WO2005092515A1 - 塗工装置、塗工方法およびそれから得られる表示部材 - Google Patents
塗工装置、塗工方法およびそれから得られる表示部材 Download PDFInfo
- Publication number
- WO2005092515A1 WO2005092515A1 PCT/JP2005/004744 JP2005004744W WO2005092515A1 WO 2005092515 A1 WO2005092515 A1 WO 2005092515A1 JP 2005004744 W JP2005004744 W JP 2005004744W WO 2005092515 A1 WO2005092515 A1 WO 2005092515A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- pulsation
- discharge
- buffers
- coating liquid
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Definitions
- the present invention relates to a coating apparatus, and more particularly, to a coating apparatus suitable for intermittent coating, and also relates to a coating method using the coating apparatus.
- An object of the present invention is to provide a coating apparatus which prevents fluctuations in film thickness and has good ejection response even in intermittent coating.
- the coating apparatus according to the present invention can be applied to a display device, a color filter for a display device, an LCD array, and an optical filter in addition to uniformly applying a coating such as a magnetic substance or a thin film on a substrate such as a film or glass. It can be suitably used.
- the coating length is less than 2 m.
- a sheet-by-sheet coating method in which a material to be coated is supplied one by one to a coater, and the coating material is supplied and applied to a next process such as drying.
- a roll coating method, a bar coating method, a die coating method, and the like have been widely used as a single-wafer coating method.
- the roll coating method is a method in which a coating liquid is transferred to a substrate through a roll such as a rubber roll, and is applied to a long coating material or a roll-shaped wound coating material. The force that can be performed The coating liquid is sent to the application roll and the substrate sequentially because the coating liquid is sequentially sent to the application roll. The coating liquid is exposed to air for a long time. Likely to happen. Also, when a high-viscosity coating liquid is used or when a thick film is applied, the variation in film thickness is not suitable because it is large.
- the bar coating method is a method in which a coating solution is applied to a substrate by using a thin bar, a wire wound on a rod, and a bar. In this method, the wire wound on the rod is in direct contact with the substrate. If the coating liquid is non-Ut-Anne or has a high viscosity, if traces of wires with poor leveling properties remain, it has a disadvantage.
- the die coating method has been widely used in the past to apply a thick film or to continuously apply a high-viscosity paint.
- coating methods such as a curtain flow method, an extrusion method, and a bead method are known.
- paint is discharged from a slit provided in the die with the die coater's base being close to the work, and the space between the base and the work which travels relatively at a constant distance is maintained.
- a paint pool called a paint bead is formed in this state, and in this state the paint is drawn out as the material to be coated travels to form a coating film.
- a bead method is used to continuously form a coating film by supplying the same amount of paint from the slits as the paint consumed in forming the coating film, the formed coating film can improve the uniformity of the film thickness. It can be realized with high accuracy.
- Patent document 1 Japanese Patent Application Laid-Open No. 10-159803
- Patent Document 2 JP-A-2000-18202
- Patent Document 3 Japanese Patent Application Laid-Open No. 2002-61788
- the present invention has the following configuration. That is,
- a coating apparatus which includes coating means for applying a coating liquid to a substrate, such as at least a coating liquid supply means, and which is connected through a pipe to apply the coating liquid to the substrate.
- a member that buffers the discharge pulsation is disposed at an arbitrary location to which the discharge pressure by the coating liquid supply unit reaches, and the member that buffers the discharge pulsation is provided at least for the gas enclosed therein and the gas.
- a coating apparatus characterized by being a member made of a material to be enclosed.
- S is the liquid contact area (cm 2 ) of the member that buffers the discharge pulsation at 25 ° C. and 1 atm
- V is the volume V ( cm 3 )
- At least a piston type metering pump is used as the coating liquid supply means.
- a method for producing a color filter which includes a step of applying using the coating method according to (12).
- a method for manufacturing an LCD array substrate comprising a step of performing coating using the coating method according to (12).
- the effect of discharge pulsation is reduced and the uniformity of the film thickness is high.
- a thin film coating can be stably obtained, and is particularly suitable for intermittently coating a substrate. It is.
- the member that buffers the discharge pulsation disposed in the pressure flow path increases the responsiveness of a change in volume, and thus, the discharge pulsation can be more effectively performed.
- the uniformity of the film thickness can be further enhanced because the ejection response is high.
- a means for measuring the internal pressure of the flow path at the time of discharge it is possible to detect the deterioration of the member that buffers the pulsation, and a coating apparatus with higher productivity can be obtained.
- FIG. 1 is a flow chart showing one embodiment of a die coater type coating apparatus provided with a member for buffering pulsation in the present invention.
- FIG. 2 is a flow chart showing an embodiment of a die coater type coating apparatus having a member for buffering pulsation, a passage internal pressure increasing means and a member deterioration detecting function in the present invention.
- FIG. 3 is a flowchart showing one embodiment of coating using a conventional die coater.
- FIG. 4 is a flowchart showing one embodiment of a die coater type coating in which a conventional air coater type accumulator is combined with a conventional die coater.
- FIG. 5 shows the results of measuring the film thickness of Examples 1 and 2.
