WO2004048638A1 - Matiere a base de diamant composee de diamant issu d'un depot en phase vapeur et de diamant polycristalllin, et utilisation de ladite matiere - Google Patents

Matiere a base de diamant composee de diamant issu d'un depot en phase vapeur et de diamant polycristalllin, et utilisation de ladite matiere Download PDF

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WO2004048638A1
WO2004048638A1 PCT/CN2003/000864 CN0300864W WO2004048638A1 WO 2004048638 A1 WO2004048638 A1 WO 2004048638A1 CN 0300864 W CN0300864 W CN 0300864W WO 2004048638 A1 WO2004048638 A1 WO 2004048638A1
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diamond
chemical vapor
composite
polycrystalline
cvdd
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PCT/CN2003/000864
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French (fr)
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Jifeng Chen
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Jifeng Chen
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Priority to AU2003275516A priority Critical patent/AU2003275516A1/en
Publication of WO2004048638A1 publication Critical patent/WO2004048638A1/zh

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only

Definitions

  • the invention relates to a new material and application, in particular to a chemical vapor deposition diamond polycrystalline diamond composite diamond material and application thereof.
  • Chemical vapor deposition diamond is a full-crystalline polycrystalline pure diamond material (CVDD) prepared by chemical vapor deposition (abbreviated as CVD). It can be attached to the surface of the substrate in the form of a film, so it is often called a diamond film. It can also be a pure diamond slab that is detached from the substrate.
  • CVDD chemical vapor deposition
  • the physical properties of chemical vapor-deposited diamonds are roughly the same as or very close to natural diamonds, while the chemical properties are completely the same.
  • chemical vapor deposition diamond has a lower preparation cost, can be large-area and curved, and its thickness can be from less than one micrometer to several millimeters as required, it has a wider range of uses than granular diamond.
  • Chemical vapor deposited diamond has much higher hardness and abrasion resistance than ordinary polycrystalline diamond, and can be used for machining tools to achieve higher processing accuracy, smoothness and service life.
  • A. Coating method That is, a layer of chemical vapor-deposited diamond is directly coated on the cutting edge portion of the carbide tool, mold or drill. This method has been extensively studied and started to be practical, but it has not been widely promoted. The main reason is that the adhesion between the CVD diamond layer and the substrate is too poor, and it is easy to fall off the cemented carbide substrate.
  • the thickness of the CVD diamond layer is also very limited. Generally, it must be thinner than 50 ⁇ m, otherwise it will fall off or crack. At present, only a few companies in the world can apply coating products, and the price is relatively high, so they have not been widely promoted.
  • the object of the present invention is to improve the shortcomings of the prior art, and to provide a chemical vapor deposited diamond-polycrystalline diamond composite diamond material and its application.
  • the present invention adopts the following design schemes:
  • the invention can have three structures:
  • a CVD diamond layer with a thickness of more than 0.01mm (without thickness) is attached to the surface of the polycrystalline diamond.
  • the CVD diamond layer and the polycrystalline diamond layer are tightly combined to form a CVDD-PCD composite.
  • the CVDD-PCD composite system is attached to the cemented carbide substrate to make a CVDD-PCD-WC (Co) three-layer composite.
  • Polycrystalline diamond composite sheet (a double-layer composite composed of a combination of a polycrystalline diamond layer and a hard alloy layer) CVD diamond layer with a thickness of more than 0.01mm is attached to the surface of polycrystalline diamond.
  • the chemical vapor deposited diamond layer is tightly bonded to the polycrystalline diamond layer, and the polycrystalline diamond is tightly bonded to the cemented carbide layer to form CVDD- PCD-WC three-layer complex.
  • the invention can be used in the manufacture of tools and heat sinks. Such as the manufacture of cutting tools, wire drawing dies, dressing tools, wear-resistant parts, petroleum or geological drill bits and radiator parts.
  • the chemical vapor deposition diamond layer is grown on the surface of the polycrystalline diamond.
  • the growth temperature of chemical vapor deposited diamond is generally 600 ⁇ -1100 ⁇ .
  • the thermal expansion coefficients of the two differ greatly when the temperature is lowered after growth, which can easily cause a large amount of stress damage in chemical vapor deposited diamond.
  • the use of polycrystalline diamond as the substrate to grow chemical vapor deposited diamond has minimal internal stress damage caused by hot and cold deformation, and it is easier to ensure the quality of chemical vapor deposited diamond;
  • the CVDD-PCD composite has better processability than pure chemical vapor deposited diamond. Since the abrasion resistance of the polycrystalline diamond layer as a chemical vapor deposited diamond substrate or a transition layer is much lower than that of the chemical vapor deposited diamond layer, processing such as thickness control can be performed on the polycrystalline diamond surface, thereby greatly reducing the processing cost.
