WO2007007580A1 - Dispositif et procédé d’isolation contre les vibrations - Google Patents

Dispositif et procédé d’isolation contre les vibrations Download PDF

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Publication number
WO2007007580A1
WO2007007580A1 PCT/JP2006/313243 JP2006313243W WO2007007580A1 WO 2007007580 A1 WO2007007580 A1 WO 2007007580A1 JP 2006313243 W JP2006313243 W JP 2006313243W WO 2007007580 A1 WO2007007580 A1 WO 2007007580A1
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WO
WIPO (PCT)
Prior art keywords
support mechanism
vibration isolation
vibration
displacement
actuator
Prior art date
Application number
PCT/JP2006/313243
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English (en)
Japanese (ja)
Inventor
Takeshi Mizuno
Original Assignee
National University Corporation Saitama University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National University Corporation Saitama University filed Critical National University Corporation Saitama University
Priority to JP2006541533A priority Critical patent/JPWO2007007580A1/ja
Publication of WO2007007580A1 publication Critical patent/WO2007007580A1/fr

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F7/00—Vibration-dampers; Shock-absorbers
    • F16F7/10—Vibration-dampers; Shock-absorbers using inertia effect
    • F16F7/1005—Vibration-dampers; Shock-absorbers using inertia effect characterised by active control of the mass
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems

