WO2006095610A1 - 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体 - Google Patents
体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体 Download PDFInfo
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- WO2006095610A1 WO2006095610A1 PCT/JP2006/303832 JP2006303832W WO2006095610A1 WO 2006095610 A1 WO2006095610 A1 WO 2006095610A1 JP 2006303832 W JP2006303832 W JP 2006303832W WO 2006095610 A1 WO2006095610 A1 WO 2006095610A1
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- Prior art keywords
- volume phase
- resin composition
- copolymer
- photosensitive resin
- recording
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- MAWOHFOSAIXURX-UHFFFAOYSA-N cyclopentylcyclopentane Chemical group C1CCCC1C1CCCC1 MAWOHFOSAIXURX-UHFFFAOYSA-N 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229940100539 dibutyl adipate Drugs 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229940014772 dimethyl sebacate Drugs 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- VJHINFRRDQUWOJ-UHFFFAOYSA-N dioctyl sebacate Chemical compound CCCCC(CC)COC(=O)CCCCCCCCC(=O)OCC(CC)CCCC VJHINFRRDQUWOJ-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 description 1
- SRVXDMYFQIODQI-UHFFFAOYSA-K gallium(iii) bromide Chemical compound Br[Ga](Br)Br SRVXDMYFQIODQI-UHFFFAOYSA-K 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- KETWBQOXTBGBBN-UHFFFAOYSA-N hex-1-enylbenzene Chemical compound CCCCC=CC1=CC=CC=C1 KETWBQOXTBGBBN-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
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- 150000002576 ketones Chemical class 0.000 description 1
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- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
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- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- BQJCRHHNABKAKU-KBQPJGBKSA-N morphine Chemical compound O([C@H]1[C@H](C=C[C@H]23)O)C4=C5[C@@]12CCN(C)[C@@H]3CC5=CC=C4O BQJCRHHNABKAKU-KBQPJGBKSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- ZCYXXKJEDCHMGH-UHFFFAOYSA-N nonane Chemical compound CCCC[CH]CCCC ZCYXXKJEDCHMGH-UHFFFAOYSA-N 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N normal nonane Natural products CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- RCALDWJXTVCBAZ-UHFFFAOYSA-N oct-1-enylbenzene Chemical compound CCCCCCC=CC1=CC=CC=C1 RCALDWJXTVCBAZ-UHFFFAOYSA-N 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical compound [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- KHMYONNPZWOTKW-UHFFFAOYSA-N pent-1-enylbenzene Chemical compound CCCC=CC1=CC=CC=C1 KHMYONNPZWOTKW-UHFFFAOYSA-N 0.000 description 1
- RPESBQCJGHJMTK-UHFFFAOYSA-I pentachlorovanadium Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[V+5] RPESBQCJGHJMTK-UHFFFAOYSA-I 0.000 description 1
- 229940059574 pentaerithrityl Drugs 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- XZUHEZIGAZNGJR-UHFFFAOYSA-N phenol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC1=CC=CC=C1.OC1=CC=CC=C1 XZUHEZIGAZNGJR-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920003050 poly-cycloolefin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229940116351 sebacate Drugs 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- 150000003329 sebacic acid derivatives Chemical class 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- PUGUQINMNYINPK-UHFFFAOYSA-N tert-butyl 4-(2-chloroacetyl)piperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(C(=O)CCl)CC1 PUGUQINMNYINPK-UHFFFAOYSA-N 0.000 description 1
- VJHDVMPJLLGYBL-UHFFFAOYSA-N tetrabromogermane Chemical compound Br[Ge](Br)(Br)Br VJHDVMPJLLGYBL-UHFFFAOYSA-N 0.000 description 1
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- YOUIDGQAIILFBW-UHFFFAOYSA-J tetrachlorotungsten Chemical compound Cl[W](Cl)(Cl)Cl YOUIDGQAIILFBW-UHFFFAOYSA-J 0.000 description 1
- CUDGTZJYMWAJFV-UHFFFAOYSA-N tetraiodogermane Chemical compound I[Ge](I)(I)I CUDGTZJYMWAJFV-UHFFFAOYSA-N 0.000 description 1
- BOUDEKXATYHWHY-UHFFFAOYSA-K thallium(3+);trifluoride Chemical compound F[Tl](F)F BOUDEKXATYHWHY-UHFFFAOYSA-K 0.000 description 1
- CULOEOTWMUCRSJ-UHFFFAOYSA-M thallium(i) fluoride Chemical compound [Tl]F CULOEOTWMUCRSJ-UHFFFAOYSA-M 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical class C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 1
- UBZYKBZMAMTNKW-UHFFFAOYSA-J titanium tetrabromide Chemical compound Br[Ti](Br)(Br)Br UBZYKBZMAMTNKW-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- KOECRLKKXSXCPB-UHFFFAOYSA-K triiodobismuthane Chemical compound I[Bi](I)I KOECRLKKXSXCPB-UHFFFAOYSA-K 0.000 description 1
- RMUKCGUDVKEQPL-UHFFFAOYSA-K triiodoindigane Chemical compound I[In](I)I RMUKCGUDVKEQPL-UHFFFAOYSA-K 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Definitions
- the present invention is rapidly photocured by active energy rays (visible laser, ultraviolet ray, electron beam, etc.), has excellent hologram properties such as diffraction efficiency and resolving power, and is excellent in transparency, heat resistance, etc.
