance, thereby improving conductivity, without simultaneously sacrificing other related optical and physical properties.
  • an electro-optic element is constructed via a sputtering process at relatively high pressures and relatively high oxygen flow rates.
  • traditional sputtering processes utilized for applying an ITO layer to a substrate have been limited to certain maximum pressures. Exceeding these pressures has previously resulted in a poor quality layer of ITO 1 or specifically a clustered, non-uniform deposition exhibiting poor electrical and optical properties.
  • the ITO coatings were produced on a vertical, inline sputtering coater.
  • Cathodes were approximately 72" in length and either two
  • Each process section has two pair of cathodes in an aligned facing configuration. Oxygen gas flows shown herein are for a process section consisting of four cathodes unless otherwise indicated. When two process sections are operated it is assumed that an equivalent amount of oxygen is fed into both chambers and the total amount of oxygen is double that used for four cathodes in one process chamber. Glass substrates were preheated to approximately 300 degrees Celsius.
  • the sputtering gas was adjusted to attain a given pressure and oxygen was introduced at the prescribed flow rate or as a percentage of the total gas fed to the system. It should be understood, however, that the present invention is not limited by the exact flow rates and percentages described herein as one skilled in the art will know that different chambers have different pumping configurations, gas inlets and manifolds, cathodes and powers and measure their pressure at different points in the process. Rather, one skilled in the art will appreciate the novelty of the method used to produce the coatings and their resultant properties including bulk resistance, stress and morphology and will be able to readily scale or adapt the teachings herein to a different sputtering system without undo experimentation. Though the majority of the work described herein was conducted with a glass substrate temperature of 300 C the trends and findings will be adaptable to higher and lower temperatures and will yield improvements over the standard conditions even if the absolute values described herein are not attained at the different temperatures.
  • increase in process pressure is offset by an increase in oxygen flow.
  • pressure to oxygen flow rate depends on several factors, including the particular noble gas used during the sputtering process. Two noble gases, krypton, and argon, are discussed in detail herein, however, other gases may be utilized with the particulars for the other gases being extrapolated from the given data.
  • a pressure of greater than or equal to 1 millitorr (mT) with an oxygen percentage of 5% is preferred, a pressure of greater than or equal to 2 mT with an oxygen percentage of 4% is more preferred a pressure of greater than or equal to 3mT with an oxygen percentage of 3% is even more preferred, and a pressure of greater than or equal to 4.5 mT with an oxygen flow rate of 2% is most preferred.
  • a pressure of greater than or equal to 2 mT with an oxygen percentage of 4% is preferred, a pressure of greater than or equal to 3mT with an oxygen percentage of 3% is more preferred, a pressure of greater than or equal to 4.5 mT with an oxygen percentage of 2% is even more preferred and a pressure of greater than or equal to 6 mT with an oxygen percentage of 1 % is most preferred.
  • Neon may be used with expected higher pressures, preferably greater than or equal to 3 mT and more preferably greater than or equal to 7 or 8 mT.
  • Xenon allows use of relatively low pressures as compared to krypton.
  • the preferred oxygen percentages may vary with the details of the sputtering apparatus. The percentages listed above are meant to be illustrative and non-limiting. The total flow of oxygen needed to obtain the optimal combination of material properties will generally increase with increased pressure. The needed amount of oxygen does not increase at the same rate as the sputtering gas, therefore, the percentage of oxygen decreases with increased pressure.
  • ITO is run at low pressures — at or below 2 mT.
  • Low pressure tends to result in the ITO coating having compressive stress.
  • Stress in the ITO can be high enough to bend glass especially as the thickness of the glass is reduced.
  • deflection of glass due to the ITO stress increases.
  • deflection of the glass can be several millimeters.
  • Deflection of the glass can be expressed in various ways.
  • One way is to consider the deflection of the glass is in terms of a lens.
  • the magnification value then directly relates to the deflection of the glass and is independent of the dimensions of the glass.
  • a perfectly flat piece of glass will have a magnification value of 1.0.
  • Coated glass, viewed from the coated side when the coating is in compressive stress then the glass will become convex on the coated side. If the coating were in tensile stress the glass will be concave on the coated side.
  • a compressive coating results in a warp or magnification value less than one and conversely if the coating is tensile, the magnification or warp values will be greater than 1.
  • Warp values on the order of 0.85 are highly distorted from flat and glass. Warp values on this order will yield an EC mirror or window that may have double image since the reflectance from the first and third surfaces may not overlap. Additionally, it is difficult to produce a viable seal with glass having unacceptable warp. Glass with warp values as high as 0.97 can cause issues in manufacturing or with regard to double image. With reference to Fig. 12, labeled "Argon Pressure Tests," the warp values were measured for ITO coatings on 1.6 mm glass.
  • the glass thickness plays a significant role in deflection and warp when an ITO or other stressed coating is applied.
  • the deflection amount generally varies inversely with the cube of the thickness of the glass (assuming that the intrinsic stress in the coating is constant with thickness of the coating). Therefore, thinner glass will warp in a non-linear fashion relative to thick glass. Thinner glass will generally warp with thinner ITO coatings when compared to thicker glass.
  • Fig. 12 depicts several key findings.
  • the warp values or stress (y-axis) in the ITO produced at 2.1 mT do not change substantially over the oxygen flow rate range (x-axis) in this experiment. Over this range the ITO passes through the minimum sheet resistance and bulk resistance values. It could be incorrectly concluded that it is not possible to simultaneously optimize both the electrical and stress properties, not to mention the other required optical properties. At very high oxygen flow rates, warp values start to deviate even more substantially from flat.
  • Fig. 13 illustrates the effects of a relative increase in Argon pressure and oxygen flow on bulk resistance. This particular test was conducted utilizing an argon as the sputtering gas.
  • the 400 seem argon case (line 1301) yields a pressure of 3.7 mT, 550 seem (line 1302) yields 5 mT, 700 seem (line 1303) yields 6.2 mT and 850 seem (line 1304) yields 7.4 mT.
  • the oxygen flow rate on the x-axis is in seem. It is noted that significant improvements are obtained with respect to bulk resistivity as Argon pressure and oxygen flow increase. Additionally, the lower Argon pressure cases tend to have a minimum at higher bulk resistance values relative to the higher pressure cases.
  • a comparable coating made at a pressure of 2 mT comprises a bulk resistance value between about 180 and 200 micro-ohm cm.
  • the bulk resistance an intrinsic measure of the quality of the ITO's electrical properties, is the multiplication of the sheet resistance and the thickness. It is common to only measure the sheet resistance, however, much information is lost when the coatings are not characterized in detail. Because the coatings are getting thinner with the changes to the process gasses the sheet resistance does not follow the same trends as the bulk resistance.
  • the continued benefits to the bulk resistance obtained with the higher Argon pressures (line 1404 representing the highest relative to lines 1401, 1402 and 1403) and oxygen flows are shown in a comparable analysis of the sheet resistance. If only sheet resistance is examined then one may conclude that the 3.7 mT case is best and the preferred properties are attained at relatively low oxygen flow rates. Another benefit that comes with the lower bulk resistance is that the real part of the refractive index is reduced. A half wave coating with a lower refractive index is physically thicker than one with a higher refractive index resulting in even lower sheet resistance.
  • the graph of Fig. 15 illustrates the effect of utilizing an argon gas in conjunction with increased Argon pressure and increased oxygen flows
  • the graph of Fig. 16 illustrates achieved ITO half wave bulk resistance.
  • the 200 seem case represents the standard in prior ITO coatings in the EC art.
  • the half wave coating of the prior art had a sheet resistance of over 12.5 ohms/sq while higher pressure cases in accordance with at least one embodiment of the present invention attained values lower then 12 ohms/sq and some even below 11 ohms/sq.
  • Substantial improvement in bulk resistance attained at higher pressures is exemplified in Fig. 16. In this case oxygen was not optimized at the higher pressures and the bulk resistance is seen to remain relatively constant with argon flows from 400-800 SCCM.
  • Bulk resistance of the ITO is important, however, as mentioned elsewhere herein sheet resistance is the primary factor that affects darkening speed in an EC element.
  • a bulk resistance of 200 micro-ohm cm equates to a sheet resistance of 13.7 ohms/sq for a half wave coating
  • a bulk resistance of 180 equates to a sheet resistance of 12.4 ohms/sq
  • a bulk resistance of 140 equates to a sheet resistance of 9.6 ohms/sq.
  • 9.6 ohms/square is a 30% reduction compared to the 13.7 ohms/sq case and results in substantial improvements in darkening times and will also enable novel bus configurations as described elsewhere herein which also improve element darkening uniformity.
  • Fig.18 warp in the glass (y-axis) is plotted as a function of oxygen flow rate (x-axis). It can be seen that the samples produced with Krypton (line 1801) have warp values closer to 1 which indicates that the krypton produced ITO coated glass is flatter than argon (line 1802) produced glass. Fig. 18 illustrates the data presented earlier where the warp was shown to increase with increasing oxygen flow rate.
  • Fig. 19 warp of the glass (y-axis) is plotted versus the absorption (x-axis).
  • the Krypton produced samples (line 1901) have more absorption when plotted against oxygen flow rate, however, when the warp is compared against absorption the Krypton produced samples are flatter than the argon produced samples (line 1902).
  • Fig. 20 depicts warp (y-axis) versus transmittance (x-axis) for Krypton (line 2001) and Argon (line 2002). Flatter glass is obtained for a given increased transmittance value. Additional improvements are possible using Krypton or Xenon, or even Argon, at higher pressures. Higher pressures enable the simultaneous achievement of lower stress, higher transparency and lower sheet resistance.
  • the morphology, or surface features, of the ITO coating also change with pressure and oxygen flow rate. There exists an interaction effect between these values where different morphologies are attained at different oxygen flow rates when the pressure is changed.
  • ITO coating samples depicted in Figs. 21-23 were produced in a coater with 72" cathodes. All samples were made at 2.1 mT, 5 kw per target, 1 process chamber (2 targets/side) and a line rate of 32 ipm. The oxygen flow rate was 2, 8 and 17 seem for the samples in Figures 21 , 22 and 23, respectively. Samples of Fig. 21 and Fig. 23 illustrate the extremes in the morphology. The sample of Fig.
  • FIG. 21 has what we call a nodular 2101 morphology while the sample of Fig. 23 has a platelet 2302 morphology. Examining the sample of Fig. 21 reveals a background platelet 2102 structure. The sample of Fig. 21 is considered to have a somewhat mixed morphology. The sample of Fig. 22, at the intermediate oxygen flow has very few nodules 2201 and an overall dominant platelet 2202 morphology. The platelet morphology has been correlated with a higher stress in the coatings while the nodular morphology occurs in the coatings with less stress. Depending on the given process gas pressure, the transition between these two different morphologies is either abrupt or gradual.
  • the low oxygen nodular morphology is characterized by a large peak- to-valley roughness (as described in detail with regard to Figs. 33a and 33b).
  • the nodules rise substantially above the surface of the coating thus creating large peak to valley roughness.
  • the roughness of the surface decreases.
