TW200841125A - Method of producing photosensitive resin film, transfer material, substrate with pixel separation wall, color filter and production method thereof, and display device - Google Patents

Abstract

The invention provides a method of producing a photosensitive resin film comprising a process of preparing, by adding an ink repellent agent, a photosensitive resin composition having a difference in surface energy before and after the addition of the ink repellent agent of 2 mN/m or more, and a process of forming a photosensitive resin film by applying the photosensitive resin composition onto a substrate or a temporal support and vacuum drying the composition; a method of producing a photosensitive resin film comprising a process of drying a film formed by applying a photosensitive resin composition containing an ink repellent agent at an air flow rate of 0.5 m/s or less at 0.5 cm above the film surface; a transfer material; a substrate with a pixel separation wall; a color filter and a production method thereof; and a display device.

Description

200841125 IX. Description of the Invention: [Technical Field of the Invention] A method for forming a photosensitive resin film, a photosensitive transfer material, a substrate with a painting wall, a color filter, and the like System and display device. [Prior Art] In recent years, the demand for liquid crystal display 7K devices and liquid crystal color televisions for personal computers has been increasing, and the demand for improved color characteristics and cost reduction of such color filters which are indispensable for such displays has increased. As a method of producing a color filter, a dyeing method, a pigment dispersion method, an electrodeposition method, a printing method, and the like are carried out. For example, the dyeing method is to form a water-soluble polymer material layer of a dyeing material on a transparent substrate, and after patterning it into a desired shape by a lithography step, the resulting pattern is immersed in a dyeing bath to obtain a coloring. pattern. By repeating this step three times, a coloring layer formed of three coloring portions of R (red), G (green), and B (blue) can be formed. Further, the pigment dispersion method is a method which has been popular in recent years, and a photosensitive resin layer in which a pigment is dispersed is formed on a transparent substrate, and patterned to obtain a monochromatic pattern. By repeating this step three times, a coloring layer formed of three coloring portions of R, G, and B can be formed. In addition, the electrodeposition method is to pattern a transparent electrode on a transparent substrate, and immerse it in an electrodeposition coating liquid to which a pigment, a resin, an electrolyte or the like is added, to electrode the first color, and repeat this step. Three times, a coloring layer formed of three coloring portions of R, g, and B was obtained, and finally, calcination was performed. The printing method is a method in which a pigment is dispersed in a thermosetting resin of 200841125, and R, G, and b are respectively applied by repeating printing three times, and then the resin is thermally cured to form a colored layer. Since these methods form three-color pixels of red, green, and blue, the same step must be repeated three times, and the cost is high. Moreover, since the number of steps is large, there is also a problem that the yield is easily lowered. In view of the above, in recent years, a color filter manufacturing method in which a black matrix (a painting wall) is formed by a pigment dispersion method and an RGB pixel is formed by an inkjet method is reviewed. In the ink jet method, for example, a concave portion surrounded by a black matrix which is a dividing wall between the pixels, and a liquid of each of R, G, and B colors are sequentially applied to form a colored region (e.g., a pixel). The method using the ink jet method has the advantages of simple process and low cost. Further, the ink jet method is not limited to the production of a color filter, and can be applied to the manufacture of other optical elements such as an electroluminescence element. In the ink jet method described above, it is necessary to prevent the occurrence of ink color mixing or the like between adjacent pixel regions or the phenomenon in which the IT 0 solution or the metal solution in the portion other than the designated region is solidified and adhered. Therefore, it is required that the drawing wall such as a black matrix has a property of repelling water or an organic solvent of the coating liquid discharged by the inkjet method, that is, so-called water repellency and oil repellency. In connection with water repellency and oil repellency, there is a photoresist composition which reveals a copolymer of a fluoroalkyl group-containing (meth) acrylate monomer and a hydrazine chain-containing ethylenically unsaturated monomer, and is described for the photoresist composition. In the solid content of the solid, a copolymer in a range of 0.001 to 0.05% by mass is added (for example, see JP-A-9-54432). Further, there is disclosed a coating composition comprising an ethylenic polymer, a photosensitive resin, and an organic solvent obtained by polymerizing a monomer composition containing an alkylene monomer having a fluorocarbon 200841125 group. Japanese Patent Publication No. 2004-2733, and discloses a photoresist composition comprising a vinyl polymer obtained by polymerizing a monomer composition containing a vinyl monomer having a fluoroalkyl group having 4 to 6 carbon atoms, and sensitizing Body (for example, Japanese Patent Publication No. 2 0 0 5 - 3 1 5 9 8 4). According to the composition of the photoresist composition or the coating composition, the water-repellent property and the oil-repellent property are not sufficient when the coating film is formed, and Inking, the film surface control of the coating film becomes difficult, and the film variation is likely to occur in the step of drying after application. If the thickness of the film itself before pattern formation is not uniform, the in-plane uniformity of the pattern formed by the film cannot be maintained, which hinders the formation of a uniform pattern. Therefore, a color filter or a display device capable of displaying high-quality image without display unevenness is not obtained. The present invention has been made in view of the above problems, and an object of the invention is to provide a method for forming an in-plane film of a photosensitive resin film, a method of forming a photosensitive resin film having a large thickness, and a method for forming a pattern image (for example, a wall) The photosensitive transfer material of the photosensitive resin film which is excellent in the water-repellent and ink-repellent characteristics of the image pattern formed by the transfer (for example, the painting wall) and the in-plane uniformity. Moreover, an object of the present invention is to provide an ink-preventing ink when a paint wall for forming a black matrix or the like for forming a pixel group for forming a pixel group is used in advance by using a resin composition containing an ink-repellent agent. It is possible to form a resin film for forming a wall which is suppressed in film thickness variation by a good ink repellency from the spread of the wall, and it is possible to obtain a film of a photosensitive resin film having a small height unevenness from the wall. Method and photosensitive transfer material. Further, an object of the present invention is to provide a high-grade color filter which produces color mixing, uneven color, and the like, and a method for manufacturing the same, and a high-quality image which can suppress the occurrence of unevenness in display. Display device. The specific means for achieving the above problems are as follows. &lt; 1 &gt; A method of forming a photosensitive resin film comprising the step of adding a photosensitive resin composition having a difference in surface energy between the surface of the ink-repellent agent and the surface energy after the addition of 2 mN/m or more And a step of applying the photosensitive resin composition onto a substrate or a temporary support and vacuum drying to form a photosensitive resin film. The method of forming a photosensitive resin film according to the above-mentioned item, wherein the vacuum drying is performed at a degree of vacuum of 1 (T3Pa or less). <3> Photosensitive property as described in the above &lt;1&gt; A method of forming a resin film, wherein the ink-repellent agent comprises (a) a repeating unit having at least a fluorine atom in a side chain, (b) a repeating unit having a polyether structure in a side chain, and (c) a carboxyl group in a side chain; The method for forming a photosensitive resin film according to the above <3>, wherein the (b) repeating unit having a polyether structure in a side chain has a blocked polyether structure in a side chain. The method of forming a photosensitive resin film according to the above-mentioned item, wherein the amount of the ink-repellent agent added is 0.5% by mass based on the total solid content of the photosensitive resin composition. The photosensitive photosensitive material layer formed on the temporary support by the method of forming the photosensitive resin film according to the above &lt;1&gt; is &lt;6&gt;7&gt; - a method of producing a color filter, The method of forming a photosensitive resin film according to the above &lt;1&gt;, or the photosensitive transfer material according to the above &lt;6&gt;, forming a painting wall on a substrate; and The step of forming the colored region by the inkjet method in the concave portion on the substrate divided by the wall. <8> A color filter manufactured by the method for producing a color filter according to the above &lt;7&gt; A display device comprising the color filter according to the above <8>. <10> A method for forming a photosensitive resin film, comprising: applying a photosensitive agent containing an ink repellent And a coating step of drying the coating film formed by applying a gas having a height of 〇5 cm from the film surface of 〇·5 m/s or less. &lt;11 &gt; The method of forming a photosensitive resin film according to the above-mentioned item, wherein the drying is performed by blowing the surface of the coating film at a flow rate of a wind speed of 0.5 m/s or less. &gt; Formation of the photosensitive resin film as described in the above &lt;10&gt; In the method of forming a photosensitive resin film, the method of forming a photosensitive resin film according to the above <1>, wherein the vacuum degree is 1 (T3 Pa or less). The ink-repellent contains (a) a repeating unit having at least a fluorine atom in a side chain, (b) a repeating unit having a polyether structure in a side chain, and (c) a repeating unit having a carboxyl group in a side chain. The method of forming a photosensitive resin film according to the above-mentioned item (1), wherein the (b) repeating unit having a polyether structure in a side chain has a blocked polyether structure. &lt; 1 5 &gt; A photosensitive transfer material having a photosensitive resin layer formed by the method for forming a photosensitive resin film according to the above &lt;10&gt;&lt;16&gt; A substrate with a wall away from the crucible, which is provided with a resin-coated wall film containing an ink-repellent agent and having an in-plane film thickness uniformity of ±5 % or less. &lt;17&gt; A method of producing a color filter, which comprises the method of forming a photosensitive resin film according to the above &lt;1&gt;, or the photosensitive transfer material described in &lt;15&gt; a layer forming step of forming a photosensitive resin layer on a substrate, a step of exposing the formed photosensitive tree/lipid layer into a pattern by a photomask, and forming a separation wall forming step from the image wall, and the above-mentioned painting The concave portion on the substrate divided by the wall is subjected to a coloring liquid composition by an inkjet method to form a colored region forming step of the colored region. &lt;18&gt; A color filter produced by the method of producing the color ® filter described in the above &lt;17&gt;. &lt; 1 9 &gt; A display device comprising the color filter described in the above &lt; i 8 &gt; BEST MODE FOR CARRYING OUT THE INVENTION A method for forming a photosensitive resin film of the present invention, a photosensitive transfer material using the same, a substrate with a paint removing wall, a color filter, and a method for producing the same, Display device. -10-200841125 &lt;Formation Method of Photosensitive Resin Film&gt; The method for forming a photosensitive resin film according to the first embodiment of the present invention includes the following steps: before and after the addition of the ink-repellent agent a step of forming a photosensitive resin composition having a difference in surface energy of 2 mN/m or more; and coating the photosensitive resin composition on a substrate or a temporary support and vacuum drying to form a photosensitive resin film. In the method for forming a photosensitive resin film according to the second embodiment of the present invention, a coating step of applying a photosensitive resin composition containing an ink-repellent agent to a substance φ is provided, and a coating step from the film surface A drying step in which the flow rate of the coating film formed by coating is formed by a flow rate of 0.5 m/s or less of a height of 0.5 cm. The method of forming the photosensitive resin film according to the first and second embodiments of the present invention may be carried out by providing other steps as needed. - Photosensitive resin composition - The photosensitive resin composition of the present invention contains at least one type of ink-repellent agent, and an initiator, a binder, an ethylenically unsaturated compound, a color material, and It is composed of other additives. # The photosensitive resin composition is composed of an ink-repellent agent, so that the water-repellent and ink-repellent properties of the image surface formed by using the photosensitive resin composition can be improved. Further, the photosensitive resin composition is suitable for the method for forming a photosensitive resin film of the present invention, and a resin composition containing an ink-repellent agent can be used, and the film surface operation at the time of film formation can be easily performed, and water-repellent and ink-repellent can be given. A coating film having high in-plane uniformity is obtained. Since the water contact angle is measured by the method described in JIS R3 2 5 7 by containing the ink-repellent, the water contact angle of the image surface before the heat treatment is applied as -11-200841125 as A°, at 24 0 °C For 50 minutes, the water contact angle of the image surface after cooling treatment is regarded as 8°, and (B°-A.) is 20° or more for water repellency and ink repellency. The water connection is as follows. Further, since the ink repellent is contained, the water repellency and the ink repellency of the surface of the painting wall formed by the use of the photosensitive light can be maintained, and the adhesion between the wall and the substrate on which the painting wall is formed can be maintained. In the recessed portion, the coloring liquid composition is applied to form a color filter, and color mixing, color unevenness, and the like can be suppressed, and the photosensitive resin group ink of the first embodiment of the present invention is added before and after the addition. When the surface energy difference is 2 mN/m and the film thickness uniformity, the surface energy difference is more than 4 mN/m, more preferably 2.1 mN/m or more and 3, by making an ink-repellent agent. Before the surface energy difference between the addition and the added photosensitive surface is 2 mN/m or more, the photosensitive resin film formed by using the resin composition is subjected to exposure treatment, and the pattern image formed on the substrate can be dialed. The water is good. Further, by vacuum drying, the occurrence of variations in the photosensitive resin formed by coating or transfer on the photosensitive suppression substrate is formed. In general, the addition of an ink repellency reduces the sensitivity of the photosensitive resin. Therefore, before and after the addition of the ink-repellent agent, the surface energy before the addition can be subtracted from the surface energy after the addition. The surface energy can be determined by, for example, a surface tension meter, and the contact angle difference antenna is given for 1 hour. The detailed resin composition maintains the detachment well, in the colored area of the painted wall, and the scoop occurs. For the sake of things, dial the above. The coating is from 2 mN/m to less than .5 mN/m. Resin composition The photosensitivity, development, heat and ink repellency of the ink are formed into a resin film, so that the surface energy of the film thickness in the surface of the film can be poor, which means that m 〇-12- 200841125 By adding 0.01 to 30% by mass of an ink-repellent to be described later to the total solid content of the photosensitive resin composition, the surface energy difference is within the above range. In the present invention, the amount of the ink-repellent agent added is preferably 〇.% by mass or more, and particularly preferably 0.2% by mass, based on the total solid content of the photosensitive resin composition. The above is 10% by mass or less, and more preferably 5% by mass or more and t% by mass or less. 1) Ink-repellent agent # The photosensitive resin composition of the present invention contains at least one type of ink-repellent agent. The ink-repellent agent is preferably a compound containing a halogen atom or a fluorine atom having a small affinity for a resin component such as a binder which is contained in a material such as a black matrix or the like, and more preferably a fluorine atom-containing compound. The above-mentioned ruthenium atom-containing compound may, for example, be a linear organopolysiloxane having a molecular weight of several thousand to several hundreds of thousands in the following repeating units. # [ t ' --Si—Ο--

