WO2006022245A1 - pn接合を有する化合物半導体エピタキシャル基板の製造方法 - Google Patents
pn接合を有する化合物半導体エピタキシャル基板の製造方法 Download PDFInfo
- Publication number
- WO2006022245A1 WO2006022245A1 PCT/JP2005/015248 JP2005015248W WO2006022245A1 WO 2006022245 A1 WO2006022245 A1 WO 2006022245A1 JP 2005015248 W JP2005015248 W JP 2005015248W WO 2006022245 A1 WO2006022245 A1 WO 2006022245A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- compound semiconductor
- substrate
- junction
- epitaxial substrate
- semiconductor epitaxial
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 57
- 150000001875 compounds Chemical class 0.000 title claims abstract description 52
- 239000004065 semiconductor Substances 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title abstract description 23
- 238000000034 method Methods 0.000 claims description 50
- 239000010410 layer Substances 0.000 description 22
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 12
- 230000006866 deterioration Effects 0.000 description 12
- 239000013078 crystal Substances 0.000 description 4
- 230000005669 field effect Effects 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 101100234408 Danio rerio kif7 gene Proteins 0.000 description 1
- 101100221620 Drosophila melanogaster cos gene Proteins 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 101100398237 Xenopus tropicalis kif11 gene Proteins 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66083—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
- H01L29/6609—Diodes
- H01L29/66136—PN junction diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02387—Group 13/15 materials
- H01L21/02395—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02579—P-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02639—Preparation of substrate for selective deposition
Definitions
- the present invention relates to a method for manufacturing a compound semiconductor epitaxial substrate having a pn junction.
- a mask that also has a force such as SiO on the compound semiconductor functional layer grown on the original substrate Forms a compound where the mask is not formed
- an epitaxial growth method including a selective growth process (hereinafter referred to as “selective growth method”) is used.
- selective growth method a compound semiconductor epitaxy substrate having a pn junction (including a pin junction) is manufactured, and an electrode or the like is placed on the substrate to divide the element to produce a field effect transistor (Schottky junction type).
- Compound semiconductor devices such as (FET) and heterobipolar transistors (HBT) have been manufactured!
- a substrate manufactured by a liquid encapsulated Czochoralski (LEC) method is usually used as a base substrate for manufacturing a compound semiconductor epitaxial substrate for these compound semiconductor elements.
- An original substrate having a compound single crystal force is used (for example, see Patent Document 1).
- Patent Document 1 Japanese Patent Laid-Open No. 11 268998
- Patent Document 2 JP-A-5-339100
- An object of the present invention is a method of manufacturing a compound semiconductor epitaxial substrate having a pn junction by an epitaxial growth method including a selective growth process, and provides a compound semiconductor element with little deterioration in characteristics. There is a need to provide a method for manufacturing a epitaxial substrate.
- the present inventors have intensively studied a manufacturing method by a selective growth method of a compound semiconductor epitaxial substrate having a pn junction, and as a result, have grown a compound semiconductor layer. Focusing on the residual strain of the original substrate, and if the average value of the residual strain is below a certain value, the compound semiconductor device that provides a compound semiconductor element having a pn junction is produced with less characteristic deterioration! As a result, the present invention has been completed. [0010] Specifically, the present invention provides a method for producing a compound semiconductor Epitakisharu substrate having a pn junction by selective growth method, the use of a base substrate having an average value of residual strain is 1. OX 10- 5 or less A method as described above is provided.
- the production method of the present invention has an average value of residual strain is characterized by using a strain less based board is 1. OX 10- 5 or less.
- the inventors of the present invention manufactured a compound semiconductor epitaxial substrate having a pn junction by a selective growth method using an original substrate with a small residual strain manufactured by the VGF method or the VB method,
- a compound semiconductor device is manufactured using a material, its initial electrical characteristics are not significantly improved as compared with a device using an original substrate by the LEC method, which has a large residual strain. It has been found that the deterioration due to the use of is reduced.
- the selective growth method a part of the compound semiconductor layer constituting the compound semiconductor element is epitaxially grown on the substrate, and then the grown layer is made of SiO or the like on the grown layer.