  • the roughness is at a minimum when the nodules have just vanished from the surface.
  • the oxygen. flow is further increased the height of the cliffs between the platelets increases, undesirably increasing the roughness of the surface.
  • Figs. 24-26 are made at comparable powers and line rates as with those of Figs. 21-23 and all at 2 seem oxygen.
  • the process gas pressures were 3.7, 2.1 and 1.6 millitorr respectively.
  • the morphology is increasingly dominated by the nodular morphology as the pressure is increased.
  • the transition between the nodular 2401, 2501, 2601 and platelet morphologies is more gradual at the higher pressures, thus, allowing a finer adjustment between desirable optical and mechanical properties in the coating.
  • the platelet 2402 morphology is still present in the background of the 3.7 millitorr sample, however, in a much less dominant amount.
  • the nodule component is eventually eliminated leaving only the platelet morphology.
  • the surface structure of the sample depicted in Fig. 28 is generally comprised of nodules 2801 and has a very minor amount of platelet 2802 morphology with slight cliffs 2803.
  • the sample of Fig. 29 is essentially all platelet 2902 surface structure with well defined cliffs 2903.
  • the samples have very low bulk resistance values of approximately 150 micro-ohm cm. The absorption of these coatings is fairly low with the 12 seem case having the best combination of flatness, resistivity and absorption.
  • Fig. 30 There are voids between the grains depicted in Fig. 30 which gives rise to undesirably high haze and a degraded conductivity; this is exemplified by the relatively high bulk resistance value of 200 micro-ohm-cm for this sample.
  • Sample E made with 12 seem of oxygen has a very low bulk resistance (131 micro-ohm cm) and a fine grain microstructure.
  • the 16 seem case has a similar microstructure but in this case the platelet morphology is not present as it is in the thinner coatings.
  • the stress levels of these Krypton-produced coatings are relatively low.
  • the warp values range from essentially unity for the low oxygen case to 0.956 for the highest oxygen case.
  • the peak-to-valley surface roughness (as defined in the discussion below with reference to Figs. 33a and 33b) for these coatings is preferably less than or equal to 200 A, more preferably less than 150 A, more preferably less than or equal to about 100 A, even more preferably less than or equal to about 50 A, and most preferably less than or equal to about 25 A.
  • L * defines lightness
  • a * denotes the red/green value
  • b * denotes the yellow/blue value.
  • Each of the electrochromic media has an absorption spectra at each particular voltage that may be converted to a three number designation, their L * a * b * values.
  • L * aV values To calculate a set of color coordinates, such as L * aV values, from the spectral transmission or reflectance, two additional items are required. One is the spectral power distribution of the source or illuminant.
  • the present disclosure uses CIE Standard Illuminant A to simulate light from automobile headlamps and uses CIE Standard Illuminant D 65 to simulate daylight.
  • the second item needed is the spectral response of the observer.
  • the present disclosure uses the 2 degree CIE standard observer.
  • the illuminant/observer combination generally used for mirrors is then represented as A/2 degree and the combination generally used for windows is represented as D 6 s/2 degree.
  • Many of the examples below refer to a value Y from the 1931 CIE Standard since it corresponds more closely to the spectral reflectance than L * .
  • the value C* which is also described below, is equal to the square root of (a*) 2 +(b*) 2 , and hence, provides a measure for quantifying color neutrality.
  • Tables 3 and 4 summarize experimental results for elements constructed in accordance with the present invention. Specifically, experiments were conducted within a range of between 8 seem and 16 seem oxygen flow for both half and two wave thicknesses with krypton as the sputtering gas and at a pressure of 3 mTorr. Table 6 summarizes the results for a slightly less than half wave ITO thickness, while Table 7 summarizes the results for a slightly more than two wave ITO thickness, the half wave thickness being applicable, for example, to mirror applications and the two wave thickness being applicable, for example, to window applications. Further, it is noted that these tables include results for both single layers and elements constructed of dual layers.
  • Table 8 depicts the inter-dependence between bulk resistance, electron mobility and electron carrier concentration. It is noted that there is a continuum of carrier concentration and mobility combinations that will yield a given bulk resistance.
  • the electron carrier concentration is preferably greater than or equal to 4Oe 20 electrons/cc, while the mobility is preferably greater than or equal to 25 cm ⁇ 2 ⁇ /-s.
  • the carrier concentration and electron mobility, thickness and surface roughness presented herein are derived from ellipsometric analysis of the coatings.
  • the electron concentration and mobility may vary from those determined using a Hall characterization method and one skilled in the art will recognize that an offset may exist between the measurement methods. As noted above there are a continuum of carrier concentrations and mobility values that can attain a given bulk resistance. In an embodiment where a low refractive index is preferred then tuning of the deposition process to yield a higher carrier concentration will be preferred. In other embodiments where a low absorption is preferred then tuning of the deposition process to yield higher electron mobility will be preferred. In other embodiments one may desire an intermediate level of both carrier concentration and mobility.
  • an electro-optic element includes an improved ITO layer that simultaneously exhibits a reduced bulk resistance, reduced absorption, decreasing bending or warping of the associated substrate to which the ITO is applied, and maintaining a uniform darkness and brightness of the overall assembly, and reduces the weight thereof.
  • Surface topology, morphology or roughness is typically not important in non- microscale electrical applications dealing with metal coatings.
  • the surface topology is of particular interest when metals are used in an optical application.
  • the coating will have appreciable non-specular reflectivity or haze.
  • This degree of roughness, in most applications, is often the first to be addressed because it can have a negative impact on visual appearance but not necessarily on functionality.
  • optical applications such as many described herein, the presence of objectionable haze is considered a worst case scenario.
  • the surface roughness may have other negative consequences at roughness levels much less than those that result in objectionable haze.
  • Surface roughness levels define acceptable morphologies for metal films to allow them to function adequately in different optical applications.
  • a penalty associated with not adequately controlling the surface morphology is often increased cost since larger quantities of higher priced metals with higher reflectivity are often needed overcome the problems associated with improper surface morphology.
  • the effects of different levels of morphology or surface roughness using thin film modeling techniques have been analyzed. These techniques are accepted in the art of thin film technologies and have been proven to accurately describe real thin film or coating systems and can therefore be used to predict the impact of different changes to a coating. This is advantageous because it may be expensive or time consuming to manufacture or fabricate the large number of samples needed to show the effects. In this case a commercial thin film program called TFCaIc supplied by Software Spectra, Inc. was used to perform the calculations.
  • the roughness is defined in terms of mean peak-to-valley distance.
  • the layer When the layer is thin it may be approximated by a single homogeneous layer with a uniform refractive index. There are several ways to approximate the refractive index of a mixed layer. These are called effective medium approximations (EMA). Each different EMA has its strengths and weaknesses. In these examples a Bruggeman EMA methodology was employed. When the thickness of the layer becomes large the roughness is not approximated well if a single fixed refractive index is used. In these cases the roughness may be approximated as several slices of different ratios of void and bulk material to form a graded index approximation. Several metals are modeled herein to provide representative examples of the optical effect of surface roughness on reflectance.
  • Tables 6, 7 and 8 show the effect of roughness thickness on the reflectivity of the surface for Ag, Cr and Rh, respectively.
  • the thickness of the layers is in nanometers and the Cap Y value represents the reflectance from the coated surface.
  • the reflectivity drops off as the thickness of the roughness increases for each of these metals.
  • the amount of acceptable roughness will vary.
  • the roughness should be less than 20 nm mean peak-to-valley, preferably less than 15 nm, even more preferably less than 10 nm and even more preferably less than 5 nm and most preferably less than 2.5 nm. These preferred ranges, as noted above, depend on the application.
  • the thickness of a flash layer, cover layer, barrier layer or adhesion layer may need to scale with the degree of roughness of the underlying surface.
  • the thickness of the functional layer necessitated by the roughness of the underlying surface may result in undesirable effects such as changes in optical properties of the resultant stack, higher costs or other negative effects.
  • Means to smooth the surfaces prior to deposition of the functional layers are described below. It should be noted that there may be some embodiments where increased surface roughness may be advantageous such as creating an effectively larger surface area for better adhesion to a seal material.
  • the tables 6, 7 and 8 also include a value labeled as "% of Theoretical Maximum". This metric defines how close the reflectance of a coating with a rough surface matches the reflectance of the ideal, perfectly smooth surface. A coating with a % of Theoretical Maximum value of 100% would have the maximum reflectance theoretically attainable for that material. If the % of Theoretical Maximum value was 85% then the reflectance attained would be only 85% of the value of the ideal smooth coating or reflectance of coating with zero roughness times 0.85.
  • the reflectance of a metal or alloy coating is dependent on many attributes of the coating even one that is relatively smooth.
  • the density of the coating, presence or absence of internal voids, stress levels, etc all play a role in how the reflectance approaches some ideal maximum value.
  • the theoretical maximum reflectance defined herein pertains not to this ideal reflectance of an ideal coating but rather to the reflectance value of a smooth real world coating.
  • Theoretical Maximum value is obtained through a combination of optical analysis and thin film modeling. By analyzing a real world coating that has surface roughness using an optical technique such a Variable Angle Spectroscopic Ellipsometry the refractive index versus wavelength and surface roughness can be obtained.
  • the refractive index versus wavelength can then be inputted into a thin film modeling program such as TFCaIc or Essential Macleod and the reflectance can be calculated.
  • This calculated reflectance using measured refractive index data is then the Theoretical Maximum reflectance value from that particular film or coating.
  • the reflectance of a coating is greater than 85% of the Theoretical Maximum, more preferably 90% of the Theoretical Maximum and most preferably greater than 95% of the Theoretical Maximum.
  • a metal or other electrically conductive material has an intrinsic property known as the bulk resistivity.
  • the sheet resistance of the coating is determined by dividing the bulk resistance number by the thickness of the coating. In principle, any sheet resistance value can be obtained from any conductive material as long as the coating is thick enough. The challenge or limitation in achieving low sheet resistance comes in when other attributes are required in addition to the sheet resistance or conductivity.
  • Silver based coatings may have insufficient stability as an anode and depending on the coating stack may also be problematic from an adhesion standpoint.
  • a metal such as chrome is relatively low in cost compared to some other metals and is known to have very good adhesion. Chrome may, therefore, function as an adhesion layer and may be built up to sufficient thickness to get the desired electrical properties.
  • chrome is very reactive and this leads to an intrinsic predisposition to relatively large surface roughness values.
  • the high reactivity is important in that as the coating is deposited, using Magnetron Sputter Vacuum Deposition (MSVD) for example, the chrome atoms will tend to stick where they first land.
  • MSVD Magnetron Sputter Vacuum Deposition
  • the rate of bond formation is very fast and this restricts the atom's ability to diffuse along the surface and find a low energy location.
  • a low energy stable location on the coating is one that lends itself to less surface roughness. This tendency to not go to a low energy state also contributes to a degradation of the coating's bulk resistance. Therefore, a thicker layer is needed to attain the target sheet resistance and the surface roughness tends to further degrade.
  • the reflectivity of a low reflectance metal may be increased by putting a thin layer of a higher reflectance metal above it.
