WO2007061097A1 - Element optique, procede pour sa fabrication, et affichage a cristaux liquides - Google Patents

Element optique, procede pour sa fabrication, et affichage a cristaux liquides Download PDF

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Publication number
WO2007061097A1
WO2007061097A1 PCT/JP2006/323612 JP2006323612W WO2007061097A1 WO 2007061097 A1 WO2007061097 A1 WO 2007061097A1 JP 2006323612 W JP2006323612 W JP 2006323612W WO 2007061097 A1 WO2007061097 A1 WO 2007061097A1
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WIPO (PCT)
Prior art keywords
dark color
color separation
separation wall
substrate
optical element
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PCT/JP2006/323612
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English (en)
Japanese (ja)
Inventor
Takeshi Ando
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Fujifilm Corporation
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Publication of WO2007061097A1 publication Critical patent/WO2007061097A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Definitions

  • the present invention relates to an optical element such as a color filter constituting a liquid crystal display device used in a color television, a monitor for a personal computer, or the like, and an electorium luminescence element for full color display having a plurality of light emitting layers,
  • the present invention also relates to a manufacturing method thereof and a liquid crystal display device including the same.
  • Color filters for display devices are generally arranged in a rectangular pattern such as red, green, and blue on a substrate such as glass, and a dark color separation wall such as a black matrix between the arranged images. It has a structure separated and separated by.
  • a substrate such as glass is used as a support, and 1) a dyeing method, 2) a printing method, 3) application of a colored photosensitive resin solution and its exposure, Colored photosensitive resin solution method that repeats development [colored resist method] (see, for example, Patent Document 1), 4) Method of sequentially transferring an image formed on a temporary support onto a final or temporary support (example) For example, see Patent Document 2), 5) A colored layer is formed by applying a pre-colored photosensitive resin solution onto a temporary support, and the photosensitive colored layer is sequentially transferred directly onto the substrate for exposure.
  • a method of forming a multicolor image by a method of repeating the image formation by the number of hues or the like [transfer method] for example, see Patent Document 3 is known.
  • An electoluminescence device has a structure in which a thin film containing a fluorescent inorganic and organic compound is sandwiched between a cathode and an anode, and electrons and holes are injected into the thin film for recombination.
  • a fluorescent material used for such an electroluminescence device can be applied to a substrate on which an element such as a TFT is formed by an ink jet method to form a light emitting layer, whereby the element can be configured.
  • the method of applying a droplet such as an ink jet method is a method of applying a droplet when manufacturing a force optical element that is applied to the manufacture of an optical element such as a color filter or an electroluminescent device. Problems specific to the application method include white spots and mixed colors in the image.
  • the parent ink may be used so that the contact angle between the dark color separation walls (the region surrounded by the dark color separation walls) is 20 ° or less with respect to water.
  • Patent Document 1 JP-A 63-298304
  • Patent Document 2 JP-A-61-99103
  • Patent Document 3 Japanese Patent Laid-Open No. 61-99102
  • Patent Document 4 Japanese Patent Laid-Open No. 9-203803
  • Patent Document 5 Japanese Patent Laid-Open No. 2001-343518
  • Patent Document 6 Japanese Patent Laid-Open No. 2001-235618
  • an optical element free from white spots in an image and color mixing between adjacent pixels a liquid crystal display device using the same, and an optical element free from white color in an image and color mixing between adjacent pixels
  • a method of manufacturing an optical element that can provide a stable and simple method.
  • a first aspect of the present invention includes at least a plurality of pixels on the substrate and a dark color separation wall that separates the pixels, and the following (a), (b), and (c) An optical element that satisfies at least
  • the pixel is formed by a method of applying droplets of a colored liquid composition between the dark color separation walls formed on the substrate.
  • the dark color separation wall has a layer formed using a photosensitive resin composition on a temporary support, and a photosensitive transfer material is laminated on the substrate, and the layer is interposed via the temporary support.
  • a second aspect of the present invention is a method for producing the above-described optical element, comprising at least a step of forming a layer using a photosensitive resin composition on a substrate, The layer is exposed to a pattern via a temporary support to form a dark color separation wall, and the color liquid composition is formed in the recesses between the formed dark color separation walls (the recesses surrounded by the separation wall). And a step of applying a liquid droplet to form a pixel.
  • a third aspect of the present invention is a liquid crystal display device including the optical element.
  • An optical element of the present invention is an optical element having at least a plurality of pixels and a dark color separation wall that separates the plurality of pixels on a substrate, and at least the following (a), (b) And (c) is satisfied.
  • the dark color separation wall has a layer formed using a photosensitive resin composition on a temporary support, and a photosensitive transfer material is laminated on the substrate, and the layer is interposed via the temporary support.
  • each of the pixels of the optical element is a pixel at a corner portion where the inner angle of the pixel portion when observed in the thickness direction from the pixel forming surface side of the substrate is less than 180 °.
  • a dark color separation wall separating the pixels from each other, the radius of curvature of the boundary line is 0.5 ⁇ m or more. It is possible to effectively prevent white spots from occurring in an image when a droplet is applied.
  • exposure of the photosensitive resin composition (layer) constituting the dark color separation wall is performed with the temporary support remaining, so that oxygen is not supplied to the photosensitive resin composition. Therefore, the curing reaction by light is carried out satisfactorily and color mixing at the time of applying the colored liquid composition can be effectively prevented.
  • White spots are a liquid droplet (hereinafter sometimes simply referred to as “ink”) mainly formed from a colored liquid composition that is sufficiently and uniformly diffused into a pixel area surrounded by a dark color separation wall. This is a failure that occurs due to the inability to correct, and causes display defects such as color unevenness and reduced contrast.
  • Figure 1 is a diagram conceptually showing the occurrence of white spots.
  • the cause of white spots will be described with reference to FIG.
  • a photo resist using resist is generally used.
  • the sol-gel process is used, and various components contained in the resist may cause contaminants to adhere to the surface of the substrate 31 and hinder the diffusion of the ink 36.
  • the shape of the opening of the dark color separation wall 33 is complicated in order to protect the TFT from external light and to obtain a bright display by increasing the aperture ratio.
  • the ink 36 is sufficiently diffused in the corners to form areas 38 that are clearly white as shown in Fig. 1. Produce.
  • color mixing is a failure that occurs when ink is mixed between adjacent pixels (colored portions) of different colors, and similarly causes display defects such as color unevenness and reduced contrast. .
  • the amount of ink filled in the recesses between the dark color separation walls is usually made uniform, so that When ink flows into the contact-emitting layer, the amount of ink becomes non-uniform and is recognized as luminance unevenness.
  • the ink is sufficiently diffused in the area surrounded by the dark color separation wall, sufficient light emission luminance cannot be obtained at the boundary between the light emitting layer and the dark color separation wall. Even in such a case, according to the present invention, it is possible to effectively suppress white spots and color mixture between adjacent pixels.
  • the ink mixture between adjacent light emitting layers is referred to as “mixed color”
  • the ink at the boundary between the light emitting layer and the dark color separation wall Occurrence of light emission luminance unevenness due to the repulsion of is described as “outline”.
  • the plurality of pixels of the optical element of the present invention are separated by dark color separation walls provided between the pixels, and the pixel formation of the substrate is formed among the boundaries between the dark color separation walls and the adjacent pixels.
  • the corner (the corner of the pixel according to the present invention) whose inner angle is less than 180 ° is the angle on the pixel area side of the optical element (the straight portion does not include the curved shape).
  • the angle is less than 180 °, and the shape is not particularly limited except that the radius of curvature is 0.5 m or more.
  • 2 to 4 show examples of corners (pixel corners according to the present invention) whose inner angle is less than 180 °.
  • the observation in the thickness direction of the pixel formation surface side of the substrate is not only when observing the formed dark color separation wall and the boundary line on the outermost surface of the pixel, but also with the dark color separation wall and This includes a case where the pixel is cut in a direction perpendicular to the thickness direction and the boundary line at the cut surface is observed in the thickness direction of the substrate.
  • the radius of curvature is adjusted by adjusting the radius of curvature of the portion of the mask used for exposure corresponding to the corner portion (corner portion of the pixel according to the present invention) whose inner angle is less than 180 °. Therefore, the above range can be controlled.
  • the radius of curvature of the dark separation wall is 0.5 m or more.
  • the upper limit of the radius of curvature is not particularly limited from the standpoint that droplets are likely to spread out. However, if the radius of curvature is too large, the curvature radius is preferably 10,000 m or less from the viewpoint of being unable to form a dark color separation wall Z pixel pattern.
  • the radius of curvature of the dark color separation wall is preferably 1.0 m or more, more preferably 2.0 m or more, and 3.0 m or more. Especially preferred
  • the dark color separation wall of the optical element of the present invention has a layer (hereinafter sometimes referred to as “photosensitive resin layer”) made of a photosensitive resin composition on a temporary support. It is formed by laminating a photosensitive transfer material having a substrate on a substrate to form a laminate, and exposing the photosensitive resin layer through the temporary support without removing the temporary support from the laminate. is there.
  • photosensitive resin layer made of a photosensitive resin composition on a temporary support. It is formed by laminating a photosensitive transfer material having a substrate on a substrate to form a laminate, and exposing the photosensitive resin layer through the temporary support without removing the temporary support from the laminate. is there.
  • the photosensitive resin layer is formed using a photosensitive resin composition, and is preferably formed using a photosensitive resin composition that contains a colorant and is color-toned.
