WO2004100283A3 - Elektrolyt zum elektrochemischen polieren von metalloberflächen - Google Patents

Elektrolyt zum elektrochemischen polieren von metalloberflächen Download PDF

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Publication number
WO2004100283A3
WO2004100283A3 PCT/EP2004/004600 EP2004004600W WO2004100283A3 WO 2004100283 A3 WO2004100283 A3 WO 2004100283A3 EP 2004004600 W EP2004004600 W EP 2004004600W WO 2004100283 A3 WO2004100283 A3 WO 2004100283A3
Authority
WO
WIPO (PCT)
Prior art keywords
electrolyte
metallic surfaces
electrochemically polishing
alloys
polishing metallic
Prior art date
Application number
PCT/EP2004/004600
Other languages
English (en)
French (fr)
Other versions
WO2004100283A2 (de
Inventor
Siegfrie Piesslinger-Schweiger
Razmik Abedian
Olaf Boehme
Original Assignee
Poligrat Holding Gmbh
Siegfrie Piesslinger-Schweiger
Razmik Abedian
Olaf Boehme
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Poligrat Holding Gmbh, Siegfrie Piesslinger-Schweiger, Razmik Abedian, Olaf Boehme filed Critical Poligrat Holding Gmbh
Priority to EP04730514A priority Critical patent/EP1625246B1/de
Priority to JP2006505339A priority patent/JP4592683B2/ja
Priority to CA002525138A priority patent/CA2525138A1/en
Priority to PL04730514T priority patent/PL1625246T3/pl
Priority to DE502004001497T priority patent/DE502004001497D1/de
Priority to US10/556,291 priority patent/US7807039B2/en
Publication of WO2004100283A2 publication Critical patent/WO2004100283A2/de
Publication of WO2004100283A3 publication Critical patent/WO2004100283A3/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/22—Polishing of heavy metals
    • C25F3/26—Polishing of heavy metals of refractory metals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

Die vorliegende Erfindung betrifft Elektrolyte zum elektrochemischen Polieren von Werkstücken aus Titan, Titanlegierungen, Niob, Nioblegierungen, Tantal und Tantallegierungen, die Schwefelsäure, Ammoniumbifluorid und wenigsten eine Hydroxycarbonsäure enthalten, sowie ein Verfahren zum elektrochemischen Polieren.
PCT/EP2004/004600 2003-05-09 2004-04-30 Elektrolyt zum elektrochemischen polieren von metalloberflächen WO2004100283A2 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
EP04730514A EP1625246B1 (de) 2003-05-09 2004-04-30 Elektrolyt zum elektrochemischen polieren von metalloberflächen
JP2006505339A JP4592683B2 (ja) 2003-05-09 2004-04-30 金属表面を電気化学的に研磨するための電解質
CA002525138A CA2525138A1 (en) 2003-05-09 2004-04-30 Electrolyte for electrochemically polishing metallic surfaces
PL04730514T PL1625246T3 (pl) 2003-05-09 2004-04-30 Elektrolit do elektrochemicznego polerowania powierzchni metalowych
DE502004001497T DE502004001497D1 (de) 2003-05-09 2004-04-30 Elektrolyt zum elektrochemischen polieren von metalloberflächen
US10/556,291 US7807039B2 (en) 2003-05-09 2004-04-30 Electrolyte for electrochemically polishing metallic surfaces

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10320909A DE10320909A1 (de) 2003-05-09 2003-05-09 Elektrolyt zum elektrochemischen Polieren von Metalloberflächen
DE10320909.3 2003-05-09

Publications (2)

Publication Number Publication Date
WO2004100283A2 WO2004100283A2 (de) 2004-11-18
WO2004100283A3 true WO2004100283A3 (de) 2004-12-09

Family

ID=33305203

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/004600 WO2004100283A2 (de) 2003-05-09 2004-04-30 Elektrolyt zum elektrochemischen polieren von metalloberflächen

Country Status (10)

