WO2005006086A1 - ホログラム記録材料、その製造方法及びホログラム記録媒体 - Google Patents
ホログラム記録材料、その製造方法及びホログラム記録媒体 Download PDFInfo
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- WO2005006086A1 WO2005006086A1 PCT/JP2004/009605 JP2004009605W WO2005006086A1 WO 2005006086 A1 WO2005006086 A1 WO 2005006086A1 JP 2004009605 W JP2004009605 W JP 2004009605W WO 2005006086 A1 WO2005006086 A1 WO 2005006086A1
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- hologram recording
- recording material
- compound
- metal oxide
- group
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- 239000000463 material Substances 0.000 title claims abstract description 69
- 238000000034 method Methods 0.000 title abstract description 4
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- 229910052751 metal Inorganic materials 0.000 claims abstract description 53
- 239000002184 metal Substances 0.000 claims abstract description 53
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- 230000007062 hydrolysis Effects 0.000 claims abstract description 14
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- 238000006116 polymerization reaction Methods 0.000 claims abstract description 13
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- 239000003999 initiator Substances 0.000 claims description 17
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- 239000002243 precursor Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 238000002156 mixing Methods 0.000 claims description 5
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- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- FABOKLHQXVRECE-UHFFFAOYSA-N phenyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C1=CC=CC=C1 FABOKLHQXVRECE-UHFFFAOYSA-N 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0248—Volume holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
- G03H2001/0264—Organic recording material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/10—Physical parameter modulated by the hologram
- G03H2240/11—Phase only modulation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/12—Photopolymer
Definitions
- holographic memory Research and development of holographic memory is underway as a recording technology that enables high-capacity, high-speed transfer. 25 pl, E. Vol. 25, No. 4, 385-390 (2003), describes the basic configuration of a holographic memory and its future prospects.
- the characteristics required for hologram recording materials include high refractive index change during recording, high sensitivity, low scattering, environmental resistance, durability, low dimensional change, and high multiplicity.
- a photopolymer material containing an organic binder polymer and a photopolymerizable monomer as main components is known.
- photopolymer materials have problems in environmental resistance, durability and the like.
- Organic-inorganic hybrid materials containing inorganic matrix and a photopolymerizable monomer as main components have been attracting attention and being studied in order to solve the problems of the polymer materials.
- the inorganic matrix has excellent environmental resistance and durability.
- Japanese Patent No. 29532000 discloses an optical recording film containing a photopolymerizable monomer or oligomer and a photopolymerization initiator in a film of an inorganic substance network. ing. It is also disclosed that the inorganic network is organically modified to improve the brittleness of the inorganic network film. However, the compatibility between the inorganic substance network and the photopolymerizable monomer or oligomer is not good. Therefore, it is difficult to obtain a uniform film. In particular, the film thickness of 100 m or more necessary to achieve high multiplicity In such a case, it is difficult to form a uniform film. Non-uniform film causes light scattering problems
- the film thickness is 100 or more
- light scattering becomes a very serious problem. That is, the light scattering lowers the transmittance of the hologram recording material, and the scattered light causes noise in the recorded data.
- the publication does not discuss recording characteristics such as scattering at a film thickness of 100 Aim or more.
- Japanese Patent Application Laid-Open No. H11-1344917 discloses an optical recording medium containing a photoactive monomer in an organic-inorganic hybrid matrix.
- the organic-inorganic hybrid matrix includes an alkyl group (methyl group) or an aryl group as a metal element.
- the refractive index of the hybrid matrix increases. If the refractive index of the hybrid matrix is high and approaches the refractive index of the photoactive monomer or its polymer, it is difficult to obtain a high refractive index change during recording. This reduces the degree of freedom in designing the recording medium.
- an organometallic compound containing an ethylenically unsaturated double bond and an ethylenically unsaturated double bond are contained as main chain constituents.
- a hologram recording material including a matrix comprising an organic-inorganic hybrid polymer obtained by copolymerizing an organic monomer and / or a hydrolyzed polycondensate thereof, a photopolymerizable compound, and a photopolymerization initiator is disclosed. .
