WO2006003867A3 - 顕微鏡観察方法、顕微鏡装置、微分干渉顕微鏡装置、位相差顕微鏡装置、干渉顕微鏡装置、画像処理方法、及び画像処理装置 - Google Patents

顕微鏡観察方法、顕微鏡装置、微分干渉顕微鏡装置、位相差顕微鏡装置、干渉顕微鏡装置、画像処理方法、及び画像処理装置 Download PDF

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Publication number
WO2006003867A3
WO2006003867A3 PCT/JP2005/011772 JP2005011772W WO2006003867A3 WO 2006003867 A3 WO2006003867 A3 WO 2006003867A3 JP 2005011772 W JP2005011772 W JP 2005011772W WO 2006003867 A3 WO2006003867 A3 WO 2006003867A3
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WO
WIPO (PCT)
Prior art keywords
microscope
image processing
image formation
image
interference
Prior art date
Application number
PCT/JP2005/011772
Other languages
English (en)
French (fr)
Other versions
WO2006003867A2 (ja
Inventor
Hiroshi Ooki
Original Assignee
Nippon Kogaku Kk
Hiroshi Ooki
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004193288A external-priority patent/JP4367261B2/ja
Priority claimed from JP2004193380A external-priority patent/JP2006017494A/ja
Priority claimed from JP2004203683A external-priority patent/JP4479391B2/ja
Priority claimed from JP2004203684A external-priority patent/JP4466240B2/ja
Application filed by Nippon Kogaku Kk, Hiroshi Ooki filed Critical Nippon Kogaku Kk
Priority to US11/630,151 priority Critical patent/US20070242133A1/en
Priority to EP05752944A priority patent/EP1767923A4/en
Publication of WO2006003867A2 publication Critical patent/WO2006003867A2/ja
Publication of WO2006003867A3 publication Critical patent/WO2006003867A3/ja

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/36Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365Control or image processing arrangements for digital or video microscopes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/58Optics for apodization or superresolution; Optical synthetic aperture systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

 本発明は、顕微鏡の構成を特殊化することなく、超解像画像などの特殊画像を取得することを目的とする。本発明の或る顕微鏡観察方法は、物体(1)の照明角度を変化させ、照明角度が各値にあるときに物体(1)から射出した各光束が結像面(15)に個別に生起させる各光波の複素振幅分布を測定する測定工程と、各光波の複素振幅分布のデータに基づき、結像光学系(14)をそれよりも開口数の大きい仮想結像光学系(L’)に置換したときにその結像面に生起する仮想光波の複素振幅分布を算出する算出工程と、仮想光波の複素振幅分布に基づき、仮想結像光学系(L’)がその結像面に形成する仮想像の画像データを作成する画像作成工程とを含むことを特徴とする。                                                                             
PCT/JP2005/011772 2004-06-30 2005-06-27 顕微鏡観察方法、顕微鏡装置、微分干渉顕微鏡装置、位相差顕微鏡装置、干渉顕微鏡装置、画像処理方法、及び画像処理装置 WO2006003867A2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US11/630,151 US20070242133A1 (en) 2004-06-30 2005-06-27 Microscope Observation Method, Microscope, Differentiation Interference Microscope, Phase Difference Microscope, Interference Microscope, Image Processing Method, and Image Processing Device
EP05752944A EP1767923A4 (en) 2004-06-30 2005-06-27 MICROSCOPE OBSERVATION METHOD, MICROSCOPE, DIFFERENTIAL INERFERENTIAL MICROSCOPE, DEPHASING MICROSCOPE, ITERFERENTIAL MICROSCOPE, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING DEVICE

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2004193288A JP4367261B2 (ja) 2004-06-30 2004-06-30 顕微鏡観察方法、顕微鏡装置、及び画像処理装置
JP2004-193380 2004-06-30
JP2004193380A JP2006017494A (ja) 2004-06-30 2004-06-30 顕微鏡観察方法、顕微鏡装置、及び画像処理装置
JP2004-193288 2004-06-30
JP2004203683A JP4479391B2 (ja) 2004-07-09 2004-07-09 画像処理装置、位相差顕微鏡、および、画像処理方法
JP2004203684A JP4466240B2 (ja) 2004-07-09 2004-07-09 画像処理装置、微分干渉顕微鏡、および、画像処理方法
JP2004-203684 2004-07-09
JP2004-203683 2004-07-09