  • the previously mentioned metals such as Rhodium or Ruthenium may be used.
  • Rhodium or Ruthenium may be used.
  • the necessary thickness of these metals to attain a given reflectivity level will be a direct result of the surface roughness of the underlying chrome layer.
  • metals that could be used as the conductive layer include, but are not limited to, aluminum, cadmium, chromium, cobalt, copper, gold, iridium, iron, magnesium, molybdenum, nickel, osmium, palladium, platinum, rhodium, ruthenium, silver, tin tungsten and zinc. Alloys of these metals with each other or with another metal or metals may be possible. The suitability of these materials in a given application will depend on the full list of requirements. For instance, Ruthenium may be an expensive metal in one application but in another application it may be low cost relative to another metal such as Rhodium and may therefore fall within the spirit of this invention.
  • a given metal or alloy may not be compatible with all of the other components in an application.
  • the sensitive metal may be buried or otherwise isolated from components where there are interaction limitations.
  • the layers deposited on top of the chrome usually will pattern the roughness of the underlying layer. Therefore, a thin layer of a higher reflectance metal will also not have its ideal reflectivity because of the layer or layers underneath it.
  • the preferred embodiment is one that has the higher reflectance metal oriented toward the observer.
  • Many of the high conductivity metals listed above also have high reflectivity. These metals may need to be alloyed with other metals to have adequate chemical, environmental or physical properties. The metals or alloys may then have an unacceptable color or hue.
  • the overall reflectance intensity may be adequate for the desired application but if the reflected color does not meet requirements then the metal or alloy is unsuitable.
  • the metal or alloy may be buried beneath a layer with lower intrinsic reflectivity but one that has a more preferable reflected color.
  • chrome coating alone has relatively low reflectance values even at the 6 ohm/sq case.
  • the reflectance was only about 61% for this sample.
  • Chrome produced by other means or process conditions should be able to attain values in excess of 65%. Therefore, even at this modest sheet resistance value the chrome reflectance has been compromised.
  • Deposition process parameters can be adjusted to minimize the surface roughness during the formation of the coating.
  • the surface roughness can be reduced and the reflectivity increased by running the process at low pressure and preferably using neon or an argon-neon mixture as the sputtering gas as described in detail below. These parameters contribute to proper momentum and energy transfer in the deposition process with the result in less rough surfaces and lower bulk resistivities.
  • Table 13 depicts how the surface roughness, reflectivity and electrical properties vary as the process parameters are adjusted.
  • the 3mT case is provided as a reference.
  • the thickness of the coating is about 600 angstroms. This thickness is important because the coating is nearly opaque at this level and the sheet resistance is relatively low.
  • lowering the pressure reduces the roughness by about 17% and almost a 2% increase in reflectance is achieved.
  • Lowering the pressure and sputtering with a 50:50 mixture of argon and neon results in further improvements.
  • the roughness is about 20% lower than the reference case and the reflectance is about 2.7% higher.
  • the last case is with even higher amounts of neon - approximately 70% of the sputtering gas is neon. Reflectance is about 3.5% higher than in the reference case and the roughness is reduced by about 24%. Thickness and roughness values are determined by using variable angle spectroscopic ellipsometry.
  • Results can be further improved by lowering the pressure and by increasing the neon content in the sputtering gas.
  • increasing the substrate temperature also contributes to smoother coatings. Higher substrate temperature results in more surface mobility of the deposited atoms leading to a smoother surface.
  • Table 13 also includes bulk resistance values for the chrome coatings.
  • the theoretical minimum bulk resistance value for chrome is about 13 micro ohm cm.
  • the reference case made at a typical pressure of 3 mT in argon has a bulk resistance value of more than 6 times the theoretical bulk resistance.
  • the bulk resistance is less than 5 times the theoretical minimum, more preferably less than 4 times the theoretical minimum, more preferably less than 3 times the theoretical minimum and most preferably less than 2 times the theoretical minimum.
  • the presence of oxygen (or water) in the system can be particularly harmful from a surface roughness perspective. Chrome is very reactive with oxygen and tends to react immediately. This leads to additional roughness in the coating.
  • Table 14 depicts the effect of oxygen on roughness.
  • the oxygen level in Table 14 refers to the percentage in the sputtering gas.
  • the pressure is in mT and the thickness is in angstroms.
  • the amount of acceptable oxygen in the coating is less than 5 atomic percent, preferable less than 2 atomic percent and ideally less than 1 atomic percent.
  • roughness is dependent on the application. When high reflectance values are desired less roughness is also desirable. Where reflectance requirements are not as stringent more roughness may be acceptable. Generally, roughness should be less than about 200 angstroms, preferable less than 100 angstroms, even more preferably less than 50 angstroms, even more preferably less than 25 angstroms and most preferably less than 15 angstroms. Roughness as the term is used herein refers to the average peak-to-valley distance as determined using ellipsometry or atomic force microscopy.
  • the cathode may be shielded to minimize the grazing (high) angle deposition.
  • Other methods to get smoother surfaces include the use of ion assisted sputtering or ion assisted deposition, plasma assisted sputtering and other means to increase surface mobility of atoms.
  • the cathode type may be selected to facilitate smoother coatings, such as, use of "twin mags", unbalance magnetrons, rf superimposed dc power, microwave assisted sputtering, high power pulse deposition, AC sputtering or other such means.
  • Chrome was used in the examples above as the conductive layer, other metals, alloys or multilayer coating materials as described herein and within the references incorporated herein may be used within the spirit of the invention.
  • Other materials may need other process conditions to attain smooth surfaces.
  • ITO for instance does not necessarily have smooth surfaces under conditions which are preferred for metals.
  • the surface morphology is modified by a number of process variables. The case of controlling the surface properties of ITO are even more challenging than that of a metal. ITO is not always conductive like a metal and some process settings which may result in a smooth coating for a metal may not result in a highly conductive coating with ITO. Therefore, controlling the morphology in light of other properties of the material is quite challenging.
  • relatively smooth coatings may be obtained at high pressures and relatively high oxygen settings as describe earlier in this document.
  • Variation in process parameters to smooth a coating can be applied to other materials as well such as TiO2 or multi-layers such as TiO2 and ITO taught in transflective coating applications.
  • the roughness generally increases with the thickness of the coatings. Often the process settings described above are insufficient to result in coatings with an acceptable roughness level. This is the case where extremely low sheet resistance values are needed. In this scenario alternate means are needed to attain coatings with relatively low surface roughness that simultaneously have low sheet resistance values.
  • an ion beam is introduced as a means to thin a coating in a local area on a coated substrate.
  • an ion beam may also be used to smooth (as depicted in Fig. 33a and 33b) a rough coating (as depicted in Fig. 37).
  • An ion beam may be used either alone or in conjunction with other methods taught herein to reduce the roughness of a coating and thus increase the reflectivity.
  • Ion beam sources vary in design and function. For the purpose of this discussion, any design capable of delivering fluxes of ions at the energy ranges described herein are suitable.
  • An ion beam is a relatively coHimated group of energetic positive or negative ions.
  • the energy of the ions is a function of the operating potential of the ion beam.
  • the current, or flux of ions is a function of the operating potential and the amount of gas fed through the beam and the back ground pressure in the chamber.
  • Sufficient energy for the ions is desirable to etch, mill away and/or smooth the coating material.
  • An example of a related phenomenon is that of billiards. Consider the incoming ion as the cue ball and the coating as the rack of balls at the start of the game. If the cue ball is shot at the rack with very low energy then the rack does not break apart. Conversely, if the cue ball is shot with high energy then the rack can be broken apart quite violently.
  • Fig. 34 depicts sputtering yield as a function of argon ion energy for various materials. There is a threshold energy whereby no or minimal sputtering occurs. As the energy is increased the sputtering yield increases. The ionized atom may also affect the sputtering rate. The preferred mass of sputtering ion to have the maximum sputtering yield will vary with the energy of the sputtering ion and the mass of the atoms to be sputtered.
  • Fig. 35 depicts sputtering yield as a function of sputtering ion and sputtered atom mass at 50OeV ion energy. The data depicted in Fig.
  • Fig. 35 was generated using a computer simulation program called "Stopping and Range of Ions in Matter (SRI M)". As depicted there is a range of optimal sputter gas ion masses which will produce acceptable sputtering yields for a given target atomic mass. In general, as the beam energy is increased the optimal mass of ions increases to maximize the sputter yield. To some extent, the preferred ion will be dependent on the mass of the sputtering atom. For optimal energy and momentum, transfer of the atoms should be of relatively comparable mass.
  • Fig. 34 depicts that the threshold energy is dependent on the sputtered material. Some materials take more energy to release than others. The graph of Fig.
  • the ion energy should be above 100 electron volts, preferably above 500 electron volts and most preferably above 1000 electron volts.
  • the smoothing effect is illustrated with reference to Figs. 36 and 37. In Fig.
  • an ion beam impinging on the surface at an angle may have a substantially higher sputtering efficiency and smoothing effect.
  • the angled ion beam would have a high probability of ejecting material laterally to the coating surface.
  • the reflectance, transmittance, absorption and sheet resistance properties of a particular transflective coating were limited by roughness in the layers.
  • One relevant coating is Glass/ITO/Si/Ru herein referred to as Option 4".
  • the ITO is optimally a 3/4 or 5/4 wave coating, 2100 or 3600 angstroms, respectively.
  • the Si fayer is about 220 angstroms and the Ruthenium layer is about 70 angstroms. Also as discussed below different variants of this stack are possible.
  • the reflectance and transmittance of this stack is very dependent on the surface and interface roughness. When multi-layer stacks such as option 4 are considered that consist of dielectric, semiconducting layers, transparent conduction oxides and metals then the interface roughness must be considered as well as the roughness of the surface.
  • Table 15 depicts the effect of ion milling the surface of ITO - one of the lower layers used in Option 4 stacks. The data was determined by using ellipsometry to characterize the coatings. Table 15 also depicts the initial properties of the ITO coating. The initial roughness for the 3 A and 5/4 wave coatings are 7.4 and 11.5 nm, respectively. These values are relatively high. The samples were ion milled with a single beam (38 cm long beam) running at 270 mA current and 3000 volts with argon feed at 20 seem and the operating pressure in the chamber was 2.5 mT. The ion beam is a closed drift Hall-effect anode layer type design.
  • the line speed for the 2B (two beam equivalent at 30 ipm) case was 15 ipm and the line speed for the 4B (four beam equivalent at 30 ipm) was 7.5 ipm.
  • the beam was oriented perpendicular to the surface of the coated glass.
  • the ion beam removed about 17 nm/beam equivalent at 30 ipm for the 3 A wave ITO and about 11.1 nm/ beam equivalent at 30 ipm.
  • the surface roughness drops dramatically in both cases with the 3 A wave ITO getting nearly perfectly smooth.
  • the 5/4 wave ITO did not get as smooth, however, because it started from a much more rough initial state it may require a slower line speed or additional beams to attain the minimal roughness values.