- an object of the present invention is to provide a hologram recording material suitable for volume hologram recording that achieves high refractive index change, high sensitivity, low scattering, environmental resistance, durability, low dimensional change, and high multiplicity. Is to provide. Another object of the present invention is to provide a method for producing the hologram recording material. It is a further object of the present invention to provide a hologram recording medium having the photographic recording material.
- the present invention is a hologram recording material, comprising a metal oxide matrix and a photopolymerizable compound, wherein the metal oxide matrix has a halogen-containing organic group.
- the metal oxide matrix is formed by hydrolysis and polymerization of a metal alkoxide compound.
- the metal alkoxide compound has a general formula (1):
- the present invention is the above-mentioned hologram recording material, wherein the metal oxide matrix contains a silicon oxide as a main component.
- the present invention is the above-mentioned hologram recording material, wherein the photopolymerizable compound has an aromatic ring.
- the present invention is the above-mentioned hologram recording material, further comprising a photopolymerization initiator. Further, the present invention provides a compound represented by the general formula (1):
- a step of mixing a photopolymerizable compound and a step of curing the metal oxide matrix precursor mixed with the photopolymerizable compound to form a metal oxide matrix are included. , 0 Ah in the manufacturing method of the host ports Gras ⁇ recording material
- the present invention is a hologram recording medium having the hologram recording material.
- the compatibility between the matrix and the photopolymerizable compound, and the compatibility between the matrix and the organic polymer formed during recording can be improved.
- a hologram recording material having significantly improved compatibility is provided.
- Data storage using the hologram recording material of the present invention Provided is a hologram recording medium having a recording film thickness of 100 zm or more, which is suitable for recording.
- FIG. 1 is a diagram illustrating a schematic cross section of the hologram recording medium manufactured in the example.
- FIG. 2 is a diagram schematically illustrating the hologram recording optical system used in the example.
- the hologram recording material of the present invention contains a metal oxide matrix and a photopolymerizable organic compound as essential components, and the metal oxide matrix is modified with a halogen-containing organic group.
- the metal oxide matrix has a network-like network structure, and the network contains a photopolymerizable organic compound.
- the photopolymerizable organic compound undergoes a polymerization reaction in the exposed portion to be polymerized, and the photopolymerizable organic compound is exposed from the unexposed portion. Diffusion moves to the area, and the exposed area is further polymerized. As a result, a region with a large amount of polymer and a region with a small amount of polymer formed from the photopolymerizable organic compound are formed according to the light intensity distribution. At this time, the metal oxide matrix moves from the polymer-rich region to the polymer-poor region, and the polymer-rich region becomes a region with less metal oxide matrix.
- the refractive index of both the organic polymer and the metal oxide matrix may be designed to be higher and lower.
- the refractive index of a metal oxide matrix containing a silicon oxide as a main component is lower than the refractive index of an organic polymer. It is preferable that the mer has a high refractive index.
- the metal oxide matrix may have a high refractive index and the organic polymer may have a low refractive index.
- the metal oxide matrix in the present invention is, for example, a material such as porous glass, which is subjected to various surface modifications to introduce octogen-containing organic groups, or to subject water glass to surface treatment. Thus, it can be obtained by introducing a halogen-containing organic group, or by introducing a halogen-containing organic group by crosslinking or polymerization reaction.
- the pores of the porous glass matrix are preferably filled with a photopolymerizable compound described below.
- the metal oxide matrix in the present invention is preferably formed by a hydrolysis and polymerization reaction of a metal alkoxide compound, a so-called sol-gel reaction.
- the component of the metal alkoxide compound is represented by the general formula (1): (R H ) m M (OR) n ( The metal alkoxide compound represented by 1) is used.
- RH represents a halogen-containing organic group
- R represents an alkyl group
- M represents a metal atom
- m represents 1 or 2
- m + n represents the valence of the metal atom M.