- FIG. 6 shows the results of measuring the film thickness of Example 5.
- FIG. 7 shows the results of film thickness measurements of Comparative Examples 1 and 2.
- FIG. 8 shows the results of measuring the film thickness of Comparative Examples 3 and 4.
- the coating apparatus of the present invention is suitably used for a coating method in which uniformity of film thickness is required and extremely high accuracy is required such that discharge pulsation of a coating liquid must be considered as a problem. be able to.
- a coating method include a die coating method, a roll coating method, and a bar coating method.
- the present invention can be employed when coating is performed continuously, but exhibits excellent characteristics when intermittent coating is performed because of its excellent responsiveness.
- the distinction between continuous coating and intermittent coating is that the base material used for the former is generally long, and the unsteady coating part until the coating film is in a steady coating state is basically a product
- the latter is a coating method that involves one or more coating stops on a single substrate
- the present invention relates to a coating apparatus for obtaining a uniform coating film by reducing the influence of discharge pulsation, and particularly to a technique which can be suitably used in an apparatus for performing intermittent coating.
- the coating liquid supply means used in the coating apparatus of the present invention is a means for sending the coating liquid to the coating means.
- various power devices such as piston pumps. These means may be used alone or in combination of two or more.
- a roll coating method, a bar coating method, and a die coating method are suitable in terms of this point.
- the roll coating method or the bar coating method may cause foreign matter to enter the coating liquid or cause the coating liquid to deteriorate or absorb moisture due to exposure to air.
- a die is generally used as a coating means. Used.
- the shape of the die cap is a slit gap that takes into account the viscosity of the coating liquid and the pressure loss of the discharge slit.
- the slit width is determined by the size and application width of the coating base material.
- the T-die and the coat hanger have been devised to achieve uniform discharge in the slit width direction.
- the coating liquid injection path to the mar-holder may be a single point or may be divided into several points.
- FIG. 1 is a flow diagram illustrating an example of a single-wafer coating apparatus according to an embodiment of the present invention.
- FIG. 3 shows the flow from the coating liquid storage tank card to the die cap. Open the suction-absorbing I-side switching valve 2 provided downstream from the coating liquid tank 1, and start suctioning the coating liquid with the syringe pump (coating liquid supply means) 3 provided downstream of the suction-absorbing I-side switching valve 2. . In this state, the discharge side switching valve 4 is closed.
- the suction-side switching valve 2 is closed, and the discharge-side switching valve 4 provided downstream of the syringe pump 3 is opened to start the liquid supply of the syringe pump 3.
- a liquid pool (bead) of the coating liquid is formed between the workpiece 7 on the stage 8 and the die base 6, and then the coating is performed by moving the stage 8 relative to the die base 6.
- Form a film Force the stage 8 to move to the desired application area, or close the discharge side switching valve 4 before that, and finish the application.
- a portion 5 is provided between the syringe pump 3 and the die cap 6 for disposing a member for buffering discharge pulsation, and a member 5a for buffering pulsation is provided therein. It is arranged.
- the discharge sequence is started by the syringe pump 3
- the pressure inside the flow path rises due to the pressure loss of the liquid sending pipe and die slit, and the discharge pulsation generated by the coating liquid supply means and the become.
- This pressure pulsation causes a variation in the thickness of the coating film.
- a member for buffering the discharge pulsation in the coating liquid flow path buffers the effect, the discharge pulsation is made uniform, and the coating is uniform without a change in the film thickness.
- a membrane can be obtained.
- the member 5a for buffering the discharge pulsation is provided in the path between the syringe pump 3 and the die cap 6, but the branch pipe is provided in the path to buffer the pulsation. Is enclosed It is acceptable to provide a closed chamber. Force that is somewhat difficult in terms of engineering.
- a member that buffers the discharge pulsation may be provided in the syringe pump or die die.
- the member that buffers the discharge pulsation used in the present invention is a member that has the function of absorbing and mitigating the fluctuation of the internal pressure of the flow channel caused by the pulsation of the discharge by a change in the volume of the member, thereby equalizing the internal pressure of the flow channel.
- the properties required for a material to exhibit the desired forceful action include absorbing vibration and shock, fast response to volume changes due to fluctuations in external pressure, and Both the material that absorbs the discharge pulsation and the material that absorbs the discharge pulsation do not change, the flexibility does not deteriorate even if the density of the member that buffers the discharge pulsation by applying pressure increases, and the vibration does not occur when the volume changes. And no plastic deformation even with repeated compression.
- a member composed of a gas sealed in the inside and a material for sealing the gas is used.
- a material other than the above for example, a polymer-based elastomer such as acrylic rubber, urethane rubber, silicone rubber, butyl rubber, natural rubber, and fluoro rubber is used.
- a foamed elastic material such as a rubber or gel elastomer
- Materials for enclosing such a gas include general-purpose films such as polyethylene, polypropylene, polyester, polyvinyl alcohol, polyvinyl chloride, and polyvinylidene chloride, and polyatallylate rubber and polyether urethane rubber. And polymer-based elastomers such as silicone rubber, butyl rubber, natural rubber, and fluororubber. The responsiveness of the volume change of the enclosed gas seems to be impaired by the rigidity of the material for encapsulating the gas.