I R ′η η In the above repeating unit, η represents an integer of 2 or more. R each independently represents an alkyl group, an alkenyl group or a phenyl group having 1 to 1 carbon atoms. Such a linear organopolyoxane is sparsely crosslinked to obtain a silicone rubber. Crosslinking agent used for cross-linking is a so-called room temperature (low temperature) hardening type of silicone rubber. Ethylene 200841125 Oxygen enamel, ketone broth, alkoxy sand, amine sand, guanamine A decyl alkane or an oxy oxane or the like is usually combined with a hydroxyl group at the end of a linear organopolyoxane to obtain a deacetic acid type, a deamination type, a dealcoholization type, a deamination type, a dealuamine type, and a deacetylation type. Ketone type silicone rubber. Further, a small amount of an organic tin compound or the like as a catalyst is added to the silicone rubber. The compound containing a fluorine atom-containing repeating unit is preferably a compound containing a repeating unit having a fluorine atom, and preferably contains (a) a repeating unit having at least a fluorine atom in a side chain, from the viewpoint of ink repellent property. (b) a fluorine-containing compound having a repeating unit of a polyether structure in the side chain and (c) a repeating unit having a carboxyl group in a side chain. Hereinafter, the fluorine-containing compound will be described in detail. - (a) a repeating unit having at least a fluorine atom in a side chain - The fluorine-containing compound of the present invention preferably contains (a) a repeating unit having at least a fluorine atom in a side chain. Thereby, water repellency and ink repellency can be given. As the repeating unit having at least a fluorine atom in the side chain, a repeating unit having a fluorinated alkyl group having a total carbon number of 4 to 8 is preferable, and the fluorinated alkyl group may be a straight chain or a branched chain. More preferably, the following structural formula (A) is used. R1

X—L^Rf Structural Formula (A) -14- 200841125 In the above structural formula (A), R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. The hospital base having a carbon number of 1 to 5 may contain, for example, a methyl group or an ethyl group. In the above structural formula (A), 'a' represents a mass ratio (% by mass) of the structural formula (A) which is present in the total mass of the fluorine-containing compound. The specific range of a is as follows. In the above structural formula (A), X1 represents an ether group, an ester group, a decylamino group, an extended aryl group, or a divalent heterocyclic residue. The exoaryl group represented by X 1 is preferably an exo-aryl group having a total carbon number of 6 to 20, and examples thereof include a phenyl group, a naphthyl group, a fluorene group, and a biphenyl group. It can be substituted by 〇-, p-, m-. Among them, an aryl group having a carbon number of 6 to 12 is more preferred, and a phenyl group and a phenyl group are particularly preferred. The heterocyclic residue represented by X1 is, for example, preferably a divalent heterocyclic residue derived from a 5-shell or 6-membered heterocyclic ring containing a nitrogen atom or a string/atom as a ring. As a specific example, the oxime ratio B ring, _ π ring, oxime ring, thioxan ring, benzothiazole ring, carbazole ring, benzoxazole ring, isoxazole ring, pyridinium ring, ip mouth The ring, the 嗤n forest ring, the thiadipine d ring, and the like are suitable, and the divalent heterocyclic residue derived from the D ring, the thiophene ring, etc. is more preferable. In the above, X1 is preferably a linking group or a linking group having the following structure.

Here, Rx represents a hydrogen atom, an alkyl group having a total carbon number of 1 to 12, or an aryl group having a total carbon number of 6 to 20%. Examples of the alkyl group having a total carbon number of 1 to 12 represented by Rx include a methyl group, an ethyl group, a propyl 'butyl group, a hexyl group, an octyl group, an unsubstituted alkyl group having a dodecyl group, and an ether group. a substituted alkyl group having a substituent of a thioether group, an ester group, a decylamino group, an amine group, a urethane group, a hydroxyl group or the like. Among them, an alkyl group having a total carbon number of 1 to 8 is preferred, and a methyl group, a butyl group or an octyl group is more preferred. Examples of the aryl group having a total carbon number of 6 to 20 represented by Rx include a phenyl group, a naphthyl group, a methylphenyl group, a methoxyphenyl group, and a nonylphenyl group. Among them, an aryl group having a total carbon number of 6 to 15 is more preferable, and a phenyl group or a nonylphenyl group is more preferable. In the above structural formula (A), as L1, the following linking group or a linking group having the following structure is preferable.

RY represents a hydrogen atom or a methyl group. η represents an integer of 2 to 20, preferably an integer of 4 to 12. The ruthenium is preferably a single bond, a linking group described below, or a linking group having the following structure. 200841125

n represents an integer of 2 to 20', and preferably represents an integer of 4 to 12. R3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, preferably a hydrogen atom. In the above structural formula (Α), Rf represents a fluorine-containing group. Rf is preferably a fluorine-containing group having the following structure or a fluorine-containing group having a group having the following structure. Ten CmF condition F j condition H] [/CF3] 7cf3 乂 -CmF2nT-CF €F3 — one xcf3 j

m represents an integer of 1 to 20, preferably an integer of 4 to 12. In the above structural formula (A), R1 is a hydrogen atom, ruthenium is an ester group, and Li is a linking group or a linking group having the following structure (RY, η, and Y are as described above, and preferred aspect) Also in the same manner as described above, it is preferred that Rf is a fluorine-containing group having the above structure or a fluorine-containing group having a group having the above structure. -17- 200841125

~ (b) a repeating unit having a polyether structure in a side chain - The fluorine-containing compound of the present invention more preferably contains (b) a repeating unit having a polyether structure in a side chain. By including this repeating unit', the adhesion between the cured film formed of the photosensitive resin composition containing a fluorine-containing compound and the substrate can be improved. Examples of the polyether structure include polyethylene oxide, polypropylene oxide, polytetrahydrofuran, and the like, and these may be combined in plural. More preferably, the following structural formula (B) is mentioned. f R2j b Structural Formula (B) n In the above structural formula (B), R2 represents a hydrogen atom and an alkyl group having 1 to 5 carbon atoms, and preferably represents a hydrogen atom, a methyl group or a hydroxymethyl group. In the above structural formula (B), η is preferably from 4 to 40, more preferably from 9 to 30, particularly preferably from 12 to 24. In the above structural formula (Β), b represents a mass ratio (% by mass) of the structural formula (B) which is present in the total total mass of the fluorine-containing compound. The specific range of b is as described in 200841125. 2-valent linkage. As a 2 2 valent linking group. In the above structural formula (B), L2 is preferably a single bond or a valent linking group, and more preferably L2 in the structural formula (B) represented by the following structural formula, more preferably a single bond.

Η

In the above structural formula (Β), μ represents a repeating unit of a repeating unit of polypropylene oxide, or a repeating unit of polytetrahydrofuran. Further, as the ruthenium, a group having the following structure is more preferable.

(c)

R5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. 1 tooth 0 π is not an integer of 2 to 20, more preferably an integer of 4 to 12. Preferably, the epoxicone 711 _ ' R5 represented by the above (a) is preferably a hydrogen atom. In the above structural formula (B), R4 represents a hydrogen atom and a carbon number! The alkyl group of -20, or the aryl group of 6-15, the alkyl group and the aryl group may be unsubstituted and have a substituent. The alkyl group represented by R4 may, for example, be a methyl group, an ethyl group, a propyl group, a hexyl group, an octyl group or an octadecyl group, and more preferably a methyl group or an octyl group. -1 9 - 200841125 The aryl group represented by R4 may, for example, be a phenyl group, a methylphenyl group, a nonylphenyl group or a methoxyphenyl group, and a phenyl group or a nonylphenyl group is preferred. The (b) repeating unit having a polyether structure in the side chain of the present invention is preferably a blocked type from the viewpoint of ink repellent property. Here, the term "polyether structure" as a capped type means an alkyl group or an aryl group other than a hydroxyl group at the distal end of the main chain from the polyether structure in the repeating unit. Specifically, for example, R4 in the above structural formula (B) is an alkyl group or an aryl group. In the present invention, R4 is more preferably a methyl group or a phenyl group. Φ In the above structural formula (B), R2 is a hydrogen atom, a methyl group or a methylol group, L2 is a single bond, and hydrazine is an ethylene oxide chain or a group (R5 represents a hydrogen atom. 1 represents 2~) An integer of 20), R4 is a blocked polyether structure of an alkyl group or an aryl group, and η is preferably a repeating unit of 1 2 to 2 4 .

A commercially available product of the vinyl compound having the polyether structure is exemplified by Nippon Oil Co., Ltd.: Blenmer® 200, ΡΜΕ550, ΡΜΕ1000, 50POEP-800P, ALE800, PE 1 3 00, ANE 1 3 00, PSE- 1 3 00, PMEP- 1 200B04 1 ΜΑ, ΡΕ3 5 0, ΡΡ 800, Xinzhongcun Chemical Co., Ltd.: Ν K Ester AM 1 30G, M23 0G, M90G, M40G, AMP-60G, OC-18E, A-SAL-9E, A-CMP-5E, and Kyoeisha Co., Ltd.: Light Ester 04 1 ΜA, etc. ~ (c) a repeating unit having a carboxyl group in a side chain - The fluorine-containing compound of the present invention more preferably contains (c) a repeating unit of -20-200841125 having a carboxyl group in a side chain. The repeating unit having a carboxyl group in the side chain is not particularly limited and may be appropriately selected from those skilled in the art, and examples thereof include (meth)acrylic acid 'vinyl benzoic acid, maleic acid, and monoalkyl maleate. , fumaric acid, itaconic acid, crotonic acid, cinnamic acid, sorbic acid, cyanocinnamic acid, acrylic acid dimer, addition reaction of hydroxyl group-containing monomer with cyclic anhydride, ω-carboxy-poly Lactone mono(meth)acrylate and the like. These can be used with any of the manufacturer and the towel. The hydroxyl group-containing monomer used for the addition reaction of the hydroxyl group-containing monomer and the cyclic acid anhydride may, for example, be 2-hydroxyethyl (meth)acrylate. Examples of the cyclic acid anhydride include maleic anhydride, phthalic anhydride, and cyclohexanedicarboxylic anhydride. As the above-mentioned commercial products, the East Asian Synthetic Chemical Industry Co., Ltd. system can be cited: A r ο ni X Μ - 5 3 00, Aronix M-5 4 00, Aronix M-5500, Aronix M-5 600, Xinzhongcun Chemical Industrial (stock) system: NK ester CB-1, NK Ester CBX-1, Kyoritsu Oil and Fat Chemical Industry Co., Ltd.: hOA-MP, HOA-MS,

Osaka Organic Chemical Industry Co., Ltd.: Biscoat #2100 and so on. Among these, 'the repeating unit represented by the following structural formula (C), (meth)acrylic acid, etc. are preferable from the viewpoint of excellent imaging performance and low cost.

In the above structural formula (C), R6 represents a hydrogen atom or a methyl group. Further, in the structural formula (C), c represents the total mass of the fluorine-containing compound - 21 -

Mass ratio (% by mass) of the structural formula (C) of 200841125. The specific range of c is such that when the fluorine-containing compound of the present invention contains the above structural formula (A), the specific range of a in (A) is preferably from 4 to 85% by mass, more preferably from % by mass, most preferably 5 0 to 8 0% by mass. When the fluorine-containing compound of the present invention contains the above structural formula (B), the specific range of b in (B) is preferably 10 to 5 % by mass, more preferably % by mass, most preferably 2 to 50% by mass. %. When the fluorine-containing compound of the present invention contains the above structural formula (C), the specific range of C in (C) is preferably 〇" to 5 〇 mass%, more preferably | mass%, most preferably 1 to 30 mass. %. The fluorine atom content in the fluorine-containing compound is preferably from 3 6 to 7 0, preferably from 3 6 to 65% by mass, most preferably from 3 6 to 60% by mass. When the content of the fluorinated fluorine atom is 36% by mass or more, when the coloring RGB such as the colored region RGB is formed, the ink can be prevented from spreading on the paint wall when the coloring liquid is administered. In the case of the precipitation of the content during the synthesis, the solubility of the photosensitive resin composition having a longevity can be further improved if it is 60% by mass or less. The content of the fluorine-containing compound in the photosensitive resin composition is preferably from 0.01 to 30% by mass, particularly preferably from 20 to 20% by mass, more preferably from 0.1 to 1% by mass, based on the total solid content of the compound. When the fluorine-containing compound is in the above range, in the case where the colored region (for example, RGB or the like is formed, when the liquid droplet of the colored liquid composition is applied, K can be spread on the drawing wall to obtain adhesion to the substrate. The fluorochemical compound of the ink-repellent agent of the present invention is described later from the ink-repellent agent 1. Structural formula 5 0 to 8 5 Structural formula 15-50 Structural formula I 1 to 40 % by weight, more; (For example, J droplet fluorination compound ^ composition is 0.05 3 added amount of color pixels) Ϊ stop printing ink concentration. Ξ之点来-22- 200841125 See, the above (a) repeat unit is 50~75 mass %, the repeating unit of the above (b) is 20 to 50% by mass, and the repeating unit of the above (c) is preferably 1 to 30% by mass. The molecular weight of the fluorine-containing compound of the present invention is determined by gel permeation chromatography. The polystyrene-equivalent weight average molecular weight obtained by the technique (GPC) is preferably from 2,000 to 3 Å, more preferably from 3,000 to 20,000. Specific examples of the fluorine-containing compound of the present invention are shown below [exemplary compound (1) ~(2 6)] However, in the present invention, it is not limited thereto. Who, ® on the composition ratio of the components (a, b, c) 'may be selected in the range of the preferred ratio of the composition.