  • CVDD-PCD composite materials can not only give full play to the high wear resistance and high finish characteristics of chemical vapor deposited diamond, but also overcome the current chemical vapor deposited diamond applications such as poor impact resistance, poor adhesion, Poor workability and many other deficiencies make large-scale applications of CVD diamond, such as cutting tools, wire drawing dies, dressing tools, wear-resistant parts, petroleum or geological drills, etc.
  • Chemical vapor deposition diamond has high thermal conductivity and can be used for heat transfer radiators, such as heat dissipation substrates for high power density integrated circuits, laser diode array heat sinks, and the like.
  • CVDD-PCD composites have the same characteristics, but their growth and processing costs are much lower than those of pure chemical vapor deposited diamond of the same thickness. Therefore, it can be used in a certain range instead of pure chemical vapor deposition diamond for heat transfer radiators. 5. Since the chemical vapor deposited diamond has the same physical and chemical properties as the single crystal diamond, the CVDD-PCD composite material can also be used in the production of jewelry.
  • FIG. 2 is a schematic diagram of the present invention
  • FIG. 3 is a schematic diagram of the present invention
  • Figure 4 is a schematic diagram of a tool applied by the present invention.
  • Fig. 5 is a schematic diagram of a cutter applied in the present invention
  • Figure 6 is a schematic diagram of the mold used in the present invention.
  • FIG. 7 is a schematic diagram of a heat transfer radiator device according to the present invention.
  • Example 1 As shown in FIG. 1, the present invention consists of a chemical vapor deposited diamond layer 1 with a thickness of not less than 0.01 mm attached to the surface of the polycrystalline diamond 2, and the chemical vapor deposited diamond layer 1 and the polycrystalline diamond 2 are tightly combined to form In the CVDD-PCD composite, the adhesion is to grow a chemical vapor deposited diamond layer 1 on the surface of the polycrystalline diamond 2.
  • Example 2 As shown in FIG. 2, a CVDD-PCD composite 3 is attached to a cemented carbide substrate 4 to make a CVDD-PCD-WC (Co) three-layer composite, and the attachment is welding.
  • a CVDD-PCD composite 3 is attached to a cemented carbide substrate 4 to make a CVDD-PCD-WC (Co) three-layer composite, and the attachment is welding.
  • Embodiment 3 As shown in FIG. 3, a polycrystalline diamond composite sheet 5 is composed of polycrystalline diamond 7 and a cemented carbide substrate. A surface of the polycrystalline diamond hafnium has a chemical vapor deposition diamond layer 1 having a thickness of not less than 0.01 mm. The vapor-deposited diamond layer 1 and the polycrystalline diamond 7 are tightly bonded to each other, and the polycrystalline diamond and the cemented carbide substrate are tightly bonded to form a three-layer composite of the CVDD-PCD composite sheet. The adhesion is on the surface of the polycrystalline diamond 7 A chemical vapor deposited diamond layer 1 is grown.
  • Example 4 As shown in FIG. 4, the CVDD-PCD composite 3 provided in Example 1 was used as the core of the wire drawing die, and the structure of the sintered insert was powder 11, and the core of the CVDD-PCD composite 3 was cured. In the metal sleeve 10; or adopting the structure of interference fit and red loading, the CVDD-PCD composite mold core 3 is cured in the metal sleeve 10 to form a CVDD-PCD composite wire drawing mold mold.
  • Embodiment 5 As shown in FIG. 5, the CVDD-PCD-WC (Co) three-layer composite body 30 and the metal cutter body 20 (such as carbon steel, tool steel, or hard alloy) provided in Embodiment 2 are welded to each other.
  • Embodiment 6 As shown in FIG. 5, the CVDD-PDC three-layer composite provided in embodiment 3 and the metal cutter body 20, such as carbon steel, tool steel, and hard alloy, are welded as the three layers of the CVDD-PCD composite sheet Composite cutter or high-precision dresser.
  • Embodiment 7 As shown in FIG. 6, using polycrystalline diamond (PCD) as the core 20 of the wire drawing die, using the structure of the sintered sleeve of the powder 11, the PCD core 20 is solidified in the metal sleeve 10; Cooperating with the red structure, the PCD mold core 20 is cured in the metal sleeve 10. Perforate and process the hole pattern in the center of the mold, and then grow a chemical vapor deposition diamond layer 21 on the surface of the inner hole of the finished PCD mold as the wear-resistant layer of the wire drawing mold, thereby achieving higher finish and longer Service life.
  • PCD polycrystalline diamond
  • Example 8 A CVDD-PCD composite body provided in Example 1 was used to make a grinding wheel dressing tool.
  • Example 9 The CVDD-PCD composite provided in Example 1 was used to fabricate a machine tool blade of a whole diamond material.
  • Embodiment 10 As shown in FIG. 7, the CVDD-PCD composite provided in Embodiment 1 is used for a heat transfer heat sink 40, such as a microwave tube, a heat dissipation substrate of a high power density integrated circuit, a laser diode array heat sink, and the like.
  • the polycrystalline diamond 2 is connected to the copper heat sink 41.
  • Embodiment 11 A chemical vapor deposition diamond-coated cutting tool using polycrystalline diamond as a substrate. Industrial applicability:
  • the chemical vapor-deposited diamond polycrystalline diamond composite diamond material provided by the present invention can fundamentally solve the problem of adhesion and internal stress caused by cold and hot deformation, so that this new material with excellent performance can be truly applied to tools on a large scale And manufacturing of heat transfer radiators.

