WO2004009708A1 - Curable resin composition - Google Patents

Curable resin composition Download PDF

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Publication number
WO2004009708A1
WO2004009708A1 PCT/JP2002/007360 JP0207360W WO2004009708A1 WO 2004009708 A1 WO2004009708 A1 WO 2004009708A1 JP 0207360 W JP0207360 W JP 0207360W WO 2004009708 A1 WO2004009708 A1 WO 2004009708A1
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WIPO (PCT)
Prior art keywords
group
resin
carbon atoms
resin composition
curable resin
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PCT/JP2002/007360
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French (fr)
Japanese (ja)
Inventor
Nobuyuki Furukawa
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Nippon Steel Chemical Co., Ltd.
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Application filed by Nippon Steel Chemical Co., Ltd. filed Critical Nippon Steel Chemical Co., Ltd.
Priority to JP2004522700A priority Critical patent/JPWO2004009708A1/en
Priority to PCT/JP2002/007360 priority patent/WO2004009708A1/en
Priority to AU2002318602A priority patent/AU2002318602A1/en
Publication of WO2004009708A1 publication Critical patent/WO2004009708A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N

Definitions

  • the present invention relates to a dihydroxazine resin having a dihydroxazine ring (hereinafter also referred to as a DHX resin) and a polyimide resin, which give a cured product having excellent heat resistance and curing properties.
  • Curable resin composition BACKGROUND ART
  • Thermosetting resins such as epoxy resins, phenolic resins, polyimide resins, melamine resins, polyimide resins, etc. have been developed and applied to fields suited to their respective resin characteristics.
  • curable resins used in copper-clad laminates for printed wiring boards, adhesives for multilayer wiring boards, sealing materials for semiconductors, adhesives for semiconductor mounting, modules for mounting semiconductors, automobiles and aircraft As for curable resins used for building components, etc., resin materials having excellent stability and reliability under high temperature and high humidity are required. Further, a resin material having halogen-free flame retardancy is strongly desired.
  • DHX resin is a resin having better heat resistance and moisture resistance than cured phenolic resin (H. Ishida, et al., J. Polym. Sci., Vol. 32, p921 (1994), H. Ishida, et al., J. Appl. Polym. Sci., Vol. 61, 1595 (1996)).
  • This resin has high ring-opening polymerization reactivity. Therefore, it has also been shown that the cured product after ring-opening reaction has various characteristics, such as low thermal expansion, because it has low curing shrinkage (H. I shi da, et. al., J. Polym. Sci., Vol. 34, 1019 (1994),)). Further, it has also been shown that it shows reactivity with epoxy resins and is effective as a curing agent (Japanese Patent Application Laid-Open No. 4-227922).
  • various polyimide resins were developed and used as heat-resistant films, insulating varnishes, heat-resistant adhesives, molding materials, copper-clad laminates for flexible printed circuit boards, adhesive films for multilayer printed circuit boards, It is used as a cover film for circuit boards, a semiconductor coating agent, an underfill agent, a sealing material for TAB, and a member in the aerospace field.
  • thermoplastic and moldable polyimide resins and polyimide resins soluble in organic solvents have been developed, and their application fields are expanding. In particular, in the field of semiconductors and printed circuit boards, high reliability as well as heat resistance are required, and polyimide materials having excellent mechanical and electrical properties have been used.
  • JP-B-49-47378, JP-A-2-69567, JP-A-4-227922, and JP-A-9-216994 disclose a compound having a dihydrobenzoxazine ring and a compound having the same.
  • Thermosetting resin compositions have been reported. But this All are made of low molecular weight resins and cannot be used as films / sheets or fibers, or have insufficient heat resistance, electrical properties or mechanical properties.
  • DISCLOSURE OF THE INVENTION An object of the present invention is to provide a curable resin composition having excellent heat resistance and flame retardancy, and also having excellent properties in adhesion to metals such as copper and stainless steel.
  • Another object of the present invention is to provide a curable resin composition having both characteristics of a polyimide resin and a DHX resin.
  • the curable resin composition of the present invention is selected from a thermosetting resin having at least one dihydroxy pyridine ring condensed with an aromatic hydrocarbon ring, a polyimide resin, a polyimide precursor, and a mixture thereof.