-23- 200841125 [Illustrative compound (υ]

a bucket ch3 ο 9

c OH [exemplified compound (3)]

[Exemplary Compound (4)] ◦^\^C6F13 ο Bu CH3〇 23

c OH [exemplified compound (5)] a [exemplified compound (6)]

Ia O o-f^s/0 c , CH3 〇 gossip 23 k^cv〇

COOH

Ch3 0^0 23 k^COOH -24 - 200841125 [exemplary compound (7)] a

q^〇^Y^C6F13〇^〇 OH

[Illustrative Compound (8)]

a C6F13 [Exemplified Compound (9)] Ο

&quot;CH3 ο^οη 23 a

• CF fcF o^o^c4f8- CF〒3 〇^〇 [Exemplified compound (1 0)] ο&quot; a iJ 5 〇^v^C6Fi3 o^o C exemplified compound (1 1 )]

J a [exemplified compound (1 2 )] b 0-

.0 .0 2§H3

c OH

c ch3 o^oh 30

〇 b 外 CH^^OH 45 -25 - 200841125 [Exemplified Compound (1 3 )] a _ 0^〇^\^C6F13 〇^〇·|^ν^〇 [Exemplified Compound (1 4 )]

i c , CH3 o eight OH 91

a C exemplified compound (1 5)] a Q person Q^n^C6F13 〇 [exemplary compound (16)]

b

b 0, '0 [exemplary compound (1 7)]

a Ο^Ό 4

Ό

匸6"13 〇 丄 , C6F13 30 b C exemplified compound (18)

c OH 30 -26 - 200841125 [exemplary compound (1 9)] a F: 3

[Illustrative compound (2 Ο)]

a Nb 〇人〇

[Illustrative Compound (2 1 )]

(Illustrated Compound (2 2 )]

a

, 〇 a^C6F13 [exemplified compound (2 3 )] a 〇^〇-^^C6F13 q&lt; [exemplary compound (2 4 )]

a 0,,0

Jb bucket c8h17 οΊη 18

Jb r i C , 〇f^0卜iC13H27 〇人〇H 9 c n

0, J^, C8Hl7 0 people 0H -27 - 200841125 [exemplary compound (2 5)]

卜fb『 〇人 O^O^Y^C6F13

OH

2) Initiator The photosensitive resin composition of the present invention can be constituted by using at least one type of initiator. As a method of curing the photosensitive resin composition, a thermal initiation system using a thermal initiator or a photoinitiator using a photoinitiator is generally used. However, in the present invention, the image-removed wall after hardening is a shape system as described later. Importantly, it is preferred to use a photoinitiation system. The photopolymerization initiator is irradiated with radiation (also referred to as exposure) of visible light, ultraviolet rays, far ultraviolet rays, electron beams, X-rays, or the like, and can generate an ethylenically unsaturated compound (polyfunctional monomer) which will be described later. The compound 'the polymerized active species' can be appropriately selected from a well-known photopolymerization initiator or photopolymerization initiator system. Examples of the photopolymerization initiator or the photopolymerization initiator include a trihalomethyl group-containing compound, an acridine compound, an acetophenone compound, a bisimidazole compound, a triterpenoid compound, a benzoin compound, and a diphenyl group. A ketone-based compound, a -28-200841125 α-diketone compound, a polynuclear oxime compound, a xanthone compound, a diazo compound, or the like. Specifically, the trihalomethyl-substituted trihalomethylcarbazole derivative or the s-tri-negative derivative described in JP-A-200 1 - 1 1 723 0 can be cited in the specification of US Pat. No. 423,985. a trihalomethyl-s-tripper compound, a trihalomethyl-containing compound such as a trihalomethyloxadiazole compound described in the specification of U.S. Patent No. 4,221,976; 9-phenyl acridine, 9 -pyridyl acridine, 9-pyridyl acridine, L2-bis(9-11丫口) ethane, 1,3-bis(9-acridinyl)propane, hydrazine, 4-double (9- Acridine)butane, 1,5-bis(9-acridinyl)pentane, 1,6-bis(9-acridinyl)hexane, 17-bis(9-acridinyl)heptane, 1 , 8-bis(9-acridinyl)octane, anthracene, 9-bis(9-dTu-decyl)decane, 1,1 fluorene-bis(9.acridinyl)decane, 1511_bis (9- An acridine compound such as a bis(9-acridinyl)alkane such as a decyl group or a 1,1 2 -bis(9-acridinyl)dodecane; 6-(p-methoxy Phenyl)-2,4-bis(trichloromethyl)-s·tripper, 6-[p-(n,N-bis(ethoxycarbonylmethyl)amino)phenyl]-2,4- Double (trichloromethane) )_s_Sansui et al., and '9,10-dimethylbenzophenanthrene, Michler's ketone, benzophenone/Minone, Hexagonal bis-pilycol/Siliary benzophenone Dimethoate, benzyl ketal, thioxanthone/amine, 2,2,-bis(2,4-dichlorophenyl)-4,4^5,5^tetraphenyl•1,2' - Bimidazole and the like. Among the above, at least one selected from the group consisting of a trihalomethyl group-containing compound, an acridine compound, a methyl ethyl ketone compound, a bisimidazole compound, and a triple well compound is preferable. At least one selected from the group consisting of a trihalomethyl compound and an acridine compound. Trihalomethyl-containing compounds, -29-200841125 吖D-based compounds are also useful in general and inexpensive. Particularly preferably, the aforementioned trihalomethyl-containing compound is 2-trichloromethyl-5-(p-styrylstyryl)-1,3,4-oxadiazole, 2-(p-butoxybenzene) Vinyl)-5-trichloromethyl-1,3,4-oxadiazole, the aforementioned tritrap system is 6-[p-(N,N-bis(ethoxycarbonylmethyl)amino)phenyl]- 2,4-bis(trichloromethyl)_s_triazine, the acridine compound is 9-phenyl acridine, the acetophenone compound is Michler's ketone, and the biimidazole compound is 2, 2, - bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-bisimidine. The photopolymerization initiator may be used singly or in combination of two or more. The total amount of the initiator (particularly the photopolymerization initiator) in the resin composition is preferably from 0.1 to 20% by mass, based on the total solid content (mass) of the resin composition, particularly preferably from 0.5 to 10% by mass. When the total amount is 〇·1 mass% or more, the resin composition can be photocured with high efficiency, and if it is 20% by mass or less, an image pattern in which no peeling or surface cracking occurs during development can be obtained. In the present invention, the total solid content (mass) of the photosensitive resin composition means all components other than the solvent in the photosensitive resin composition. The photopolymerization initiator may be formed by using a hydrogen donor. The hydrogen donor is preferably a thiol compound or an amine compound as described above from the viewpoint that the sensitivity can be further improved. The term "hydrogen donor" as used herein refers to a compound which can supply a hydrogen atom to a radical generated from the photopolymerization initiator by exposure. The thiol compound is a compound having a benzene ring or a hetero ring as a nucleus and having one or more sulfhydryl groups directly bonded to the nucleus (hereinafter referred to as "thiol hydrogen donor"). It is preferably 1 to 3, more preferably 1 to 2. Further, -30-200841125 The amine-based compound is a compound having a benzene ring or a heterocyclic ring as a nucleus and having one or more amine groups bonded to the nucleus (hereinafter referred to as "amine-based hydrogen donor"). The amine group is preferably from 1 to 3, more preferably from 1 to 2. Further, these hydrogen donors may have both a mercapto group and an amine group. Specific examples of the above-mentioned thiol-based hydrogen donor include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, and 2,5-dimercapto-m thiazide. Oxazole, 2-mercapto-2,5-dimethylaminopyridine, and the like. Among them, 2-mercaptobenzothiazole and 2-mercaptobenzoxazole are preferred, and 2-nonylbenzene-thiazole is particularly preferred. Specific examples of the amine-based hydrogen donor include 4,4'-bis(dimethylamino)benzophenone and 4,4'-bis(diethylamino)benzophenone, and 4 Diethylaminoacetophenone, 4-dimethylaminopropiophenone, ethyl-4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-dimethylamine Benzoic acid cyanide and the like. Among them, preferred are 4,4'-bis(dimethylamino)benzophenone, 4,4,-bis(diethylamino)benzophenone, and particularly preferably 4,4. '-Bis(diethylamino)benzophenone. The hydrogen donor may be used alone or in combination of two or more. It is preferable that the image of the image is not easily peeled off from the permanent support during development, and the strength and sensitivity are also improved. One or more kinds of thiol-based hydrogen donors and one or more kinds of amine-based hydrogen donors are used in combination. Specific examples of the combination of the above-described thiol-based hydrogen donor and the amine-based hydrogen donor include 2-mercaptobenzothiazole/4,4'-bis(dimethylamino)benzophenone, and 2 -mercaptobenzothiazole/4,4'-bis(diethylamino)benzophenone, 2-phenylthioxazole/4,4'-bis(dimethylamino)benzophenone 2-mercaptobenzoxazole/4,4'-bis(diethylamino)benzophenone. A more preferred combination is 2_mercaptobenzo-31- 200841125 thiazole/4,4,-bis(diethylamino)benzophenone, 2-mercaptobenzoxazole/4,4'-double (two A particularly preferred combination of ethylamino)benzophenone is 2-mercaptobenzothiazol/4,4'-bis(diethylamino)benzophenone. When the thiol-based hydrogen donor and the amine-based hydrogen donor are combined, the mass ratio of the thiol-based hydrogen donor (M) to the amine-based hydrogen donor (A) (Μ: A) is usually 1··1. ~1:4, more preferably 1:1~1:3. The total amount of the hydrogen donor in the photosensitive resin composition is preferably from 1 to 20% by mass, particularly preferably from 0.5 to 10% by mass, based on the total solid content (mass) of the photosensitive resin composition. #3) Adhesive The photosensitive resin composition of the present invention can be suitably used by using at least one type of binder. As the binder, a polymer having a polar group such as a carboxylic acid group or a carboxylate group in a side chain is preferred. For example, JP-A-59-446-15, JP-A-54-34327, JP-A-58-12577, JP-A-54-25 957, and JP-A-59- 5 3 8 3 No. 6 and JP-A 59-7 1 (Methylacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer described in M8) And a partially esterified maleic acid copolymer, etc. Further, a cellulose derivative having a carboxylic acid group in a side chain may be mentioned. Further, a cyclic acid anhydride may be preferably added to a polymer having a hydroxyl group. Further, as a particularly preferable example, a copolymer of benzyl (meth)acrylate and (meth)acrylic acid described in the specification of U.S. Patent No. 4 1 3 93 9 1 or (meth) may be mentioned. a multicomponent copolymer of benzyl acrylate and (meth)acrylic acid and other monomers. These polar group-containing binder polymers can be used alone, -32-200841125 or can also be used with conventional film-forming polymers. The state of the composition is used. The content of the binder in the resin composition, for the tree The total solid content of the composition is generally 20 to 50% by mass, preferably 25 to 45% by mass. 4) Ethylene unsaturated compound The photosensitive resin composition of the present invention may use at least one kind of ethylenicity. It is composed of a saturated compound. As the ethylenically unsaturated compound, the following compounds may be used singly or in combination with other monomers. • Specific examples thereof include tert-butyl (meth)acrylate, ethylene glycol di(meth)acrylate, 2-hydroxypropyl (meth)acrylate, and triethylene glycol di(meth)acrylate. , trimethylolpropane tri (meth) acrylate, 2-ethyl-2-butyl propylene glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, Dipentaerythritol hexa(meth) acrylate, dipentaerythritol penta (meth) acrylate, polyoxyethylated trimethylolpropane tri(meth) acrylate, tris(2-(meth) propylene decyloxy Ethyl)isocyanurate, 1,4-diisopropenylbenzene, 1,4-dihydroxybenzenedi(meth)acrylate, VIII® methyl glycol di(meth)acrylate, benzene Ethylene, diallyl fumarate, triallyl trimellitate, lauryl (meth)acrylate, (meth)acrylamide, benzyldimethylbis(meth)acrylamide, and the like. Further, a compound having a hydroxyl group such as 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate or polyethylene glycol mono(meth)acrylate may be used, and a hexamethylene group may be used. A reaction product with a diisocyanate such as diisocyanate, toluene diisocyanate or xylene diisocyanate. Among them, particularly preferred are pentaerythritol tetraacrylate, dipentaerythritol-33-200841125 hexaacrylate, dipentaerythritol pentaacrylate, and tris(2-propenyloxyethyl)isocyanurate. The content of the ethylenically unsaturated compound in the resin composition is preferably from 5 to 80% by mass, particularly preferably from 10 to 70% by mass, based on the total solid content (mass) of the resin composition. When the content of the ethylenically unsaturated compound is within the above range, the resistance of the exposed portion of the composition to the alkali developing solution can be ensured, and when it is a resin composition, the increase in the adhesiveness can be suppressed to ensure the workability. 5) Color material # The photosensitive resin composition of the present invention can be formed using at least one color material. As the color material, a well-known coloring agent (dye, pigment, etc.) can be used, and specifically, the pigments and dyes described in JP-A-2005-17716 [0038] to [0054], or the special opening 2004- can be suitably used. The pigments described in JP-A-2005- 1 752 1 [0080] to [0088], and the like. In the photosensitive resin composition of the present invention, an organic pigment, an inorganic pigment, a dye or the like can be suitably used. In particular, when forming a light-blocking paint wall using the photosensitive resin composition of the present invention, a metal oxide powder such as a carbon material (such as carbon black), titanium oxide or triiron tetroxide, or a metal can be used. A light-shielding material such as a sulfide powder or a metal powder, or a mixture of pigments such as red, blue, and green. Among them, carbon black is preferred. When the pigment is used, it is preferred to uniformly disperse the content of the bismuth material in the resin composition in the photosensitive resin composition, from the viewpoint of shortening the development time - 34-200841125 See 'Total solids of the resin composition The content of the component is preferably from 30 to 70% by mass, particularly preferably from 40 to 60% by mass, more preferably from 50 to 5% by mass. The pigment is preferably used as a dispersion. The dispersion can be prepared by adding and dispersing a composition obtained by preliminarily mixing a pigment and a pigment dispersant in an organic solvent (or a vehicle) to be described later. The vehicle liquid refers to a medium portion which disperses the pigment when the coating material is in a liquid state, and includes a portion (adhesive agent) which is combined with the liquid pigment to solidify the coating film, and a component (organic solvent) for dissolving and diluting the pigment. The dispersing machine used for dispersing the above-mentioned pigments is not particularly limited, and for example, it is described in the "Pigment of the Pigment" (asakura, the first edition, the Asakura Bookstore, 2000, p. 438). Conventional dispersers such as kneaders, roll mills, vertical ball mills, super honing machines, dissolvers, homomixers, sand mills, and the like. Further, it can also be finely pulverized by frictional force by mechanical grinding as described on page 310 of the document. The particle diameter of the color material (pigment) is preferably from 0.001 to Ο. ίμιη, more preferably from 0.01 to 0.08 μm, from the viewpoint of dispersion stability. In addition, "particle size" refers to the diameter when the electron micrograph of the microparticles is taken as the circle of the same area®, and the "number average particle diameter" refers to the particle diameter of 100 particles, which is averaged on average. value. 6) Other components In the photosensitive resin composition, the following solvents, surfactants, thermal polymerization inhibitors, ultraviolet absorbers, and the like may be added in addition to the components of the above 1) to 5). Further, the "adhesive aid" described in JP-A No. 1 1 - 1 3 3 600 or other additives may be contained. - Solvent -35 - 200841125 In the photosensitive resin composition of the present invention, an organic solvent may be further used in addition to the above components. Examples of the solvent include methyl ethyl ketone, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, cyclohexanone, cyclohexanol, methyl isobutyl ketone, ethyl lactate, and methyl lactate. , caprolactam and the like. • Surfactant In the photosensitive resin composition of the present invention, from the viewpoint of controlling the uniform film thickness and effectively preventing coating unevenness, it is preferred that the photosensitive resin composition appropriately contains interfacial activity. Agent. Φ As the above-mentioned surfactant, a surfactant disclosed in Japanese Laid-Open Patent Publication No. H03- 3 3 7 4 2 4 or JP-A No. 1 1 - 1 3 3 600 is suitable. • Thermal polymerization inhibitor The photosensitive resin composition of the present invention preferably contains a thermal polymerization inhibitor. Examples of the thermal polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, p-methoxyphenol, di-tert-butyl-p-cresol, pyrophenol, tert-butylcatechol, and benzoquinone. , 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-tert-butylphenol), 2-锍Benzimidazole, morphine trap and the like. β·Ultraviolet absorber In the photosensitive resin composition of the present invention, an ultraviolet absorber or a line absorber may be contained as needed. Examples of the ultraviolet ray absorbing agent include a compound described in JP-A-H05-72724, a salicylate-based system, a benzophenone-based compound, a benzoquinone-based system, a cyanoacrylate-based compound, and a nickel chelate compound. Hindered amines and the like.