  • the dark-toned photosensitive resin composition is a coloring composition having a high optical density, and the optical density is preferably 2.5 or more, and 2.5 to: LO. 0 is more preferable, 2. 5 to 6.0 is more preferred, 3. 0 to 5.0 force is particularly preferred! / ⁇ .
  • the photosensitive resin composition is preferably photocurable using an initiation system described later, and the optical density with respect to the exposure wavelength (generally the ultraviolet region) is also important. That is, the value is preferably 2.0 to: LO. 0 force, more preferably 2.5 to 6.0, and most preferably 3.0 to 5.0.
  • the optical density is 2.0 or more, the dark color separation wall shape can be changed to a desired shape.
  • the optical density is 10.0 or less, the polymerization reaction can be started and the formation of the dark color separation wall is easy. It is.
  • the optical density is measured by forming a layer on a transparent substrate using a photosensitive resin composition, exposing and developing the transmission optical density (OD), and measuring the transmission optical density (OD) with a spectrophotometer UV-2100.
  • OD transmission optical density
  • UV-2100 a spectrophotometer
  • the photosensitive resin composition in the present invention preferably comprises at least a colorant, and can generally be constituted by using a solvent, and if necessary, a resin component, an initiation system, a monomer, a surface activity. It can comprise using other components, such as an agent.
  • pigments including organic pigments and inorganic pigments
  • dyes and the like can be suitably used.
  • the photosensitive resin layer is made light-shielding, light-shielding agents such as carbon black, titanium oxide, iron tetroxide etc., metal oxide powder, metal sulfide powder, metal powder, etc., red, blue, green etc. A mixture of these pigments can be used.
  • the pigment is uniformly dispersed in the photosensitive resin composition.
  • the ratio of the colorant in the solid content of the photosensitive resin composition is preferably 30 to 70% by mass, more preferably 40 to 60% by mass from the viewpoint of shortening the development time 50 to 50%. More preferred is 55% by weight.
  • Specific examples of the known dyes and pigments include the color materials described in paragraph numbers [0038] to [0040] of JP-A-2005-17716 and the paragraphs of JP-A-2005-361447.
  • Preferable examples include pigments described in numbers [0068] to [0072] and colorants described in paragraph numbers [0080] to [0088] of JP-A-2005-17521.
  • the black colorant examples include carbon black, titanium carbon, iron oxide, titanium oxide, graphite, and the like. Among these, carbon black is preferable.
  • a pigment When a pigment is used, it is desirable to use it as a dispersion.
  • This dispersion can be prepared by adding and dispersing a composition obtained by previously mixing a pigment and a pigment dispersant in an organic solvent (or vehicle) described later.
  • the vehicle is a part of a medium that disperses a pigment when the paint is in a liquid state, a part that is liquid and binds to the pigment and hardens the coating film (binder), and dissolves and dilutes the medium.
  • Component organic solvent
  • the disperser used for dispersing the pigment is not particularly limited.
  • Encyclopedia of Pigments (Asakura Kunizo, 1st edition, page 438, Asakura Shoten (2000)) And known dispersers such as Ader, Rhono Reminore, Atridor, Super Minore, Disorno, Homomixer, Sand Mill, etc.
  • fine grinding may be performed using frictional force by mechanical grinding described on page 310 of “Encyclopedia of Pigments”.
  • the number average particle diameter of the colorant is preferably 0.001 to 0.1 ⁇ m, and more preferably 0.01 to 0.08 m. Those are preferred. When the number average particle size exceeds 0 .: m, the polarization may be canceled by the colorant and the contrast may be lowered.
  • Particle size refers to the diameter of particles in an electron micrograph image represented by a circle of the same area, and “number average particle size” refers to the particle size of 100 particles. The average value.
  • the photosensitive resin composition in the present invention preferably comprises a resin component (binder, resin, polymer, etc.), an initiation system, and a monomer in addition to the colorant. If necessary, it may further contain known additives such as plasticizers, fillers, stabilizers, polymerization inhibitors, surfactants, solvents, adhesion promoters, and the like. Furthermore, it is preferable that the photosensitive resin composition is thermoplastic which is preferably softened or tacky at a temperature of at least 150 ° C. or less. From this point of view, it can be modified by adding a compatible plasticizer.
  • a polymer having a polar group such as a carboxylic acid group or a carboxylic acid group in the side chain is preferable.
  • a polymer having a polar group such as a carboxylic acid group or a carboxylic acid group in the side chain
  • examples thereof include JP-A-59-44615, JP-B-54-34327, JP-B-58-12577, JP-B-54-25957, JP-A-59-53836, and As described in JP-A-59-71048, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partial ester oxalic maleic acid copolymer A coalescence etc. can be mentioned.
  • the cellulose derivative which has a carboxylic acid group in a side chain can also be mentioned.
  • polymers obtained by adding a cyclic acid anhydride to a polymer having a hydroxyl group can also be preferably used.
  • Particularly preferred examples include a copolymer of benzyl (meth) acrylate and (meth) acrylic acid described in US Pat. No. 4,139,391, benzyl (meth) acrylate and (meth) acrylic acid, Mention may be made of multi-component copolymers with other monomers. These polar groups The binder polymer may be used alone or as a composition used in combination with an ordinary film-forming polymer.
  • a heat initiation system using a thermal polymerization initiator or a photoinitiation system using a photopolymerization initiator is generally used, but a photoinitiation system is preferred in the present invention. .
  • a photoinitiating system is a compound capable of generating an active species that initiates the polymerization reaction of a monomer, which will be described later, upon irradiation with radiation such as visible light, ultraviolet light, far ultraviolet light, electron beam, or X-ray (also called exposure). Yes, it can be appropriately selected from known photopolymerization initiators or photopolymerization initiator systems.
  • torino, romethyl group-containing compounds include atalidine compounds, acetophenone compounds, biimidazole compounds, triazine compounds, benzoin compounds, benzophenone compounds, ⁇ -diketones.
  • a triazine compound, a trihalomethyl group-containing compound such as a trihalomethyloxadiazo compound described in US Pat. No. 4,212,976;
  • At least one selected from trino, romethyl group-containing compound, atalidine compound, acetophenone compound, biimidazole compound, and triazine compound is preferred. It is preferable to contain at least one selected from methyl group-containing compounds and atalidine compounds. Torino, romethyl group-containing compounds, and ataridin-based compounds are useful because they are versatile and inexpensive.
  • trihalomethyl group-containing compound is 2 trichloromethyl.
  • the triazine compound is 6- [p- (N, N bis (ethoxycarbomethyl) amino) phenol] -2,4 bis (trichloromethyl) s -triazine, and the benzophenone
  • the compound is Michler's ketone, and the biimidazole compound is 2, 2′-bis (2,4 dichroic phenol) 4, 4 ′, 5, 5′-tetraphenyl 1, 2 '—Biimidazole.
  • the initiation system may be used alone or in combination of two or more.
  • the total amount in the photosensitive resin composition of the starting system is preferably 0.1 to 20% by mass of the total solid content (mass) of the photosensitive resin composition. Particularly preferred. When the total amount is 0.1% by mass or more, the photocuring efficiency of the composition is good, and exposure is not required for a long time. The image pattern is not lost or the pattern surface is not easily roughened.
  • the initiation system may be used in combination with a hydrogen donor.
  • the hydrogen donor is preferably a mercabtan compound or an amine compound as defined below from the viewpoint that sensitivity can be further improved.
  • the term “hydrogen donor” as used herein refers to a compound that can donate a hydrogen atom to a radical generated from the initiation system by exposure.
  • the mercabtan compound has a benzene ring or a heterocyclic ring as a mother nucleus, and is directly connected to the mother nucleus.
  • a compound having 1 or more, preferably 1 to 3, and more preferably 1 to 2 mercapto groups bonded to each other hereinafter referred to as “mercapbutane-based hydrogen donor”.
  • the amine compound is a compound having a benzene ring or a heterocyclic ring as a mother nucleus and having 1 or more, preferably 1 to 3, more preferably 1 to 2, amino groups directly bonded to the mother nucleus. (Hereinafter referred to as “amine-based hydrogen donor”). These hydrogen donors may have a mercapto group and an amino group at the same time.
  • mercaptan-based hydrogen donor examples include 2 mercaptobenzozoazole, 2 mercaptobenzoxazole, 2 mercaptobenzozoimidazole, 2, 5 dimethylcapto 1, 3, 4-thiadiazole, 2 mercapto 2, 5 And dimethylaminopyridine.
  • 2-mercaptobenzothiazole and 2-mercaptobenzothazole are preferred, especially 2-mercaptobenzothiazole!
  • amine-based hydrogen donor examples include 4,4 ′ bis (dimethylamino) benzophenone, 4,4′-bis (jetylamino) benzophenone, 4-jetylaminoacetophenone, 4-dimethylaminopropione.
  • 4,4'-bis (dimethylamino) benzophenone and 4,4'-bis (jetylamino) benzophenone are preferred, and 4,4'-bis (jetylamino) benzophenone is particularly preferred.
  • the hydrogen donor can be used singly or in combination of two or more, and the formed image is difficult to fall off on the permanent support during development, and also has strength and sensitivity. In view of improvement, it is preferable to use one or more mercaptan hydrogen donors in combination with one or more amine hydrogen donors.
