WO2006069755A3 - Objektivmodul mit wenigstens einem austauschbaren optischen element - Google Patents

Objektivmodul mit wenigstens einem austauschbaren optischen element Download PDF

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Publication number
WO2006069755A3
WO2006069755A3 PCT/EP2005/013990 EP2005013990W WO2006069755A3 WO 2006069755 A3 WO2006069755 A3 WO 2006069755A3 EP 2005013990 W EP2005013990 W EP 2005013990W WO 2006069755 A3 WO2006069755 A3 WO 2006069755A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
replaceable optical
lens module
replaceable
lens
Prior art date
Application number
PCT/EP2005/013990
Other languages
English (en)
French (fr)
Other versions
WO2006069755A2 (de
Inventor
Guido Soyez
Stephan Back
Joachim Buechele
Julian Kaller
Guido Limbach
Harald Woelfle
Original Assignee
Zeiss Carl Smt Ag
Guido Soyez
Stephan Back
Joachim Buechele
Julian Kaller
Guido Limbach
Harald Woelfle
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Guido Soyez, Stephan Back, Joachim Buechele, Julian Kaller, Guido Limbach, Harald Woelfle filed Critical Zeiss Carl Smt Ag
Priority to US11/722,595 priority Critical patent/US8092029B2/en
Priority to JP2007547388A priority patent/JP5022912B2/ja
Priority to KR1020077016610A priority patent/KR101252312B1/ko
Publication of WO2006069755A2 publication Critical patent/WO2006069755A2/de
Publication of WO2006069755A3 publication Critical patent/WO2006069755A3/de
Priority to US13/346,430 priority patent/US8376559B2/en
Priority to US13/766,174 priority patent/US8939587B2/en
Priority to US14/605,232 priority patent/US9423695B2/en
Priority to US15/243,397 priority patent/US9703098B2/en
Priority to US15/647,254 priority patent/US20180031827A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/14—Mountings, adjusting means, or light-tight connections, for optical elements for lenses adapted to interchange lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Abstract

In einem Objektivmodul (7), insbesondere einem Projektionsobjektiv für die Halbleiter-Lithographie, ist wenigstens ein in einem Objektivgehäuse (12) angeordnetes austauschbares optisches Element (9) vorgesehen. Wenigstens eine Gasaustauscheinrichtung (15) ist in einem Bereich des austauschbaren optischen Elements (9) derart angeordnet, dass während des Austauschs des optischen Elements (9) ein Aufnahmebereich (10') für das austauschbare optische Element (9) spülbar ist.
PCT/EP2005/013990 2004-12-23 2005-12-23 Objektivmodul mit wenigstens einem austauschbaren optischen element WO2006069755A2 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
US11/722,595 US8092029B2 (en) 2004-12-23 2005-12-23 Lens module comprising at least one exchangeable optical element
JP2007547388A JP5022912B2 (ja) 2004-12-23 2005-12-23 少なくとも１つの交換可能な光学素子を備えるレンズモジュール
KR1020077016610A KR101252312B1 (ko) 2004-12-23 2005-12-23 적어도 하나의 교체 가능한 광학 요소를 포함하는 대물렌즈모듈
US13/346,430 US8376559B2 (en) 2004-12-23 2012-01-09 Lens module comprising at least one exchangeable optical element
US13/766,174 US8939587B2 (en) 2004-12-23 2013-02-13 Lens module comprising at least one exchangeable optical element
US14/605,232 US9423695B2 (en) 2004-12-23 2015-01-26 Lens module comprising at least one exchangeable optical element
US15/243,397 US9703098B2 (en) 2004-12-23 2016-08-22 Lens module comprising at least one exchangeable optical element
US15/647,254 US20180031827A1 (en) 2004-12-23 2017-07-11 Lens module comprising at least one exchangeable optical element

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63968404P 2004-12-23 2004-12-23
US60/639,684 2004-12-23

Related Child Applications (3)

Application Number Title Priority Date Filing Date
US11/722,595 A-371-Of-International US8092029B2 (en) 2004-12-23 2005-12-23 Lens module comprising at least one exchangeable optical element
US72259508A Continuation 2004-12-23 2008-02-28
US13/346,430 Continuation US8376559B2 (en) 2004-12-23 2012-01-09 Lens module comprising at least one exchangeable optical element