Definitions

  • the present invention relates to a vibration isolation device and a vibration isolation method that suppress transmission of vibrations, and in particular, achieves excellent vibration isolation characteristics at low cost.
  • a vibration isolator is applied to the manufacturing apparatus to prevent intrusion of disturbances such as vibration.
  • the vibration propagates from the floor to the equipment (this is called ground disturbance).
  • a “passive vibration isolation device” that supports a vibration isolation object such as a device or table with a low-rigidity mechanical panel or air panel has been widely used.
  • vibration F is generated by the disturbance F that directly acts on the vibration isolation object (this is called direct disturbance). Vibration cannot be suppressed.
  • the object 10 for vibration isolation is supported by the actuator 13, the vibration of the object 10 for vibration isolation is detected by the acceleration sensor 11, and the controller 12 2 cancels the vibration.
  • Both the “active vibration isolator” that drives the actuator 13 and the conventional force are used.
  • the active vibration isolator is about 10 times more expensive than the passive vibration isolator.
  • Patent Document 1 the present inventors have combined a support mechanism using a panel and a zero power magnetic levitation control mechanism to reduce vibrations caused by ground motion disturbance and linear motion disturbance. Propose.
  • the zero-power magnetic levitation control mechanism is a mechanism that achieves magnetic levitation using the electromagnet 22 and the permanent magnet 21 attached to the levitation object 28 so as to oppose the electromagnet 22 as shown in FIG. 12 (b). .
  • the suction of the permanent magnet 21 I balance the force and gravity, and the mass m
  • mass Am is applied to the upper object 28, in order to obtain an increase in attractive force commensurate with the increase in gravity, the energization of the electromagnet 22 is increased, and the permanent magnet 21 is further attracted to the electromagnet 22 side. Is called.
  • a normal panel having a positive stiffness increases in length as the mass increases due to an increase in mass Am.
  • the zero power magnetic levitation control mechanism can be viewed as a panel having negative rigidity because the distance between the electromagnet 22 and the permanent magnet 21 is shortened when gravity is increased by increasing the mass ⁇ m.
  • kc kl -k2 / (kl + k2)
  • the vibration isolator of Patent Document 1 has zero power that acts as a panel with positive stiffness (kl) 26 and a panel with negative stiffness (one kl), as shown in FIG.
  • the overall rigidity (kc) is set to infinity, and vibration of the vibration isolation table 24 due to linear motion disturbance is suppressed.
  • Fig. 15 (a) when a direct acting disturbance is applied to the vibration isolation table 24, as shown in Fig. 15 (b), the intermediate is directly connected to the panel 26 with respect to the base 25. Only the base 23 moves and the vibration isolation table 24 does not move.
  • vibration due to ground disturbance can be eliminated by setting the panel 26 stiffness (kl) to a small value.
  • Patent Document 1 Japanese Patent Laid-Open No. 2002-81498
  • the vibration isolator of Patent Document 1 has a problem that when the linear motion disturbance is large, the vibration cannot be completely suppressed following the linear motion disturbance (that is, zero compliance cannot be realized). There is.
  • FIG. 16 shows various loads applied to the vibration isolation table 24 of this vibration isolation device.
  • the relative displacement of the vibration isolation table 24 with respect to the intermediate base 23, the displacement of the intermediate base 23 with respect to the base 25, and the base 25 The result of measuring the displacement between 24 and 25 is shown. Yes.
  • the horizontal axis indicates the magnitude of the downward load in N (Newton), and the vertical axis indicates the magnitude of the upward displacement in mm.
  • the displacement of the vibration isolation table 24 relative to the base 25 is obtained by accounting for the relative displacement of the vibration isolation table 24 relative to the intermediate base 23 and the displacement of the intermediate base relative to the base.
  • 0 2 ZX 3 is the negative stiffness.
  • the magnitude of negative stiffness is proportional to the third power of the reciprocal of the gap.
  • the distance between the intermediate base 23 and the base 25 decreases in proportion to the weight (indicated by a negative displacement in FIG. 16).
  • the gap between the magnet 22 and the permanent magnet 21 of the zero-power magnetic levitation control mechanism is reduced and the magnitude of the negative stiffness is increased, so how to increase the relative displacement of the vibration isolation table 24 relative to the intermediate platform 23 is Get smaller. Therefore, the displacement of the vibration isolation table 24 with respect to the base 25 is shifted to the negative side.
  • the present invention solves these conventional problems, and can eliminate vibrations due to ground disturbance and linear disturbance, and can achieve zero compliance over a wide load range. Therefore, the object is to provide a low-cost vibration isolator and a vibration isolation method.
  • the support mechanism for supporting the vibration isolation object includes an active first support mechanism having an actuator, and a low-rigidity structure arranged in series with the first support mechanism.
  • the position of the object to be isolated does not change even if vibrations occur due to ground motion disturbance or linear motion disturbance.
  • the first support mechanism and the second support mechanism are connected in series in the vertical direction so that the second support mechanism is positioned above the first support mechanism. Can be arranged.
  • the first support mechanism and the second support mechanism are connected in series in the vertical direction so that the first support mechanism is positioned above the second support mechanism. Can be arranged.
  • the mass driven by the actuator can be reduced only to the vibration isolation table, so that the effect of reducing the size of the actuator can be obtained.
