WO2006064934A1 - 電界電子放出素子とその製造方法及びこの素子を使用した電子放出方法、並びに、電界電子放出素子を使用した発光・表示デバイスとその製造方法 - Google Patents
電界電子放出素子とその製造方法及びこの素子を使用した電子放出方法、並びに、電界電子放出素子を使用した発光・表示デバイスとその製造方法 Download PDFInfo
- Publication number
- WO2006064934A1 WO2006064934A1 PCT/JP2005/023203 JP2005023203W WO2006064934A1 WO 2006064934 A1 WO2006064934 A1 WO 2006064934A1 JP 2005023203 W JP2005023203 W JP 2005023203W WO 2006064934 A1 WO2006064934 A1 WO 2006064934A1
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- WIPO (PCT)
- Prior art keywords
- electron emission
- field electron
- display device
- gas
- cold cathode
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
- H01J1/3042—Field-emissive cathodes microengineered, e.g. Spindt-type
- H01J1/3044—Point emitters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
- H01J2201/30446—Field emission cathodes characterised by the emitter material
Definitions
- the present invention is represented by the general formula BN, and is made of a material containing sp 3 bond, sp 2 bond, or a mixture thereof, and has a surface shape with excellent field electron emission characteristics.
- Field electron emission in the atmosphere The present invention relates to an operable field electron emission device, a manufacturing method thereof, a field electron emission method using the device, a light emitting / display device using the field electron emission device, and a manufacturing method thereof.
- the present invention relates to an unprecedented field electron emission characteristic (current density is conventional) with the purpose and application applied to the field of a lamp type light source device using a field emission electron source, a field emission type display, etc.
- the present invention relates to an electron-emitting member having the above-described unique configuration and a method for manufacturing the same.
- the present invention also relates to a light emitting / display device having a cold cathode type electron source for electron emission of fluorine nitride represented by the general formula BN and having at least sp 3 bonds.
- the electron source is a boron nitride electron source having a sharp shape with a sharp tip with excellent field electron emission properties, and thereby has a low electron emission threshold, a high output, and a long lifetime.
- the present invention relates to a light emitting / display device capable of realizing the above. Background art
- FED Field electron emission display
- S ED S ur f a c e—C o n d c c t i o n E l c ct ron—Em dt ter D i s p l a y
- boron nitride which has been used as a heat-resistant and wear-resistant material, and has recently been attracting attention as a new creation material.
- boron nitride manufactured under specific conditions exhibits a surface shape with excellent field-electron emission characteristics when formed into a film. It was found that the product was produced and had strong electric field strength.
- Patent Document 1 Japanese Laid-Open Patent Publication No. 2 0 4-3 5 3 0 1
- Patent Document 2 Japanese Patent Application No. 2 0 0 3 — 2 0 9 4 8 9 Disclosure of Invention
- the present invention is based on the invention according to the above-mentioned previous patent application, which is further developed, and is a field electron-emitting device that operates stably in the atmosphere, a manufacturing method thereof, and an electric field using the device.
- Providing a method for emitting electrons, and field electrons It is an object of the present invention to provide a light emitting / display device using a cold cathode electron source having a surface shape with excellent emission characteristics, a low electron emission threshold, a high output, and a long lifetime.
- sp 3 binding BN or this and sp 2 binding BN which is formed by the prior art, is formed in a self-formation by reaction from the gas phase, and is indicated by BN with a sharp tip.
- boron nitride has a specific physical surface state provided by the above-described prior art, and thereby exhibits a property of being excellent in electron emission performance.
- the present invention has been made on the basis of this finding, and the configuration thereof is as described in the following (1) to (2 2).
- a boron nitride material containing a BN crystal with a sharp tip is formed on the element substrate, and it exhibits stable electron emission in the atmosphere when a voltage is applied.
- a field electron emission device is formed on the element substrate, and it exhibits stable electron emission in the atmosphere when a voltage is applied.
- a boron nitride material containing a crystal represented by BN having a sharp shape at the tip is formed on the element substrate in a self-modeling manner at an interval and density suitable for electron emission.
- the boron nitride material containing a crystal represented by BN having a sharp tip is made of sp 3 -bonded BN or a mixture of sp 3 -bonded BN and sp 2 -bonded BN.
- a fluorine nitride material containing a crystal represented by BN having a pointed shape is excited by ultraviolet light and formed by a reaction from a gas phase. (1) to (3 The field electron-emitting device according to any one of 1).
- the boron nitride material including a crystal represented by BN having a sharp tip is formed of sp 3 -bonded BN, or a mixture of sp 3 -bonded BN and sp 2 -bonded BN.
