WO2006132243A1 - Inspection device - Google Patents

Inspection device Download PDF

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Publication number
WO2006132243A1
WO2006132243A1 PCT/JP2006/311327 JP2006311327W WO2006132243A1 WO 2006132243 A1 WO2006132243 A1 WO 2006132243A1 JP 2006311327 W JP2006311327 W JP 2006311327W WO 2006132243 A1 WO2006132243 A1 WO 2006132243A1
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WO
WIPO (PCT)
Prior art keywords
contact
inspection
wiring pattern
inspection apparatus
negative pressure
Prior art date
Application number
PCT/JP2006/311327
Other languages
French (fr)
Japanese (ja)
Inventor
Shigeki Ishikawa
Yosuke Mabune
Original Assignee
Nhk Spring Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nhk Spring Co., Ltd. filed Critical Nhk Spring Co., Ltd.
Publication of WO2006132243A1 publication Critical patent/WO2006132243A1/en

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2887Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations

Definitions

  • the present invention relates to an inspection for conducting a continuity test on a thin film film-like inspection object having a plurality of conductive regions including a wiring pattern used for input or output of an electric signal formed on the surface. Relates to the device.
  • TCP Tepe and Arrier Package
  • TAB Tape Automated Bondmg
  • COF and hip On Film
  • This TCP is formed by mounting a semiconductor chip such as an LSI (Large Scale Integrated Circuit) on a thin film substrate having a predetermined wiring pattern formed on the surface.
  • a technique for performing a disconnection inspection using a non-contact type sensor As a technique for solving the above-described problems, a technique for performing a disconnection inspection using a non-contact type sensor. A technique is also disclosed (see, for example, Patent Document 2).
  • a predetermined AC signal is supplied to a circuit composed of a connection electrode provided for an inspection object and a sensor having an electrode that forms a capacitive coupling with the connection electrode. Then, a change in capacitance between the electrode to be inspected and the sensor electrode caused by the disconnection is detected as a change in the detection level of the electric signal.
  • Patent Document 1 Japanese Patent Laid-Open No. 8-184631
  • Patent Document 2 JP-A-4-244976
  • the above-described film substrate has a very small material thickness and high flexibility as compared with a conventional semiconductor substrate. Therefore, when used in a liquid crystal display, the entire apparatus must be miniaturized. On the other hand, it has the advantage of being able to cause deformation such as warping and undulation because it is thin and lacks rigidity.
  • the present invention has been made in view of the above, and an object of the present invention is to provide an inspection apparatus that can detect a disconnection of an inspection target that is thin and has low rigidity with high accuracy. Means for solving the problem
  • one embodiment of the present invention is a method in which a plurality of conductive regions including a wiring pattern used for input or output of an electrical signal are formed on a surface, and mounted.
  • An inspection apparatus for performing a continuity inspection of the wiring pattern on a thin film film inspection target on which a predetermined semiconductor chip is mounted, wherein at least one of an input and an output of an electric signal is in contact with the wiring pattern A plurality of conductive contacts to be performed; a holder member that accommodates the plurality of conductive contacts in an arrangement corresponding to the wiring pattern; and the plurality of conductive contacts to be contacted when performing the continuity test.
  • Wiring Flattening means for flattening a region near the pattern.
  • the flattening unit may flatten the wiring pattern by applying pressure to the wiring pattern.
  • the flattening means includes a plurality of pressing members that are elastically urged and retracted in an axial direction so as to be accommodated in the holder member.
  • the member may have a larger protruding amount from the holder member than the conductive contact in a state where the member is not in contact with the inspection object.
  • the pressing member when the continuity test is performed, abuts at least one of the surfaces inside and in the vicinity of a chip mounting area where a predetermined semiconductor chip is mounted during mounting. It may be provided at the position.
  • the holder member includes a first holder member that accommodates the plurality of conductive contacts, and a second holder member that accommodates the pressing member. You may have.
  • the pressing member may be provided at a position in contact with a peripheral portion of the wiring pattern that is in contact with the plurality of conductive contacts when the continuity test is performed.
  • the pressing member may be made of a resin with a contact portion contacting the inspection object.
  • the flattening means may include negative pressure applying means for applying a negative pressure to the inspection object.
  • the negative pressure applying means at the time of performing the continuity test, at least inside and in the vicinity of a chip mounting area where a predetermined semiconductor chip is mounted at the time of mounting.
  • the negative pressure applying means may apply a negative pressure to a peripheral portion of the wiring pattern in contact with the plurality of conductive contacts when performing the continuity test.
  • the negative pressure applying means includes a plurality of holes formed at predetermined positions, and a receiving table on which a part of the inspection target is placed, and a hole formed in the receiving table. Multiple holes provided And a suction unit that performs suction by negative pressure through the unit.
  • the continuity test may include a disconnection test using a non-contact sensor.
  • the plurality of conductive contacts that make contact with the wiring pattern to be inspected in the form of a thin film and perform at least one of input and output of an electric signal
  • the plurality of conductive elements A holder member that accommodates the contacts in an arrangement corresponding to the wiring pattern, and a flattening means for flattening a region near the wiring pattern that contacts the plurality of conductive contacts when the continuity test is performed.
  • FIG. 1 is a diagram showing a configuration of a main part of an inspection apparatus according to Embodiment 1 of the present invention.
  • FIG. 2 is a view in the direction of arrow A in FIG.
  • FIG. 3 is a diagram showing a configuration of a film substrate to be inspected.
  • FIG. 4 is a cross-sectional view showing a configuration of a conductive contact applied to the inspection apparatus according to Embodiment 1 of the present invention.
  • FIG. 5 is a cross-sectional view showing a structure of a presser member applied to the inspection apparatus according to Embodiment 1 of the present invention.
  • FIG. 6 is an explanatory view showing a state in which a deformed film substrate is flattened by a peripheral edge pressing member.
  • FIG. 7 is an explanatory view showing a state in which the conductive contact is connected to the wiring pattern of the film substrate.
  • FIG. 8 is a diagram showing a state of the inspection apparatus after the film substrate is flattened.
  • FIG. 9 is a top view showing a configuration of a cradle that forms part of the inspection apparatus according to Embodiment 2 of the present invention.
  • FIG. 10 is a cross-sectional view taken along line BB in FIG.
  • FIG. 11 is a view showing a state where a film substrate is placed on a cradle and negative pressure is applied.
  • FIG. 12 is a top view showing a configuration of a cradle that forms part of an inspection apparatus according to a modification of the second embodiment of the present invention.
  • FIG. 13 is a cross-sectional view taken along line CC of FIG.
  • FIG. 1 is a diagram showing the configuration of the main part of the inspection apparatus according to Embodiment 1 of the present invention.
  • the inspection apparatus shown in FIG. 1 has a contact unit 1 for inputting / outputting electric signals to / from an inspection object and a thin film substrate 2 to be inspected, and a contact unit for inspection. And a cradle 3 for sandwiching the film substrate 2 with the pedestal 1.
  • FIG. 2 is a view in the direction of arrow A in FIG. 1, and is a bottom view showing the configuration of the bottom surface portion of the contact unit 1.
  • the contact unit 1 is installed corresponding to the wiring pattern of the film substrate 2, and establishes an electrical connection between the film substrate 2 and an inspection circuit (not shown) for inspecting the electrical characteristics of the film substrate 2.
  • a plurality of conductive contacts 14 are provided.
  • the contact unit 1 is used as a presser member that is urged and urged so as to expand and contract with respect to the axial direction.
  • a plurality of center part pressing members 16 to be attached, and a plurality of peripheral part pressing members 17 to press the peripheral part of the wiring pattern of the film substrate 2 to the cradle 3 are provided.
  • the conductive contact 14 and the peripheral edge pressing member 17 are accommodated and held in a substantially rectangular parallelepiped holder member 11 (first holder member).
  • the center pressing member 16 is accommodated and held in a holder member 12 (second holder member) that is fitted in the hollow portion of the holder member 11.
  • These holder members 11 and 12 are fixed and supported integrally with the base member 13 by using screws or the like.
  • the axial directions of the conductive contact 14 and the peripheral edge pressing member 17 held by the holder member 11 are all parallel. Also, the axial direction of the center pressing member 16 held by the holder member 12 is also parallel to the axial direction of the conductive contact 14 and the peripheral pressing member 17. As described above, the axial directions of the conductive contact 14, the center pressing member 16, and the peripheral pressing member 17 are preferably parallel to each other, but the present invention is applied only when force is applied. Of course not.
  • FIG. 3 is a diagram showing a configuration of the film substrate 2 to be inspected.
  • the film substrate 2 shown in the figure has a thickness of several tens; a polyimide tape having a thickness of about zm (micrometer) and a plurality of wiring patterns 22 along a longitudinal direction of a long tape-like base material 21 formed thereon. Are arranged regularly.
  • the wiring pattern 22 has a one-to-one correspondence between the inner lead 23 connected to the semiconductor chip during mounting, the connection electrode 25 used for electrical connection with an external device, and the inner lead 23 and the connection electrode 25. And outer leads 24 to be connected.
  • a predetermined semiconductor chip is mounted at the time of mounting on the side near the center of the group of wiring patterns 22 and the end of each inner lead 23 that is different from the end connected to the outer lead 24.
  • a chip mounting area 26 is provided.
  • This chip mounting area 26 is TAB In this case, it is called a device hole and has a rectangular opening.
  • the chip mounting area 26 is made of the same material as the surrounding area, not the opening. Needless to say, the arrangement pattern of the connection electrodes 25 on the film substrate 2 completely corresponds to the arrangement pattern in the holder member 11 of the conductive contact 14.
  • FIG. 4 is a cross-sectional view showing a configuration of the conductive contact 14.
  • the conductive contact 14 shown in the figure has needle-like members 141 and 142 disposed at both ends thereof, and these needle-like members 141 and 142 are connected and biased by a panel member 143.
  • the needle-like members 141 and 142 and the panel member 143 are made of a conductive material such as metal. Further, the needle-like members 141, 142 and the panel member 143 are accommodated and held in the opening 111 of the holder member 11 so as to have the same axis, and the tip force of the needle-like member 141 on the S film substrate 2 side.
  • the tip of the needle-like member 142 is connected to a lead wire 15 accommodated in the opening 131 of the base member 13 and receives supply of an electric signal or the like through the lead wire 15.
  • the needle-like member 141 positioned vertically below the needle-like member 142 and the panel member 143 is provided with a flange portion 14 la and serves to prevent the holder member 11 from being removed.
  • the holder member 11 that holds the conductive contact 14 is configured by superposing the first member 11a and the second member l ib. For this reason, it is possible to easily attach or replace the conductive contact 14 to the opening 11 1.
  • a center-holding member 16 shown in FIG. 5 is in contact with the film substrate 2 and can be expanded and contracted within a predetermined range in a direction parallel to the expansion and contraction direction of the conductive contact 14, and one end of the plunger 161.
  • the center pressing member 16 is fitted and held in a receptacle-type pipe member 71.
  • This pipe member 71 is provided in a socket 72 that is provided in each of the third member 12a and the fourth member 12b constituting the holder member 12 and is fitted in the openings 121a and 121b that communicate coaxially. Contained.
  • the openings 121a is an opening, and the other is a closed end.
  • the opening 121b is an open end at both ends.