- R H may be different for m and R may be different for n ⁇
- Examples of the metal atom include Si, AI, Ti, Zr, Zn, ln, and Sn. Of these, Si is preferable.
- the halogen-containing organic group represented by RH is, for example, a halogenated hydrocarbon group, especially an octalogenated alkyl group. Chlorine is preferred as halogen, and chloromethyl groups (one CH 2 CI), dichloromethyl groups (one CHCI 2 ), chlorobutyl pill groups (—CH 2 CH 2 CH 2 CI ), black hole heptyl group (one CH 2 CH 2 CH 2 CH 2 CI), 3- black port heptyl group (one CH 2 CH 2 CHCICH 3), 1, 2- dichloroethane port Echiru group (one CHCICH 2 CI) And the like.
- the number of carbon atoms of the halogenated alkyl group is not limited, but is usually about 4 or less.
- halogenated hydrocarbon group examples include, in addition to the above-mentioned chlorinated hydrocarbon group, alkyl bromide groups such as a bromomethyl group (_CH 2 Br) and a bromopropyl group (one CH 2 CH 2 CH 2 Br). And iodoalkyl groups such as propyl group (1 CH 2 CH 2 CH 2
- R H of the halogen-containing organic group represented by, black port E chill O carboxymethyl group (-CH 2 0CH 2 CH 2 CI ) ether bond-containing group such as, black hole phenyl group (one C 6 H 4 CI )) are also included.
- a lower alkyl group having 1 to 4 carbon atoms is preferable, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, and a sec-butyl group.
- the metal alkoxide compound represented by the general formula (1) has an octogen-containing organic group, a metal oxide matrix obtained by using the metal alkoxide compound has extremely high compatibility with a photopolymerizable compound. And at the time of recording, it has very good compatibility with the organic polymer formed by polymerization of the photopolymerizable compound.
- an ordinary metal alkoxide compound having no octogen-containing organic group is used.
- This metal alkoxide compound has the general formula (2):
- metal atom M examples include Si, AI, Ti, Zr, Zn, ln, and Sn. Of these, Si is preferred.
- Alkyl group is usually represented by Ri and R 2
- a lower alkyl group of moderate to 4 carbon atoms include methyl group, Echiru group, a propyl group, an isopropyl group, a butyl group, Isopuchi Le group, sec- butyl group and the like .
- silicon compounds preferred are, for example, tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, ethyltrimethoxysilane, methyltriethoxysilane, ethyltriethoxysilane and the like.
- Such materials include, for example, dimethyl dimethyl silane, dimethyl diethoxy silane and the like.
- the use amount of the metal alkoxide compound of the general formula (1) in the entire metal alkoxide compound cannot be determined unconditionally because it depends on the network configuration of the matrix and the content of the photopolymerizable organic compound.
- the metal alkoxide compound of the general formula (1) may be, for example, 0.05 to 1 moI, preferably 0.1 to 1 m0I with respect to the entire metal alkoxide compound ⁇ moI.
- the amount of the halogen-containing organic group represented by F may be set to 0.05 to equivalent of the terminal group of the metal oxide matrix.
- the photopolymerizable compound a compound selected from a radically polymerizable compound and a cationically polymerizable compound can be used.
- the radically polymerizable compound is not particularly limited as long as it has one or more radically polymerizable unsaturated double bonds in the molecule.
- a compound having a (meth) acryloyl group or a vinyl group may be used. Can be.
- compounds having a (meth) acryloyl group include phenoxyshetyl (meth) acrylate, trimethylolpropane (meth) acrylate, and pentaerythritol tetra (meth) acrylate.
- Dipentaerythritol hexa (meth) acrylate diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate , Bis (2-hydroxyethyl) isocyanuric di (meth) acrylate, 2,2-bis [4- (acryloxydiethoxy) phenyl] propane, etc., but are not necessarily limited to these. Not something.
- Examples of the compound having a vinyl group include divinylbenzene, ethylene glycol divinyl ether, diethylene glycol divinyl ether, triethylene glycol divinyl ether, and the like, but are not necessarily limited thereto. Only one radical polymerizable compound may be used, or two or more radical polymerizable compounds may be used in combination.