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Description

化学气相沉积金刚石聚晶金刚石复合型金刚石材料及应用 技术领域
本发明涉及一种新材料及应用, 特别是涉及一种化学气相沉积金刚石 聚晶金刚石复合型金刚石材料及其应用。
背景技术:
化学气相沉积金刚石是采用化学气相沉积 (简称 CVD)的方法制备出来 的一种全晶质多晶纯金刚石材料(简称 CVDD), 它可以呈膜状附着于基底 表面, 故又常称金刚石膜, 亦可以是脱离基底的纯金刚石厚片。 化学气相 沉积金刚石的物理性能和天然金刚石大致相同或非常接近, 化学性质则完 全相同。
由于化学气相沉积金刚石的制备成本较低, 可以大面积化和曲面化, 而 且其厚度可按需要从不足一微米直至数毫米,故有着比颗粒状金刚石更为广 泛的用途。 如:
1>利用其高硬度和耐磨性, 可以作为工具的超硬涂层, 从而使工具的 寿命提高十几到几十倍。 也可以用厚的化学气相沉积金刚石片, 加工制作 成各种焊接型金刚石工具, 如高精度砂轮修整刀、 拉丝模及各种超硬材料 加工和非铁金属加工用的刀具等。 由于化学气相沉积金刚石不含任何金属 或非金属添加剂, 其多晶结构又使其在各个方向都具有几乎相同的极高硬 度, 因此其机械性能兼具单晶金刚石和聚晶金刚石 (简称 PCD)的优点, 而 又在一定程度上克服了它们的不足。 实践表明, 厚膜化学气相沉积金刚石 工具的使用寿命可大大超过任何粒度的聚晶金刚石工具, 加工精度则可和 单晶金刚石工具近似, 明显优越于聚晶金刚石工具。 因此, 美国、 日本、 欧洲等发达国家和地区正逐渐将化学气相沉积金刚石作为未来汽车发动机 制造业中最理想的工具材料。
2>利用其高导热性、 高绝缘电阻以及与众多半导体材料较好匹配的低 热膨胀系数特性, 可制作微波管、 激光二极管、 列阵器件及大功率集成电路 等高功率密度电路元件的散热器件 热沉。 金刚石热沉的应用将导致微电 子和光电子工业发展的一次飞跃。
化学气相沉积金刚石比普通的聚晶金刚石具有高得多的硬度和耐磨 性, 用于机械加工工具可实现更高的加工精度、 光洁度及使用寿命。 目前 将化学气相沉积金刚石应用于刀具有两种做法: A. 涂层法。 即在硬质合金刀具、模具或钻具的刃口部位直接涂覆一层 化学气相沉积金刚石。 这种方法被大量研究并开始实用, 但总是得不到大 范围推广, 主要原因在于化学气相沉积金刚石层与基体间的附着力太差, 容易从硬质合金基体上脱落。 而且化学气相沉积金刚石层的厚度也受到了 很大的限制, 一般必须薄于 50 μ πι, 否则就会出现脱落或裂纹。 目前全世 界只有很少的几个公司的涂层产品可以得到应用, 而且价格偏高, 因此一 直得不到大量的推广。
Β.焊接型化学气相沉积金刚石厚膜工具。该种做法是将厚度 0.2-1.0mm (一般 0.5mm) 的化学气相沉积金刚石片悍接在硬质合金基体(简称 WC) 上做成 CVDD-WC复合片,然后再把 CVDD-WC复合片焊接在刀具基体上 制做成切削刀具。 但由于化学气相沉积金刚石与硬质合金的热膨胀系数相 差较大, 悍接后冷却时因收缩量差别较大, 容易造成化学气相沉积金刚石 内部严重的应力损伤, 导致化学气相沉积金刚石层脱落或出现裂紋, 在使 用中也容易崩刃, 因此其应用推广也受到了很大的限制。 该种产品从 20世 纪 90年代初期开始迸入市场, 到现在近 10年过去了, 虽然已经表现出了 非常优异的性能, 但在国内外仍然只是小批量使用。