  • the first support mechanism and the second support mechanism can be arranged in series in the horizontal direction.
  • vibration isolation in the horizontal direction can be performed.
  • the vibration isolator of the present invention includes an intermediate base supported by an active first support mechanism having an actuator with respect to the floor, and a second rigid low relative to the intermediate base.
  • the vibration isolation table supported by the support mechanism, the measurement means for measuring the displacement of the second support mechanism, and the first support so as to cancel the displacement of the second support mechanism based on the measurement result of the measurement means Control means for controlling the displacement of the actuator of the support mechanism.
  • the vibration isolator of the present invention is a medium supported by the second support mechanism having low rigidity with respect to the floor.
  • a voice coil motor or a piezoelectric actuator can be used as the actuator of the first support mechanism, and a mechanical panel or an air panel can be used as the second support mechanism.
  • the vibration isolation method of the present invention includes an active first support mechanism including an actuator and a low-rigidity second support mechanism arranged in series with the first support mechanism.
  • This is a vibration isolation method that suppresses the linear motion disturbance acting on the vibration isolation object by supporting the object and blocks the ground motion disturbance transmitted from the floor to the vibration isolation object. Then, based on the measurement result, the displacement of the actuator of the first support mechanism is controlled so as to cancel the displacement of the second support mechanism.
  • the position of the object to be isolated does not change even if vibrations occur due to ground motion disturbance or linear motion disturbance.
  • the vibration isolation device of the present invention is capable of vibration isolation due to ground disturbance and linear disturbance, and can achieve zero compliance over a wide load range, and has high reliability. is doing. Also, this device can be manufactured at low cost.
  • the vibration isolation method of the present invention can achieve zero compliance over a wide load range using this vibration isolation device.
  • FIG. 1 is a diagram showing a configuration of a vibration isolation device according to an embodiment of the present invention.
  • FIG. 2 is a diagram for explaining a displacement canceling operation of the vibration isolation device according to the embodiment of the present invention.
  • [3] A diagram showing a displacement cancellation control system of the vibration isolation device in the embodiment of the present invention.
  • FIG. 5 is a diagram showing a vibration isolator arranged horizontally in the embodiment of the present invention.
  • FIG. 6 is a diagram showing an apparatus used for measurement of vibration isolation characteristics of the vibration isolation apparatus in the embodiment of the present invention.
  • FIG. 7 A diagram showing a block diagram of a control system for controlling the VCM of the measuring device.
  • FIG. 9 A diagram showing another displacement cancellation control system of the vibration isolation device in the embodiment of the present invention.
  • FIG. 14 is a diagram showing the configuration of a conventional vibration isolator
  • FIG. 15 is a diagram for explaining the vibration isolation operation of a conventional vibration isolation device.
  • FIG. 16 is a diagram showing vibration isolation characteristics of a conventional vibration isolation device
  • the vibration isolator includes a base 35, an intermediate base 33, a vibration isolation table 34, and a first base that is on the base 35 and supports the intermediate base 33.
  • the support mechanism 31 and the second support mechanism 32 provided on the intermediate base 33 and supporting the vibration isolation table 34 are provided with a low rigidity. It expands and contracts in response to the applied linear motion disturbance.
  • the second support mechanism 32 absorbs vibration due to ground motion disturbance that propagates through the base 35 and suppresses propagation of the vibration to the vibration isolation table 34.
  • the first support mechanism 31 is an active support mechanism having an actuator, and the actuator is controlled so as to cancel the displacement of the distance between the vibration isolation table 34 and the intermediate base 33, and this control is immediately performed. It has a quick response.
  • FIG. 2 shows the first support mechanism 31 and the second support mechanism when a linear motion disturbance is applied to the vibration isolation table 34.
  • the state of displacement of the support mechanism 32 is shown.
  • the second support mechanism 32 keeps the distance between the vibration isolation table 34 and the intermediate base 33 at xl, and the first support mechanism 31 sets the distance between the intermediate base 33 and the base 35 to x2.
  • a linear motion disturbance is applied to the vibration isolation table 34
  • the second support mechanism 32 contracts as shown in Fig. 2 (b)
  • the distance between the vibration isolation table 34 and the intermediate base 33 becomes (xl Assume that ⁇ X) has changed.
  • the displacement of the distance between the vibration isolation table 34 and the intermediate base 33 is detected by, for example, a mechanical or optical gap sensor or the like, and the first support mechanism 31 determines that the intermediate base 33 It is controlled to keep the distance between the bases 35 at ( ⁇ 2 + ⁇ ). As a result, the distance L between the vibration isolation table 34 and the base 35 is
  • the original distance is maintained (note that the thickness of the intermediate stage 33 is assumed to be 0 for the sake of simplicity).
  • the displacement information of the second support mechanism 32 is input to the controller 41 that controls the actuator of the first support mechanism 31, and the controller 41 is Then, a control signal for generating a displacement that cancels out the displacement of the second support mechanism 32 to the first support mechanism 31 is generated.