- the use of a polymer having an aromatic ring provides a higher refractive index organic polymer, and a difference in refractive index from a low refractive index metal oxide matrix containing a silicon oxide as a main component. Easy and preferred.
- an oligomer of the above-described radical polymerizable compound may be used as the photopolymerizable compound.
- the structure of the polymerizable compound is not particularly limited as long as it has at least one reactive group selected from a cyclic ether group and a vinyl ether group.
- Examples of the compound having a cyclic ether group among such clickable polymerizable compounds include a compound having an epoxy group, an alicyclic epoxy group, and a xentanyl group.
- compounds having an epoxy group include bisphenol A diglycidyl ether, novolak type epoxy resins, trisphenol methane triglycidyl ether, 1,4-butanediol diglycidyl ether, and 1,6- Xandi diglycidyl ether, glycerin triglycidyl ether, trimethylol propane triglycidyl ether, propylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, and the like.
- Examples of the compound having an alicyclic epoxy group include, for example, 2,4-epoxycyclyl hexylmethyl-3,4-epoxycyclohexanyl ethoxylate, bis (3,4-epoxycyclohexylmethyl) adipate , 2- (3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexanone-meta-dioxane, bis (2,3-epoxycyclopentyl) ether, EHPE— 3150 ( Alicyclic epoxy resin manufactured by Daicel Chemical Industries, Ltd.).
- compounds having an oxetanyl group include 1,4-bis [(3-ethyl-13-year-old xetanylmethoxy) methyl] benzene and 1,3-bis [(3-ethyl-3 1-year-old xetanylmethoxy) methyl] propane, ethylene glycol bis (3-ethyl-3-oxetanylmethyl) ether, trimethylolpropane tris (3-ethyl-1-3-year-old xetanylmethyl) ether, penyu erythritol tetrax (3-Ethyl-3-3-xentanylmethyl) ether, dipentaerythritol hexakis (3-ethyl-3-oxentanylmethyl) ether, ethylene-oxide-modified bisphenol A-bis (3-ethyl-3-year-old xentanylmethyl) ether, etc. Is mentioned.
- cationically polymerizable compounds as compounds having a vinyl ether group, specifically, triethylene glycol divinyl ether, tetraethylene glycol divinyl ether, trimethylolpropane trivinyl ether, cyclohexan-1,4- Examples include dimethylol divinyl ether, 1,4-butanediol divinyl ether, polyester divinyl ether, and polyurethane polyvinyl ether.
- One kind of the cationic polymerizable compound may be used alone, or two or more kinds may be used in combination.
- the use of a compound having an aromatic ring results in an organic polymer having a high refractive index, and the difference in the refractive index from that of a low-refractive-index gold-oxide matrix containing a silicon oxide as a main component is obtained. It is preferable because it can be easily obtained.
- an oligomer of the above-described cationic polymerizable compound may be used as the photopolymerizable compound.
- the photopolymerizable compound is used in an amount of, for example, about 10 to 100% by weight, preferably 50 to 500% by weight, based on the weight of the metal oxide matrix after curing. Good. If the amount is less than 100% by weight, it is difficult to obtain a large change in the refractive index during recording, and if it exceeds 100% by weight, it is difficult to obtain a large change in the refractive index during recording. It is preferable that the material further contains a photopolymerization initiator corresponding to the wavelength of the recording light. When photopolymerization initiator is contained, The exposure at this time promotes the polymerization of the photopolymerizable compound, so that higher sensitivity can be obtained.
- a photoradical initiator is used.
- a cationically polymerizable compound is used as the photopolymerizable compound, a light-powered thione initiator is used.
- Examples of the photo-radical initiator include Darocure 1173, Irgacure 784, Irgacure 651, Irgacure 184, and Irgacure 907 (all manufactured by CHIPAS Chemical Co., Ltd.).
- the content of the photoradical initiator is, for example, about 0.1 to 10% by weight, and preferably about 0.5 to 5% by weight, based on the radical polymerizable compound.