- the present invention relates to a photosensitive phase composition for volume phase hologram recording suitable as a material for a volume phase hologram capable of forming a thick film, and an optical information recording medium using the same.
- holograms have been mainly used in the stereoscopic image display field / security field.
- wet type materials that required development such as silver salt photosensitive materials and dichromated gelatin, have been mainly used as hologram materials. After that, development processing is not required.
- Environmental 'Dry photopolymerization hologram recording materials with excellent light resistance have become mainstream.
- the recording mechanism of the photopolymerization type hologram recording material is generally considered as follows, unlike silver salt photosensitive material or dichromated gelatin.
- the recording material when the recording material is irradiated with interference fringes consisting of light interference with excellent coherence (coherence), the light part (light intensity is strong, area) and the dark part (light intensity is weak, area) ), Materials having different polymerization properties diffuse and move, and as the photopolymerization progresses, a refractive index modulation structure is formed, so that a holodalum is recorded.
- the polymerization forms of the photopolymerization type hologram recording material include 1) radical polymerization type, 2) cationic polymerization type, and 3) radical Z cationic polymerization combined type.
- the photosensitivity polymerization type material is general force sensitivity is high, there is a drawback that the shrinkage due to the polymerization form is as large as several percent.
- the only photosensitive resin composition that is commercially available among the photopolymerizable hologram recording materials is Omnidetas of DuPont.
- Holographic 'Data storage is not in-plane recording like CD and DVD, but volume recording, and page data is used for handling data, so a large amount of data that is not comparable to conventional CD and DVD Can be recorded.
- recording of 1TB (terabyte) is possible
- Patent Document 1 US Pat. No. 5,759,721
- Patent Document 2 U.S. Patent No. 6,784,300
- Patent Document 3 U.S. Pat.No. 3,993,485
- Patent Document 4 U.S. Pat.No. 6,124,076
- Patent Document 5 Japanese Unexamined Patent Publication No. 2000-086914
- Patent Document 6 JP-A-5-94014
- Patent Document 7 JP-A-9-106242
- Patent Document 8 Japanese Patent Application Laid-Open No. 2004-123873
- Patent Documents 6 and 7 describe photosensitive resin compositions for holograms that contain a radical polymerizable ethylene monomer, a photopolymerization initiator, and epoxy resin.
- a hologram is formed by utilizing the phenomenon that a radically polymerizable ethylene monomer having a bright interference fringe pattern is preferentially polymerized during hologram exposure by a laser and the ethylene monomer moves to a bright part. Yes.
- the epoxy resin is then cured.
- Patent Document 8 describes a soluble aromatic copolymer aromatic copolymer having a structural unit of a dibule aromatic compound and a structural unit of a monobull aromatic compound, but for holographic use. What are you teaching?
- the present invention has been accomplished in view of the above circumstances, and has good diffraction efficiency, resolving power, transparency, heat resistance, and the like required for volume phase holograms, and particularly excellent photosensitivity.
- An object of the present invention is to provide a resin composition for volume phase hologram recording and an optical information recording medium obtained from the composition cover.
- the hologram obtained by the present invention can be used for applications other than for holographic data storage, such as diffraction grating, interference filter, lens, head-up display, etc. Can do.
- the inventors of the present invention incorporated a soluble polyfunctional vinyl aromatic copolymer and a photo-radical polymerizable compound copolymerizable therewith into the composition to obtain a photosensitive property.
- the inventors have found that the shrinkage after curing can be further suppressed while further improving the properties, and the present invention has been completed.
- the present invention provides a soluble aromatic copolymer having a structural unit of divinyl aromatic compound and a structural unit of monovinyl aromatic compound, and containing 10 mol% or more of a structural unit represented by the following formula (al).
- a photosensitive resin composition for volume phase hologram recording comprising 5 to 60% by weight of a soluble aromatic copolymer (A), the photosensitive resin composition comprising (E) It is a thing.