- a boron nitride material containing a crystal of BN having a pointed shape formed on the element substrate is used as a field electron emission electron source necessary for exciting the phosphor to emit light.
- a cold cathode light-emitting display device is used.
- the field electron emission source is a crystal represented by BN having a pointed shape.
- the boron nitride material containing a crystal represented by BN having a sharp tip is made of sp 3 bonding BN or a mixture of sp 3 bonding BN and sp 2 bonding BN, (12) or (1) The cold cathode light emitting display device according to 3).
- a boron nitride material containing a crystal of BN having a sharp tip is excited by ultraviolet light and formed by a reaction from a gas phase.
- (1 2) to (14) The cold cathode light emitting / display device according to any one of the above.
- the field electron emission electron source is set in a container provided with a window, directly or opposed to and separated from the phosphor, and takes light emitted from the phosphor from the window.
- the cold cathode light emission display device according to any one of (1 2) to (15), which is configured to emit light.
- a method of manufacturing a cold cathode light emitting display device characterized by being assembled by assembly.
- the boron nitride material containing a crystal represented by BN having a sharp tip is made of sp 3 -bonded BN or a mixture of sp 3 -bonded BN and sp 2 -bonded BN.
- ultraviolet light irradiation is required in the reaction from the gas phase. This has already been clarified in the earlier patent application that becomes the invention of the present inventors. The reason for this can be considered as follows, which is mentioned in the previous patent application.
- the matter of “stablely emitting electron emission in the atmosphere” is limited to use conditions and usage modes of the field electron emission device of the present invention exclusively in the atmosphere. It is neither a meaning nor a regulation. The meaning and significance of these items are that conventional field emission devices are difficult to operate stably in the atmosphere, and are usually set to operate in a vacuum while holding the device in a vacuum vessel.
- the element of the present invention means that it has a performance that can be operated without being held in a vacuum vessel, and is limited to use in the atmosphere. Does not mean to do. That is, in addition to the mode of using in the atmosphere, the mode of setting the vacuum container and using it as well as the conventional mode is also included.
- the crystal indicated by BN with a sharp tip when the crystal indicated by BN with a sharp tip is formed on the element substrate, it has a sufficient function as an electron-emitting device, and the electron-emitting device has been established.
- the electron-emitting device are also included as electron-emitting devices.
- the element substrate on which the boron nitride material containing the crystal is formed is integrated with other means to form an element, and the element substrate is also included. Furthermore, these include those in a state where they are integrally attached to the container, and those in which the atmosphere and pressure in the container are adjusted, including those in the vacuum state.
- the present invention requires a special configuration which is expensive, and the present invention has a pointed shape generated by irradiating the substrate constituting the electronic member with ultraviolet light.
- the use of the above materials as an electron source in a cold cathode light emitting / display device is excellent in that it is easy to start as described above and can be designed to save energy, and the BN itself is stable. Because it is a simple compound, it does not deteriorate even when used for a long time and contributes significantly to extending the life of the device. Since it can be incorporated into the device as an electron emission emitter as it is, it is directly connected to the simplification of the structure and the manufacturing process in the device design, which is advantageous in terms of cost. Furthermore, Emmitta Since the thin film part including one is only a few to several tens of meters, it is expected to have a number of operational effects such as enabling ultra-thin device. Brief Description of Drawings
- FIG. 1 is a schematic diagram showing an outline of a reaction apparatus.
- Fig. 2 is a scanning electron microscope image showing that the BN crystal with a sharp tip produced in Example 1 is deposited in a suitable density and dispersion state against a thin film as a background, and exhibits a unique surface shape. .
- FIG. 3 is a diagram showing the field electron emission characteristics of the device obtained in Example 1 at 1 atmosphere in the atmosphere.
- FIG. 4 is a F ow l e r -No r d h im plot diagram of field electron emission characteristics in vacuum in Example 1.
- FIG. 5 is a diagram showing the field electron emission characteristics of the device fabricated in Example 2 at 1 atmosphere in the atmosphere.
- FIG. 6 is a graph showing the field electron emission characteristics of the device fabricated in Example 3 in the atmosphere (humidified atmosphere).
- FIG. 7 is a diagram showing the field electron emission characteristics of the device fabricated in Example 4 in the atmosphere (ethyl alcohol-added atmosphere).
- FIG. 8 (a) is a conceptual diagram showing the structure of the light emitting display device (phosphor; ⁇ ⁇ Zn powder) of Example 5.