Publications (2)

Publication Number Publication Date
WO2006003867A2 WO2006003867A2 (ja) 2006-01-12
WO2006003867A3 true WO2006003867A3 (ja) 2006-02-16

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2005/011772 WO2006003867A2 (ja) 2004-06-30 2005-06-27 顕微鏡観察方法、顕微鏡装置、微分干渉顕微鏡装置、位相差顕微鏡装置、干渉顕微鏡装置、画像処理方法、及び画像処理装置

Country Status (3)

Country Link
US (1) US20070242133A1 (ja)
EP (1) EP1767923A4 (ja)
WO (1) WO2006003867A2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104792706A (zh) * 2015-04-23 2015-07-22 天津大学 面阵ccd的位置三角波频率编码激励的成像光测量系统

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* Cited by examiner, † Cited by third party
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JP5147454B2 (ja) * 2007-03-07 2013-02-20 キヤノン株式会社 画像形成装置、及び画像形成方法
DE102007039201A1 (de) * 2007-08-20 2009-02-26 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur Erhöhung der Auflösung eines optischen Abbildungssystems
CN101526464B (zh) * 2008-03-05 2011-05-11 清华大学 相衬成像方法及设备
CN101620176B (zh) * 2009-06-10 2011-01-12 钱国英 一种珍珠粉和贝壳粉的鉴别方法
US8693000B2 (en) * 2011-12-22 2014-04-08 General Electric Company Quantitative phase microscopy for label-free high-contrast cell imaging
US8934103B2 (en) 2011-12-22 2015-01-13 General Electric Company Quantitative phase microscopy for label-free high-contrast cell imaging
WO2014070082A1 (en) * 2012-10-29 2014-05-08 General Electric Company Quantitative phase microscopy for label-free high-contrast cell imaging
CN103076107B (zh) * 2013-01-17 2014-12-24 杭州电子科技大学 基于太赫兹脉冲测量的燃烧温度传感装置及方法
JP6112872B2 (ja) * 2013-01-18 2017-04-12 キヤノン株式会社 撮像システム、画像処理方法、および撮像装置
JP2015052663A (ja) * 2013-09-06 2015-03-19 キヤノン株式会社 画像処理方法、画像処理装置、撮像装置およびプログラム
NL2013262B1 (en) * 2014-07-25 2016-09-09 Delmic B V Method for inspecting a sample using an assembly comprising a scanning electron microscope and a light microscope.

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JP2002005828A (ja) * 2000-06-20 2002-01-09 Tochigi Nikon Corp 半導体の不純物濃度検査装置及び検査方法
JP2002257629A (ja) * 2001-02-27 2002-09-11 Communication Research Laboratory 電磁波検出装置および検出方法
JP2003295104A (ja) * 2002-04-01 2003-10-15 Tochigi Nikon Corp テラヘルツパルス光照射装置及びこれを用いたイメージ化装置
JP2004020352A (ja) * 2002-06-14 2004-01-22 Tochigi Nikon Corp テラヘルツパルス光計測方法及び装置

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Publication number Priority date Publication date Assignee Title
US4164788A (en) * 1976-10-13 1979-08-14 Atul Jain Super-resolution imaging system
WO2003042670A1 (en) * 2001-11-13 2003-05-22 Rensselaer Polytechnic Institute Method and system for performing three-dimensional teraherz imaging on an object

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002005828A (ja) * 2000-06-20 2002-01-09 Tochigi Nikon Corp 半導体の不純物濃度検査装置及び検査方法
JP2002257629A (ja) * 2001-02-27 2002-09-11 Communication Research Laboratory 電磁波検出装置および検出方法
JP2003295104A (ja) * 2002-04-01 2003-10-15 Tochigi Nikon Corp テラヘルツパルス光照射装置及びこれを用いたイメージ化装置
JP2004020352A (ja) * 2002-06-14 2004-01-22 Tochigi Nikon Corp テラヘルツパルス光計測方法及び装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104792706A (zh) * 2015-04-23 2015-07-22 天津大学 面阵ccd的位置三角波频率编码激励的成像光测量系统

Also Published As

Publication number Publication date
EP1767923A2 (en) 2007-03-28
EP1767923A4 (en) 2009-10-28
US20070242133A1 (en) 2007-10-18
WO2006003867A2 (ja) 2006-01-12

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