WO2005010980A1 - ベローズ支持構造及び可動ステージ装置 - Google Patents
ベローズ支持構造及び可動ステージ装置 Download PDFInfo
- Publication number
- WO2005010980A1 WO2005010980A1 PCT/JP2004/010685 JP2004010685W WO2005010980A1 WO 2005010980 A1 WO2005010980 A1 WO 2005010980A1 JP 2004010685 W JP2004010685 W JP 2004010685W WO 2005010980 A1 WO2005010980 A1 WO 2005010980A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- bellows
- moving
- movable
- axial direction
- guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
- H10P72/3302—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J3/00—Diaphragms; Bellows; Bellows pistons
- F16J3/04—Bellows
- F16J3/048—Bellows with guiding or supporting means
Definitions
- the present invention relates to a bellows support structure and a movable stage device that can prevent stress concentration that is likely to occur when the operation stroke of a bellows is long.
- the present invention particularly relates to this kind of technology that can be suitably used for a semiconductor processing system.
- semiconductor processing refers to forming a semiconductor layer, insulating layer, conductive layer, etc. in a predetermined pattern on a substrate to be processed such as a wafer or a glass substrate for an LCD (Liquid Crystal Display) or FPD (Flat Panel Display).
- LCD Liquid Crystal Display
- FPD Felat Panel Display
- a substrate to be processed for example, a semiconductor wafer may be moved or transported in a vacuum chamber.
- a base is used as a means for connecting a movable part and a fixed part that perform linear motion in a vacuum chamber and separating the vacuum side and the atmosphere side (for example, see Japanese Patent Application Laid-Open No. No. 79).
- Non-uniform expansion and contraction of the bellows can lead to reduced durability and breakage of the bellows.
- Figure 9A shows the conventional bellows support structure (internal support structure). It is a longitudinal cross-sectional view shown roughly. As shown in FIG. 9A, connection flanges 2 and 3 are arranged at both ends of the bellows 1. At the middle of Bellows 1, one or more intermediate rings 5 formed separately are arranged. A shaft 30 for supporting and guiding the intermediate ring 5 is arranged at the shaft center in the bellows 1.
- FIG. 9B is a longitudinal sectional view schematically showing another conventional bellows support structure (external support structure). As shown in FIG. 9B, connection flanges 2 and 3 are provided at both ends of the bellows 1. In the middle of the bellows 1, one or more intermediate rings 5 formed separately are provided. A shaft 31 for supporting and guiding the intermediate ring 5 is arranged outside the bellows 1.
- An object of the present invention is to provide a bellows support structure and a movable stage device which can prevent particles from scattering and can secure a sufficient space in the bellows.
- Another object of the present invention is to provide a bellows support structure and a movable stage capable of disposing a driving member of a movable portion in a bellows while improving durability of the bellows.
- Equipment Still another object of the present invention is to provide a bellows support structure and a movable stage device which can simplify the structure and reduce the cost.
- a first aspect of the present invention is a structure for supporting a bellows from the inside
- a guide track disposed inside the bellows and extending along the axial direction of the bellows;
- a moving member disposed movably on the guide track along the axial direction;
- An intermediate support that substantially connects the moving member and the bellows
- a second aspect of the present invention is a movable stage device for moving an object to be processed in a vacuum or a chamber filled with a predetermined gas or liquid,
- a linear guide disposed between the first and second side walls in the room
- a movable frame movable along the longitudinal direction of the guide and the linear guide are passed through the movable frame;
- a pair of bellows surrounding the linear guide between the movable frame and the first and second side walls, and the movable frame and the pair of bellows cooperate with each other to hermetically seal the other portion of the room.
- a driving member for moving the movable frame along the linear guide A guide track disposed inside the pair of bellows and extending along the axial direction of the pair of bellows;
- a moving member arranged movably on the guide track along the axial direction;
- An intermediate support that substantially connects the moving member and the pair of bellows
- FIG. 1 is a longitudinal sectional view schematically showing a bellows support structure according to an embodiment of the present invention. .
- Figure 2 is a left side view of the structure shown in Figure 1.
- Figure 3 is a right side view of the structure shown in Figure 1.