  • Table 16b Cell data comparing ion milled parts properties
  • the coating is Glass/ITO/Cr/Ru.
  • the chrome and ruthenium are masked internal to the epoxy seal and the ITO is used to transfer electric current from the electrodes to the EC element interior.
  • the ITO has some degree of roughness which is reduced by treatment with an ion beam.
  • Figure 38 shows decreased roughness with inverse line speed at fixed beam current.
  • the line speed for the glass through the coater was 30 inches per minute (ipm).
  • ipm inches per minute
  • a single ion beam was used and the current was adjusted to vary the ion milling rate.
  • Fig. 39 depicts the increase in reflectance versus beam current.
  • a reflectance increase of 0.5% is attained with even this modest ion milling condition.
  • the ITO coating maintained its initial roughness to potentially facilitate increased adhesion of the ITO to the epoxy in the area of the seal while milling the ITO in the viewing area to attain improved optical properties.
  • the color and reflectance of a so- called chrome ring type coating was investigated.
  • a multi-layer metal coating is applied on top of an ITO coating that is on glass.
  • the ITO coated glass was ion etched in a ring around an element to thin the ITO coating in this location to improve the color and reflectance of the chrome ring stack while enabling lower sheet resistance of the thicker ITO in the center of the part.
  • FIG. 40 depicts the reflectance of different conditions when viewed through the glass.
  • the reflectance without ion milling is depicted as the bold line.
  • the reflectance with several different line speeds are also depicted. As the speed is reduced, the residence time under the beam is increased and the roughness is reduced. This results in an increase in reflectance. The reflectance appears to plateau, however, there was some arcing of the beam during these tests which may have affected the results. The key result is that with ion milling, even in the presence of arcing, the reflectance is increased.
  • Fig. 38 depicts the change in ITO roughness in these tests versus line speed under conditions without arcing.
  • Fig. 42 depicts the reflectance versus inverse line speed for an ion beam treatment of a chrome layer prior to the application of the Ruthenium layer.
  • the beam current was set to about 250 mA.
  • the coating attains its maximum reflectance of almost 70.5%. Further reductions in the line speed did not result in additional increases in reflectance. If faster line speeds are desired then additional beams may be employed.
  • Fig. 43 depicts how reducing the amount of Ruthenium may be used in the coating due to the smoothing effect of the ion beam.
  • the line speed was at about 2.1 ipm and the beam current was comparable to the results in Fig. 42.
  • As little as 160 angstroms of Ruthenium may be used to net the maximum reflectivity. This results in substantial cost savings relative to the baseline case where extra Ruthenium was used to compensate for the roughness of the initial layers.
  • a 1.5 ohm/sq coating of chrome and ruthenium with relatively high reflectance may not have even been practical without ion beam smoothing.
  • the chrome layer is smooth or has been smoothed by an ion beam then this thickness demonstrates the optimal reflectance case.
  • Table 17 depicts the results of calculations where the thickness of the ruthenium is compared to the total thickness. The contribution of the roughness is considered to be the average of the 10 and 20% cases.
  • the percentage of the stack that is ruthenium varies with the target sheet resistance of the stack and with the bulk resistance of the chrome or base layer. It is desirable that the ruthenium or other high reflectance metal to be less than 50% of the total thickness if the sheet resistance is greater than or equal to 6 ohm/sq. If the sheet resistance of the stack is approximately 2 ohms/sq then the ruthenium thickness should be less than about 25% of the total thickness.
  • the thickness percentage of the high reflectance layer will also vary with the bulk reflectance of this metal and the reflectance target.
  • the appropriate high reflectance percentage of total thickness is a function of the desired reflectance of the stack, the desired sheet resistance of the stack and the bulk resistance of the different materials being used to construct the stack.
  • the percentage of the high reflectance material should be less than 50% of the total thickness, preferable less than 25%, more preferably less than 15%, even more preferably less than 10% and most preferably less than 7.5% of the total thickness.
  • chrome and ruthenium are used to demonstrate the benefits of one embodiment of the present invention. Other metals can be substituted for the chrome layer as a means to provide the majority of the sheet resistance.
  • the so-called high reflectance metal is defined as a metal that is of higher reflectance relative to the layer that is contributing to the majority of the sheet resistance.
  • the electrical conduction layer or layers may have an unacceptable color or hue.
  • the reflectance intensity may be acceptable but the reflected color may be considered objectionable.
  • the top most, high reflectance layer may in fact function not to increase the reflectance but rather to provide an acceptable color.
  • the electrical conduction layer may be highly colored and a neutral reflected color is preferred. In this case the so called high reflectance layer would act to make the color more neutral.
  • the electrical conduction layer may have a neutral reflected color and a highly colored reflectance is preferred.
  • high reflectance metal may be selected to provide a non-neutral appearance.
  • a multi-layer stack may be applied over the electrical conduction layer such that the stack attains low sheet resistance while having the flexibility to adjust color via adjustments to the multi-layer stack placed above the electrical conduction layer.
  • the multi-layer stack could consist of metals, dielectric layers, and/or semi-conductor layers. The selection of the materials comprising the stack, their thicknesses, orientation relative to the electrical conduction layer and neighboring medium will be determined by the design criteria of a given application.
  • the thickness must be increased and thus the surface roughness is increased and the reflectance is decreased.
  • the reflectance of the coating then will drop to a low value relative to the Theoretical Maximum value.
  • the techniques described herein will allow one to attain a reflectance greater than 90% of the Theoretical Maximum and preferably greater than about 95% of the Theoretical Maximum.
  • the techniques described herein will allow one to attain a reflectance greater than 80% of the Theoretical Maximum and preferably greater than about 85% of the Theoretical Maximum, more preferably greater than about 90% of the Theoretical Maximum, and most preferably greater than about 95% of the Theoretical Maximum.
  • the techniques described herein will allow one to attain a reflectance greater than 75% of the Theoretical Maximum and preferably greater than about 85% of the Theoretical Maximum, more preferably greater than about 90% of the Theoretical Maximum, and most preferably greater than about 95% of the Theoretical Maximum.
  • the techniques described herein will allow one to attain a reflectance greater than 70% of the Theoretical Maximum and preferably greater than about 80% of the Theoretical Maximum, more preferably greater than about 90% of the Theoretical Maximum, and most preferably greater than about 95% of the Theoretical Maximum.
  • the thickness of the high reflectance metal may also be simply increased to also reduce the light transmittance but the high reflectance metals are often relatively expensive and the sole use of these materials would result in a higher price of the coating.
  • the ITO layer may be any transparent conducting oxide or other transparent electrode.
  • the transparent conducting oxide or transparent electrode may consist of a single layer or multilayer.
  • the layers in a multilayer may be selected to modify the reflected color or appearance such that the "ring" has the appropriate optical properties.
  • One such multilayer may include the use of color suppression layers placed between the glass substrate and the transparent conducting oxide. The use of this layer leads to more selections of color for the ring as the ITO layer thickness is adjusted.
  • Adhesion layer may be chrome, Ni, NiCr, of various compositions, Ti, Si, or silicon alloys, or other suitable adhesion enhancement layer.
  • the "high reflectance metals" are selected from metals and alloys that have bulk reflectance values that are higher than chrome.
  • Example metals include aluminum, ruthenium, rhodium, iridium, palladium, platinum, cadmium, copper, cobalt, silver, gold and alloys of these materials. In addition to alloys, mixtures of these metals with each other or with other metals may be employed. Multi-layers may also be used in place of the single layer shown in the schematic for the high reflectance metal.
  • the UV blocking layer may consist of a single material, alloy, multi-layer or other combination which results in the appropriate reduction of transmittance.
  • the adhesion of materials, layer or coatings may also be improved by use of the ion beam treatment described herein.
  • ion beam treatment of an ITO surface was performed using argon and then a mixture of argon and oxygen. These tests were compared to non-ion milled surfaces.
  • the samples were attached to a test piece of glass by an epoxy material to form a sealed cavity. A hole was drilled in the top lite of glass and the cavity is pressurized to determine the pressure value necessary for the cavity to fail. Failure mode may include cohesive failure within the epoxy, adhesion of the epoxy to the coatings, facture of the glass or the coating may de-adhere from the substrate or there may be intra-coating adhesion failures.
  • the ITO surface was either ion beam treated with argon, argon/oxygen mixture or had no treatment.
  • the surface was then coated with a thin layer of chrome about 50 angstroms thick followed by a ruthenium layer approximately 500 angstroms thick (so called Beta Ring).
  • the coated glass was bonded to another piece of glass with an epoxy typically used in EC elements and the epoxy was then cured.
  • Table 18 depicts the pressure values at failure and the amount of metal lift from the ITO coating.
  • the control parts have trace amounts of metal lift.
  • the argon beamed parts had substantial lift of metals but the pressures at failure were essentially the same.
  • the use of oxygen had again similar pressure values at failure but the lift of metals from the ITO was eliminated.
  • the oxygen improves the adhesion of chrome to the ITO.
  • the ion beam will preferentially sputter oxygen which is a component which helps the adhesion of chrome.
  • the argon only case results in a minimization of critical oxygen and a weaker bond. Adding oxygen into the beam, it is believed, "heals" the ITO surface thus strengthening the bond and minimizing the metal lift.
  • the pressure values at failure do not show a correlation because the glass is fracturing during the test. This fracturing determines the pressure value at failure and thus dominates the test.
  • the oxygen is necessary but there may be situations where other gases may be preferable or argon alone may be the better choice.
  • Table 18 Pressure values at failure and amount of metal lift from ITO coating.
  • a top layer which may be used in some applications, may be an electrical conduction stabilizing material. Its role is to provide good electrical conduction between the ring metals and the bus bar or silver paste.
  • the material may be selected from the platinum group metals such as iridium, osmium, palladium, platinum, rhodium and ruthenium. Mixtures or alloys of these metals with each other or with other suitable metals may be used.
  • the thickness and selection of the materials in the layers are preferably selected to provide the appropriate color and reflectance intensity as taught in the referenced patent application.
  • the thickness of the layers should also be selected to attain the necessary transmittance properties.
  • the visible transmittance should be set so that the epoxy seal is not visible when viewed.
  • the visible transmittance should be less than 5%, preferably less than 2.5%, even more preferably less than 1% and most preferably less than about 0.5%.
  • the UV transmittance may or may not correlate exactly with the visible transmittance. In the case of the UV transmittance the appearance of the ring is not the issue but rather the protection of the seal is the principle concern. This of course presumes that the selected seal is sensitive to UV light.
  • the amount of allowable UV light is dependent on how susceptible the seal is to the UV light.
  • the coating should be designed such that the ring coating is opaque to UV light but unfortunately this level of UV transmittance may be cost prohibitive. Additionally, the adhesion of the layers may be compromised if the total thickness becomes too large. The stresses which may be present in the layers would result in a strain large enough to cause the layers to delaminate from the glass or other layers of the coating. For this reason one needs to contemplate a finite amount of UV transmittance.
  • the UV transmittance should be less than about 1 %, preferable less than 0.5%, more preferably less than 0.1% and most preferably less than 0.05%.