  • the curable resin composition is characterized in that it contains the polyimide resin used in a weight ratio of 5 to 9'5: 95 to 5.
  • the curable resin composition of the present invention essentially comprises a thermosetting resin (DHX resin) having at least one dihydroxazine ring, and a polyimide resin selected from a polyimide resin, a precursor thereof, or a mixture thereof. Contains as an ingredient.
  • the content of the DHX resin in the resin composition is 5 to 95% by weight based on the total amount of the resin components.
  • the content of the polyimide resin is in the range of 5 to 95% by weight, preferably 20 to 80% by weight, based on the total amount of the resin components. If the content of DHX resin is too small, the cured product will not be effective in heat resistance, flame retardancy, adhesion, etc. In addition, the flexibility of the polyimide resin is impaired, the brittleness of the cured product becomes apparent, and the superiority of the material is lost.
  • the DHX resin is not particularly limited as long as it has at least one dihydroxazine ring condensed with an aromatic hydrocarbon ring, and is a resin that is cured by a ring-opening polymerization reaction of the dihydroxazine ring. DHX resin and the like can also be used.
  • the aromatic hydrocarbon ring condensed with the dihydroxazine ring is preferably a benzene ring or a naphthalene ring, and these aromatic hydrocarbon rings are alkyl groups having 3 or less carbon atoms such as a methyl group. And the like, but those having no substituent are preferred.
  • the dihydroxazine ring condensed with a benzene ring is called dihydrobenzoxazine 1 and is called a dihydrobenzoxazine ring resin (hereinafter referred to as DHB resin).
  • DHB resin dihydrobenzoxazine ring resin
  • a dihydroxazine ring condensed with a naphthalene ring is Since it is called a dronaphthoxazine ring, it is called a dihydronaphthoxazine ring resin (hereinafter, DNH resin).
  • DNH resin dihydronaphthoxazine ring resin
  • each is a type of DHX resin.
  • the DHX resin is a DHB resin represented by the following general formula (3) or a DHB resin represented by the following general formula (4) in that it is easily mixed with the polyimide resin and suppresses a decrease in heat resistance after curing.
  • it is a D HN resin.
  • R9 and R10 are organic radicals 0 1 1 carbon atoms, R11 is a hydrogen atom or a hydrocarbon group with carbon number 1_ ⁇ 6, or not Y is present, - C (CH 3) 2 -, - CO -, - 0-, - S-, - S0 2 - - CH 2 - (- indicates a group represented by or formula (5) CFJ 2), _C
  • R15 represents hydrogen or an alkyl group having 1-6 carbon atoms
  • R16 represents an alkyl group having 1-6 carbon atoms, cyclohexyl group, phenyl group, substituted phenyl group, naphthyl group or substituted naphthyl group
  • the group represented by the formula (5) is a group derived from a specific phenol resin, and is represented by the following formula (5).
  • R 12 represents an organic group having 1 to 10 carbon atoms
  • R 13 represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms
  • R 14 represents a methylene group or a P-xylylene group
  • n represents 1 to Indicates an integer of 10
  • R9 and R10 are organic groups having 1 to 10 carbon atoms, but are preferably an alkyl group, a phenyl group or an alkylphenyl group.
  • Rll is a hydrogen atom, and is preferably a hydrocarbon group having 1 to 6 carbon atoms, but is preferably a hydrogen atom or an alkyl group.
  • Y is absent, - C (CH 3) 2 -, - CO -, - 0-, - S -, - S0 2 _, - CH 2 -, _C (CF 3) 2 - or the formula (5)
  • the group represented is represented, preferably _C (CH 3 ) 2- .
  • R15 represents hydrogen or an alkyl group having 1 to 6 carbon atoms;
  • R16 represents an alkyl group having 1 to 6 carbon atoms, cyclohexyl group, phenyl group, substituted phenyl group, naphthyl group or substituted naphthyl group.
  • R12 represents an organic group having 1 to 10 carbon atoms, preferably an alkyl group, a phenyl group, or an alkylphenyl group.
  • R 13 is a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms, but is a hydrogen atom or an alkyl group
  • R 14 represents a methylene group or a p-xylylene group
  • n is an integer of 1 to 10 Is shown.