- R 1 represents an aromatic hydrocarbon group having 6 to 30 carbon atoms.
- the present invention is also an optical information recording medium for volume phase hologram recording, wherein the recording layer comprising the photosensitive resin composition is formed on one support or between two supports. . Furthermore, the present invention is a volume phase hologram obtained by recording interference fringes formed by an energy line having excellent coherency on the optical information recording medium. More Further, the present invention is a method for producing a volume phase hologram, wherein the recording medium is exposed and recorded with interference fringes formed with an energy line force having excellent coherency.
- the photosensitive resin composition of the present invention is a resin composition for volume phase hologram recording that is used for recording interference fringes composed of light interference having excellent coherence as fringes having different refractive indexes.
- the soluble aromatic copolymer (A) is obtained by copolymerizing a divinyl aromatic compound and a monovinyl aromatic compound, and is a structural unit containing a reactive vinyl group in the side chain represented by the above formula (al). 10 mol% or more.
- the structural unit represented by the formula (al) is derived from a divinyl aromatic compound as a monomer.
- the average number of structural units represented by formula (al) is 3 or more per molecule.
- the soluble aromatic copolymer (A) is a known compound described in Patent Document 8, etc., and is preferably produced by the method described therein.
- dibule aromatic compound examples include m-dibutenebenzene, p-dibutenebenzene, 1,2-diisopropenenolebenzene, 1,3-diisopropenenolebenzene, 1,4-diisopropenenolebenzene.
- dibuyl aromatic compound examples include dibulubenzene (both m- and p-isomers), dibibibiol (in terms of cost and heat resistance of the obtained polymer). Each isomer) and divinylnaphthalene (including each isomer). More preferred is dibutenebenzene (both m and p isomers) and dibirubifur (including each isomer). In particular, divinylbenzene (both m- and p isomers) is most preferably used.
- Examples of the monobule aromatic compound include styrene, urnaphthalene, birbiphenyl and the like and derivatives thereof.
- Derivatives include compounds in which an aromatic ring is substituted with a substituent such as an alkyl group, an alkoxy group, a halogen or a phenyl group, and the above substituent is substituted at the ⁇ -position or j8-position of the bur group.
- aromatic olefins such as indene and acenaphthylene and their derivatives can also be used as the monobule aromatic compound. These may be used alone or in combination of two or more.
- styrene derivative examples include methyl styrene, ethyl styrene, propyl styrene, butyl styrene, pentino styrene, hexyl styrene, cyclohexyl styrene, ethoxy styrene, propoxy styrene, butoxy styrene, pentoxy styrene, hex styrene.
- Cyclohexoxystyrene, phenoxystyrene, and the like can be used.
- These substituents can be substituted at the o, m, or p position with respect to the bull group, and if they can have a side chain, they should be linear or side chain alkyl groups or alkoxy groups. Can do.
- indene or a derivative thereof for example, indene, an alkyl-substituted indene having 1 to 6 carbon atoms, an alkoxy substituted indene having 1 to 6 carbon atoms, or the like can be used.
- examples of the acenaphthylene or derivatives thereof include acenaphthylene, alkyl-substituted acenaphthylene having 1 to 6 carbon atoms, phenyl-substituted acenaphthylene, halogen-substituted acenaphthylene such as chlorine and bromine, and the like.
- the monobulu aromatic compound is not limited to these.
- a nuclear alkyl-substituted aromatic vinyl compound and an a-alkyl-substituted aromatic vinyl compound are preferable in that the amount of indane structure generated in the skeleton of the copolymer during polymerization is large.
- Preferred examples include ethyl benzene (both m and p isomers), ethyl bilbiphenyl (including isomers) and ethyl butyl naphthalene (each) in terms of cost and metathermal properties of the resulting polymer. Including isomers).
- the soluble aromatic copolymer (A) includes a divinyl aromatic compound as described above and a monovinyl aromatic compound. Force obtained by copolymerizing aromatic compounds Other monomers may be used if necessary. Examples of other monomers that can be used include tribyl aromatic compounds, gen compounds such as butadiene and isoprene, alkyl butyl ethers, isobutene, and diisoptylene. These other monomers are used in the range of less than 30 mole 0/0 of the total monomers.
- Jibyuru aromatic compound 20 moles of all monomers 0/0 or more preferably used such that 40 to 80 mole 0/0, monovinyl aromatic compounds 10 mole 0/0 or more of the total monomers, preferably It is used so that it may become 20-60 mol%.
- a preferred example of the polymerization method for producing the soluble aromatic copolymer (A) is the method described in Patent Document 8. For example, it is the following method.
