WO2005073435A1 - 封孔処理剤、封孔処理方法、及びその処理剤で処理されたプリント基板 - Google Patents
封孔処理剤、封孔処理方法、及びその処理剤で処理されたプリント基板 Download PDFInfo
- Publication number
- WO2005073435A1 WO2005073435A1 PCT/JP2005/000754 JP2005000754W WO2005073435A1 WO 2005073435 A1 WO2005073435 A1 WO 2005073435A1 JP 2005000754 W JP2005000754 W JP 2005000754W WO 2005073435 A1 WO2005073435 A1 WO 2005073435A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sealing agent
- sealing
- printed circuit
- circuit board
- agent
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
Definitions
- Sealing treatment agent Sealing treatment agent, sealing treatment method, and printed circuit board treated with the treatment agent
- the present invention relates to a sealing agent, particularly a sealing agent for gold or a gold alloy plating material, which is provided with a base material of nickel or a nickel-containing alloy of a metal material, and a method of treating the same.
- a sealing agent particularly a sealing agent for gold or a gold alloy plating material, which is provided with a base material of nickel or a nickel-containing alloy of a metal material, and a method of treating the same.
- gold plating is performed by applying nickel plating as a base plating on a copper-based base material.
- a sealing treatment is generally performed.
- the sealing treatment includes an organic type and an inorganic type. Since organic solvents generally use a halogen-based organic solvent as a solvent, there is a problem in terms of effects on the human body and effects on the environment such as depletion of the ozone layer. Chromate method is well known for inorganic materials. However, in addition to the increase in contact resistance, the solution contains hexavalent chromium and the effect on the human body and the environment is a problem. [0005] In order to address these problems, there has been proposed an aqueous sealing agent in which an organic inhibitor is solubilized in water with a surfactant and an emulsifier.
- Patent Document 1 discloses that a specific benzotriazole-based compound, a mercaptobenzothiazole-based compound, and a triazine-based compound are used as inhibitors.
- a specific benzotriazole-based compound, a mercaptobenzothiazole-based compound, and a triazine-based compound are used as inhibitors.
- One or more selected compounds, a lubricant, and an emulsifier An aqueous sealing agent is disclosed.
- Patent Document 2 discloses that a benzotriazole-based compound, a mercaptobenzothiazole-based compound, and a triazine-based compound are used as inhibitors. And a water-based sealing agent containing an amine compound.
- Patent Document 1 Japanese Patent No. 2804453
- Patent Document 2 JP 2003-129257 A
- An object of the present invention is to provide an improved sealing agent and a sealing method capable of satisfying such a demand, and a printed circuit board treated with the agent.
- the present invention is as follows. (1) One or more of the heterocyclic conjugates or salts thereof containing a mercapto group in a total content of 0.001 to 0.1% and a surfactant of 0.01 to 1%. A pore-sealing agent whose pH is adjusted to 10 or less.
- the first essential component of the pore-sealing agent of the present invention one or two or more of a mercapto group-containing heterocyclic compound or a salt thereof is selected, and a total of 0.1 or more is contained in the treating agent.
- 001-0.1 Contains 1 wt%. These compounds react with nickel, which is the underlying metal inside the pinhole, to form a complex, and the pinhole is filled with the complex. Corrosion resistance is improved.
- the heterocyclic compound containing a mercapto group used in the present invention is preferably a compound having a 5-membered or 6-membered heterocyclic ring containing at least one nitrogen and condensed with an aromatic ring. You may. More preferably, a compound represented by the following formula is used. In addition, the use of these salts (sodium salt, potassium salt, ammonium salt, amine salt, etc.) is preferred.
- Lwt% ⁇ is of these compounds is less than 0. 001wt% not observed sealing treatment effect, exceeds 0. l W t% Adverse effects on contact resistance are observed. Preferably, it is 0.005 to 0.05 wt%.
- the corrosion resistance was improved by adding 0.01- ⁇ % of a surfactant. I put it out. This is considered to be because the surfactant force lowers the surface tension of water and improves the permeability of the mercapto group-containing heterocyclic compound or its salt into the pinhole. If the amount of the surfactant is less than 0.01% by weight, sufficient penetration into the pinholes described above cannot be obtained, and sufficient corrosion resistance cannot be obtained. On the other hand, if it exceeds 1%, the washing effect of the surfactant is enhanced, and the adsorption of the heterocyclic compound containing a mercapto group or a salt thereof is inhibited, so that a sufficient effect cannot be obtained.