- the surface hardness when gas is sealed at normal pressure becomes 70 or less Shore C hardness, and 50 for the purpose of buffering weak pulsation.
- the use of the following materials does not hinder such gas volume changes that are preferred! If the material is sealed, the gas sealing pressure should be adjusted to the internal pressure of the flow path! May be set.
- the Shore C hardness described in the present invention is a value obtained by using an ASKER (registered trademark) C hardness meter manufactured by Kobunshi Keiki Co., Ltd.
- the apparent specific gravity of the member for buffering the discharge pulsation is preferably 2 or less, more preferably 4 or less, more preferably ⁇ ⁇ ⁇ ⁇ or less with respect to the true specific gravity of the material enclosing the gas. Less than 1/6.
- the lower limit is not particularly limited, but if it is too small, the noria of the enclosed gas is impaired, so that it is preferable that the above-mentioned gas noria be maintained.
- the apparent specific gravity of the member that buffers the discharge pulsation is obtained by dividing the mass of the entire member that buffers the discharge pulsation by the volume of the entire member, and the true specific gravity of the material that seals the gas is In addition, the mass of the material alone that seals the gas excluding the gas inside is divided by the volume of the material alone.
- preferable properties that the material for encapsulating the gas should have are low permeability to a liquid (a coating liquid component) and a gas, and solvent resistance depending on the coating liquid. I can do it.
- the coating liquid may enter the inside of the material, or conversely, the enclosed gas may permeate and escape to the outside. Since the pulsation damping effect may be impaired, the gas barrier is as high as possible! It is better to use an encapsulation material! ⁇ . For example, when air is used as the gas to be filled, it is necessary to consider the transmittance of nitrogen and oxygen, which are the main components of air.
- Examples of the film having a high gas noria property include a film having a surface subjected to a metal vapor deposition treatment, A film having high solvent resistance, or a composite film in which a heat-fusible material is coated or laminated on the inner wall to be heat sealable can also be preferably used.
- the use of these composite films is preferable because it is possible to obtain a member that is inexpensive, has good sealing properties, and has high resistance to solvent pulsation, and that absorbs pulsation.
- the same effect can be obtained by using a gas having a lower permeability than oxygen, for example, nitrogen or argon, as the gas used for the pulsation buffering member.
- a gas having a lower permeability than oxygen for example, nitrogen or argon
- the gas barrier property is high, and the gas barrier property is further improved by using a sealing material and a gas having low permeability in combination.
- a more preferable embodiment of the member for buffering the discharge pulsation of the present invention is to make the contact area with the coating liquid as large as possible so that the pulsation buffering effect can be obtained more effectively with a small volume. It is preferable to have a structure that does not cause wrinkling or constriction due to zigzag or Z or compression, and does not generate secondary vibration due to deformation of the member that buffers pulsation.
- the liquid contact area refers to the total area that is in contact with the coating liquid in a state where the member that buffers the discharge pulsation is disposed in the coating apparatus.
- the liquid contact area is preferably at least 60%, more preferably at least 80%, most preferably at least 95% of the surface area of the pulsation buffering member.
- the pulsation buffering effect can be more effectively obtained with a small volume.
- values at a coating liquid pressure of 1 atm and a temperature of 25 ° C are used.
- the flatness index A represented by the following formula (1) of the member that buffers the discharge pulsation is 1.4 or more and 20 or less.
- S is the liquid contact area (cm 2 ) of the member that buffers pulsation at 25 ° C. and 1 atm
- V represents the volume V (cm 3 ) of the member that buffers pulsation under the above conditions.
- the flatness index A represented by the above equation (1) is determined by the following equation.
- the force is several times the surface area of a true sphere of the same volume, and the greater the flatness index A, the flatter it is.
- the flatness index A is 1.
- the member for buffering the discharge pulsation two sheets of the encapsulating material are bonded together to form a flat shape in which the outer peripheral portion is sealed, in which the gas is sealed in a spherical shape. Since the liquid contact area is many times larger than in the case, a sufficient pulsation buffering effect can be obtained even if the volume of the sealed gas is small, and the pulsation is excellent in ejection response.
- pressure is uniformly applied from all directions to the members arranged in the flow path such that the entire surface is in contact with the coating liquid, but the compression of the substantially flat member to satisfy the above equation (1) is performed. Is limited to a flattened shape.
- the material that encloses the gas is unlikely to cause wrinkles and constrictions, so that the delay in volume change and the generation of vibration due to wrinkles and constrictions can be suppressed, and such a shape reduces the amount of deformation of the material itself. It is possible to reduce the required characteristics of the mechanical properties of the gas-filled material such as bending resistance, plastic deformation stress, and elastic recovery force. .
- the flatness index A is preferably 20 or less.
- the more preferable range of the flatness index A is 2 or more and 10 or less.
- the volume to be sealed may be appropriately determined depending on the pulsation intensity to be buffered and the required ejection responsiveness without any particular limitation.
