TW200526817A - Sealing agent, sealing method and printed board treated with said sealing agent - Google Patents
Sealing agent, sealing method and printed board treated with said sealing agent Download PDFInfo
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- TW200526817A TW200526817A TW094102439A TW94102439A TW200526817A TW 200526817 A TW200526817 A TW 200526817A TW 094102439 A TW094102439 A TW 094102439A TW 94102439 A TW94102439 A TW 94102439A TW 200526817 A TW200526817 A TW 200526817A
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- sealing treatment
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
200526817 九、發明說明: 【發明所屬之技術領域】 本發明係有關封孔處理 或含有鋅之八入— 尤其疋有關具備已電鍍鎳 •料用:…屬材料作為底層之金或金合金電,材 過之印刷基板/封孔處理方法、以及用該處理劑處理 【先前技術】 求高件業界,在電子計算機或通信機器等要 、电子機态之接點部分使用鍍金。 =年來之電子機器小型化、⑪度化 行錢金之比例比以二:件(連接器、開關、印㈣^ 電鑛後鑛金為在銅系之母材上實施鑛錄作為底層 於電子機器大都要求經濟性。上述之鑛金由 成本。门貝所以一般將鑛金之厚度變薄,以謀求降低 氣孔若變薄,則覆膜令之氣孔將呈對數增加,該 化物、氣化物等)侵人^腐㈣物質(水分、硫 該腐巍生成物合她/::广池,腐勤底層及基材。 等問題。θ “表面析出,導至發生接觸電阻惡化 角午決该問題之方法一 t J 一 π + 機系及血機系等方丰古丁、处理。封孔處理有有 ...... 有機系由於-般使用鹵素系有機溶 3J67J0 • 200526817 劑作為溶劑,從對人體之一 塑耸〜曰及六、虱層破壞等對環境之影 令寻喊點會有問題。1檣么 L 、枝不已知有鉻酸鹽法,但是除了接 包上幵之外,由於溶液中令右丄>ί西处 士 _境之影響等問題。 鉻’㈣人體及環 對於該等問題之對策,提案有使用界面活性劑及乳化 為有機系抑制劑之可溶於水之水系封孔處理劑。 例如’於專利文獻1揭示含有1種或2種以上選自& :二:并三唾系化合物、魏基苯并噻哇系化合物及三哼 制劑:水之化合物、潤滑劑、以及乳化劑作為抑 市」d之水系封孔處理劑。 /於專利文獻2揭示含有1種或2種以上選自由笨 唑系化合物、巯基苯并嗦η _ ^ ^ - 組群之化人物秦系化合物所成 水李心丨/ 性劑、以及胺化合物作為抑制劑之 水糸封孔處理劑。 W < 包括上述之專利,由於以往之封孔處 •連接器等之接點用途,所以需賦予插拔性 可經由在覆膜卜涂款曰+ 文水之特性 4、 ^上X佈具有潤滑性之成分達成,進而哕古^ 、分=大氣中腐钱成分之障壁,賦予对腐餘性。〆’ 時,=將封孔處理劑用於印刷基板之焊墊部分 ^開,有銜接部分之焊接濕潤性顯著劣化之問^錫合 利文獻1 ··曰本專利2804453號公報 專利文獻2 :日本專利公開2003-1 29257號公報 【發明内容】 31671〇 200526817 無環境污染性問題且經由處理可具有與以往同等以上 且焊錫潤濕性不會惡化之封孔處理劑及 經改善之封孔處理劑、封孔處理方法 1要木之 理之印刷基板為目的。 ^以及㈣處理劑處 為了解決上述之問題點,本案發明人 發現以下所示之封孔處理劑及使用該處理:封 雜環式化合物或其鹽1種或2種以上、合 一、 · Wt%,以及界面活性劑0· 01至lwt%,並將 命液之pfH直调整在1〇以下之範圍之封孔處理齊卜0 ' pH值調整在8至1〇範圍為特徵之上述 U J揭不之封孔處理劑。 (3)以使用上述⑴或⑵揭示之封孔處理劑進行封孔處理 為特徵之封孔處理方法。 〜 ⑷以使用上述⑴或⑵揭示之封孔處 之印刷基板。 王尥馮将倣 【實施方式】 [貫施本發明之最佳形態] 本發明封孔處理劑之第一必須成分 =化合物或其鹽之丨種或2種以上’在處理 .001至〇.跡該等化合物與作為 鎳進:反應生成™ :軋奄埋,結果可提昇鍍金之耐腐蝕性。 316710 7 -200526817 本發明使用之含有巯基之雜 有1個氮原子之具有5員雜严衣。:物,較好為至少含 芳環進行縮合。更佳者可;,】:'6員雜環之化合物,可與 使用該等之鹽(鈉鹽、、牛17述式表示之化合物。亦可 [化1] 義、鉍鹽、胺鹽等)。200526817 IX. Description of the invention: [Technical field to which the invention belongs] The present invention is related to sealing treatment or containing zinc zinc-especially 疋 related to having electroplated nickel material: ... a gold or gold alloy with the material as the bottom layer, Printed board / sealing treatment method based on material and treatment with the treatment agent [Prior art] In the high-end industry, gold-plating is used for the contact parts of electronic and computer equipment such as electronic and computer equipment. = In the past years, the ratio of miniaturization and advancement of electronic equipment has been divided into two: pieces (connectors, switches, seals, etc.) ^ After mining, gold is used as the bottom layer of electronics on the copper base material. Most of the machines require economic efficiency. The above-mentioned mined gold comes at a cost. Therefore, Menbei generally reduces the thickness of mined gold in order to reduce the pores. If the pores become thin, the pores will increase logarithmically, such compounds, vapors, etc. ) Intrusive ^ Rotten substances (water, sulfur, this rotten product combined with // :: Guangchi, the bottom layer of the ground and the substrate. Etc.). Θ "Surface precipitation, leading to the deterioration of contact resistance. Method one t J one π + mechanical system and blood mechanical system, etc. Fang Feng Guding, treatment. Sealing treatment has ... Organic systems due to the general use of halogen-based organic solvents 3J67J0 • 200526817 agent as a solvent, from Shaping one of the human body ~ The damage to the environment such as the damage of the lice layer will cause problems with the shouting point. 