- FIG. 8 (b) is a conceptual diagram showing the structure of the light-emitting / display device (phosphor; ZnO / Zn powder) of Example 6.
- FIG. 8 (c) is a conceptual diagram showing the structure of the light emitting / display device (RGB light emitting element) of Example 7.
- FIG. 8 (d) is a conceptual diagram showing the structure of the light emitting / display device (RGB light emitting element) of Example 8.
- FIG. 9 is a graph showing current-voltage characteristics of the device of Example 5.
- FIG. 10 is a Fow ler-No r dh eim plot of the data of FIG. (Explanation of symbols)
- Reaction vessel (reactor) 2. Gas inlet 3. Gas outlet
- a CVD reaction vessel having the structure shown in FIG. 1 can be used.
- a reaction vessel 1 includes a gas inlet 2 for introducing a reaction gas and its dilution gas, and a gas outlet 3 for exhausting the introduced reaction gas and the like out of the vessel.
- a boron nitride deposition substrate 4 is set in the gas flow path in the vessel, and an optical window 5 is attached to a part of the reaction vessel wall facing the substrate, through which ultraviolet light is applied to the substrate.
- the excimer ultraviolet laser device 6 is set so that is irradiated.
- the reaction gas introduced into the reaction vessel is excited by ultraviolet light irradiated on the surface of the substrate, and a nitrogen source and a boron source in the reaction gas react in a gas phase to form a substrate on the substrate constituting the electronic member.
- a nitrogen source and a boron source in the reaction gas react in a gas phase to form a substrate on the substrate constituting the electronic member.
- Represented by BN, sp 3 bond, or a mixture of this and sp 2 bond is formed and grows into a film.
- the pressure in the reaction vessel can be carried out in a wide range of 0.0 1 to 7 6 OT orr, and the temperature of the substrate installed in the reaction space is from room temperature to 1 300 ° C. However, in order to obtain the desired reaction product with high purity, the pressure is low and it is preferable to carry out the reaction at a high temperature.
- a plasma torch 7 shows this aspect.
- the reactive gas inlet and the plasma torch are integrally set toward the substrate so that the reactive gas and plasma are irradiated toward the substrate. ing.
- the product is taken out from the reaction apparatus together with the substrate, As an electron emitter, it can be used for light emitting and display devices.
- the invention of this application is carried out using the above reaction vessel, and will be further described based on the drawings and specific examples. However, the examples disclosed below are disclosed as an aid for easily understanding the present invention, and the present invention is not limited thereby.
- Toko filtration to aim of the present invention is excellent surface shape field electron emission characteristics, which are self-shaped formed, mainly an excellent sp 3 bonding boron nitride to the field electron emission characteristics, or
- the present invention provides a field electron emission device including a mixture with sp 2 bond and a method for manufacturing the same, and further provides an electron emission method using the device, as long as the object can be achieved. Needless to say, etc. can be changed and set as appropriate.
- the present invention also provides a cold cathode type light emitting / display display using an electron emission electron source made of a specific material, and the reaction conditions and the like are appropriately changed and set as long as the object can be achieved. Needless to say, you can.
- the target substance was obtained after a synthesis time of 60 minutes.
- the crystal system of this sample determined by the X-ray diffraction method is hexagonal, and it is a 5 H polymorphic structure with sp 3 bonds.
- the thin film has a unique surface shape covered with a conical protrusion structure with a sharp tip (length of several microns to several tens of micrometers) that is likely to cause electric field concentration. It was done.
- FIG. 4 shows a F o ler -No rd heim plot when the same experiment as above is performed in vacuum. This is l / V on the horizontal axis and L og [I / V "2] on the vertical axis (V is the device voltage, I is the current value), and the measurement point is on a straight line. It is understood that field electron emission due to dynamic tunneling occurs in vacuum Example 2;
- Example 2 The sample (thin film) obtained in Example 1 was coated with ZnO: Zn phosphor fine particles with a thickness of about 10 m, further separated from the surface by about 40 ⁇ , and ITO glass as the anode.