  • Specific examples of the combination of the mercabtan-based hydrogen donor and the amine-based hydrogen donor include 2 mercaptobenzothiazole Z4,4'-bis (dimethylamino) benzophenone, 2-mercaptobenzothiazole Z4,4'-bis (Jetylamino) benzophenone, 2 mercaptobenzoxazole Z4,4'-bis (dimethylamino) benzophenone, 2mercaptobenzoxazole Z4,4'-bis (jetylamino) benzophenone, and the like.
  • a more preferred combination is 2 mercaptobenzothiazole / 4,4'-bis (jetyl Amino) benzophenone, 2 mercaptobenzoxazole Z4,4′-bis (jetylamino) benzophenone, and a particularly preferred combination is 2-mercaptobenzothiazole / 4,4′bis (jetylamino) benzophenone.
  • the mass ratio of the mercabtan hydrogen donor (M) to the amine amine donor (A) (M: A)
  • M: A mass ratio of the mercabtan hydrogen donor
  • 1: 1 to 1: 4 is preferred, and 1: 1 to 1: 3 is more preferred.
  • the total amount of the hydrogen donor in the photosensitive resin composition is preferably 0.1 to 20% by mass of the total solid content (mass) of the photosensitive resin composition, and preferably 0.5 to 10% by mass. Particularly preferred.
  • Monomers include monofunctional monomers and polyfunctional monomers, and polyfunctional monomers are preferable.
  • the following compounds are preferably used alone or in combination with other monomers.
  • t-butyl (meth) acrylate ethylene glycol di (meth) acrylate, 2-hydroxypropyl (meth) acrylate, triethylene glycol di (meth) acrylate, trimethylolpropane Tri (meth) atarylate, 2-ethylyl 2-butyloop mouth Pandiol di (meth) atarylate, pentaerythritol tri (meth) atarylate, pentaerythritol tetra (meth) atarylate, dipentaerythritol hexa (meth) talylate, Dipentaerythritol penta (meth) acrylate, polyoxyethylated trimethylol propane pantri (meth) acrylate, tris (2- (meth) attayllooxychetyl) isocyanurate, 1,4-diisopropylbenzene, 1 , 4-Dihydroxyben Di (
  • compounds having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, polyethylene glycol mono (meth) acrylate, hexamethylene diisocyanate, toluene Reactants with diisocyanates such as isocyanates and xylene diisocyanates can also be used.
  • pentaerythritol tetraatalylate dipentaether.
  • the content of the monomer in the photosensitive resin composition is preferably 5 to 80% by mass, preferably 10 to 70% by mass, based on the total solid content (mass) of the photosensitive resin composition. Particularly preferred.
  • the content is less than 5% by mass, the resistance to an alkali developer in the exposed portion of the composition may be inferior.
  • the content exceeds 80% by mass the photosensitive resin composition is obtained. The tackiness will increase and handling may be inferior.
  • the photosensitive resin composition of the present invention can generally be prepared using an organic solvent in addition to the above components.
  • organic solvents include methyl ethyl ketone, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, cyclohexanol, methyl isobutyl ketone, ethyl lactate, methyl lactate, strength prolatatum, etc. be able to.
  • the photosensitive resin composition is applied onto a substrate or a temporary support constituting a photosensitive transfer material using, for example, a slit-like nozzle described later.
  • the film thickness can be controlled to be uniform and uneven coating can be effectively prevented.
  • Suitable surfactants include those described in JP-A-2003-337424 and JP-A-11-133600.
  • the surfactant content with respect to the total solid content of the photosensitive resin composition is generally 0.001 to 1% by mass, preferably 0.01 to 0.5% by mass. ⁇ 0.3% by weight is particularly preferred.
  • the photosensitive resin composition can contain an ultraviolet absorber as necessary.
  • the ultraviolet absorber include salicylate-based, benzophenone-based, benzotriazole-based, cyanoacrylate-based, nickel chelate-based, and hindered amine-based compounds in addition to the compounds described in JP-A-5-72724.
  • the content of the UV absorber relative to the total solid content of the photosensitive resin composition is generally 0.5 to 15% by mass, preferably 1 to 12% by mass. 1.2 to 10% by mass Is particularly preferred.
  • the photosensitive resin composition further contains a thermal polymerization inhibitor.
  • thermal polymerization inhibitors include hydroquinone, hydroquinone monomethyl ether, p-methoxyphenol, di-t-butinole p-cresol, pyrogallol, t-butinorecatechol, benzoquinone, 4, 4'-thiobis (3-methyl 6-t Butylphenol), 2,2'-methylenebis (4-methyl-6t-butylphenol), 2 mercaptobenzimidazole, phenothiazine and the like.
  • the photosensitive resin composition of the present invention may contain "adhesion aid" described in JP-A-11-133600, other additives, and the like. [0059] ⁇ Board ⁇
  • the substrate (permanent support) constituting the optical element a metallic support, a metal bonded support, glass, ceramic, a synthetic resin film, or the like can be used. Particularly preferred are glass and synthetic resin film which are transparent and have good dimensional stability.
  • the optical element of the present invention was formed by forming a layer using the photosensitive resin composition on the substrate (hereinafter sometimes referred to as "photosensitive layer forming step”).
  • the method for producing an optical element of the present invention comprising at least a step of forming a pixel by applying droplets of a colored liquid composition to the recesses between the walls (hereinafter sometimes referred to as a “pixel formation step”) can be produced.
  • the dark color separation wall in the present invention was specifically formed on the temporary support using the photosensitive resin composition by the photosensitive layer forming step and the separation wall forming step.
  • a photosensitive transfer material having a layer (hereinafter also referred to as a “dark color photosensitive resin layer”) is laminated on the substrate so that the dark color photosensitive resin layer is in contact with the layer, and the layer is then formed on the substrate.
  • the dark-colored photosensitive resin layer that is, after forming a laminate
  • the pattern is exposed through the temporary support and further developed. By doing so, it is possible to form a dark color separation image wall.
  • the dark color separation wall can be obtained by other methods.
  • Other methods include a dark color photosensitive resin layer formed on a temporary support using the light sensitive resin composition, and an oxygen blocking layer laminated on the dark color photosensitive resin layer. Is laminated on the substrate and a dark color photosensitive resin layer is formed on the substrate (that is, after being formed into a laminate), and then, via a temporary support and an oxygen blocking layer.
  • a deep color separation image wall can be formed by pattern exposure and further development.
  • the oxygen blocking layer is also preferably formed between the temporary support and the dark color photosensitive resin layer, and transferred onto the substrate together with the dark color photosensitive resin layer.
  • the dark color separation wall is often configured to be black, but is not necessarily limited to black.
  • the chromaticity is measured by performing the same process as the formation of the dark color separation wall except that a layer is formed on the substrate using a material for forming the dark color separation wall and the pattern is not exposed. Perform the sample obtained with a C light source, and calculate x, y, and Y for this sample.
  • Achromatic color point When calculating the chromaticity deviation of force, the Y value of the achromatic color point is equal to the Y value of the sample.
  • the color difference ⁇ exceeds 30, when the dark color separation wall functions as a black matrix, light leakage occurs, which is not preferable.
  • the smaller the lower limit of the color difference ⁇ the better, as long as it is within a range where a liquid crystal display device can be manufactured.
  • a photosensitive transfer material is prepared in which a dark color photosensitive resin layer and a protective film are provided on a temporary support in order from the temporary support side. If necessary, an oxygen blocking layer or a thermoplastic resin layer may be provided between the temporary support and the dark color photosensitive resin layer. Then, after peeling off and removing the protective film, the surface of the exposed dark photosensitive resin layer is bonded onto a permanent support (substrate), and laminated by heating and pressing through a laminator or the like (laminated body). ).
  • the laminator can be appropriately selected from conventionally known laminators, vacuum laminators, and the like, and an auto-cut laminator can also be used to increase productivity.
  • a desired photomask for example, a quartz exposure mask
  • ultraviolet light is further above the photomask.
  • a light source that can be irradiated.
  • the exposure can be performed using, for example, a proximity type exposure machine (for example, manufactured by Hitachi High-Tech Electronic Engineering Co., Ltd.) equipped with an ultrahigh pressure mercury lamp, and the exposure amount can be selected as appropriate (for example, 300 mjZ cm 2 ).
  • the light source include a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a xenon lamp, and a metal halide lamp.
  • the temporary support is peeled and removed from the laminate, and developed with a predetermined processing solution to obtain a pattern image, and then washed with water as necessary to obtain a deep color separation. A painting wall is obtained.
  • pure water is sprayed with a shower nozzle or the like, and the surface of the dark color photosensitive resin layer is displayed. It is preferable that the surface be uniformly moistened.
  • a dilute aqueous solution of an alkaline substance can be suitably used. Further, a developer added with a small amount of an organic solvent miscible with water may be used.
  • alkaline substance examples include alkali metal hydroxides (for example, sodium hydroxide and potassium hydroxide), alkali metal carbonates (for example, sodium carbonate and potassium carbonate), alkali metal bicarbonate. Salts (eg, sodium bicarbonate, potassium bicarbonate), alkali metal silicates (eg, sodium silicate, potassium silicate), alkali metal metasilicates (eg, sodium metasilicate, potassium metasilicate), tri Examples include ethanolamine, jetanolamine, monoethanolamine, morpholine, tetraalkylammonium hydroxide (eg, tetramethylammonium hydroxide), trisodium phosphate, and the like.
  • the concentration of alkaline substance is preferably 0.01 to 30% by mass.