1 樯 L L, branches are not known to have a chromate method, but in addition to the bag, Due to the influence of the right 丄 in the solution “ the west priest _ environment and other issues. Chromium ㈣ ㈣ human body In response to these problems, HOWA proposes the use of surfactants and water-soluble water-soluble plugging agents emulsified as organic inhibitors. For example, 'Patent Document 1 discloses that one or two or more kinds are selected from &: two: sialosalic compounds, Weicyl benzothiwa compounds, and Sanhum formulations: water compounds, lubricants, and emulsifiers are used as water-based plugging treatment agents to suppress the market. "/ Patent Literature 2 Reveals that it contains one or two or more compounds selected from the group consisting of benzole compounds, mercaptobenzopyrene η ^ ^ ^-a group of chemical compounds made from the Qin compound, a sex agent, and an amine compound as an inhibitor. Sealing treatment agent W < Including the above-mentioned patents, due to the use of contacts in conventional sealing places and connectors, it is necessary to provide pluggability through the characteristics of the coating film + Wenshui 4, ^ The upper X cloth has a lubricating component, and it is ancient. ^, Points = barriers to the rotten components in the atmosphere, which provide resistance to rot. When 〆 ', = a sealing agent is used for the pad portion of the printed circuit board. ^ On, the welding wettability of the connecting part is significant Question of deterioration ^ Xiheli Document 1 · Japanese Patent Publication No. 2804453 Patent Document 2: Japanese Patent Publication No. 2003-1 29257 [Summary of the Invention] 31671〇200526817 There is no environmental pollution problem and the treatment can be equivalent to the conventional one The above-mentioned sealing treatment agent, solder sealing treatment agent, and improved sealing treatment agent and sealing treatment method 1 are intended to solve the above-mentioned problems. ^ And the treatment agent is to solve the above problems. The inventors of the present case have discovered the following sealing treatment agent and use of the treatment: one or two or more of a heterocyclic compound or a salt thereof, one, · Wt%, and a surfactant 0.1 to 1 wt% And the sealing treatment agent which is characterized by adjusting the pfH of the life fluid directly to a range of 10 or less and adjusting the 0 'pH value to a range of 8 to 10. (3) A plugging treatment method characterized by performing a plugging treatment using the plugging treatment agent disclosed by the above-mentioned ⑴ or ⑵. ~ ⑷ Use the printed circuit board at the sealing hole disclosed in ⑴ or ⑴ above. Wang Yifeng will imitate [embodiment] [perform the best form of the present invention] The first necessary component of the sealing agent of the present invention = one or two or more compounds or salts thereof. These compounds are reacted with nickel to form: reaction formation ™: rolling and burying, as a result, the corrosion resistance of gold plating can be improved. 316710 7 -200526817 The thiol group-containing heterocycle used in the present invention has one nitrogen atom and a 5-member heterocycle. : Condensation, preferably at least an aromatic ring. The better is ;,]: '6-membered heterocyclic compounds, and the use of these salts (sodium salt, the compound represented by the formula described in cattle 17). Also, bismuth salt, amine salt, etc. ).