  • the plunger 161 of the center pressing member 16 has a cylindrical contact portion 161a that contacts the film substrate 2 and a diameter substantially the same as the inner diameter of the pipe member 71.
  • the protruding portion 161b that protrudes and the distal end portion 161c that fits into the connector portion of the receptacle-type noise member 71 and serves to prevent the plunger 161 from being removed from the noise member 71 are coaxially connected to the protruding portion 161b and the distal end portion 161c.
  • a rod-shaped connecting portion 161d is coaxially connected to the protruding portion 161b and the distal end portion 161c.
  • the tip portion 161c is in contact with the end portion of the panel member 162 that is also housed and held in the pipe member 71, and the contact portion 16la is the surface of the film substrate 2 and the inner portion of the chip mounting region 26 and As the contact unit 1 descends, it gradually enters the inside of the pipe member 71. For this reason, the protrusion amount of the contact portion 161a from the holder member 12 gradually decreases.
  • the panel member 162 has a function of mitigating that the plunger 161 is displaced at a stroke due to the resistance from the film substrate 2.
  • the contact portion 161a of the plunger 161 only needs to be formed of a material having insulating properties such as grease.
  • the diameter R of the contact portion 161a at the tip of the center pressing member 16 is preferably large enough to avoid the wiring pattern 22, and is specifically about 1 to 2 mm.
  • the diameter R of the contact portion 161a of the center pressing member 16 should be determined depending on which package the film substrate 2 is applied to. For example, when the film substrate 2 is applied to TAB, the chip mounting region 26 forms an opening, and therefore the diameter R of the contact portion 161a must be larger than the width of the opening. On the other hand, when applied to the film substrate 2 force SCOF, even if the diameter R of the contact portion 161a is smaller than the width of the chip mounting region 26, the region can be flattened. It is more preferable that the value is smaller than the width of the chip mounting area 26. In this sense, for example, the diameter of the contact portion 171a of the peripheral portion pressing member 17 may be different from the diameter of the contact portion 161a of the center portion pressing member 16.
  • the center pressing member 16 and the peripheral pressing member 17 have the same structure.
  • the peripheral edge pressing member 17 includes a plunger 171 (abutting portion 171a, projecting portion 171b, tip portion 171c, connecting portion 17 Id) and a panel member 172 having the same configuration as the plunger 161 and the panel member 162, respectively.
  • the peripheral edge pressing member 17 is also accommodated in the pipe member 71 in the holder member 12. The point that the pipe member 71 is held by the socket 72 embedded in the holder member 12 is the same as in the case of the center pressing member 16.
  • the conductive contact 14, the center pressing member 16, and the peripheral pressing member 17 that also project the bottom force of each holder of the contact unit 1 are in contact with the film substrate 2, and in this state,
  • the amount of protrusion H of the plunger 161 and 171 from the bottom of the main body of the contact unit 1 is the amount of protrusion h from the bottom of the main body of the contact unit 1 of the needle member 141 of the conductive contact 14 (see FIG. 4).
  • H> h which is larger than
  • a non-contact type sensor 31 is disposed on the surface of the central portion of the cradle 3 (see FIG. 1).
  • This sensor 31 is formed by using one or more thin electrode forces, a metal conductor such as a copper plate or an iron plate, and a thin film insulating film such as PET.
  • the connection electrode 25 can be capacitively coupled.
  • the surface area of the sensor 31 exposed on the mounting surface of the film substrate 2 of the cradle 3 is slightly larger than the area of the chip mounting area 26.
  • FIGS. 6 and 7 show that when the contact unit 1 according to the first embodiment is used to inspect the film substrate 2, the contact unit 1 is lowered to the wiring pattern 22 of the film substrate 2.
  • FIG. 6 is an explanatory view showing a situation when the contact 14 is brought into contact with the contact 14; Of these, FIG. 6 shows that the film substrate 2 that has undergone deformation such as warping or undulation is flattened by the peripheral-side pressing member 17. Shows the situation. Further, FIG. 7 shows a state where the conductive contact 14 is brought into contact with the wiring pattern 22 (connection electrode 25 thereof) by further lowering the contact unit 1 after reaching the state of FIG. .
  • FIG. 6 will be described. Since the bottom surface of the contact portion 171a of the peripheral edge pressing member 17 protrudes downward from the tip end portion of the conductive contact 14, when the contact unit 1 is lowered, the peripheral edge pressing member 17 First reaches the film substrate 2 and starts pressing the film substrate 2 downward. At this time, since the film substrate 2 is pressed by the elastic force of the panel member 172 having the same configuration as the panel member 16 2 (see FIG. 5) of the center pressing member 16, the impact applied to the film substrate 2 is not affected. The film substrate 2 can be returned to its original flat shape while being softened.
  • the solid line in FIG. 6 shows a state in which the inner region of the peripheral edge pressing member 17 is generally flattened. Although not shown, since the center pressing member 16 performs the same operation as the peripheral edge pressing member 17, the area near the chip mounting area 26 is flattened in the same manner as described above. Nah ...
  • the protruding amount of the conductive contact 14 from the holder member 11 may be designed in view of this point. That is, the protruding amount h of the conductive contact 14 from the holder member 11 in the initial state is the thickness of the film substrate 2 (the thickness of the base material 21 and the wiring pattern 22) and the contact unit 1 such as the center pressing member 16 or the like. Determine the optimum value after considering the amount of protrusion H from the top!
  • FIG. 8 is a view of the state shown in FIG. 7 when the contact unit 1 is viewed as a whole.
  • the portion of the film substrate 2 that is pressed by the center pressing member 16 and the peripheral pressing member 17 is substantially flat, so the positional relationship between the sensor 31 and the film substrate 2 Is almost constant. Therefore, the change in the capacitance due to the deformation of the film substrate 2 becomes almost negligible, the operation sensitivity of the sensor 31 is improved, and the operation is stabilized.
  • a plurality of conductive contacts that contact at least one of input and output of electrical signals in contact with the wiring pattern of (inspection target) and the plurality of conductive contacts are parallel to each other in the axial direction.
  • a flat plate means it is possible to detect a disconnection of a thin film substrate having a low rigidity with high accuracy. As a result, the reliability of the inspection itself can be improved.
  • a peripheral edge pressing member that presses the peripheral edge of the wiring pattern is provided, so that the conductive contact of the film substrate during inspection is provided. Deformation such as warpage and undulation in the region near the contacting surface can be eliminated, and the contact state of the peripheral portion with the conductive contact can be ensured. As a result, the contact between the individual conductive contacts and the contact electrode is uniform, so that the wear of a plurality of conductive contacts is made uniform without the wear of a specific conductive contact progressing quickly. It is possible to improve the durability of the inspection apparatus itself.
  • FIG. 9 is a top view showing a configuration of a cradle that forms part of the inspection apparatus according to the second embodiment.
  • FIG. 10 is a cross-sectional view taken along line BB in FIG.
  • the cradle 4 shown in these drawings includes a mounting portion 41 on which the film substrate 2 is mounted, and a negative pressure that is fixed to the mounting portion 41. And a suction part 42 to which a suction nozzle is attached.
  • the same non-contact type sensor 31 as described in the first embodiment is embedded in the substantially central portion of the surface of the mounting portion 41, and at the periphery of the sensor 31 on the surface of the mounting portion 41.
  • Has holes 43 for negative pressure suction in FIG. 9, six holes 43 are formed).
  • a plurality of holes 44 (12 in FIG. 9) are also formed near the edge of the surface of the mounting portion 41.
  • Each hole 43 and 44 communicates with a vacuum hole 46 (described later) of the suction part 42 through a communication passage 45.
  • the diameter of the holes 43 and 44 is about 1 mm.
  • the suction part 42 has a vacuum hole 46 formed in the surface facing the mounting part 41, and the bottom surface of the vacuum hole part 46 is open at the surface not facing the mounting part 41. It communicates with a through-hole portion 421 having.
  • a suction nozzle 47 is attached to the through-hole portion 421.
  • the nozzle 47 is connected to a vacuum generating device such as a vacuum pump 49 via a hose 48.
  • FIG. 11 is a diagram showing a state in which the film substrate 2 is placed on the cradle 4 and the negative pressure is increased by the vacuum pump 49.
  • the holder member 51 is fixedly supported by the base member 52.
  • the holder member 51 can accommodate a plurality of conductive contacts 14 according to the wiring pattern 22 of the film substrate 2 (the lead wire 15 is omitted).
  • the film substrate is fixed substantially parallel to the cradle.
  • the distance between the sensor and the film substrate is almost constant, which improves the operational sensitivity of the sensor embedded in the cradle and stabilizes its operation.
  • the disconnection inspection can be performed accurately and reliably, and the progress of wear of the conductive contact is substantially uniform. As a result, durability can be improved.
  • FIG. 12 is a top view showing a configuration of a cradle applied to an inspection apparatus according to a modification of the second embodiment.
  • FIG. 13 is a cross-sectional view taken along the line CC in FIG.
  • a groove portion 63 that surrounds the vicinity of the sensor 31 is provided in the mounting portion 61, and holes 64 are formed at predetermined intervals on the bottom surface of the groove portion 63.
  • six holes 64 are formed.
  • four groove portions 65 are provided along the four corners of the placement portion 61 at the peripheral portion of the placement portion 61, and holes 66 are formed at predetermined intervals on the bottom surface of each groove portion 65. (In FIG. 12, there are three holes 66 in one groove 65).
  • the diameters of the grooves 63 and 65 are about lmm, and their depths are about the same.
  • Each of the holes 64 and 66 communicates with the vacuum hole 46 of the suction part 42 through the communication passage 67.
  • the configuration of the suction part 42 is the same as that of the second embodiment, and the point that it is connected to the vacuum pump 49 via the nozzle 47 and the hose 48 is the same as that of the second embodiment.
  • the best mode for carrying out the present invention has been described in detail for the first and second embodiments.
  • the present invention should not be limited only by these two embodiments.
  • only one of the center pressing member and the peripheral edge pressing member as the flattening means provided in the inspection apparatus according to the present invention may be provided.
  • the accuracy of the sensor can be particularly improved.
  • only the peripheral edge pressing member is provided, it is possible to suppress variation in wear of the conductive contact and to realize stable contact with the film substrate. it can.
  • the various pressing members described in the first embodiment and the second embodiment You may comprise the test
  • the conductive contact applied to the inspection apparatus according to the present invention is not limited to the above-described conductive contact 14 (see FIG. 4). In other words, any of various types of conventionally known conductive contacts can be applied to the inspection apparatus according to the present invention.
  • the present invention can include various embodiments and the like not described herein, and V, V, within the scope not departing from the technical idea specified by the claims. It is possible to make various design changes.
  • the inspection apparatus applies to a thin film-like inspection target in which a plurality of conductive regions including a wiring pattern used for input or output of an electric signal are formed on the surface. It is useful for the continuity inspection of the wiring pattern, and is particularly suitable for detecting the disconnection of the thin object and lack of rigidity.

Abstract

An inspection device for detecting disconnection of a thin inspection object of low rigidity with high precision. The inspection device comprises a plurality of conductive contacts brought into contact with a thin filmlike wiring pattern of an inspection object to perform at least either of input or output of an electric signal, a holder member for accommodating the plurality of conductive contacts in an arrangement corresponding to the wiring pattern, and a means for flattening the region in the vicinity of the wiring pattern brought into contact with the plurality of conductive contacts at the time of inspecting electrical connection.