  • the pH is preferably 8 to 14.
  • Examples of the "water-miscible organic solvent” include, for example, methanol, ethanol, 2-prononole, 1-propanol, butanol, diacetone-ethanolo, ethyleneglycol-mono monoethanolate, Ethylene glycol-monoethylenoatenole, ethylene glycol-monolemonyl butyl ether, benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ⁇ — force prolataton, ⁇ -butyrolataton, dimethylformamide, dimethylacetamide, hexamethylphospho
  • Preferable examples include luamide, ethyl acetate, methyl lactate, ⁇ -strength prolatatam, and ⁇ ⁇ ⁇ -methylpyrrolidone.
  • the concentration of the organic solvent miscible with water is preferably 0.1 to 30% by mass.
  • a known surfactant can be added, and
  • the developer may be used as a bath solution or as a spray solution.
  • the temperature of the developer is usually preferably around 40 ° C around room temperature.
  • the development time depends on the composition of the photosensitive resin layer, the alkalinity and temperature of the developer, and the type and concentration when an organic solvent is added, but is usually about 10 seconds to 2 minutes. If it is too short, the development of the non-exposed area may be insufficient, and the absorbance at the time of exposure may be insufficient. May be chinked. In either case, it is difficult to make the dark color separation wall shape suitable. In this development step, the dark color separation wall shape is formed as described above.
  • the height of the dark color separation wall obtained as described above is preferably 1.8 m or more and 10 ⁇ m or less, more preferably 1.9 m or more and 10 m or less. More preferably, it is 2. O / zm or more, and particularly preferably 2.2 m or more and 5 m or less. By setting the height to 1 or more, color mixing can be prevented more effectively. If the height exceeds 10 m, it may be difficult to form a dark color separation wall.
  • the height of the dark color separation wall is, for example, the length from the substrate surface in the thickness direction of the substrate on which the dark color separation wall is formed.
  • a photosensitive transfer material for forming a dark color separation image wall is formed by using a photosensitive transfer material having at least a layer composed of a photosensitive resin composition (dark color photosensitive resin layer) on a temporary support.
  • a photosensitive transfer material having at least a layer composed of a photosensitive resin composition (dark color photosensitive resin layer) on a temporary support.
  • the dark photosensitive resin layer is protected by the temporary support until the exposure is completed, it automatically becomes an oxygen-poor atmosphere. For this reason, there is an advantage that the pattern can be formed more easily while using the current manufacturing process as it is without having to perform exposure in an inert gas environment or a reduced pressure environment.
  • An oxygen-poor atmosphere is an atmosphere separated from an oxygen-containing atmosphere by providing a layer (including a substrate such as a temporary support) having an oxygen permeability of 2 OOOcm 3 / (m 2 'dayatm) or less.
  • the oxygen permeability of the layer is preferably 100 «! 1 3 7 (111 2 '(1 & ⁇ &1; 111) or less, more preferably 50 cmV (m 2 -day ⁇ atm) or less! /. If the oxygen permeability is greater than 2000 cm 3 Z (m 2 ⁇ day ⁇ atm), oxygen cannot be effectively blocked, and it may be difficult to make the separation wall into the desired shape. .
  • the photosensitive transfer material according to the present invention is a layer (dark color photosensitive layer) comprising a photosensitive resin composition on a temporary support by a method such as applying the photosensitive resin composition. And a thermoplastic resin layer, an intermediate layer, and a protective film as necessary.
  • Temporary support can be appropriately selected from those that are chemically and thermally stable and made of a flexible material. Specifically, Teflon (registered trademark), polyethylene terephthalate, polycarbonate, polyethylene, polypropylene, polyester, etc.
  • the thickness of the temporary support is suitably 5 to 300 ⁇ m, preferably 20 to 150 ⁇ m. If this thickness is less than 5 m, the substrate tends to be easily broken when the substrate before development is peeled off, and if it exceeds 300 m, the resolution tends to decrease.
  • a biaxially stretched polyethylene terephthalate film is particularly preferred.
  • an oxygen barrier layer can be provided between the temporary support and the photosensitive resin layer.
  • a layer mainly composed of polyethylene, polyvinylidene chloride, polybutyl alcohol (PVA) or the like is preferable, and among these, a layer mainly composed of polyvinyl alcohol is preferable.
  • the polyvinyl alcohol those having an acidity of 80% or more are preferable.
  • the content of polybulal alcohol (PVA) in the oxygen barrier layer is preferably 25 to 99% by mass, preferably 50 to 90% by mass. More preferred is 50 to 80% by mass.
  • polyvinyl pyrrolidone is preferable among polymers other than PVA such as polyvinyl pyrrolidone and polyacrylamide as necessary.
  • the addition amount of the polymer other than PVA is preferably 1 to 40% by mass, more preferably 1 to 40% by mass of the entire layer. If the amount of polymer added other than PVA, such as polypyrrolidone, is too large, oxygen barrier properties may be insufficient.
  • the thickness of the oxygen blocking layer is preferably 0.2 to: LO / zm, more preferably 0.5 to 3. O / zm, as long as the oxygen blocking ability can be exhibited.
  • the photosensitive transfer material may further have a thermoplastic resin layer as necessary.
  • the thermoplastic resin layer preferably comprises at least a resin component and is alkali-soluble.
  • the resin component those having a substantial soft spot of 80 ° C or less are preferred.
  • Examples of the alkali-soluble thermoplastic resin having a soft freezing point of 80 ° C or lower include a saponified product of ethylene and an acrylate ester copolymer, a copolymer of styrene and a (meth) acrylate ester, and the like. Saponification product with polymer, saponification product with butyltoluene and (meth) acrylate copolymer, poly (meth) acrylate ester, (meth) acrylate ester copolymer such as (meth) acrylate butyl and vinyl acetate Examples thereof include a polymer such as a polymer.
  • thermoplastic resin layer at least one of the above-mentioned thermoplastic resins can be appropriately selected and used.
  • thermoplastic resins can be appropriately selected and used.
  • “Plastic Performance Handbook” Japan Plastic Industry Federation, All Japan Plastic Molding Industry Association) Edited by the Industrial Research Council, published on October 25, 1968
  • organic polymers that have a soft spot of about 80 ° C or less and are soluble in an alkaline aqueous solution.
  • organic polymer substances having a soft softening point of 80 ° C or higher various softeners compatible with the polymer substance can be added to the organic polymer substance to substantially reduce the softening point.
  • the temperature can be lowered to 80 ° C or lower.
  • these organic polymer substances have various polymers, supercooled substances, and adhesion improvements as long as the actual soft spot does not exceed 80 ° C in order to adjust the adhesive strength with the temporary support.
  • An agent or a surfactant, a release agent, etc. can also be added.
  • plasticizers include: polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tritale diphosphate, cresyl diphenyl phosphate biphenyl diphenyl phosphate Can do.
  • each layer of the photosensitive transfer material is preferably 2 to 30 / zm force for the thermoplastic resin layer and 0.5 to 3.0 m for the oxygen barrier layer. is there.
  • a thin protective film is preferably provided on the dark color photosensitive resin layer in order to protect against contamination and damage during storage.
  • the protective film is the same or similar to the temporary support It is important to select materials that are easily separated from the photosensitive resin layer. Suitable materials for the protective film include, for example, silicone paper, polyolefin, or polytetrafluoroethylene sheet.
  • the thickness of the protective film is generally 4 to 40 ⁇ m, preferably 5 to 30 ⁇ m, particularly preferably 10 to 25 / z m.
  • thermoplastic resin coating solution a coating solution in which the components of the thermoplastic resin layer are dissolved on the temporary support and dry it to form a thermoplastic resin layer.
  • a solution for forming an oxygen barrier layer a coating solution for oxygen barrier layer prepared using a solvent that does not dissolve the thermoplastic resin layer is applied onto the formed thermoplastic resin layer and dried.
  • do not dissolve the oxygen barrier layer on the oxygen barrier layer do not dissolve the oxygen barrier layer! For example, by applying a layer coating liquid) and drying to laminate a dark photosensitive resin layer.
  • thermoplastic resin layer and an oxygen blocking layer on a temporary support and a sheet provided with a dark photosensitive resin layer on a protective film were prepared, and oxygen blocking was performed.
  • the sheet is provided with a thermoplastic resin layer on the temporary support and a protective film on the protective film.
  • a photosensitive transfer material can also be produced by preparing a sheet provided with a layer and an oxygen barrier layer and bonding them together so that the thermoplastic resin layer and the oxygen barrier layer are in contact with each other.
  • application in the above method can be performed by a known application apparatus or the like.
  • application is preferably performed by an application apparatus (slit coater) using a slit-like nozzle.
  • a step of forming an ink repellency treatment on at least a part of the dark color separation wall by performing an ink repellency treatment on the dark color separation wall formed on the substrate (Hereinafter sometimes referred to as an “ink repellent treatment step”).
  • ink repellent treatment step After the dark color separation wall is subjected to ink repellency treatment, that is, after at least part of the dark color separation wall has ink repellency, pixel formation described later is performed. It is preferable to perform a step, that is, a step of forming a plurality of pixels by applying droplets of the colored liquid composition to the recesses between the dark color separation walls.
  • the ink-repellent treatment has the disadvantage that when a droplet is applied by an ink jet method or the like, the droplet (ink droplet) of the colored liquid composition gets over the dark color separation wall and mixes with the ink forming the adjacent pixels. It can be effectively resolved.
