WO2005043242A1 - フォトマスク及び映像デバイスの製造方法 - Google Patents
フォトマスク及び映像デバイスの製造方法 Download PDFInfo
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- WO2005043242A1 WO2005043242A1 PCT/JP2004/016177 JP2004016177W WO2005043242A1 WO 2005043242 A1 WO2005043242 A1 WO 2005043242A1 JP 2004016177 W JP2004016177 W JP 2004016177W WO 2005043242 A1 WO2005043242 A1 WO 2005043242A1
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- WIPO (PCT)
- Prior art keywords
- pattern
- photomask
- light
- shielding film
- transfer
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/52—Reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Definitions
- the present invention relates to a photomask used for pattern transfer and a method for manufacturing an image device using the photomask.
- an exposure device such as a reduced-size projection exposure device is used to irradiate exposure light through a photomask to expose the device substrate. It has a step of transferring a pattern to a photosensitive material.
- a photomask used at this time a photomask having a light-shielding film pattern on a light-transmitting substrate such as rectangular glass is generally used. Examples of the light-shielding film pattern include those mainly composed of chromium and those mainly composed of molybdenum silicide.
- pattern transfer is usually performed by arranging the surface of the photomask (the light-shielding film pattern surface) face down and irradiating exposure light from the back surface (glass surface) of the photomask. Therefore, if the reflectance of the surface of the photomask is high, stray light is generated due to multiple reflections between the surface to be transferred and the photomask, thereby deteriorating the imaging characteristics. Are controlled to have low reflection.
- the reflectance of the chromium film is as high as about 40 to 50% near the exposure light (200 nm to 500 nm), and the chromium oxide
- the reflectance is suppressed to about 15%.
- the reflectance of the glass surface is around 8%.
- an antireflection film is formed on the substrate side in order to reduce multiple reflections between the backside of the photomask and the illumination system.
- the photomask is usually provided with a transfer area where a pattern to be transferred on a transfer target is formed at the center and a non-transfer area provided around the transfer area. Region.
- the peripheral non-transfer area includes, for example, a product name of a photomask for identification by human eyes, and a photomask as described in Japanese Patent Application Laid-Open No. 2000-99619.
- a light-shielding film pattern indicating product identification information such as a bar code for identifying a photomask by a mask identification method is formed.
- a blind is used to block exposure light so that the exposure light is not irradiated to the non-transferred area.
- the blind there are a blind disposed directly above the back surface of the photomask and an imaging blind which forms a real image on the same plane as the pattern of the photomask. Disclosure of the invention
- the non-device pattern such as the light-shielding film pattern indicating the product identification information formed in the non-transfer area in the peripheral portion of the photomask as described above has been provided with the blind in the exposure apparatus, the exposure apparatus There is a problem that the image is resolved on the transfer surface due to the influence of the stray light inside.
- the present invention has been made in view of the above problems, and provides a photomask capable of preventing a non-device pattern formed in a non-transfer region of a photomask from being resolved on a transfer surface. With the goal. Still another object of the present invention is to provide a method for manufacturing an image device capable of preventing occurrence of non-device pattern-like mura of a photomask in an image.
- the present invention has the following configuration.
- (Configuration 1) A photomask in which a light-shielding film pattern is formed on the surface of a light-transmitting substrate Wherein the photomask has a non-device pattern composed of a light-shielding film turn in a non-transfer region in a peripheral portion, and at least a back surface of the light-transmitting substrate facing a position where the non-device pattern is formed.
- a photomask comprising light transmission reducing means for reducing transmission of exposure light incident from a peripheral portion of the rear surface of the transparent 'I' raw substrate.
- the photomask in which a light-shielding film pattern is formed on the surface of a light-transmitting substrate, the photomask has a non-device pattern made of a light-shielding film pattern in a non-transfer region in a peripheral portion, and the non-device
- means for reducing a difference in reflectance between the pattern portion and the non-pattern portion of the non-device pattern with respect to the exposure light incident from the back surface of the translucent substrate is provided.
- a photomask which is characterized in that:
- a photomask, wherein means for reducing a difference in reflectance between the pattern portion of the non-device pattern and the non-pattern portion with respect to exposure light is provided.
- the photomask In a photomask in which a light-shielding film pattern is formed on a surface of a light-transmitting substrate, the photomask has a non-device pattern made of a light-shielding film pattern in a non-transferred region in a peripheral portion.