- R 1 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms
- R 2 represents a p-valent aromatic hydrocarbon group or an aliphatic hydrocarbon group
- Z represents a halogen atom
- p represents an integer of 1 to 6. If there are a plurality of R 1 and Z in one molecule, they may be the same or different.
- the monomer component containing 20 to: LOO mol% of the dibule aromatic compound (a) is cationically polymerized at a temperature of 20 to 120 ° C. with an initiator represented by (good).
- organic solvent one or more organic solvents having a dielectric constant of 2 to 15 are preferable.
- the selected donor component be present in the group power of the compound and the sulfoxide compound having 2 or more carbon atoms.
- any compound that does not essentially inhibit cationic polymerization can be used without any particular limitation, and it can be used alone or in combination of two or more so that the dielectric constant falls within the range of 2 to 15. You can use it.
- Linear aliphatic hydrocarbons such as xane, heptane, octane, nonane, decane; 2-methylpropane, 2-methylbutane, 2, 3, 3-trimethylpentane, 2, 2, 5-trimethylhexane, etc.
- Branched aliphatic hydrocarbons; cyclo Hexane, methylcyclohexane, cycloaliphatic hydrocarbons cyclohexane and the like Echirushikuro; petroleum fractions may be mentioned water ⁇ made paraffin oil.
- dichloroethane, toluene, xylene, pentane, hexane, heptane, octane, 2-methylpropane, 2-methylbutane, methylcyclohexane and ethylcyclohexane are preferred.
- dichloroethane, toluene, xylene, n-hexane, cyclohexane, heptane, methylcyclohexane and ethylcyclohexane are more preferable.
- the amount of the organic solvent used is usually determined so that the concentration power of the polymer is from ⁇ 50 wt%, preferably from 5 to 35 wt% in consideration of the viscosity of the polymer solution obtained and ease of heat removal.
- The If the dielectric constant is less than 2, the polymerization activity will be low. If the dielectric constant is more than 15, it is not preferred because gelling is likely to occur during polymerization.
- the initiator represented by the general formula (1) is used in an amount of 0.001 to 100 mol, preferably 0.3 to 50 times mol of the rosic acid catalyst and 1 mol of the donor component to 1 mol of the initiator. It is also preferred to use in the range of 001 to 10 mol and polymerize in an organic solvent that dissolves the soluble aromatic copolymer.
- Lewis acid catalyst used as a polymerization catalyst examples include boron bromide (III), sodium chloride boron ( ⁇ ), aluminum bromide (III), aluminum fluoride (III), aluminum chloride (III) Aluminum iodide (III), Gallium bromide (III), Gallium chloride (III), Indium odor (III), Indium chloride (III), Indium fluoride (III), Indium iodide (III), Odor Thallium (III) fluoride, thallium fluoride (III), bromide (IV), chloride (IV), fluoride (IV), iodide (IV), germanium bromide (IV) , Germanium chloride (IV), germanium iodide (IV), Tin bromide (IV), tin chloride (IV), tin fluoride (IV), tin iodide (IV), lead fluoride (IV), antimony bromide (III), antimony chloride (III), antimony chloride ( V), antimony fluoride (III), anti
- Gold such as Et, tungsten chloride (VI), vanadium chloride (V), salt iron (III), zinc bromide (II)
- Organometallic halides such as Et A1C1 and EtAlCl
- the above catalysts are not particularly limited, and can be used alone or in combination of two or more.
- boron bromide (111), boron chloride (111), tin chloride (IV), tin bromide (IV), tin chloride (IV), tin fluoride (IV), tin iodide (IV) and antimony chloride (V) are preferable in terms of control of the branched structure and polymerization activity. More preferred are sodium chloride (boron) and tin (IV) chloride, and particularly preferred is tin (IV) chloride.
- the initiator represented by the general formula (1) includes (1 chloro 1-methylethyl) benzene,
- the polymerization for producing the soluble aromatic copolymer (A) is carried out in a temperature range of 20 to 100 ° C. If the polymerization reaction is carried out at less than 20 ° C, the heat resistance of the produced copolymer will be low, so this is not preferred.If it exceeds 100 ° C, the reaction rate will be too high, and it will be difficult to control the reaction. This is not preferable because an insoluble gel is easily generated.
- the method for recovering the copolymer after the termination of the polymerization reaction is not particularly limited. For example, a commonly used method such as a steam stripping method or precipitation with a poor solvent may be used.
- the soluble aromatic polymer (A) is represented by the following formula (a2):
- R 4 represents an aromatic hydrocarbon group having 6 to 30 carbon atoms.
- R 4 represents an aromatic hydrocarbon group having 6 to 30 carbon atoms.