Specifically, phenyl salicylate, 4-t-butylphenyl salicylate, 2,4-di-t-butylphenyl-3', 5'-di-third-4'- Hydroxybenzoate, 4-tert-butylphenyl salicylate, 2,4-dihydroxybenzophenone, 2-hydroxy-I-36 - 200841125 methoxybenzophenone, 2-hydroxyl 4-n-octyloxybenzophenone, 2-(2,-hydroxy-5'-methylphenyl)benzotriazole, 2-(2,-hydroxy-3,_t-butyl- 5 , _methylphenyl)-5-chlorobenzotriazole, ethyl-2-cyano-3,3-diphenyl acrylate, 2,2,-radio-4-methoxybenzophenone Ketone, nickel dibutyl dithiocarbamate, bis(2,2,6,6-tetramethyl·4·pyridine)-sebacate, 4-tert-butylphenyl salicylate , phenyl salicylate, 4-hydroxy-2,2,6,6-tetramethylpiperane condensate, succinic acid-bis(2,2,6,6-tetramethyl-4-piperidinyl) · Ester, 2-[2-hydroxy-3,5-bis(α,α-dimethylbenzyl)phenyl]-2Η-benzotriazole, 7-{[4-chloro-6-(di-B Amino)-5-φ tri-cultivation]amino}}3 phenylcoumarin. In a coating step, at least the aforementioned photosensitive resin composition containing an ink repellent is applied in the coating step. As a coating method, there is a method of directly forming a drawing wall by coating a substrate on a substrate formed of a permanent support, and a photosensitive property formed by coating a temporary support which is a photosensitive support material to be described later. The layer formed by the resin composition is transferred onto a substrate formed of a permanent support to form a method of drawing the walls. Therefore, the photosensitive resin layer can be formed by using the above-described photosensitive resin composition on at least one side of the substrate or by using the photosensitive transfer material of the present invention to be described later. The coating system of the photosensitive resin composition is not particularly limited, and is carried out by a known coating method such as slit coating, rod coating, or curtain coating. In the present invention, as the substrate (permanent support), glass, ceramic, synthetic resin film or the like can be used. Particularly preferred is transparency and dimensional stability -37- 200841125 A transparent substrate such as a good glass or synthetic resin film. When it is applied to a desired substrate, a photosensitive resin film (photosensitive resin layer) is directly formed on the substrate after being supplied to a drying step to be described later. Further, when it is applied to a desired temporary support, the photosensitive resin film after drying is transferred to a photosensitive resin film to be described later, and a photosensitive resin layer is formed on the desired substrate. When coating on a temporary support, it is generally based on a roll-shaped transfer material. When a long temporary support is used for coating, when transported by a cotton web, the transport speed during coating is relatively fast. Therefore, in order to suppress film thickness variation (good in in-plane uniformity), it is necessary to consider not only the drying step described later but also the amount of associated air depending on the coating speed in order to obtain a wall having a small variation in height. ～Photosensitive transfer material ～ The photosensitive transfer material of the present invention is a method of forming a photosensitive resin film according to the present invention, and a photosensitive resin layer is provided on the temporary support, and a temporary support is provided as needed. Further, a layer other than a thermoplastic resin layer and an oxygen barrier layer (hereinafter also referred to as an "oxygen barrier layer") may be provided between the photosensitive resin layer and the photosensitive resin layer. By using a photosensitive transfer material, the paint wall can be formed easily and at low cost. As a method of transferring a photosensitive resin layer onto a substrate by using a photosensitive transfer material, for example, the following steps can be mentioned. 1) On the temporary support, a photosensitive transfer material having a (thermoplastic resin layer) oxygen barrier layer, a photosensitive resin layer, and a cover sheet for protecting the photosensitive resin layer is provided in this order. -38-200841125 2) The cover sheet is peeled off, and the surface of the exposed photosensitive resin layer is bonded to a substrate which is a permanent support, and laminated (laminated body) by heating or pressurization by a laminator or the like. As the laminator, those selected from conventional laminators, vacuum laminators, and the like can be suitably used, and in order to further improve productivity, an automatic cutting laminator can also be used. 3) peeling off between the temporary support and the oxygen barrier layer (or thermoplastic resin layer), removing the temporary support from the laminate, and transferring the photosensitive resin layer and the oxygen barrier layer (and the thermoplastic resin layer) onto the substrate . ® When the oxygen barrier layer is used, the photosensitive resin layer is protected from the atmosphere by the oxygen barrier layer, so it automatically becomes an oxygen-poor atmosphere. Therefore, the exposure does not have to be performed under an inert gas or under reduced pressure, and the current step can be utilized as it is, and the advantages of high sensitivity and high hardness can be obtained. As will be described later, the temporary support can also be used as a "protective layer capable of resisting oxygen". In this case, it is not necessary to provide an oxygen barrier layer, which contributes to a reduction in the number of steps. In the photosensitive transfer material, a thermoplastic resin layer may be provided between the temporary support and the oxygen barrier layer between the temporary support and the photosensitive resin layer or when the oxygen barrier layer is provided. The thermoplastic resin layer is a resin component which is alkali-soluble and contains at least a resin component having a substantial softening point of 80 ° C or less, and has a cushioning property. By providing such a thermoplastic resin layer, good adhesion to the permanent support can be obtained. Examples of the alkali-soluble thermoplastic resin having a softening point of 80 ° C or less include a saponified product of an ethylene and an acrylate copolymer, a saponified product of a styrene and a (meth) acrylate copolymer, a vinyl toluene and a (methyl group). a saponified product of a saponified product of an acrylate copolymer, a poly(meth)acrylate, a butyl (meth)acrylate, or a (meth)acrylate copolymer such as vinyl acetate-39-200841125. In the thermoplastic resin layer, at least one of the above thermoplastic resins can be appropriately selected, and a "Plastic Performance Fact Sheet" can be used. (The Japan Plastics Industry Alliance, the All-Japan Plastic Forming Industry Association, edited by the Industrial Research Association, 1 9 6 It is available in the organic polymer of the softening point of about 80 ° C or less in the 8th year of October 8th. Further, in the case of an organic polymer material having a softening point of 80 ° C or higher, a substantial softening point can be lowered by adding each of the organic polymer materials to each of the plastic materials compatible with the polymer material. It can also be used up to 80 °C. Further, in the organic polymer material, for the purpose of adjusting the adhesion to the temporary support, various polymers or supercooled substances may be added in a range where the substantial softening point does not exceed 80 ° C. Adhesive modifier, surfactant, release agent, etc. Specific examples of preferred plasticizers include polypropylene glycol, polyethylene glycol, dioctyl phthalate, diheptyl phthalate, dibutyl phthalate, tricresyl phosphate, and tolyl diphenyl phosphate. , biphenyl diphenyl phosphate and the like. ^ As a temporary support constituting a photosensitive transfer material, it can be suitably selected from those composed of chemically and thermally stable flexible materials. Specifically, it is preferably a Teflon (registered trademark), a polyethylene terephthalate, a polycarbonate, a polyethylene, a polypropylene, a polyester, or the like, a sheet or a laminate thereof. The thickness of the temporary support is suitably 5 to 30,000 μm, preferably 20 to 150 μm. When the thickness is within the above range, peeling can be easily performed without damaging the temporary support, and exposure with good resolution can be performed via the temporary support. In the above specific examples, a 2-axis stretched polyethylene terephthalate film is particularly preferred. -40- 200841125 It is preferable to provide a thin cover sheet on the photosensitive resin layer for protection against contamination or damage during storage. Although the cover sheet may be formed of the same or similar material as the temporary support, it must be easily separated from the photosensitive resin layer. As the cover sheet material, for example, a polyoxynitride paper, a polyolefin or a polytetrafluoroethylene sheet is suitable. Further, the thickness of the cover sheet is generally 4 to 40 μm, preferably 5 to 30 μm, and particularly preferably 1 to 25 μm. In the second embodiment of the present invention, a photosensitive resin composition containing at least an ink-repellent agent is applied to the temporary support in the coating step, and in the drying step described later, from the film surface The flow rate of the gas of 5 cm is 0.5 m/s or less, and the coating film formed by coating is dried, and a photosensitive resin layer (photosensitive resin film) is provided on the temporary support. In the photosensitive transfer material, when a photosensitive resin layer is provided using a resin composition containing an ink repellent, if a toner is used, smooth operation of the coated film surface becomes difficult, and it is difficult to obtain a uniform thickness. However, in the first embodiment of the present invention, the ink repellent property can be improved, and the film thickness variation can be suppressed, and the resin film for forming the paint wall having high uniformity in the film can be formed. Thereby, a picture wall (black matrix or the like) having a small height is obtained, and a color filter and a display device which can display a display image with uneven suppression can be provided. In the drying step of the first embodiment of the present invention, the photosensitive resin composition applied on the substrate or the temporary support is vacuum dried to form a photosensitive resin film. In the vacuum drying, the degree of vacuum is preferably 1 (T3 Pa or less, and the degree of vacuum is preferably 1 (T4 Pa or less) from the viewpoint of uniformity of film thickness of the photosensitive resin film to be formed. Vacuum drying can also be under vacuum. The heating temperature is, for example, from -41 to 200841125. The heating temperature is, for example, from 25 to 100 ° C. In this case, from the viewpoint of film thickness uniformity of the photosensitive resin film to be formed, it is preferably 1 ( In the drying step of the second embodiment of the present invention, the flow rate of the gas having a height of 〇5 cm from the film surface is 〇.5 m in the drying step of the vacuum of 30 to 80 ° C in the second embodiment of the present invention. In the range of /s or less, the coating film formed by the coating step is dried. In this step, by drying the gas at a flow rate of 〇·5 m/s or less, it is possible to effectively prevent the ink from being contained. When the film surface is operated, specifically, due to a slight external force, convection of the coating liquid occurs on the film surface, that is, the film surface is uneven, and the in-plane uniformity of the coating film can be lowered to within ±5 %. Therefore, a wall with a high degree of irregularity can be formed (black moment) In other words, if the flow rate of the gas exceeds 0.5 m / s ', the in-plane uniformity of the coated film exceeds ± 5 %, and the uniform thickness of the drawn wall cannot be stably formed. The flow rate measured at a position of the film surface of the coating film of 55 cm (the height from the surface of the film was 0.5 cm) was measured by the use of SYSTEM 6243 (manufactured by KANOMAX Co., Ltd.) ^ The flow rate of the gas, From the viewpoint of productivity such as drying time, it is preferable that the gas of O.lm/s to 0.5 m/s 〇 is a gas which is in contact with the surface of the film existing in the space in which the coating film exists. The flow rate of the gas is a flow rate which occurs due to the movement of the gas existing near the surface of the membrane by vacuum suction or the like, or conversely, may be supplied to the surface of the membrane (for example, air, etc.) for drying from the outside. The flow rate of the gas in the dry air. The drying system in this step: (1) The supplied dry air can be supplied by direct contact or -42- 200841125 without contacting the film surface. Do it with or without maintaining temperature In the case of the above, (the temperature of the dry air, the water content, and the wind direction are appropriately selected. In the case of the above (2), it is preferable that the degree of vacuum is 1 (T3Pa or less). The method is vacuum suction. When the degree of vacuum is 1 (less than T3 Pa, the film can be uniformly dried while maintaining uniformity in the film. In vacuum drying, vacuum drying can also be carried out under vacuum and under heating. The heating temperature may be from 2 5 • to 1 0 0 ° C. In the present invention, from the viewpoint of uniformity of film thickness of the photosensitive resin film to be formed, a vacuum of not less than W4 Pa, 30 to 80 is preferable. The drying temperature of °C is vacuum dried. The measurement of the degree of vacuum can be measured using a general vacuum meter. Specifically, a Pirani vacuum gauge or a diaphragm type vacuum gauge (for example, a BarraUon vacuum gauge manufactured by MKS Co., Ltd., etc.) can be used. Determination. &lt;Substrate with a wall attached to the drawing&gt; The substrate with the image-drawing wall of the present invention is formed on the substrate by using the method of forming the photosensitive resin film of the present invention or the photosensitive transfer material of the present invention. The photosensitive resin layer forming step of forming the photosensitive resin layer is formed by exposing the formed photosensitive resin layer to a pattern by a mask, and developing the image forming wall from the drawing wall. In the second embodiment of the present invention, the substrate having the image-removing wall is provided with a resin containing an ink-repellent agent and having an in-plane film thickness uniformity of ±5 % or less on a substrate (preferably a transparent substrate). It is composed of a wall membrane. Since the in-plane film thickness uniformity of the resin is less than 5% of the soil, it is possible to obtain a color filter having a high degree of inhomogeneity from the wall (black matrix, etc.) -43-200841125. This prevents uneven display when the image is displayed. The substrate with the paint wall of the present invention is most preferably obtained by the method for forming a photosensitive resin film of the present invention. &lt;Color filter and method for producing the same&gt; The method for producing a color filter of the present invention can be configured by using the method for forming a photosensitive resin film of the present invention or the feeling of the present invention. a step of forming a photosensitive resin layer on a substrate, a step of forming a photosensitive resin layer by exposing the formed photosensitive resin layer to a patterned image by a photomask to form an off-painting wall forming step, and In the concave portion on the substrate divided by the drawing wall, the colored liquid composition is applied by an inkjet method to form a colored region forming step of the colored region. The painting wall of the present invention is generally black (dark), but is not limited to black. The colored coloring matter is preferably an organic substance (a variety of pigments such as dyes and pigments). - Photosensitive resin layer forming step - In the photosensitive resin layer forming step, a photosensitive resin layer is formed on the substrate by using the above-described method for forming a photosensitive resin film of the present invention or the photosensitive transfer material of the present invention described above And become a layered body. The details of the formation of the photosensitive resin layer are as described above. -Drawing wall forming step - The drawing wall forming step is performed by providing a photosensitive resin layer formed by the photosensitive resin layer forming step, and exposing it to a pattern by a mask (exposure step), and then performing development The imaging step forms a wall away from the painting. In the exposure step, the layered body obtained by the layer forming step and the desired mask (for example, a quartz exposure mask) are used as a photosensitive resin layer (the photosensitive support is used to remove the temporary support when using the photosensitive material - 44-200841125) The rear removal surface (the oxygen barrier layer) is disposed in such a manner as to face the mask. For example, when the photosensitive resin layer and the mask are vertically erected, the gap between the mask surface and the photosensitive resin layer is appropriately set. The distance (for example, 200 μm) is used for exposure. The exposure is carried out, for example, by using a proximity type exposure machine having an ultrahigh pressure mercury lamp (for example, manufactured by Hi-Tech Electronics Co., Ltd.), and the exposure amount can be selected suitably (for example, 300 mJ/cm2). Examples of the light source used for the exposure include a medium pressure to an ultrahigh pressure mercury lamp, a xenon lamp, a metal halide lamp, and the like. From the viewpoint of improving the light sensitivity, i.e., the degree of hardening, it is preferred to expose the photosensitive resin layer in a lean oxygen atmosphere and then develop it. Here, in the case of an oxygen-poor atmosphere, the protective layer (hereinafter also referred to as "the oxygen barrier layer") which is capable of blocking oxygen under an inert gas and under reduced pressure is as follows. The inert gas means an atmosphere which is exposed to an inert gas such as N2, H2 or co2 or a rare gas such as He, Ne or Ar. Among them, the inert gas is preferably Ν2 in view of safety, ease of availability, and cost. ^ The above-mentioned reduced pressure means a state below 500 hPa, preferably below l〇〇hPa. For example, the polyvinyl ether/maleic anhydride polymer or the carboxyalkyl cellulose described in each of the publications of JP-A-46-2121 or JP-A-56-40824 can be mentioned. Water-soluble salts, water-soluble cellulose ethers, water-soluble salts of carboxyalkyl starch, polyvinyl alcohol, polyvinylpyrrolidone, various polypropylene decylamines, various water-soluble polyamines, water-soluble salts of polyacrylic acid , gelatin, ethylene oxide polymer, various starches and the like -45- 200841125 The water-soluble salt of the group, the copolymer of styrene/maleic acid, the maleate resin, and the like Combinations of the above and the like. Among these, a combination of polyvinyl alcohol and polyvinylpyrrolidone is particularly preferred. Further, the saponification ratio of the polyvinyl alcohol is preferably 80% or more, and the content of the polyvinylpyrrolidone is preferably from 1 to 75% by mass, particularly preferably 1%, to the solid content of the alkali-soluble photosensitive resin layer. 