WO2007057664A3 - Procede de dessin d'un film mince - Google Patents

Procede de dessin d'un film mince Download PDF

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Publication number
WO2007057664A3
WO2007057664A3 PCT/GB2006/004261 GB2006004261W WO2007057664A3 WO 2007057664 A3 WO2007057664 A3 WO 2007057664A3 GB 2006004261 W GB2006004261 W GB 2006004261W WO 2007057664 A3 WO2007057664 A3 WO 2007057664A3
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
patterning
intermediate layer
patterned
depositing
Prior art date
Application number
PCT/GB2006/004261
Other languages
English (en)
Other versions
WO2007057664A2 (fr
Inventor
Donal Bradley
Mello John De
Jingsong Huang
Original Assignee
Imp College Innovations Ltd
Donal Bradley
Mello John De
Jingsong Huang
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imp College Innovations Ltd, Donal Bradley, Mello John De, Jingsong Huang filed Critical Imp College Innovations Ltd
Priority to EP06808551.3A priority Critical patent/EP1955112B1/fr
Priority to US12/094,070 priority patent/US8828649B2/en
Priority to JP2008540685A priority patent/JP2009516380A/ja
Publication of WO2007057664A2 publication Critical patent/WO2007057664A2/fr
Publication of WO2007057664A3 publication Critical patent/WO2007057664A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention porte sur un procédé de dessin d'un film mince consistant à déposer une couche intermédiaire sensible aux radiations entre un substrat et une couche de film mince, et à utiliser un rayonnement dessiné pour dessiner le film mince.
PCT/GB2006/004261 2005-11-17 2006-11-15 Procede de dessin d'un film mince WO2007057664A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP06808551.3A EP1955112B1 (fr) 2005-11-17 2006-11-15 Procede de structuration d' un film mince
US12/094,070 US8828649B2 (en) 2005-11-17 2006-11-15 Method of patterning a thin film
JP2008540685A JP2009516380A (ja) 2005-11-17 2006-11-15 薄膜をパターニングする方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0523437.2A GB0523437D0 (en) 2005-11-17 2005-11-17 A method of patterning a thin film
GB0523437.2 2005-11-17

Publications (2)

Publication Number Publication Date
WO2007057664A2 WO2007057664A2 (fr) 2007-05-24
WO2007057664A3 true WO2007057664A3 (fr) 2007-08-09

Family

ID=35580227

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2006/004261 WO2007057664A2 (fr) 2005-11-17 2006-11-15 Procede de dessin d'un film mince

Country Status (6)

Country Link
US (1) US8828649B2 (fr)
EP (1) EP1955112B1 (fr)
JP (1) JP2009516380A (fr)
CN (1) CN101384963A (fr)
GB (1) GB0523437D0 (fr)
WO (1) WO2007057664A2 (fr)

Families Citing this family (28)