Description

明 細 書  Specification
検査装置  Inspection device
技術分野  Technical field
[0001] 本発明は、電気信号の入力または出力に用いられる配線パターンを含む複数の導 電領域が表面上に形成された薄膜フィルム状の検査対象に対し、その配線パターン の導通検査を行う検査装置に関する。  The present invention relates to an inspection for conducting a continuity test on a thin film film-like inspection object having a plurality of conductive regions including a wiring pattern used for input or output of an electric signal formed on the surface. Relates to the device.
背景技術  Background art
[0002] 従来、例えば液晶ディスプレイを構成する液晶パネルのドライバ回路等に、 TAB(T ape Automated Bondmg)A COF (し hip On Filmノ等の TCP (Tape し arrier Packag e)と呼ばれる ICパッケージを用いた構成が知られている。この TCPは、表面に所定 の配線パターンが形成された薄膜のフィルム基板に、 LSI (Large Scale Integrated Circuit)等の半導体チップを搭載することによって形成される。  Conventionally, for example, an IC package called TCP (Tape and Arrier Package) such as TAB (Tape Automated Bondmg) A COF (and hip On Film) is used for a driver circuit of a liquid crystal panel constituting a liquid crystal display, for example. This TCP is formed by mounting a semiconductor chip such as an LSI (Large Scale Integrated Circuit) on a thin film substrate having a predetermined wiring pattern formed on the surface.
[0003] TCPを製造する際には、他の半導体集積回路の場合と同様に不良品を検出する ため、電気特性に関する検査が行われる。より具体的には、フィルム基板上に形成さ れた配線パターンにおける電気的な短絡および断線の有無の検査 (導通検査)や、 半導体チップを搭載した後に配線パターンを介して半導体チップに所定の検査信号 を入出力する動作特性検査等が行われる。  [0003] When manufacturing a TCP, in order to detect defective products as in the case of other semiconductor integrated circuits, an inspection relating to electrical characteristics is performed. More specifically, the wiring pattern formed on the film substrate is inspected for the presence of electrical shorts and breaks (continuity inspection), and after the semiconductor chip is mounted, the semiconductor chip is subjected to a predetermined inspection via the wiring pattern. Operational characteristics inspection etc. to input / output signals are performed.
[0004] 上述した検査のうち、半導体チップ搭載前のフィルム基板の断線検査に関しては、 細径の導電性接触子と導電ゴム体を用いて行う技術が知られて!/ヽる (例えば、特許 文献 1を参照)。この技術では、フィルム基板に設けられて配線パターンの一部をな す接続用電極と導電性接触子との接触状態を保持したまま、導電ゴム体の底面を全 ての配線パターンに接触させて所定の電流を流し、導電性接触子と導電ゴム体との 間で絶縁状態にある箇所を断線箇所として検出する。  [0004] Among the above-mentioned inspections, a technique of using a thin conductive contact and a conductive rubber body is known for disconnection inspection of a film substrate before mounting a semiconductor chip! (Ref. 1). In this technology, the bottom surface of the conductive rubber body is brought into contact with all the wiring patterns while maintaining the contact state between the connection electrodes provided on the film substrate and forming a part of the wiring pattern and the conductive contacts. A predetermined current is passed, and a portion in an insulating state between the conductive contact and the conductive rubber body is detected as a broken portion.
[0005] し力しながら、上記の如く導電ゴム体を用いて断線検査を行う場合、導電ゴム体は 磨耗や変形による経時劣化を起こすため、断線検査の精度的な問題が生じやすか つた o  [0005] However, when conducting a disconnection inspection using a conductive rubber body as described above, the conductive rubber body is subject to deterioration over time due to wear or deformation.
[0006] 上述した課題を解決する技術として、非接触型のセンサを用いて断線検査を行う技 術も開示されている (例えば、特許文献 2を参照)。この技術では、検査対象に設けら れた接続用電極と、この接続用電極との間で容量結合を形成する電極を備えたセン サとから構成される回路に対して所定の交流信号を供給し、断線によって生じる検査 対象の電極とセンサの電極との間の静電容量の変化を電気信号の検出レベルの変 化として検出する。 [0006] As a technique for solving the above-described problems, a technique for performing a disconnection inspection using a non-contact type sensor. A technique is also disclosed (see, for example, Patent Document 2). In this technology, a predetermined AC signal is supplied to a circuit composed of a connection electrode provided for an inspection object and a sensor having an electrode that forms a capacitive coupling with the connection electrode. Then, a change in capacitance between the electrode to be inspected and the sensor electrode caused by the disconnection is detected as a change in the detection level of the electric signal.
[0007] 特許文献 1 :特開平 8— 184631号公報 Patent Document 1: Japanese Patent Laid-Open No. 8-184631
特許文献 2:特開平 4— 244976号公報  Patent Document 2: JP-A-4-244976
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0008] 上述したフィルム基板は、従来の半導体基板と比較して材料厚が非常に小さぐか つ柔軟性に富むことから、液晶ディスプレイに使用した場合には、装置全体の小型 化を図ることができる等の利点を有している力 その一方で剛性に乏しぐ薄肉である が故に反りや波打等の変形を生じやす 、と 、う問題も有して 、る。  [0008] The above-described film substrate has a very small material thickness and high flexibility as compared with a conventional semiconductor substrate. Therefore, when used in a liquid crystal display, the entire apparatus must be miniaturized. On the other hand, it has the advantage of being able to cause deformation such as warping and undulation because it is thin and lacks rigidity.
[0009] このようなフィルム基板を検査対象として、上記特許文献 2に記載された従来技術 による断線検査を行う場合、フィルム基板の変形によってフィルム基板とセンサとの距 離が変化し、静電容量が本来とるべき値からずれてしまい、断線検査の精度が低下 してしまう恐れがあった。このため、薄肉で剛性に乏しいフィルム基板に対しても、高 V、精度で断線を検出することが可能な技術が待望されて 、た。  [0009] When the disconnection inspection according to the conventional technique described in Patent Document 2 is performed using such a film substrate as an inspection target, the distance between the film substrate and the sensor changes due to the deformation of the film substrate, and the capacitance May deviate from the value that should be taken, and the accuracy of the disconnection inspection may be reduced. For this reason, there is a need for a technology that can detect disconnection with high V and accuracy even for thin film substrates with low rigidity.
[0010] 本発明は、上記に鑑みてなされたものであって、薄肉で剛性に乏しい検査対象の 断線を高い精度で検出することができる検査装置を提供することを目的とする。 課題を解決するための手段  The present invention has been made in view of the above, and an object of the present invention is to provide an inspection apparatus that can detect a disconnection of an inspection target that is thin and has low rigidity with high accuracy. Means for solving the problem
[0011] 上述した課題を解決し、目的を達成するために、本発明の一態様は、電気信号の 入力または出力に用いられる配線パターンを含む複数の導電領域が表面上に形成 され、実装時に所定の半導体チップが搭載される薄膜フィルム状の検査対象に対し 、前記配線パターンの導通検査を行う検査装置であって、前記配線パターンと接触 して電気信号の入力または出力の少なくともいずれか一方を行う複数の導電性接触 子と、前記複数の導電性接触子を、前記配線パターンに対応した配置で収容するホ ルダ部材と、前記導通検査を行う際、前記複数の導電性接触子と接触する前記配線 パターンの近傍領域を平坦化する平坦化手段と、を備えたことを特徴とする。 [0011] In order to solve the above-described problem and achieve the object, one embodiment of the present invention is a method in which a plurality of conductive regions including a wiring pattern used for input or output of an electrical signal are formed on a surface, and mounted. An inspection apparatus for performing a continuity inspection of the wiring pattern on a thin film film inspection target on which a predetermined semiconductor chip is mounted, wherein at least one of an input and an output of an electric signal is in contact with the wiring pattern A plurality of conductive contacts to be performed; a holder member that accommodates the plurality of conductive contacts in an arrangement corresponding to the wiring pattern; and the plurality of conductive contacts to be contacted when performing the continuity test. Wiring Flattening means for flattening a region near the pattern.
[0012] また、上記発明において、前記平坦化手段は、前記配線パターンに圧力を加える ことによって前記配線パターンを平坦ィ匕するとしてもよい。  [0012] In the above invention, the flattening unit may flatten the wiring pattern by applying pressure to the wiring pattern.
[0013] また、上記発明において、前記平坦化手段は、軸線方向に対して伸縮自在に弾発 付勢されて前記ホルダ部材に収容される複数の押え用部材を有し、前記複数の押え 用部材は、前記検査対象に接触していない状態で、前記導電性接触子よりも前記ホ ルダ部材からの突出量が大き 、としてもよ 、。 [0013] Further, in the above invention, the flattening means includes a plurality of pressing members that are elastically urged and retracted in an axial direction so as to be accommodated in the holder member. The member may have a larger protruding amount from the holder member than the conductive contact in a state where the member is not in contact with the inspection object.
[0014] また、上記発明において、前記押え用部材は、前記導通検査を行う際、実装時に 所定の半導体チップが搭載されるチップ搭載領域の内部および近傍の少なくともい ずれか一方の表面に当接する位置に設けられたこととしてもよい。 [0014] In the above invention, when the continuity test is performed, the pressing member abuts at least one of the surfaces inside and in the vicinity of a chip mounting area where a predetermined semiconductor chip is mounted during mounting. It may be provided at the position.
[0015] また、上記発明にお!/ヽて、前記ホルダ部材は、前記複数の導電性接触子を収容す る第 1のホルダ部材と、前記押え用部材を収容する第 2のホルダ部材と、を有するとし てもよい。 [0015] Further, according to the present invention, the holder member includes a first holder member that accommodates the plurality of conductive contacts, and a second holder member that accommodates the pressing member. You may have.
[0016] また、上記発明において、前記押え用部材は、前記導通検査を行う際、前記複数 の導電性接触子と接触する前記配線パターンの周縁部に当接する位置に設けられ たこととしてちよい。  [0016] Further, in the above invention, the pressing member may be provided at a position in contact with a peripheral portion of the wiring pattern that is in contact with the plurality of conductive contacts when the continuity test is performed. .
[0017] また、上記発明において、前記押え用部材は、前記検査対象に当接する当接部が 榭脂製であるとしてもよい。  [0017] In the above invention, the pressing member may be made of a resin with a contact portion contacting the inspection object.
[0018] また、上記発明において、前記平坦化手段は、前記検査対象に対して負圧を加え る負圧印加手段を有するとしてもよい。 [0018] In the above invention, the flattening means may include negative pressure applying means for applying a negative pressure to the inspection object.
[0019] また、上記発明において、前記負圧印加手段は、前記導通検査を行う際、実装時 に所定の半導体チップが搭載されるチップ搭載領域の内部および近傍の少なくとも[0019] In the above invention, the negative pressure applying means, at the time of performing the continuity test, at least inside and in the vicinity of a chip mounting area where a predetermined semiconductor chip is mounted at the time of mounting.
V、ずれか一方の表面に負圧を加えるとしてもよ!/、。 V, even if negative pressure is applied to one surface! /
[0020] また、上記発明において、前記負圧印加手段は、前記導通検査を行う際、前記複 数の導電性接触子と接触する前記配線パターンの周縁部に負圧を加えるとしてもよ い。 [0020] Further, in the above invention, the negative pressure applying means may apply a negative pressure to a peripheral portion of the wiring pattern in contact with the plurality of conductive contacts when performing the continuity test.
