WO2006046796A1 - Soupape de systeme d'echappement de gaz - Google Patents

Soupape de systeme d'echappement de gaz Download PDF

Info

Publication number
WO2006046796A1
WO2006046796A1 PCT/KR2005/001035 KR2005001035W WO2006046796A1 WO 2006046796 A1 WO2006046796 A1 WO 2006046796A1 KR 2005001035 W KR2005001035 W KR 2005001035W WO 2006046796 A1 WO2006046796 A1 WO 2006046796A1
Authority
WO
WIPO (PCT)
Prior art keywords
flow passage
valve
slide tube
gate plate
main flow
Prior art date
Application number
PCT/KR2005/001035
Other languages
English (en)
Inventor
Jeong Hwan Jang
Original Assignee
Nano Coatech Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nano Coatech Co., Ltd. filed Critical Nano Coatech Co., Ltd.
Publication of WO2006046796A1 publication Critical patent/WO2006046796A1/fr

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/02—Stopping, starting, unloading or idling control
    • F04B49/022—Stopping, starting, unloading or idling control by means of pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/02—Stopping, starting, unloading or idling control
    • F04B49/03—Stopping, starting, unloading or idling control by means of valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K11/00—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves
    • F16K11/02—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit
    • F16K11/06—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements
    • F16K11/072—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with pivoted closure members
    • F16K11/074—Multiple-way valves, e.g. mixing valves; Pipe fittings incorporating such valves with all movable sealing faces moving as one unit comprising only sliding valves, i.e. sliding closure elements with pivoted closure members with flat sealing faces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/0263—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor using particular material or covering means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/04—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with pivoted closure members
    • F16K3/10—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with pivoted closure members with special arrangements for separating the sealing faces or for pressing them together