- It is preferably represented by the formula (al) having a structural unit derived from a monobut aromatic compound represented by
- the existing molar ratio (al) Z [(al) + (a2)] of the structural unit represented by formula (a2) is 0.1 or more.
- it is 0.3 or more, particularly preferably 0.5 or more. If it is less than 1, the recorded hologram disappears with time.
- the soluble aromatic polymer (A) has the following general formula (2) in its main chain skeleton.
- Y represents a saturated or unsaturated aliphatic hydrocarbon group, an aromatic hydrocarbon group or an aromatic ring or a substituted aromatic ring fused to a benzene ring
- n is an integer of 0 to 4.
- the indane structure is produced under the production conditions such as a specific solvent, catalyst, and temperature when the copolymer (A) is produced by the production method described above, so that the active point of the growing polymer chain end is divinyl aromatic It is produced by attacking the aromatic ring of a structural unit derived from a compound and a monovinyl aromatic compound.
- the indane structure is preferably present in an amount of 0.01 mol% or more based on the structural units of all monomers. More preferably, it is 0.1 mol% or more, and further preferably 1 mol% or more. Especially preferably, it is 3 mol% or more. Most preferably, it is 5 mol% or more.
- the above indane structure is contained in the main chain skeleton of the polyfunctional vinyl aromatic copolymer of the present invention. If there is no structure, it is preferable because heat resistance and solubility in a solvent are insufficient.
- the number average molecular weight of the soluble aromatic copolymer (A) (in terms of standard polystyrene obtained using gel permeation chromatography, hereinafter referred to as Mn) is preferably 400 to 30,000. More preferably, it is 400 to 10000, more preferably 500 to 5000. If the ⁇ force is less than 400, the viscosity of the copolymer ( ⁇ ) is too low and the processability is not good. Further, it is not preferable that ⁇ is 30000 or more because rapid mass transfer during hologram recording is inhibited.
- the value of the soluble aromatic copolymer (IV) molecular weight distribution should be 10 or less. If MwZMn exceeds 10, the processing characteristics of the soluble polyfunctional vinyl aromatic copolymer deteriorate, and the gel is generated.
- the soluble aromatic copolymer (A) has polymerizability because it has a structural unit represented by the formula (al) having an unsaturated bond. And since it is soluble in toluene, xylene, tetrahydrofuran, dichloroethane or chloroform, it can move so as to eliminate the concentration gradient when a specific part is polymerized as a composition.
- the photoradically polymerizable compound (B) used in the present invention is compatible with the soluble aromatic copolymer (A) and the polymer binder (D) or plasticizer (E) described later. Those which are polymerized by active radical species generated from a radical polymerization initiator are preferred.
- a monomer having at least one polymerizable functional group such as a (meth) atalyloyl group, a vinyl group or an aryl group in the molecule can be preferably used.
- the photoradical polymerizable compound (B) two or more types of photoradically polymerizable compounds having different polymerizability and refractive index may be used.
- the components that are polymerized first (in the bright part of the interference light) when irradiated with light are mainly the photo-radical polymerizable compound (B) and the soluble aromatic copolymer (A).
- the cured product produced at this time is mainly a polymer of the soluble aromatic copolymer (A) and a copolymer of the photoradical polymerizable compound (B) and the soluble aromatic copolymer (A). Presumed to be a component.
- recording can be performed for a moment.
- the copolymer (A) reacts with the photo-radically polymerizable compound (B) to play a role in fixing the recording. Therefore, the refractive index difference is considered to occur between the following components.
- the bright part is a cured product of the soluble aromatic copolymer (A) and the photoradically polymerizable compound (B).
- the dark part the polymer binder (D), the plasticizer (E) or both are concentrated (non-cured product concentrated phase) in the dark part, resulting in a difference in refractive index.
- the polymer of the photoradically polymerizable compound (B2) and the polymer binder (D), plasticizer (E) or both are concentrated (dark cured product and non-cured product concentrated phase), and the refractive index difference Occurs. Therefore, in the case of 1), the refractive index of the cured product concentrated phase and the non-cured product concentrated phase must be different from each other by a certain value or more. In the case of 2), the refractive index of the cured product concentrated phase must be different from the dark cured product and the non-cured product concentrated phase by a certain value or more.
- the refractive index is adjusted by selecting the type and amount of the photoradical polymerizable compound (B), the polymer binder (D), and the plasticizer (E).