  • the ink repellent treatment is a treatment for spreading droplets of the colored liquid composition to be applied, and the means thereof is not particularly limited.
  • the ink repellent treatment (1) a method of kneading an ink repellent substance on a dark color separation wall, (2) a method of newly providing an ink repellent layer, (3) ink repellency by plasma treatment And (4) a method of applying an ink repellent material to the upper surface of the dark color separation wall.
  • the present invention is not limited to this.
  • each ink repellent treatment will be described in detail.
  • the fluorine-containing resin (A) has an R f group (a) and an acidic group (b) that also have a polyfluoroether structural force represented by the following formula 1, and an acid value of 1 to 300 mgKOHZg Is preferred.
  • X represents a divalent saturated hydrocarbon group having 1 to LO carbon atoms or a fluoro divalent saturated hydrocarbon group having 1 to LO carbon atoms
  • n The enclosed units (X—O) each represent the same group or different groups.
  • Y is a hydrogen atom (only when a fluorine atom is not bonded to a carbon atom adjacent to the oxygen atom adjacent to Y), a monovalent saturated hydrocarbon group having 1 to 20 carbon atoms, or 1 to 20 carbon atoms. Represents a fluorinated monovalent saturated hydrocarbon group.
  • n represents an integer of 2 to 50. However, the total number of fluorine atoms in Formula 1 is 2 or more.
  • X is a hydrogen atom 1 having 1 to carbon atoms: LO.
  • Y Represents a fluorinated alkyl group or a perfluorinated alkyl group having 1 to 20 carbon atoms, except for one hydrogen atom having 1 to 20 carbon atoms.
  • X force is a perfluoroalkylene group having 1 to 10 carbon atoms
  • each unit (X-O) surrounded by n is each It represents the same group or different groups
  • Y represents a perfluorinated alkyl group having 1 to 20 carbon atoms.
  • n represents the integer of 2-50.
  • n is preferably 2-30, more preferably 2-15.
  • the fluorinated resin (A) contains a monomer having an Rf group (a), a monomer having an acidic group (b), and other monomers as required.
  • the compatibility of the monomer is improved.
  • the total number of carbon atoms in the Rf group (a) having the polyfluoroether structural force represented by the formula 1 is preferably 2 to 50, more preferably 2 to 30.
  • the fluorinated resin (A) has good repellency, particularly organic solvent repellency.
  • the fluorine-containing resin (A) is synthesized by copolymerization with a monomer having an Rf group (a), a monomer having an acidic group (b), and, if necessary, other monomers. When it does, the compatibility of a monomer becomes favorable.
  • X include CF CF CF CF CF CF CF CF CF (
  • Y include CF CF CF CF CHF, one (CF) CF, one (C
  • Rf group (a) having a polyfluoroether structural force represented by the formula 1 include an Rf group (a) represented by the following formula 2.
  • p represents an integer of 2 or 3
  • the unit (CF — O) surrounded by n ⁇ 1 is the same.
  • Rf group (a) represented by the above formula 2 specifically, CF 0 (CF CF O) CF (n is
  • Rf groups (a) in the fluorine-containing resin (A) may all be the same or different.
  • the fluorine atom content in the fluorine-containing resin (A) is preferably 1 to 60%, more preferably 5 to 40%. Within this range, the fluorine-containing resin (A) has good ink repellency and good developability when developing the photosensitive resin composition.
  • the fluorine-containing resin (A) has an acidic group (b), and the acidic group (b) includes at least one selected from a group force consisting of a carboxyl group, a phenolic hydroxyl group, and a sulfonic acid group.
  • a group force consisting of a carboxyl group, a phenolic hydroxyl group, and a sulfonic acid group.
  • An acidic group or a salt thereof is preferred.
  • the acid value of the fluorinated resin (A) is preferably 1 to 300 mgKOH / g, more preferably 5 to 200 mgKOHZ g, and particularly preferably 10 to 150 mgKOHZg. Within the above range, the developability when developing the photosensitive resin composition is improved.
  • the acid value is the mass (unit: mg) of potassium hydroxide that is necessary to neutralize the fat lg, and the unit is “mg KOHZg” in this specification.
  • the number average molecular weight of the fluorinated resin (A) is preferably 500 or more and less than 20000, more preferably 2000 or more and less than 15,000. Within this range, the developability when developing the photosensitive resin composition is good.
  • the number average molecular weight is measured using polystyrene as a standard substance by gel permeation chromatography.
  • the fluorinated resin (A) is composed of a structural unit derived from a monomer having an ethylenic double bond and the Rf group (a), an ethylenic double bond, and the acidic group (b). It is preferable that the acid value is 1 to 300 mgKOHZg.
  • Examples of the ethylenic double bond include a (meth) atteroyl group, a vinyl group, and a allyl group.
  • R 1 is a hydrogen atom
  • Q 1 represents a single bond or a divalent organic group having 1 to 6 carbon atoms
  • Q 2 represents a divalent organic group having 1 to 6 carbon atoms.
  • QQ 2 may have a cyclic structure.
  • QQ 2 Specific examples are: -CH 1, -CH CH 1, CH (CH
  • the proportion of the structural unit derived from the monomer having the ethylenic double bond and the Rf group (a) in the fluorinated resin (A) is preferably 1 to 95 mol%, etc. 5 ⁇ 80 mol% is more preferred 20 ⁇ 60 mol% is more preferred. Within such a range, the fluorinated resin has good ink repellency and good developability when developing the photosensitive resin composition.
  • Examples of the monomer having an acidic group (b) include a monomer having a carboxyl group, a monomer having a phenolic hydroxyl group, and a monomer having a sulfonic acid group.
  • Examples of the monomer having a carboxyl group include acrylic acid, methacrylic acid, berylacetic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, kaynoic acid, and salts thereof. It is done. These may be used individually by 1 type and may use 2 or more types together.
  • Examples of the monomer having a phenolic hydroxyl group include o-hydroxystyrene, m-hydroxystyrene, and p-hydroxystyrene.
  • one or more hydrogen atoms of these benzene rings are an alkyl group such as a methyl group, an ethyl group or an n-butyl group, an alkoxy group such as a methoxy group, an ethoxy group or an n-butoxy group, a halogen atom or an alkyl group.
  • a compound in which one or more hydrogen atoms are substituted with a halogen atom, a nitro group, a cyan group, or an amide group may be used alone or in combination of two or more.
  • Examples of the monomer having a sulfonic acid group include vinyl sulfonic acid, styrene sulfonic acid, (meth) aryl sulfonic acid, 2 hydroxy-3- (meth) aryloxypropane sulfonic acid, (meta ) Acrylic acid 2-sulfoethyl, (meth) acrylic acid 2-sulfopropyl, 2 Hydroxy-3-- (meth) Atalyloxypropane sulfonic acid, 2- (meth) acrylamido 2-methylpropanesulfonic acid, or salts thereof Etc. These may be used alone or in combination of two or more.
  • the amount of the structural unit derived from a monomer having an acidic group (b) is from 0.1 to 40 mole 0/0 Hitoshiryoku S
  • the fluorine-containing resin has good ink repellency and good developability when developing the photosensitive resin composition.
  • the fluorine-containing resin is derived from a structural unit derived from a monomer having an ethylenic double bond and an Rf group (a), and from a monomer having an ethylenic double bond and an acidic group (b).
  • a copolymer having no Rf group (a) and no acidic group (b) hereinafter referred to as “other monomer”. You may have a structural unit.
  • Other monomers include, for example, hydrocarbon-based olefins, butyl ethers, isopropyl ethers, allylic ethers, butyl esters, allylic esters, (meth) acrylic acid esters, (meth) Examples include acrylamides, aromatic vinyl compounds, chloroformes, fluoroolefins, and conjugates. These compounds contain functional groups Examples of the functional group that may be used include a hydroxyl group, a carbonyl group, an alkoxy group, and an amide group. Moreover, you may have group which has a polysiloxane structure. However, structural units derived from other monomers do not have the Rf group (a) and the acidic group (b). Other monomers may be used alone or in combination of two or more.
  • (meth) acrylic acid esters and (meth) acrylamides are preferred from the viewpoint of improving the heat resistance of a film formed using the photosensitive resin composition.
  • the proportion of the structural unit derived from the other monomer in the fluorinated resin is preferably 80% mol or less, more preferably 70 mol% or less. Within this range, the developability when developing the photosensitive resin composition is good.
  • the fluorine-containing resin is a structural unit derived from the monomer having the ethylenic double bond and Rf group (a), and a monomer having the ethylenic double bond and acidic group (b).
  • each of the compounds having a reactive site is reacted with a compound having an Rf group (a) and a compound having Z or an acidic group (b). It can also be obtained by a seed modification method.
  • a monomer having an epoxy group is preferentially copolymerized, and an Rf group is later formed.
  • examples thereof include a method in which (a) is reacted with a compound having a carboxyl group, and a method in which a monomer having an epoxy group is previously copolymerized and then a compound having an Rf group (a) and a hydroxyl group is reacted.
  • Specific examples of the monomer having an epoxy group include glycidyl (meth) acrylate, 3
  • Examples of the compound having an Rf group (a) and a carboxyl group include compounds represented by the following formula 3.
  • p represents an integer of 2 or 3
  • q represents an integer of 1 to 20
  • n represents an integer of 2 to 50.
  • Examples of the compound having the Rf group (a) and the hydroxyl group include compounds represented by the following formula 4.