- FIG. 4 is a perspective view of the structure shown in FIG.
- FIG. 5A is a perspective view of the moving member having the structure shown in FIG. 1 as viewed from above.
- FIG. 5B is a perspective view of the moving member shown in FIG. 5A as viewed from below.
- FIG. 6A is a plan view showing a state where the moving members having the structure shown in FIG. 1 come into contact with each other. ⁇
- FIG. 6B is a plan view showing a state where the moving members shown in FIG. 6A are separated from each other.
- FIG. 7 is a perspective view schematically showing a movable stage device according to the embodiment of the present invention.
- FIG. 8 is a partially cutaway perspective view showing a semiconductor processing system incorporating the movable stage device shown in FIG.
- Figure 9A shows the conventional bellows support structure (internal support structure).
- FIG. 9B is a longitudinal sectional view schematically showing another conventional bellows support structure (external support structure).
- the present inventor studied the problems of the conventional bellows support structure, particularly the problems when these were applied to the drive system of a semiconductor processing system. As a result, the following findings were obtained.
- a stopper can be installed on the bellows.
- the stopper In both cases of the internal support structure and the external support structure as shown in Figs. 9A and 9B, it is generally considered that the stopper is located outside the bellows. If it is located outside the bellows, the sliding part will be outside the bellows, similar to each member of the external support structure. For this reason, particles generated from a sliding part such as a stopper may be scattered into the vacuum chamber and contaminate the wafer.
- FIG. 1 is a longitudinal sectional view schematically showing a bellows support structure according to an embodiment of the present invention.
- FIGS. 2, 3, and 4 are a left side view, a right side view, and a perspective view of the structure shown in FIG. 1, respectively.
- the bellows (bellows) 1 is formed of a cylindrical body that can expand and contract in the longitudinal direction.
- a flange 2 for fixing the bellows 1 to a fixing portion for example, a side wall of a vacuum chamber is provided.
- the other end of the bellows 1 is provided with a flange 3 for connecting the bellows 1 to a movable portion, for example, a movable frame (to be described later with reference to FIG. 7).
- one or more (one or more) intermediate rings 5, which are one or more intermediate supports, are provided separately or separately. In the illustrated example, an intermediate ring 5 that is separately provided is shown.
- An annular mounting groove 6 is formed on the end face of the fixed flange 2.
- the mounting groove 6 is provided with an O-ring (airtight material: not shown) for airtight sealing between the side wall of the vacuum chamber.
- the outer periphery of the movable flange 3 is formed in a front rectangular shape in the same manner as the end surface shape of the movable frame.
- a flat contact surface 7 for contacting an O-ring attached to the end surface of the movable frame is formed on the end surface of the flange 3.
- Bellows 1 is formed by alternately welding a plurality of ring-shaped thin plates made of a metal such as stainless steel on the inner and outer circumferences.
- the intermediate ring 5 is composed of a ring having substantially the same diameter as the bellows 1.
- the flanges 2, 3 and the intermediate ring 5 are at the end of the bellows 1. Each part is joined by welding.
- the intermediate ring 5 is provided at an intermediate position of the bellows 1 at one or a plurality of intervals as appropriate according to the length of the bellows 1.
- two rails 8 as guide members (guide tracks) are horizontally arranged along the longitudinal direction (axial direction).
- the two Renoles 8 are respectively arranged on the upper side and the lower side inside the bellows 1 so as to be close to the inner surface of the bellows 1.
- Rail 8 is preferably of low profile and flat to reduce the footprint.
- the rail 8 supports a moving block 10 which is a main body of the moving member so as to be movable along the longitudinal direction.
- An intermediate ring 5 is attached to each of the moving blocks 10. Therefore, the moving block 10 is connected to the inner surface of the bellows 1 via the intermediate ring 5.
- the rail 8 faces the bottom 8a, the sides 8b, 8b rising from both sides of the bottom 8a, and the upper edges of the sides 8b, 8b inward. And has a flange portion 8c and 8c bent. Therefore, the rail 8 has a guide groove portion 8d having a substantially C-shaped cross section surrounded by these portions.