- photoradical polymerizable compounds (B) include methyl (meth) acrylate, butyl (meth) acrylate, 2-ethyl hexyl (meth) acrylate, lauryl (meth) acrylate, ethyl carbitol (meth) Atarylate phenoloxyl (meth) acrylate, nourphenoxy acetyl (meth) acrylate, dicyclopentyl (meth) acrylate, isobornyl (meth) acrylate, tribromobenzyl (meth) acrylate Monofunctional (meth) atalylates such as methacryloyl morpholine; (meth) Atalyloxypropyltris (methoxy) silane and other alkenyl-containing (meth) acrylates; bisphenol F, bisphenol A, hydrogenated Di (meth) atalylates of bisphenol compound alkylene oxide adducts such as bisphenol A; Multifunctional (meth)
- Atarylates N, N-dimethylacrylamide, N, N-jetylacrylamide and other acrylamides; Monofunctional bur compounds such as benzene, dibutenebenzene, urnaphtholene, vinylenobiphenol, vinylene butylene, styrene, p-chlorostyrene, N-butylcarbazole, N-binolepyrrolidone, N-bilucaprolatatam; Allyl group-containing compounds such as arylidene pentaerythritol, diallyl phthalate, diallyl isophthalate, ethylene glycol diallyl carbonate, trimellitic acid triallyl ester, triallyl (iso) cyanurate Or urethane (meth) acrylates, polyurethane (meth) acrylates, thiourethane acrylates, polythiourethane acrylates, ester acrylates, polyester (meth) acrylates, poly Ether (me
- the photo-radically polymerizable compound (B) is blended in the composition and polymerized and cured when irradiated with light, but a part thereof is copolymerized and cured with the soluble aromatic copolymer (A). To do.
- Photoinitiator systems (C) include He—Ne laser (633 nm), Ar laser (515, 488 ⁇ m), YAG laser (532 nm), He—Cd laser (442 nm), or blue DPSS laser (405 nm).
- a radical is generated by absorbing visible light laser light such as the soluble aromatic copolymer (A) whose active radical species is an essential component of the present invention and the photoradical polymerization property.
- Any initiator system for polymerizing the compound (B) may be used.
- a dye sensitizer can be added for the purpose of further increasing the sensitivity at each laser light wavelength.
- photopolymerization initiators examples include 2,2 diethoxyacetophenone, 2,2 diethoxy-2 phenolacetophenone, benzophenone, 1- (4-isopropylphenol) 2-hydroxy 2-methylpropane 1-one, 2-hydroxy-2-methyl 1-phenol propane 1-one, benzoin ethyl ether, benzoin isobutyl ether, benzoin isopropyl ether, 1-hydroxy monocyclohexyl monophenyl ketone, 2, 2-dimethoxy-1,2-diphenylethane 1-one, 1-hydroxy-1-cyclohexyl roof-eluketone, 2-hydroxy-1-2-methyl-1-phenol-propane 1-one, 1- (4 hydroxyethoxy ) 1-Frue 2 Hydroxy 1-Methyl 1-Propanone 1-on, 2-Methyl- 1 1 (4 (Methylthio) phenol) 2 Morpho Nopropan 1-one, 2-benzyl 1 2-dimethylamino 1- (4-morpholinophenol) Butan
- radical photopolymerization initiators examples include Irgacurel 84, 369, 500, 651, 819, 907, 784, 2959, Darocurll l6, 1173 (above, manufactured by Chinoku 'Specialty' Chemicals). It is done.
- a thermal polymerization initiator may be used in combination with the photopolymerization initiator.
- the thermal polymerization initiator to be used in combination include 2, 2′-azobis (2-methyl petit-tolyl), 2, 2, azobisisobutyronitrile, 2, 2, azobisisovaleroni. Tolyl, 2,2, -azobis (2,4 dimethylvale-tolyl), 1,1,1azobis (cyclohexane-1-1-carbotri) ), Methyl ethyl ketone peroxide, methyl isobutyl ketone peroxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, and the like.
- the amount of these initiators to be added varies depending on the type of initiator, the type of compound to be blended, and the composition ratio, and thus cannot be determined unconditionally, but is 0.05 to 30 with respect to the total amount of the photosensitive resin composition.
- a weight% range is preferred. Particularly preferred is the range of 0.1 to 8% by weight. If it is less than 0.05% by weight, the curability is inferior and unreacted substances remain, resulting in poor recording stability. On the other hand, if it exceeds 30% by weight, the degree of polymerization becomes low, the cured product becomes too soft, and in some cases the transparency is lowered, which is not preferable.
- the content is 1 to 8% by weight, a photosensitive resin composition having particularly good curability and good holographic properties can be provided.
- any dye sensitizer that absorbs light in the visible region may be used.
- Xanthene dye, cyanine dye, merocyanine dye, skrillium examples include known compounds such as dyes based on dyes, thiopyrylium salt dyes, quinoline dyes, (base) styryl dyes, (keto) coumarin dyes, rhodocyanine dyes, porphyrin dyes, and oxazine dyes. These may be used alone or in combination of two or more.