发明内容. - 本发明的目的在于改进现有技术之缺点, 提供一种化学气相沉积金刚 石聚晶金刚石复合型金刚石材料及其应用。
为实现上述目的, 本发明采取以下设计方案:
如果将化学气相沉积金刚石直接附着于聚晶金刚石的表面, 则由于二 者热膨胀系数比较接近、 其基本结构又都是金刚石, 则可以从根本上解决 附着力问题及冷缩量不同造成的化学气相沉积金刚石内应力损伤问题。 因 为沉积过程中不会出现 CVDD与 Substrate的失控剥离,故化学气相沉积金 刚石层的厚度也可以不再受到限制, 质量也更容易保证。
本发明可有三种结构:
1、 聚晶金刚石表面附着厚度在 0.01mm以上 (厚度不限) 的化学气相 沉积金刚石层, 化学气相沉积金刚石层与聚晶金刚石层间结合紧密, 构成 CVDD-PCD复合体。
2、 硬质合金基体上附着 CVDD-PCD复合体制做成 CVDD-PCD-WC (Co) 三层复合体。
3、 聚晶金刚石复合片(聚晶金刚石层与硬质合金层结合构成的双层复 合材料) 的聚晶金刚石表面附着厚度在 0.01mm 以上的化学气相沉积金刚 石层, 化学气相沉积金刚石层与聚晶金刚石层间结合紧密, 聚晶金刚石与 硬质合金层间结合紧密, 构成 CVDD-PCD-WC三层复合体。
本发明可用于工具和散热器件的制造。 如切削工具、 拉丝模具、 修整工 具、 耐磨部件、 石油或地质钻头和散热器件的制造等。
结构 1 和结构 2 所述的附着为在聚晶金刚石表面生长化学气相沉积金 刚石层。
本发明的优点:
1、 化学气相沉积金刚石的生长温度一般在 600Ό-1100Ό, 采用普通基 体生长化学气相沉积金刚石, 在生长结束后降温时由于二者热膨胀系数相 差较多, 容易导致化学气相沉积金刚石内部大量的应力损伤。 而采用聚晶 金刚石作为基体生长化学气相沉积金刚石, 则因冷热变形所造成的内部应 力损伤极小, 更容易保证化学气相沉积金刚石的质量;
2、 做成 CVDD-PCD-WC (Co) 三层复合体, 则由于聚晶金刚石层比 化学气相沉积金刚石具有更好的抗冲击性, 其热膨胀系数也界于化学气相 沉积金刚石和硬质合金之间, 故可以起到很好的过渡及缓冲作用, 从而克 服化学气相沉积金刚石的抗冲击性差的弱点, 更好地发挥化学气相沉积金 刚石的优越特性。
3、 CVDD-PCD 复合材料比单纯的化学气相沉积金刚石具有更好的可 加工性。 由于作为化学气相沉积金刚石基底或过渡层的聚晶金刚石层的耐 磨性远远低于化学气相沉积金刚石层, 因此可在聚晶金刚石面进行厚度控 制等加工, 从而大大降低加工成本。
因此,采用 CVDD-PCD复合材料, 既可以充分发挥化学气相沉积金刚 石的高耐磨、 高光洁度特性, 又可以克服目前化学气相沉积金刚石应用中 所遇到的诸如抗冲击性差、 附着力差、 可加工性差等很多不足, 从而可以 实现化学气相沉积金刚石的大规模应用, 如切削工具、 拉丝模具、 修整工 具、 耐磨部件、 石油或地质钻头等。
4、 化学气相沉积金刚石具有很高的热导率, 可用于传热散热器件, 如 高功率密度集成电路的散热基体、 激光二极管列阵热沉等。 CVDD-PCD复 合材料具有相同的特性, 但其生长和加工成本则远远低于同样厚度的纯化 学气相沉积金刚石。 因此, 可以在一定范围内代替纯化学气相沉积金刚石 用于传热散热器件。 5、 由于化学气相沉积金刚石具有和单晶金刚石相同的物理和化学性 质, 因此 CVDD-PCD复合材料亦可用于珠宝首饰的制作。