- another compound semiconductor layer is epitaxially grown and an electrode is provided to manufacture a compound semiconductor element.
- the thermal growth is caused by the difference in thermal expansion coefficient between the compound semiconductor layer formed by epitaxial growth and the SiO mask.
- the average value of the residual strain of a substrate used in the present invention 1. is 0 X 10- 5 or less. 1. 0 X 10- 5 super In such a case, there is a possibility that deterioration of the composite semiconductor element may proceed due to long-term use.
- the average value of the residual Tomeibitsu may be at 7 X 10- 6 or less, preferably in the gesture et preferred is 5 X 10- 6 or less.
- the growth of the compound semiconductor layer is usually performed by metal organic chemical vapor deposition (Metal Organic).
- MOCVD Chemical Vapor Deposition
- MBE Molecular Beam Epitaxy
- the residual strain of the compound semiconductor epitaxial substrate can be measured by, for example, a photoelastic method. Specifically, it can be measured by the method described in, for example, Proceedings of 8th Semi-Insulating III-V Materials, Warsaw Tru June, 1994, p95-98.
- the photoelastic method is a method for observing a stress concentration state by utilizing a birefringence phenomenon, and is generally used.
- the residual strain of the substrate is the absolute value of the difference between the radial strain Sr and the tangential direction St, and can be calculated by the following equation.
- ⁇ is the wavelength of the light used for measurement
- d is the thickness of the substrate
- n is the refractive index of the substrate
- ⁇ is the compound
- Phase difference caused by refraction ⁇ is main vibration azimuth, ⁇ and ⁇ and ⁇ are elastic tensors
- FIG. 1 shows an embodiment of a compound semiconductor device manufactured using a compound semiconductor epitaxial substrate according to the manufacturing method of the present invention, and shows a case where the compound semiconductor device is a diode.
- 1 is a semi-insulating GaAs substrate
- 2 is a buffer layer
- 3 is an n + GaAs layer.
- n + GaAs SiO insulating film 7 is applied, and p + GaAs layer 4 is stacked in the opening.
- a p-electrode 5 is deposited on the top
- an n-electrode 6 is deposited on the n + GaAs layer by sputtering.
- FIG. 2 shows a graph for explaining the current-voltage characteristics of this diode.
- this diode only a small amount of current flows in reverse bias, and the diode exhibits rectification. However, as the diode degrades after prolonged use, the amount of current at reverse bias increases as shown in Fig. 3.
- the current-voltage characteristic in which the increase in the amount of current at such a reverse bias is small is as shown in FIG.
- a diode is taken as an example, other elements having a pn junction, such as a junction field effect transistor (JFET), a heterobipolar transistor (HBT), etc., may be used as a compound according to the present invention.
- JFET junction field effect transistor
- HBT heterobipolar transistor
- the compound semiconductor device manufactured using a semiconductor epitaxial substrate has less deterioration in characteristics such as current gain ( ⁇ ) and maximum current (Imax) compared to conventional devices!
- the diode with the layer structure shown in Fig. 1 was manufactured as follows.
- a SiO insulating film 7 is deposited on the entire surface of the epitaxial substrate, followed by patterning using a photoresist as a mask.
- a p + GaAs layer 4 was selectively grown in this opening by MOCVD (Fig. 4 (b)). Further, after depositing the p-electrode 5 on the p + GaAs layer 4 by sputtering (FIG. 4 (c)), the n-electrode 6 is formed by opening the n-electrode forming part using the SiO 2 insulating film as a photoresist as a mask. (Fig. 4 (d)).
- FIG. 5 shows a graph showing the current-voltage characteristics of the compound semiconductor element (diode) obtained as described above. Then, when an excessive voltage of 3.7V was applied to this element, the deterioration acceleration test was conducted by energizing it for 10 minutes, and then the current-voltage characteristics were examined again, as shown in Fig. 6, the increase in reverse bias leakage current was It was almost unseen power. Further, when the cross section of the element after energization was observed with a TEM (transmission electron microscope), dislocation was not observed.