  • the exterior mirror to display features such as turn signals, heater on/off indicators, door ajar warnings or warning to oncoming traffic that a door may be about to open.
  • the mirror or mirror housing is also being used to house puddle or approach lighting.
  • the requirements are unique for an inside mirror when compared with a mirror for outside the vehicle.
  • the specular reflectance of an inside mirror is preferably 60% or higher and preferably has ample transmittance in front of the display to pass an adequate amount of light through the associated mirror element.
  • an inside mirror does not have to withstand the harsh chemicals and environmental challenges encountered in an outside mirror application.
  • One challenge is to balance the need to meet automotive specifications for a rearview mirror and the desire to incorporate an aesthetically pleasing information center.
  • Providing high mirror element light transmittance is one means to compensate for limited light output display technologies. Often times high transmittance results in circuitry and other hardware behind the mirror element being visible.
  • An opacifier layer may be applied on the fourth surface of the mirror element to combat this problem.
  • a supplemental turn signal as depicted in Fig. 5a is one example of a display feature desirable in an outside mirror assembly.
  • One way to incorporate a signal feature behind an electrochromic mirror element is to laser ablate some of the reflective material from the element to allow light to pass through.
  • a desire to offer alternative styling and designs is motivation for employing transflective mirror element technologies.
  • the transflective approaches of some embodiments of the present invention allow features in the mirror with a much more "stealthy" (covert) appearance. Stealthy allows light to pass through the transflective element while blocking the view of the source of the light. Stealthy may also or alternatively mean that there is minimal contrast between the display area and the main reflective area.
  • ruthenium is often used in outside EC applications because of its relatively high reflectance and environmental durability.
  • a 23 nm Ru coating as the reflector in an EC element would have a reflectance of approximately 57.5% a level that would meet most commercial mirror reflectance specifications.
  • This coating would have a sheet resistance of approximately 20 ohms/sq and the EC element would have a transmittance of approximately 2.5%. Neither the transmittance nor the sheet resistance is viable for practical applications.
  • Other environmentally durable metals may have slightly different reflectance, transmittance and sheet resistance values but none will have the properties to meet the requirements in an EC application.
  • a lower reflectivity requirement for OEC elements enables use of different configurations of materials including silver, silver alloys, chrome, rhodium, ruthenium, rhenium, palladium, platinum, indium, silicon, semiconductors, molybdenum, nickel, nickel-chrome, gold and alloy combinations for the associated reflective and, or, transflective layer(s) stacks with fewer difficulties in meeting the preferred reflectance, durability and electrochromic performance characteristics.
  • Some of these materials have an advantage over silver or silver alloys in that silver and silver alloys are susceptible to damage in an outside mirror environment. Use of harder metals is advantageous for durability of the mirror element in terms of manufacturing options and a more robust final product.
  • Reflective and, or, transflective stacks may also be created with dielectric materials which produce high enough reflectance levels for use in an OEC element.
  • Ag based materials will generally gain approximately 1 % transmittance for every percent of reflectance reduction in the mid-visible range.
  • An advantage associated with increased transmission is the ability to utilize lower cost, lower light output light sources, such as, displays or LED's.
  • the outside mirror has typically been used for indication type displays that generally use LED's that can be ordered with very high light outputs.
  • Novel designs are disclosed herein that enable the use of Ag based transflective coatings in inside and outside mirror applications. These novel designs preserve the unique optical properties and benefits derived from the Ag layer while simultaneously addressing the limitations for using Ag based materials in outside applications.
  • TCO Transparent Conductive Oxide
  • ITO Indium Tin Oxide
  • TCO Indium Tin Oxide
  • Other TCO materials include F:SnO2, Sb:SnO2, Doped ZnO, IZO, etc.
  • the TCO layer is overcoated with a metal coating that may consist of a single metal or alloy or a multilayer metal coating. The use of multiple metal layers may be needed, for instance, to facilitate adhesion between different materials.
  • a semiconductor layer may be added in addition or in lieu of the metal layers. The semiconductor layer provides some unique properties that will be discussed below.
  • the roughness issue can be solved by either modifying the deposition process for the ITO and/or implementing ion beam smoothing after the ITO deposition and before the deposition of subsequent layers. Both methods were discussed above in detail.
  • improved ITO materials discussed above may be employed in this embodiment to lower the sheet resistance of the overall transflective coating.
  • the semiconductor layer may comprise Silicon or doped silicon.
  • Small amounts of an additional element or elements may be added to alter the physical or optical properties of the Silicon to facilitate its use in different embodiments.
  • the benefit of a semiconductor layer is that it enhances the reflectivity with less absorption compared to a metal.
  • Another benefit of many semiconductor materials is that they have a relatively low band gap. This equates to an appreciable amount of absorption in the blue to green wavelengths of the visible spectrum.
  • the preferential absorption of one or more bands of light lends the coating to have relatively pure transmitted color.
  • the high transmitted color purity equates to having certain portions of the visible or near infrared spectra with transmittance values greater than 1.5 times the transmittance of the lower transmitting regions.
  • the transmittance in the high transmitting region will be greater than 2 times the transmittance in the low transmitting region and most preferably greater than 4 times the transmittance in the low transmitting region.
  • the transmitted color of the transflective stack should have a C* value [sqrt(a* 2 +b* 2 )] greater than about 8, preferably greater than about 12 and most preferably greater than about 16.
  • Other semiconductor materials that result in transflective coatings with relatively high purity transmitted color include SiGe, InSb, InP, InGa, InAIAs 1 InAI, InGaAs, HgTe, Ge, GaSb, AISb, GaAs and AIGaAs.
  • Other semiconductor materials that would be viable would be those that have a band gap energy at or below about 3.5 eV.
  • a material such as Ge or an SiGe mixture may be preferred.
  • Ge has a smaller band gap compared to Si and this results in a greater wavelength range that have relatively low transmittance levels. This can be preferred because the lower transmittance at wavelengths different from the display are more effective at hiding any features behind the mirror. If a uniform transmittance is needed then it would be advantageous to select a semiconductor material that has a relatively high band gap.
  • a display area may be stealthy in nature such that an observer may not perceive that the mirror has a display until the display it is activated or back lit.
  • Stealthyness is achieved when the reflectivity of the display area is relatively similar to the remaining viewing area and the color or hue contrast is minimal. This feature is very advantageous because the display area does not reduce the viewing area of the mirror as discussed above.
  • a small amount of transmitted light can make features behind the mirror visible such as circuit boards, LED arrays, shrouds and heater terminals.
  • Use of a light blocking (opacifying) layer may be used to avoid this problem.
  • An opaque layer is often applied on the fourth surface of the mirror using a variety of materials such as paints, inks, plastics, foams, metals or metal foils. The challenge of applying this layer is complicated in an outside mirror. Most outside mirrors have a convex or aspheric shape which makes application of a film or coating more difficult.
  • An opacifying layer may be incorporated into the third surface stack of the element.
  • the transflective area may be masked and an appropriate stack such as ruthenium, rhodium or other single or multi-layer stack (metals, metal/dielectrics and or dielectrics) which provide the appropriate reflectance and color (opaqueness) may be applied over the remaining surface.
  • an appropriate stack such as ruthenium, rhodium or other single or multi-layer stack (metals, metal/dielectrics and or dielectrics) which provide the appropriate reflectance and color (opaqueness) may be applied over the remaining surface.
  • the stealthy appearance is achieved when desired color and reflectance match or mismatches are maintained.
  • the display area and the main viewing area of the mirror element are virtually indistinguishable. In other embodiments one may want the transflective area to have a different color with an aesthetically pleasing contrast.
  • Another option is to maintain high transmittance levels in one part of the visible spectrum with low overall transmittance to obtain a stealthy appearance.
  • Use of a narrow spectral band pass filter may also be employed to obtain the stealthy effect.
  • Inserting a relatively opaque layer (whether of the same material or one different than those in adjacent layers) into an otherwise transflective third surface coating stack maybe be incorporated to help hide electronics that are behind the mirror element in without, or in addition to, use of a coating or tape or other opacifying material on the rear surface of the element. Addition of this layer may affect the reflectance in the area where it is inserted. Reflectance in this area might then be adjusted, through choice of materials and their thicknesses, such that the difference between A display area and the relatively opaque areas of the mirror element are hardly noticeable, thereby preserving the unity of the appearance of the device.
  • a conductive material is used to add opacity the conductivity of the relatively opaque portion of the display is now greater and there is a correspondingly smaller voltage drop across the majority of the viewing area providing a faster coloring speed.
  • Additional opacifying layer(s) may be such that the reflectivity from the back of that area is substantially less than without the opacifying layer(s), thereby, lessening the effect of multiple reflections that may otherwise occur from stray light.
  • One such device demonstrating the aforementioned principles includes a third surface coating stack of approximately 400 angstroms TjO 2 followed by 200 angstroms of ITO over substantially all of the entirety of the third surface followed by approximately 90 angstroms of chrome except for an area roughly over the display followed by approximately 320 angstroms of 7% gold 93% silver alloy over substantially the entire third surface.
  • intensity adjustments may be made to compensate for any spectral bias from the coatings and, of, the activated electrochromic medium.
  • the intensity adjustment may be a function of the operating voltage of the device, and or, other feedback mechanism to match the relative RGB intensities appropriately for a given point in the color excursion of the electrochromic element.
  • dyes such as those that might be used to create a "blue mirror" even when the electrochromic species are not active, the intensity of the emitters may be adjusted to have improved color rendering.
  • any spectral bias of first and /or second surface coatings will become more of a factor; the degree of compensation of the intensities of the different colors of the display may correspondingly be adjusted.
  • UV absorbers and other additives to the EC medium may also affect the visible absorption of the element intensity adjustments may be incorporated to improve color rendering of an associated display.
  • transflective coating it may be advantageous to design a transflective coating for both displays and signal or other indicator applications.
  • the transmittance spectra of the transflector may be biased to accentuate the transmittance in this region.
  • An RGB display with equal intensities in the red, green and blue parts of the spectrum would have different intensities after passing through the transflective layer (and other components of the mirror element). This offset in intensities may then be correspondingly compensated by adjusting the output of the individual RGB colors to get proper color rendering.
  • the reflectance match between the opaque and display areas is more desirable than the example in Tables 19 and 20. Additionally, there may be benefits for having the reflectance match at a range of different reflectance values. In this manner, the transmittance of the display area may be adjusted without compromising the reflectance match between the opaque viewing area and the display areas.
  • Another design objective is to have the color either match in the viewing and display areas or to be different in an aesthetically pleasing fashion. A color match may be beneficial when the least perceptible difference between the two areas is desired. In other circumstances it may be beneficial to have a reflectance match but a color mismatch to help guide the viewer to where the display is located.
  • the thickness of the chrome and AgAu7x were optimized so that the reflectance match was relatively close while still having a relatively low transmittance.
  • the change in reflectance and transmitta ⁇ ce as a function of the chrome and AgAu 7x thickness is shown in Table 21.
  • the data in Table 21 is modeled data for an Electrochromic element consisting of the identified stack, 0.14 microns of EC fluid, and a top plate with a Yz wave of ITO coating on the 2 nd surface.