- the guide groove 8 d of the upper rail 8 faces upward, and the guide groove 8 d of the lower rail 8 faces downward.
- the two rails 8 are disposed, for example, at the upper and lower portions of a cross member (beam member) 11 1 that passes through the inside of the bellows 1.
- the cross member 11 in the illustrated example is movable.
- FIG. 5A is a perspective view of the moving member having the structure shown in FIG. 1 as viewed from above.
- FIG. 5B is a perspective view of the moving member shown in FIG. 5A as viewed from below.
- FIG. 6A is a plan view showing a state where the moving members having the structure shown in FIG. 1 are in contact with each other.
- FIG. 6B is a plan view showing a state when the moving members shown in FIG. 6A are separated from each other.
- the movable blocks 10 which are the main bodies of the movable members, are movably arranged in series in the inner groove 8d of the rail 8 in a number corresponding to the number of the intermediate rings 5.
- the movable block 10 is disposed so as to be free to slide or run so as not to fall inside the guide groove 8d.
- two rollers (wheels) 12 are rotatably supported by the moving blocks 10 via support shafts 12 a so as to roll on the rails 8. The roller 12 can be omitted if the moving block 10 can be smoothly driven in the guide groove 8d.
- protruding portions 10 a and 10 b protruding in the traveling direction are arranged so as to be point-symmetrical.
- the two rollers 12 move.
- At the front side and the rear side of the block 10 in the traveling direction it is supported via a support shaft 12a in a cantilever state at a substantially central portion of the side surface of the protrusions 10a and 10b.
- the center line of the moving block 10 extending in the axial direction of the bellows 1 is defined by the front roller 12 and the rear protruding portion 0b and the rear roller 12 and the front protruding portion 10a. Are placed so as to face each other (that is, right and left sides).
- the closest distance between the adjacent movable blocks 10 is defined by the protrusions 10 a and 10.
- the adjacent moving blocks 10 have the protruding portions 10 a, 10 a or 10 b, 10 b on the same side. (Right or left). Therefore, the closest distance between the adjacent moving blocks 10 is defined by the fact that the protrusions 10a, 10a or 10b, 10b abut each other.
- a hook bar 13 having a substantially U-shape in plan view is provided in the guide groove 8 d of the rail 8 to prevent the bellows 1 from being excessively elongated.
- the hook 13 locks the moving blocks 10 adjacent to each other in the longitudinal direction of the bellows 1 within a predetermined interval. That is, the farthest distance between the adjacent moving blocks 10 is defined by the hook bar 13.
- the hook bars 13 are arranged alternately on the left and right sides of the center line of the movable block 10 extending in the axial direction of the bellows 1. That is, as shown in FIG. 5B, with respect to three consecutive first, second, and third moving blocks 10, the first and second moving blocks 10 are connected to the right hook bar. 13 When moored at 3, second and third mobile blocks The dock 10 is moored at the hook bar 13 on the left.
- the hook bar 13 is formed by bending both ends of a long bar material 13a into hook portions 13b and 13b at substantially right angles in the same direction.
- the hook portion 13 b of the hook bar 13 Under the opposite protruding portion 10 a 10 a (or 10 b, 10 b) of the adjacent moving block 10, the hook portion 13 b of the hook bar 13 is A locking portion 10c for locking the lock is provided (see FIG. 5B).
- grooves 10d are provided to allow the hook 13b to move.
- the hook bar 13 is provided with a guide groove 8d inside the guide groove 8d. Both sides are slidably supported so as not to fall along the longitudinal direction while being covered with the flange portion 8c.
- each hook bar 13 should be approximately equal to the length of both moving blocks 10 when adjacent moving blocks 10 abut each other. Is preferred.
- the adjacent movable blocks 10 can be in contact with each other without the adjacent hook bars 13 interfering with each other. That is, it is possible to secure a sufficient amount of contraction of the bellows 1 and to secure a sufficient amount of expansion of the bellows 1 when the adjacent moving blocks 10 separate (separate) from each other. It can be.
- a fixing piece 10 e for fixing each intermediate ring 5 is protruded from a substantially central portion on each movable block 10.