- sodium salt such as diazonium salt, sulfonium salt and sodium salt
- aromatic salt is preferably used
- an iron-arene complex such as a phenoctene derivative, a 7-aryl silanol-aluminum complex, and the like can also be preferably used, and it is preferable to appropriately select from these.
- Thylacure UVI-6970, Thylacure UVI-6974, Thylacure UVI-6990 all manufactured by Dow Chemical Co., USA
- Irgacure 264, Irgacure 250 all manufactured by Chipa Specialty Chemicals
- CIT-1682 Neippon Soda Manufactured
- the content of the light-powered thione initiator is, for example, about 0.1 to 10% by weight, preferably about 0.5 to 5% by weight, based on the strength of the polymerizable compound.
- the photopolymerization initiator preferably contains, in addition to the initiator, a dye serving as a sensitizer corresponding to the recording light wavelength.
- the photopolymerization initiator is decomposed after recording to stabilize hologram recording. Usually, it is decomposed by sufficient light irradiation after recording. Next, the production of the hologram recording material will be described.
- a metal alkoxide mixture containing the metal alkoxide compound represented by the general formula (1) and the metal alkoxide compound represented by the general formula (2) at a predetermined ratio is hydrolyzed and polymerized, and the metal oxidization is performed. Obtain the precursor of the matrix.
- This hydrolysis polymerization reaction can be carried out by the same operation and conditions as in the known sol-gel method. For example, a predetermined ratio of the metal alkoxide compound of the general formula (1) and the metal alkoxide compound of the general formula (2) is dissolved in a suitable good solvent to form a homogeneous solution, and a suitable acid catalyst is added dropwise to the solution, The reaction can be carried out by stirring the solution in the presence of water.
- Examples of such a solvent include water; alcohols such as methanol, ethanol, propanol, isopropanol, and butanol; ethers such as getyl ether, dioxane, dimethoxyethane, and tetrahydrofuran; N-methylpyrrolidone, and acetone. Examples include tritolyl, dimethylformamide, dimethylacetamide, dimethylsulfoxide, acetone, and benzene. Any of these may be appropriately selected, but alcohols are preferred. Alternatively, a mixed solvent thereof can be used. The amount of the solvent is not limited, but is preferably from 100 to 100 parts by weight based on 100 parts by weight of the entire metal alkoxide compound.
- the acid catalyst examples include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid; formic acid, acetic acid, trichloroacetic acid, trifluoroacetic acid, propionic acid, methanesulfonic acid, ethanesulfonic acid, p-toluenesulfonic acid, and the like.
- the hydrolysis polymerization reaction can be generally carried out at room temperature, depending on the reactivity of the metal alkoxide compound, and can be carried out at room temperature, and is carried out at 0 to 15 (temperature of about TC, preferably room temperature to 50 ° C). The reaction can be performed at a temperature of about C.
- the reaction time may be appropriately determined depending on the reaction temperature, but is about 1 to 240 hours.
- the reaction is performed in an inert atmosphere such as nitrogen gas.
- the alcohol generated by the polymerization reaction under reduced pressure of about 0.5 to 1 atm It may be performed while removing 4.
- a photopolymerizable organic compound is mixed.
- the photopolymerizable organic compound and the metal alkoxide compound may be mixed after hydrolysis, or may be mixed before hydrolysis.
- mixing after hydrolysis it is preferable to add and mix the photopolymerizable organic compound in a state where the metal oxide matrix precursor is in a sol state for uniform mixing. Further, the mixing of the photopolymerization initiator can be performed before or after the hydrolysis.
- the sol-state metal oxide matrix precursor in which the photopolymerizable organic compound is uniformly mixed is cured to form a metal oxide matrix.
- the hologram containing the photopolymerizable organic compound in the metal oxide matrix network and the photopolymerization initiator as an optional component Recording material is created.
- the film-form hologram recording material is produced by applying the sol-state metal oxide matrix precursor on a substrate, drying and curing the sol-state metal oxide matrix precursor.