附图说明- 图 1为本发明结构示意图
图 2为本发明示意图
图 3为本发明示意图
图 4为本发明应用的工具示意图
图 5为本发明应用的刀具示意图
图 6为本发明应用的模具示意图
图 7为本发明应用传热散热器件示意图
具体实施方式:
实施例 1 :如图 1所示,本实用新型由聚晶金刚石 2表面附着厚度不小 于 0.01mm的化学气相沉积金刚石层 1,化学气相沉积金刚石层 1与聚晶金 刚石 2层间结合紧密,构成 CVDD-PCD复合体,所述的附着为在聚晶金刚 石 2表面生长化学气相沉积金刚石层 1。
实施例 2:如图 2所示, 硬质合金基体 4上附着 CVDD-PCD复合体 3, 制做成 CVDD-PCD- WC (Co) 三层复合体, 所述的附着为焊接。
实施例 3 : 如图 3所示, 聚晶金刚石复合片 5由聚晶金刚石 7与硬 质合金衬底组成, 聚晶金刚石 Ί的表面附着厚度不小于 0.01mm的化学 气相沉积金刚石层 1, 化学气相沉积金刚石层 1与聚晶金刚石 7层间结 合紧密, 聚晶金刚石与硬质合金衬底间结合紧密, 构成 CVDD-PCD复 合片三层复合体, 所述的附着为在聚晶金刚石 7表面生长出化学气相沉 积金刚石层 1。
本发明 CVD-PCD复合型金刚石材料的应用于工具和散热器件的制 造 ··
实施例 4: 如图 4所示, 用实施例 1提供的 CVDD-PCD复合体 3做 为拉丝模的模芯, 釆用粉末 11烧结镶套的结构, 将 CVDD-PCD复合体 3模芯固化在金属套 10中;或采用过盈配合红装的结构,将 CVDD-PCD 复合体模芯 3固化在金属套 10中,做成 CVDD-PCD复合体拉丝模模具。
实施例 5 : 如图 5所示, 用实施例 2提供的 CVDD-PCD-WC ( Co ) 三层复合体 30与金属刀体 20 (如碳素钢、 工具钢或硬质合金) 焊接做 成 CVDD-PCD-WC (Co) 三层复合体刀具或高精度砂轮修整刀。 实施例 6: 如图 5所示, 用实施例 3提供的 CVDD-PDC三层复合体 与金属刀体 20, 如碳素钢、 工具钢和硬质合金焊接做为 CVDD-PCD复 合片三层复合体刀具或高精度砂轮修整刀。
实施例 7:如图 6所示,用聚晶金刚石(PCD)作为拉丝模的模芯 20, 采用粉末 11烧结镶套的结构, 将 PCD模芯 20固化在金属套 10中; 或 采用过盈配合红装的结构, 将 PCD模芯 20固化在金属套 10中。 在模 具的中心穿孔及加工孔型, 然后在做成的 PCD模具的内孔表面生长一 层化学气相沉积金刚石层 21, 作为拉丝模具的耐磨层, 从而可以实现更 高的光洁度和更长的使用寿命。
实施例 8:用实施例 1提供的 CVDD-PCD复合体制作砂轮修整工具。 实施例 9:用实施例 1提供的 CVDD-PCD复合体制作整体金刚石材 料的机卡刀片。 ,
实施例 10: 如图 7所示, 用实施例 1提供的 CVDD-PCD复合体用 于传热散热器件 40, 如微波管、 高功率密度集成电路的散热基体、 激光 二极管列阵热沉等, 铜热沉 41上连接聚晶金刚石 2。
实施例 11 : 以聚晶金刚石为基体的化学气相沉积金刚石涂层刀具。 工业实用性:
本发明提供的化学气相沉积金刚石聚晶金刚石复合型金刚石材料可以 从根本上解决附着力问题及因冷热变形造成的内部应力问题, 使这一性能 优异的新材料真正得到大规模的应用于工具及传热散热器件的制造。

Claims

权 利 要 求 书
1、一种由化学气相沉积金刚石和聚晶金刚石组成的化学气相沉积金刚石 聚晶金刚石复合型金刚石材料, 其特征在于: 聚晶金刚石表面附着化学气相 沉积金刚石层。
2、根据权利要求 1所述的一种化学气相沉积金刚石聚晶金刚石复合型金 刚石材料, 其特征在于: 硬质合金基体上附着所述的聚晶金刚石表面附着化 学气相沉积金刚石层。
3、根据权利要求 1所述的一种化学气相沉积金刚石聚晶金刚石复合型金 刚石材料, 其特征在于: 所述的聚晶金刚石有硬质合金衬底。
4、根据权利要求 1所述的一种化学气相沉积金刚石聚晶金刚石复合型金 刚石材料, 其特征在于: 所述的化学气相沉积金刚石层厚度不小于 0.01mm。
5、根据权利要求 3所述的一种化学气相沉积金刚石聚晶金刚石复合型金 刚石材料, 其特征于: 所述的化学气相沉积金刚石层厚度不小于 0.01ιηπι。
6、一种化学气相沉积金刚石聚晶金刚石复合型金刚石材料的应用,其特 征在于: 所述的化学气相沉积金刚石聚晶金刚石复合型金刚石材料应用于工 具及散热器件的制造。
7、根据权利要求 6所述的一种化学气相沉积金刚石聚晶金刚石复合型金 刚石材料的应用, 其特征在于: 所述的工具为 CVDD-PCD 复合体拉丝模模 具, 其结构为采用粉末烧结镶套的结构或采用过盈配合红装的结构,'将所述 的 CVDD-PCD复合型金刚石制品固化在金属套中加工成模具, 或者在聚晶 金刚石拉丝模具的内孔表面生长一薄层化学气相沉积金刚石。
8、 根据权利要求 6所述的一种化学气相沉积金刚石聚晶金刚石复合 型金刚石材料的应用, 其特征在于: 所述的工具为工具, 其结构为
a. CVDD-PCD复合片三层复合体与金属刀体焊接, 做成 CVDD-PCD 复合片三层复合体刀具或高精度砂轮修整刀。
b. CVDD-PCD复合体直接制作成的机卡式整体金刚石刀片。
C. 以聚晶金刚石为基体的化学气相沉积金刚石涂层刀具。
9、根据权利要求 6所述的 CVD-PCD复合型金刚石材料的应用, 其特征 在于: 所述的应用为传热散热器件。
10、根据权利要求 6所述的一种化学气相沉积金刚石聚晶金刚石复合 型金刚石材料的应用, 其特征在于: 所述的工具为刀具, 其结构为
CVDD-PCD-WC ( Co)三层复合体与金属刀体,焊接做成 CVDD-PCD- WC
( Co) 三层复合体刀具或高精度砂轮修整刀。
11、根据权利要求 1所述的一种化学气相沉积金刚石聚晶金刚石复合型 金刚石材料, 其特征在于: 所述的附着为生长。
12、根据权利要求 2所述的一种化学气相沉积金刚石聚晶金刚石复合型 金刚石材料, 其特征在于: 所述的硬质合金基体上附着为焊接。
PCT/CN2003/000864 2002-11-27 2003-10-16 Matiere a base de diamant composee de diamant issu d'un depot en phase vapeur et de diamant polycristalllin, et utilisation de ladite matiere WO2004048638A1 (fr)

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CN101856673A (zh) * 2010-06-18 2010-10-13 北京希波尔科技发展有限公司 一种复合结构的cvd金刚石拉丝模芯及制造方法和应用
CN104399990B (zh) * 2014-10-23 2017-07-11 金华中烨超硬材料有限公司 一种表面带花纹的硬质合金‑聚晶金刚石复合片及其制备方法
CN109128192A (zh) * 2017-06-28 2019-01-04 深圳先进技术研究院 聚晶金刚石复合片及其制备方法
CN110512106B (zh) * 2019-09-05 2021-07-20 广东技术师范大学 一种由渗氮烧结基体与微波涂层直接结合的金刚石涂层梯度硬质合金刀具的制备方法
US11488888B2 (en) * 2019-11-08 2022-11-01 Microchip Technology Caldicot Limited Chemical vapor deposition diamond (CVDD) wires for thermal transport
CN112337403B (zh) * 2020-11-04 2021-09-28 吉林大学 一种表面增强的三脊异形聚晶金刚石复合片及其制备方法

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