  • the p-xylylene group is represented by the following formula.
  • Desirable DHX resin used in the present invention may be composed of only the resin represented by the general formula (3) or the general formula (4) ′, and is a resin containing a small amount of a partial polymer thereof. Or a mixture thereof. In addition, it may contain a small amount of impurities by-produced during the production of DHX resin, partially ring-opened products, unreacted products, and the like.
  • the DHB resin used in the present invention can be produced by a known method. Examples of preferable reaction raw materials include a phenol compound, a primary amine and an aldehyde represented by the following general formula.
  • Phenol compound H O -Ar3 or H 0- Ar4-OH
  • Ar3 is a monovalent aromatic group
  • Ar4 is a divalent aromatic group, and is preferably a polycyclic aromatic group having two or more rings, and a substituent such as a halogen or an alkyl group. But has at least one hydrogen that can be substituted ortho to the OH group.
  • R is a monovalent aliphatic or aromatic organic group, preferably an aromatic group, and may have a substituent such as halogen. It is also preferable that the compound is a polycyclic aromatic group having two or more rings. Preferably, it is an alkyl group having 1 to 10 carbon atoms, a cyclohexyl group, a phenyl group or a substituted phenyl group.
  • R ′ is hydrogen or an organic group such as a monovalent aliphatic or aromatic group, and is preferably hydrogen, a low-fiber or alkynole group.
  • DHB resins can be obtained by changing the phenol compound, primary amine or aldehyde.
  • phenol conversion phenol conversion
  • the following compounds are used as raw materials as compounds, primary amines and aldehydes.
  • represents p-phenylene, and R9 and R10 may be the same.
  • Phenosole compound H O— ⁇ — ⁇ _ ⁇ _ ⁇ ⁇
  • the primary amine is preferably (0.8 to 1.2) X y mol, preferably. Or (0.9 to: L.1) Xy mole, and the aldehyde is (1.6 to 2.4) Xy mole, preferably (1.8 to 2.2) Xy mole. It is desirable to carry out the reaction using.
  • the phenolic compounds used as raw materials for DHB resin include phenols having at least one ortho-bonded with hydrogen, polyfunctional phenols, bisphenols, 1,1,1-tris (4- And trisphenols such as hydroxyphenyl) ethane.
  • it is a compound having two or more phenolic hydroxyl groups in one molecule from the viewpoint of thermosetting properties.
  • Specific examples include polyfunctional phenols such as catechol, resorcinol, and hydroquinone, and bisphenols such as bisphenol ⁇ / A, bisphenolphenol S, bisphenol and hexafluorobisphenol A.
  • phenol resin examples include a phenol novolak resin, a resole resin, a phenol-modified xylene resin, an alkyl phenol resin, a melamine phenol resin, and a polybutadiene-modified phenol resin. One or more of these can be used.
  • First-class amines include methylamine, butylamine, and cyclohexylamine.
  • Aliphatic amines such as mine, aromatic amines such as aniline, toluidine, and fusidine can be used, and one or more of these can be used.
  • aldehyde the above-mentioned aldehyde can be used, but when formaldehyde is used, it can be used in any form as a formalin aqueous solution or as a paraformaldehyde.
  • DHB resin examples include the following DHB resins. However, the present invention is not limited to these, and one or more of them may be used.
  • the DHX resin used in the present invention is a dihydronaphthoxazine ring.
  • a thermosetting resin also referred to as DHN resin
  • This DHN resin can be used alone as a DHX resin, or can be used in combination with the DHB resin as described above.
  • a specific method for producing the DHN resin is, as in the case of the DHB resin described above, a reaction in which a primary amine is gradually added to formaldehyde, and then a naphthol hydroxyl group is formed. The compound is added and kept at 70-120 ° C. for 20 minutes to 24 hours. At this time, an organic solvent can be used if necessary. After the reaction, the product is isolated and purified by a synthetic chemical method such as extraction, and then purified and dried to remove volatile components such as condensed water to obtain the desired DHN resin.
  • the DHN resin specifically, the following resins are preferably exemplified.
  • the power is not limited to these.