  • the reflectance difference between the opaque and display areas are lower when the chrome layer is relatively thin and/or when the AgAu 7x layer is relatively thick. This approach provides for a means to make a mirror with an opaque area and a display with a fairly good match in certain transmittance and reflectance ranges.
  • a means is desirable to attain a reflectance match over a broad range of desired reflectance values while maintaining opacity in the viewing area and higher transmittance in the display area. This is attained in at least one embodiment by adding an additional layer to the stack described in the example of Table 21.
  • This preferred third surface stack is TiO2/ITO/AgAu7x/Cr/AgAu7x. .
  • the chrome layer is masked in the area of the display while the other layers may be present over substantially the entire surface or, at a minimum, in the area of the display.
  • This example uses a TiO2/ITO net quarter wave bi-layer (the so- called GTR3 base layer) to neutralize the color of the transflective silver or silver alloy layer in the area of the display.
  • Other transflective color neutralization layers may be substituted in the display area and are within the scope of this embodiment.
  • the chrome layer which splits the AgAu7x layer has the novel property in this application of not only providing an opaque character for the stack but it also optically isolates the lower layers from the top AgAu7x layer.
  • Fig. 46 shows how the reflectance varies with the thickness of the chrome layer.
  • the thin chrome layer effectively isolates the bottom silver gold alloy layer from contributing to the reflectance.
  • This isolation results with such a thjn layer of chrome which allows the chrome thickness to be tuned to attain a range of transmittance values while not having any applicable effect on the overall reflectance of the stack.
  • One benefit of this approach extends to the display area. Since only a thin chrome layer is needed to isolate the bottom AgAu7x layer from contributing to the reflectance the thickness of the bottom AgAu 7x layer may be varied to attain other design goals. For example, the desire to have the reflectance match in the opaque area and in the display area as previously expressed may be achieved.
  • a transflective mirror element has regions of relatively high transmittance and low transmittance
  • the term "opaque" is meant to indicate that the transmittance level is sufficiently low to hide the appearance of components behind the fourth surface without the addition of opacifying materials on the fourth surface.
  • the transmittance should be less than 5%, preferably less than 2.5% and even more preferably less than 1 % and most preferably less than 0.5%. Since the AgAu7x is isolated in the opaque area, the thickness may be adjusted as needed to attain the desired reflectance in the display area. The AgAu7x top layer will have a higher reflectivity when it is deposited onto Cr versus T ⁇ O2/ITO (as present in the display area).
  • the bottom AgAu7x thickness may be set such that the display area matches the reflectance of the opaque area.
  • the reflectance value for the mirror element may be as low as the reflectance value of the chrome layer alone up to the reflectance of a thick AgAu7x layer.
  • the reflectance can be tuned to any desired value over this range and the transmittance can be adjusted as well. A desirable reflectance match between the display area and the viewing area is also attainable.
  • the silver containing layers may be other alloys or combinations of alloys aside from 7%Au93%Ag.
  • the transflective area where the silver layers no longer have one or more intervening opacifying layers will likely become after processing or time, an alloy that is the weighted average of the upper and lower alloys. For example if silver-palladium alloy were used as the upper silver bearing layer and silver-gold alloy for the lower layer, then the transflective region would likely become a silver-gold-palladium ternary alloy layer. Similarly if equal thicknesses of 7% gold in silver and 13% gold in silver were used as the two silver bearing layers, the resulting layer in the transflective region would likely be a layer with essentially uniform distribution of gold at 10% in silver.
  • the opacifying layer may be separate layers combined in the transflective region where one, or both or all layers might not contain silver.
  • silver alloy over silicon may be employed in the transflective region, or ruthenium over silicon, among many possible combinations.
  • the transmittance attainable in the "opaque" area is dependent on both the silver based layer and the chrome or "opacifying" layer.
  • the chrome layer can be thinned to a desired level to approach the transmittance of the display area. It is often difficult to control the thickness of a very thin layer if higher transmittance levels are needed. Thicker layers may be used if the metal opacifying layer is partially oxidized. A thicker layer may be needed to attain the higher transmittance relative to a thin pure metal layer. Fig.
  • Fig. 47 depicts the relationship between transmittance and reflectance for the stacks from Table 21 above and the case of using a CrOx layer as the opacifying layer.
  • Fig. 47 depicts transmittance versus reflectance for different opacifying layers and thicknesses.
  • the symbols in the chart represent different thickness AgAu7x layers. The thicker layers are to the right and the thinner layers are to the left.
  • the reflectance approaches the value of the chrome or opacifying layer.
  • the thickness of the opacifying layer will affect the low end reflectance of the mirror element. For instance, when the Cr layer is 10 nm thick the low end reflectance is 41.7%, 20 nm it is 50.5% and 30 nm it is 52.7%.
  • the low end reflectance approaches a constant value as the opacifying layer is increased in thickness however, for thin layers there will be a drop in reflectance when the layer gets too thin. This can be an advantage or disadvantage depending on the design criteria for a given application.
  • the limitations between reflectance and transmittance for a chrome layer can be overcome by replacing the chrome layer entirely with a different material or by adding additional layers.
  • a base layer below the reflector is taught which may be a conductive metal, metal oxide, metal nitride or alloy. There may also be an intermediate layer or layers between the base layer and the reflective material. These metals and materials may be selected such that there are no galvanic reactions between the layers and/or to improve adhesion to the substrate and to the reflector or other layer(s). These layers may be deposited on the substrate or there may be additional layers below the previously mentioned base layers that provide additional desirable characteristics. For example, a dielectric pair comprising TiO2 and ITO with an effective odd quarter wave optical thickness may be present. The thickness of the TiO2 and ITO layers may be adjusted as needed to meet specific conductivity and optical requirements.
  • a metal layer When a metal layer is deposited under the silver comprising layer it may be selected from the group consisting of chromium, stainless steel, silicon, titanium, nickel, molybdenum, and alloys of chromium/molybdenum/nickel, nickel/chromium, molybdenum, and nickel-based alloys, Inconel, indium, palladium, osmium, tungsten, rhenium, iridium, molybdenum, rhodium, ruthenium, stainless steel, silicon, tantalum, titanium, copper, nickel, gold, platinum, and alloys whose constituents are primarily those aforementioned materials, any other platinum group metals, and mixtures thereof.
  • the layer under the reflector layer may be an oxide or metal oxide layer such as chromium oxide and zinc oxide.
  • An optional metal layer over the silver comprising layer may be chosen from the group consisting of rhodium, ruthenium, palladium, platinum, nickel, tungsten, tantalum, stainless steel, gold, molybdenum or their alloys.
  • the present disclosure contemplates opacifying layers in conjunction with transflective portions of the mirror or optical element. This presents new or additional design criteria be included which affect the selection of metals which act to reduce the transmittance in certain areas of the element or mirror.
  • Table 22 shows the reflectance and color of various suitable base or opacifying layer metals on a T ⁇ O2/ITO dielectric layer stack in an EC cell. The thickness of ail of the metal layers is 30 nm. The color and reflectance will vary with the thickness of the metal layers. Table 22 depicts the relative differences in color and reflectivity of various suitable metal opacifying layers on the low end reflectance when the opacifying metal is relatively thick and the AgAu7x or other Ag comprising top layer is absent.
  • alloys of these metals with each other or with other metals will have differing optical properties. In some cases the alloys will behave as do mixtures of the individual metals, however in other cases the alloys do not have reflective properties which are simply the interpolation of the individual metals.
  • the metals or alloys can be selected for their galvanic properties, reflectivity, color or other properties as needed. In silver containing reflective layer stack's the reflectivity and color will vary when deposited onto these different metals or alloys. Table 23 depicts metal containing stacks with 20 nm of AgAu7x on top. The color and reflectance of the 20 nm Ag containing layer stack is altered by the properties of the metal used as with the opacifying layer.
  • the transmittance of the different stacks is also shown. As shown above for chrome, the transmittance, reflectance and color can be altered by changing the thickness of the opacifying metal. It is clear from these examples that a desired color, transmittance and reflectivity may be attained by altering the properties of the opacifying metal layer or layers. Table 22: Reflectance and color of various metals in an EC cell on top of a T ⁇ O2/ITO base layer system.
  • Table 23 Reflectance and color of various metals and AgAu 7x in an EC cell on top of a TiO2/ITO base layer system.
  • the ability to color and reflectance tune in the viewing area may be further augmented or enhanced by combining the metal opacifying layers with dielectric layers additionally described in the US patent 6,700,692.
  • the dielectric layers may modify both the color and reflectance, often without having a substantial effect on the absorption in the stack.
  • the previously described bi-layer base layer under the silver containing reflecting layer may be employed. Table 24 depicts how the reflectance and color varies with changes to the ITO and TiO2 thickness for a fixed AgAu 7x layer. As can be seen the thickness of the bi-layers not only affects the reflectance, but, the color can also be tuned.
  • the adjustability of the color and reflectance may be further expanded by adjusting the thickness of the AgAu7x, or silver containing reflecting layer. Additional color and reflectance changes may be obtained by adding additional dielectric or metal layers as part of the display stack either above or below the silver containing layer or by changing the refractive indices of the dielectric layers.
  • Table 24 Color and reflectance changes with variations in the TiO2 and ITO thickness of the base layer in the display area for a fixed silver containing layer thickness.
  • a color and/or a reflectance match may be achieved by adjusting the layers in the display area.
  • layers can be applied over substantially the entire surface, however because of the unique optical shielding properties of the opacifying layer or layers, these lower layers do not contribute to the reflectance and color in the viewing or opaque area but are fully functional in the display area where the opacifying layer or layers are masked.
  • the present invention is not limited to having the layers which function in the display area cover the entire part. This is particularly applicable to layers under the opacifying layer. These layers may be deposited as necessary only in the general area of the display should the manufacturing process warrants this approach.
  • the reflector and or transflector could be bluish in reflected hue. It could also be advantageous to combine an opaque bluish reflector region and a bluish transflective region in the same element for a stealthy appearance.
  • a coating stack made and used in such a fashion had color values shown in Table 25 and a reflectance spectrum shown in Fig. 53.
  • Table 25 and Fig. 53 show values when the coating is on a single lite of glass and after incorporation into an EC element.
  • a reflective stack of approximately 40nm of TiO2, 20nm of ITO, 14 nm Silver, 50nm Chrome, 10nm Silver and 90nm ITO models as being similar in hue and brightness to the same stack without the Chrome layer. Without the chrome layer the transmission of the stack is calculated as being adequate for use as a display or light sensor region. Therefore one could mask the chrome during the deposition of that layer and make an electrochromic element with similar bluish hue and brightness (i.e. stealthy) in both the opaque and transflective portions of the device.
  • Another feature beneficial in the area of display windows and transflective coatings is an anti-reflection feature from the reverse direction.
  • Often displays put out a substantial amount of stray light which bounces or scatters around the back of the mirror element and eventually make its way out in the area of the display.
  • This stray light can be reduced. Attaining lower reflectance without additional layers on the fourth surface has the added benefit of reduced cost.