  • This control signal is amplified by the amplifier 42 and input to the first support mechanism 31, and the first support mechanism 31 is displaced according to the control signal. As a result, the displacement of the second support mechanism 32 is canceled out.
  • FIG. 4 is a block diagram illustrating an example of a control system that controls the first support mechanism 31.
  • This control system includes a VCM (Voice Coil Motor) 43 that constitutes the actuator of the first support mechanism 31, a strain gauge sensor 44 that measures the displacement x of the movable part of the VCM 43, and a strain amplifier 45 that converts strain into an electrical signal.
  • a DSP (Digital Signal Processor) 46 that constructs a control system for IPD control (proportional derivative precedence type PID control), and an amplifier 51 that converts the voltage output from the DSP 46 into current.
  • the DSP 46 also includes a subtractor 49 that subtracts the input signal from the command value ei (V) force, an integrator 48 that performs the integration operation of the output of the subtractor 49, and a PD unit that performs the proportional operation and differentiation operation of the input signal. And a subtractor 50 for subtracting the output of the PD unit 47 from the output of the integrator 48. finger
  • the command value ei is given a signal that cancels out the displacement of the second support mechanism 32.
  • VCM43 shows the transfer function of VCM
  • Ki is the VCM thrust coefficient (N / A)
  • m is the mass of the moving part of VCM (kg)
  • k is the panel constant of the panel in VCM ( NZm)
  • s is a variable.
  • C of the strain gauge sensor 44 indicates a sensor gain ( ⁇ Zm).
  • Ka of the distortion amplifier 45 indicates the distortion amplifier gain (VZ ⁇ ).
  • DSP46's Pi, Pd, and Pv represent integral gain, proportional gain, and differential gain.
  • Kb of the amplifier 51 indicates the amplifier gain (AZV)! /
  • the base 35, the first support mechanism 31, the intermediate base 33, the second support mechanism 32, and the vibration isolation table 34 are arranged horizontally, and the intermediate base 33 and the vibration isolation table 34 are The vibration isolator supported by the linear slider 36 was used so that the table 34 could move without friction with the ground.
  • Figure 6 shows the vibration isolation device actually used for the measurement.
  • the first support mechanism 31 is composed of VCM
  • the second support mechanism 32 is composed of VCM so that arbitrary rigidity can be obtained.
  • FIG. 7 shows a control system that controls the VCM of the second support mechanism 32. Compared to the control system in Fig. 4, this control system is configured to input a signal specifying the initial displacement of the second support mechanism as the command value ei, and to construct a control system for PD control with DSP46.
  • the points are different.
  • the VCM37 for generating disturbance is installed in the equipment shown in Fig. 6.
  • a gap sensor 38 with a strain gauge attached to the panel panel is connected between the vibration isolation table 34 and the intermediate base 33, and the intermediate base 33. Place yourself between 33 and base 35!
  • Fig. 8 shows the VCM 37 for disturbance generation, where a horizontal load was applied to the vibration isolation table 34, and the “displacement of the distance between the vibration isolation table 34 and the intermediate base 33” “intermediate base 33—base 35” The results of the measurement of the “displacement of the distance between” and “the displacement of the distance between the vibration isolation table 34 and the base 35” are shown.
  • the horizontal axis shows the load in N (Newton) and the vertical axis shows the magnitude of displacement in mm.
  • “Displacement of the distance between the vibration isolation table 34 and the base 35” refers to “Displacement of the distance between the vibration isolation table 34 and the intermediate base 33” and “Displacement of the distance between the intermediate base 33 and the base 35”. It will be added.
  • the displacement of the distance between the vibration isolation table 34 and the base 35 is substantially zero over a wide range of loads, and zero compliance is realized.
  • this vibration isolation device is capable of vibration isolation due to ground motion disturbance and linear motion disturbance, and can realize zero compliance over a wide load range.
  • an expensive servo-type acceleration sensor is not required !, it can be manufactured at low cost.
  • the first support mechanism 31 is configured by VCM, the one having the rapid response that can be applied to the displacement cancellation control. If so, the first support mechanism 31 can be used.
  • the second support mechanism 32 may be a machine panel or an air panel having low rigidity.
  • the vibration isolator in which the vibration isolator is simply installed vertically, it can be arranged horizontally and used for suppressing horizontal vibration.
  • a first support mechanism 31 having an actuator is disposed between the base 35 and the intermediate base 33, and a second low-rigidity second is provided between the intermediate base 33 and the vibration isolation table 34.
  • the case where the support mechanism 32 is disposed has been described.
  • the second support mechanism 32 is disposed between the base 35 and the intermediate base 33, and the first support mechanism 31 is disposed. It may be arranged between the intermediate table 33 and the vibration isolation table 34. With this arrangement, the mass driven by the actuator can be made only by the vibration isolation table, so that the effect of reducing the size of the actuator can be obtained.
  • the vibration isolator of the present invention includes a semiconductor manufacturing system, an ultraprecision measuring device such as a scanning tunneling microscope (STM) and an atomic force microscope (AFM), an ultraprecision processing machine that performs laser processing and nanoscale processing. Or, it can be widely used for vibration isolation of various devices that do not like vibration, such as devices in the cutting-edge fields that handle bio micro-duplication and nanotechnology.
  • STM scanning tunneling microscope
  • AFM atomic force microscope