Publications (2)

Publication Number Publication Date
WO2006069755A2 WO2006069755A2 (de) 2006-07-06
WO2006069755A3 true WO2006069755A3 (de) 2006-10-05

Family

ID=35809556

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/013990 WO2006069755A2 (de) 2004-12-23 2005-12-23 Objektivmodul mit wenigstens einem austauschbaren optischen element

Country Status (4)

Country Link
US (6) US8092029B2 (de)
JP (1) JP5022912B2 (de)
KR (1) KR101252312B1 (de)
WO (1) WO2006069755A2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7724351B2 (en) 2006-01-30 2010-05-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and exchangeable optical element
DE102006050835A1 (de) * 2006-10-27 2008-05-08 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum Austausch von Objetkivteilen
DE102008028415A1 (de) 2007-06-22 2008-12-24 Carl Zeiss Smt Ag Optische Baugruppe, Projektionsbelichtungsanlage für die Halbleiterlithographie und Projektionsobjektiv
NL2008184A (en) 2011-02-28 2012-08-29 Asml Netherlands Bv Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method.
KR101986341B1 (ko) * 2012-03-30 2019-06-07 삼성전자주식회사 양방향 카메라 모듈 및 그를 구비한 플립 칩 본딩 장치
CN109283797B (zh) * 2017-07-21 2021-04-30 上海微电子装备（集团）股份有限公司 物镜保护装置、物镜系统以及光刻设备
CN115327780A (zh) 2017-09-11 2022-11-11 杜比实验室特许公司 用于ar/vr/mr的模块化拆卸式可穿戴装置
DE102021205985A1 (de) 2021-06-11 2022-12-15 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Regenerieren eines gasbindenden Bauteils

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010026355A1 (en) * 2000-03-30 2001-10-04 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2001073825A1 (fr) * 2000-03-29 2001-10-04 Nikon Corporation Dispositif d'alignement, appareil et procede servant a transferer une tranche, puce et son procede de fabrication
DE10121346A1 (de) * 2001-05-02 2002-11-07 Zeiss Carl Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie
JP2004071663A (ja) * 2002-08-02 2004-03-04 Canon Inc 露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19830438A1 (de) * 1998-07-08 2000-01-13 Zeiss Carl Fa Verfahren zur Dekontamination von Mikrolithographie-Projektionsbelichtungsanlagen
DE10253162B4 (de) * 2002-11-14 2005-11-03 Infineon Technologies Ag Verfahren zum Spülen einer optischen Linse
US7136142B2 (en) * 2004-05-25 2006-11-14 Asml Netherlands B.V. Lithographic apparatus having a gas flushing device
US7446849B2 (en) * 2004-07-22 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001073825A1 (fr) * 2000-03-29 2001-10-04 Nikon Corporation Dispositif d'alignement, appareil et procede servant a transferer une tranche, puce et son procede de fabrication
US20010026355A1 (en) * 2000-03-30 2001-10-04 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
DE10121346A1 (de) * 2001-05-02 2002-11-07 Zeiss Carl Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie
JP2004071663A (ja) * 2002-08-02 2004-03-04 Canon Inc 露光装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 12 5 December 2003 (2003-12-05) *

Also Published As

Publication number Publication date
US8092029B2 (en) 2012-01-10
US20080137192A1 (en) 2008-06-12
KR20070087667A (ko) 2007-08-28
JP5022912B2 (ja) 2012-09-12
WO2006069755A2 (de) 2006-07-06
US20180031827A1 (en) 2018-02-01
US20120105958A1 (en) 2012-05-03
US20160357012A1 (en) 2016-12-08
KR101252312B1 (ko) 2013-04-08
US9423695B2 (en) 2016-08-23
US20130155509A1 (en) 2013-06-20
US8376559B2 (en) 2013-02-19
US8939587B2 (en) 2015-01-27
JP2008526004A (ja) 2008-07-17
US20150138521A1 (en) 2015-05-21
US9703098B2 (en) 2017-07-11

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