[0021] また、上記発明において、前記負圧印加手段は、所定位置に複数の孔部が穿設さ れて成り、前記検査対象の一部を載置する受台と、前記受台に穿設された複数の孔 部を介して負圧による吸引を行う吸引手段と、を有するとしてもよい。 [0021] In the above invention, the negative pressure applying means includes a plurality of holes formed at predetermined positions, and a receiving table on which a part of the inspection target is placed, and a hole formed in the receiving table. Multiple holes provided And a suction unit that performs suction by negative pressure through the unit.
[0022] また、上記発明において、前記導通検査には、非接触型のセンサを用いた断線検 查が含まれるとしてもよい。  [0022] In the above invention, the continuity test may include a disconnection test using a non-contact sensor.
発明の効果  The invention's effect
[0023] 本発明によれば、薄膜フィルム状をなす検査対象の配線パターンと接触して電気 信号の入力または出力の少なくともいずれか一方を行う複数の導電性接触子と、前 記複数の導電性接触子を、前記配線パターンに対応した配置で収容するホルダ部 材と、前記導通検査を行う際、前記複数の導電性接触子と接触する前記配線パター ンの近傍領域を平坦化する平坦化手段と、を備えたことにより、薄肉で剛性に乏しい 検査対象の断線を高い精度で検出することができる検査装置を提供することが可能 となる。  [0023] According to the present invention, the plurality of conductive contacts that make contact with the wiring pattern to be inspected in the form of a thin film and perform at least one of input and output of an electric signal, and the plurality of conductive elements A holder member that accommodates the contacts in an arrangement corresponding to the wiring pattern, and a flattening means for flattening a region near the wiring pattern that contacts the plurality of conductive contacts when the continuity test is performed. Thus, it is possible to provide an inspection apparatus that can detect a disconnection of an inspection object that is thin and lacks rigidity with high accuracy.
図面の簡単な説明  Brief Description of Drawings
[0024] [図 1]図 1は、本発明の実施の形態 1に係る検査装置要部の構成を示す図である。  FIG. 1 is a diagram showing a configuration of a main part of an inspection apparatus according to Embodiment 1 of the present invention.
[図 2]図 2は、図 1の矢視 A方向の矢視図である。  FIG. 2 is a view in the direction of arrow A in FIG.
[図 3]図 3は、検査対象であるフィルム基板の構成を示す図である。  FIG. 3 is a diagram showing a configuration of a film substrate to be inspected.
[図 4]図 4は、本発明の実施の形態 1に係る検査装置に適用される導電性接触子の 構成を示す断面図である。  FIG. 4 is a cross-sectional view showing a configuration of a conductive contact applied to the inspection apparatus according to Embodiment 1 of the present invention.
[図 5]図 5は、本発明の実施の形態 1に係る検査装置に適用される押え用部材の構 成を示す断面図である。  FIG. 5 is a cross-sectional view showing a structure of a presser member applied to the inspection apparatus according to Embodiment 1 of the present invention.
[図 6]図 6は、変形したフィルム基板を周縁部押し押え用部材によって平坦ィ匕する状 況を示す説明図である。  FIG. 6 is an explanatory view showing a state in which a deformed film substrate is flattened by a peripheral edge pressing member.
[図 7]図 7は、導電性接触子をフィルム基板の配線パターンに接続させる状況を示す 説明図である。  [FIG. 7] FIG. 7 is an explanatory view showing a state in which the conductive contact is connected to the wiring pattern of the film substrate.
[図 8]図 8は、フィルム基板を平坦ィ匕した後の検査装置の状況を示す図である。  FIG. 8 is a diagram showing a state of the inspection apparatus after the film substrate is flattened.
[図 9]図 9は、本発明の実施の形態 2に係る検査装置の一部をなす受台の構成を示 す上面図である。  FIG. 9 is a top view showing a configuration of a cradle that forms part of the inspection apparatus according to Embodiment 2 of the present invention.
[図 10]図 10は、図 9の B— B線断面図である。  FIG. 10 is a cross-sectional view taken along line BB in FIG.
[図 11]図 11は、受台にフィルム基板を載置し、負圧を加えた状態を示す図である。 [図 12]図 12は、本発明の実施の形態 2の変形例に係る検査装置の一部をなす受台 の構成を示す上面図である。 FIG. 11 is a view showing a state where a film substrate is placed on a cradle and negative pressure is applied. FIG. 12 is a top view showing a configuration of a cradle that forms part of an inspection apparatus according to a modification of the second embodiment of the present invention.
[図 13]図 13は、図 12の C C線断面図である。  FIG. 13 is a cross-sectional view taken along line CC of FIG.
符号の説明 Explanation of symbols
I、 5 コンタクトユニット  I, 5 contact unit
2 フィルム基板  2 Film substrate
3、 4、 6 受台  3, 4, 6 cradle
I I、 12、 51 ホルダ部材  I I, 12, 51 Holder member
11a 第 1部材  11a First part
l ib 第 2部材  l ib Second part
12a 第 3部材  12a 3rd part
12b 第 4部材  12b 4th member
13、 52 ベース咅附  13, 52 Base attachment
14 導電性接触子  14 Conductive contact
15 リード線  15 Lead wire
16 中心部押え用部材  16 Center pressing member
17 周縁部押え用部材  17 Edge holding member
21 基材  21 Base material
22 配線パターン  22 Wiring pattern
23 インナーリード  23 Inner lead
24 アウターリード  24 Outer lead
25 接続用電極  25 Connecting electrode
26 チップ搭載領域  26 Chip mounting area
31 センサ  31 sensors
41、 61 載置部  41, 61 Place
42 吸引部  42 Suction unit
43、 44、 64、 66 孔部  43, 44, 64, 66 hole
45、 67 連絡用通路 46、 68 バキューム孔部 45, 67 Access passage 46, 68 Vacuum hole
47 ノズル  47 nozzles
48 ホース  48 hose
49 バキュームポンプ  49 Vacuum pump
63、 65 溝部  63, 65 Groove
71 パイプ部材  71 Pipe member
72 ソケット  72 socket
111、 121a, 121b, 131 開口部  111, 121a, 121b, 131 opening
141、 142 針状部材  141, 142 needle member
141a フランジ部  141a Flange
143、 162、 172 ノネ部材  143, 162, 172 None
161、 171 プランジャ  161, 171 Plunger
161aゝ 171a 当接部  161a ゝ 171a Contact part
161bゝ 171b 突出部  161b ゝ 171b Protrusion
161c, 171c 先端部  161c, 171c Tip
161d、 171d 連結部  161d, 171d connecting part
421 貫通孔部  421 Through hole
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0026] 以下、添付図面を参照して本発明を実施するための最良の形態 (以後、「実施の形 態」と称する)を説明する。なお、図面はあくまで模式的なものであり、各部分の厚み と幅との関係や、各部分の厚みの比率などは現実のものとは異なる場合がある上、相 互の図面間においても、互いの寸法の関係や比率が異なる部分が含まれる場合が ある。 Hereinafter, best modes for carrying out the present invention (hereinafter referred to as “embodiments”) will be described with reference to the accompanying drawings. The drawings are only schematic, and the relationship between the thickness and width of each part, the ratio of the thickness of each part, etc. may differ from the actual ones. There may be some parts that have different dimensional relationships and ratios.
[0027] (実施の形態 1)  (Embodiment 1)
図 1は、本発明の実施の形態 1に係る検査装置要部の構成を示す図である。同図 に示す検査装置は、検査対象に対して電気信号の入出力等を行うコンタクトユニット 1と、検査対象である薄膜状のフィルム基板 2を載置し、検査を行う際にコンタクトュ- ット 1との間でフィルム基板 2を挟持する受台 3とを備える。 [0028] 図 2は、図 1の矢視 A方向の矢視図であり、コンタクトユニット 1の底面部の構成を示 す底面図である。コンタクトユニット 1は、フィルム基板 2の配線パターンに対応して設 けられ、フィルム基板 2と、このフィルム基板 2の電気的特性を検査する検査回路(図 示せず)との電気的な接続を確立する複数の導電性接触子 14を備える。また、コンタ タトユニット 1は、軸線方向に対して伸縮自在に弹発付勢される押え用部材として、フ イルム基板 2の配線パターンの中心部近傍に当接してフィルム基板 2を受台 3に押え 付ける複数の中心部押え用部材 16と、フィルム基板 2の配線パターンの周縁部を受 台 3に押え付ける複数の周縁部押え用部材 17と、を備える。このうち、導電性接触子 14および周縁部押え用部材 17は、略直方体状のホルダ部材 11 (第 1のホルダ部材 )に収容保持されている。また、中心部押え用部材 16は、ホルダ部材 11の中空部に 嵌合されて成るホルダ部材 12 (第 2のホルダ部材)に収容保持される。これらのホル ダ部材 11および 12は、ねじ等を用いることによってベース部材 13に一体的に固定 支持される。 FIG. 1 is a diagram showing the configuration of the main part of the inspection apparatus according to Embodiment 1 of the present invention. The inspection apparatus shown in FIG. 1 has a contact unit 1 for inputting / outputting electric signals to / from an inspection object and a thin film substrate 2 to be inspected, and a contact unit for inspection. And a cradle 3 for sandwiching the film substrate 2 with the pedestal 1. FIG. 2 is a view in the direction of arrow A in FIG. 1, and is a bottom view showing the configuration of the bottom surface portion of the contact unit 1. The contact unit 1 is installed corresponding to the wiring pattern of the film substrate 2, and establishes an electrical connection between the film substrate 2 and an inspection circuit (not shown) for inspecting the electrical characteristics of the film substrate 2. A plurality of conductive contacts 14 are provided. In addition, the contact unit 1 is used as a presser member that is urged and urged so as to expand and contract with respect to the axial direction. A plurality of center part pressing members 16 to be attached, and a plurality of peripheral part pressing members 17 to press the peripheral part of the wiring pattern of the film substrate 2 to the cradle 3 are provided. Among these, the conductive contact 14 and the peripheral edge pressing member 17 are accommodated and held in a substantially rectangular parallelepiped holder member 11 (first holder member). The center pressing member 16 is accommodated and held in a holder member 12 (second holder member) that is fitted in the hollow portion of the holder member 11. These holder members 11 and 12 are fixed and supported integrally with the base member 13 by using screws or the like.
[0029] ホルダ部材 11が保持する導電性接触子 14および周縁部押え用部材 17の軸線方 向は、全て平行である。また、ホルダ部材 12が保持する中心部押え用部材 16の軸 線方向も、導電性接触子 14および周縁部押え用部材 17の軸線方向と平行である。 このように、導電性接触子 14、中心部押え用部材 16、および周縁部押え用部材 17 の各々の軸線方向は、互いに平行であることが好ましいが、力かる場合にのみ本発 明が適用されるわけでな 、ことは勿論である。  The axial directions of the conductive contact 14 and the peripheral edge pressing member 17 held by the holder member 11 are all parallel. Also, the axial direction of the center pressing member 16 held by the holder member 12 is also parallel to the axial direction of the conductive contact 14 and the peripheral pressing member 17. As described above, the axial directions of the conductive contact 14, the center pressing member 16, and the peripheral pressing member 17 are preferably parallel to each other, but the present invention is applied only when force is applied. Of course not.
[0030] 図 3は、検査対象であるフィルム基板 2の構成を示す図である。同図に示すフィルム 基板 2は、厚さが数十; z m (マイクロメートル)程度のポリイミド等力 形成された長尺 のテープ状の基材 21に、その長手方向に沿って複数の配線パターン 22が規則的に 配置されて成る。配線パターン 22は、実装時に半導体チップに接続されるインナーリ ード 23と、外部機器との電気的な接続に用いられる接続用電極 25と、インナーリード 23と接続用電極 25とを 1対 1に接続するアウターリード 24と、を有する。  FIG. 3 is a diagram showing a configuration of the film substrate 2 to be inspected. The film substrate 2 shown in the figure has a thickness of several tens; a polyimide tape having a thickness of about zm (micrometer) and a plurality of wiring patterns 22 along a longitudinal direction of a long tape-like base material 21 formed thereon. Are arranged regularly. The wiring pattern 22 has a one-to-one correspondence between the inner lead 23 connected to the semiconductor chip during mounting, the connection electrode 25 used for electrical connection with an external device, and the inner lead 23 and the connection electrode 25. And outer leads 24 to be connected.