- the member for buffering the discharge pulsation can be preferably used for intermittent coating applications in which discharge stability and discharge response of the pump are most important.
- the discharge speed is often low, and as a pump suitably used for such a purpose, for example, a piston type fixed amount pump can be mentioned.
- Vomit The output speed is a numerical value designed for the application, such as the size of the substrate to be applied and the application speed, and is not particularly limited.
- discharge amount Q per second coating liquid discharged from the unit is a 0. 1- 20 cm 3, even pulsation generated in a small pump very discharge speed, buffering the discharge responsiveness of fine pulsation It is possible to achieve both.
- the coating apparatus of the present invention is provided with a means 10 for further increasing the internal pressure of the flow path, which is different from the coating liquid supply means as shown in FIG. I like it.
- the means for further increasing the internal pressure of the flow path is a means for generating a region in which the internal pressure of the flow path increased by the coating liquid supply means when the means is provided is 1.1 times or more the internal pressure of the flow path when the means is not provided. Say. If a member for buffering the discharge pulsation is provided at a place where the internal pressure of the flow path is increased by such means, even if the discharge pulsation is very small, the response of the impact by the member is improved by the increased internal pressure of the flow path.
- the pulsation can be more effectively buffered, and the discharge can be stabilized by the volume restoration of the member even if the negative pressure pulsation occurs instantaneously.
- the means 10 for increasing the pressure in the flow path include a method in which a part of the flow path pipe is made thinner, and a method in which an orifice or an opening adjustment valve is provided in the flow path.
- the upper limit is preferably in the range of IMPa or less.
- the pressure is more preferably 0.5 MPa or less.
- the lower limit is not particularly limited, but if the internal pressure of the flow path does not reach a pressure capable of compressing the pulsation buffering member, the pulsation is buffered because the pressure pulsation is not naturally damped due to volume fluctuation. Even when a gas is used for the member, it is preferable to keep the internal pressure at least equal to the normal pressure.
- a means for detecting deterioration of a member for buffering pulsatile artery by grasping a rising gradient of the internal pressure of the flow path gradually increasing immediately after the start of discharge by using a pressure sensor and a recorder arranged on the pump discharge side is provided. By doing so, it will be possible to use it to issue warnings to prompt inspections and to stop pump supply.
- the black matrix existing between each pixel of RGB and between the pixels, and all or a part of the overcoat layer are formed using the coating apparatus of the present invention.
- the coating liquid itself can be made photosensitive or a photosensitive resist can be further applied thereon to form a pattern using a photolithography method.
- the obtained pattern is subjected to a process such as thermosetting if necessary, and is subjected to a process of forming a configuration such as an electrode and an alignment film, thereby forming a color filter.
- a process such as thermosetting if necessary
- a process of forming a configuration such as an electrode and an alignment film
- a method was used in which a single-wavelength Na lamp with a wavelength of 589 nm was irradiated onto the dried coating film surface and the reflected light was visually observed.
- This evaluation method uses a single-wavelength light source, so that the reflected light from the glass surface and the coating film surface force interfere with each other, so that even a very small variation in the coating film thickness can be visually recognized as interference unevenness. It is.
- the distance from the coating start position in the coating direction (hereafter referred to as the coating distance) is perpendicular to the coating direction in a range where the coating start position force is 30 to 70% of the distance to the coating end position.
- a force was observed in which there was streak-like interference unevenness in which the longitudinal direction was a direction (parallel to the die die), and judgment was made based on the following criteria.
- the average value of the film thickness in the range of coating distance 400mm-450mm (steady coating part) was taken as the average film thickness.
- Film thickness distribution width R is 0.005 / z m or less
- Thickness distribution width force s Larger than 0.01 / zm, force 0.33 / zm or less
- film thickness distribution width R is greater than 0.03 m
- the film thickness distribution width R is preferably as small as possible, but when it is 0.03 m or more, when it is used as a colored layer of a color filter, it will be used as a display unevenness when it is used as a display monitor with a thin film transistor liquid crystal panel for liquid crystal display devices. Can not do it.
- the gap becomes uneven in the liquid crystal layer of the liquid crystal display device, and the quality as a display monitor is deteriorated.
- Coating distance 2mm force When observing in the order of the coating distance in order, the distance from the coating start point force at the last point outside the range of ⁇ 0.5% of the average film thickness is defined as the coating stable distance. Evaluation was based on criteria.
- coating stable distance is larger than 15mm and 20mm or less
- the coating stable distance is larger than 20 mm, or the coating distance is larger than 50 mm. There are points where the coating thickness is out of the range of ⁇ 0.5% of the average film thickness in the range.
- Coating was continuously performed on 1000 glass substrates, and the 500th and 1000th coating films were subjected to the interference unevenness evaluation described in the above section A, and judged based on the following criteria.
- the interference unevenness of the 500th coating film is excellent, good or acceptable, and the 1000th coating film has no interference unevenness.
- FIG. 1 shows a flow chart of the liquid feeding of the slit die type coating apparatus which is the coating apparatus used in the present embodiment.