SH 該等化合物之木力 -η ηπι +0/ j、、加I在 0.001 至 o.lwU之範圍 涡〇· OOlwt%,則無钮了丨忐 、孔處理效果,若超過0. lwt%,| 3]67]0 :200526817 觸電阻有不良影響。較好為0.005至〇〇5wt%。 又,經由添加界面活性劑0.01至lwt%,發現耐腐蝕 性昇高。認為是因界面活性劑可降低水之表面張力,提昇 含有巯基之雜環化合物或其鹽對氣孔之浸透性所致。 界面活性劑之添加量若未滿〇· 〇lwt%,則不能獲得對 上述氣孔之充分浸透性而不能獲得充分之耐腐蝕性。又, 若超過lwt%時,則界面活性劑具有之洗淨效果變強,阻礙 3有巯基之雜環化合物或其鹽之吸附,不能獲得充分之效 杲。 么界面活性劑可適當選擇1種或2種以上市售之陰離子 尔、陽離子系、非離子系、以及兩性界面活性劑使用。尤 /、疋溶液之pH值在8至1 〇之範圍使用時,以適當選擇1 種或2種以上陰離子系、非離子系、以及兩性界面活性劑 使用車乂 4土。#中,自離子界面活性劑以壬基苯酉分之環氧乙 烷附加物(環氧乙垸莫耳數為6至12)或中級醇環氧乙烧附 φ加物(壤乳乙烧莫耳數為6至12)更佳。陰離子界面活性劑 以硫酸鹽型、磷酸酯型更佳。 一日本專剎第2804453號公報揭示之封孔處理劑,由於 3/潤滑劑及乳化劑,形成撥水性覆膜,賦予潤滑性、耐 腐蝕性。又,日本專利公開2003-129257號公報揭示之封 孔處理劑,經由添加胺化合物,由於金屬表面顯示撥水性, 因而提昇耐腐姓性。但是,若金屬表面成為撥水性,則將 提昇说潤性為目的而塗抹之助炫劑或焊錫合, 焊錫濕潤性顯著劣化。 316710 9 200526817 八,本Γ由於未含有上述之在金屬表面賦予撥水性之成 为,所以谭錫濕潤性不會劣化。 又’由於撥水性少,有耐腐姓性劣 本發明經由界面活性劑具有之浸透_ ft方j 於溶液…在其鹽Γ崎物之形成,又由 劑同等以上之耐腐純。6 "可^旱與以往封孔處理 二=二邱值與耐腐㈣之詳細關係尚不明,但是 PH值仗1 〇越傾向於酸性,耐腐蝕 為8至10之範圍使用時 &升。已知在邱值 從用吟可賦予取大之耐腐蝕性。 以下=ΓΡΗ值必須在1G以下,但^值若在7 經時會有含有化:農由於 彳樹—程管理面而言上 使用較佳。 甘e主1U之乾圍 經由將液體注入封孔處理槽,預測在使用中 、处理,合液之pH值會產生變動。為了 # 留扁f丨昍μ 馮了使该pH值變動停 二在取小限值’以添加p H緩衝劑較佳。在本發: 圍具有pH緩衝能之物質可列舉叫 巳 碟酸之驗金屬鹽、二二各啉酸之驗金屬鹽、三聚 欠… 夂之^屬鹽、四硼酸之鹼金屬鹽、 合肢之驗金屬鹽、氨水、:乙醇胺、二Lwt% , SH wooden force of these compounds -η ηπι + 0 / j, plus I in the range of 0.001 to o.lwU vortex 〇. OOlwt%, there is no button 丨 忐, if it exceeds 0. lwt% , | 3] 67] 0: 200526817 Touch resistance has an adverse effect. It is preferably 0.005 to 0.05 wt%. Further, by adding a surfactant to 0.01 to 1 wt%, it was found that the corrosion resistance was increased. It is thought that the surfactant can reduce the surface tension of water and increase the permeability of thiol-containing heterocyclic compounds or their salts to stomata. If the amount of the surfactant added is less than 0.01% by weight, sufficient permeability to the above pores cannot be obtained and sufficient corrosion resistance cannot be obtained. When it exceeds 1 wt%, the cleaning effect of the surfactant becomes strong, and the adsorption of a heterocyclic compound having a mercapto group or a salt thereof is prevented, and a sufficient effect cannot be obtained. As the surfactant, one or two types of anionic surfactants, cationic, nonionic, and amphoteric surfactants that are commercially available can be appropriately selected and used. In particular, when the pH value of the samarium solution is used in the range of 8 to 10, one or two or more anionic, non-ionic, and amphoteric surfactants are appropriately selected. In #, the self-ionic surfactant is nonylbenzene fluorene ethylene oxide addition (6 to 12 moles of ethylene oxide) or intermediate alcohol ethylene oxide with φ adduct (soil milk ethane) The Mohr number is more preferably 6 to 12). The anionic surfactant is preferably a sulfate type or a phosphate type. A sealing treatment agent disclosed in Japanese Patent No. 2804453 has a water-repellent coating due to 3 / lubricant and emulsifier, and provides lubricity and corrosion resistance. In addition, the sealing agent disclosed in Japanese Patent Laid-Open No. 2003-129257 discloses that, by adding an amine compound, the metal surface shows water repellency, thereby improving the corrosion resistance. However, if the metal surface becomes water-repellent, a glaze or solder applied for the purpose of improving the wettability will significantly degrade the solder wettability. 