Definitions

  • the present invention relates to a valve of a gas exhaust system, and more par ⁇ ticularly, to a valve which is mounted to a harmful-gas exhausting system used for semiconductor and LCD fabricating processes.
  • gate valves 4 and three-way valves 5 are mounted on a gas exhaust line 2 for exhausting harmful gases generated in fabricating processes for semiconductors and LCDs and on a vacuum line 3 for evacuating air from a semi ⁇ conductor or LCD fabricating space 1, respectively.
  • a gas exhaust line 2 for exhausting harmful gases generated in fabricating processes for semiconductors and LCDs
  • a vacuum line 3 for evacuating air from a semi ⁇ conductor or LCD fabricating space 1, respectively.
  • SIO2, SI3N4 or W powder generated during the process frequently clogs the vacuum line 3, the gas exhaust line 2 and a scrubber 6. Disclosure of Invention Technical Problem
  • the unsealed structure causes generation of environmental pollution sources and repair and maintenance costs, and waste of manpower and time.
  • An object of the invention is to provide a valve of a gas exhaust system, which can avoid leakage of harmful gases and malfunction of the system by preventing a sealing portion for maintaining airtightness at a valve seat from being exposed to the harmful gases upon operation of the valve so as to avoid deposition of powder of the harmful gases, and can prevent a flow passage from being narrowed due to deposition of the powder of the harmful gases by means of nano-coating on an inner wall of the flow passage.
  • a valve of a gas exhaust system comprising a valve body having at least one main flow passage; a slide tube that is slidably provided at the main flow passage of the valve body and has a discharge flow passage communicating with the main flow passage; a gate plate provided at the main flow passage of the valve body to be movable in a direction traversing the slide tube so as to open or close an end of the discharge flow passage of the slide tube; and an actuator for moving the gate plate in a state where a leading end of the slide tube is ascend from the gate plate is moved.
  • valve of the present invention it is possible to avoid leakage of harmful gases and malfunction of the system by preventing a sealing portion for maintaining airtightness at the valve seat from being exposed to the harmful gases upon operation of the valve so as to avoid deposition of powder of the harmful gases, and to prevent the flow passage from being narrowed due to deposition of the powder of the harmful gases by means of nano-coating on an inner wall of the flow passage.
  • FIG. 1 is a view showing the configuration of a gas exhaust system
  • FIG. 2 is a sectional view showing a valve of a gas exhaust system according to an embodiment of the present invention
  • FIG. 3 is a cross-sectional view showing the valve of the present invention.
  • FIGs. 4 to 7 are sectional views showing operation states of the valve according to the embodiment of the present invention.
  • FIGs. 8 and 9 are photographs showing the valve of the present invention.
  • FIG. 10 is a schematic sectional view showing a nano-coated surface of the valve of the present invention.
  • a valve body 10 has a main flow passage 11 in communication with a gas exhaust line or a vacuum line.
  • Valve seats 12 are formed on two main flow passage 11a and l ib, respectively.
  • Slide grooves 13 are concavely formed in sidewalls of two main flow passage 11a and l ib, respectively.
  • Slide tubes 20 are slidably inserted into the slide grooves 13.
  • Each of the slide tubes 20 has a discharge flow passage 21 communicating with the main flow passage 11.
  • a piston 30 is circumferentially provided on an outer periphery of each of the slide tubes 20.
  • a piston-receiving groove 14 is concavely formed in a sidewall of the slide groove 13.
  • Fluid ports 15 are formed at the piston-receiving groove 14 so that a fluid for moving the piston 30 can flow in or out therethrough.
  • the piston 30 is forcibly moved in a direction opposite to the fluid that flows in through one of the fluid ports 15 so that the slide tube 20 moves toward or away from the valve seat 12.
  • Each of the fluid ports 15 is provided at one of both sides with respect to the center of the piston 30 so that the piston 30 is pushed by the fluid that flows in therethrough.
  • a hydraulic mechanism 60 (referring to Fig. 8 and Fig. 9) for causing a fluid to flow through the fluid ports 15 is provided outside the valve body 10.
  • the piston 30 is slid by means of hydraulic pressure. However, it is also possible to move the piston 30 using an electromagnetic force by installing an electromagnet in a sidewall of the piston-receiving groove 14 and making the piston 30 out of metal.
  • One end of the slide tube 20 is seated on the valve seat 12, and an O-ring 12a is provided on the valve seat 12 to maintain airtightness when the slide tube 20 is seated on the valve seat 12, and also prevents damage due to contact of the slide tube 20 with the valve seat 12.
  • a gate plate 40 is provided on (two main flow passage l la and 1 Ib) of the valve body 10 to be swing rotated in a direction traversing the slide tube 20.
  • An actuator 50 for swing the gate plate 40 is mounted on the valve body 10.
  • the actuator 50 is positioned between the two slide tubes 20.
  • the actuator 50 rotates a rotary shaft 41 about an axis to turn the gate plate 40 so that the gate plate is positioned below any one of the slide tubes 20.
  • the actuator 50 operates the gate plate 40 in a state where a low end of the slide tube 20 is ascend from the same plane as a plane on which the gate plate 40 is rotated.
  • the gate plate 40 can be positioned between the slide tube 20 and the valve seat 12 by the operation of the actuator 50 in a state that the slide tube 20 is elevated from the valve seat 12.
  • the gate plate 40 is mounted on the valve body 10 to be swing rotated by the rotary shaft 41, thereby opening or closing one end of the discharge flow passage 21 of the slide tube 20.
  • a sealing member 42 is slidably provided at a side on the top of the gate plate to be in close contact with the low end of the slide tube 20 and maintain air- tightness.
  • the sealing member 42 is provided on the top of the gate plate 40 to be slidable in the same direction as a direction in which the slide tube 20 is slid.
  • the sealing member 42 is slid such that its lower end can be exposed below the gate plate 40, and also returns to its original position by means of an elastic mechanism (not shown).
  • the sealing member 42 is formed to have the same shape as the leading end of the slide tube 20.
  • the gate plate 40 is positioned above one of the valve seats 12 and thus is not turned on the same plane as the valve seat 12. Therefore, the gate plate does not come into frictional contact with the valve seat 12.
  • the rotary shaft 41 or the gate plate 40 is preferably moved together with the slide tube 20 upon contact thereof with the slide tube 20 in the same direction as the direction in which the slide tube 20 descends, and then seated on the valve seat 12.
  • the gate plate 40 can be moved by means of the turning operation of the rotary shaft 41, it is also possible to cause the gate plate 40 to linearly reciprocate so as to selectively open and close one of the two slide tubes 20.
  • the gate plate 40 in a where there is a single main flow passage 11 and a single slide tube 20, it may be preferred that the gate plate 40 be slidably operated.
  • the inner wall of the main flow passage 11 of the valve body 10 and the surfaces of the slide tubes 20 are nano-coated with nickel, fluorine, phosphorus, boron, lactic acid and tungsten.
  • valve body 10 and the slide tube 20 are coated on a nano scale by means of electroless plating.
  • a base material for the valve member 10 and the slide tubes 20 is stainless steel, aluminum, alumina, iron or the like.
  • the nano-coating material comprises 60 to 65 parts by weight of nickel, 30 to 35 parts by weight of fluorine, 1 to 2 parts by weight of phosphorus, 1 to 2 parts by weight of boron, and 5 to 7 parts by weight of lactic acid.
  • the nano-coating material comprises 62 parts by weight of nickel, 30 parts by weight of fluorine, 1 part by weight of phosphorus, 1 part by weight of boron and 6 parts by weight of tungsten.
  • Fig. 10 shows that F, Ni, P, W and B are dispersed in the inner wall of the nano-coated main flow passage 11 and the inner walls of the nano-coated slide tubes 20.
  • the nano-coating on the surfaces of the inner walls of the main flow passage 11 and the slide tubes 20 has a thickness of about 20 mm, thermal resistance at a temperature of about 480 0 C or higher, corrosion resistance, waterproofness and high hardness. Further, the nano-coating can minimize deposition of particles of the fluid thereon, thereby preventing the flow passages from being clogged.
  • the valve of the present invention has advantages in that leakage of harmful gases and malfunction of a gas exhaust system can be avoided by preventing the sealing portion for maintaining airtightness at the valve seat from being exposed to the harmful gases upon operation of the valve so as to avoid deposition of powder of the harmful gases, and a flow passage can be prevented from being narrowed due to deposition of the powder of the harmful gases by means of nano-coating on the inner wall of the flow passage.