- a piston type syringe pump 3 having an inner diameter of 18 mm was used as a coating liquid supply means, and a die mouthpiece 6 having a discharge slit width of 620 mm and a slit gap of 100 m was used as a coating means.
- the suction side switching valve 2 is opened, and then the coating liquid is suctioned by the syringe pump 3 for 20.76 cm 3 , and the base material adsorbed and fixed to the stage 8
- the die cap 6 was brought close to the short side end of 7 (glass substrate) up to 100 m, and the discharge of the syringe pump 3 was started at a coating liquid discharge speed of 2.563 cm 3 Z seconds.
- the stage 8 is moved 750mm at a speed of 6mZ seconds, and a uniform coating is applied on the entire surface of the 620 x 750mm glass substrate 7. Formed.
- the internal pressure of the flow passage from the coating liquid supply means to the coating means was set to 0.1 OlMpa (only the piping pressure loss generated in the coating liquid path).
- the coated substrate is immediately put into a vacuum chamber and vacuum-dried, and then dried and cured at 90 ° C for 10 minutes in a hot-plate type curing furnace to have an average thickness of 3.73 ⁇ m. A coating was obtained.
- Table 1 shows the evaluation results.
- Thin streak-like interference unevenness was confirmed, with the longitudinal direction being the direction perpendicular to the coating direction (the direction parallel to the die die).
- This streak-like interference unevenness is caused by When moving the stage to form a coating film, the coating liquid bead vibrates due to the subtle change in the discharge speed of the die capping force, resulting in a change in the liquid level on the glass substrate. This is due to uneven thickness.
- the substrate obtained in this example was acceptable because thin stripe-shaped unevenness was visually recognized.
- the average film thickness in this example was 3.73 ⁇ m, and the evaluation range for judging that the coating was stable was 3
- the stable coating distance was 12 mm, which was judged to be good (Fig. 5-a).
- a one-dollar valve is installed as a means 10 for increasing the internal pressure of the flow path, and the pressure of the flow path between the coating liquid supply means and the needle valve is set to 0 by a pressure gauge 9. After adjusting the valve opening until IMPa was reached, a coating film was formed in the same manner as in Example 1.
- Table 1 shows the evaluation results.
- the balloon volume was completed to 1000 coated was measured by a measuring cylinder, the balloon volume including those Hatsufutomezai was reduced from about 0. 9cm 3 to about 0. 6 cm 3. Since the internal pressure of the flow channel is increased by the needle valve, it can be assumed that the enclosed air permeated the polyethylene, which is the material of the balloon, and gradually flowed out.
- a material that seals the gas of the discharge pulsation member 5a is a gas barrier film (PTS bag: Mitsubishi Gas Chemical Co., Ltd .: 5 cm x 20 mm) with a thickness of 112 ⁇ m.
- a coating film was formed in the same manner as in Example 2 except that 3 Zm 2 'dayMPa) was used.
- the stable coating distance of 14 mm was judged to be good.
- the evaluation of the 500th and 1000th sheets was excellent, with no interference unevenness visible at all, and the continuous use performance was judged to be excellent.
- the volume of the norain after completion of the application of 1,000 sheets was measured with a measuring cylinder, the volume of the member for buffering the discharge pulsation was about 0.9 cm 3 , and almost no change was observed.
- the arrival time of the flow path internal pressure immediately after the start of continuous application was about 0.9 seconds.
- the time required to reach the pressure with about 0.85 seconds at the end of coating 500 sheets is about 0.8 seconds, and the time to reach the pressure at the end of 100 sheets is about 0.6 seconds. there were.
- the volume of the pulsation absorbing member it was confirmed that the volume of the pulsation absorbing member was reduced by 0.3 cm 3 at the end of the application of 1000 sheets. I was able to confirm that I could.
- a coating film was formed in the same manner as in Example 3, except that the volume of the gas to be sealed was 0.7 cm 3 and the sealing shape was 25 ⁇ 30 mm.
- a silicone tube with an outer diameter of 6 mm and an inner diameter of 4 mm oxygen permeability 5000 cm 3 Zm 2 'dayMPa or more
- oxygen permeability 5000 cm 3 Zm 2 'dayMPa or more was plugged at both ends, and about 0.68 cm 3 of air was sealed inside.
- a coating film was formed in the same manner as in Example 5.
- Example 5 As a member for buffering the discharge pulsation, a member having the width of 2 mm at both ends of the member for buffering the discharge pulsation used in Example 5 fixed to the wall surface of the enclosure with metal fittings, and a state where one side is not in contact with the liquid is used.
- a coating film was formed in the same manner as in Example 5.
- the continuous use performance was excellent.
- a coating film was formed in the same manner as in Example 1, except that a member for buffering the discharge pulsation was not used as shown in the flow chart shown in FIG. Table 3 shows the evaluation results. Interference unevenness is not possible.
- a coating film was formed in the same manner as in Example 1 except that an air chamber type accumulator (volume: 50 cm 3 , airtightness: lcm 3 ) was used without using a member for buffering discharge pulsation.
- a coating film was formed in the same manner as in Example 1 except that a silicone rubber foam having a size of 40 ⁇ 40 mm and a thickness of 6 mm was arranged in the working channel liquid as a member for buffering the discharge pulsation.