- TEM transmission electron microscope
- the substrate was prepared by VB method, except for using a GaAs substrate with an average residual strain 4 X 10- 6 was fabricated diodes under the same conditions as the actual Example 1.
- the element was inferior (reverse bias leakage current increase calorie), and almost no dislocation was observed.
- the substrate was prepared by the LEC method, except for using a GaAs substrate with an average residual strain 4 X 10- 5 was fabricated diodes under the same conditions as the actual Example 1.
- the reverse bias leakage current increased.
- the reverse bias leakage current was further increased as shown in FIG.
- the cross section of the device after energization was observed with a TEM (transmission electron microscope), a large amount of dislocations were observed.
- FIG. 1 is a layer structure diagram showing a diode according to an example of an embodiment of the present invention.
- FIG. 2 is a graph for explaining the current-voltage characteristics of a diode.
- FIG. 3 is a graph showing deterioration of the diode after energization.
- FIG. 4 is a diagram showing a manufacturing process of the pn junction element (diode) in FIG.
- FIG. 6 is a graph showing that the diode of Example 1 is not deteriorated after energization.
- FIG. 7 is a graph showing deterioration of the diode of Comparative Example 1 after energization.
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/660,936 US8906158B2 (en) | 2004-08-24 | 2005-08-23 | Method for producing compound semiconductor epitaxial substrate having PN junction |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004-243413 | 2004-08-24 | ||
JP2004243413A JP2006060177A (ja) | 2004-08-24 | 2004-08-24 | pn接合を有する化合物半導体エピタキシャル基板の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006022245A1 true WO2006022245A1 (ja) | 2006-03-02 |
Family
ID=35967457
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/015248 WO2006022245A1 (ja) | 2004-08-24 | 2005-08-23 | pn接合を有する化合物半導体エピタキシャル基板の製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8906158B2 (ja) |
JP (1) | JP2006060177A (ja) |
KR (1) | KR20070048207A (ja) |
TW (1) | TWI381428B (ja) |
WO (1) | WO2006022245A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011035066A (ja) * | 2009-07-30 | 2011-02-17 | Sumitomo Electric Ind Ltd | 窒化物半導体素子、及び窒化物半導体素子を作製する方法 |
KR20150118405A (ko) * | 2014-04-14 | 2015-10-22 | 삼성전자주식회사 | 메시지 운용 방법 및 그 전자 장치 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5237766A (en) * | 1975-09-19 | 1977-03-23 | Nec Corp | Semiconductor device |
JPH05339100A (ja) * | 1992-04-10 | 1993-12-21 | Sumitomo Electric Ind Ltd | 化合物半導体単結晶およびその成長方法 |
JPH08119800A (ja) * | 1994-10-24 | 1996-05-14 | Sumitomo Electric Ind Ltd | Iii −v族化合物半導体材料の熱処理方法 |
JP2000103699A (ja) * | 1998-09-28 | 2000-04-11 | Sumitomo Electric Ind Ltd | GaAs単結晶基板およびそれを用いたエピタキシャルウェハ |
JP2001053005A (ja) * | 1999-08-06 | 2001-02-23 | Sumitomo Electric Ind Ltd | 化合物半導体エピタキシャルウェハおよびその製造方法 |
JP2003257997A (ja) * | 2002-02-28 | 2003-09-12 | Sumitomo Electric Ind Ltd | 窒化ガリウム系半導体装置を製造する方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11268998A (ja) | 1998-03-23 | 1999-10-05 | Sumitomo Electric Ind Ltd | GaAs単結晶インゴットおよびその製造方法ならびにそれを用いたGaAs単結晶ウエハ |
-
2004
- 2004-08-24 JP JP2004243413A patent/JP2006060177A/ja active Pending
-
2005
- 2005-07-04 TW TW094122568A patent/TWI381428B/zh not_active IP Right Cessation
- 2005-08-23 WO PCT/JP2005/015248 patent/WO2006022245A1/ja active Application Filing