- An intermediate ring 5 is attached to the fixing piece 10 e by screwing or welding.
- one or more intermediate rings 5 are provided integrally or separately at an intermediate portion of the bellows 1.
- a rail 8 is provided near the inner surface of the bellows 1 along the longitudinal direction. Along its length on rail 8
- the movable block 10 is movably supported.
- Intermediate ring 5 is supported by moving block 10.
- a sufficient space can be secured in the bellows 1, and a driving member for a movable portion can be arranged in the bellows 1.
- the rail 8 has a guide groove 8d having a substantially C-shaped cross section. Rails 8 are arranged at the top and bottom along the horizontal direction so that the inner groove 8 d faces upward and downward. Therefore, the bellows 1 can be supported in a horizontal and stable state via the intermediate ring 5.
- the bellows 1 When the movable blocks 10 adjacent to each other in the longitudinal direction of the bellows 1 abut against each other, the bellows 1 is prevented from being excessively contracted. Therefore, the bellows 1 can be prevented from being excessively shrunk with a simple structure, and the structure can be simplified, the durability can be improved, and the cost can be reduced.
- the rail 8 is provided with a hook bar 13 having a substantially U-shape in a plane that connects the moving blocks 10 adjacent to each other in the longitudinal direction of the bellows 1 at a predetermined interval. They are arranged alternately. For this reason, it is possible to prevent the bellows 1 from being excessively stretched with a simple structure, thereby simplifying the structure, improving the durability and reducing the cost.
- FIG. 7 is a perspective view schematically showing a movable stage device according to the embodiment of the present invention.
- this movable stage device 15 transports an object to be processed, for example, a semiconductor wafer, in a vacuum chamber 16, for example. It is arranged for.
- the movable stage device 15 includes a cross member (beam member) 11 laid between both side walls 17 in the vacuum chamber 16.
- a movable frame 18 surrounds the cross member 11 and is movable along the longitudinal direction of the cross member.
- a driving member 20 is provided to move the movable frame 18 back and forth along the cross member 11.
- a pair of bellows 1 are arranged so as to cover the cross members 11 located on both sides of the movable frame 18. One end of the pair of bellows 1 is fixed to the side wall 17 via the flange 2, and the other end is connected to the end face of the movable frame 18 via the flange 3.
- the support structure of the bellows 1 is the same as that shown in FIGS. 1 to 6B. That is, as shown in FIGS. 1 to 4, the bellows (bellows) 1 is formed of a cylindrical body that is stretchable in the longitudinal direction. At one end of the bellows 1, a flange 2 for fixing the bellows to a fixing portion, for example, a side wall of a vacuum chamber is provided. A flange 3 for connecting the bellows 1 to the movable frame 18 is provided at the other end of the bellows. 5 is provided separately or separately.
- two rails 8 as guide members (guide tracks) are horizontally arranged along the longitudinal direction (axial direction).
- the two Renoles 8 are respectively arranged on the upper side and the lower side inside the bellows 1 so as to be close to the inner surface of the bellows 1.
- the rail 8 supports a movable block 10 which is a main body of the movable member so as to be movable along the longitudinal direction.
- An intermediate ring 5 is attached to each of the moving blocks 10. Therefore, the travel block 10 is connected to the inner surface of the bellows 1 via the intermediate ring 5. Is done.
- a linear guide 21 is provided on one side surface of the cross member 11 along the longitudinal direction.
- the movable frame 18 is slidably supported by the linear guide 21 via the slider 22.
- a ball screw 23 is rotatably mounted on one side surface of the cross member 11 along the longitudinal direction thereof.
- the movable frame 18 is fixed to the female screw member 25 screwed to the ball screw 23.
- a motor 26 for rotational drive is connected to one end of the pole screw 23. Thereby, the movable frame 18 can be moved in the horizontal direction via the female screw member 25 by the rotation of the ball screw 23.
- the inside of the bellows 1 is communicated with the atmosphere through a through hole 27 formed in a side wall 17. That is, the support structure (support mechanism) for the drive member 20 and the bellows 1 is located inside the bellows 1 on the atmosphere side. Therefore, particles generated from the driving member 20 and the sliding portion of the support structure do not scatter and float in the vacuum chamber 16 and contaminate the wafer.