316710 9 200526817 8. Since Ben Γ does not contain the above-mentioned effect of imparting water repellency to the metal surface, Tan Xi's wettability will not be deteriorated. Because of its low water-repellency, it has poor corrosion resistance. The present invention is formed by the penetration of the surfactant into the solution ... in the salt, and it is made of corrosion-resistant pure agent. 6 " Can dry and the previous sealing treatment 2 = The detailed relationship between the two Qiu value and corrosion resistance is unknown, but the pH value is more acidic, and the corrosion resistance is in the range of 8 to 10 when used & liter . It is known that the high corrosion resistance can be imparted at the Qiu value. The following = ΓΡΗ value must be below 1G, but ^ value will be included if it is in the 7th period: agricultural use is better in terms of tree management. Gan e main 1U dry surrounding By injecting liquid into the sealing treatment tank, it is predicted that the pH value of the liquid will change during use and processing. In order to # 留 bianf 丨 昍 μ, it is better to stop the pH change to take a small limit value 'to add p H buffer. In the present invention: Substances having pH buffering energy can be listed as metal test salts of acetic acid, metal test salts of didichroline acid, trimeric owing ... Limb test metal salt, ammonia, ethanolamine, two
…本發明之封孔處理劑具有上述之成分,料^者可 攸水或乙醇、丙酮、正烷烴等 D 擇。但是,μ慮到經濟性或引火性=有_]適當選 Χ 51人性,則溶劑以水最適合。 3】67]〇 10 ••200526817 溶劑為水時’將溶液之溫度加熱至4(TC至說,則成分在 水中之礼化會變快,而且處理後之材料容易乾燥。 “處理方法可為將電鑛品在處理劑中浸漬、或將處 ’:務或塗抹寺任何一種方法。但是於本發明,電鍍品之形 狀不論為板狀·條狀、壓型零件,電鍍後只要為連續生產 、.泉’則可在生產線中處理,提高封孔處理各種機能之效果。 二=品進行遂型等加工後再用本發明之封孔處理劑… The plugging agent of the present invention has the above-mentioned components, and the material may be selected from water, ethanol, acetone, and n-alkane. However, considering the economical or ignitability = having _] appropriate choice of 51 human nature, water is the most suitable solvent. 3] 67] 〇10 •• 200526817 When the solvent is water, 'heat the temperature of the solution to 4 (TC to say, the ceremonialization of the ingredients in water will become faster, and the processed material will be easy to dry. "The processing method can be Any method of immersing or smelting electrical minerals in the treatment agent, such as: service or painting. However, in the present invention, the shape of the electroplated product is no matter whether it is plate-shaped, strip-shaped, or profiled parts. ". 泉" can be processed in the production line to improve the effect of various functions of sealing treatment. Two = after the product is processed and then processed, the sealing treatment agent of the present invention is used.