- a color filter with a photospacer pillar and a liquid crystal display panel were produced by using the present invention.
- the reaction was carried out using pyrrolidone as a solvent to obtain a polyimide precursor (polyamic acid) solution.
- a carbon black mill base having the following composition was dispersed at 7000 rpm for 30 minutes using a homogenizer, and the glass beads were filtered to prepare a black paste.
- a black paste was applied to a 350 mm-size alkali-free glass substrate (OA-2, manufactured by NEC Corporation) using a spinner and semi-cured in an oven at 135 ° C for 20 minutes.
- a positive resist (Shipley Microposit (registered trademark) RC100 30 cp) was applied using a spinner and dried at 90 ° C. for 10 minutes.
- the resist film thickness was 1.5 m.
- the exposure was performed using a photomask PLA-501F, manufactured by Canon Inc., through a photomask having a pattern of a part of the pillars (base portion) outside the black matrix portion, the frame portion, and the screen.
- TMAH Umuhidorokishido
- 2 wt 0/0 inclusive 23 ° C aqueous developer the substrate was dipped in a developer, reciprocates once a 10cm width 5 seconds simultaneously.
- the development of the positive resist and the etching of the polyimide precursor were performed simultaneously.
- the development time was 60 seconds.
- the positive resist was peeled off with methylcellosolve acetate, further cured, and cured at 300 ° C. for 30 minutes to obtain a resin black matrix substrate having a pattern of a black matrix portion, a frame portion, and a base portion.
- the thickness of the resin black matrix was 0.90 / zm, and the OD value was 3.0.
- the reflectance (Y value) at the interface between the resin black matrix and the glass substrate was 1.2%. Area of the base of the column by ⁇ black matrix out of the screen was about 50000 m 2.
- the pillar base is also formed in the area that is cut off when the liquid crystal display device is used outside the screen. They were periodically arranged at equal intervals of about 1 piece per lcm 2 .
- red, green and blue pigments dianthraquinone pigments represented by Color Index No. 65300 Pigment Red 177, and phthalocyanines represented by Color Index No. 74265 Pigment Green 36, respectively.
- a green pigment, phthalocyanine blue pigment represented by Color Index No. 74160 Pigment Blue 15-4 was prepared. The pigments were mixed and dispersed in a polyimide precursor solution to obtain three types of colored pastes of red, green and blue.
- a blue paste was applied on a substrate, dried with hot air at 80 ° C for 10 minutes, and semi-cured at 120 ° C for 20 minutes.
- a positive resist (Shipley Microposit (registered trademark) SRC 100 30 cp) was applied with a spinner and dried at 80 ° C. for 20 minutes. Exposure was performed using a mask, the substrate was dipped in an alkaline developing solution (Shipley Microposit (registered trademark) 351), and while simultaneously moving the substrate, development of the positive resist and etching of the polyimide precursor were performed simultaneously. . Thereafter, the positive resist was stripped with methyl cellosolve acetate, and further cured at 300 ° C. for 30 minutes.
- the thickness of the colored pixel portion was 1.7 m.
- a blue colored layer was further formed on the frame, on the black matrix base outside the screen, together with the formation of blue pixels.
- the area of the base of the blue colored layer outside the screen was about 25000 ⁇ m, and the area of the base of the blue colored layer on the picture frame was about 500 ⁇ m.
- the thickness of the red pixel portion was 1.8 m.
- the pillar base was strong.
- the thickness of the green pixel portion was 1.5 m.
- a photosensitive JSR negative type acrylic material (NN810 or NN700) was used for the column material.
- the coating apparatus of Example 5 was used, and in Comparative Example 5, the coating apparatus of Comparative Example 1 was used. In the same manner as in Example 5 using the above method.
- the coated substrate is immediately put into a vacuum chamber and dried under vacuum, and then dried and cured at 90 ° C for 10 minutes in a hot plate type curing furnace to obtain an average film having no interference unevenness. A dry coating having a thickness of 3.73 m was obtained.
- an exposure machine (canon 1 ⁇ ⁇ -? 50 ⁇ ) were irradiated to mask exposure the use Ite 20011] 17.111 2 (i-line) a.
- the substrate was dipped in a TMAH aqueous solution (0.15%), and the development pattern jung was simultaneously performed while simultaneously swinging the substrate.
- the pillars were formed on the black matrix base inside the screen and on the picture frame and outside the screen using this puttering, and then dried and cured at 279 ° C for 20 minutes in a hot plate type curing furnace.
- area on pillars ⁇ in the screen is about 110 m 2, area under ⁇ layer was about 120 m 2.
- the area above the resin pillars outside the screen was about 10,000 ⁇ m 2 (size 100 x 100 m), and the area under the resin layer was about 12000 m 2 (size 110 XI 10 m).
- the column height was 3.1 / zm.
- the columns in the screen were provided at a ratio of one per 3W3 ⁇ 4 (1W3 ⁇ 4: 100 m x 300 ⁇ m).