  • Cr/TiC ⁇ /ITO/AgAuZx/Cr/AgAuTx is provided in the opaque or viewing area while having TiO2/ITO/AgAu7x/AgAu7x in the display area.
  • the first chrome layer is thin, about 2 to 15 nm thick, preferable about 5-10 nm thick and is masked in the display area.
  • the second chrome is also masked in the display area and its thickness is adjusted to get the desired transmittance in the viewing area.
  • the TiO2/ITO bi layer covers the entire surface and is adjusted to get the anti-reflectance effect from the reverse direction in the viewing area while providing the proper color in the display area from the front of the part.
  • Table 26 depicts the reflectance from the reverse direction, or from the fourth surface.
  • the first case is the reference case. This is the stack described above for the opaque or viewing area of the mirror element. As can seen the reflectance from the back is quite high at about 61%.
  • a thin chrome layer ( ⁇ 5nm) is added below the dielectric layers. The addition of this thin layer in the viewing area reduces the reflectance to approximately 6% at 10 fold decrease in intensity. In this manner the scattering of any stray light will be reduced.
  • This reflectance value, and its color, may be adjusted by the thickness of the chrome layer and the dielectric layers. Approximately 4% of the 6.2% reflectance arises from the uncoated fourth surface of the glass.
  • the amount of reflectance reduction and its absolute value are dependent on the properties of the first silver containing layer and the subsequent chrome layer. As described above these layers are adjusted to tune not only the transmittance but also the reflectance toward the viewer. As these layers are adjusted to meet varying design goals or targets, the dielectric layers and/or the base chrome layer may be adjusted to achieve the optimal anti-reflection effects.
  • chrome may be used as the anti- reflection layer.
  • Materials such as tungsten, chrome, tantalum, zirconium, vanadium and other similar metals will also provide a broad anti-reflection property.
  • Other metals may result in a higher, more colored reflectance.
  • the chrome or other metal layer may be doped with small amounts of oxygen or nitrogen to alter the optical properties of the metal to adjust the anti- reflection properties.
  • materials of higher index such as transparent conductive oxides
  • titanium dioxide is used as a relatively high index material coupled with indium tin oxide as a relatively low index material benefits are obtained optically and electrically.
  • titianium dioxide is a relatively high index of refraction material that is not a sufficiently good insulator at optical thicknesses to isolate more conductive thin films placed above or below it such as ITO, another TCO or a metal or semimetal layer or layers.
  • TjO 2 When TjO 2 is applied as an optical thin film between layers that are much more conductive, such as Indium Tin Oxide, the T 1 O 2 will not insulate the ITO layers from one another in an electrochromic element and the desired optical effect of a high-low-high stack is achieved. In other words, most of the cumulative conductivity benefits of the total thickness of ITO in the thin film is retained along with obtaining the optical benefits of the high and low index layers.
  • Base layers B approximately 40 nm titanium dioxide under approximately 20 nm ITO with sheet resistance between about 110 and 150 ohms / square.
  • Base layers C Base layer A + base layers B with a sheet resistance of approximately 16 ohms / square (the lower than expected sheet resistance may be due to the fact that capping the ITO layer of A before vacuum break and cooling may have enhanced the conductivity compared with layer A alone).
  • Base layers D approximately 42.5 nm titanium dioxide, 42.5nm ITO, 42.5 nm titanium dioxide, 42.5nm ITO with a sheet resistance of about 40 ohms / square.
  • Fig. 54a depicts the reflectance spectra of these base layers on glass in air (without additional coatings and prior to assembly into electrochromic elements).
  • a color and reflectivity match between the viewing area and the display area may be desired.
  • the reflectance of the two areas may be adjusted to be substantially the same. After lay up, when the medium in contact with the metals changes from air to that of the EC fluid the reflectivity may be different in the two areas. This is because each stack interacts with the new incident medium in different ways.
  • Ruthenium as the top layer in one design (Glass/TiO2 45nm/ITO 18nm/Ru14nm) and AgAu7x in another (Glass/T ⁇ O245nm/ITO 18nm/AgAu7x19nm) both are adjusted to have a reflectance as single of 70.3% then when assembled into an element the Ru side will drop to 56.6% reflectance while the AgAu7x side will drop to 58.3%.
  • TiO2 40nm/ITO 18nm/Cr 25nm/AgAu7x 9nm has a reflectance of 77.5% as a single and 65.5% when assembled in an element while T ⁇ O240nm/ITO 18nm/AgAu7x 23.4nm has a reflectance of 77.5% as a single and 66% when assembled in an element.
  • the difference in this case is not as dramatic as the earlier example, however it shows that even buried layers can influence the reflectance drop going from a single to an element. This is to illustrate that when reflectance matches are desired in an element a reflectance mismatch may be needed for the coatings as singles.
  • an EC element consisting of 40nmTiO2/18nm
  • ITO/EC fluid/140nm ITO/Glass having a reflectance of 8.1%.
  • a 5 nm Ruthenium layer is deposited on the fourth surface to simulate a display behind the mirror (i.e. 5nm Ru/Glass/40nmTiO2/18nm ITO/EC fluid/ITO/Glass) the reflectance rises to 22.4%.
  • An EC element consisting of Glass/40 ⁇ mTiO2/18nm ITO/22nm AgAu7x/EC fluid/ITO/Glass has a reflectance of 61.7%.
  • the stack with the 5 nm of Ruthenium has a reflectance of 63.5% - approximately a 2% increase in reflectance. This amount of reflectance is quite perceptible by the viewer.
  • the relative reflectance may be adjusted in the two areas to compensate for the transmitted light component. Therefore, to achieve a net 2 percent brighter area in the display section of the mirror either preferentially increase the reflectance in the viewing area or decrease the reflectance in the display area. The amount of adjustment is dependent on the particular circumstances of the system.
  • Example 1a the third surface of a 2.2mm glass substrate is coated with approximately 400A TiO 2 followed by approximately 180A of ITO and finally with approximately 195A of silver-gold alloy (93% silver/7% gold by weight).
  • the titanium dioxide and ITO are preferably applied substantially to the edge of the glass and the silver alloy is preferably masked inboard of at least the outboard side of the associated seal.
  • the second surface comprises a Yz wave (HW) layer of ITO.
  • HW Yz wave
  • the associated element reflectance and transmission model is illustrated Figs. 48a and 48b, lines 4801a and 4801b respectively.
  • the model reflection is approximately 57% @ approximately 550nm and transmittance is approximately 36.7%.
  • Example 1b This Example is configured similar to Example 1a except with a chrome/metal tab along at least a portion of a perimeter area of the third surface extending beneath the seal to improve the conductivity between an associated clip contact area and the silver alloy. The appearance remains the same however, the darkening speed is improved.
  • This feature may be applied to a number of the following examples to improve electrical conductivity from the third surface to the associated electrical contacts. As can be seen from Figs. 48a and 48b, the reflectance associated with the element of Example 1 a while the transmission of each is dramatically different; this represents one of the advantages of the present invention.
  • Example 1c is configured similar to Example 1a, however, a display area is initially masked and a stack consisting of Cr/Ru is deposited over substantially the entire surface, subsequent to removing the mask (i.e. resulting in only the Cr/Ru on the glass in the display area.
  • the Cr/Ru opacifying stack may be replaced by a number of combinations.
  • the reflectance and transmission results are depicted in Figs. 48a and 48b by lines 4802a and 4802b, respectively.
  • the opacifying stack preferably has a low contrast for both reflectivity and color, relative the display area.
  • Another advantage in this example is that the metals generally used in the opacifying layer may extend to the edge of the glass to bridge between an associated electrical connection clip and the third surface silver-gold alloy.
  • the model reflection is approximately 56.9% @ approximately 550nm in the viewing area and approximately 57% reflection in the display region with transmittance ⁇ 10, ⁇ 5% preferred, ⁇ 1% even more preferred, and ⁇ 0.1% most preferred design goal (this applies to all comparable designs) in the viewing area and transmittance in the display region of approximately36.7%.
  • a light sensor may be located behind the "display area" in addition to, or in lieu of, a display or other light source.
  • Example 2a the third surface of a mirror element is coated with approximately 2000A of ITO followed by approximately 50% transmission chrome and finally with approximately 170A of silver-gold alloy.
  • the ITO and chrome are coated substantially to the edge of the glass and the silver alloy is masked inboard of at least the outboard side of the seal.
  • the Cr thickness is preferably adjusted so that the ITO plus Cr layer measures 50% transmittance through the back plate only.
  • the second surface preferably comprises a HWITO layer.
  • the reflectance and transmission of the element is illustrated in Figs. 49a-49d lines 4901a and 4901b respectively.
  • the Cr layer may be adjusted (thicker or thinner) to adjust the final transmittance of the transflective element.
  • Example 2b is similar to Example 2a except with chrome/ruthenium combination stack coated to obtain a transmittance of 50% when measuring the back plate only (i.e. prior to incorporation in a mirror element).
  • Ru layer provides improved stability during curing of the epoxy seal.
  • the ratio of the Ru and chrome thickness may be adjusted and there is some design latitude.
  • Chrome is incorporated primarily to improve the Ru adherence to the ITO.
  • the Ru has preferred bonding to the Ag or Ag alloy.
  • Other metal or metals may be placed between the Cr and Ru layers so long as the proper material and physical properties are maintained.
  • the reflectance and transmission characteristics are depicted in Fig. 49c, lines 4901c and 4902c, respectively.
  • Example 2c is similar to- Examples 2a and 2b except a display area is initially masked and a Cr/Ru (or other opacifier) layer deposited over substantially the entire third surface subsequent to removing the mask. Transmission and reflectance results are illustrated in Figs. 49a and 49b, lines 4902a and 4902b, respectively. The associated advantages are similar to those of Example 1c.
  • Example 3a [0271] In this Example, the third surface of an EC element is coated approximately
  • This Example is similar to example 1a, the TiO2 and ITO are coated substantially to the edge of the glass and the silver is masked inboard of at least the outboard side of the seal and a layer of Indium-Zinc-Oxide (IZO) or other TCO is subsequently applied over the silver as a protective barrier from the EC fluid.
  • the IZO/TCO layer may extend substantially to the edge of the glass.
  • the second surface preferably comprises a HWITO layer.
  • the element reflectivity and transmission is illustrated in Figs. 50a and 50b, lines 5001a and 5001b, respectively.
  • the model reflection is approximately 57% @ approximately 550nm and the transmittance is approximately 36%.
  • Example 3b is configured similar to Example 3a except a display area is masked and a stack consisting of Cr/Ru is deposited over substantially the entire unmasked area of the third surface.
  • the Cr/Ru opacifying stack may be replaced by a number of combinations of materials.
  • the reflectance and transmission results are depicted in figs. 50a and 50b by lines 5002a and 5002b, respectively.
  • An advantage in this example is that the metals generally used in the opacifying layer may extend substantially to the edge of the glass and provide a bridge between an associated electrical contact clip and the silver alloy.
  • Related reflectance and transmission measured data is depicted in Fig. 50c, lines 5001c. 5002c, respectively.