- the movable frame 18 may be provided with a swivelable and extendable transfer arm mechanism (see Fig. 8) for holding the wafers one by one and transferring them in the horizontal direction via an elevating mechanism. it can. '
- FIG. 8 is a partially cutaway perspective view showing a semiconductor processing system incorporating the movable stage device shown in FIG.
- the semiconductor processing system 30 is formed of a horizontal casing that is long in one direction, and the common transfer chamber 32 (in FIG. 7, the vacuum chamber 16) can be set to a vacuum atmosphere. Shown as Have To one side surface of the common transfer chamber 32, three vacuum processing chambers 34 for performing semiconductor processing on a semiconductor wafer in a vacuum atmosphere are connected. The other side of the common transfer chamber 32 is connected to two load lock chambers (not shown) functioning as pressure buffer chambers for transferring a wafer.
- Ports 36 for loading and unloading a semiconductor wafer W as a substrate to be processed are formed on the side surface of the transfer chamber 32 in correspondence with the vacuum processing chamber 34 and the load-lock chamber.
- Each port 36 is provided with a gate valve G for hermetically separating the transfer chamber 32 from the vacuum processing chamber 34 and the load lock chamber.
- a movable stage device 15 shown in FIG. 7 is provided in the common transfer chamber 32.
- the movable stage device 15 has a movable frame 18 and a pair of bellows 1 disposed on both sides of the movable frame 18.
- the movable frame 18 and the pair of bellows 1 cooperate to form an auxiliary space 42 that is hermetically isolated from the atmosphere in the common transfer chamber 32.
- This auxiliary space 42 communicates with the atmospheric pressure atmosphere through openings 38 formed on both end walls of the common transfer chamber 32.
- a drive structure and a support structure shown in FIG. 7 are disposed in the movable frame 18 and the bellows 1, that is, in the auxiliary space 42. With these internal structures, the movable frame 18 can move horizontally between both end walls of the common transfer chamber 32. Further, on the movable frame 18, a swingable and extendable transfer arm mechanism 45 for handling the wafer W is provided via a lifting mechanism. The transfer arm mechanism 45 transfers the wafer W into and out of the vacuum processing chamber 34 and the load lock chamber through the port 36. According to the movable stage device 15 shown in FIGS. 7 and 8, the bellows 1 on both sides of the movable frame 18 have an auxiliary space 4 hermetically isolated from the atmosphere in the vacuum chambers 16 and 32. 2 is formed.
- a drive structure and a support structure for the movable frame 18 and the bellows 1 are provided in the catching space 42. Under such a configuration, the wafer is moved or transferred via the movable frame 18 (in FIG. 8, via the transfer arm mechanism 45). Therefore, scattering of particles in the vacuum chambers 16 and 32 and particle contamination on the wafer can be prevented.
- the embodiments of the present invention have been described in detail with reference to the drawings. However, the present invention is not limited to these, and various design changes and the like are possible without departing from the gist of the present invention. It is.
- the bellows is horizontal
- the bellows support structure according to the present invention is applicable even when the bellows is vertical.
- the intermediate ring is separate from the bellows, but the intermediate ring may be formed integrally with the bellows.
- the intermediate ring (intermediate support portion) and the moving member may be formed integrally or integrally.
- a rail is exemplified as the guide member (guide track).
- the guide track is a roller conveyor (roller bearing) in which rollers are connected in the longitudinal direction. You may. In this case, the moving member moves on the roller conveyor.
- the rails (guide members) are not limited to the upper part and the lower part, but may be arranged on the left and right.
- the chamber where the movable stage device is installed is limited to vacuum Instead, for example, a chamber filled with a predetermined gas (air, gas, or the like) or a liquid (water, chemical solution, or the like) may be used.
- the pressure in the room may be normal pressure, positive pressure, or negative pressure.
- the bellows is not limited to metal, but may be a material having corrosion resistance, for example, Teflon (registered trademark).