- a photomask characterized in that a fine pattern is formed on a device pattern or in a region where a non-device pattern is formed, such that the fine pattern is not substantially resolved on the transfer surface.
- the light-shielding film pattern of the present invention a pattern mainly composed of chromium, a pattern mainly composed of molybdenum silicide, or the like can be used.
- the photomask a two-layer or multilayer structure having an antireflection film on the front surface or a double-sided antireflection type having an antireflection film formed on the back surface is used.
- a glass substrate such as a synthetic quartz glass can be used.
- the non-device pattern includes a product name or a product code of a photomask, a product identification pattern such as a barcode for product identification, or various alignment marks such as an alignment mark.
- FIG. 1A and 1B are diagrams showing a photomask according to Example 1 of the present invention, wherein FIG. 1A is a plan view, FIG. 1B is a rear view, and FIG. 1C is a cross-sectional view.
- FIG. 2 is a manufacturing process diagram of the photomask according to the first embodiment of the present invention.
- FIG. 3 is a cross-sectional view of a photomask according to Embodiment 5 of the present invention.
- FIG. 4 is a manufacturing process diagram of the photomask according to the fifth embodiment of the present invention.
- FIG. 5 is a sectional view of a photomask according to Example 6 of the present invention.
- FIG. 6 is a manufacturing process diagram of the photomask according to the sixth embodiment of the present invention.
- 7A and 7B are diagrams showing a photomask according to Example 7 of the present invention, wherein FIG. 7A is a plan view and FIG. 7B is a partially enlarged view.
- FIG. 8 is a schematic configuration diagram of an exposure apparatus. BEST MODE FOR CARRYING OUT THE INVENTION
- the photomask according to the first embodiment of the present invention is a photomask in which a light-shielding film pattern is formed on the surface of a light-transmitting substrate, wherein the photomask shields a non-transfer region in a peripheral portion from light.
- a non-device pattern composed of a transparent film pattern, and at least a portion of the exposure light incident from the peripheral portion of the rear surface of the light-transmitting substrate on the rear surface of the light-transmitting substrate facing the position where the non-device pattern is formed.
- a light transmission reducing means for reducing transmission is provided.
- a light transmission reducing unit is provided at least at a position on the back surface of the photomask opposite to the position where the non-device pattern is formed, and blocks light from the periphery of the photomask.
- FIG. 8 is a schematic configuration diagram of an exposure apparatus, in which 24 is a transparent substrate in a photomask, 25 is a light-shielding film pattern in a photomask, and 26 is a pellicle that protects the photomask surface. It is.
- the light transmission reducing means is a means having a function of reducing the transmission of exposure light that normally enters from the back surface of the light transmitting substrate (the back surface of the photomask). It is preferable that 80% or less of the light is transmitted as compared with.
- this light transmission reducing means the exposure light is absorbed, reflected, or scattered, or two or more of them, so that the transmission of the exposure light entering from the back surface in the peripheral portion of the photomask is reduced. Is done.
- the first embodiment when a plurality of types of non-device patterns among the above-mentioned non-device patterns are formed on one photomask, light transmission is performed for all or only the selected non-device patterns.
- Reduction means can be provided. Also, some non-device patterns If a problem occurs partially with respect to the non-device pattern, a light transmission reducing means can be provided for a part of the non-device pattern.
- a photomask according to a second embodiment of the present invention is a photomask in which a light-shielding film pattern is formed on the surface of a light-transmitting substrate, wherein the photomask has a light-shielding property in a non-transfer region in a peripheral portion.
- a non-device pattern comprising a film pattern, and a pattern portion of the non-device pattern and a non-pattern with respect to exposure light incident from the back surface of the light-transmitting substrate so that the non-device pattern is not resolved on the transfer surface. It is characterized in that means for reducing the difference in reflectance in the section are provided.
- the reflected light is not reflected.
- the difference in reflectivity between the pattern portion and the non-pattern portion of the device pattern is reduced. For this reason, it is possible to reduce the risk of resolving the non-device pattern when reaching the transfer surface.
- the pattern portion and the non-pattern portion of the non-device pattern are the cut pattern portion, and the surrounding substrate portion is the non-device pattern. It is a pattern part.
- the remaining pattern portion is a pattern portion, and the peripheral substrate portion is a non-pattern portion.