50% by mass, more preferably 10 to 40% by mass. Further, various films can be used in the oxygen barrier layer. For example, polyesters such as PET, polyamines such as Nile, and ethylene-vinyl acetate copolymers (EVA) can also be used. These films may also be stretched as needed, and have a thickness of 5 to 300 μm, preferably 20 to 150 μm. In particular, when a photosensitive transfer material is used to form a paint wall, a temporary support can be suitably used as a protective layer capable of blocking oxygen. When the temporary support is used as the oxygen barrier layer, the temporary support system remains (not peeled off), and the temporary support is disposed in a face-to-face manner with a desired mask (for example, a quartz exposure mask) to make the laminate The distance between the exposure mask surface and the temporary support (for example, 200 μm) is appropriately set in the state where the reticle is vertically erected for exposure. The oxygen permeability coefficient of the oxygen barrier layer (the oxygen barrier layer) is preferably 2,0 0 c m3 / (m2.dayatm) or less, more preferably 1〇〇cm3/(m2.day.atm) or less, most Good is below 5〇cm3/(m2.day.atm). When the oxygen permeability is within the above range, light hardening is favorably performed by oxygen barrier, and the desired wall shape is effectively formed. If the oxygen permeability is more than 200 〇cm3/(m2 · day · atm), it is difficult to efficiently separate oxygen from the wall by -46 - 200841125. Next, a developing step is applied, and the exposed photosensitive resin layer is subjected to development processing using a predetermined developing solution. Next, as needed, a water washing process is performed to obtain a pattern image (a pattern of a wall). Further, before development, it is preferred to spray pure water from the shower nozzle so that the surface of the photosensitive resin layer or the oxygen barrier layer is uniformly wetted. As the developing solution used for the development processing, a thin aqueous solution of an alkaline substance is used, but an organic solvent which is miscible with water may be added in a small amount. Φ Examples of the basic substance include alkali metal hydroxides (for example, sodium hydroxide or potassium hydroxide), alkali metal carbonates (for example, sodium carbonate and potassium carbonate), and alkali metal bicarbonates (for example, carbonic acid). Sodium hydrogencarbonate, potassium bicarbonate), alkali metal silicates (such as sodium citrate, potassium citrate), alkali metal bismuth citrates (such as sodium metasilicate, potassium metasilicate), triethanolamine, diethanolamine Monoethanolamine, morpholine, tetraammonium hydroxide (for example, tetramethylammonium hydroxide), trisodium phosphate, and the like. The concentration of the alkaline substance is preferably 0.01 to 30% by mass, and the pH is preferably 8 to 14. Examples of the "organic solvent which is miscible with water" include methyl alcohol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, and ethylene. Alcohol monoethyl ether, ethylene glycol mono-n-butyl ether, benzyl alcohol, acetone, methyl ethyl ketone, cyclohexanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, two Methylacetamide, hexamethylsulfonamide, ethyl lactate, methyl lactate, ε-caprolactam, Ν-methylpyrrolidone, and the like. The concentration of the organic solvent which is miscible with water is preferably from 0.1 to 30% by mass. Furthermore, the concentration of the surfactant is preferably 0. 〇 1 to 1 0% by mass. -47 - 200841125 The developing solution can also be used as a bath or as a spray. In the case where the uncured portion of the photosensitive resin layer is removed, a method of combining a rotary brush or a wet sponge to brush or the like can be used in the developing liquid. The liquid temperature of the developing solution is preferably from the vicinity of the usual room temperature (20 ° C) to 40 ° C. The development time depends on the composition of the photosensitive resin layer, the alkalinity or temperature of the developing solution, the type and concentration of the organic solvent, and the like, but it is usually about 10 seconds to 2 minutes. When the development time is within the above range, the development of the non-hardened portion (non-exposed portion in the negative type) is good, and the cured portion (the exposed portion in the case of the negative type) is not engraved, and # is in a good shape. The point of the painting wall is effective. Further, after the development process, a water washing step may also be added. - Heat treatment step - By the heat treatment (also referred to as baking treatment), the pattern image (from the pattern wall pattern) formed by the photosensitive resin layer obtained in the developing step, the water-repellent and ink-repellent properties are further improved. Painting the wall. Heat treatment seals the image pattern formed by exposure and development (from the wall pattern) for heating to harden, while arranging the fluorine functional groups on the surface by heat, which can be used to dial water and dial Ink. In particular, the use of the above-mentioned fluorine-containing compound having repeating units (a) to (c) is effective. As a method of heat treatment, various conventional methods can be used. In other words, for example, a method in which a plurality of substrates are housed in a cassette, a method of treating the sheet by a method of convection oven, a method of processing each sheet by a hot plate, and the like is performed by an infrared heater. Further, the baking temperature (heating temperature) is usually 150 to 2 80 ° C, preferably 180 to 250 ° C. The heating time can be appropriately selected in accordance with the aforementioned baking temperature, for example, -48-200841125, for example, when the baking temperature is 240 ° C, preferably 10 to 120 minutes, more preferably 30 to 90 minutes. Further, in the heat treatment step of the method of forming the wall, the film is formed by the exposure and development steps, and the film is prevented from being thinned by unevenness, thereby preventing the UV absorber from being contained in the photosensitive resin layer. From the viewpoint of precipitation of components, etc., post-exposure can also be performed before the heat treatment. When the post-exposure is applied before the heat treatment, it is possible to effectively prevent the bulging of the tiny foreign matter that is bitten during the lamination to become a defect. • Here, a brief description of the aforementioned exposure is given. The light source used for the post-exposure may be appropriately selected as long as it can irradiate light having a wavelength range (for example, 365 nm or 405 nm) which can cure the photosensitive resin layer. Specifically, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a metal halide lamp, or the like can be given. The exposure amount is usually 50 to 5000 mJ/cm2, preferably 200 to 2000 mJ/cm2, more preferably 500 to 1 000 mJ/cm2, as long as it can supplement the exposure amount of the exposure. The detachment wall which can be produced by the method for forming the paint wall of the present invention preferably has a high optical density of 5 5 5 n m. In particular, when a black matrix constituting a color filter as a drawing wall is formed, the optical density is preferably 2.5 or more from the viewpoint of providing a more vivid and clear multicolor image by providing light shielding properties. It is 2.5 to 10.0, more preferably 2.5 to 6.0, and particularly preferably 3.0 to 5.0. Further, the photosensitive resin layer is preferably hardened by a photoinitiating system, 49 - 200841125 for an exposure wavelength (generally an ultraviolet region) In other words, optical concentration is also important. That is, the 値 is preferably 2. 〇~1〇.〇, more preferably 2.5 to 6. 〇, particularly preferably 3.0 to 5.0. If in the above preferred range, the desired wall of the desired shape can be formed. In addition, in terms of the width and height of the painting wall, the width (that is, the interval between the pixel and the pixel when the color filter is formed) is preferably 15 to 1 〇〇 μιη, and the height (ie, from the normal direction of the substrate) The distance from the substrate surface to the apex of the wall is preferably 1.0 to 5·0 μm. The shape described in the paragraph Φ [ 〇 〇 5 4 ] to [0 0 5 5 ] of the shape of the drawing wall is also suitable for the present invention. ~ Measurement of the contact angle from the wall of the painting ~ The change in the ink contact angle and the water contact angle of the paint wall (for example, the black matrix) before and after the heat treatment (baking treatment) is important. The measurement method of the contact angle is based on the method of the j IS specification of the Japan Standards Association, and specifically, the "6. Instillation method" in JIS R3 2 5 7 "Test method for wettability of the surface of a substrate glass". The method described. More specifically, using a contact angle measuring device (a contact angle meter CA-A manufactured by Kyowa Interface Science Co., Ltd.), ink droplets and water droplets of a size of 2 〇 are produced, and ink droplets and water droplets are dripped from the needle tip to make The pattern-shaped upper surface of the painting wall was placed in contact with each other to form ink droplets and water droplets. After standing for 1 second, the shape of the ink droplets and water droplets was observed by the peephole of the contact angle meter, and the contact angle θ of 25 ° C was obtained. Here, "after heat treatment" means that after heating at 250 ° C for 50 minutes, the latter is placed at room temperature for 1 hour. ～ contact angle 値~ photosensitive resin composition, when the water contact angle of the surface of the painted wall formed by using the photosensitive-50-200841125 resin composition is measured by the above method, before the heat treatment is applied The water contact angle of the surface of the painted wall pattern is regarded as A. When the water contact angle of the surface of the painted wall after cooling at 240 ° C for 50 minutes was taken as 8 °, the contact angle difference (B ° - A °) may be 20 or more. The contact angle difference (B°-AQ) is preferably 30 or more, and most preferably 40. the above. Also, as A. From the viewpoint of improving the adhesion between the painting wall and the substrate, it is preferably 〇~6 (Τ, more preferably 0 to 55°, particularly preferably 0 to 50°. As Β °, it is more effective From the viewpoint of suppressing the color mixture in the production of the color filter, it is preferably from 65 to 180%, more preferably from 80 to 180%, particularly preferably from 90 to 180°. Here, referring to Fig. 1, the wall is illustrated. The upper surface of the painting wall refers to the exposed surface on the opposite side of the surface contacting the substrate from the surface of the painting wall (the upper surface 4 of Fig. 1). Further, the side of the painting wall refers to the wall away from the painting wall. a surface other than the upper surface of the painted wall (the side surface 5 of Fig. 1) in the exposed surface. Further, the concave portion on the substrate refers to a substrate which is surrounded by the drawing wall and which is not formed by the side wall of the drawing wall and the substrate. a concave region (a recess 3 in Fig. 1) formed by a surface. - a colored region forming step 1 - a colored region forming step is a recess on a substrate defined by the above-described off-wall forming step 'Forming a colored liquid composition by inkjet to form a colored region. In this step, on the substrate divided by the wall of the painting The concave portion (the region for forming the colored region) is given a color liquid composition (preferably two or more colors), and a plurality of colored regions (for example, two or more colors) (for example, red, green, blue, white, and the like) can be formed. The coloring filter of purple or the like is used. The method for producing a color filter according to the present invention is the above-described painting wall (for example, a black matrix) using the photosensitive composition for a color filter of the present invention having 200841125. On the substrate, the colored liquid composition is applied to form a colored region, so that the color mixing accompanying the spread of the ink on the drawing wall can be avoided, and the occurrence of peeling off of the wall or the occurrence of defects can be suppressed, so that color mixing can be produced. High-quality color filter in which image failure such as whitening is suppressed, such as whitening. The color filter of the present invention also has a painting wall using the photosensitive composition for a color filter of the present invention. Therefore, the colorlessness is uneven and the color purity is high, and the image failure such as whitening is suppressed, and the display characteristic is clear and clear. • As the inkjet method, the charged ink can be continuously ejected by the electric The method of controlling, using a method in which a piezoelectric element intermittently ejects ink, a method of heating an ink, and a method of intermittently ejecting the foam by using the same, etc. The ink can be either oily or water-based. The coloring agent containing the ink can be used together with a dye or a pigment, and it is more preferable to use a pigment from the viewpoint of durability, and it is also possible to use a coating for the production of a conventional color filter. The colored ink (for example, the colored resin composition described in paragraphs [0034] to [0063] of JP-A-2005-3 86 1), or the publication described in JP-A-2-004-32 5736 A conventional ink such as ink printed in JP-A-2002-37261-3. In the ink using the inkjet method, it is possible to cure by heating or to add ultraviolet rays in consideration of the step after the application. The energy line can be hardened. As the component which is heat-hardened, various thermosetting resins are widely used, and as a component which can be hardened by the energy ray, for example, a photoreaction initiator is added to the acrylate derivative or the methacrylate derivative. In particular, considering the heat resistance of -52-, 200841125, it is more preferable to have a plurality of acrylonitrile groups and methacrylonitrile groups in the molecule. These acrylate derivatives and methacrylate derivatives are preferably those which are water-soluble, and those which are poorly soluble in water may be emulsified or the like. In this case, a photosensitive composition containing a coloring agent such as a pigment of the photosensitive composition can be suitably used. In the color filter of the present invention, it is preferable that a color filter of a colored liquid composition is ejected onto a substrate by an inkjet method to form a color filter having a colored region (for example, a pixel), preferably having a color filter. A color filter of at least three color-colored pixels of at least RGB 3 • color ink discharged by the inkjet method. The pattern shape of the color filter is not particularly limited, and is generally a black matrix shape or a line shape, and may be a lattice shape or a (5 (delta) arrangement. In the color filter produced, in order to improve Patience, there is a case where the overcoat layer is provided in a comprehensive manner. The overcoat layer protects the colored region (for example, RGB pixels) while flattening the surface. However, from the viewpoint of increasing the number of steps, it is preferably not provided. The resin (OC agent) for forming the overcoat layer may, for example, be an acrylic resin composition, an epoxy resin composition, or a polyimine resin composition. Among them, transparency in the visible light range is excellent, and color is formed. The resin component of the curable composition of the filter generally contains an acrylic resin as a main component, and an acrylic resin composition is preferable from the viewpoint of excellent adhesion. As an example of the overcoat layer, JP-A 2003 In the paragraph No. [0 0 1 8 ] to [0 0 2 8] of the publication No. 2-8, the commercial product of the overcoating agent is "Optmer SS6699G" manufactured by JS R Co., Ltd. Such as RGB pixels In the above, a transparent electrode, an alignment film, etc. may be provided as needed. Specific examples of the transparent electrode include an oxime film. Further, specific examples of the alignment film include polyimine. &lt;Display device&gt; The display device of the present invention is configured by providing the color filter of the present invention described above. According to the color filter of the present invention, display unevenness during image display can be suppressed, and a display image with good image quality can be obtained. The color filter 'obtained by the method for producing a color filter of the present invention can be used as a display element in combination with a liquid crystal display element, an electrophoretic dynamic display element, an electrochromic display element, and a PLZT. It can also be used for color TV cameras or other uses that use color filters. Examples of the display device include a display device such as a liquid crystal display device, a plasma display device, an EL display device, and a CRT display device. The definition of the display device or the description of each display device is, for example, "electronic display device (sasaki Sasaki, Industrial Research Association (share) issued in 990)", "display device (Ibuki Shunzhang, industrial book (share)) It is recorded in the annual issue). A display device comprising the color filter of the present invention is preferably a liquid crystal display device. The liquid crystal display device is described in, for example, "Second-generation liquid crystal display technology (edited by Uchida Ryuo, Industrial Research Association (issued) in 1994). The liquid crystal display device to which the present invention is applicable is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the "Second Generation Liquid Crystal Display Technology". Among them, it is particularly effective for a liquid crystal display device for a color TFT method. The color TFT liquid crystal display device is described in, for example, "Color TFT liquid crystal display (Kyoritsu Publishing Co., Ltd., issued 996) - 54-200841125. Further, the present invention is also applicable to horizontal electric field driving such as IPS. A liquid crystal display device in which the viewing angle of the method such as the MVA or the like is expanded. For these methods, for example, "EL, PDF, LCD display technology, and the latest trends in the market (Dongli Research Center Survey Research Department 2001 1 It is described on page 43 of the annual issue). The liquid crystal display device is composed of a wide variety of members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle compensation film, in addition to the color filter. The color filter of the present invention can be applied to a liquid crystal display device composed of these conventional members. These components are described, for example, in '94 LCD Peripherals and Chemicals Markets (Island Kentaro, MCC (shares) issued in 1994), and "2003 LCD-related market status and future prospects (volumes)" (Shares Fuji Chimera, 硏 2003, etc.). The use is applicable to portable terminals such as televisions, personal computers, liquid crystal projectors, game machines, portable telephones, digital cameras, vehicle navigation systems, and the like, and is not particularly limited. [Examples] The present invention will be more specifically described below by way of examples. The present invention is not limited by the following examples as long as it does not exceed the gist of the invention. Further, the molecular weight indicates the weight average molecular weight in terms of polystyrene measured by gel permeation chromatography (GP C), and "%" and "parts" are based on mass unless otherwise specified. (Example 1) An exemplary compound (1) of the above fluorine-containing compound of the present invention was synthesized as follows. Further, the fluorine-containing compound of the present invention other than the exemplary compound synthesized herein may be synthesized by a similar method. Further, the fluorine atom content in the fluorine-containing compound indicates the amount of fluorine estimated by the structural formula. - Synthesis of the ink-repellent (exemplified compound (1)) - 30 g of propylene glycol monomethyl ether acetate [MMPG-Ac, manufactured by DAICEL Chemical Industry Co., Ltd.] was placed in a cooling tube of 300 ml under a nitrogen stream. In the three-necked flask, the internal temperature was heated to 70 ° C in a water bath with a stone mortar. Among them, 25% of acrylic acid [AA, Tokyo Chemical Industry Co., Ltd.], 25 g # 2-(perfluorohexyl) was dissolved in 35 g of MMPG-Ac by a plunger pump for 2 hours. -ethyl acrylate [FAAC6, manufactured by ΝΟΚ), 22.5 g of terminal methyl polyethylene oxide monomer [P ME 1000, manufactured by Nippon Oil & Fats Co., Ltd., repeat number 23 of yttrium, terminal methyl group] A solution of 0.70 g of lauryl mercaptan [LM, manufactured by Tokyo Chemical Industry Co., Ltd.], and 0.28 5 g of 2,2'-azobis(isovaleronitrile) dissolved in 1 g of MMPG-Ac [V65 , and the solution of Wako Pure Chemical Industries Co., Ltd.]. After the completion of the dropwise addition, the mixture was stirred for 5 hours. As described above, 2-(perfluorohexyl)-ethyl acrylate [FAAC6], acrylic acid [AA], and polyethylene oxide monomer [PME 1 000] were copolymerized to synthesize Φ FAAC6/AA/PME 1 00 0 = 5 0/5/4 5 (mass ratio) of the exemplified compound (l). The weight average molecular weight of the compound (1) is 13,000, and the fluorine atom content in the compound (1) is 36%. - Preparation of photosensitive resin composition - First, the amount of K pigment dispersion 1 and propylene glycol monomethyl acetate acetate vinegar described in Table 1 were mixed at a temperature of 24 C (±2 C), and spoiled at 150 rpm for 10 minutes. Then, the amounts of methyl ethyl ketone, binder 2, hydroquinone monomethyl ether, DPHA liquid, 2, 4 bis (trichloromethyl-56-200841125)-6 were measured in the amounts shown in Table 1, respectively. -[4'-(N,N-Diethoxycarbonylmethylamino)-3bromophenyl]-s-tripper, the following surfactant 1, the above-exemplified compound (1) as an ink-repellent The mixture was added in this order at a temperature of 25 ° C (: t 2 ° C), and stirred at 150 ° C (soil 2 ° C) at 150 ° C for 30 minutes to obtain a photosensitive resin composition K 1 . In addition, the quantity shown in Table 1 is a mass part, and it is the following composition in detail. Here, the amount of the J ink added is 1% of the stomach of the total solid content of the photosensitive resin composition. &lt; Κ pigment dispersion 1 &gt;