- Face-to-face field emission display F ED (F ie 1 d Em ission
- Example 4 The same experiment as in Example 2 was performed at 1 atm in air. However, here is sealed A sponge wetted with water was placed in the measurement chamber and adjusted so that the humidity of the air in the measurement chamber was close to 90%. The result is shown in FIG. It can be seen that the amount of electron emission and the current value increased by nearly 200 times as compared with Examples 1 and 2 by adjusting the humidity of the working atmosphere. Although the present inventors believe that this is due to a decrease in the electron emission threshold resulting from the formation of a surface electric dipole layer by surface adsorbed water, a detailed academic study awaits further research. However, as an empirical / experimental fact, the improvement of electron emission characteristics by adjusting humidity was established here. In addition, it was confirmed by a tester or the like that the insulation between the anode and the cathode was maintained in the above examples. Example 4;
- Example 7 The same experiment as in Example 2 was performed at 1 atm in air. However, a sponge wetted with ethyl alcohol or methyl alcohol was placed in a sealed measurement chamber, and the measurement chamber was filled with air containing alcohol. The results are shown in Fig. 7. It can be seen that the amount of electron emission and the current value increased by nearly 300 times compared to Examples 1 and 2 by adding alcohol in the working atmosphere. This is presumed to have led to an increase in electron emission characteristics due to a decrease in the electron emission threshold due to the formation of a surface electric dipole layer by surface adsorbed water.
- phosphor fine particles ZnO: Z powder
- Fig. 9 shows the current-voltage characteristics of the fabricated device in vacuum.
- a 1 ⁇ resistor is connected in series during measurement.
- the vertical axis is the logarithm of the current value
- the horizontal axis is the device voltage.
- I device current
- V device voltage. It is understood that field electron emission due to the Nell effect occurs in vacuum Example 6;
- Example 7 A substrate equivalent to that in Example 5 was used, and a sample was prepared on the same reaction conditions and prepared. Next, prepare IT ⁇ glass, apply phosphor fine particles to the ITO glass side, assemble a light-emitting device through the My insulation spacer, use the sample side as the cathode, and use the ITO glass as the anode. As a result of energization under the same current and voltage conditions as in Example 5, the same light emission was observed.
- Example 7 Example 7;
- RGB element was designed by combining devices using phosphors of three colors of green, blue, and red in the same device as in Example 5. As a result of applying the voltage, RGB light emission was obtained.
- Example 9 In a device equivalent to Example 6, devices using phosphors of three colors of green, blue, and red were combined to make an RGB element, and RGB light emission was obtained.
- Example 9 In a device equivalent to Example 6, devices using phosphors of three colors of green, blue, and red were combined to make an RGB element, and RGB light emission was obtained.
- the present invention has a unique configuration in which a surface shape with excellent field electron emission characteristics, that is, a pointed tip shape is formed in a self-modeling manner.
- the present invention provides a field electron emission device, a method for manufacturing the same, and an electron emission method using the device, which are made of a material containing sp 3 bonding BN or a mixture of sp 3 bonding BN and the sp 2 bonding BN. Therefore, it is possible to provide a field electron emission device having a low field electron emission threshold, a high current density, and a long electron emission life, and its significance is extremely large. It also provides light-emitting / display devices using the above-mentioned materials as field electron emission electron sources and manufacturing methods thereof, and contributes to thinner and lighter devices in device design. Be expected.
- the present invention finds a unique phenomenon in which a self-organized growth phenomenon of a thin film under light irradiation naturally develops a characteristic shape, and utilizes the parenthesis phenomenon, and the grown thin film itself Even if the material remains asgrown, it has a surface morphology that has a significant acceleration effect on the field electron emission characteristics. Moreover, due to the physical characteristics of the thin film material itself, it maintains the large current density and is due to the discharge of the material. Considering that there is almost no damage and that the lifetime of the function when applied for the above purpose is semi-permanent, it has been required to have a process that makes it a shape and pattern suitable for field electron emission. In comparison, the significance is not simply a process difference, but an inherently significant difference.
- the current density of field electron emission is steadily 10 times or more of the conventional AZ due to the synergistic effect of the surface shape self-formation effect and the excellent physical properties of the material itself.
- Providing a thin film with excellent durability and a manufacturing method and its application that are both cm 2 order, can be said to be an epoch-making significance that goes beyond the current technological level, I am convinced that it brought the effect.
- a field electron emission threshold is low
- (b) By providing a field electron emission element having a high current density and (C) a long electron emission lifetime, and incorporating this as an electron source in a cold cathode type light emitting / display device, it goes without saying that It is easy to start up, contributes to lighter, thinner devices, simplified assembly process, and lower costs, and is expected to be used greatly in device design in the future. Its start-up operation works well even in the atmosphere and is extremely good because it is possible, and its performance far exceeds the conventional level. Among them, the excellent characteristics (particularly current density more than 100 times conventional and extremely excellent structural strength and durability peculiar to BN) especially in (b) and (c) are high. Bring epoch-making technical breakthroughs to various lamp-type light source devices, field emission displays, etc. that require stable operation without requiring material deterioration even under conditions of intense use for long periods of time. Predicted and its significance is extremely large.