- the means for reducing the difference in reflectance between the pattern portion and the non-pattern portion of the non-device pattern is provided, so that the reflectance in the pattern portion and the non-pattern portion with respect to the conventional photomask is increased.
- the difference is reduced. It is preferable that the difference in reflectance be 80% or less of the conventional photomask.
- the conventional photomask includes a two-layer or multilayer structure having an anti-reflection film on the front surface, or a double-sided anti-reflection type having an anti-reflection film also formed on the back surface.
- Type of exposure equipment and photoma The degree of resolution of the non-device pattern on the transfer surface varies depending on the type of disk. Therefore, the present invention can be employed when a problem occurs depending on the type of the exposure apparatus and the type of the photomask.
- the second embodiment when a plurality of types of non-device patterns among the above-described non-device patterns are formed on one photomask, all or selected non-device patterns are formed. Only the region where the difference is present can be subjected to means for reducing the reflectance difference. Further, when a problem occurs partially with respect to a certain non-device pattern, a means for reducing the reflectance difference can be applied to a part of the non-device pattern.
- a light-shielding film of the pattern portion or the non-pattern portion with respect to the exposure light such that the reflectance difference between the pattern portion and the non-pattern portion of the non-device pattern with respect to the exposure light incident from the rear surface of the light-transmitting substrate is reduced.
- This is a method of adjusting the reflectivity of light. Specifically, by partially etching the light-shielding film in the pattern portion or the non-pattern portion in the thickness direction so as to have transparency, the reflectivity of the non-pattern portion or the pattern portion becomes lower than that of the light-transmitting substrate. This is a method of setting the film thickness so as to approach the ratio.
- a photomask according to a third embodiment of the present invention is a photomask in which a light-shielding film pattern is formed on the surface of a light-transmitting substrate.
- the exposure light incident from the back of the photomask is Even if the light is reflected on the surface of the non-device pattern, the reflected light does not cause a substantial difference in reflectance between the pattern portion of the non-device pattern and the non-pattern portion. There is no risk of being imaged.
- the reflectance of the pattern portion of the non-device pattern is different from that of the non-pattern portion.
- the incident light from the back surface of the photomask is overwhelming, and in this embodiment, the non-device pattern is hardly resolved on the transfer surface.
- the difference in reflectance between the non-device pattern pattern and the non-pattern portion is such that non-device patterns such as product identification patterns can be visually recognized from the photomask surface. Is preferred
- the photomask of the present embodiment partially etches the light shielding film in the thickness direction when forming the non-device pattern.
- the difference in reflectance between the pattern portion and the non-pattern portion substantially disappears as compared with the case where the substrate is exposed like a missing pattern on the back surface, and the pattern cannot be recognized as a pattern.
- a difference in reflectivity occurs to the extent that it can be visually recognized.
- non-device patterns such as product identification patterns can be recognized from the photomask surface.
- a photomask according to a fourth embodiment of the present invention is a photomask in which a light-shielding film pattern is formed on the surface of a light-transmitting substrate, wherein the photomask includes a light-shielding film in a non-transfer region in a peripheral portion.
- a non-device pattern comprising a pattern, and a reflectance of the pattern portion and the non-pattern portion of the non-device pattern to exposure light incident from the photomask surface so that the non-device pattern is not resolved on the transfer surface. It is characterized in that means for reducing the difference are provided.
- the reflected light is reflected by the reflectance of the pattern portion and the non-pattern portion of the non-device pattern. Since the difference is reduced, the possibility of resolving the non-device pattern when the non-device pattern reaches the transfer surface can be reduced.
- the pattern portion and the non-pattern portion of the non-device pattern are the same as in the second and third embodiments described above, and when the non-device pattern is formed by the cutout pattern of the light-shielding film pattern, When the non-device pattern is formed by the remaining pattern of the light-shielding film pattern, the remaining pattern portion is the pattern portion, and the surrounding substrate portion is the pattern portion. Is a non-pattern part.
- means is provided for reducing the difference in reflectance between the pattern portion of the non-device pattern and the non-pattern portion for the exposure light incident from the photomask surface.
- a conventional photomask is a two-layer or multilayer structure having an anti-reflection film on the front surface, or a double-sided anti-reflection type having an anti-reflection film also formed on the back surface, as in the above-described embodiment. Stuff is included.