{ • Carbon black (Degussa 窫Nipex35) 13.1% • Dispersant 1 〇·65% • Polymer (benzyl methacrylate/methacrylic acid = 72/28 molar ratio of random copolymer, molecular weight 3.7 million) 6.72% • Propylene glycol monomethyl ether acetate 79.53% dispersant 1

&lt;Binder 2&gt; • Polymer (benzyl methacrylate/methacrylic acid = 7 2/2 8 molar ratio of a homopolymer, molecular weight 38,000) 27% • Propylene glycol monomethyl ether acetate 73 % -57- 200841125

&lt; D Ρ Η A liquid &gt;

Dipentaerythritol hexaacrylate (containing 500 ppm polymerization inhibitor MEHQ, manufactured by Nippon Chemical Co., Ltd., trade name: KAYARAD DPHA) 7 6% • Propylene glycol monomethyl ether acetate 24% &lt; surfactant 1 &gt • The following structure 1 3 0% • Methyl ethyl ketone 7 0% Structure 1 —(CH^H)4(r-OC 〇〇Η2〇Η2ΟηΡ2η+1 -(CH2-CH)x— ( CHa-CH)^- 0=6 οά O(P0)7H 0(E0)7H (n = 6,x = 55,y = 5, Mw = 3 3940, M w/Mn = 2.5 5 PO : propylene oxide , EO ··Ethylene oxide) [Table 1] Photosensitive resin composition Κ1 K Pigment dispersion 1 30 Propylene glycol monomethyl ether acetate 15 Methyl ethyl ketone 34 Adhesive 2, 13 DPHA liquid 5.5 2, 4 -Bis(trichloromethyl)-6-[4,-(Ν,Ν-bisethoxycarbonylmethylamino)-3'-bromophenyl]-s-three tillage 0.2 hydroquinone monomethyl ether 0.006 Surfactant 1 0.06 Illustrative compound (1) 0.35 parts by mass - 58 - 200841125 "Formation of the wall of the painting" After washing the alkali-free glass substrate with a UV cleaning device, it is washed with a detergent and then ultrapure. The water is ultrasonically washed. The substrate is heated at 10 ° C for 3 minutes. In order to stabilize the surface state, the substrate was cooled, and the temperature was adjusted to 23 ° C, and then coated with a glass substrate coater (manufactured by FAS Asia, trade name: MH-1600) having a slit nozzle. In the above table, the photosensitive composition K 1 having the composition is described. Then, it is dried in a vacuum drying apparatus having a degree of vacuum of 1 (T5 Pa and a temperature of 100 ° C for 2 minutes) to obtain a photosensitive film having a film thickness of 2.3 μm. The resin composition layer K 1 is used in a state in which the substrate and the photomask (the quartz exposure mask having the image pattern) are vertically erected using a proximity type exposure machine (manufactured by Hitachi High-Tech Electronics Co., Ltd.) having an ultrahigh pressure mercury lamp. The distance between the mask surface and the photosensitive resin composition layer 设定1 was set to 200 μm, and the pattern was exposed to an exposure amount of 300 mJ/cm 2 in a nitrogen atmosphere. Next, pure water was sprayed from the shower nozzle so that After the surface of the photosensitive composition layer K1 is uniformly wetted, a KOH-based developing solution (containing KOH, a non-ION ion surfactant, trade name: CDK-1, Fuji Film Electronic Material Co., Ltd.) is used. 100 times diluted The image was sprayed at a flat nozzle pressure of 0.04 MPa for 80 seconds at 23 ° C to obtain a patterned image. Then, ultrapure water was sprayed at a pressure of 9.8 MPa to remove the residue by an ultrahigh pressure washing nozzle. Post-exposure was performed at an exposure amount of 2000 mJ/cm 2 in the air, followed by post-baking (heat treatment) at 240 ° C for 50 minutes to obtain an opening having a film thickness of 2.0 μm, an optical density of 4.0, and a width of ΙΟΟμπι. Ribbon black matrix (away from the wall). Hereinafter, the glass substrate on which the drawing wall is formed is referred to as "substrate with the drawing wall -59-200841125". <<Preparation of Color Filter>> &lt;Preparation of Composition for Colored Ink for Illustrator&gt; First, a pigment, a polymer dispersant, and a solvent are mixed in the following components to obtain a pigment using a two-roll and bead mill. Dispersions. The pigment dispersion liquid was sufficiently stirred with a dissolver or the like, and other materials were added in a small amount to prepare a colored ink composition for red (R) pixels. (The composition of the composition of the pigmented ink for the red pixel) • Pigment (CI·Pigment Red 254) 5 parts • The molecular dispersant (Solspass 24000, manufactured by LUBRIZOL, Japan) 1 part • Adhesive (benzyl methacrylate/A) Acrylic acid = 72/28 molar ratio of random copolymer, molecular weight 37,000) 3 parts • First epoxy resin (aldehyde varnish type epoxy resin, Oilcoat EI company Epicoat 154) 2 copies • Second Epoxy resin (neopentyl glycol diglycidyl ether) 5 parts • Hardener (trimellitic acid) 4 parts • Solvent: Ethyl 3-ethoxypropionate 8 parts, in addition to the above composition In the case of the CI Pigment Red 254, the same amount of C.I. Pigment Green 3 6 was used, and the colored ink composition for green (G) pixels was prepared in the same manner as in the case of the colored ink composition of the red pixel. In addition, in place of the CI·Pigment Red 254 in the above composition, the same amount of CI·Pigment Blue 15:6 is used, and the blue color is modulated in the same manner as in the case of the colored ink composition of the red pixel-60-200841125. (B) A pigmented ink composition for a pixel. Next, the coloring ink composition for pixels of R, G, and B described above is used in the region of the above-mentioned substrate from which the wall of the substrate is attached (the wall surrounded by the substrate and the substrate) In the concave portion, an ink jet type recording device (for example, Apollo II manufactured by DIMATIX Co., Ltd.) is used to discharge the ink composition at a desired concentration, and a color filter composed of patterns of R, G, and B is produced. Light film. The colored filter after the image was baked was baked in a 30 ° C oven for 30 minutes to obtain a # color filter substrate which was completely hardened from the wall and each of the pixels. <<Production of Liquid Crystal Display Device>> On the R pixel, G pixel, and B pixel of the color filter substrate obtained above, and on the off-paint wall, ΐτο (indium tin oxide) is formed by sputtering. Transparent electrode. &lt;Formation of Columnar Spacer Pattern&gt; The coating liquid for a photosensitive resin layer for the following spacers is applied onto 1 τ 前述 of the color light-emitting sheet by a slit coater similar to the above, and dried. And ® forms the photosensitive resin layer SP1. (Prescription SP 1 for coating liquid for photosensitive resin layer) Heavy methacrylic acid/allyl methacrylate copolymer, average molecular weight: 40000; high molecular weight) Mohr ratio = 20/80, 108 parts