  • the DHX resin causes a ring-opening polymerization reaction upon heating, and forms a crosslinked structure having excellent properties while generating a phenolic hydroxyl group without generating volatile components.
  • This cured product has low moisture absorption, high glass transition temperature, high strength-high elasticity, low curing shrinkage, and excellent flame retardancy. Note that D H
  • the X resin may be a single compound before curing, may be a mixture containing a small amount of by-products, or may be a partially polymerized oligomer in the present invention.
  • D ⁇ X resin in both cases, No.
  • polyimide resin used as another essential component of the curable resin composition of the present invention examples include a component composed of a repeating unit containing an imido group or an amic acid or both.
  • the polyimide resin is preferably a resin obtained from a tetracarboxylic acid compound and a diamine compound, and more preferably contains a repeating unit structure represented by the following general formula (1) or (2). It is a polyimide resin or a precursor thereof.
  • a polyimide resin or a precursor resin containing 50% by weight or more of one or both of the structural units represented by the general formula (2) or (3) above (Polyamic acid) is preferred.
  • Arl and Ar2 have at least one aromatic ring It is a tetravalent organic group, and can be said to be a residue of a tetracarboxylic acid compound. Therefore, preferred Arl and Ar2 are understood from the preferred tetracarboxylic acid compounds described below. Further, the divalent group bonded to two Ns can be said to be a residue of a diammine compound.
  • R1 and R2, i and j, and X are understood from the preferred diamine compounds described below.
  • R1 and R2 - 0H, - NH 2, - SH, - C0NH 2 or carbon atoms 1 shows a 6 organic group, preferably a lower alkyl group.
  • i and j each represent an integer of 0 to 4, preferably 0 to 2.
  • R3 and R4 represent a divalent organic group having 1 to 10 carbon atoms, preferably an alkylene group or a phenylene group having 1 to 6 carbon atoms.
  • R5 to R8 represent hydrogen or an organic group having 1 to 6 carbon atoms, preferably an alkylene group or a phenylene group having 1 to 6 carbon atoms.
  • m represents a number of 1 to 10, preferably 2 to 8.
  • an acid dianhydride is preferable.
  • Specific examples include pyromellitic dianhydride (PMDA), 3,3 ', 4,4'-diphenylsulfonetetracarboxylic dianhydride
  • DSDA 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride
  • BPDA 4,4'-biphenyltetracarboxylic dianhydride
  • a-BPDA 2,3', 3,4'-biphenyltetracarboxylic dianhydride
  • BTDA 4,4'-Benzophenonetetracarboxylic dianhydride
  • DPA 2,2'-bis (3,4-dicarboxyphenyl) ether dianhydride
  • a-0DPA 2,2, -bis (3,4-dicarboxyphenyl) propane dianhydride
  • BDCP 2,2'-bis (3,4-dicanolepoxif) Enyl) hexafluoropropane dianhydride
  • NTCA 1,4,5,8-naphthalenetetracarboxylic dianhydride
  • BDCF 1,4,5,8-naphthalenetetracarboxylic dianhydr
  • the diamine compound can be used without limitation as long as it is a compound having two or more amino groups in the molecule, but from the viewpoint of improving heat resistance, aromatic diamine is preferred. Desirably, it is a compound.
  • Preferred specific examples of the diamino compound include the following diamines. However, the present invention is not limited to these, and one or more kinds can be used. In addition, m-phenylenediamine, p-phenylenediamine and the like can also be used.
  • a siloxane-based diamine providing a repeating unit represented by the general formula (2)
  • the amine include bis (3-aminopropyl) 1-1,1,3,3-tetramethyldisiloxane and bis (4-aminophenyl) 1-1,1,3,3 —Tetramethyldisiloxane, bis (3-methinolay 4-aminophenol) 1,1,1,3,3-tetramethyldisiloxane, or the following general formula (6)
  • R3 to R4 and n are the same as those in the general formula (2)).
  • R3 and R4 are preferably a trimethylene group
  • R5 to R8 are each a methyl group, a Bier group or a phenyl group.
  • the polyimide resin can be synthesized by reacting tetracarboxylic dianhydride with a diamino compound in substantially equimolar amounts. Known reaction conditions can be employed.