- the degree of the problem of resolving the non-device pattern onto the transfer surface differs depending on the type of the exposure device and the type of the photomask. Therefore, if a problem occurs according to the type of the exposure device and the type of the photomask, the present invention Can be adopted.
- non-device patterns when a plurality of types of non-device patterns among the above-described non-device patterns are formed on one photomask, all or selected non-device patterns are formed. Means for reducing the reflectance difference can be applied only to the formed area. Further, when a problem occurs partially with respect to a certain non-device pattern, a means for reducing the reflectance difference can be applied to a part of the non-device pattern.
- the reflectance of the light-shielding film of the pattern portion or the non-pattern portion with respect to the exposure light is reduced so that the difference in reflectance between the pattern portion and the non-pattern portion of the non-device pattern with respect to the exposure light incident from the photomask surface is reduced. It is a method of adjusting. Specifically, in the case of the second embodiment described above. Similarly to the above, by partially etching the light-shielding film in the pattern portion or non-pattern portion in the thickness direction to make it transparent, the reflectivity of the non-pattern portion or pattern portion becomes higher than that of the translucent substrate. This is a method of setting the film thickness so as to approach. In the above case, a non-device pattern such as a product identification pattern can be recognized from the front or back surface of the photomask.
- a photomask according to a fifth embodiment of the present invention is a photomask in which a light-shielding film pattern is formed on a light-transmitting substrate surface, wherein the photomask has a light-shielding property in a non-transfer region in a peripheral portion.
- a non-device pattern consisting of a film pattern, and that a fine pattern that does not substantially resolve on the transfer surface is formed on the non-device pattern or in a region where the non-device pattern is formed.
- a fine pattern formed on the non-device pattern or in a region where the non-device pattern is formed such that the resolution is substantially not resolved on the transfer target surface (for example, less than the resolution limit by exposure light).
- the transmittance or reflectance of the non-device pattern can be reduced as compared with a conventional photomask in which the fine pattern is not formed.
- the fine pattern does not substantially resolve on the transfer surface, and thus the non-device pattern having the superposed fine patterns overlaps. Can be prevented from being resolved on the transfer surface.
- the pattern portion of the non-device pattern is a pattern for removing a light-shielding film
- a fine pattern is formed in the non-device pattern, or the non-device pattern and its peripheral region.
- the non-device pattern is a remaining pattern of the light-shielding film
- the remaining pattern may be etched into a fine pattern.
- the shape of the fine pattern can be selected as appropriate, such as a slit shape or a mesh shape, and its size is such that it does not substantially resolve on the transfer surface according to the required transmission or reflection characteristics. It is appropriately determined within the range.
- the photomask of the present invention can be suitably used for manufacturing an image device having a step of performing pattern transfer using a photomask.
- Video Specific examples of devices include imaging devices such as solid-state imaging devices such as CCD, CMOS, and VMIS, or liquid crystal display devices, plasma display devices, EL display devices, LED display devices, and DMD display devices. Display devices are examples.
- FIG. 1 shows a photomask according to the first embodiment.
- FIG. 1 (a) is a plan view of the photomask of the present embodiment when oriented horizontally
- FIG. 1 (b) is a view from the back of the photomask of Example 1
- FIG. 1 (c) is FIG. 1A is a cross-sectional view taken along a broken line A-A ′ in FIG. 1A and FIG. 1B.
- the photomask 1 of the present embodiment has a transfer area 2 and a non-transfer area 3 around the transfer area 2.
- a device pattern 7 composed of a light-shielding film pattern is formed in a transfer region 2 on the surface of a transparent substrate 6 made of synthetic quartz glass or the like, and a non-transfer region 3 on the surface of the transparent substrate 6
- a product identification pattern 8 which is a non-device pattern formed in a cutout pattern on a light-shielding film.
- a light transmission reducing thin film 9 as a light transmission reducing means is formed of, for example, an anti-reflection coating made of MEK (methyl ethyl ketone) and fine particles of zinc oxide (ZnO). It is formed by ink-jet printing using paint.
- MEK methyl ethyl ketone
- ZnO zinc oxide
- a photomask blank 12 with a resist film was prepared in which a light-shielding film 10 in which a chromium film and a chromium oxide film were sequentially formed on a transparent substrate 6 and a resist film 11 was applied thereon was prepared ( See Figure 2 (1)).