- ultra-bright and high-efficiency lighting systems can be constructed by emitting electron beams at a current density more than 100 times that of the conventional technology, and a sufficient current value can be obtained with a small electron emission area.
- Realization of high-definition displays, etc. application to mobile phones, wireless computers, etc.
- the present invention is thought to lead to innovations in various electrical devices and devices that have spread in every corner of modern daily life, including lighting and displays. Therefore, its applicability is extremely wide. As a whole, it relates to all areas of human life, and its technical and economic effects are global and enormous.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Cold Cathode And The Manufacture (AREA)
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/792,995 US7759662B2 (en) | 2004-12-14 | 2005-12-13 | Field electron emission element, a method of manufacturing the same and a field electron emission method using such an element as well as an emission/display device employing such a field electron emission element and a method of manufacturing the same |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004361150A JP2006172797A (ja) | 2004-12-14 | 2004-12-14 | 自己造形性電子放出bn薄膜を使用してなる発光・表示デバイスとその製作方法。 |
| JP2004361146A JP4608692B2 (ja) | 2004-12-14 | 2004-12-14 | 大気中電子放出特性を有する電子放出素子とその製造方法、および、この素子を使用した電子放出方法 |
| JP2004-361150 | 2004-12-14 | ||
| JP2004-361146 | 2004-12-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2006064934A1 true WO2006064934A1 (ja) | 2006-06-22 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2005/023203 Ceased WO2006064934A1 (ja) | 2004-12-14 | 2005-12-13 | 電界電子放出素子とその製造方法及びこの素子を使用した電子放出方法、並びに、電界電子放出素子を使用した発光・表示デバイスとその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7759662B2 (ja) |
| WO (1) | WO2006064934A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008004552A (ja) * | 2006-06-23 | 2008-01-10 | Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi | 電界放出表示装置およびその製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008003676B4 (de) * | 2008-01-09 | 2011-07-21 | Bruker Daltonik GmbH, 28359 | Ionenmobilitätsspektrometer mit einer nicht radioaktiven Elektronenquelle |
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| JPH103869A (ja) * | 1997-03-26 | 1998-01-06 | Canon Inc | 発光素子及び画像表示装置 |
| JPH1050206A (ja) * | 1996-08-05 | 1998-02-20 | Futaba Corp | 電界放出素子の製造方法 |
| JPH10116555A (ja) * | 1996-10-14 | 1998-05-06 | Hamamatsu Photonics Kk | 電子管 |
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| JP2001250467A (ja) * | 2000-03-03 | 2001-09-14 | Ricoh Co Ltd | カーボンナノチューブを用いた電子放出素子、帯電器および画像記録装置 |
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| GB9905132D0 (en) * | 1999-03-06 | 1999-04-28 | Smiths Industries Plc | Electron emitting devices |
| JP3595718B2 (ja) * | 1999-03-15 | 2004-12-02 | 株式会社東芝 | 表示素子およびその製造方法 |
| WO2001056053A1 (en) * | 2000-01-26 | 2001-08-02 | Matsushita Electric Industrial Co., Ltd. | Discharge light-emitting device and method of manufacture thereof |
| JP2007534138A (ja) * | 2003-07-22 | 2007-11-22 | イエダ リサーチ アンド ディベロプメント カンパニー リミテッド | 電子放出装置 |
| US7336026B2 (en) * | 2003-10-03 | 2008-02-26 | Ngk Insulators, Ltd. | High efficiency dielectric electron emitter |
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2005
- 2005-12-13 WO PCT/JP2005/023203 patent/WO2006064934A1/ja not_active Ceased
- 2005-12-13 US US11/792,995 patent/US7759662B2/en not_active Expired - Fee Related
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| JPH1050206A (ja) * | 1996-08-05 | 1998-02-20 | Futaba Corp | 電界放出素子の製造方法 |
| JPH10116555A (ja) * | 1996-10-14 | 1998-05-06 | Hamamatsu Photonics Kk | 電子管 |
| JPH10269930A (ja) * | 1997-03-25 | 1998-10-09 | Nec Corp | 電界放出型冷陰極、および電界放出型冷陰極搭載装置の製造方法 |
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| JP2001250467A (ja) * | 2000-03-03 | 2001-09-14 | Ricoh Co Ltd | カーボンナノチューブを用いた電子放出素子、帯電器および画像記録装置 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008004552A (ja) * | 2006-06-23 | 2008-01-10 | Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi | 電界放出表示装置およびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20080122370A1 (en) | 2008-05-29 |
| US7759662B2 (en) | 2010-07-20 |
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