- a polyimide-based alignment film was provided on the color filter of Example 10 and rubbed. Further, a counter substrate with a transparent electrode provided with a thin film transistor element was prepared, a polyimide-based alignment film was similarly provided, and a rubbing treatment was performed. After bonding the color filter provided with the alignment film and the transparent electrode substrate provided with the thin film transistor element using a sealant, unnecessary regions outside the screen were cut off. Next, liquid crystal was injected from the injection rocker provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning to normal pressure.
- the inlet was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell.
- the obtained liquid crystal panel body was able to secure a uniform cell gap with a photospacer pillar having no unevenness in height, and had good display quality.
- the present invention provides a coating apparatus for applying a coating liquid to a substrate, in which, when discharge pulsation caused by vibration of a liquid feed pump or the like impairs uniformity of a coating film, the discharge pulsation is reduced to achieve uniform discharge.
- This is a technology that realizes coating film formation.
- even a very small change in the film thickness is visually recognized as display unevenness and is considered to affect the quality. It can be suitably used for thin film coating technology.
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006511438A JPWO2005092515A1 (ja) | 2004-03-25 | 2005-03-17 | 塗工装置、塗工方法およびそれから得られる表示部材 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004088796 | 2004-03-25 | ||
JP2004-088796 | 2004-03-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005092515A1 true WO2005092515A1 (ja) | 2005-10-06 |
Family
ID=35056032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/004744 WO2005092515A1 (ja) | 2004-03-25 | 2005-03-17 | 塗工装置、塗工方法およびそれから得られる表示部材 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPWO2005092515A1 (ja) |
CN (1) | CN1933920A (ja) |
TW (1) | TW200538208A (ja) |
WO (1) | WO2005092515A1 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007000732A (ja) * | 2005-06-22 | 2007-01-11 | Toppan Printing Co Ltd | 単板塗布装置および塗布方法 |
DE102004010774B4 (de) * | 2003-03-18 | 2009-07-02 | Heishin Sobi K.K. | Materialzuführsystem |
JP2010078004A (ja) * | 2008-09-24 | 2010-04-08 | Fujifilm Corp | 送液方法、及び塗布方法 |
JP2010227785A (ja) * | 2009-03-26 | 2010-10-14 | Toray Eng Co Ltd | ポンプ装置及び塗布装置 |
WO2010147054A1 (ja) * | 2009-06-15 | 2010-12-23 | 武蔵エンジニアリング株式会社 | 高粘性材料の定量吐出装置および方法 |
DE102004003683B4 (de) * | 2003-02-21 | 2015-06-18 | Heishin Sobi K.K. | Flüssigmaterial-Versorgungssystem |
DE102015110883A1 (de) * | 2015-07-06 | 2017-01-12 | J. Wagner Gmbh | Pulsationsdämpfungssystem |
JP7488719B2 (ja) | 2020-08-19 | 2024-05-22 | 株式会社ヒラノテクシード | 間欠塗工装置 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101695332B1 (ko) * | 2009-11-12 | 2017-01-11 | 주식회사 탑 엔지니어링 | 액정공급장치 |
WO2012165326A1 (ja) * | 2011-06-01 | 2012-12-06 | タツモ株式会社 | ポンプの流量制御方法および塗膜形成方法 |
CN104350450B (zh) * | 2012-05-31 | 2018-01-26 | 大日本印刷株式会社 | 静电电容式触摸面板基板和显示装置 |
DE202012008417U1 (de) * | 2012-07-10 | 2012-09-27 | Heidelberger Druckmaschinen Ag | Vorrichtung zum Auftragen von Klebstoff |
CN103706515A (zh) * | 2014-01-03 | 2014-04-09 | 温州大学 | 一种自动涂料系统及涂料方法 |
JP6510765B2 (ja) * | 2014-05-02 | 2019-05-08 | 兵神装備株式会社 | 流動物吐出システム、及びアキュムレータ |
TWI558471B (zh) * | 2014-12-01 | 2016-11-21 | Wei Kuang Automation Co Ltd | Coating machine for multi-phase glue device |
JP7008326B2 (ja) * | 2017-12-05 | 2022-01-25 | 兵神装備株式会社 | 吐出システム |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6024901U (ja) * | 1983-07-28 | 1985-02-20 | 日産自動車株式会社 | アキユムレ−タ |
JPH03172698A (ja) * | 1989-11-30 | 1991-07-26 | Mitsubishi Heavy Ind Ltd | 圧力脈動吸収装置 |
JPH09192568A (ja) * | 1996-01-22 | 1997-07-29 | Chugai Ro Co Ltd | ダイコータへの塗料供給装置 |
JPH1130387A (ja) * | 1997-07-09 | 1999-02-02 | Mitsubishi Heavy Ind Ltd | 変動圧力低減装置 |