料°即使為電鑛後經封孔處理之金屬材 /在將一後之壓型加工時附著之壓型油洗淨之工 孔處=之機能大㈣失。此相再度進行封孔處理為有效。 2用本發明之封孔處理劑處理㈣基 :::板會劣化,可獲得具有與以往同等以切腐純能之 [實施例] —以下,列舉實施例對本發明作詳細之說明。 丨只細例1至9及比較例1至8 對於彈黃用鱗青銅基板 經由瓦特浴、… 板(。521〇、25_ 20_ 〇.4_) Γ 進…鍍鎳,於其上在氰酸鹽溶液中進扞 0· 1 // m之鍍金。 分狀r遲仃 將該鍍金基板以表1之組成 — rn〇r 、夺、主士 、、成所不之封孔處理劑以浴、、攻 5〇C、次潰時間20秒之條件處理, 合· 金上形成封孔處理覆膜。又,乾無,在鍍 交換水。 封孔處理劑之溶劑使用離子 對於進行封孔處理後之基板進行以下之評估。結果如 ]] 316710 200526817 表i所示。 鹽水噴霧試驗 ^方…亥等基板進行24小時鹽水喷霧試驗(以JISZ2371 二基準),進行耐腐蝕性之評估。 評估基準 〇·幾乎無腐叙 △:各處看到茶褐色之腐蝕點 > X .各處看到綠色之腐蝕點(銅銹) 焊錫濕潤性 對於该等基板將助㈣⑽_26,達姆拉化研公司製造) =丙知烯釋2倍者)全面塗佈,放置1G分鐘後放上5個 4錫球(超級清淨球s,錫_37%H 6 業(股)公司势杀),力位4士 丁征盃屬工 』衣以),在保持於15(TC之熱盤上加熱2分鐘(預 然後在保持於230°C之熱盤上加_ 30秒鐘。焊錫'、蟲 評估由測定加熱後焊錫盤之濕潤擴大面積為之,: I 者之焊錫球之濕潤擴大面積為基準(n = 5)。 谇錫濕潤性之評估基準 Ο •焊錫球之濕潤擴大而籍*>去_ χ 〇 95 仁入^積〉未處理之濕潤擴大面積 X ·太干錫球之濕潤擴大面籍 < 夫卢 χ 〇 7 ,、大面積〈未處理之濕潤擴大面積 又,將已進行日本專利2804453號公報搞_ 基板(比較例7)與已進行特開2003-129257货处理之 處理之基板(比較例8)作為比較例一併=報揭示之 1丁汗估。組成如 316710 12 200526817 下所述又,汗估試驗結果合併於表1表示。 比較例7(日本專利28〇4453號公報揭示之封孔處理^ 抑制劑:苯并三。坐 O.Olwt% 潤滑劍:油酸 0.3 wt% 乳化劑:月桂基酸性磷酸一酯 〇.3 wt% 比車乂例8(日本專利公開2003-129257號公報揭示之封孔處 理劑) 抑制劑:笨并三唑 〇.〇5wt% 胺化合物:三乙醇胺 丨wt〇/〇 石粦酸_系界面活性劑:EN-2P(青木製油工業公司製造) 0· 1 wt%Even if it is a metal material that has been subjected to sealing treatment after power ore / the function of cleaning the pressing hole attached to the pressing oil during the subsequent pressing processing = the function is greatly lost. It is effective to perform the sealing process again in this phase. 2 Treatment of fluorene group ::: board with the sealing agent of the present invention will result in degradation of the pure energy equivalent to that in the past. [Examples] —The following is a detailed description of the present invention with examples.丨 Only detailed examples 1 to 9 and comparative examples 1 to 8 For scale yellow bronze substrates for elastic yellow are passed through a watt bath, ... plate (.521〇, 25_ 20_ 〇.4_) Γ, nickel plating, and cyanate In the solution, 0 · 1 // m of gold plating is defended. Fractional r 仃 仃 the gold-plated substrate with the composition of Table 1-rn〇r, 夺, master,, and the sealing treatment agent can not be processed under the conditions of bath, attack 50 ℃, time of 20 seconds A sealing film is formed on the alloy. Also, dry without exchange water during plating. Use of ions as the solvent of the sealing treatment agent The following evaluation was performed on the substrate after the sealing treatment. The results are shown in]] 316710 200526817 Table i. Salt water spray test ^ Fang ... Hai and other substrates were subjected to a 24-hour salt water spray test (based on JISZ2371 two standards) to evaluate corrosion resistance. Evaluation Criteria 〇 · Almost no corrosion △: Dark brown corrosion spots are seen everywhere> X. Green corrosion spots (copper rust) are seen everywhere Solder wettability will help _26, Damura Chemical Research Corporation (Manufactured) = 2 times the amount of propene released) Fully coated, put 5 4 solder balls (super clean ball s, tin_37% H 6 industry (stock) company killing) after 1G minutes, force 4 The Shi Zhengzheng Cup is a worker's clothing, and is heated on a hot plate kept at 15 (TC for 2 minutes (preliminarily and then added on a hot plate maintained at 230 ° C for _ 30 seconds. Soldering, insect evaluation by determination After heating, the wet expansion area of the solder pad is as follows: I: The wet expansion area of the solder ball is used as a reference (n = 5). 谇 Evaluation criteria of solder wettability 〇 • The solder ball is expanded by the wetness * > Go_ χ 〇95 Enriched product> Untreated wet expanded area X · Wet expanded surface of too dry solder ball <Flu χ 〇7, Large area <Untreated wet expanded area again, Japanese patent will be issued Publication No. 2804453 _ Substrate (Comparative Example 7) and Substrate (Comparison with JP 2003-129257) Example 8) As a comparative example, it is reported as a report of 1 Khan estimates. The composition is as described below under 316710 12 200526817. The results of the Khan test results are shown in Table 1. Comparative Example 7 (Japanese Patent No. 2804445) Sealing treatment ^ Inhibitor: Benzotriol. O.Olwt% Lubrication sword: Oleic acid 0.3 wt% Emulsifier: Lauryl acid phosphate monoester 0.3 wt% Specific Example 8 (Japanese Patent Laid-Open 2003-129257 Sealing treatment agent disclosed in the gazette) Inhibitor: Benzotriazole 0.05% by weight Amine compound: Triethanolamine 丨 wt〇 / 〇 Carnic acid _ series surfactant: EN-2P (manufactured by Aoki Oil Industry Co., Ltd.) 0 · 1 wt%
316710 -200526817316710 -200526817
〔1丨1 試驗結果 焊錫 濕潤性 〇 〇 〇 〇 〇 〇 〇 〇 〇 鹽水喷 霧試驗 〇 〇 Ο 〇 〇 〇 〇 〇 〇 封礼處理液組成 f 冷4»> LO LO CD LD σί LO ① LO LTD c^> LO CT5 LO LO οο CO οο CNI CNI 〇〇 〇〇 CNI (NJ 焦磷酸鉀 焦磷酸鉀 焦磷酸鉀 四硼酸鉀 四删酸鉀 四侧酸if 焦磷酸鉀 焦磷酸鉀 焦磷酸鉀 界面活性劑及其濃度(wt?