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Diaphragms And Bellows (AREA)
Abstract
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/565,978 US20060192505A1 (en) | 2003-07-28 | 2004-07-21 | Bellows-supporting structure and movable stage device |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003280549A JP4231364B2 (ja) | 2003-07-28 | 2003-07-28 | ベローズ支持構造及び可動ステージ |
| JP2003-280549 | 2003-07-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2005010980A1 true WO2005010980A1 (ja) | 2005-02-03 |
Family
ID=34100871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2004/010685 Ceased WO2005010980A1 (ja) | 2003-07-28 | 2004-07-21 | ベローズ支持構造及び可動ステージ装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20060192505A1 (ja) |
| JP (1) | JP4231364B2 (ja) |
| KR (1) | KR100787399B1 (ja) |
| CN (1) | CN100383950C (ja) |
| WO (1) | WO2005010980A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117963488A (zh) * | 2024-01-11 | 2024-05-03 | 宁波美亚特精密传动部件有限公司 | 直线导向装置 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5237178B2 (ja) * | 2009-04-14 | 2013-07-17 | 株式会社ミツトヨ | 移動機構の防塵装置および測定機 |
| JP5842385B2 (ja) * | 2011-05-18 | 2016-01-13 | 株式会社明電舎 | ベローズおよびその製造方法 |
| ES2613883T3 (es) * | 2012-07-13 | 2017-05-26 | Thk Co., Ltd. | Unidad de movimiento |
| CN118789242B (zh) * | 2024-09-14 | 2024-12-31 | 河北省安装工程有限公司 | 一种双壁波纹管便携式调节安装装置 |
| CN119927530B (zh) * | 2025-04-03 | 2025-08-08 | 江苏鑫环球建设工程有限公司 | 一种波纹管自动焊接设备 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5687656U (ja) * | 1979-12-10 | 1981-07-14 | ||
| JPH01169103A (ja) * | 1987-12-24 | 1989-07-04 | Fuji Seiki Co Ltd | ロッドレスシリンダ |
| JPH08279545A (ja) * | 1995-04-06 | 1996-10-22 | Dainippon Screen Mfg Co Ltd | 基板搬送装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3731595A (en) * | 1971-12-01 | 1973-05-08 | Borg Warner | Cylindrical bellows seal for extensive axial movement |
| JPS583966Y2 (ja) * | 1976-09-22 | 1983-01-24 | エヌオーケー株式会社 | ベロ−ズ装置 |
| US4170166A (en) * | 1977-05-31 | 1979-10-09 | Reed John H | Air motor with expansible chamber |
| JP2003077974A (ja) * | 2001-08-31 | 2003-03-14 | Hitachi Kokusai Electric Inc | 基板処理装置および半導体装置の製造方法 |
-
2003
- 2003-07-28 JP JP2003280549A patent/JP4231364B2/ja not_active Expired - Fee Related
-
2004
- 2004-07-21 CN CNB200480000878XA patent/CN100383950C/zh not_active Expired - Fee Related
- 2004-07-21 KR KR1020067001166A patent/KR100787399B1/ko not_active Expired - Fee Related
- 2004-07-21 US US10/565,978 patent/US20060192505A1/en not_active Abandoned
- 2004-07-21 WO PCT/JP2004/010685 patent/WO2005010980A1/ja not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5687656U (ja) * | 1979-12-10 | 1981-07-14 | ||
| JPH01169103A (ja) * | 1987-12-24 | 1989-07-04 | Fuji Seiki Co Ltd | ロッドレスシリンダ |
| JPH08279545A (ja) * | 1995-04-06 | 1996-10-22 | Dainippon Screen Mfg Co Ltd | 基板搬送装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117963488A (zh) * | 2024-01-11 | 2024-05-03 | 宁波美亚特精密传动部件有限公司 | 直线导向装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4231364B2 (ja) | 2009-02-25 |
| KR100787399B1 (ko) | 2007-12-21 |
| US20060192505A1 (en) | 2006-08-31 |
| CN100383950C (zh) | 2008-04-23 |
| JP2005050985A (ja) | 2005-02-24 |
| KR20060032206A (ko) | 2006-04-14 |
| CN1701431A (zh) | 2005-11-23 |
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