Country Link
US (1) US7807039B2 (de)
EP (1) EP1625246B1 (de)
JP (1) JP4592683B2 (de)
AT (1) ATE339534T1 (de)
CA (1) CA2525138A1 (de)
DE (2) DE10320909A1 (de)
DK (1) DK1625246T3 (de)
ES (1) ES2271882T3 (de)
PL (1) PL1625246T3 (de)
WO (1) WO2004100283A2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006047713B3 (de) * 2006-10-09 2008-03-27 Poligrat Gmbh Elektropolierverfahren für Niob und Tantal und Elektrolyt
DE102007011632B3 (de) 2007-03-09 2008-06-26 Poligrat Gmbh Elektropolierverfahren für Titan
US20100213078A1 (en) * 2009-02-25 2010-08-26 Ryszard Rokicki Electrolyte composition for electropolishing niobium and tantalum and method for using same
US20110017608A1 (en) * 2009-07-27 2011-01-27 Faraday Technology, Inc. Electrochemical etching and polishing of conductive substrates
CA2781613C (en) * 2009-11-23 2017-11-14 Metcon, Llc Electrolyte solution and electropolishing methods
US20110303553A1 (en) * 2010-06-11 2011-12-15 Inman Maria E Electrochemical system and method for machining strongly passivating metals
US8580103B2 (en) 2010-11-22 2013-11-12 Metcon, Llc Electrolyte solution and electrochemical surface modification methods
CN102225504B (zh) * 2011-04-06 2013-12-25 宝鸡鑫泽钛镍有限公司 高精度钛及钛合金板制备工艺
CN102677142B (zh) * 2012-05-16 2015-07-08 安徽华东光电技术研究所 一种用于行波管螺旋线的电化学抛光方法
KR101600428B1 (ko) * 2014-07-15 2016-03-07 한국화학연구원 중이온 가속관의 나이오븀 식각방법
EP3109348B1 (de) * 2015-06-24 2020-06-03 Airbus Defence and Space GmbH Elektrolyt und verfahren zum elektrolytischen polieren eines metallischen substrats
WO2018102845A1 (de) * 2016-12-09 2018-06-14 Hirtenberger Engineered Surfaces Gmbh Elektropolierverfahren und elektrolyt hierzu
CN107937977A (zh) * 2017-12-20 2018-04-20 西安泰金工业电化学技术有限公司 一种阴极辊电解抛光液及抛光方法
JP6671763B2 (ja) * 2018-02-28 2020-03-25 三愛プラント工業株式会社 電解研磨液及び電解研磨方法
JP7313664B2 (ja) * 2019-06-17 2023-07-25 マルイ鍍金工業株式会社 電解研磨方法
DE102020200815A1 (de) 2020-01-23 2021-07-29 Mahle International Gmbh Zusammensetzung als Elektrolyt zum Auflösen und/oder Abscheiden von Metallen, Metalloxiden und/oder Metalllegierungen sowie Verwendungen dieser Zusammensetzung

Citations (4)

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Publication number Priority date Publication date Assignee Title
US2863811A (en) * 1955-05-09 1958-12-09 Gen Electric Method of etching capacitor electrodes
EP1094134A1 (de) * 1999-10-18 2001-04-25 General Electric Company Elektrochemische Vorrichtung und Verfahren zum Abziehen von metallischen Überzügen
US20020019128A1 (en) * 2000-06-05 2002-02-14 Jong-Won Lee Slurry for chemical mechanical polishing of metal layer, method of preparing the slurry, and metallization method using the slurry
US6447664B1 (en) * 1999-01-08 2002-09-10 Scimed Life Systems, Inc. Methods for coating metallic articles

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DK574274A (de) * 1973-12-06 1975-07-28 Ciba Geigy Ag
EP0139958B1 (de) * 1983-08-23 1986-11-05 BBC Aktiengesellschaft Brown, Boveri & Cie. Verfahren zum elektrolytischen Polieren eines Werkstücks aus einer Legierung auf Nickel-, Kobalt- oder Eisenbasis
JPH02310400A (ja) * 1989-05-22 1990-12-26 Nec Corp マグネシウム上のめっき皮膜を剥離する方法
JPH0394100A (ja) * 1989-09-04 1991-04-18 Canon Inc 電解研磨液及び電解研磨方法
JP3291512B2 (ja) * 1995-03-16 2002-06-10 日本パーオキサイド株式会社 過酸化水素、フッ化水素アンモニウム、及び硫酸を含有する酸性溶液の安定剤、及びこれを用いた鉄−ニッケル合金の化学的溶解処理液
US5861535A (en) * 1997-09-23 1999-01-19 Eastman Kodak Company Reductive alkylation process to prepare tertiary aminoaryl compounds
JP3318656B2 (ja) * 1999-04-08 2002-08-26 独立行政法人産業技術総合研究所 チタン複合材料
FR2795433B1 (fr) 1999-06-25 2001-08-31 Org Europeene De Rech Composition de bain pour le polissage electrolytique du titane, et son procede d'utilisation
US7128825B2 (en) * 2001-03-14 2006-10-31 Applied Materials, Inc. Method and composition for polishing a substrate
JP3484525B2 (ja) * 2001-07-06 2004-01-06 株式会社ケミカル山本 ステンレス鋼表面の清浄、不動態化処理方法
US7357854B1 (en) * 2002-08-19 2008-04-15 Advanced Cardiovascular Systems, Inc. Process for electropolishing a device made from cobalt-chromium

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2863811A (en) * 1955-05-09 1958-12-09 Gen Electric Method of etching capacitor electrodes
US6447664B1 (en) * 1999-01-08 2002-09-10 Scimed Life Systems, Inc. Methods for coating metallic articles
EP1094134A1 (de) * 1999-10-18 2001-04-25 General Electric Company Elektrochemische Vorrichtung und Verfahren zum Abziehen von metallischen Überzügen
US20020019128A1 (en) * 2000-06-05 2002-02-14 Jong-Won Lee Slurry for chemical mechanical polishing of metal layer, method of preparing the slurry, and metallization method using the slurry

Also Published As

Publication number Publication date
JP4592683B2 (ja) 2010-12-01
DK1625246T3 (da) 2006-11-13
EP1625246B1 (de) 2006-09-13
DE10320909A1 (de) 2004-11-18
DE502004001497D1 (de) 2006-10-26
CA2525138A1 (en) 2004-11-18
EP1625246A2 (de) 2006-02-15
US20070029209A1 (en) 2007-02-08
ES2271882T3 (es) 2007-04-16
ATE339534T1 (de) 2006-10-15
JP2006526071A (ja) 2006-11-16
US7807039B2 (en) 2010-10-05
PL1625246T3 (pl) 2006-12-29
WO2004100283A2 (de) 2004-11-18

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