〇 LO CD LO cz> LO CD LO CD LO CD LO ◦ LO CD LO 〇 LO CZ5 壬基苯酚環氧乙烷10莫耳附加物 壬基苯酚環氧乙烷10莫耳附加物 壬基笨紛環氧乙烧10莫耳附加物 月桂醇環氧乙烷附加物之磷酸酯 月桂醇環氧乙烧附加物之峨酸酷 月桂醇環氧乙坑附加物之填酸酯 月桂醇環氧乙烷附加物之硫酸酯鹽 月桂醇環氧乙坑附加物之硫酸酯鹽 月桂醇環氡乙烷附加物之硫酸酯鹽 含有髓基之雜環化合物 或其鹽及其濃度(wt%) ^―( 〇> f Η CD ο C3 CD 〇> r-__H 〇 T—Η 〇> r—Η 〇> Τ '( CD ◦ 3-锍基-1,2, 4-三唑 2-巯基笨并噻唑鈉 2-酼基笨并噁唑 3-酼基-1,2, 4-三唑 2-酼基笨并噻唑鈉 2-賧基笨并噁唑 3-酼基-1, 2, 4-三唑 2-锍基笨并噻唑鈉 2-酼基笨并噁唑 T—Η (ΝΙ ΓΟ LO CO 卜 〇〇 CD 453 - ]4 316710 -200526817[1 丨 1 Test results Solder wettability 0.00000000000000 Salt water spray test 〇000 〇〇〇〇〇〇 Sealing treatment liquid composition f Cold 4 »> LO LO CD LD σί LO ① LO LTD c ^ > LO CT5 LO LO οο CO οο CNI CNI 〇〇〇〇CNI (NJ potassium pyrophosphate potassium pyrophosphate potassium pyrophosphate potassium tetraborate potassium tetraborate potassium tetraside acid if potassium pyrophosphate potassium pyrophosphate potassium pyrophosphate Surfactant and its concentration (wt? 〇LO CD LO cz> LO CD LO CD LO CD LO ◦ LO CD LO 〇LO CZ5 Nonylphenol ethylene oxide 10 moles Nonylphenol ethylene oxide 10 moles Ear Additives Nonyl Stupid Ethylene Oxide 10 Mol Additives Laureth Ethylene Oxide Additives Phosphate Lauryl Ethylene Oxide Etylene Additives Eric Acid Lauryl Alcohol Ethylene Etylene Additives Filler Acid Ester Lauryl Alcohol Ethylene Oxide Sulfate Salt Lauryl Alcohol Ethylene Etylene Sulfate Sulfate Salt Lauryl Alcohol Cyclopentane Ethane Sulfate Salt Sulfate Compound containing myelin or a salt thereof and its concentration (Wt%) ^ ― (〇 > f Η CD ο C3 CD 〇 > r -__ H 〇T-Η 〇 > r Η 〇 > Τ '(CD ◦ 3-fluorenyl-1,2,4-triazole 2-mercaptobenzothiazole sodium 2-fluorenylbenzoxazole 3-fluorenyl-1,2,4-triazole Sodium 2-fluorenylbenzothiazolyl 2-fluorenylbenzothiazolyl 3-fluorenyl-1, 2, 4-triazole 2-fluorenylbenzothiazolyl sodium 2-fluorenylbenzothiazolyl T-fluorene (ΝΙΙ ΓΟ LO CO 〇〇CD 453-] 4 316710 -200526817
〔Ζ丨I嬸〕 試驗結果 焊錫 I濕潤性 〇 1 Ο 〇 〇 〇 X X 鹽水噴 霧試驗 <3 1 <3 <] <3 X 〇 <3 封礼處理液組成 pH緩衝劑及其濃度 (wt%) 、 pH 值 LO cn> LO LO CT: LO LO CD 1 LO CZ5 1 .....* CO CN1 CO CO 1 1 1 1 焦磷酸鉀 焦磷酸鉀 焦磷酸鉀 焦磷酸鉀 未添加 1 1 1 界面活性劑及其濃度(wt%) LO 〇> LO 〇 0.005 CNI LO 〇 1 1 1 月桂醇環氧乙烧附加物之硫酸酯鹽 月桂醇環氧乙烧附加物之硫酸酯鹽 壬基笨醅環氧乙烷1 0莫耳附加物 壬基笨酚環氧乙烷10莫耳附加物 月桂醇環氧乙烧附加物之鱗酸酷 1 1 1 含有疏基之雜環化合物 或其鹽及其濃度(wt%) 1_ 0.0005 LO <ZD ψ < CD CD 〇 CD CZ5 CD 1 1 1 2-锍基笨并噻唑鈉 2-锍基笨并噻唑鈉 3-锍基-1,2, 4-三唑 3 -魏基-1,2,4 -三〇坐 2-巯基笨并噻唑鈉 未處理 曰本專利第2804453號 曰本專利公開2003-129257 — CNJ CO LO CJD 卜 〇〇 15 316710 200526817 由以上之結果明暸,本發明之封孔處理劑不含會污染 環境之物質,且用本發明之封孔處理劑處理過之電鍍材料 具有與以往同等以上之耐腐蝕性,亦不會使焊錫濕潤性劣 化0[Z 丨 I 婶] Test results Solder I wettability 〇 〇 〇〇〇〇XX salt water spray test < 3 1 < 3 <] < 3 X 〇 < 3 The pH treatment agent is composed of the gift solution and its buffer