  • the polyimide resin is represented by the general formula (1) or
  • the polyimide resin unit represented by (2) or a precursor unit thereof may be contained as a repeating unit in an amount of 50% by weight or more, preferably 80% by weight or more. It contains both the polyimide resin units represented by the general formulas (1) and (2) or the precursor unit thereof, and the weight ratio of the units represented by the general formulas (1) and (2) is 20 to 8 0: 80 to 20 is also advantageous.
  • the curable resin composition of the present invention is obtained by adding a DHX resin to a polyimide resin and a DHX resin by a conventional blending method or a polyimide resin or a polyimide acid solution which is a polyimide precursor. Add, mix and dry if necessary It can be manufactured more.
  • the weight ratio of Porii Mi de resin and DHX resin is 5-95: A 95-5 0
  • an epoxy resin may be used as one component of the resin composition.
  • the epoxy resin used as one component of the curable resin composition of the present invention include bisphenol II epoxy resin, bisphenol F epoxy resin, phenol nopol epoxy resin, and Examples include, but are not limited to, resole nopolak type epoxy resin, hydrogenated bisphenol A type epoxy resin, various alicyclic epoxy resins, various epoxy resins having a naphthalene structure, and brominated epoxy resins. It can be used without. Further, one or more of these can be used.
  • a compound having a phenolic hydroxyl group which has an effect of opening the dihydroxazine ring for example, a compound having a bisphenol A, a nopolak resin, a resole resin, or an amino group may be used. You can also.
  • an imidazole compound, a dicyandiamide compound, and a phosphorus compound can be used as a curing reaction catalyst.
  • thermosetting resin composition of the present invention may contain various phenolic resins, melamine resins, polyamide resins, and the like, if necessary, in addition to the components described above.
  • phosphines such as triphenyl phosphine, phosphites, ester phosphites, ester phosphites, phosphine oxides, etc.
  • Various organic phosphorus compounds can also be used.
  • the curable resin composition of the present invention contains a DHX resin and a polyimide resin as essential components.
  • a DHX resin and a polyimide resin the amounts thereof are as described above, but more preferably 100 to 100 parts by weight of the polyimide resin, and more preferably 5 to 50 parts by weight of the DHX resin. It is.
  • the other resin components should be 40% by weight or less, preferably 20% by weight or less of the total resin component.
  • all resin components in the curable resin composition refer to components excluding components other than resin such as filler.
  • the curable resin composition of the present invention is not only used as a molding material and a varnish, but also has excellent moldability, so that it can be used in the form of a film, a sheet, a fiber or the like.
  • the curable resin composition of the present invention can form a crosslinked structure by a thermal reaction and can be thermoset.
  • the cured product obtained in this way is a cured resin having excellent heat resistance and flame retardancy, and also having excellent adhesion to metal.
  • BAPD Bis (3-aminopropyl)-1, -1,3,3-tetramethyldisiloxane
  • PSX750 bis (3-aminopropyl) dimethylpolysiloxane with an average molecular weight of 750
  • PSX1000 bis (3-aminopropyl) dimethylpolysiloxane with an average molecular weight of 1000
  • NMP N-methyl-2-pyrrolidinone
  • Thermosetting with dihydrobenzoxazine ring in the above polyimide solution After mixing the resin lOg, it was cast on a glass substrate and cast using a doctor blade. Furthermore, this is placed in an inert oven under a stream of nitrogen,
  • the resin layer was separated from the glass substrate and fixed to a stainless steel metal frame. This was dried at 180 ° C. for 10 minutes to obtain a curable resin composition film. Using this film, the adhesive strength with copper and stainless steel was measured. The film was further heat-treated at 180 ° C. for 60 minutes, and then its physical properties were measured.
  • Tg glass transition temperature
  • DMA dynamic viscoelasticity analyzer
  • TMA thermomechanical analyzer
  • TGA thermal decomposition onset temperature (5% weight loss temperature)
  • Flexural strength and flexural modulus were measured using a gravimetric analyzer (TGA) according to JIS K6911.
  • the cured product was treated under PCT (121 ° C, 2 atm) treatment time of 20 hours, and the change in weight before and after PCT treatment was measured to determine the water absorption.
  • PCT 121 ° C, 2 atm
  • the flame retardancy of the 1.6 mm thick cured product was evaluated according to the UL standard method.