(Polymerizable monomer) 6 4.7 parts • 2,4-bis(trichloromethyl)-6-[4'-(&gt;1,1^bisethoxycarbonylmethylamino)_3,-bromophenyl ]-s-Triple well 6.24 parts-61 - 200841125 0.0336 parts • Hydroquinone monomethyl ether • Victoria Blue BOHM (made by Baotu Valley Chemical Co., Ltd.) 0.874

• Megafac F780F (Daily Ink Chemical Industry Co., Ltd.; surfactant) 0.8 5 6 parts 328 parts 475 parts • methyl ethyl ketone • 1-methoxy-2-propyl acetate • methanol 16.6 parts , through a specified mask, with a high-pressure mercury lamp at 300mJ / cm2 • for proximity exposure. After the exposure, the photosensitive resin layer of the unexposed portion was dissolved and removed by using a K0H developing solution [CDK-1 (trade name) 100-fold dilution (pH = 1·8), Fuji Photo Film Co., Ltd.]. Subsequently, it was baked at 23 ° C for 30 minutes to form a columnar spacer pattern having a diameter of 16 μm and an average height of 3.7 μm on the portion of the glass substrate which was on the upper portion of the ED film. Further, an alignment film made of polyimide is provided thereon. &lt;Formation of protrusions for liquid crystal alignment division> # The following coating liquid for a photosensitive resin layer for protrusions is applied onto I Τ 0 of the color filter substrate by a slit coater similar to the above, and dried. A photosensitive resin layer for protrusions is formed. Next, an intermediate layer having a dry film thickness of 1.6 μm was provided on the photosensitive resin layer for protrusions using the coating liquid for an intermediate layer of the following prescription Ρ1. (Coating liquid for photosensitive resin layer for protrusions: Prescription A) • Positive photoresist liquid 5 3 · 3 parts (made by Fuji Film Electronic Materials Co., Ltd., FH_24 13 F) -62- 200841125 • Methyl ethyl ketone 4 6.7 parts • The above surfactant 1 0.04 parts (coating solution for intermediate layer: prescription P 1 ) • Polyvinyl alcohol (PVA2 05, manufactured by Kuraray Co., Ltd., saponification degree 88%, polymerization degree 5 50) 32.2 parts • Poly Vinylpyrrolidone (ISP·Japan, K·30) 14.9 parts • 524 parts of distilled water

• Methanol 429 parts Next, a proximity exposure machine was placed so that the distance between the mask and the surface of the photosensitive resin layer for protrusions was 100 μm, and the irradiation energy was 150 mJ/cm 2 by an ultrahigh pressure mercury lamp through the mask. Then, the substrate was sprayed with a 2.38% aqueous solution of tetramethylammonium hydroxide at 33 ° C for 30 seconds by a spray-type developing device to remove unnecessary portions of the photosensitive resin layer for protrusion (exposure portion). ). As described above, in the portion of the color filter substrate on the upper portion of the R, G, and B pixels on the ITO film, protrusions formed of the photosensitive resin layer patterned in a desired shape are formed. Then, by baking the color filter substrate on which the protrusions are formed at 240 ° C for 50 minutes, an alignment of a height of 1 · 5 μm and a longitudinal cross-sectional shape in a fish plate shape can be formed on the color filter substrate. A protrusion for division. Further, with respect to the color filter substrate obtained as described above, the side-by-side substrate and the liquid crystal material are combined to form an alignment-divided vertical alignment type liquid crystal display element. In other words, as the driving side substrate, a TFT substrate on which a pixel electrode and a pixel electrode (conductive layer) are arranged is arranged, and the TFT substrate and the color filter substrate obtained in the above-mentioned -63 - 200841125 are provided with the TFT substrate. The surface on the side of the pixel electrode or the like is disposed so as to face the surface on the side of the color filter substrate on which the protrusion for the division is formed, and the gap is provided by the spacer formed as described above. The liquid crystal material is sealed in the gap to form a liquid crystal cell provided with a liquid crystal layer for image display. On both sides of the thus obtained liquid crystal cell, a polarizing plate HLC2-2518 manufactured by Sanritz was adhered. Then, the backlight of the cold cathode tube is placed on the back side of the liquid crystal cell on which the polarizing plate is provided, and the alignment is a vertical alignment type liquid crystal display device. ® (Example 2) In addition to the preparation of the photosensitive resin composition of Example 1, the amount of the ink-repellent added was changed from 1% to 5% of the total solid content of the photosensitive resin composition, and In the same manner as in the first embodiment, a substrate with a painting wall, a color filter, and a liquid crystal display device were produced. Next, evaluation was carried out in the same manner as in Example 1. (Example 3) In the same manner as in Example 1, except that the degree of vacuum of the vacuum drying apparatus was changed from l〇-5Pa to 1 (T4Pa) in the formation of the drawing wall of Example 1, The substrate of the wall, the color filter, and the liquid crystal display device were evaluated in the same manner as in Example 1. (Example 4) In addition to the formation of the paint wall of Example 1, the vacuum degree of the vacuum drying device was changed from (T5Pa was changed to 1 (T3Pa, except for T3Pa, a substrate with a painting wall, a color filter, and a liquid crystal display device were produced.) Next, evaluation was performed in the same manner as in Example 1. -64- 200841125 (Example 5) "Manufacturing method of photosensitive transfer material K1" On a polyethylene phthalate film temporary support having a thickness of 75 μm, a slit nozzle was used for coating by the following prescription Η 1 The coating liquid for the thermoplastic resin layer was dried, and then the coating liquid for the intermediate layer composed of the following formulation Ρ 1 was applied and dried. Further, the photosensitive resin composition prepared in Example 1 was applied. And make it dry. So, in temporary support On top, a thermoplastic resin layer having a dry film thickness of 14.6 μm, an intermediate layer having a dry film Φ thickness of 1.6 μm, and a photosensitive resin composition layer having a dry film thickness of 2·3 μηι are laminated, and finally a pressure-sensitive protection layer is applied. Film (polypropylene film having a thickness of 12 μm). Thus, photosensitive transfer by integrating a temporary support, a thermoplastic resin layer, an intermediate layer (oxygen barrier film), and a black photosensitive resin composition layer was prepared. Material, sample name is photosensitive transfer material Κ 1. &lt;coating solution for thermoplastic resin layer: prescription Η 1 &gt; • methanol 1 1 · 1 part • propylene glycol monomethyl ether acetate 6.36 parts

• Methyl ethyl ketone 52.4 parts • Methyl methacrylate / Ethyl hexyl acrylate / Benzyl methacrylate / methacrylic acid copolymer (copolymerization composition ratio (Morby ratio) = 5 5 / 1 1.7/4.5 /2 8.8, molecular weight = 100,000, Tg and 7 (TC) 5.83 parts • styrene/acrylic acid copolymer (copolymerization composition ratio (mole ratio) = 63/37, molecular weight = 10,000, Tg and loot: ) 13 ·6 parts • 2,2-bis[4-(A propyl ethoxylated polyethoxy) phenyl] propyl compound (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) 9 j parts -65- 200841125 • The aforementioned interface activity Agent 1 〇. 5 4 parts &lt; Coating solution for intermediate layer: Prescription Pl&gt; • Polyvinyl alcohol (PVA205, manufactured by Kuraray Co., Ltd., saponification degree = 88%, degree of polymerization 5 5 0) 32.2 parts • Polyvinylpyrrole Pyridone (ISP · Japan, Κ-30) 14·9 parts • 524 parts of distilled water • 429 parts of methanol ^ Spray the glass detergent solution adjusted to 25 °C to the alkali-free by a shower The glass substrate was washed for 20 seconds while being washed with a rotating brush having a bristles, washed with pure water spray, and then sprayed with a decane coupling solution (Ν_β (amine ethyl) γ-aminopropyl group) by a shower. Trimethoxy sulfonium 0.3 mass% aqueous solution, trade name: ΚΒΜ603, Shin-Etsu Chemical Industry Co., Ltd. for 20 seconds, pure water spray washing. The substrate was heated at 100 ° C for 2 minutes by a substrate preliminary heating device. The obtained decane coupling treatment glass substrate The cover film is removed from the photosensitive transfer material K1 produced by the above-described production method, and the surface of the photosensitive resin composition layer exposed after the removal is overlapped with the surface of the decane coupling treatment glass substrate, and a laminator is used. (Manufactured by Hitachi Industrial Co., Ltd. (Lamic II type)), the substrate heated at 1 ° C for 2 minutes has a rubber roller temperature of 130 ° C, a linear pressure of 100 N/cm, and a conveying speed of 2.2 m / min. Then, the polyethylene terephthalate film temporary support is peeled off at the interface with the thermoplastic resin layer to remove the temporary support. After the temporary support is peeled off, by the proximity of the ultrahigh pressure mercury lamp Type exposure machine (made by Hitachi High-Tech Electronics Co., Ltd.), which makes the substrate perpendicular to the reticle (quartz exposure reticle with -66-200841125 portrait pattern) In the standing state, the distance between the mask surface and the photosensitive resin composition layer is set to 200 μm, and the exposure amount is 70 mJ/cm 2 for pattern exposure. Next, the KOH developing solution [CDK-1 (trade name)) 100-fold dilution (pH=ll.8), Fuji Photo Film (manufactured by Fuji Photo Film) was used to develop the unexposed portion of the photosensitive resin composition layer and the underlying intermediate layer and the thermoplastic resin layer to obtain a glass substrate. Patterned portrait on the. Then, under the atmosphere, an aligner is used to expose the substrate to 200 00 m J/cm 2 # from the front side of the substrate, and then post-bake at 240 ° C for 50 minutes to obtain an optical density of 4.0. Black matrix (away from the wall). Next, in the same manner as in the first embodiment, a color filter or a liquid crystal display device was produced. (Comparative Example 1) In the same manner as in Example 1, except that the ink-repellent was not added in the preparation of the photosensitive resin composition, a substrate with a drawing, a color filter, and a liquid crystal display were produced. Device. (Comparative Example 2) In addition to the first embodiment, in the preparation of the photosensitive resin composition, the amount of the ink-repellent added is changed from 1% to 0.5% based on the total solid content of the photosensitive resin composition. In the same manner as in the first embodiment, a substrate with a painting wall, a color filter, and a liquid crystal display device were produced. (Comparative Example 3) In the same manner as in the first embodiment, in the same manner as in the first embodiment, in the same manner as in the first embodiment, the -67 - 200841125 was attached to the wall except for the case where the drawing wall was formed without using a vacuum drying device. Substrate, color filter and liquid crystal display device. (Example 6) Except that in Example 1, drying of the photosensitive resin composition K1 after application was carried out for 2 minutes in a drying apparatus having a drying air volume of 〇.5 m/s in a device at a temperature of 100 °C. A substrate, a color filter, and a liquid crystal display device with a black matrix (painting wall) were produced in the same manner as in Example 1 except that the photosensitive resin composition layer K1 having a film thickness of about 2.3 μm was obtained. At this time, the amount of dry air in the apparatus was measured at a height of 0.5 cm Φ from the layer surface of the photosensitive resin composition layer K 1 and measured using SYSTEM6243 (manufactured by KANOMAX Co., Ltd.). (Examples 7 to 1 1) In the same manner as in Example 6, except that the content of the ink-repellent, the drying temperature, the drying time, the dry air volume, and the drying method were changed to those shown in Table 2 below. A substrate, a color filter, and a liquid crystal display device with a black matrix (out of the wall) are prepared. (Examples 12 to 14) ^ In addition to Example 6, the content of the ink-repellent, the drying temperature, the drying time, the dry air volume, and the drying method were changed to those shown in Table 2 below, and the painting wall was removed. The drying apparatus of "〇·5 m / s temperature of 100 °C" used in the formation was replaced with a vacuum drying oven DP-22 (manufactured by YAMATO Co., Ltd.), and the degree of vacuum shown in Table 2 below was used. In the same manner as in Example 1, except that the coating film was dried, a substrate with a black matrix (painting wall), a color light-emitting sheet, and a liquid crystal display device were produced. Further, the measurement of the degree of vacuum was carried out using a Barratron-68-200841125 vacuum gauge manufactured by MKS Co., Ltd., Japan. (Comparative Examples 4 to 7) In the same manner as in Example 6, except that the content of the ink-repellent, the drying temperature, the drying time, the dry air volume, and the drying method were changed to those shown in Table 2 below. A substrate, a color filter, and a liquid crystal display device with a black matrix (out of the wall) are prepared. (Example 15) Except that in Example 5, the φ after the application of the photosensitive resin composition K1 was dried, and the dry air volume in the apparatus was 〇.5 m/s, and it was carried out in a drying apparatus at a temperature of 10 ° C. A photosensitive transfer material Κ 1 was produced in the same manner as in Example 5 except that the photosensitive resin composition layer Κ1 having a film thickness of about 2.3 μm was obtained in 2 minutes. In this case, the air volume in the apparatus was measured at a height of 55 cm from the surface of the layer of the photosensitive resin composition layer Κ1, and was measured using SYSTEM6243 (manufactured by Seiko Instruments Inc.). &lt;Evaluation&gt; 1) Surface energy of the photosensitive resin composition. Measurements of Examples 1 to 5 and Comparative Examples 1 to 3 were carried out at 25 ° C using a surface tension meter (CBVP_A3, manufactured by Kyowa Interface Science Co., Ltd.). The surface energy of the photosensitive resin composition before the addition of the ink-repellent agent and the surface energy of the photosensitive resin composition after the addition of the ink-repellent agent. The results are shown in Table 2. 2) Water-repellent/inking property (contact angle) on the wall of the painting, except in the first to fifth embodiments and the first to seventh embodiments, in the case where the photosensitive resin composition layer K1 is formed, the mask is not used. The exposure was carried out in the same manner as in Examples 1 to 15 and Comparative Examples 1 to 7, and then subjected to a baking treatment (heat treatment step) under the same conditions -69 - 200841125 to obtain a test sensitivity. Resin composition layer. After the post-baking treatment, the photosensitive resin composition layer was allowed to stand at room temperature for 1 hour, and then cooled, and then subjected to a contact angle measuring device (contact angle meter CA-A manufactured by Kyowa Interface Science Co., Ltd.) to give an example. 1 red color (1^ pixel is used as a liquid sample (ink sample) of 20 scales as a liquid sample (ink sample), and the photosensitive resin composition layer for contact test is used, and the photosensitive property is tested. The # droplet (ink drop) of the colored ink composition for R pixel was formed on the resin composition layer. The shape of the ink droplet was observed by the peephole of the contact angle meter, and the drop was placed at 25 t under the drop. After 1 sec., the ink contact angle 墨 of the ink droplets was determined. In Examples 6 to 15 and Comparative Examples 4 to 7, the ink droplets were changed to water droplets, and the water contact after the post-baking was measured by the same procedure. The results are shown in Table 2. 3) In-plane uniformity (film thickness variation rate) The black matrix (out of the wall) produced in Examples 6 to 15 and Comparative Examples 4 to 7 was measured at 5 points at any point. The thickness is calculated as the average 値Lav. Among the thicknesses of the five places, the difference between the average 値Lav and the average 値Lav was taken as Lm, and the film thickness variation rate (%) was obtained by the following formula, and the in-plane uniformity was used as an evaluation index. The results are shown in Table 2 below. Film thickness variation rate (%) = Lm/Lav 4) Display unevenness of liquid crystal display device When a test signal of gray is input to the liquid crystal display devices produced in Examples 1 to 15 and Comparative Examples 1 to 7, visual observation is performed. Gray display, according to the following -70-200841125 evaluation criteria to evaluate the occurrence of display unevenness. The results are shown in Table 2 below. &lt;Evaluation Criteria&gt; • A: No display unevenness, and a very good display image was obtained. • B: The edge of the glass substrate is slightly uneven, but it has no effect on the display and the image is good. • C : There is a slight unevenness in the display section, but it is within the range that is practically permissible. • D : Unevenness is seen on the display, and the displayed image is slightly worse. • E : Strong unevenness is seen on the display, and the displayed image is very poor. -71 - 200841125