- the surfactant one or more commercially available anionic, cationic, nonionic and amphoteric surfactants can be appropriately selected and used.
- a-one type there are phenols of norphenol with ethylene oxide (ethylene oxide moles 6 to 12) and intermediate alcohols of ethylene oxide with moles (ethylene oxide moles 6 to 12).
- a sulfate type and a phosphate type are particularly preferable.
- the sealing agent described in Japanese Patent No. 2804453 includes a lubricant and an emulsifier to form a water-repellent film and impart lubricity and corrosion resistance. Further, the sealant described in JP-A-2003-129257 is said to improve corrosion resistance because the metal surface shows water repellency by adding an amine conjugate. However, when the metal surface becomes water-repellent, it repels the flux or solder alloy applied for the purpose of improving the wettability, so that the solder wettability deteriorates greatly.
- the present invention does not include the above-mentioned component for imparting water repellency to the metal surface, and therefore does not deteriorate solder wettability.
- a mercapto group-containing heterocyclic compound having a mercapto group is present in a pinhole due to a penetration action of a surfactant.
- a surfactant it was found that by setting the pH of the solution to 10 or less in addition to promoting the complex formation of a salt thereof, corrosion resistance equivalent to or higher than that of a conventional pore-treating agent can be obtained.
- the pH of the solution When the pH of the solution is required to be 10 or less, and the pH becomes 7 or less, when the concentration of the heterocyclic compound having a mercapto group or the salt thereof is high, the complex having a mercapto group with the passage of time is obtained. It is preferable to use the compound in the range of PH8-10 from the viewpoint of bath life and process control because the cyclic conjugate or the salt thereof may be precipitated.
- Pre-Processing Force It is expected that the pH of the sealing solution will fluctuate during use by bringing the liquid into the sealing bath. In order to minimize this pH fluctuation, it is desirable to add a pH buffer.
- the substance having a pH buffering ability in the pH range of the present invention include alkali metal salts of pyrophosphate, alkali metal salts of tripolyphosphate, alkali metal salts of boric acid, alkali metal salts of tetraborate, and alkali metal salts of glutamic acid. Ammonia water, diethanolamine, diethylenetriamine and the like can be mentioned.
- the pore-treating agent of the present invention has the above-described components, and the solvent can be appropriately selected from water or an organic solvent containing no halogen such as ethanol, acetone, and normal paraffin. However, considering economics and flammability, water is the most suitable solvent. If the solvent is water, heating the solution to 40-80 ° C will speed up the emulsification of the components in water, and will facilitate drying of the processed material.
- any method such as spraying or applying a force for immersing a plated product in a treatment agent can be used.
- the treatment in that line enhances various functions of the sealing treatment. Is high.
- a phosphor bronze substrate for panel (C5210, 25 mm ⁇ 20 mm ⁇ O. 4 mm) was plated with 1 ⁇ m nickel in a Watts bath, and then 0.1 ⁇ m in gold was plated in a cyan bath.
- This gold-plated substrate is treated with a sealing agent having the composition shown in Table 1 at a bath temperature of 50 ° C and an immersion time of 20 seconds, and then washed with water and dried to seal the gold-plated surface. A treated film was formed. Note that ion-exchanged water was used as a solvent for the pore-sealing agent.
- the substrates were subjected to a salt spray test (based on CFISZ2371) for 24 hours to evaluate corrosion resistance.
- a flux (RM-26, manufactured by Tamura Kaken) diluted twice with isopropyl alcohol is applied to the entire surface of the substrate, left for 10 minutes, and then solder balls (Sparkling Ball S, 5 pieces of Sn—37% Pb, 0.6 mm ⁇ , manufactured by Senju Metal Industry Co., Ltd.), heated (preheated) on a hot plate maintained at 150 ° C. for 2 minutes, and then heated at 230 ° C. Heating was performed on the plate for 30 seconds.