[0031] 一群の配線パターン 22の略中央部であって各インナーリード 23の端部のうちァゥ ターリード 24と接続する端部と異なる端部の側には、実装時に所定の半導体チップ が搭載されるチップ搭載領域 26が設けられている。このチップ搭載領域 26は、 TAB の場合にはデバイスホールと呼ばれ、長方形状の開口をなしている。他方、 COFの 場合のチップ搭載領域 26は開口ではなぐその周囲と同様の素材によって構成され ている。なお、フィルム基板 2上の接続用電極 25の配列パターンと、導電性接触子 1 4のホルダ部材 11における配列のパターンとが完全に対応して 、ることは 、うまでも ない。 [0031] A predetermined semiconductor chip is mounted at the time of mounting on the side near the center of the group of wiring patterns 22 and the end of each inner lead 23 that is different from the end connected to the outer lead 24. A chip mounting area 26 is provided. This chip mounting area 26 is TAB In this case, it is called a device hole and has a rectangular opening. On the other hand, in the case of COF, the chip mounting area 26 is made of the same material as the surrounding area, not the opening. Needless to say, the arrangement pattern of the connection electrodes 25 on the film substrate 2 completely corresponds to the arrangement pattern in the holder member 11 of the conductive contact 14.
[0032] 図 4は、導電性接触子 14の構成を示す断面図である。同図に示す導電性接触子 1 4は、その両端に針状部材 141および 142が配置され、これらの針状部材 141およ び 142がパネ部材 143によって連結付勢されて成る。針状部材 141、 142、および パネ部材 143は、金属等の導電性材料によって形成されている。また、針状部材 14 1、 142、およびパネ部材 143は、同一の軸線を有するようにホルダ部材 11の開口部 111に収容保持されており、針状部材 141の先端力 Sフィルム基板 2側に突出する一 方、針状部材 142の先端は、ベース部材 13の開口部 131に収容されるリード線 15 に接続され、このリード線 15を介して電気信号等の供給を受ける。図 4において針状 部材 142やパネ部材 143よりも鉛直下方に位置する針状部材 141にはフランジ部 14 laが設けられており、ホルダ部材 11からの抜止機能を果たしている。  FIG. 4 is a cross-sectional view showing a configuration of the conductive contact 14. The conductive contact 14 shown in the figure has needle-like members 141 and 142 disposed at both ends thereof, and these needle-like members 141 and 142 are connected and biased by a panel member 143. The needle-like members 141 and 142 and the panel member 143 are made of a conductive material such as metal. Further, the needle-like members 141, 142 and the panel member 143 are accommodated and held in the opening 111 of the holder member 11 so as to have the same axis, and the tip force of the needle-like member 141 on the S film substrate 2 side. On the other hand, the tip of the needle-like member 142 is connected to a lead wire 15 accommodated in the opening 131 of the base member 13 and receives supply of an electric signal or the like through the lead wire 15. In FIG. 4, the needle-like member 141 positioned vertically below the needle-like member 142 and the panel member 143 is provided with a flange portion 14 la and serves to prevent the holder member 11 from being removed.
[0033] 以上の構成を有する導電性接触子 14の針状部材 141先端がフィルム基板 2上の 接続用電極 25に当接する際には、パネ部材 143からの弾性力によって接続用電極 25への衝撃を緩和する。  When the tip of the needle-like member 141 of the conductive contact 14 having the above configuration abuts on the connection electrode 25 on the film substrate 2, the elastic contact force from the panel member 143 causes the connection to the connection electrode 25. Reduce the impact.
[0034] 導電性接触子 14を保持するホルダ部材 11は、第 1部材 11aおよび第 2部材 l ibを 重ね合わせることによって構成されている。このため、導電性接触子 14の開口部 11 1への取付や交換を容易に行うことができる。  [0034] The holder member 11 that holds the conductive contact 14 is configured by superposing the first member 11a and the second member l ib. For this reason, it is possible to easily attach or replace the conductive contact 14 to the opening 11 1.
[0035] 次に、中心部押え用部材 16の構成を、図 5の断面図を参照して説明する。図 5に 示す中心部押え用部材 16は、フィルム基板 2に当接して導電性接触子 14の伸縮方 向と平行な方向に所定の範囲で伸縮自在なプランジャ 161と、このプランジャ 161の 一端に当接してプランジャ 161を軸線方向に付勢するパネ部材 162とを有する。この 中心部押え用部材 16は、リセプタクル型のパイプ部材 71に嵌合保持される。このパ イブ部材 71は、ホルダ部材 12を構成する第 3部材 12aおよび第 4部材 12bにそれぞ れ設けられて同軸的に連通する開口部 121aおよび 121bに嵌入されたソケット 72に 収容されている。なお、図 5からも明らかなように、開口部 121aは一方のみが開口で あり、他方は閉端である。これに対して、開口部 121bは両端とも開口端である。 Next, the configuration of the center pressing member 16 will be described with reference to the cross-sectional view of FIG. A center-holding member 16 shown in FIG. 5 is in contact with the film substrate 2 and can be expanded and contracted within a predetermined range in a direction parallel to the expansion and contraction direction of the conductive contact 14, and one end of the plunger 161. A panel member 162 that abuts and urges the plunger 161 in the axial direction. The center pressing member 16 is fitted and held in a receptacle-type pipe member 71. This pipe member 71 is provided in a socket 72 that is provided in each of the third member 12a and the fourth member 12b constituting the holder member 12 and is fitted in the openings 121a and 121b that communicate coaxially. Contained. As is clear from FIG. 5, only one of the openings 121a is an opening, and the other is a closed end. On the other hand, the opening 121b is an open end at both ends.
[0036] 中心部押え用部材 16のプランジャ 161は、フィルム基板 2に当接する円筒状の当 接部 161aと、パイプ部材 71の内径と略同一な径を有し、パイプ部材 71から一部が 突出する突出部 161bと、リセプタクル型のノイブ部材 71のコネクタ部分に嵌入され 、プランジャ 161のノイブ部材 71からの抜止機能を果たす先端部 161cと、突出部 1 61bおよび先端部 161cを同軸的に連結する棒状の連結部 161dと、を有する。この うち先端部 161cは、同じくパイプ部材 71に収容保持されるパネ部材 162の端部に 当接しており、当接部 16 laがフィルム基板 2の表面であってチップ搭載領域 26の内 部および/または近傍の表面に当接し、コンタクトユニット 1が下降していくにつれて 、徐々にパイプ部材 71の内部に進入していく。このため、当接部 161aのホルダ部材 12からの突出量は徐々に減少していく。この際、パネ部材 162は、プランジャ 161が フィルム基板 2からの抗カによって一気に変位してしまうのを緩和する機能を有する。  [0036] The plunger 161 of the center pressing member 16 has a cylindrical contact portion 161a that contacts the film substrate 2 and a diameter substantially the same as the inner diameter of the pipe member 71. The protruding portion 161b that protrudes and the distal end portion 161c that fits into the connector portion of the receptacle-type noise member 71 and serves to prevent the plunger 161 from being removed from the noise member 71 are coaxially connected to the protruding portion 161b and the distal end portion 161c. A rod-shaped connecting portion 161d. Of these, the tip portion 161c is in contact with the end portion of the panel member 162 that is also housed and held in the pipe member 71, and the contact portion 16la is the surface of the film substrate 2 and the inner portion of the chip mounting region 26 and As the contact unit 1 descends, it gradually enters the inside of the pipe member 71. For this reason, the protrusion amount of the contact portion 161a from the holder member 12 gradually decreases. At this time, the panel member 162 has a function of mitigating that the plunger 161 is displaced at a stroke due to the resistance from the film substrate 2.
[0037] 以上の構成を有する中心部押え用部材 16では、少なくともプランジャ 161の当接 部 161aが、榭脂等の絶縁性を有する素材によって形成されていればよい。なお、中 心部押え用部材 16の先端の当接部 161aの径 Rは、配線パターン 22を避けることが できる程度の大きさが好ましく、具体的には 1〜2mm程度である。  [0037] In the center-holding member 16 having the above-described configuration, at least the contact portion 161a of the plunger 161 only needs to be formed of a material having insulating properties such as grease. The diameter R of the contact portion 161a at the tip of the center pressing member 16 is preferably large enough to avoid the wiring pattern 22, and is specifically about 1 to 2 mm.
[0038] ところで、中心部押え用部材 16の当接部 161aの径 Rは、フィルム基板 2が如何な るパッケージに適用されるかによって決められるべきものである。例えば、フィルム基 板 2が TABに適用される場合、チップ搭載領域 26は開口を形成しているので、当接 部 161aの径 Rはその開口の幅よりも大きくなければならない。他方、フィルム基板 2 力 SCOFに適用される場合、当接部 161aの径 Rがチップ搭載領域 26の幅より小さくて もその領域を平坦ィ匕することが可能なので、力かる場合には Rの値がチップ搭載領 域 26の幅より小さい方がより好ましい。この意味では、例えば周縁部押え用部材 17 の当接部 171aの径と中心部押え用部材 16の当接部 161aの径とが異なっていても 構わない。  [0038] By the way, the diameter R of the contact portion 161a of the center pressing member 16 should be determined depending on which package the film substrate 2 is applied to. For example, when the film substrate 2 is applied to TAB, the chip mounting region 26 forms an opening, and therefore the diameter R of the contact portion 161a must be larger than the width of the opening. On the other hand, when applied to the film substrate 2 force SCOF, even if the diameter R of the contact portion 161a is smaller than the width of the chip mounting region 26, the region can be flattened. It is more preferable that the value is smaller than the width of the chip mounting area 26. In this sense, for example, the diameter of the contact portion 171a of the peripheral portion pressing member 17 may be different from the diameter of the contact portion 161a of the center portion pressing member 16.
[0039] ここまで、中心部押え用部材 16の構成を説明してきた力 本実施の形態 1において は、中心部押え用部材 16と周縁部押え用部材 17は同一の構造を有している。すな わち、周縁部押え用部材 17は、プランジャ 161およびパネ部材 162とそれぞれ同じ 構成を有するプランジャ 171 (当接部 171a、突出部 171b、先端部 171c、連結部 17 Id)およびパネ部材 172を備える。この周縁部押え用部材 17も、ホルダ部材 12にお いて、パイプ部材 71に収容されて成る。このパイプ部材 71が、ホルダ部材 12に埋め 込まれるソケット 72に保持されている点についても、中心部押え用部材 16の場合と 同様である。 [0039] The force that has been described so far for the structure of the center pressing member 16 In the first embodiment, the center pressing member 16 and the peripheral pressing member 17 have the same structure. sand That is, the peripheral edge pressing member 17 includes a plunger 171 (abutting portion 171a, projecting portion 171b, tip portion 171c, connecting portion 17 Id) and a panel member 172 having the same configuration as the plunger 161 and the panel member 162, respectively. . The peripheral edge pressing member 17 is also accommodated in the pipe member 71 in the holder member 12. The point that the pipe member 71 is held by the socket 72 embedded in the holder member 12 is the same as in the case of the center pressing member 16.
[0040] ところで、コンタクトユニット 1の各ホルダ底面力も突出する導電性接触子 14や中心 部押え用部材 16、周縁部押え用部材 17がフィルム基板 2に当接して 、な 、状態に おいて、プランジャ 161および 171のコンタクトユニット 1の本体底面からの突出量 H ( 図 5を参照)は、導電性接触子 14の針状部材 141先端のコンタクトユニット 1の本体 底面からの突出量 h (図 4を参照)よりも大きぐ H>hである。  [0040] By the way, the conductive contact 14, the center pressing member 16, and the peripheral pressing member 17 that also project the bottom force of each holder of the contact unit 1 are in contact with the film substrate 2, and in this state, The amount of protrusion H of the plunger 161 and 171 from the bottom of the main body of the contact unit 1 (see FIG. 5) is the amount of protrusion h from the bottom of the main body of the contact unit 1 of the needle member 141 of the conductive contact 14 (see FIG. 4). H> h, which is larger than