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Sliding Valves (AREA)
  • Details Of Valves (AREA)

Abstract

La présente invention concerne une soupape de système d'échappement de gaz. La soupape comprend un corps (10) de soupape présentant au moins un passage (11) d'écoulement principal, un tube glissant (20) lequel est placé coulissant sur le passage (11) d'écoulement principal du corps (10) de soupape et présente un passage (21) d'écoulement de décharge communicant avec le passage (11) d'écoulement principal, une plaque de robinet (40) ménagée sur le passage (11) d'écoulement principal du corps (10) de valve pour pouvoir être mobile dans une direction traversant le tube coulissant (20), de manière à ouvrir ou à fermer une extrémité du passage (21) d'écoulement de décharge du tube coulissant (20), et un actionneur (50) destiné à actionner la plaque de robinet (40). Selon la présente invention, il est possible d'éviter une fuite de gaz dangereux et le mauvais fonctionnement du système en empêchant qu'une partie d'étanchéité destinée à maintenir l'étanchéité à l'air au niveau du siège de la soupape ne soit exposée au gaz dangereux lors de l'actionnement de la soupape, afin d'éviter un dépôt de poudre des gaz dangereux, et afin d'empêcher que le passage d'écoulement ne soit rétréci du fait du dépôt de la poudre des gaz dangereux au moyen d'un nanorevêtement sur la paroi intérieure du passage d'écoulement.
PCT/KR2005/001035 2004-10-29 2005-04-11 Soupape de systeme d'echappement de gaz WO2006046796A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2004-0086954 2004-10-29
KR1020040086954A KR100503753B1 (ko) 2004-10-29 2004-10-29 가스배출시스템의 개폐밸브

Publications (1)

Publication Number Publication Date
WO2006046796A1 true WO2006046796A1 (fr) 2006-05-04

Family

ID=36228014

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2005/001035 WO2006046796A1 (fr) 2004-10-29 2005-04-11 Soupape de systeme d'echappement de gaz

Country Status (2)

Country Link
KR (1) KR100503753B1 (fr)
WO (1) WO2006046796A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008020715A1 (fr) * 2006-08-16 2008-02-21 Jong-Ha Park Économiseur de gaz utilisé dans la fabrication de semi-conducteurs
JP2016048097A (ja) * 2014-08-28 2016-04-07 株式会社不二工機 流路切換弁
CN110762246A (zh) * 2019-10-26 2020-02-07 五洲阀门股份有限公司 一种平板式高耐磨多路分配阀
ES2746360A1 (es) * 2018-09-05 2020-03-05 Mecanizados Esferimec S L Valvula pivotante para regular el flujo de un fluido y procedimiento para regular el flujo de un fluido
WO2021067346A1 (fr) * 2019-10-03 2021-04-08 Oceaneering International, Inc Soupape d'isolement pour régulation d'écoulement de fluide

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101713549B1 (ko) * 2015-10-27 2017-03-08 주식회사 앤아이윈 유-무기공정 반도체 제조시 발생가스의 희석 및 댐퍼의 세척이 동시에 가능한 배출가스 정밀압력제어용 투-웨이 슬라이드 오토 댐퍼의 제어장치
KR102587459B1 (ko) * 2021-04-16 2023-10-11 주식회사 에스와이티 원격 플라즈마 소스 분리 밸브 및 이를 이용한 플라즈마 소스 또는 프로세스 가스 공급 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990005048U (ko) * 1997-07-11 1999-02-05 고영복 가스 밸브용 액츄에이터
US6192922B1 (en) * 1999-06-01 2001-02-27 Synetics Solutions Inc. Airflow control valve for a clean room
US6719272B1 (en) * 1999-06-02 2004-04-13 Tokyo Electron Limited Valve and vacuum processing device with the valve
KR20040048443A (ko) * 2002-12-03 2004-06-10 삼성전자주식회사 반도체소자 제조설비의 배기 시스템 및 그 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990005048U (ko) * 1997-07-11 1999-02-05 고영복 가스 밸브용 액츄에이터
US6192922B1 (en) * 1999-06-01 2001-02-27 Synetics Solutions Inc. Airflow control valve for a clean room
US6719272B1 (en) * 1999-06-02 2004-04-13 Tokyo Electron Limited Valve and vacuum processing device with the valve
KR20040048443A (ko) * 2002-12-03 2004-06-10 삼성전자주식회사 반도체소자 제조설비의 배기 시스템 및 그 방법