- the polymer binder (D) can be used for the purpose of, for example, improving the film formability and film strength which can handle thick films, or improving the environmental resistance after hologram recording.
- the polymer binder (D) used for this purpose is preferably one having high transparency and high compatibility with the soluble aromatic copolymer (A).
- polystyrene and its derivatives methyl methacrylate-styrene copolymer (MS resin), styrene-atari mouth-tolyl copolymer (AS, SAN resin), poly (4-methylpentene-1) (TPX Resin), polycycloolefin (COP resin), polydiethylene glycol bisvalyl carbonate (EGAC resin), polythiourethane (PTU resin), polymethyl vinyl ether (PMVE resin), polysulfone resin, polyacetic acid bur , Polybulal alcohol, polypyrrole pyrrolidone, acetylcellulose and the like.
- the polymer binder (D) may have a reactive group such as a cation polymerizable group in its side chain or main chain. One or more of these can be blended.
- a plasticizer (E) can be used as a compound that improves the mass transfer or the compatibility of the photosensitive resin composition.
- the plasticizer (E) those that are highly compatible with the aromatic copolymer (A) and the photo-radical polymerizable compound (B), and those that are liquid to facilitate mass transfer during recording are preferably used. To be elected.
- sebacic acid esters such as dimethyl sebacate, jetyl sebacate, dibutyl sebacate, bis (2-ethylhexyl) sebacate; dimethyl adipate, jetyl adipate, dibutyl adipate, bis (2-ethylhexyl) adipate, etc.
- Adipic acid esters such as dimethyl phthalate, jetyl phthalate, dibutyl phthalate, bis (2-ethylhexyl) phthalate, diisodecyl phthalate; trimethyl phosphate, triethyl phosphate, tributyl phosphate, Known plasticizers (E) such as (2-ethyl hexyl) phosphate, triphenyl phosphate, cresyl diphenyl phosphate, tricresyl phosphate, and other normal phosphate esters can be used. These can be used in more than one kind.
- a thermal polymerization inhibitor e.g., a thermal polymerization inhibitor, a chain transfer agent, an antioxidant, a silane coupling agent, a coating surface improver, a surface conditioner, a plasticizer, an antifoaming agent, a surfactant, a coloring agent.
- Agents, storage stabilizers, UV absorbers, thickeners and other known additives (F) can also be added.
- the solvent (G) may be used to dissolve or disperse the resin composition.
- it can.
- ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone
- esters such as ethyl acetate and butyl acetate
- petroleum solvents such as toluene and xylene
- methyl cetosolve, ethinoreceroso Cellosolves such as noreb and butylcetosolve
- alcohols such as ethanol, methanol, isopropanol and butanol
- ethers such as tetrahydrofuran and dioxane
- halogenated hydrocarbons such as dichloromethane and chloroform.
- the amount of the solvent is preferably not more than 100 parts by weight, more preferably not more than 200 parts by weight per 100 parts by weight of the solid resin component.
- the boiling point is preferably 100 ° C or lower.
- the solvent (G) is a component for dissolving or dispersing the resin composition, and is excluded in the calculation of the content of each component other than the constituent components of the resin composition in the present invention.
- the components used as essential components in the composition of the present invention are (A) to (C) and (D) or (E However, it is preferable to use both (D) and (E). Further, in the description of the above component and other components (F), etc., and the solvent (G), these are not limited to those exemplified.
- each component is preferably blended in the following proportions with respect to the total weight of the composition (excluding the solvent).
- the photopolymerization initiator (C) is 0.05 to 30% by weight, preferably 1 to 10% by weight (when a dye sensitizer is combined, the dye sensitizer is 0.01 to 10% by weight, The total amount with the polymerization initiator does not exceed 30% by weight)
- polymer binder (D) 0-50% by weight of polymer binder (D), preferably 10-40% by weight
- plasticizer (E) preferably 10 to 35% by weight
- the photosensitive resin composition of the present invention and the hologram recording medium can be produced by using a known photosensitive coating composition such as a spin coater, roll coater, bar coater and the like in a liquid form.
- a photosensitive coating composition such as a spin coater, roll coater, bar coater and the like in a liquid form.
- Coated on a substrate such as a glass plate, polycarbonate plate, polymethylmetatalylate plate, polyester film, etc., with a dry film thickness of 1 to: LOOO / zm, and if necessary, for hologram recording through a drying process
- a method for producing a medium is suitable.
- a protective layer may be provided as an oxygen barrier film on the photosensitive resin assembly layer.