  • p is an integer of 2 or 3
  • q is an integer of 1 to 20
  • n is an integer of 2 to 50.
  • Examples of various modification methods for reacting a polymer having a reactive site with a compound having an acidic group (b) include copolymerization of monomers having a hydroxyl group, followed by reaction with an acid anhydride. The method of letting it be mentioned. In addition, there may be mentioned a method in which an acid anhydride having an ethylenic double bond is copolymerized in advance and a compound having a hydroxyl group is reacted later.
  • the monomer having a hydroxyl group include bulufenol, 2 hydroxyethyl (meth) acrylate, 2 hydroxypropyl (meth) acrylate, 3 hydroxypropyl (meth) acrylate, 4- Hydroxybutyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, 6-hydroxy hexyl (meth) acrylate, 4-hydroxy cyclohexyl (meth) acrylate, neopentyl glycol mono (meth) ate 2-hydroxypropyl (meth) acrylate, glycerin mono (meth) acrylate, 2-hydroxy shethyl vinyl ether, 4-hydroxybutyl vinyl ether, cyclohexanediol mono vinyl ether, 2-hydroxy ester Tyryl ether, N hydroxy Examples include methyl (meth) acrylamide, N, N-bis (hydroxymethyl), and the like.
  • the monomer having a hydroxyl group may be a monomer having a polyoxyalkylene chain having a terminal hydroxyl group.
  • CH CHOCH C H CH O (C H O)
  • CH CHCOOC H 0 (C H O) (C H O) H (where h is 0 or 1 to: an integer of LOO
  • acid anhydride examples include phthalic anhydride, 3-methylphthalic anhydride, trimellitic anhydride, and the like.
  • acid anhydride having an ethylenic double bond examples include maleic anhydride, anhydrous itaconic acid, citraconic anhydride, methyl-5-norbornene 2,3 dicarboxylic acid, anhydrous 3, 4, 5,
  • Examples include 6-tetrahydrophthalic acid, cis-l, 2, 3, 6-tetrahydrophthalic acid, 2-butene-1-yl succinic anno, and idride.
  • the compound having a hydroxyl group may be a specific example of the above-mentioned monomer having a hydroxyl group as long as it is a compound having one or more hydroxyl groups, ethanol, 1 propanol, 2-propanol, Alcohols such as 1-butanol and ethylene glycol, cellsolves such as 2-methoxyethanol, 2-ethoxyethanol, 2-butoxyethanol, 2 (2-methoxyethoxy) ethanol, 2- (2-ethoxyethoxy) ethanol, And carbitols such as 2- (2-butoxyethoxy) ethanol.
  • a compound having one hydroxyl group in the molecule is preferred. These may be used alone or in combination of two or more.
  • the polymer having the above-mentioned reaction site serving as a fluorine-containing resin or a precursor of fluorine-containing resin is prepared by dissolving the monomer in a solvent together with a chain transfer agent as necessary, and heating it. Can be synthesized by a method of reacting and reacting.
  • the amount of the fluorinated resin (A) in the solid content of the photosensitive resin composition is preferably 0.01 to 50% by mass, and more preferably 0.1 to 30% by mass. 2-10% by weight is particularly preferred. Within such a range, the photosensitive resin composition exhibits good ink repellency and ink tumbling properties, and developability during image formation is good.
  • ink repellent layer a partition wall having ink repellency on at least the dark color separation wall formed on the substrate. it can.
  • a silicone rubber layer as the partition wall having ink repellency.
  • the silicone rubber layer is provided on the surface layer of the dark color separation wall and needs to have a repulsive effect on the solution and ink used for coloring.
  • the silicone rubber layer is not particularly limited, but a layer composed mainly of a linear organic polysiloxane having a molecular weight of several thousand to several hundred thousand having the following repeating units is preferable. .
  • n represents an integer of 2 or more
  • R represents an alkyl group having 1 to 10 carbon atoms, a alkenyl group, or a phenyl group.
  • Silicone rubber is obtained by sparsely cross-linking such a linear organic polysiloxane.
  • the crosslinking agent responsible for crosslinking include acetoxy silane, keto oxime silane, alkoxy silane, amino silane, amido silane, and alkoxy silane used for so-called room temperature (low temperature) curable silicone rubber.
  • deacetic acid-type, deoxime-type, dealcohol-type, deamamine-type, deamid-type, and deketone-type silicone rubbers are obtained.
  • a small amount of an organic tin compound is generally added to the silicone rubber as a catalyst.
  • various types of adhesive layers may be used at the interface, particularly aminosilane compounds and organic titanate compounds. It can be used preferably.
  • an adhesive component may be added to the silicone rubber layer. As this additional adhesive component, aminosilane compounds and organic titanate compounds can be used.
  • a silicone rubber layer is formed on a substrate on which a dark color separation wall is formed. Form. At this time, exposure for producing the partition wall is performed from the dark color separation wall non-formation surface side (back side) of the substrate using the dark color separation wall as a mask. After exposure in this manner, a partition wall having a silicone rubber layer can be produced by developing with an n-heptane / ethanol mixed solution.
  • the ink-repellent treatment with plasma can be applied to the dark color separation wall formed on the substrate.
  • Gases containing at least fluorine atoms introduced during plasma treatment include CF and C.
  • halogen gas selected from HF, CF, SF, CF, and CF
  • C F octafluorocyclopentene
  • ozone depletion potential 0
  • the atmospheric lifetime is 0.9 compared to conventional gas (CF: 50,000 years, C F: 3200 years).
  • a gas such as oxygen, argon, or helium may be used in combination as necessary.
  • the selected CF, CHF, C F, SF, C F, and C F are selected.
  • the mixing ratio of O is preferably set to a range of 30% or less.
  • methods such as low-frequency discharge, high-frequency discharge, and microwave discharge can be applied, and conditions such as pressure, gas flow rate, discharge frequency, and processing time during plasma processing are arbitrary. Can be set.
  • a material having ink repellency (hereinafter also referred to as an ink repellent material) can be applied to the surface of the substrate and the dark color separation wall formed on the substrate.
  • the material having ink repellency include fluorine resin such as polytetrafluoroethylene, silicone rubber, perfluoroalkyl acrylate, hydrocarbon acrylate, methyl
  • fluorine resin such as polytetrafluoroethylene, silicone rubber, perfluoroalkyl acrylate, hydrocarbon acrylate, methyl
  • those generally considered as ink repellent materials such as siloxane, those having a contact angle of 50 ° or more with respect to the colored liquid composition can be suitably used without particular limitation.
  • the ink-repellent material can be applied by dissolving or dispersing the ink-repellent material in a solvent.
  • a coating method any method that does not affect the substrate, the separation wall, etc. may be used.For example, slit coat, spin coat, dip coat, roll coat, etc. it can.
  • UV'O treatment is performed through the dark color separation wall from the dark color separation wall non-formation surface side (back side) of the substrate on which the dark color separation wall is formed. Repellent in parts other than dark color separation walls
  • the ink repellent treatment can be carried out by selectively removing the hydrophilic material or making it hydrophilic (so that the contact angle with the colorant has a difference of 30 ° or more before and after the treatment).
  • the patterning method is optimal depending on the material, such as laser ablation, plasma ashing, dry treatment such as corona discharge treatment, and wet treatment using alkali V It is possible to select the method.
  • ink repellent treatments (1) to (4) from the viewpoint that the process is simple, (3) a method of imparting ink repellency by plasma treatment is particularly preferred.
  • the pixel of the optical element of the present invention is formed by applying and penetrating droplets of the colored liquid composition into the recesses between the dark color separation walls on the substrate on which the dark color separation walls are formed.
  • it is formed in the separation wall forming step in the method for producing an optical element of the present invention. That is, a colored liquid composition for forming pixels (for example, RGB pixels) is applied, for example, by an ink jet method to a region (pixel region for forming pixels) surrounded by a dark color separation wall formed on the substrate.
  • a plurality of pixels can be formed by applying droplets and entering them.
  • a known method such as an ink jet method or a stripe grease coating method can be used.
  • the means for fixing the shape of the dark color separation wall before forming each pixel is not particularly limited, but 1) Re-exposure after development (referred to as post-exposure) 2) Heat treatment is performed at a relatively low temperature after image formation.
  • the heat treatment here means heating a substrate having a dark color separation wall in an electric furnace, a drier or the like, or irradiating with an infrared lamp.
  • the heating temperature in 2) is about 100 ° C. to about 250 ° C., and the heating time is about 10 to 40 minutes. If the temperature is lower than 100 ° C, the dark color separation wall may not be cured. If the temperature is higher than 250 ° C, the shape of the dark color separation wall may be destroyed.
  • Examples of the ink jet method used for forming each pixel include a method of thermally curing ink, a method of photocuring ink, a method of forming a transparent image-receiving layer on a substrate in advance and ejecting ink with force.
  • a known method can be used.
  • a heating step of performing a heat treatment is provided. That is, the substrate is heated in an electric furnace, a drier, etc., or irradiated with an infrared lamp.
  • the heating temperature and time depend on the composition of the photosensitive resin composition and the thickness of the formed layer, but generally from about 120 ° C to about 250 ° C from the viewpoint of ensuring sufficient solvent resistance and alkali resistance. Heating at ° C for about 10 minutes to about 120 minutes is preferred.