- a device pattern in the transfer area and a product identification pattern in the non-transfer area are drawn and developed on the resist film 11 to form a resist pattern 11 ′, and the resist pattern 11 ′ is formed along the resist pattern 11 ′.
- Etch the light-shielding film 10 see Fig. 2 (2)).
- the resist pattern is peeled off and washed, and the device pattern 7 is removed.
- a photomask 13 before forming the light transmission reducing means in which the product identification pattern 8 is formed on the surface of the transparent substrate 6 is obtained (see FIG. 2 (3)).
- the antireflection paint is applied to a portion corresponding to the non-transfer area 3 using an ink jet printer capable of printing on the back of the photomask in a non-contact manner, and dried (see FIG. 2 (4)).
- the light transmission reducing thin film 9 thus formed has a transmittance of 5% or less for exposure light (wavelength 230 to 370 nm).
- the exposure light irradiated from the back side of the photomask is converted into a non-device pattern formed in a non-transfer region around the photomask. It can be prevented from reaching.
- Example 2 an antireflection film made of, for example, polyester was adhered to the back surface of the transparent substrate corresponding to the non-transferred area of the photomask as a light shielding film with an adhesive.
- Example 2 In the same manner as in Example 1, a photomask in which a device pattern and a product identification pattern are formed on the surface of the transparent substrate before the light blocking film is formed is obtained.
- the antireflection film (thickness: 50 xm) previously cut out of the portion corresponding to the transfer region is attached to the back surface of the photomask with an adhesive, and light is applied to the non-transfer region on the back surface of the transparent substrate.
- a barrier film is formed.
- the light blocking film thus formed has a transmittance of 2% or less to exposure light (wavelength 230 to 370 nm).
- Example 3 a low-reflection film made of, for example, chromium oxide was formed by vapor deposition on the back surface of the transparent substrate corresponding to the non-transferred area of the photomask, It was done.
- Example 2 In the same manner as in Example 1, a photomask in which a device pattern and a product identification pattern are formed on the surface of the transparent substrate before the light blocking film is formed is obtained.
- chromium oxide is deposited on the entire back surface of the photomask, and a resist film is applied thereon.
- the entire region corresponding to the transfer region is drawn on the resist film and developed to form a resist pattern, and the chromium oxide film in the transfer region is etched along the resist pattern.
- the resist pattern is peeled off and washed to form a light shielding film in the non-transferred area on the back surface of the transparent substrate.
- the light-shielding film thus formed has a reflectance of 12% or less with respect to exposure light (wavelength 230 to 370 nm).
- Example 4 as a means for reducing light transmission, the back surface of the transparent substrate corresponding to the non-transferred area of the photomask was processed by irradiating a laser to obtain a function of scattering light. Things.
- a photomask having a device pattern and a product identification pattern formed on the surface of the transparent substrate is obtained.
- a non-transferred area on the back surface of the photomask is processed to roughen the glass surface and scatter the exposure light.
- the processed surface of the non-transferred region thus formed has a transmittance of 30% or less to exposure light (wavelength 230 to 370 nm).
- FIG. 3 is a cross-sectional view of a photomask according to the fifth embodiment.
- the photomask 14 of the present embodiment has a light transmittance of the substrate in the non-transfer area 3 around the photomask, and the entire surface is partially etched in the thickness direction so as to have transparency.
- the film thickness is set to be substantially the same.
- a resist film 15 is applied to the surface of the photomask 13 ′ (see FIG. 4 (2)), and is exposed and developed so that a resist pattern covering only the transfer region 2 is formed.
- a resist pattern 15 ' is formed (see FIG. 4 (3)).
- the exposed light-shielding film in the non-transfer area 3 is partially etched in the thickness direction using an etchant (see FIG. 4 (4)), and then the resist pattern is peeled off and washed. Is performed to obtain the photomask 14 of this embodiment.
- the reflectance of the non-transferred region 3 thus formed with respect to the exposure light incident from the back surface of the light-shielding film was 15%, which was close to 8% of the substrate.
- the reflectance with respect to the exposure light irradiated from the surface of the light-shielding film in the non-transfer area 3 was also 15%.
- the pattern may be transferred to the non-device pattern. Since the difference in the reflectance of the non-pattern portion is reduced, it is possible to prevent the non-device pattern from being resolved on the transfer surface.
- FIG. 5 is a sectional view of a photomask according to the sixth embodiment.