- 2005-08-23 KR KR1020077004607A patent/KR20070048207A/ko not_active Application Discontinuation
- 2005-08-23 US US11/660,936 patent/US8906158B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5237766A (en) * | 1975-09-19 | 1977-03-23 | Nec Corp | Semiconductor device |
JPH05339100A (ja) * | 1992-04-10 | 1993-12-21 | Sumitomo Electric Ind Ltd | 化合物半導体単結晶およびその成長方法 |
JPH08119800A (ja) * | 1994-10-24 | 1996-05-14 | Sumitomo Electric Ind Ltd | Iii −v族化合物半導体材料の熱処理方法 |
JP2000103699A (ja) * | 1998-09-28 | 2000-04-11 | Sumitomo Electric Ind Ltd | GaAs単結晶基板およびそれを用いたエピタキシャルウェハ |
JP2001053005A (ja) * | 1999-08-06 | 2001-02-23 | Sumitomo Electric Ind Ltd | 化合物半導体エピタキシャルウェハおよびその製造方法 |
JP2003257997A (ja) * | 2002-02-28 | 2003-09-12 | Sumitomo Electric Ind Ltd | 窒化ガリウム系半導体装置を製造する方法 |
Also Published As
Publication number | Publication date |
---|---|
US8906158B2 (en) | 2014-12-09 |
US20090031944A1 (en) | 2009-02-05 |
TWI381428B (zh) | 2013-01-01 |
JP2006060177A (ja) | 2006-03-02 |
TW200616049A (en) | 2006-05-16 |
KR20070048207A (ko) | 2007-05-08 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7233610B2 (en) | Nitride based semiconductor laser diode device with a bar mask | |
KR100304881B1 (ko) | Gan계화합물반도체및그의결정성장방법 | |
US7358160B2 (en) | Method of selective formation of compound semiconductor-on-silicon wafer with silicon nanowire buffer layer | |
US7339255B2 (en) | Semiconductor device having bidirectionally inclined toward <1-100> and <11-20> relative to {0001} crystal planes | |
JP5317398B2 (ja) | 格子パラメータを変化させる元素を含有する窒化ガリウムデバイス基板 | |
US6524932B1 (en) | Method of fabricating group-III nitride-based semiconductor device | |
US20080315255A1 (en) | Thermal Expansion Transition Buffer Layer for Gallium Nitride on Silicon | |
JP4127463B2 (ja) | Iii族窒化物系化合物半導体の結晶成長方法及びiii族窒化物系化合物半導体発光素子の製造方法 | |
US20070045639A1 (en) | Semiconductor electronic device | |
GB2338107A (en) | Buffer layers for semiconductor devices | |
US20100044719A1 (en) | III-V Compound Semiconductor Epitaxy Using Lateral Overgrowth | |
KR20050084774A (ko) | 질화 갈륨계 디바이스 및 그 제조 방법 | |
US20080149941A1 (en) | Compound Semiconductor-On-Silicon Wafer with a Silicon Nanowire Buffer Layer | |
CA2657504A1 (en) | Method of fabricating semiconductor devices on a group iv substrate with controlled interface properties and diffusion tails | |
JPH11145514A (ja) | 窒化ガリウム系半導体素子およびその製造方法 | |
US9685589B2 (en) | Optoelectronic component with a layer structure | |
WO2003003431A1 (en) | Relaxed sige films by surfactant mediation | |
US20050241571A1 (en) | Method of growing nitride single crystal on silicon substrate, nitride semiconductor light emitting device using the same, method of manufacturing the same | |
WO2006022245A1 (ja) | pn接合を有する化合物半導体エピタキシャル基板の製造方法 | |
US20090045437A1 (en) | Method and apparatus for forming a semi-insulating transition interface | |
JP2000114599A (ja) | 半導体発光素子 | |
US20140264385A1 (en) | Manufacture of wafers of wide energy gap semiconductor material for the integration of electronic and/or optical and/or optoelectronic devices | |
CN115579437A (zh) | 一种外延芯片结构 | |
JP2000150388A (ja) | Iii族窒化物半導体薄膜およびその製造方法 | |
US7923098B2 (en) | Low-defect-density crystalline structure and method for making same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 11660936 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020077004607 Country of ref document: KR |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |