CN1274878C - 化学气相沉积金刚石聚晶金刚石复合型金刚石材料及应用 - Google Patents
化学气相沉积金刚石聚晶金刚石复合型金刚石材料及应用 Download PDFInfo
- Publication number
- CN1274878C CN1274878C CN 02153432 CN02153432A CN1274878C CN 1274878 C CN1274878 C CN 1274878C CN 02153432 CN02153432 CN 02153432 CN 02153432 A CN02153432 A CN 02153432A CN 1274878 C CN1274878 C CN 1274878C
- Authority
- CN
- China
- Prior art keywords
- diamond
- chemical vapour
- vapour deposition
- cvdd
- pcd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 183
- 239000010432 diamond Substances 0.000 title claims abstract description 183
- 239000002131 composite material Substances 0.000 title claims abstract description 33
- 239000000463 material Substances 0.000 title claims abstract description 24
- 238000000151 deposition Methods 0.000 title claims description 6
- 239000000126 substance Substances 0.000 title claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 78
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 10
- 239000000956 alloy Substances 0.000 claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims description 15
- 239000011159 matrix material Substances 0.000 claims description 12
- 230000012010 growth Effects 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 238000003466 welding Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000012546 transfer Methods 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 5
- 238000005491 wire drawing Methods 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 38
- 238000010586 diagram Methods 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000035939 shock Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 230000003245 working effect Effects 0.000 description 3
- 229910000975 Carbon steel Inorganic materials 0.000 description 2
- 229910001315 Tool steel Inorganic materials 0.000 description 2
- 239000010962 carbon steel Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 208000037656 Respiratory Sounds Diseases 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Chemical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims (8)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 02153432 CN1274878C (zh) | 2002-11-27 | 2002-11-27 | 化学气相沉积金刚石聚晶金刚石复合型金刚石材料及应用 |
AU2003275516A AU2003275516A1 (en) | 2002-11-27 | 2003-10-16 | Diamond material compounded of chemical vapor deposition diamond and polycrystalline-diamond, and the use of the same |
PCT/CN2003/000864 WO2004048638A1 (fr) | 2002-11-27 | 2003-10-16 | Matiere a base de diamant composee de diamant issu d'un depot en phase vapeur et de diamant polycristalllin, et utilisation de ladite matiere |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 02153432 CN1274878C (zh) | 2002-11-27 | 2002-11-27 | 化学气相沉积金刚石聚晶金刚石复合型金刚石材料及应用 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1504591A CN1504591A (zh) | 2004-06-16 |
CN1274878C true CN1274878C (zh) | 2006-09-13 |
Family
ID=32331920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 02153432 Expired - Lifetime CN1274878C (zh) | 2002-11-27 | 2002-11-27 | 化学气相沉积金刚石聚晶金刚石复合型金刚石材料及应用 |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN1274878C (zh) |
AU (1) | AU2003275516A1 (zh) |
WO (1) | WO2004048638A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101856673A (zh) * | 2010-06-18 | 2010-10-13 | 北京希波尔科技发展有限公司 | 一种复合结构的cvd金刚石拉丝模芯及制造方法和应用 |
CN104399990B (zh) * | 2014-10-23 | 2017-07-11 | 金华中烨超硬材料有限公司 | 一种表面带花纹的硬质合金‑聚晶金刚石复合片及其制备方法 |
CN109128192A (zh) * | 2017-06-28 | 2019-01-04 | 深圳先进技术研究院 | 聚晶金刚石复合片及其制备方法 |
CN110512106B (zh) * | 2019-09-05 | 2021-07-20 | 广东技术师范大学 | 一种由渗氮烧结基体与微波涂层直接结合的金刚石涂层梯度硬质合金刀具的制备方法 |
US11488888B2 (en) * | 2019-11-08 | 2022-11-01 | Microchip Technology Caldicot Limited | Chemical vapor deposition diamond (CVDD) wires for thermal transport |
CN112337403B (zh) * | 2020-11-04 | 2021-09-28 | 吉林大学 | 一种表面增强的三脊异形聚晶金刚石复合片及其制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5271971A (en) * | 1987-03-30 | 1993-12-21 | Crystallume | Microwave plasma CVD method for coating a substrate with high thermal-conductivity diamond material |
EP0449571B1 (en) * | 1990-03-30 | 1995-08-30 | Sumitomo Electric Industries, Ltd. | Polycrystalline diamond tool and method for producing the polycrystalline diamond tool |
JPH06297206A (ja) * | 1993-04-09 | 1994-10-25 | Sumitomo Electric Ind Ltd | 硬質焼結体工具およびその製造方法 |
JP3379150B2 (ja) * | 1993-06-14 | 2003-02-17 | 住友電気工業株式会社 | ダイヤモンド被覆材料およびその製造方法 |
US6344149B1 (en) * | 1998-11-10 | 2002-02-05 | Kennametal Pc Inc. | Polycrystalline diamond member and method of making the same |
-
2002
- 2002-11-27 CN CN 02153432 patent/CN1274878C/zh not_active Expired - Lifetime
-
2003
- 2003-10-16 WO PCT/CN2003/000864 patent/WO2004048638A1/zh not_active Application Discontinuation
- 2003-10-16 AU AU2003275516A patent/AU2003275516A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN1504591A (zh) | 2004-06-16 |
WO2004048638A1 (fr) | 2004-06-10 |
AU2003275516A1 (en) | 2004-06-18 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20090313 Address after: Beijing Chaoyang District Calendula Village Industrial Zone Patentee after: Beijing Supower Science and Technology Developing Co.,Ltd. Address before: Beijing Hipol company, 4 Jiuxianqiao Road, Beijing, Chaoyang District Patentee before: Chen Jifeng |
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ASS | Succession or assignment of patent right |
Owner name: BEIJING XIBOR SCIENCE AND TECHNOLOGY DEVELOPMENT C Free format text: FORMER OWNER: CHEN JIFENG Effective date: 20090313 |
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ASS | Succession or assignment of patent right |
Owner name: LANGFANG HAO BO DIAMOND CO., LTD. Free format text: FORMER OWNER: BEIJING XIBOR SCIENCE AND TECHNOLOGY DEVELOPMENT CO., LTD. Effective date: 20090911 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20090911 Address after: Hebei city of Langfang province Dachang County Qi Ge Zhuang Cun Xian Tan Lubei Patentee after: LANGFANG HAOBO DIAMOND Co.,Ltd. Address before: Beijing Chaoyang District Calendula Village Industrial Zone Patentee before: Beijing Supower Science and Technology Developing Co.,Ltd. |
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ASS | Succession or assignment of patent right |
Owner name: LANGFANG SUPOWER SCIENCE AND TECHNOLOGY DEVELOPMEN Free format text: FORMER OWNER: LANGFANG HAOBO DIAMOND CO., LTD. Effective date: 20120907 |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20120907 Address after: 065300 Baihe Industrial Zone, Dachang, Hebei, Langfang Patentee after: LANGFANG SUPOWER DIAMOND TECHNOLOGY Co.,Ltd. Address before: 065300 Hebei city of Langfang province Dachang County Qi Ge Zhuang Cun Xian Tan Lubei Patentee before: LANGFANG HAOBO DIAMOND Co.,Ltd. |
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CX01 | Expiry of patent term |
Granted publication date: 20060913 |
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CX01 | Expiry of patent term |