[0041] 次に、受台 3の構成を説明する。この受台 3の中央部表面には、非接触型のセンサ 31が配設されている(図 1を参照)。このセンサ 31には、 1または複数の電極力 厚み の薄 、銅版や鉄板等の金属導体と、薄膜状の PET等の絶縁フィルムとを用いて形 成されており、各電極は、フィルム基板 2の接続用電極 25と容量結合可能な構成を 有している。この受台 3のフィルム基板 2の載置面に露出するセンサ 31の表面積は、 チップ搭載領域 26の面積よりも若干大き 、。  Next, the configuration of the cradle 3 will be described. A non-contact type sensor 31 is disposed on the surface of the central portion of the cradle 3 (see FIG. 1). This sensor 31 is formed by using one or more thin electrode forces, a metal conductor such as a copper plate or an iron plate, and a thin film insulating film such as PET. The connection electrode 25 can be capacitively coupled. The surface area of the sensor 31 exposed on the mounting surface of the film substrate 2 of the cradle 3 is slightly larger than the area of the chip mounting area 26.
[0042] 以上の構成を有するセンサ 31を用いてフィルム基板 2の断線検査を行う際には、各 導電性接触子 14に対して選択的に交流信号を入力し、この交流信号に応じてセン サ 31から出力される出力信号の信号レベルの変化を所定の回路によって検出する。 フィルム基板 2に断線が生じている場合には、本来存在しないはずの静電容量が生 じるため、センサ 31から出力される信号レベル力 想定される値よりも小さくなる。した がって、この信号レベルの変化を検出することにより、フィルム基板 2の断線箇所を検 知することができる。  [0042] When performing a disconnection inspection of the film substrate 2 using the sensor 31 having the above-described configuration, an AC signal is selectively input to each conductive contact 14, and a sensor is sent in accordance with the AC signal. A change in the signal level of the output signal output from the sensor 31 is detected by a predetermined circuit. When the film substrate 2 is disconnected, an electrostatic capacity that should not originally exist is generated, so that the signal level force output from the sensor 31 is smaller than the expected value. Therefore, the broken portion of the film substrate 2 can be detected by detecting the change in the signal level.
[0043] 図 6および図 7は、本実施の形態 1に係るコンタクトユニット 1を用いてフィルム基板 2 の検査を行う際に、コンタクトユニット 1を下降してフィルム基板 2の配線パターン 22に 導電性接触子 14を当接する際の状況を示す説明図である。このうち、図 6は、反りや 波打ち等の変形を生じているフィルム基板 2を周縁部押え用部材 17によって平坦ィ匕 する状況を示している。また、図 7は、図 6の状態に達した後、さらにコンタクトユニット 1を下降させることによって導電性接触子 14を配線パターン 22 (の接続用電極 25) に接触させた状態を示して 、る。 [0043] FIGS. 6 and 7 show that when the contact unit 1 according to the first embodiment is used to inspect the film substrate 2, the contact unit 1 is lowered to the wiring pattern 22 of the film substrate 2. FIG. 6 is an explanatory view showing a situation when the contact 14 is brought into contact with the contact 14; Of these, FIG. 6 shows that the film substrate 2 that has undergone deformation such as warping or undulation is flattened by the peripheral-side pressing member 17. Shows the situation. Further, FIG. 7 shows a state where the conductive contact 14 is brought into contact with the wiring pattern 22 (connection electrode 25 thereof) by further lowering the contact unit 1 after reaching the state of FIG. .
[0044] まず、図 6について説明する。周縁部押え用部材 17の当接部 171aの底面は、導 電性接触子 14の先端部よりも下方に突出しているため、コンタクトユニット 1を下降さ せていくと、周縁部押え用部材 17の方が先にフィルム基板 2に到達し、フィルム基板 2を下方に押え付け始める。この際には、中心部押え用部材 16が有するパネ部材 16 2 (図 5を参照)と同じ構成を有するパネ部材 172の弾性力によってフィルム基板 2を 押圧するため、フィルム基板 2に加わる衝撃を和らげながら、フィルム基板 2をもとの 平板状に戻していくことができる。図 6の実線は、周縁部押え用部材 17の内側領域 が概ね平坦化された状態を示している。なお、図示はしないが、中心部押え用部材 1 6も周縁部押え用部材 17と同様の動作を行うため、チップ搭載領域 26の近傍領域も 上記同様に平坦ィ匕されることは 、うまでもな 、。  First, FIG. 6 will be described. Since the bottom surface of the contact portion 171a of the peripheral edge pressing member 17 protrudes downward from the tip end portion of the conductive contact 14, when the contact unit 1 is lowered, the peripheral edge pressing member 17 First reaches the film substrate 2 and starts pressing the film substrate 2 downward. At this time, since the film substrate 2 is pressed by the elastic force of the panel member 172 having the same configuration as the panel member 16 2 (see FIG. 5) of the center pressing member 16, the impact applied to the film substrate 2 is not affected. The film substrate 2 can be returned to its original flat shape while being softened. The solid line in FIG. 6 shows a state in which the inner region of the peripheral edge pressing member 17 is generally flattened. Although not shown, since the center pressing member 16 performs the same operation as the peripheral edge pressing member 17, the area near the chip mounting area 26 is flattened in the same manner as described above. Nah ...
[0045] 図 6の実線で示す状態では、導電性接触子 14の先端が未だ配線パターン 22に接 触していないことが望ましい。したがって、導電性接触子 14のホルダ部材 11からの 突出量は、この点に鑑みて設計しておけばよい。すなわち、初期状態における導電 性接触子 14のホルダ部材 11からの突出量 hは、フィルム基板 2の厚み (基材 21と配 線パターン 22の厚み)および中心部押え用部材 16等のコンタクトユニット 1からの突 出量 Hなどを考慮した上で、最適な値に定めればよ!、。  In the state shown by the solid line in FIG. 6, it is desirable that the tip of the conductive contact 14 is not yet in contact with the wiring pattern 22. Therefore, the protruding amount of the conductive contact 14 from the holder member 11 may be designed in view of this point. That is, the protruding amount h of the conductive contact 14 from the holder member 11 in the initial state is the thickness of the film substrate 2 (the thickness of the base material 21 and the wiring pattern 22) and the contact unit 1 such as the center pressing member 16 or the like. Determine the optimum value after considering the amount of protrusion H from the top!
[0046] この後、コンタクトユニット 1をさらに下降させていくと、周縁部押え用部材 17は徐々 に弾性力を受けながら縮小していき、やがて図 7の実線で示すように、導電性接触子 14の先端が配線パターン 22の接続用電極 25に接触する。図 8は、図 7に示す状態 をコンタクトユニット 1の全体で見たときの図である。この図 8に示すように、フィルム基 板 2のうち中心部押え用部材 16および周縁部押え用部材 17によって押えた部分は 概ね平坦となっているため、センサ 31とフィルム基板 2との位置関係はほぼ一定であ る。したがって、フィルム基板 2の変形による静電容量の変化はほとんど無視できる程 度になり、センサ 31の作動感度が向上し、動作が安定する。この結果、より精度の高 い断線検査を行うことが可能となる。 [0047] また、コンタクトユニット 1を下降させる際、中心部押え用部材 16および周縁部押え 用部材 17が導電性接触子 14よりも早くフィルム基板 2に接触し、導電性接触子 14が 接触し始める時点ではフィルム基板 2が概ね平坦となって 、たため、複数の導電性 接触子 14の先端はほぼ同時に配線パターン 22に接触し始める。この結果、多数の 検査を経た後の各導電性接触子 14の磨耗の程度は、設置位置に関わらず略一様と なる。したがって、導電性接触子 14のフィルム基板 2への接触を安定化させることが でき、導電性接触子 14自体の耐久性も向上させることができる。 Thereafter, when the contact unit 1 is further lowered, the peripheral edge pressing member 17 is gradually reduced while receiving the elastic force, and eventually, as shown by the solid line in FIG. The tip of 14 contacts the connection electrode 25 of the wiring pattern 22. FIG. 8 is a view of the state shown in FIG. 7 when the contact unit 1 is viewed as a whole. As shown in FIG. 8, the portion of the film substrate 2 that is pressed by the center pressing member 16 and the peripheral pressing member 17 is substantially flat, so the positional relationship between the sensor 31 and the film substrate 2 Is almost constant. Therefore, the change in the capacitance due to the deformation of the film substrate 2 becomes almost negligible, the operation sensitivity of the sensor 31 is improved, and the operation is stabilized. As a result, it is possible to perform a disconnection inspection with higher accuracy. [0047] When the contact unit 1 is lowered, the center pressing member 16 and the peripheral pressing member 17 contact the film substrate 2 earlier than the conductive contact 14, and the conductive contact 14 contacts. Since the film substrate 2 is almost flat at the time of starting, the tips of the plurality of conductive contacts 14 start to contact the wiring pattern 22 almost simultaneously. As a result, the degree of wear of each conductive contact 14 after many inspections is substantially uniform regardless of the installation position. Therefore, the contact of the conductive contact 14 to the film substrate 2 can be stabilized, and the durability of the conductive contact 14 itself can be improved.
[0048] 以上説明した本発明の実施の形態 1によれば、薄膜フィルム状をなすフィルム基板  [0048] According to Embodiment 1 of the present invention described above, a film substrate having a thin film shape
(検査対象)の配線パターンと接触して電気信号の入力または出力の少なくともいず れか一方を行う複数の導電性接触子と、前記複数の導電性接触子を、互いの軸線 方向が平行であるとともに前記配線パターンに対応した配置で収容するホルダ部材 と、前記導通検査を行う際、前記複数の導電性接触子と接触する前記配線パターン の近傍領域を平坦ィ匕する中心部押え用部材 (平坦ィ匕手段)と、を備えたことにより、 薄肉で剛性に乏しいフィルム基板の断線を高い精度で検出することが可能となる。こ の結果、検査自体の信頼性も向上させることができる。  A plurality of conductive contacts that contact at least one of input and output of electrical signals in contact with the wiring pattern of (inspection target) and the plurality of conductive contacts are parallel to each other in the axial direction. A holder member that is accommodated in an arrangement corresponding to the wiring pattern, and a center pressing member that flattens a region near the wiring pattern that comes into contact with the plurality of conductive contacts when the continuity test is performed. A flat plate means), it is possible to detect a disconnection of a thin film substrate having a low rigidity with high accuracy. As a result, the reliability of the inspection itself can be improved.
[0049] また、本実施の形態 1によれば、平坦化手段の一種として、配線パターンの周縁部 を押える周縁部押え用部材を設けたことにより、フィルム基板のうち検査時に導電性 接触子が接触する表面の近傍領域における反りや波打ち等の変形をなくし、周縁部 の導電性接触子に対する接触状態を確実なものとすることができる。この結果、個々 の導電性接触子と接触用電極との接触が一様となるため、特定の導電性接触子の 磨耗が早く進行することなぐ複数の導電性接触子の磨耗の進行を均一にすることが でき、検査装置自体の耐久性を向上させることが可能となる。  [0049] According to the first embodiment, as a kind of flattening means, a peripheral edge pressing member that presses the peripheral edge of the wiring pattern is provided, so that the conductive contact of the film substrate during inspection is provided. Deformation such as warpage and undulation in the region near the contacting surface can be eliminated, and the contact state of the peripheral portion with the conductive contact can be ensured. As a result, the contact between the individual conductive contacts and the contact electrode is uniform, so that the wear of a plurality of conductive contacts is made uniform without the wear of a specific conductive contact progressing quickly. It is possible to improve the durability of the inspection apparatus itself.
[0050] (実施の形態 2)  [0050] (Embodiment 2)