-
2005
- 2005-03-17 CN CN200580009576.3A patent/CN1933920A/zh active Pending
- 2005-03-17 WO PCT/JP2005/004744 patent/WO2005092515A1/ja active Application Filing
- 2005-03-17 JP JP2006511438A patent/JPWO2005092515A1/ja not_active Withdrawn
- 2005-03-24 TW TW094109046A patent/TW200538208A/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6024901U (ja) * | 1983-07-28 | 1985-02-20 | 日産自動車株式会社 | アキユムレ−タ |
JPH03172698A (ja) * | 1989-11-30 | 1991-07-26 | Mitsubishi Heavy Ind Ltd | 圧力脈動吸収装置 |
JPH09192568A (ja) * | 1996-01-22 | 1997-07-29 | Chugai Ro Co Ltd | ダイコータへの塗料供給装置 |
JPH1130387A (ja) * | 1997-07-09 | 1999-02-02 | Mitsubishi Heavy Ind Ltd | 変動圧力低減装置 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004003683B4 (de) * | 2003-02-21 | 2015-06-18 | Heishin Sobi K.K. | Flüssigmaterial-Versorgungssystem |
DE102004010774B4 (de) * | 2003-03-18 | 2009-07-02 | Heishin Sobi K.K. | Materialzuführsystem |
JP2007000732A (ja) * | 2005-06-22 | 2007-01-11 | Toppan Printing Co Ltd | 単板塗布装置および塗布方法 |
JP2010078004A (ja) * | 2008-09-24 | 2010-04-08 | Fujifilm Corp | 送液方法、及び塗布方法 |
JP2010227785A (ja) * | 2009-03-26 | 2010-10-14 | Toray Eng Co Ltd | ポンプ装置及び塗布装置 |
WO2010147054A1 (ja) * | 2009-06-15 | 2010-12-23 | 武蔵エンジニアリング株式会社 | 高粘性材料の定量吐出装置および方法 |
JP2010284627A (ja) * | 2009-06-15 | 2010-12-24 | Musashi Eng Co Ltd | 高粘性材料の定量吐出装置および方法 |
US8453886B2 (en) | 2009-06-15 | 2013-06-04 | Musashi Engineering, Inc. | Device and method for discharging constant amount of high-viscosity material |
DE102015110883A1 (de) * | 2015-07-06 | 2017-01-12 | J. Wagner Gmbh | Pulsationsdämpfungssystem |
JP7488719B2 (ja) | 2020-08-19 | 2024-05-22 | 株式会社ヒラノテクシード | 間欠塗工装置 |
Also Published As
Publication number | Publication date |
---|---|
CN1933920A (zh) | 2007-03-21 |
JPWO2005092515A1 (ja) | 2008-02-07 |
TW200538208A (en) | 2005-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2005092515A1 (ja) | 塗工装置、塗工方法およびそれから得られる表示部材 | |
US20050271832A1 (en) | Manufacturing method and manufacturing system of liquid crystal display, liquid crystal display, and electronic apparatus | |
JP4391211B2 (ja) | 液晶表示装置の製造方法及びそれに用いる液晶滴下装置 | |
TWI291379B (en) | Liquid crystal dispensing apparatus | |
TWI242471B (en) | Liquid crystal dispensing system | |
JP2007181807A (ja) | シール材塗布装置、シール材塗布方法及びこれを用いた液晶表示素子の製造方法 | |
JP2008075537A (ja) | 脈動吸収装置、それを用いた塗布方法および塗布装置並びに液晶ディスプレイ用部材の製造方法 | |
CN102636912B (zh) | 液晶显示装置及其制作方法 | |
KR20070019698A (ko) | 도포장치, 도포방법 및 그것으로부터 얻어지는 표시부재 | |
JP4047742B2 (ja) | 一体化されたニードルシートを有した液晶滴下装置 | |
US7362411B2 (en) | Pattern mask, liquid crystal injection process, and method of fabricating LCD device using the same | |
US6803986B2 (en) | Method of fabricating a liquid crystal display cell | |
KR101674601B1 (ko) | 액체 적하기의 노즐 표면 개질 방법 | |
KR20050060973A (ko) | 액정적하장치 | |
KR20100137923A (ko) | 진공합착에 의한 epd 소자의 제조방법 | |
CN101458415B (zh) | 显示面板的制造方法及其显示介质排列结构 | |
US8300204B2 (en) | System and method for dispensing liquid crystal material and method for fabricating liquid crystal display device using the same | |
US9250467B2 (en) | Manufacturing mold and manufacturing method for color filter | |
JP2002219396A (ja) | 塗工装置、塗工方法およびこれらを用いて製造されたカラーフィルタ、またはカラー液晶表示装置 | |
KR101239822B1 (ko) | 액정표시장치용 실런트 적하장치 및 이를 이용한 실패턴형성방법 | |
KR20050047349A (ko) | 필터를 구비한 액정적하장치 | |
KR101131249B1 (ko) | 액정적하장치 및 적하방법 | |
JPH0618905A (ja) | 液晶表示器の製造方法 | |
JP2004203987A (ja) | ネマチック液晶組成物及びそれを用いた液晶表示装置 | |
TW201316101A (zh) | 液晶顯示面板之製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2006511438 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020067018095 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 200580009576.3 Country of ref document: CN |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWW | Wipo information: withdrawn in national office |
Country of ref document: DE |
|
WWP | Wipo information: published in national office |
Ref document number: 1020067018095 Country of ref document: KR |
|
122 | Ep: pct application non-entry in european phase |