- the metal alkoxide compound of the general formula (1) having an octogen-containing organic group is used as a metal oxide matrix material raw material component, the metal alkoxide compound in the production of the above-mentioned holographic recording material is shifted at the time of misalignment. Also have excellent compatibility with photopolymerizable compounds. In other words, the compatibility between the sol-state metal oxide matrix precursor and the photopolymerizable compound is very good, and the compatibility between the cured metal oxide matrix and the photopolymerizable compound is also very good. .
- the hologram recording medium of the present invention By using the hologram recording material of the present invention, it is possible to obtain a hologram recording medium having a recording film thickness of 100 im or more suitable for data storage.
- the hologram recording medium can be formed by forming a film-shaped hologram recording material on a substrate such as glass or resin, or by sandwiching a film-shaped hologram recording material between the substrates.
- the recording film thickness of the hologram recording medium is 10 m to 5 mm, and in order to have high multiplicity and to be suitable for data storage, 1 OO wm The above is preferable.
- the hologram recording medium of the present invention since the recording film is uniform, there is no problem of light scattering. Furthermore, at the time of recording, the photopolymerizable organic compound is polymerized in the exposed area, but the metal oxide matrix has an octogen-containing organic group, so that the compatibility between the metal oxide matrix and the polymer is very high. Is excellent. For this reason, according to the hologram recording medium of the present invention, sufficient compatibility is ensured at the time of recording and after recording, and the problems of light scattering and a decrease in transmittance do not occur. In general, polymers derived from photopolymerizable organic compounds (monomers) are less compatible with the metal oxide matrix. Example
- a hologram recording material was prepared by the following procedure using the sol-gel method.
- Si molar ratio (0C 2 H 5) 4: CIC 3 H6-Si (0C 2 H 5) 3 2: 1 Deatta.
- a solution consisting of 1.5 mL of water, 0.5 M of a 1N hydrochloric acid aqueous solution, and a solvent (5 mL of isopropanol) was added dropwise to the alkoxide solution at room temperature with stirring, and stirring was continued for 6 hours for hydrolysis. The reaction was performed. Thus, a sol solution of a silicon oxide into which a propyl group was introduced was obtained. (Photopolymerizable organic compound)
- the silicon oxide sol solution and the photopolymerizable organic compound are mixed at room temperature so that the final weight ratio of the matrix material and the photopolymerizable organic compound material is 1: 2, and the mixture is yellow and transparent.
- a hot mouth gram recording material solution was obtained.
- FIG. 1 showing a schematic cross section of a hologram recording medium.
- a glass substrate (22) provided with an anti-reflection film (22a) on one side is prepared.
- the end (22e) of the substrate is placed on the surface of the ⁇ - glass substrate (22) where the anti-reflection film (22a) is not provided.
- the obtained hologram recording material solution was applied so as to have a dry film thickness of 100, and was dried at room temperature for 24 hours to evaporate the solvent. By this drying step, the gelation (polymerization reaction) of the metal oxide proceeds, and an organic-inorganic hybrid hologram recording material film (21) containing a photopolymerizable organic compound in the metal oxide matrix network is obtained.
- a spacer (24) having a thickness of 100 Aim is placed on the end (22e) of the glass substrate (22) on which the mouth gram recording material film (21) is formed, and a hologram recording material film (21)
- the top was covered with another glass substrate (23) provided with an antireflection film (23a) on one side.
- glass The surface of the substrate (23) on which the antireflection film (23a) was not provided was covered so as to be in contact with the surface of the hologram recording material film (21).
- a hologram recording medium 1) having a structure in which the hologram recording material film (21) was sandwiched between two glass substrates (22) and (23) was obtained.
- the characteristics of the obtained hologram recording medium sample were evaluated in a hologram recording optical system as shown in FIG.
- a light source (1) of an Nd: YAG laser (532 nm) is used, and the light oscillated from this light source ⁇ ) is converted into a lens (2), pinhole (3), and shutter.