  • Example 4a the third surface of an EC element is coated with approximately 2100A of ITO followed by approximately 225A of silicon and finally with approximately 7 ⁇ A of Ru or Rh. [0275] All of the layers may be coated substantially to the edge of the glass.
  • the glass may be processed in sheets and cut subsequently into singles for incorporation into a mirror element.
  • the Ru or Rh layer may be replaced by one of several highly reflective metals or alloys.
  • the second surface is preferably coated with HWITO.
  • HWITO This example illustrates the advantage of increased transmittance at different wavelengths.
  • the base ITO layer may be replaced having layers with different thicknesses.
  • it is preferred that the ITO is an odd multiple of % wave. In these cases the reflectance will be slightly enhanced by the ITO. This effect is diminished somewhat as the ITO gets thicker. The benefit of the thicker ITO is generally lower sheet resistance which will result in faster element darkening times.
  • the model reflection is approximately 57% i@ approximately 550nm and the transmittance is approximately 11.4%.
  • Example 5 The modeled reflectance and transmission is depicted in Figs. 51a and 51b, respectively.
  • the measured reflectance and transmission is depicted in Fig. 51c, lines 5101c, 5102c, respectively.
  • Example 5 [0276] In this Example, the third surface of an EC element is coated with approximately 2100A of ITO followed by approximately 5 ⁇ A of chrome followed by approximately 75A of Ru and finally, optionally, with approximately 77A of Rh. [0277] All of the layers may be coated substantially to the edge of the glass or the glass may be processed in sheets and subsequently cut into singles for inco ⁇ oration into mirror elements.
  • the Ru layer may be replaced by one of several highly reflective metals or alloys or additional layer(s) may be added such as rhodium.
  • the metal layers may be adjusted to obtain a higher or lower reflectivity/transmittance balance.
  • the second surface is preferably coated with a HWITO layer.
  • One benefit of the thicker ITO is lower sheet resistance which will result in faster element darkening times.
  • Thicker ITO may increase the third surface stack roughness which may result in lower reflectivity. This effect is observed when comparing the model transmission and reflectance of Figs. 52a and 52b, respectively to the transmission and reflectance obtained from the. experiments (lines 5201c1 and 5201c2, respectively of Fig. 52c).
  • the model reflection is approximately 57% @ approximately 550nm and the transmittance is approximately 7.4%.
  • Example 6a Opacifier layer on third surface [0278]
  • an opacifier layer is incorporated into the third surface coating stack.
  • a base layer stack of approximately 600A of chrome followed by approximately 600A of ITO is deposited onto a glass substrate either with a display area masked during the deposition process of the base layer stack or the base layer stack is subsequently laser deleted in the display area.
  • Subsequently layers of approximately 7O ⁇ A of ITO and (approximately 18 ⁇ A of silver-alloy Ag-X where X indicates the option for an alloy of Ag) are applied. This approach is substantially opaque in the viewing area and transflective in the display area.
  • the alloy may be masked relatively far away from the seal to improve the life of the element in harsh environments.
  • the model reflection is approximately 52% @ approximately 550nm and the transmittance is approximately 41%.
  • Example 6b is similar to Example 6a.
  • the third surface is initially coated with a base layer stack of approximately 600A of chrome followed by approximately 100A of ITO followed by approximately 500A of Tj ⁇ 2 and finally by approximately 5 ⁇ A chrome other than in a display area.
  • Substantially the entire third surface is subsequently coated with approximately 150A of Tj ⁇ 2 followed by approximately 500A of ITO and finally by approximately 18 ⁇ A of silver-gold alloy.
  • the model reflection is approximately 54% @ approximately 550nm and the transmittance is approximately 41%.
  • An electrochromic mirror may have limited reflectance (R) if a high transmittance (T) level is desired or alternatively limited transmittance if high reflectivity is required.
  • a transition in the metal layer thickness is gradual in manner.
  • a gradual change in reflectance and or transmittance in a transition region is more difficult for the human eye to detect.
  • Two regions still have distinct reflectance and transmittance values, however, the boundary between the two regions is graded.
  • the gradation eliminates the abrupt discontinuity and replaces it with a gradual transition.
  • the human eye is not as drawn to the interface when it is graded.
  • the grade may be linear, curvilinear or other forms of transition illustrated in Figs. 56b-56d.
  • the distance over which the grade takes place may vary.
  • the distance is a function of the reflectance difference between the two regions. When the reflectance between the two regions is relatively low, the distance of the grading may be relatively short. When the reflectance difference is large, a longer grade may be desired to minimize visibility of the transition.
  • length of the grade is a function of the application and intended use, observers, lighting, etc.
  • the transmittance may be reduced to near zero in one or more portions.
  • the reflectance may be the same or different in other cases described herein.
  • the "stealthy" embodiments described elsewhere herein may be employed to keep the reflectance relatively constant while allowing the transmittance to be tuned in various portions of the mirror element as desired.
  • the present invention is not limited to having two or more regions of constant transmittance or reflectance.
  • Region B has a relatively low transmittance that may be zero. This may be desired if one of the design goals is to have region B block the light coming from objects placed behind the transflective coated substrate.
  • the coating stack may have a gradual transition from region B via grade C.
  • Region A may have another gradient within itself. There are potential benefits to this that will be discussed below.
  • the grade between the two zones may take on various forms. In the broadest sense an element may comprise regions of distinct and uniform transmittance and reflectance. In the examples shown in Figs. 57a-57c, there are not regions of constant reflectance and transmittance. These cases have a gradual and continuous change in optical properties. Advantages to this approach are illustrated in Fig. 58.
  • the transmittance through the glass will vary by about 6%.
  • having a graded transflective coating in the region of the display may compensate somewhat for this effect and therefore can result in a more equal perceived light intensity across the display.
  • a graded transition zone may be used for a display such as a rear camera or a traditional compass temperature display.
  • a so called “split Ag” stack is provided where an opacifying layer is placed between two Ag layers to help match the appearance between the areas of transflective and opaque properties.
  • an Ag layer is placed above an opacifying layer. Both of these embodiments may benefit from a graded transition between the regions.
  • the opacifying layer or Ag layer or all layers may be graded. In at least one embodiment the opacifying layer may be graded to minimize the abruptness of the transition between the regions.
  • Fig. 59 illustrates an example of an electrochromic mirror construction having a back plate 5914 of glass, layer 5972 including a sub layer of titanium dioxide of approximately 44 ⁇ A and a sub layer of ITO of about 200A, a layer 5978 of 6Au94Ag where one region has a thicknesses of about 140A another region has a thickness of about 235A, and a third region between the first two regions where the thickness gradually transitions between the two, an electrochromic fluid/gel 5925 having a thickness of approximately 140 microns, a layer 5928 of approximately 1400A of ITO, and a glass plate 5912 of 2.1 mm.
  • the resulting reflectance of the element ranges from about 63% in the majority of the mirror to about 44% in the area in front of the display.
  • Figs. 60 and 61 depict the corresponding reflectance data as a function of the position on a mirror. A display is placed behind the region of low reflectance, high transmittance in this instance.
  • Another application of graded transitions is in electrochromic elements having a second surface reflector that hides the epoxy seal; a reflectance and color match between the "ring" and the reflector positioned on the third or fourth surfaces may be achieved.
  • the best match is when the reflected intensity of the ring matches the reflector reflected intensity.
  • the reflectance of the reflector is further increased while not altering the ring. This may occur because of durability, manufacturing or other considerations.
  • a means to maintain the match between the reflector and the ring may be obtained when the reflectance of the reflector is graded as discussed above.
  • the reflectance of the reflector may be tuned to match the reflectance of the ring near the ring and then gradually increase moving away from the ring. In this manner the reflectance in the center of the viewing area is relatively high, as seen in Fig. 62.
  • the ITO may be gradually changed from the ring area to the center of the viewing area to preserve the thickness range necessary for acceptable color while allowing a relatively high reflectance in the center of the element. In this manner, the mirror will darken relatively quickly compared to the case where the ITO coating is relatively thin across the element.
  • grading may be employed such that the sheet resistance of the coating varies gradually with position. This method compliments various bus configurations and results in faster and more uniform darkening.
  • Fig. 63 illustrates an embodiment of a mirror element in accordance with the state of the art prior to the present invention.

Abstract

Electro-optic elements are becoming commonplace in a number of vehicular and architectural applications. Various electro-optic element configurations provide variable transmittance and or variable reflectance for windows and mirrors. The present invention relates to various thin-film coatings, electro-optic elements and assemblies incorporating these elements.
PCT/US2007/005494 2006-03-03 2007-03-02 Improved thin-film coatings, electro-optic elements and assemblies incorporating these elements WO2007100921A2 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
KR1020127005055A KR101275450B1 (ko) 2006-03-03 2007-03-02 개선된 박막 코팅, 전기 광학 요소 및 이들 요소를 포함하는 어셈블리
KR1020087024293A KR101278371B1 (ko) 2006-03-03 2007-03-02 개선된 박막 코팅, 전기 광학 요소 및 이들 요소를 포함하는 어셈블리
MX2008011009A MX2008011009A (es) 2006-03-03 2007-03-02 Revestimientos de pelicula delgada mejorados, elementos electro-opticos y ensambles que incorporan estos elementos.
CA2644218A CA2644218C (fr) 2006-03-03 2007-03-02 Revetements a couche mince ameliores, elements electro-optiques et ensembles comprenant ces elements
CN2007800076526A CN101395521B (zh) 2006-03-03 2007-03-02 改进的薄膜涂层、光电元件和包含这些元件的组件
EP07752210A EP2035886A4 (fr) 2006-03-03 2007-03-02 Revetements ameliores a couches minces, elements electrooptiques et assemblages incluant ces elements
JP2008558324A JP5570730B2 (ja) 2006-03-03 2007-03-02 改良薄膜コーティング、電気光学要素、及びこれらの要素を組み込んだアセンブリ

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US77936906P 2006-03-03 2006-03-03
US60/779,369 2006-03-03
US81092106P 2006-06-05 2006-06-05
US60/810,921 2006-06-05
US87347406P 2006-12-07 2006-12-07
US60/873,474 2006-12-07
US88868607P 2007-02-07 2007-02-07
US60/888,686 2007-02-07

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CA2644218C (fr) 2014-12-02
CN103838050A (zh) 2014-06-04
CN101976009B (zh) 2015-07-22
KR101278371B1 (ko) 2013-06-25
EP2035886A2 (fr) 2009-03-18
CA2644218A1 (fr) 2007-09-07
EP2035886A4 (fr) 2010-11-03
JP5570730B2 (ja) 2014-08-13
JP5855623B2 (ja) 2016-02-09
KR20080106963A (ko) 2008-12-09
CN103838050B (zh) 2017-04-26
JP2014029556A (ja) 2014-02-13
CN101976009A (zh) 2011-02-16
WO2007100921A3 (fr) 2008-05-08
KR20120035222A (ko) 2012-04-13
MX2008011009A (es) 2008-09-05
JP2009529150A (ja) 2009-08-13

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