本発明の実施の形態 2は、フィルム基板 2を平坦にする平坦ィ匕手段の一部として、 フィルム基板 2を載置する受台に対して負圧で吸引するための孔部を設けたことを特 徴とする。図 9は、本実施の形態 2に係る検査装置の一部をなす受台の構成を示す 上面図である。また、図 10は、図 9の B— B線断面図である。これらの図に示す受台 4 は、フィルム基板 2を載置する載置部 41と、この載置部 41に固着されるとともに負圧 吸引用のノズルが装着されて成る吸引部 42とを備える。 In the second embodiment of the present invention, as a part of the flattening means for flattening the film substrate 2, a hole for sucking with a negative pressure is provided for the cradle on which the film substrate 2 is placed. Features. FIG. 9 is a top view showing a configuration of a cradle that forms part of the inspection apparatus according to the second embodiment. FIG. 10 is a cross-sectional view taken along line BB in FIG. The cradle 4 shown in these drawings includes a mounting portion 41 on which the film substrate 2 is mounted, and a negative pressure that is fixed to the mounting portion 41. And a suction part 42 to which a suction nozzle is attached.
[0051] 載置部 41の表面略中央部には、上記実施の形態 1で説明したのと同じ非接触型 のセンサ 31が埋め込まれるとともに、載置部 41の表面のセンサ 31の周辺部には、負 圧吸引用の孔部 43が穿設されている(図 9では 6個の孔部 43が穿設されている)。ま た、載置部 41の表面の縁端部付近にも、複数の孔部 44 (図 9では 12個)が穿設され ている。各孔部 43および 44は、連絡用通路 45を介して吸引部 42のバキューム孔部 46 (後述)に連通している。孔部 43および 44の径は、 1mm程度である。他方、吸引 部 42は、載置部 41の対向する表面にバキューム孔部 46が穿設されており、このバ キューム孔部 46の底面は、載置部 41と対向しない側の表面に開口端を有する貫通 孔部 421に連通している。この貫通孔部 421には、吸引用のノズル 47が装着されて いる。このノズル 47は、ホース 48を介してバキュームポンプ 49等の真空発生機器に 接続されている。 [0051] The same non-contact type sensor 31 as described in the first embodiment is embedded in the substantially central portion of the surface of the mounting portion 41, and at the periphery of the sensor 31 on the surface of the mounting portion 41. Has holes 43 for negative pressure suction (in FIG. 9, six holes 43 are formed). In addition, a plurality of holes 44 (12 in FIG. 9) are also formed near the edge of the surface of the mounting portion 41. Each hole 43 and 44 communicates with a vacuum hole 46 (described later) of the suction part 42 through a communication passage 45. The diameter of the holes 43 and 44 is about 1 mm. On the other hand, the suction part 42 has a vacuum hole 46 formed in the surface facing the mounting part 41, and the bottom surface of the vacuum hole part 46 is open at the surface not facing the mounting part 41. It communicates with a through-hole portion 421 having. A suction nozzle 47 is attached to the through-hole portion 421. The nozzle 47 is connected to a vacuum generating device such as a vacuum pump 49 via a hose 48.
[0052] 図 11は、受台 4にフィルム基板 2を載置し、バキュームポンプ 49によって負圧をカロ えた状態を示す図である。この図 11に示すように、導電性接触子 14を収容するコン タクトユニット 5は、ホルダ部材 51がベース部材 52に固定支持されている。ホルダ部 材 51〖こは、フィルム基板 2の配線パターン 22に応じて複数の導電性接触子 14が収 容されて!/、る(リード線 15は省略)。  FIG. 11 is a diagram showing a state in which the film substrate 2 is placed on the cradle 4 and the negative pressure is increased by the vacuum pump 49. As shown in FIG. 11, in the contact unit 5 that accommodates the conductive contact 14, the holder member 51 is fixedly supported by the base member 52. The holder member 51 can accommodate a plurality of conductive contacts 14 according to the wiring pattern 22 of the film substrate 2 (the lead wire 15 is omitted).
[0053] この図 11に示すように、フィルム基板 2に対して負圧をカ卩えることにより、フィルム基 板 2のうち少なくとも載置部 41に載置される部分は概ね平坦ィ匕される。この結果、セ ンサ 31とフィルム基板 2との位置関係が一定に保たれ、断線検査時の精度を向上さ せることができる。また、検査時に、複数の導電性接触子 14が配線パターン (の接続 用電極 25)にほぼ同時に接触するため、導電性接触子 14の磨耗の進行具合も略一 様となり、検査装置としての耐久性を向上させることができる。  As shown in FIG. 11, by covering the film substrate 2 with a negative pressure, at least a portion of the film substrate 2 placed on the placement portion 41 is generally flattened. . As a result, the positional relationship between the sensor 31 and the film substrate 2 is kept constant, and the accuracy during the disconnection inspection can be improved. In addition, since a plurality of conductive contacts 14 are in contact with the wiring pattern (connecting electrode 25) at the same time during the inspection, the progress of the wear of the conductive contacts 14 is also substantially the same, making it durable as an inspection device. Can be improved.
[0054] 以上説明した本発明の実施の形態 2によれば、検査対象であるフィルム基板に対し て負圧を加えることにより、そのフィルム基板がその受台とほぼ平行に固定されるの で、センサとフィルム基板との間隔がほぼ一定となり、受台に埋め込まれたセンサの 作動感度が向上し、その動作が安定する。このため、上記実施の形態 1と同様に、断 線検査を精度よく確実に行うことができ、導電性接触子の磨耗の進行具合を略一様 として耐久性を向上させることができる。 [0054] According to the second embodiment of the present invention described above, by applying a negative pressure to the film substrate to be inspected, the film substrate is fixed substantially parallel to the cradle. The distance between the sensor and the film substrate is almost constant, which improves the operational sensitivity of the sensor embedded in the cradle and stabilizes its operation. For this reason, as in the first embodiment, the disconnection inspection can be performed accurately and reliably, and the progress of wear of the conductive contact is substantially uniform. As a result, durability can be improved.
[0055] また、本実施の形態 2によれば、フィルム基板を平坦化する際に負圧を印加するだ けでよ!、ため、フィルム基板の表面を傷つける恐れがほとんどな!/ヽと 、う利点も有す る。 [0055] Furthermore, according to the second embodiment, it is only necessary to apply a negative pressure when flattening the film substrate! Therefore, there is almost no risk of damaging the surface of the film substrate! There is also an advantage.
[0056] (実施の形態 2の変形例)  [0056] (Modification of Embodiment 2)
図 12は、本実施の形態 2の一変形例に係る検査装置に適用される受台の構成を 示す上面図である。また、図 13は、図 12の C— C線断面図である。これらの図に示す 受台 6は、載置部 61に、センサ 31近傍の周辺を包囲する溝部 63が設けられ、この溝 部 63の底面には、所定の間隔で孔部 64が穿設されている(図 12では 6個の孔部 64 が穿設されている)。また、載置部 61の周縁部には、載置部 61の四隅に沿うようにし て 4つの溝部 65が設けられており、各溝部 65の底面には、所定の間隔で孔部 66が 穿設されて 、る(図 12では 1つの溝部 65に 3個の孔部 66が穿設されて 、る)。溝部 6 3および 65の径は lmm程度であり、その深さも同程度である。各孔部 64および 66は 、連絡用通路 67を介して吸引部 42のバキューム孔部 46に連通している。なお、吸 引部 42の構成は、上記実施の形態 2と同じであり、ノズル 47およびホース 48を介し てバキュームポンプ 49に接続されている点も上記実施の形態 2と同じである。  FIG. 12 is a top view showing a configuration of a cradle applied to an inspection apparatus according to a modification of the second embodiment. FIG. 13 is a cross-sectional view taken along the line CC in FIG. In the cradle 6 shown in these drawings, a groove portion 63 that surrounds the vicinity of the sensor 31 is provided in the mounting portion 61, and holes 64 are formed at predetermined intervals on the bottom surface of the groove portion 63. (In FIG. 12, six holes 64 are formed). In addition, four groove portions 65 are provided along the four corners of the placement portion 61 at the peripheral portion of the placement portion 61, and holes 66 are formed at predetermined intervals on the bottom surface of each groove portion 65. (In FIG. 12, there are three holes 66 in one groove 65). The diameters of the grooves 63 and 65 are about lmm, and their depths are about the same. Each of the holes 64 and 66 communicates with the vacuum hole 46 of the suction part 42 through the communication passage 67. The configuration of the suction part 42 is the same as that of the second embodiment, and the point that it is connected to the vacuum pump 49 via the nozzle 47 and the hose 48 is the same as that of the second embodiment.
[0057] 以上の構成を有する受台 6を用いてフィルム基板 2を平坦化する際の負圧の加え 方は、上記実施の形態 2と同様である。したがって、得られる効果も同じである。  [0057] The method of applying the negative pressure when the film substrate 2 is flattened using the cradle 6 having the above-described configuration is the same as that of the second embodiment. Therefore, the effect obtained is the same.
[0058] (その他の実施の形態)  [0058] (Other Embodiments)
ここまで、本発明を実施するための最良の形態として、実施の形態 1および 2を詳述 してきた力 本発明はそれら二つの実施の形態によってのみ限定されるべきものでは ない。例えば、本発明に係るに検査装置に設けられる平坦ィ匕手段としての中心部押 え用部材および周縁部押え用部材は、そのうちのいずれか一方のみ具備されていれ ばよい。中心部押え用部材のみが具備される場合には、特にセンサの精度を向上さ せることができる。これに対して、周縁部押え用部材のみが具備される場合には、導 電性接触子の磨耗のばらつきを抑制することができ、フィルム基板との間の安定的な 接触を実現することができる。  So far, the best mode for carrying out the present invention has been described in detail for the first and second embodiments. The present invention should not be limited only by these two embodiments. For example, only one of the center pressing member and the peripheral edge pressing member as the flattening means provided in the inspection apparatus according to the present invention may be provided. When only the center pressing member is provided, the accuracy of the sensor can be particularly improved. On the other hand, when only the peripheral edge pressing member is provided, it is possible to suppress variation in wear of the conductive contact and to realize stable contact with the film substrate. it can.
[0059] また、平坦化手段として、実施の形態 1で説明した各種押え用部材と実施の形態 2 で説明した孔部とを併せ持つ検査装置を構成しても構わない。この場合には、押え 用部材の当接位置と孔部の穿設位置とが重ならないように留意すればよい。 [0059] Further, as the flattening means, the various pressing members described in the first embodiment and the second embodiment. You may comprise the test | inspection apparatus which has a hole part demonstrated by (2). In this case, attention should be paid so that the contact position of the pressing member and the drilling position of the hole do not overlap.
[0060] なお、本発明に係る検査装置に適用される導電性接触子は、上述した導電性接触 子 14 (図 4を参照)に限られるわけではない。すなわち、本発明に係る検査装置に対 しては、従来知られているさまざまな種類の導電性接触子のうちのいずれかを適用 することが可能である。  Note that the conductive contact applied to the inspection apparatus according to the present invention is not limited to the above-described conductive contact 14 (see FIG. 4). In other words, any of various types of conventionally known conductive contacts can be applied to the inspection apparatus according to the present invention.
[0061] このように、本発明は、ここでは記載していないさまざまな実施の形態等を含みうる ものであり、特許請求の範囲により特定される技術的思想を逸脱しない範囲内にお V、て種々の設計変更等を施すことが可能である。  [0061] As described above, the present invention can include various embodiments and the like not described herein, and V, V, within the scope not departing from the technical idea specified by the claims. It is possible to make various design changes.
産業上の利用可能性  Industrial applicability
[0062] 以上のように、本発明に係る検査装置は、電気信号の入力または出力に用いられ る配線パターンを含む複数の導電領域が表面上に形成された薄膜フィルム状の検 查対象に対し、その配線パターンの導通検査に有用であり、特に、薄肉で剛性に乏 L ヽ検査対象の断線を検出するのに適して 、る。 [0062] As described above, the inspection apparatus according to the present invention applies to a thin film-like inspection target in which a plurality of conductive regions including a wiring pattern used for input or output of an electric signal are formed on the surface. It is useful for the continuity inspection of the wiring pattern, and is particularly suitable for detecting the disconnection of the thin object and lack of rigidity.