- the photomask 16 partially etches the pattern portion of the product identification pattern 8 in the thickness direction.
- the reflectance difference between the pattern portion and the non-pattern portion substantially disappears as compared with the case where the substrate is exposed like a missing pattern on the back surface, and the pattern cannot be recognized as a pattern.
- a photomask blank 12 with a resist film was prepared in which a light-shielding film 10 in which a chromium film and a chromium oxide film were sequentially formed on a transparent substrate 6 and a resist film 17 was applied thereon (see FIG. 6 (1)).
- a device pattern 7 in the transfer area is drawn on the resist film 17 and developed to form a resist pattern 17 ′, and a light-shielding film 10 is formed along the resist pattern 17 ′. Etch (see Fig. 6 (2)).
- the resist pattern is peeled off and washed to obtain a photomask 18 on which the device pattern 7 has been formed before the product identification pattern is formed (Fig. 6
- a resist film 19 is applied to the surface of the photomask 18 (see FIG. 6).
- Exposure is performed so that only the pattern portion of the product identification pattern is exposed, and development is performed to form a resist pattern 19 (see FIG. 6 (5)).
- the light-shielding film of the above-described pattern portion of the exposed non-transfer area 3 is partially etched in the thickness direction using an etching liquid (for example, a film having a thickness of 100 A along the resist pattern).
- the light-shielding film is partially etched in the thickness direction at 400 A (see FIG. 6 (5)).
- the product identification pattern 8 thus formed cannot be recognized as a pattern from the back of the photomask.
- pattern transfer is performed using the photomask 16 of this embodiment. By doing so, even if the exposure light irradiated from the back side of the photomask is reflected on the product identification panel 8, there is no risk of being resolved as a pattern.
- FIG. 7A is a plan view of a photomask according to Example 7, and FIG. 7B is a partially enlarged view of a region surrounded by a dotted line B shown in FIG. 7A.
- a fine pattern 19 that is equal to or smaller than the resolution limit by exposure light is formed on the product identification pattern 8 in the non-transfer area 3 around the photomask.
- the photomask 18 of this embodiment forms a product identification pattern on which a fine pattern is formed by drawing a fine pattern that is not more than the resolution limit due to exposure light when writing the product identification pattern. can do.
- the product identification pattern formed in such a manner that the fine patterns are overlapped is difficult to be resolved as a pattern by exposure light irradiated from any of the front and back surfaces.
- the present invention it is possible to prevent a non-device pattern such as a product identification pattern formed in a non-transfer region in a peripheral portion of a photomask from being resolved on a transfer target, and thus a highly accurate
- the present invention is applicable to a photomask capable of realizing a transfer pattern.
- the present invention prevents a non-device pattern such as a product identification pattern formed in a non-transfer area around a photomask used in the manufacture of a video device from being resolved on a transfer object.
- a non-device pattern such as a product identification pattern formed in a non-transfer area around a photomask used in the manufacture of a video device from being resolved on a transfer object.
- the present invention is applicable to an image device manufacturing method capable of preventing non-device pattern-like unevenness from occurring in an image.
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US10/577,915 US20070082273A1 (en) | 2003-10-30 | 2004-10-25 | Photomask and image device manufacturing method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2003370938A JP2005134666A (ja) | 2003-10-30 | 2003-10-30 | フォトマスク及び映像デバイスの製造方法 |