- Lubricant Oleic acid 0.3wt%
- Emulsifier Lauryl acid phosphate monoester 0.3wt%
- Inhibitor benzotriazole 0.05 wt%
- Amine compound triethanolamine lwt%
- Phosphate ester surfactant EN-2P (manufactured by Aoki Oil Industry) 0.1 lwt% [0029] [Table 1-1]
- Example 4 3 Recovery—1, 2, 4-tria, sol ”0.01: Enter: 'Refeno / ethylene side 2 29.5 ⁇ ⁇
- the sealing agent of the present invention does not contain a substance that pollutes the environment, and the sealing agent is treated with the sealing agent of the present invention. It does not deteriorate solder wettability.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005517426A JP4397376B2 (ja) | 2004-01-30 | 2005-01-21 | 封孔処理剤、封孔処理方法、及びその処理剤で処理されたプリント基板 |
CN2005800035457A CN1914359B (zh) | 2004-01-30 | 2005-01-21 | 封孔处理剂、封孔处理方法、及用该处理剂处理的印刷基板 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004-023280 | 2004-01-30 | ||
JP2004023280 | 2004-01-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005073435A1 true WO2005073435A1 (ja) | 2005-08-11 |
Family
ID=34823864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2005/000754 WO2005073435A1 (ja) | 2004-01-30 | 2005-01-21 | 封孔処理剤、封孔処理方法、及びその処理剤で処理されたプリント基板 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4397376B2 (ja) |
CN (1) | CN1914359B (ja) |
TW (1) | TWI268967B (ja) |
WO (1) | WO2005073435A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2142485A1 (en) * | 2007-04-18 | 2010-01-13 | Enthone, Inc. | Metallic surface enhancement |
JP2012172190A (ja) * | 2011-02-21 | 2012-09-10 | Daiwa Fine Chemicals Co Ltd (Laboratory) | 封孔処理剤溶液及びそれを用いた封孔処理方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101580951B (zh) * | 2008-05-12 | 2011-03-30 | 比亚迪股份有限公司 | 一种提高镀铬产品的耐蚀性的方法 |
US20190112726A1 (en) * | 2016-03-28 | 2019-04-18 | Okuno Chemical Industries Co., Ltd. | Sealing liquid for anodic oxide coating films of aluminum alloy, concentrated liquid and sealing method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03215697A (ja) * | 1990-01-19 | 1991-09-20 | Meidensha Corp | 金属材料の封孔処理方法 |
JPH05311495A (ja) * | 1991-12-25 | 1993-11-22 | Nikko Kinzoku Kk | 貴金属めっき材の封孔処理方法 |
JP2003129257A (ja) * | 2001-10-19 | 2003-05-08 | Yuken Industry Co Ltd | 金めっき封孔処理剤 |
-
2005
- 2005-01-21 CN CN2005800035457A patent/CN1914359B/zh active Active
- 2005-01-21 WO PCT/JP2005/000754 patent/WO2005073435A1/ja active Application Filing
- 2005-01-21 JP JP2005517426A patent/JP4397376B2/ja active Active
- 2005-01-27 TW TW094102439A patent/TWI268967B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03215697A (ja) * | 1990-01-19 | 1991-09-20 | Meidensha Corp | 金属材料の封孔処理方法 |
JPH05311495A (ja) * | 1991-12-25 | 1993-11-22 | Nikko Kinzoku Kk | 貴金属めっき材の封孔処理方法 |
JP2003129257A (ja) * | 2001-10-19 | 2003-05-08 | Yuken Industry Co Ltd | 金めっき封孔処理剤 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2142485A1 (en) * | 2007-04-18 | 2010-01-13 | Enthone, Inc. | Metallic surface enhancement |
JP2010525169A (ja) * | 2007-04-18 | 2010-07-22 | エントン インコーポレイテッド | 金属表面の強化 |
US8741390B2 (en) | 2007-04-18 | 2014-06-03 | Enthone Inc. | Metallic surface enhancement |
EP2142485A4 (en) * | 2007-04-18 | 2014-10-22 | Enthone | IMPROVEMENT OF METAL SURFACES |
JP2012172190A (ja) * | 2011-02-21 | 2012-09-10 | Daiwa Fine Chemicals Co Ltd (Laboratory) | 封孔処理剤溶液及びそれを用いた封孔処理方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI268967B (en) | 2006-12-21 |
JPWO2005073435A1 (ja) | 2007-09-13 |
TW200526817A (en) | 2005-08-16 |
JP4397376B2 (ja) | 2010-01-13 |
CN1914359B (zh) | 2011-12-28 |
CN1914359A (zh) | 2007-02-14 |
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