  • the pattern shape of the pixels formed in this way is not particularly limited, but may be a general stripe shape or lattice shape (specifically, a shape as shown in Fig. 6B). Further, it may be in a delta arrangement (specifically, a shape as shown in FIG. 6A).
  • the mask for pattern formation used at the time of exposure may be a general stripe shape, a lattice shape, or a delta arrangement.
  • ink jet method charged ink is continuously ejected and controlled by an electric field.
  • Various methods such as a method, a method of intermittently ejecting ink using a piezoelectric element, and a method of intermittently ejecting ink by heating and foaming the ink can be employed.
  • Either an oily or water-based colored liquid composition can be used for ink to be ejected by the ink jet method.
  • the ink (colored liquid composition) contains a colorant and the like, and both a dye and a pigment can be used as the colorant, and a pigment is preferred from the viewpoint of durability.
  • a coating-type colored ink for example, the colored resin composition described in paragraphs [0034] to [0063] of JP-A-2005-3861 used for producing a known color filter,
  • the inkjet composition described in paragraph Nos. [0009] to [0026] of JP-A No. 10-195358 can also be used.
  • the ink may contain a component that is cured by heating or is cured by an energy ray such as an ultraviolet ray in consideration of a step after coloring.
  • a component that is cured by heating or is cured by an energy ray such as an ultraviolet ray in consideration of a step after coloring.
  • Various thermosetting resin is widely used as the component that is hardened by heating, and examples of the component that is cured by the energy rays include those obtained by adding a photoinitiator to an attalylate derivative or a metatalylate derivative. .
  • heat resistance when heat resistance is taken into consideration, those having a plurality of allyloyl groups and methacryloyl groups in the molecule are more preferable.
  • attalylate derivatives and metatalylate derivatives are preferably water-soluble, and even those that are sparingly soluble in water can be used by emulsifying them.
  • a photosensitive resin composition containing a colorant such as the above-described pigment can be used as a suitable one.
  • thermosetting ink for a color filter comprising at least a binder and a bifunctional tan trifunctional epoxy group-containing monomer can be used as a suitable ink.
  • the optical element of the present invention is preferably one in which pixels are formed by applying droplets by an ink jet method in a region separated by a dark color separation wall.
  • the optical element of the present invention is an element that controls light transmission and light emission, and can be suitably used as a color filter electroluminescent element or the like.
  • an overcoat layer is formed on the entire surface of the substrate on the side where dark color separation walls and pixels are provided for the purpose of improving solvent resistance or flatness. It may be provided. Note that the overcoat layer can protect the pixels formed by solidifying the inks of R, G, and B colors and can flatten the surface, but it is preferably not provided in terms of increasing the number of steps.
  • the overcoat layer can be formed using a resin (OC agent).
  • the resin (OC agent) include an acrylic resin composition, an epoxy resin composition, and a polyimide resin composition. Can be mentioned. Above all, it is excellent in transparency in the visible light region, and the resin component of the photocurable composition for color filters usually has an acrylic resin as the main component, and has excellent adhesion. Things are desirable.
  • the overcoat layer include those described in paragraph Nos. [0018] to [0028] of JP-A-2003-28776, and an overcoat agent sold as an optomer SS6699G manufactured by JSR. .
  • the liquid crystal display device of the present invention is configured by providing the above-described optical element of the present invention.
  • the mode of the liquid crystal display device is not particularly limited as long as the optical element of the present invention is provided.
  • Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, Kogyo Kenkyukai, published in 1999)
  • Various types of liquid crystal display devices described can be applied. In particular, it is effective as a color TFT liquid crystal display device.
  • the color TFT liquid crystal display device is described in, for example, "Color TFT liquid crystal display” (Kyoritsu Shuppan Co., Ltd., issued in 1996).
  • liquid crystal display devices with wide viewing angles, such as horizontal electric field drive methods such as IPS and pixel division methods such as MVA. These methods are described in, for example, “EL, PDP, LCD Display Technology and the Latest Trends in Kayaba” (Toray Research Center, Research Division, 43 pages, 2001).
  • the liquid crystal display device includes an electrode substrate, a polarizing film, a retardation film, a knocklight, a spacer, a viewing angle guarantee film, and the like. It is configured using various members.
  • the optical element of the present invention can be suitably applied to a liquid crystal display device composed of these known members.
  • PET film Polyethylene terephthalate film with a thickness of 16 ⁇ m (Tetron (registered trademark) G2, manufactured by Tijin DuPont Films Co., Ltd .; hereinafter referred to as PET film) on a temporary support using a slit-shaped nozzle, Applying the resin composition K1 and drying, a thick photosensitive resin layer with a dry film thickness of 2.2 m is provided on the temporary support, and finally the surface of this dark photosensitive resin layer is applied. A protective film (12 ⁇ m thick polypropylene film) was pressure bonded.
  • a dark color photosensitive transfer material in which a dark color photosensitive resin layer and a protective film were provided on a temporary support was produced.
  • this is referred to as a dark color photosensitive transfer material K1.
  • Methyl ethyl ketone 53 53 Binder 1 9.1 9.1
  • Photosensitive resin composition K1 is composed of K pigment dispersion 1, propylene glycol monomethyl ether acetate (MMPGAC, manufactured by Daicel Chemical Industries, Ltd.
  • a non-alkali glass substrate is cleaned with a rotating brush with nylon bristles while spraying a glass detergent solution adjusted to 25 ° C for 20 seconds with a shower.
  • the silane coupling solution N- ⁇ (amino Ethyl))-aminopropyltrimethoxysilane 0.3 mass% aqueous solution, trade name: KBM603, manufactured by Shin-Etsu Chemical Co., Ltd.
  • KBM603 manufactured by Shin-Etsu Chemical Co., Ltd.
  • the temporary support is peeled from the laminate, and pure water is sprayed from above the peeled dark color photosensitive resin layer with a shower nozzle, so that the surface of the dark color photosensitive resin layer is covered.
  • KO H developer CDK-1 (1, containing a non-ionic surfactant, 100-fold diluted with pure water from Fuji Film Elect Kokuiku Materials Co., Ltd.
  • shower development was performed at 23 ° C. for 80 seconds at a flat nozzle pressure of 0.04 MPa to obtain a patterned image.
  • ultrapure water was sprayed at a pressure of 9.8 MPa from an ultrahigh pressure washing nozzle to remove the residue, and post exposure was performed at an exposure amount of 2000 mjZcm 2 in the atmosphere.
  • heat treatment was performed at 220 ° C for 30 minutes to form a 2.1 m thick thick color separation wall.
  • the height of the dark color separation wall is measured using the contact surface roughness tester P-10 (manufactured by TENCOR) to measure the height ( ⁇ m) of the substrate surface force after beta treatment. did.
  • the mask used above has a lattice shape in the pattern shape, and the pixel portion of the boundary line that forms the boundary between the pixel and the dark color separation wall when observed in the thickness direction of the glass substrate.
  • This mask is designed so that the radius of curvature of the dark color separation wall of the boundary line at the corner where the inner angular force of S is less than 180 ° can be designed to be 0.
  • the radius of curvature is determined by observing the glass substrate from the dark color separation wall forming surface side in the thickness direction with an optical microscope, and the dark color of the pixel at the corner where the inner angle of the pixel is less than 180 °. As shown in Fig. 5, the boundary with the separation wall is 1 ⁇ m on both sides along the boundary line with the corner apex as the center. The radius was obtained.
  • plasma ink repellent treatment was performed on the dark-colored separation wall by the following method.
  • the glass substrate on which the dark color separation wall was formed was placed in a force sword coupling type parallel plate type plasma processing apparatus and subjected to plasma ink repellent treatment under the following conditions.
  • a pigment Of the components in the composition below, first, a pigment, a polymer dispersant, and a solvent were mixed, and a pigment dispersion was prepared using a three-roll and bead mill. To this pigment dispersion, other components were added little by little with sufficient stirring with a dissolver or the like to prepare a colored ink for red (R) pixels.
  • R red
  • Second epoxy resin neopentyldaricol diglycidyl ether
  • Curing agent trimellitic acid
  • G (green) colored ink composition for pixel G which is the same as the colored ink composition for R pixel, except that the same amount of CI pigment drain 36 is used instead of CI pigment red 254 in the R ink composition. was prepared.
  • CI Pigment A colored ink composition for B (blue) pixels was prepared in the same manner as for the colored ink composition for R pixels except that the same amount of ro 15: 6 was used.
  • the RGB inks obtained above are sequentially applied to the recesses (in the area separated by the dark color separation walls) between the dark color separation walls formed as described above.
  • An ink jet recording apparatus was used to eject a quantity that provides a desired density to form red, green, and blue patterns (pixels).
  • the glass substrate after ink ejection was placed in an oven at 230 ° C. for 30 minutes and subjected to beta treatment to cure each pixel, thereby producing a color filter.
  • ITO indium stannate
  • the formation of a dark color separation wall is performed except that the formulation of the photosensitive resin composition K1 described above is changed to the following formulation S1 of the coating solution for photosensitive resin layer Spacers were formed by the same method as above.
  • exposure, development, and beta are as follows.
  • Proximity exposure is performed at 60 mjZcm 2 with an ultrahigh pressure mercury lamp through a predetermined photomask and temporary support, and after the exposure, a KOH developer (CDK manufactured by Fuji Photo Film Co., Ltd.) is used.