JP2003-370938 | 2003-10-30 |
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WO2005043242A1 true WO2005043242A1 (ja) | 2005-05-12 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2004/016177 WO2005043242A1 (ja) | 2003-10-30 | 2004-10-25 | フォトマスク及び映像デバイスの製造方法 |
Country Status (6)
Country | Link |
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US (1) | US20070082273A1 (ja) |
JP (1) | JP2005134666A (ja) |
KR (1) | KR20060117874A (ja) |
CN (1) | CN1802605A (ja) |
TW (1) | TWI270742B (ja) |
WO (1) | WO2005043242A1 (ja) |
Families Citing this family (8)
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US20080239263A1 (en) * | 2007-03-29 | 2008-10-02 | Asml Netherlands B.V. | Lithographic system and device manufacturing method |
KR100891703B1 (ko) * | 2007-03-30 | 2009-04-03 | 주식회사 엘지화학 | 마이크로 패턴이 형성된 필름의 제조방법 및 그로부터제조된 필름 |
DE102008001800A1 (de) * | 2007-05-25 | 2008-11-27 | Carl Zeiss Smt Ag | Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement |
TWI335252B (en) | 2007-11-30 | 2011-01-01 | Ind Tech Res Inst | Calibration strip and the laser calibration system using thereof |
WO2009112655A1 (fr) * | 2008-03-05 | 2009-09-17 | Alcatel Lucent | Procede de fabrication de photomasques et dispositif pour sa mise en œuvre |
JP6086274B2 (ja) * | 2011-06-02 | 2017-03-01 | 株式会社ブイ・テクノロジー | 寸法測定装置 |
CN104217652B (zh) * | 2014-09-04 | 2016-05-11 | 深圳市华星光电技术有限公司 | 显示面板、彩色滤光基板及其制造方法、制造设备 |
CN110517945A (zh) * | 2018-05-21 | 2019-11-29 | 上海新微技术研发中心有限公司 | 半导体器件的制造方法及半导体器件 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59163825A (ja) * | 1983-03-08 | 1984-09-14 | Nec Corp | X線露光マスクおよびその製造方法 |
JPS61185929A (ja) * | 1985-02-13 | 1986-08-19 | Nec Corp | X線露光マスク |
JPH04136855A (ja) * | 1990-09-28 | 1992-05-11 | Fujitsu Ltd | 露光用マスクの製造方法 |
JPH04261537A (ja) * | 1991-01-18 | 1992-09-17 | Mitsubishi Electric Corp | マスク |
JPH09275051A (ja) * | 1996-04-02 | 1997-10-21 | Canon Inc | X線マスク構造体及びその製造方法、そのx線マスク構造体を用いたx線露光装置、x線露光方法及びデバイスの製造方法、並びにその方法により製造されたデバイス |
JPH11133588A (ja) * | 1997-10-28 | 1999-05-21 | Dainippon Printing Co Ltd | 露光マスクおよび露光装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5914202A (en) * | 1996-06-10 | 1999-06-22 | Sharp Microeletronics Technology, Inc. | Method for forming a multi-level reticle |
TW352420B (en) * | 1998-06-25 | 1999-02-11 | United Microelectronics Corp | Back alignment mark for half tone phase shift mask |
JP3715189B2 (ja) * | 2000-09-21 | 2005-11-09 | 株式会社ルネサステクノロジ | 位相シフトマスク |
US7323276B2 (en) * | 2003-03-26 | 2008-01-29 | Hoya Corporation | Substrate for photomask, photomask blank and photomask |
-
2003
- 2003-10-30 JP JP2003370938A patent/JP2005134666A/ja active Pending
-
2004
- 2004-10-25 US US10/577,915 patent/US20070082273A1/en not_active Abandoned
- 2004-10-25 CN CNA2004800157591A patent/CN1802605A/zh active Pending
- 2004-10-25 KR KR1020057025451A patent/KR20060117874A/ko not_active Application Discontinuation
- 2004-10-25 WO PCT/JP2004/016177 patent/WO2005043242A1/ja active Application Filing
- 2004-10-28 TW TW093132660A patent/TWI270742B/zh not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59163825A (ja) * | 1983-03-08 | 1984-09-14 | Nec Corp | X線露光マスクおよびその製造方法 |
JPS61185929A (ja) * | 1985-02-13 | 1986-08-19 | Nec Corp | X線露光マスク |
JPH04136855A (ja) * | 1990-09-28 | 1992-05-11 | Fujitsu Ltd | 露光用マスクの製造方法 |
JPH04261537A (ja) * | 1991-01-18 | 1992-09-17 | Mitsubishi Electric Corp | マスク |
JPH09275051A (ja) * | 1996-04-02 | 1997-10-21 | Canon Inc | X線マスク構造体及びその製造方法、そのx線マスク構造体を用いたx線露光装置、x線露光方法及びデバイスの製造方法、並びにその方法により製造されたデバイス |
JPH11133588A (ja) * | 1997-10-28 | 1999-05-21 | Dainippon Printing Co Ltd | 露光マスクおよび露光装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20060117874A (ko) | 2006-11-17 |
TWI270742B (en) | 2007-01-11 |
TW200519524A (en) | 2005-06-16 |
JP2005134666A (ja) | 2005-05-26 |
CN1802605A (zh) | 2006-07-12 |
US20070082273A1 (en) | 2007-04-12 |
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