Concentration (wt%), pH value LO cn > LO LO CT: LO LO CD 1 LO CZ5 1 ..... * CO CN1 CO CO 1 1 1 1 potassium pyrophosphate potassium pyrophosphate potassium pyrophosphate potassium pyrophosphate not added 1 1 1 Surfactant and its concentration (wt%) LO 〇 > LO 〇0.005 CNI LO 〇1 1 1 Sulfate salt of lauryl alcohol ethylene oxide additive Sulfate salt of lauryl alcohol ethylene oxide additive Nonylbenzyl oxirane 1 0 Molar addon Nonylbenzol ethylene oxide 10 Molar addon Lauryl alcohol Ethylene oxide Addition linoleic acid 1 1 1 Heterocyclic compound containing thiol or Its salt and its concentration (wt%) 1_ 0.0005 LO < ZD ψ < CD CD 〇CD CZ5 CD 1 1 1 2-Sodium benzobenzothiazole 2-sodium benzthiathiazole 3-fluorenyl-1, 2,4-triazole 3-Weiji-1,2,4-triazolyl 2-mercaptobenzothiazole sodium is not treated. Japanese Patent Publication No. 2804453, Japanese Patent Publication 2003-129257 — CNJ CO LO CJD. 15 316710 2005268 17 From the above results, it is clear that the sealing treatment agent of the present invention does not contain substances that will pollute the environment, and the electroplating material treated with the sealing treatment agent of the present invention has corrosion resistance equal to or higher than that in the past, and does not cause Degraded solder wettability 0
]6 316710] 6 316710
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US20190112726A1 (en) * | 2016-03-28 | 2019-04-18 | Okuno Chemical Industries Co., Ltd. | Sealing liquid for anodic oxide coating films of aluminum alloy, concentrated liquid and sealing method |
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JPH03215697A (en) * | 1990-01-19 | 1991-09-20 | Meidensha Corp | Method for sealing metallic material |
JPH05311495A (en) * | 1991-12-25 | 1993-11-22 | Nikko Kinzoku Kk | Hole sealing treatment of noble metal plated material |
JP3870225B2 (en) * | 2001-10-19 | 2007-01-17 | ユケン工業株式会社 | Gold plating sealing agent and method |
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2005
- 2005-01-21 CN CN2005800035457A patent/CN1914359B/en active Active
- 2005-01-21 WO PCT/JP2005/000754 patent/WO2005073435A1/en active Application Filing
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TWI268967B (en) | 2006-12-21 |
JPWO2005073435A1 (en) | 2007-09-13 |
JP4397376B2 (en) | 2010-01-13 |
CN1914359B (en) | 2011-12-28 |
WO2005073435A1 (en) | 2005-08-11 |
CN1914359A (en) | 2007-02-14 |
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