  • the substrate was baked at 230 ° C for 30 minutes, and a columnar spacer having a diameter of 16 / ⁇ ⁇ and an average height of 2.0 ⁇ m was formed on the upper part of the dark color separation wall on the ITO film on the glass substrate. A pattern was formed.
  • a liquid crystal display is produced by the method described in the first embodiment [0079] to [0082] of Japanese Patent Application Laid-Open No. 11 242243.
  • a device was made. Specifically, a liquid crystal display device was produced as follows.
  • the gate patterns 200 and 210 and the common patterns 300 and 310 are formed by depositing and patterning a metal film on the substrate 100.
  • the gate insulating film 400, the amorphous silicon layer 800, and the doped amorphous silicon layer 900 are sequentially deposited, and the amorphous silicon layer 800 and the doped amorphous silicon layer 900 are patterned together. -Take it.
  • a chromium layer and an aluminum layer are sequentially deposited to a thickness of about 500 mm and 2000 mm, respectively.
  • the chromium film 501 is patterned.
  • the data line 500, the source electrode 510, the drain electrode 620, and the pixel patterns 600 and 610 are formed.
  • the amorphous silicon layer 900 that is not covered with the source electrode 510 and the drain electrode 620 is etched to complete the resistive contact layers 910 and 920.
  • a protective film 700 is deposited on the entire surface of the substrate.
  • Example 1 the mask used is a mask in which the pattern shape is a lattice and the radius of curvature of the dark color separation wall at the corner where the inner angle of the pixel portion is less than 180 ° is 2.1 ⁇ m. Except for the above, a dark color separation wall is formed and a color filter is produced in the same manner as in Example 1. In addition, in this embodiment, an ITO pattern is further formed by sputtering. Thereafter, a spacer was formed by the same method as in Example 1, and a liquid crystal display device was produced in the same manner as in Example 1 except that the liquid crystal alignment control protrusion was formed by the following method.
  • Protrusions for controlling liquid crystal alignment were formed in the same manner as in Example 1, except that the formulation of the colored photosensitive resin composition K1 in Example 1 was changed to the formulation T1 of the coating liquid for photosensitive resin layer shown below. .
  • exposure, development, and beta are as follows.
  • a proximity exposure machine is arranged so that the distance between the predetermined photomask and the surface of the photosensitive resin layer is 100 m, and the irradiation energy is irradiated by an ultrahigh pressure mercury lamp through the photomask and the temporary support.
  • Proximity exposure was performed at 150 mj / cm 2 .
  • the (exposed part) was developed and removed.
  • protrusions patterned in a desired shape were formed on the glass substrate on the color filter side.
  • the liquid crystal display substrate on which the protrusions were formed was subjected to beta treatment at 230 ° C. for 30 minutes to form liquid crystal alignment control protrusions.
  • the photosensitive resin composition K1 is replaced with the photosensitive resin composition K2 prepared in the composition shown in Table 1 above, and the mask used is a corner portion having a lattice pattern and an internal angle of the pixel portion of less than 180 °.
  • the mask used is a corner portion having a lattice pattern and an internal angle of the pixel portion of less than 180 °.
  • a color filter and a liquid crystal display device were produced in the same manner as in Example 1 except that the film thickness of the color separation wall was changed to 3.1 ⁇ m.
  • a color filter and a liquid crystal display device were produced in the same manner as in Example 1 except that the ink repellent treatment by plasma treatment was replaced with the following treatment.
  • the fluorosurfactant (Florard FC-430, manufactured by Sumitomo 3M Co., Ltd.) on the side of the separation wall forming surface of the glass substrate on which the dark color separation wall is formed (the following photosensitive resin)
  • a slit-shaped nozzle with an alkali-soluble photosensitive resin (positive photoresist AZP421 0, manufactured by Hoechst Shapan Co., Ltd.) with a thickness of 2 ⁇ m.
  • the resulting coating film was heat-treated at 90 ° C. for 30 minutes in a hot air circulating dryer.
  • a dark color separation wall was formed on the glass substrate and exposed from the side (back side) through the dark color separation wall with an exposure amount of 1 lOmjZcm 2 .
  • a dark color separation wall was formed, and a power color filter and a liquid crystal display device were produced.
  • the mask is replaced with a mask in which the radius of curvature of the dark color separation wall is 0.3 / zm at the corner where the pattern shape is a grid and the inner angle of the pixel portion is less than 180 °.
  • a dark color separation wall was formed, and a color filter and a liquid crystal display device were produced.
  • a layer is formed so as to have the same thickness as the examples and comparative examples, and pattern exposure is not performed.
  • a sample film was obtained by performing the same operation as in each example and each comparative example, and the transmission optical density of each sample film obtained was measured at 555 nm using a spectrophotometer (manufactured by Shimadzu Corporation, UV-2100). (OD).
  • OD transmission optical density
  • the transmission optical density (OD °) of the glass substrate used here was measured by the same method. The value obtained by subtracting OD ° from the measured OD force was also used as the transmission optical density of the dark color separation wall.
  • Each color filter produced in each example and each comparative example was observed with an optical microscope in the thickness direction from the pixel formation side of the glass substrate to evaluate color mixing and white spots. Evaluation was made for color mixing by observing the power of color mixing in each pixel and whether ink remains on the upper surface of the dark color separation wall. Each was done by observing whether there was a spot. In addition, the observation of mixed colors was performed on any 1000 pixels in the color filter, and the observation on white spots was performed on any 1000 points in the corners of the pixels.
  • the color mixture is 5 or more and less than 10.
  • the density unevenness was determined for 10 people in each area in the area of 10 cm X 10 cm.
  • FIG. La is a schematic plan view for explaining the appearance of white spots when pixels and dark color separation walls are observed in the thickness direction of the substrate.
  • Fig. Lb is a cross-sectional view taken along line A-B in Fig. La.
  • FIG. 5 is a diagram for explaining a measurement part for obtaining a radius of curvature.
  • [6A] It is a conceptual diagram showing pixels formed in a delta arrangement.
  • ⁇ 6B It is a conceptual diagram showing pixels formed in a stripe shape or a lattice shape.

Abstract

L'invention concerne un élément optique qui présente sur un substrat plusieurs pixels et des parois hyperchromiques de séparation des pixels qui séparent les pixels, les pixels étant formés en projetant une goutte liquide d'une composition colorante liquide entre les parois hyperchromiques de séparation des pixels, les parois hyperchromiques de séparation des pixels étant formées en stratifiant sur le substrat un matériau photosensible de transfert doté d'une couche de résine photosensible sur un support temporaire et en exposant ensuite la couche de résine photosensible à travers le support temporaire. Lorsqu'on l'observe depuis le côté du substrat qui présente la surface de formation des pixels et dans la direction de son épaisseur, la frontière entre les pixels et la paroi hyperchromique de séparation des pixels a la forme d'une courbe dont le rayon de courbure est de 0,5 en un coin où l'angle intérieur d'une partie de pixel est inférieur à 180°.
PCT/JP2006/323612 2005-11-28 2006-11-27 Element optique, procede pour sa fabrication, et affichage a cristaux liquides WO2007061097A1 (fr)

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CN102830457B (zh) * 2012-08-13 2015-08-26 深超光电（深圳）有限公司 一种彩色滤光片基板

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JPS63184706A (ja) * 1987-01-28 1988-07-30 Matsushita Electric Ind Co Ltd 液晶表示体用カラ−フイルタ
JPH08271720A (ja) * 1995-03-30 1996-10-18 Canon Inc カラーフィルタ、その製造方法および液晶表示装置
JPH0921910A (ja) * 1995-07-07 1997-01-21 Toray Ind Inc カラーフィルタ、カラーフィルタ製造方法、カラー液晶表示素子およびカラーイメージセンサ
JP2002131735A (ja) * 2000-10-20 2002-05-09 Canon Inc 液晶素子とその製造方法
WO2003030131A1 (fr) * 2001-08-29 2003-04-10 Seiko Epson Corporation Dispositif electro-optique et appareil electronique
JP2004177793A (ja) * 2002-11-28 2004-06-24 Seiko Epson Corp 微細構造物の製造方法およびこの微細構造物の製造方法を用いて製造された自発光素子、光学素子、デバイス並びにこのデバイスを備えた電子機器
JP2006010883A (ja) * 2004-06-23 2006-01-12 Dainippon Printing Co Ltd カラーフィルタおよびその製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63184706A (ja) * 1987-01-28 1988-07-30 Matsushita Electric Ind Co Ltd 液晶表示体用カラ−フイルタ
JPH08271720A (ja) * 1995-03-30 1996-10-18 Canon Inc カラーフィルタ、その製造方法および液晶表示装置
JPH0921910A (ja) * 1995-07-07 1997-01-21 Toray Ind Inc カラーフィルタ、カラーフィルタ製造方法、カラー液晶表示素子およびカラーイメージセンサ
JP2002131735A (ja) * 2000-10-20 2002-05-09 Canon Inc 液晶素子とその製造方法
WO2003030131A1 (fr) * 2001-08-29 2003-04-10 Seiko Epson Corporation Dispositif electro-optique et appareil electronique
JP2004177793A (ja) * 2002-11-28 2004-06-24 Seiko Epson Corp 微細構造物の製造方法およびこの微細構造物の製造方法を用いて製造された自発光素子、光学素子、デバイス並びにこのデバイスを備えた電子機器
JP2006010883A (ja) * 2004-06-23 2006-01-12 Dainippon Printing Co Ltd カラーフィルタおよびその製造方法

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