- the protective layer for example, a film equivalent to the above-mentioned substrate, a film such as polyolefin, polyvinyl chloride, polyvinyl chloride, polyvinyl alcohol, polyethylene terephthalate, glass, or the like can be used.
- a film such as polyolefin, polyvinyl chloride, polyvinyl chloride, polyvinyl alcohol, polyethylene terephthalate, glass, or the like can be used.
- the photosensitive solution it may be diluted with an appropriate solvent as necessary. In that case, drying is required after coating on the substrate.
- the recording layer produced as described above can be subjected to interference exposure by a conventionally known method to form a volume phase hologram.
- laser light is coherence
- Interference fringes are recorded by two-beam interference fringe exposure by a normal holographic exposure apparatus using light having excellent properties (coherence) (for example, light having a wavelength of 300 to 1200 nm).
- the diffracted light by the recorded interference fringes is obtained and can be made into a hologram.
- Light sources suitable for the hologram recording material of the present invention include He—Ne laser (633 nm), Ar laser (515, 488 nm), YAG laser (532 nm), He Cd laser (442 nm), or blue DPSS laser (405 nm).
- Etc. are available.
- the entire surface of the optical recording composition film is irradiated with ultraviolet rays (UV) by a xenon lamp, a mercury lamp, a metal nitride lamp, or the like, or heat of about 60 ° C. is applied to the optical recording composition film. Remaining the reaction, the polymerization of the partially radical polymerizable compound and the phase separation accompanying the mass transfer are promoted, and a hologram with more excellent hologram characteristics can be obtained.
- UV ultraviolet rays
- DVB570 Mixed monomer with a component ratio of DVB and ethyl benzene of 57:43 (manufactured by Shinsetsu Chemical Co., Ltd.)
- S2EG Bis (2-metatalyloylthioethyl) sulfide (manufactured by Sumitomo Seiyaku),
- TCP tricresyl phosphate (manufactured by Shin Nippon Chemical Co., Ltd.)
- MS 600 Methylol methacrylate-styrene (60:40) copolymer.
- the diffraction efficiency of the transmission hologram was calculated by the following equation using the value obtained by reading the diffracted light from a linearly polarized He-Ne laser (632.8) with an optical power meter.
- Diffraction efficiency (%) (Diffraction light intensity Z Incident light intensity) X 100
- the curing shrinkage ratio of the photosensitive resin composition can be calculated by the following equation by measuring the density of the resin composition before and after curing. A spot UV irradiation device was used as the light source, and 6 mW / cm 2 of UV was irradiated to the sample with a thickness of 50 / zm in the air.
- Curing shrinkage (%) (1 liquid density / film density) X 100
- Dichloromethane 50 g of copolymer obtained in Synthesis Example 1: 10 g, TCP: 15 g, MS—200: 20 g, S2EG: 15 g, 1-hydroxycyclohexyl phenol ketone (Irgacurel 84, Ciba Specialty Chemicals Co., Ltd.) )): 0. lg, 3 ethyl 5 — [(3 ethyl 2 (3H) —benzothiazolidylidene) ethylidene] 2 thixo 4 oxazolidinone (NK-1473, manufactured by Hayashibara Biochemical Research Institute): 0. Olg was dissolved to obtain a photosensitive solution.
- a photosensitive resin composition solution was prepared in the same manner as in Example 1 except that the composition was as shown in Table 1. From this, an optical information recording medium was obtained, and a hologram was recorded and evaluated.
- a soluble polyfunctional vinyl aromatic copolymer in the photosensitive resin composition not only the transparency, but also the volume phase type excellent in sensitivity, low curing shrinkage, and transparency.
- a hologram recording material, a volume phase hologram recording medium, and a volume phase hologram can be provided.
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Abstract
Description
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CN2006800074140A CN101137940B (zh) | 2005-03-08 | 2006-03-01 | 体相位全息图记录用感光性树脂组合物和使用了其的光信息记录介质 |
JP2007507056A JP4745333B2 (ja) | 2005-03-08 | 2006-03-01 | 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体 |
US11/885,787 US8034514B2 (en) | 2005-03-08 | 2006-03-01 | Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same |
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Also Published As
Publication number | Publication date |
---|---|
CN101137940A (zh) | 2008-03-05 |
KR101024744B1 (ko) | 2011-03-25 |
KR20070108947A (ko) | 2007-11-13 |
TWI401532B (zh) | 2013-07-11 |
CN101137940B (zh) | 2010-08-25 |
JPWO2006095610A1 (ja) | 2008-08-14 |
TW200702915A (en) | 2007-01-16 |
JP4745333B2 (ja) | 2011-08-10 |
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