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FR2910007B1 (fr) * 2006-12-19 2009-03-06 Commissariat Energie Atomique Procede de preparation d'un film organique a la surface d'un support solide dans des conditions non-electrochimiques, support solide ainsi obtenu et kit de preparation
US7615483B2 (en) * 2006-12-22 2009-11-10 Palo Alto Research Center Incorporated Printed metal mask for UV, e-beam, ion-beam and X-ray patterning
US7884021B2 (en) * 2007-02-27 2011-02-08 Spartial Photonics, Inc. Planarization of a layer over a cavity
TWI377713B (en) 2007-10-19 2012-11-21 Ind Tech Res Inst Stacked structure and method of patterning the same and organic thin film transistor and array including the same
KR20090059811A (ko) * 2007-12-07 2009-06-11 한국전자통신연구원 유기 메모리 소자 및 그의 제조방법
TW201001624A (en) 2008-01-24 2010-01-01 Soligie Inc Silicon thin film transistors, systems, and methods of making same
KR100999377B1 (ko) * 2008-06-18 2010-12-09 한국과학기술원 유기기반 태양전지 및 그의 제조방법
US8809111B2 (en) 2009-10-20 2014-08-19 Cornell University Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers
JP2011210407A (ja) * 2010-03-29 2011-10-20 Sumitomo Chemical Co Ltd 発光装置
JP4893839B2 (ja) * 2010-03-29 2012-03-07 住友化学株式会社 発光装置の製造方法
KR101263327B1 (ko) * 2011-05-06 2013-05-16 광주과학기술원 레이저 유도 이온 가속용 박막 부재 제조방법 및 이를 이용한 박막 표적 및 그 제조방법
FR2980913B1 (fr) * 2011-09-30 2014-04-18 Commissariat Energie Atomique Procede de structuration d'une couche active organique deposee sur un substrat
KR101621636B1 (ko) * 2011-12-20 2016-05-16 이 아이 듀폰 디 네모아 앤드 캄파니 격납된 층을 제조하기 위한 방법 및 물질, 및 이를 사용하여 제조된 소자
US9935152B2 (en) 2012-12-27 2018-04-03 General Electric Company X-ray detector having improved noise performance
KR20140096863A (ko) * 2013-01-29 2014-08-06 삼성디스플레이 주식회사 그래핀 패턴 형성 방법
US9917133B2 (en) 2013-12-12 2018-03-13 General Electric Company Optoelectronic device with flexible substrate
US9257480B2 (en) 2013-12-30 2016-02-09 General Electric Company Method of manufacturing photodiode detectors
EP3117204B1 (fr) 2014-03-13 2021-06-16 General Electric Company Détecteur numérique à rayons x incurvé pour inspection de soudure
CN103955023B (zh) * 2014-05-23 2016-04-13 中国科学院微电子研究所 一种制备表面等离子体激元纳米光子器件的方法
KR20180029233A (ko) * 2015-07-03 2018-03-20 내셔날 리서치 카운실 오브 캐나다 초협폭-간극 선을 인쇄하는 방법
EP3317724B1 (fr) * 2015-07-03 2022-10-26 National Research Council of Canada Réalisation d'un motif métallique par auto-alignement basée sur le frittage photonique de nanoparticules métalliques
US11094530B2 (en) 2019-05-14 2021-08-17 Applied Materials, Inc. In-situ curing of color conversion layer
US11239213B2 (en) 2019-05-17 2022-02-01 Applied Materials, Inc. In-situ curing of color conversion layer in recess
TWI757973B (zh) 2019-12-06 2022-03-11 美商伊路米納有限公司 使用圖形檔案控制電子元件的方法和裝置以及相關的電腦程式產品和圖形檔案組
CN113903873B (zh) * 2020-06-22 2023-04-07 京东方科技集团股份有限公司 量子点发光面板、显示装置和制作方法
JP2023535069A (ja) 2020-07-24 2023-08-15 アプライド マテリアルズ インコーポレイテッド Ｕｖ－ｌｅｄ硬化用の、チオール系架橋剤を有する量子ドット調製物
US11646397B2 (en) 2020-08-28 2023-05-09 Applied Materials, Inc. Chelating agents for quantum dot precursor materials in color conversion layers for micro-LEDs
CN115094374A (zh) * 2022-06-23 2022-09-23 哈尔滨工业大学 用于制备图案化金属氧化物薄膜的材料和方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999047976A1 (fr) * 1998-03-17 1999-09-23 Kodak Polychrome Graphics Llc Planche d'impression planographique a sec, a copiage par inversion

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US5198153A (en) 1989-05-26 1993-03-30 International Business Machines Corporation Electrically conductive polymeric
ATE171560T1 (de) 1993-03-09 1998-10-15 Koninkl Philips Electronics Nv Herstellungsverfahren eines musters von einem elektrisch leitfähigen polymer auf einer substratoberfläche und metallisierung eines solchen musters
US5834071A (en) * 1997-02-11 1998-11-10 Industrial Technology Research Institute Method for forming a thin film transistor
US6649327B2 (en) 2001-10-25 2003-11-18 The United States Of America As Represented By The Secretary Of The Navy Method of patterning electrically conductive polymers
CN100440579C (zh) 2002-04-10 2008-12-03 大日本印刷株式会社 电致发光元件的制造方法
US7261920B2 (en) * 2002-04-24 2007-08-28 Sipix Imaging, Inc. Process for forming a patterned thin film structure on a substrate
EP1566987B1 (fr) 2002-11-27 2011-05-11 Dai Nippon Printing Co., Ltd. Procede de fabrication d'element electroluminescent
JP4250038B2 (ja) * 2003-08-20 2009-04-08 シャープ株式会社 半導体集積回路
GB2419216A (en) * 2004-10-18 2006-04-19 Hewlett Packard Development Co Display device with greyscale capability
JP3972929B2 (ja) * 2004-09-27 2007-09-05 セイコーエプソン株式会社 露光マスクの位置合わせ方法、及び薄膜素子基板の製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999047976A1 (fr) * 1998-03-17 1999-09-23 Kodak Polychrome Graphics Llc Planche d'impression planographique a sec, a copiage par inversion

Also Published As

Publication number Publication date
EP1955112A2 (fr) 2008-08-13
GB0523437D0 (en) 2005-12-28
US8828649B2 (en) 2014-09-09
CN101384963A (zh) 2009-03-11
JP2009516380A (ja) 2009-04-16
WO2007057664A2 (fr) 2007-05-24
US20080278068A1 (en) 2008-11-13
EP1955112B1 (fr) 2015-03-04

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