Claims

請求の範囲 The scope of the claims
[1] 電気信号の入力または出力に用いられる配線パターンを含む複数の導電領域が 表面上に形成され、実装時に所定の半導体チップが搭載される薄膜フィルム状の検 查対象に対し、前記配線パターンの導通検査を行う検査装置であって、  [1] A plurality of conductive regions including a wiring pattern used for input or output of an electric signal is formed on the surface, and the wiring pattern is applied to a thin film film-like inspection target on which a predetermined semiconductor chip is mounted at the time of mounting. An inspection device for performing a continuity test of
前記配線パターンと接触して電気信号の入力または出力の少なくともいずれか一 方を行う複数の導電性接触子と、  A plurality of conductive contacts that contact at least one of an input and an output of an electrical signal in contact with the wiring pattern;
前記複数の導電性接触子を、前記配線パターンに対応した配置で収容するホルダ 部材と、  A holder member for accommodating the plurality of conductive contacts in an arrangement corresponding to the wiring pattern;
前記導通検査を行う際、前記複数の導電性接触子と接触する前記配線パターンの 近傍領域を平坦化する平坦化手段と、  A flattening means for flattening a region near the wiring pattern in contact with the plurality of conductive contacts when performing the continuity test;
を備えたことを特徴とする検査装置。  An inspection apparatus comprising:
[2] 前記平坦化手段は、  [2] The flattening means includes
前記配線パターンに圧力をカ卩えることによって前記配線パターンを平坦ィ匕すること を特徴とする請求項 1記載の検査装置。  2. The inspection apparatus according to claim 1, wherein the wiring pattern is flattened by applying pressure to the wiring pattern.
[3] 前記平坦化手段は、 [3] The flattening means includes
軸線方向に対して伸縮自在に弹発付勢されて前記ホルダ部材に収容される複数 の押え用部材を有し、  A plurality of presser members that are elastically urged and retracted relative to the axial direction and accommodated in the holder member;
前記複数の押え用部材は、前記検査対象に接触していない状態で、前記導電性 接触子よりも前記ホルダ部材からの突出量が大きいことを特徴とする請求項 1または 2記載の検査装置。  3. The inspection apparatus according to claim 1, wherein the plurality of pressing members have a larger protruding amount from the holder member than the conductive contact in a state where the plurality of pressing members are not in contact with the inspection object.
[4] 前記押え用部材は、 [4] The pressing member is
前記導通検査を行う際、実装時に所定の半導体チップが搭載されるチップ搭載領 域の内部および近傍の少なくともいずれか一方の表面に当接する位置に設けられた ことを特徴とする請求項 3記載の検査装置。  4. The device according to claim 3, wherein when performing the continuity test, the continuity test is provided at a position in contact with at least one of the inside and the vicinity of a chip mounting area where a predetermined semiconductor chip is mounted during mounting. Inspection device.
[5] 前記ホルダ部材は、 [5] The holder member is
前記複数の導電性接触子を収容する第 1のホルダ部材と、  A first holder member that houses the plurality of conductive contacts;
前記押え用部材を収容する第 2のホルダ部材と、  A second holder member for accommodating the pressing member;
を有することを特徴とする請求項 4記載の検査装置。 5. The inspection apparatus according to claim 4, further comprising:
[6] 前記押え用部材は、 [6] The pressing member is
前記導通検査を行う際、前記複数の導電性接触子と接触する前記配線パターンの 周縁部に当接する位置に設けられたことを特徴とする請求項 3記載の検査装置。  4. The inspection apparatus according to claim 3, wherein when performing the continuity inspection, the inspection apparatus is provided at a position that contacts a peripheral portion of the wiring pattern that contacts the plurality of conductive contacts.
[7] 前記押え用部材は、 [7] The pressing member is
前記検査対象に当接する当接部が榭脂製であることを特徴とする請求項 3記載の 検査装置。  4. The inspection apparatus according to claim 3, wherein the contact portion that contacts the inspection object is made of resin.
[8] 前記平坦化手段は、 [8] The flattening means includes
前記検査対象に対して負圧を加える負圧印加手段を有することを特徴とする請求 項 1または 2記載の検査装置。  3. The inspection apparatus according to claim 1, further comprising negative pressure applying means for applying a negative pressure to the inspection object.
[9] 前記負圧印加手段は、 [9] The negative pressure applying means includes
前記導通検査を行う際、実装時に所定の半導体チップが搭載されるチップ搭載領 域の内部および近傍の少なくともいずれか一方の表面に負圧を加えることを特徴と する請求項 8記載の検査装置。  9. The inspection apparatus according to claim 8, wherein when conducting the continuity test, a negative pressure is applied to at least one of the inside and the vicinity of a chip mounting area where a predetermined semiconductor chip is mounted during mounting.
[10] 前記負圧印加手段は、 [10] The negative pressure applying means includes:
前記導通検査を行う際、前記複数の導電性接触子と接触する前記配線パターンの 周縁部に負圧を加えることを特徴とする請求項 8記載の検査装置。  9. The inspection apparatus according to claim 8, wherein when performing the continuity test, negative pressure is applied to a peripheral portion of the wiring pattern that contacts the plurality of conductive contacts.
[11] 前記負圧印加手段は、 [11] The negative pressure applying means includes:
所定位置に複数の孔部が穿設されて成り、前記検査対象の一部を載置する受台と 前記受台に穿設された複数の孔部を介して負圧による吸引を行う吸引手段と、 を有することを特徴とする請求項 8記載の検査装置。  A plurality of holes formed in predetermined positions, and a suction base for placing a part of the inspection object thereon, and suction means for performing suction by a negative pressure through the plurality of holes formed in the base The inspection apparatus according to claim 8, further comprising:
[12] 前記導通検査には、非接触型のセンサを用いた断線検査が含まれることを特徴と する請求項 1または 2記載の検査装置。 12. The inspection apparatus according to claim 1, wherein the continuity inspection includes a disconnection inspection using a non-contact type sensor.
PCT/JP2006/311327 2005-06-08 2006-06-06 Inspection device WO2006132243A1 (en)

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8225683B2 (en) * 2007-09-28 2012-07-24 Lam Research Corporation Wafer bow metrology arrangements and methods thereof
JP2012112904A (en) * 2010-11-26 2012-06-14 Micronics Japan Co Ltd Probe card, semiconductor inspection device, and semiconductor inspection method
JP2012220451A (en) * 2011-04-13 2012-11-12 Seiken Co Ltd Inspection unit

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59122555U (en) * 1983-02-08 1984-08-17 株式会社フジクラ Printed circuit board inspection equipment
JPH03199976A (en) * 1989-12-27 1991-08-30 Toshiba Corp Probe card
JPH05288802A (en) * 1992-04-09 1993-11-05 Fuji Electric Co Ltd Inspection method for electric characteristic of semiconductor chip, and wafer prober
JP2000009785A (en) * 1998-06-25 2000-01-14 Onishi Denshi Kk Printed board inspecting device
JP2001296325A (en) * 2000-04-18 2001-10-26 Hioki Ee Corp Method and apparatus for inspection of circuit board
WO2003087852A1 (en) * 2002-04-16 2003-10-23 Nhk Spring Co., Ltd. Holder for conductive contact
JP2004271237A (en) * 2003-03-05 2004-09-30 Tdk Corp Inspection device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0714927Y2 (en) * 1988-11-17 1995-04-10 日置電機株式会社 Pinboard structure in circuit board inspection equipment
JPH10206480A (en) * 1997-01-20 1998-08-07 Okano Denki Kk Method for supporting conductor circuit board in conductor circuit board inspecting apparatus
JP2000266799A (en) * 1999-03-15 2000-09-29 Taiyo Kogyo Kk Printed circuit board inspection device
JP2003185695A (en) * 2001-12-20 2003-07-03 Seiko Epson Corp Method and apparatus for inspection of wiring pattern
JP2003322670A (en) * 2002-04-30 2003-11-14 Kyoritsu Denki Kk Printed board inspection device
JP4264310B2 (en) * 2003-08-06 2009-05-13 日本電産リード株式会社 Board inspection equipment

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59122555U (en) * 1983-02-08 1984-08-17 株式会社フジクラ Printed circuit board inspection equipment
JPH03199976A (en) * 1989-12-27 1991-08-30 Toshiba Corp Probe card
JPH05288802A (en) * 1992-04-09 1993-11-05 Fuji Electric Co Ltd Inspection method for electric characteristic of semiconductor chip, and wafer prober
JP2000009785A (en) * 1998-06-25 2000-01-14 Onishi Denshi Kk Printed board inspecting device
JP2001296325A (en) * 2000-04-18 2001-10-26 Hioki Ee Corp Method and apparatus for inspection of circuit board
WO2003087852A1 (en) * 2002-04-16 2003-10-23 Nhk Spring Co., Ltd. Holder for conductive contact
JP2004271237A (en) * 2003-03-05 2004-09-30 Tdk Corp Inspection device

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