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008020715A1 (fr) * 2006-08-16 2008-02-21 Jong-Ha Park Économiseur de gaz utilisé dans la fabrication de semi-conducteurs
JP2016048097A (ja) * 2014-08-28 2016-04-07 株式会社不二工機 流路切換弁
ES2746360A1 (es) * 2018-09-05 2020-03-05 Mecanizados Esferimec S L Valvula pivotante para regular el flujo de un fluido y procedimiento para regular el flujo de un fluido
WO2020049204A1 (fr) * 2018-09-05 2020-03-12 Mecanizados Esferimec, S.L. Vanne pivotante pour réguler l'écoulement d'un fluide et procédé pour réguler l'écoulement d'un fluide
US11408518B2 (en) 2018-09-05 2022-08-09 Mecanizados Esferimec, S.L. Pivoting valve for regulating the flow of a fluid and procedure for regulating the flow of a fluid
WO2021067346A1 (fr) * 2019-10-03 2021-04-08 Oceaneering International, Inc Soupape d'isolement pour régulation d'écoulement de fluide
CN110762246A (zh) * 2019-10-26 2020-02-07 五洲阀门股份有限公司 一种平板式高耐磨多路分配阀
CN110762246B (zh) * 2019-10-26 2021-06-11 五洲阀门股份有限公司 一种平板式高耐磨多路分配阀

Also Published As

Publication number Publication date
KR100503753B1 (ko) 2005-07-26

Similar Documents

Publication Publication Date Title
WO2006046796A1 (fr) Soupape de systeme d'echappement de gaz
JP5365867B2 (ja) ゲートバルブ
EP1165993B1 (fr) Soupape a fente double face et son procede de realisation
CN100416145C (zh) 具有改进的流导控制的阀装置
TWI431213B (zh) 蝶形壓力控制閥
US10094486B2 (en) Method and system for supplying a cleaning gas into a process chamber
JP5330466B2 (ja) スライドバルブ
JP4042507B2 (ja) 流量制御機構付きゲートバルブ
US20040144309A1 (en) Reciprocating gas valve for pulsing a gas
WO2012105109A1 (fr) Soupape de régulation de vide, appareil de régulation de vide et programme informatique
KR101099571B1 (ko) 진공 게이트밸브
JP2005320622A (ja) 交換可能メンテナンス弁
WO2007142395A1 (fr) Soupape à vanne à dépression
JP4421480B2 (ja) 振り子型弁アッセンブリ用シールリング
KR101494307B1 (ko) 다양한 형태의 진공장치에 설치가 가능한 진공 게이트밸브
WO2006010035A2 (fr) Vanne porte
KR20020010680A (ko) 진공 게이트 밸브 및 게이트 밸브를 구비한 진공 처리 장치
JP2010053876A (ja) 三方切換弁
JP2001355745A (ja) ゲートバルブ
CN220347162U (zh) 一种真空铸造模具
CN216768385U (zh) 一种带双向密封双碟版蝶阀
CN217784277U (zh) 一种三通切换阀
JP4470201B2 (ja) ゲートバルブ
JP2005321100A (ja) 開閉バルブ
JPH0671979U (ja) 半導体製造装置用流体制御器

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BW BY BZ CA CH CN CO CR CU CZ DK DM DZ EC EE EG ES FI GB GD GE GM HR HU ID IL IN IS JP KE KG KM KZ LC LK LR LS LT LU LV MA MD MK MN MW MX MZ NA NI NO NZ PG PH PL PT RO RU SC SD SE SG SK SM SY TJ TM TN TR TT TZ UA UG US VC VN YU ZA ZM

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): BW GH GM KE LS MW MZ NA SD SZ TZ UG ZM ZW AM AZ BY KG MD RU TJ TM AT BE BG CH CY DE DK EE ES FI FR GB GR HU IE IS LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 05764890

Country of ref document: EP

Kind code of ref document: A1