Abstract

Le problème à résoudre dans le cadre de la présente invention est de proposer un dispositif d’isolation contre les vibrations qui est peu coûteux, capable d’isoler les vibrations entraînées par des perturbations de mouvement du sol et des perturbations à action directe et qui observe un niveau nul sur une plage de charge importante. La solution consiste en un dispositif d’isolation contre les vibrations qui comprend un mécanisme de support qui supporte un élément isolé des vibrations (34) qui comporte un premier mécanisme de support actif (31) avec un actionneur et un second mécanisme de support rigide bas (32) agencé en série avec le premier mécanisme de support (31). Le déplacement de l’actionneur du premier mécanisme de support (31) est commandé pour compenser le déplacement du second mécanisme de support (32). En conséquence, même en cas de vibrations entraînées par les perturbations de mouvement du sol et aux perturbations à action directe, la position de l’élément isolé des vibrations (34) ne change pas. Le dispositif d’isolation contre les vibrations peut isoler les vibrations entraînées par les perturbations de mouvement du sol et les perturbations à action directe, observer le niveau nul sur la plage de charge importante, et est très fiable. En outre, le dispositif d’isolation contre les vibrations peut être fabriqué à bas coût.
PCT/JP2006/313243 2005-07-13 2006-07-03 Dispositif et procédé d’isolation contre les vibrations WO2007007580A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006541533A JPWO2007007580A1 (ja) 2005-07-13 2006-07-03 除振装置及び除振方法

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JP2005-204076 2005-07-13
JP2005204076 2005-07-13

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013044711A (ja) * 2011-08-26 2013-03-04 Saitama Univ 力測定装置
WO2019111950A1 (fr) * 2017-12-05 2019-06-13 株式会社 東芝 Amortisseur de vibrations

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000136845A (ja) * 1998-10-30 2000-05-16 Canon Inc 能動振動絶縁装置およびそれを用いた露光装置
JP2005106272A (ja) * 2003-09-11 2005-04-21 Japan Science & Technology Agency 除振方法およびその装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000120766A (ja) * 1998-10-13 2000-04-25 Canon Inc ハイブリッド式能動振動絶縁装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000136845A (ja) * 1998-10-30 2000-05-16 Canon Inc 能動振動絶縁装置およびそれを用いた露光装置
JP2005106272A (ja) * 2003-09-11 2005-04-21 Japan Science & Technology Agency 除振方法およびその装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013044711A (ja) * 2011-08-26 2013-03-04 Saitama Univ 力測定装置
WO2019111950A1 (fr) * 2017-12-05 2019-06-13 株式会社 東芝 Amortisseur de vibrations
JPWO2019111950A1 (ja) * 2017-12-05 2020-11-26 株式会社東芝 制振装置

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