&lt;Ν嗽Note coating sword|Coat I coating transfer coater coating I 1 coating 1 1 coating 1 1 coating coating coating coating coating coating coating transfer strip coating coating If &lt;&lt; PQ PQ &lt; m Q PQ CQ &lt; U &lt; uu &lt;&lt;&lt; PQ w QQQ Film thickness variation rate % 1 1 1 1 1 1 1 1 CN cn κη (N &lt;N Ο) r—^ vn — H (N sir—Η Cn (N m ^T) in dry condition dry air volume m/s 1 1 1 1 1 1 1 1 vn o' m Ο d (N CNo 〇(N o CN 〇&lt;N 〇vn ov〇〇&lt;N (N VO o drying time seconds 1 1 1 1 1 I 1 ! o 04 S τ—1; si—Hi rH omoo (N 〇(N 〇〇〇(N 〇〇〇o CN 11- 1 1 1 1 1 1 1 1 Oo Ο ο oo (N ooooomoo 〇o 〇o 〇H o T—i Ink contact angle υη in cn 0 Ο ?: o ο νο to 〇κη trv ov〇mo On rn inch 〇 tr tr in o ON • TV O 〇ooom Water contact angle Ο ON ON 〇 (N ON o 〇?n 卜 g 1 1 1 1 1 1 1 1 1 1 1 1 1 1 'vacuum degree Pa τ a T-H rn τ 4 r —H t—H r—^ 1 1 1 1 1 1 1 rn rr&gt; rn rH 1 1 1 1 1 Surface (mN/m) Surface energy difference 1-2. m (N CO ro CN m &lt;N (N 〇〇vq m &lt;Ν 1 1 1 1 1 1 1 1 1 1 1 1 1 1 Teng surface (3⁄4 O Csi οο Os r—I 〇〇(NO m rri CSJ ο 1 1 1 1 1 1 I 1 I 1 1 1 1 1 1 m before the ink addition (N m CM m CN m (N m (N m CN m &lt;N m rr; (Μ ! 1 II 1 1 1 1 1 I 1 II 1 vn i_B _H r—H 〇in d ^—4 ▼—H 1—H mot—H mot~t Example 1 Implementation Example 2 Example 3 Example 4 Example 5 Comparative Example 1 Comparative Example 2: Comparative Example 3 Example 6 丨 Example 7 Example 8 Example 9 Example 10 Example 11 Example 12 Example 13 Example 14 Implementation Example 15 Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 7 In the second embodiment, the first embodiment, the first embodiment, the photosensitive resin film of the first embodiment of the present invention, is used as shown in Table 2 When the formation method was used to produce a paint wall, a color filter, and a liquid crystal display device (Examples 1 to 5), the display was not good. On the other hand, in Comparative Example 1 in which no ink-repellent was contained, and Comparative Example 2 in which the surface energy difference before and after the addition of the ink-repellent agent was less than 2 mN/m, Comparative Example 3 in which vacuum drying was not performed showed unevenness. Deterioration, exceeding the allowable range. Moreover, when the method for forming a photosensitive resin film according to the second embodiment of the present invention is used to form a paint removing wall, a color filter, and a liquid crystal display device (9 cases of 6 to 15), the formed film is applied. The in-plane uniformity is high, and the height unevenness of the formed black matrix is suppressed, and a color filter having high in-plane uniformity (or within the allowable range) can be obtained. The liquid crystal display device using the color filter can prevent display unevenness during image display, and can obtain high-quality images. On the other hand, in Comparative Example 4 containing no ink-repellent, the ink-repellent property was poor, and the in-plane uniformity was also inferior. Further, in Comparative Examples 5 and 6 which were dried at a dry air volume of more than 0.5 m/s, the in-plane uniformity was also inferior, and the black matrix height was not suppressed. Therefore, when color filters and liquid crystal display devices are used for image display, display unevenness is deteriorated, and high-quality image display is difficult. In the above-mentioned embodiment, the example in which the exemplary compound (丨) is used as the ink-repellent agent is described as a center. However, when other ink-repellent agents are used, or two or more types are used in combination, the same as in the present embodiment. By forming a photosensitive resin film by vacuum drying, the same effect as in the first embodiment can be obtained, and display unevenness can be suppressed in the same manner as described above. -73- '200841125 As described above, the method for forming a photosensitive resin film according to the first embodiment of the present invention can reduce the in-plane of the photosensitive resin film by forming a pattern image (for example, a wall) The film thickness changes. Further, according to the method of forming a photosensitive resin film according to the first embodiment of the present invention, it is possible to provide a photosensitive transfer material having a photosensitive resin film on which a pattern image (for example, a wall) is formed by transfer The water repellency and the ink repellency are excellent, and the adhesion between the pattern image and the substrate on which the pattern image is formed can be satisfactorily maintained. In addition, according to the method for forming a photosensitive resin film according to the first embodiment of the present invention, it is possible to provide a high-grade color filter in which color mixture and color unevenness are suppressed, a simple manufacturing method thereof, and display unevenness. A display device that suppresses the display of high-quality images. According to the method of forming a photosensitive resin film according to the second embodiment of the present invention, it is possible to provide a black matrix or the like between the divided pixels for forming a pixel group by using a resin composition containing an ink-repellent agent in advance. When the wall is painted, it has a good ink repellency that prevents the ink from spreading, and can form a resin film for suppressing the formation of the paint wall by changing the film thickness (more preferably within ±5% of the in-plane uniformity of the coating film). A photosensitive resin' film which is highly irregular and has a small height and a photosensitive transfer material using the same can be obtained. According to the method of forming a photosensitive resin film according to the second embodiment of the present invention, it is possible to provide a substrate with a painting wall capable of preventing high-quality image display by preventing color mixture, color unevenness, and the like from being suppressed in display images. , a color filter and a method of manufacturing the same, and a display device. BRIEF DESCRIPTION OF THE DRAWINGS -74-.200841125 Fig. 1 is a cross-sectional view for explaining a color filter such as a top surface, a side surface, and a concave portion on a substrate. [Description of main component symbols] 1 Off-paint wall 2 Colored liquid composition 3 Concave part 4 Upper side 5 Side framing 6 Substrate

-75 -

Claims (1)

200841125 X. Patent application scope: 1. A method for forming a photosensitive resin film, which comprises: adding an ink-repellent agent, and sensitizing the difference between the surface energy of the ink-repellent agent before and after the addition is 2 mN/m or more a step of forming a resin composition; and coating the photosensitive resin composition on a substrate or a temporary support and vacuum drying to form a photosensitive resin film. 2. The method of forming a photosensitive resin film according to the first aspect of the invention, wherein the vacuum drying is performed at a degree of vacuum of 1 (T3Pa or less. #3. A method of forming a photosensitive resin film according to claim 1 of the patent application. Wherein the ink-repellent contains (a) a repeating unit having at least a fluorine atom in a side chain, (b) a repeating unit having a polyether structure in a side chain, and (c) a repeating unit having a carboxyl group in a side chain. The method for forming a photosensitive resin film according to the third aspect of the invention, wherein the (b) repeating unit having a polyether structure in a side chain is a repeating unit having a blocked polyether structure in a side chain. The method of forming a photosensitive resin film according to the first aspect of the invention, wherein the amount of the ink-repellent added is 0.5% by mass or more based on the total solid content of the photosensitive resin composition. A printing material comprising a photosensitive resin layer formed on a temporary support by a method for forming a photosensitive resin film according to claim 1 of the patent application. 7 - A method for producing a color filter, comprising: Use such as Shen The method for forming a photosensitive resin film according to the first aspect of the patent range or the photosensitive transfer material of claim 6 of the patent application, the step of forming a wall away from the substrate on the substrate-76-200841125; The step of forming the colored region by the ink jet method from the concave portion on the substrate divided by the crucible wall. 8 - A color filter manufactured by the method of producing the color filter of claim 7 of the patent application. A display device comprising the color filter of the eighth aspect of the patent application, wherein the photosensitive resin film is formed by coating a photosensitive resin composition containing an ink-repellent agent. And a drying step of drying the coated coating film by a flow rate of 〇5 cm/s from a height of 膜5 cm/s from the film surface. 1 1 ·If the patent scope of the application is the first item A method of forming a photosensitive resin film, wherein the drying is performed by blowing a surface of the coating film with a dry air having a flow rate of 0.5 m/s or less. 1 2 . Photosensitivity of the patent range of the patent application a method of forming a resin film, wherein The degree of vacuum is 1 (T3 Pa or less), and vacuuming is performed to dry (vacuum suction = "space lower than atmospheric pressure"). 1 3 · Photosensitive resin of the first paragraph of the application A method of forming a film, wherein the ink-repellent contains (a) a repeating unit having at least a fluorine atom in a side chain, (b) a repeating unit having a polyether structure in a side chain, and (c) a repeat having a carboxyl group in a side chain The method for forming a photosensitive resin film according to claim 13, wherein the (b) repeating unit having a polyether structure in a side chain has a blocked polyether structure. -77- 200841125 1 A photosensitive transfer material comprising a photosensitive resin layer formed by the method for forming a photosensitive resin film according to the first aspect of the invention. 16. A substrate having a wall attached to the wall, the resin having a resin-coated wall film having an ink-repellent agent and having an in-plane film thickness uniformity of ±5 % or less. The method for producing a color filter, comprising: a method for forming a photosensitive resin film according to the first aspect of the patent application, or a photosensitive transfer material according to claim 15 of the patent application, a step of forming a layer of a photosensitive resin layer on a substrate, exposing the formed photosensitive resin layer to a pattern by a photomask, and developing a process of forming an off-paint wall from the image wall, and The recessed portion on the divided substrate is subjected to a coloring liquid composition by an inkjet method to form a colored region forming step of the colored region. 1 8 - A color filter produced by the method of producing a color filter of claim 17 of the patent application. A display device comprising a color filter as disclosed in claim 18 of the patent application. -78-