- the filter is spatially filtered by a lens (5), collimated, split by a beam splitter (8), and the total incident angle 2 of the two light beams to the hologram recording medium sample (11) is 36.9 °. And the interference of the two luminous fluxes was recorded in sample (11).
- the hologram was recorded by rotating the sample (11) in the horizontal direction and multiplexing it with an angle (sample angle-7.5 ° to + 7.5 °, multiplexing three or six angular intervals). After hologram recording, sufficient light was irradiated with only one light beam to react the remaining unreacted components. For reproduction, only one light beam was irradiated using the shutter (9), and the diffracted light rate was measured with the power meter (12) while rotating the sample (11). In Fig. 2, mirrors (6), (7), and (10) are used.
- ⁇ # (sum of the square root of the diffraction efficiency) was as high as 1.6 .
- ⁇ There was no decrease in transmittance at 532 nm (recording wavelength) before and after recording. .
- Si molar ratio (0C 2 H 5) 4: CH 3 - Si (0C 2 H 5) 3 2: 1.
- a silicon oxide sol solution was obtained in the same manner as in Example 1 except that the metal oxide matrix raw material was changed in this manner.
- the obtained methyl oxide-introduced silicon oxide sol solution and the same photopolymerizable organic compound as used in Example 1 were mixed in a final weight ratio of the matrix material and the photopolymerizable organic compound material. was mixed at room temperature so that the ratio became 1: 2.
- SKOCzHs in molar ratio *: 2: 1.
- a silicon oxide sol solution was obtained in the same manner as in Example 1 except that the metal oxide matrix raw material was changed in this way.
- the resulting silicon oxide sol solution into which the fluoro group was introduced and the same photopolymerizable organic compound used in Example I were mixed with the final matrix material and photopolymerizable organic compound.
- the materials were mixed at room temperature such that the weight ratio of the materials was 1: 2 to obtain a yellow transparent hologram recording material solution.
- This hologram recording material solution is applied to a glass substrate in the same manner as in Example 1, dried, and a hologram recording material film is formed. Further, a hologram recording having a structure in which the recording material film is sandwiched between two glass substrates The medium was obtained.
- the characteristics of the obtained hologram recording medium sample were evaluated in the same manner as in Example 1. 9 ffi went. At this time, the dynamic range: M # was 0.7, which was lower than that of the first embodiment. In addition, white clouding occurred in the recorded area (exposed area), and the transmittance at 532 nm was reduced by 5% from the level before recording.
- the introduction of a phenyl group into the metal oxide matrix was effective in improving compatibility with the introduction of the methyl group, but the compatibility with the polymer formed during recording was insufficient. .
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
- Polymerisation Methods In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Silicon Polymers (AREA)
Abstract
Description
Claims
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US10/563,815 US7767361B2 (en) | 2003-07-10 | 2004-06-30 | Hologram recording material, process for producing the same and hologram recording medium |
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JP2003-194817 | 2003-07-10 | ||
JP2003194817A JP4461725B2 (ja) | 2003-07-10 | 2003-07-10 | ホログラム記録材料、その製造方法及びホログラム記録媒体 |
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JP2005165054A (ja) * | 2003-12-03 | 2005-06-23 | Tdk Corp | 光学部品、光記録媒体及びその製造方法 |
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US7883821B2 (en) * | 2006-12-15 | 2011-02-08 | Tdk Corporation | Process for producing titanium-containing metal oxide, hologram recording material, process for producing the same, and hologram recording medium |
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JP2008292712A (ja) * | 2007-05-23 | 2008-12-04 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
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JP2009175367A (ja) * | 2008-01-23 | 2009-08-06 | Tdk Corp | ケイ素含有複合酸化物ゾルの製造方法、ケイ素含有ホログラム記録材料の製造方法及びホログラム記録媒体 |
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US7767361B2 (en) | 2010-08-03 |
JP2005031279A (ja) | 2005-02-03 |
JP4461725B2 (ja) | 2010-05-12 |
US20060172203A1 (en) | 2006-08-03 |
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