  • the adhesive strength was evaluated according to JIS K 6850 using a pressure press at a compression temperature (glass transition temperature + 50 ° C) and a compression pressure (19.6 MPa). Note that the adhesive strength (1) indicates copper, and the adhesive strength (2) indicates stainless steel. Table 1 shows the raw material composition of the polyimide resin and the compounding composition of the resin composition, and Table 2 shows the physical properties of the obtained cured product.
  • Example 1 The description of Example 1 was repeated except that the epoxy resin (Epicoat 828) was used instead of the DHX resin, and the raw material composition of polyimide 'resin and the composition of the curable resin composition were as shown in Table 1.
  • the evaluation was performed in the same manner as described above.
  • a phenol nopolak resin was used as a curing agent for the epoxy resin, and triphenyl phosphine was used as a curing accelerator.
  • Table 1 shows the raw material composition of the polyimide resin and the composition of the resin composition.
  • Table 2 shows the physical properties of the obtained cured product. .
  • the curable resin composition of the present invention has excellent heat resistance and flame retardancy because of having a crosslinked structure by a thermal reaction, and also has excellent adhesion to metals such as copper and stainless steel. Since the cured product produced from the curable resin composition of the present invention also has good electrical and mechanical properties, it can be used as a laminate for a printed wiring board, a printed wiring board, a semiconductor sealing material, a semiconductor mounting module, It is also useful as a peripheral component for various electronic components. In addition, carbon fiber and carbon electrodes, such as automobiles, aircraft components, and building components, It can be used as a binder for various composite materials and as a matrix resin. Further, the curable resin composition of the present invention is not only used as a varnish, but also has excellent moldability, so that it can be used in the form of a film, a sheet, a fiber or the like.

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  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
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  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
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Abstract

A curable resin composition which is excellent in heat resistance, mechanical properties, and adhesion and is capable of forming a film having improved flame retardancy. The curable resin composition comprises a thermosetting resin having dihydrobenzoxazine rings and a polyimide resin in a weight ratio of from 5/95 to 95/5.

Description

明細書 硬化性樹脂組成物 技術分野 本発明は、 耐熱性、 硬化特性に優れた硬化物を.与えるジヒ ドロキサジン 環を有するジヒ ドロキサジン樹脂 (以下、 D HX樹脂ともいう) とポリイ ミ ド系樹脂からなる硬化性樹脂組成物に関する。 背景技術 エポキシ樹脂、 フエノール樹脂、 ポリイ ミ ド樹脂、 メラミン樹脂、 ポリ ィ ミ ド樹脂等の熱硬化性樹脂が開発され、 それぞれの樹脂特性に合った分 野へ応用されている。 最近、 プリ ン ト配線板用銅張積層板、 多層配線板用 接着剤、 半導体用封止材料、 半導体実装用接着剤、 半導体搭載用'モジユー ル等に用いられる硬化性樹脂や、 自動車、 航空機、 建築部材等に用いられ る硬化性樹脂において、 高温 · 高湿下での安定性や信頼性に優れた樹脂材 料が求められている。 また、 ハロゲンフ リ ー難燃性を有する樹脂材料が強 く望まれている。  TECHNICAL FIELD The present invention relates to a dihydroxazine resin having a dihydroxazine ring (hereinafter also referred to as a DHX resin) and a polyimide resin, which give a cured product having excellent heat resistance and curing properties. Curable resin composition. BACKGROUND ART Thermosetting resins such as epoxy resins, phenolic resins, polyimide resins, melamine resins, polyimide resins, etc. have been developed and applied to fields suited to their respective resin characteristics. Recently, curable resins used in copper-clad laminates for printed wiring boards, adhesives for multilayer wiring boards, sealing materials for semiconductors, adhesives for semiconductor mounting, modules for mounting semiconductors, automobiles and aircraft As for curable resins used for building components, etc., resin materials having excellent stability and reliability under high temperature and high humidity are required. Further, a resin material having halogen-free flame retardancy is strongly desired.
近年、 D HX樹脂が、 フエノール樹脂に比較して、 硬化物の耐熱性、 耐 湿性が良好な樹脂であることが報告されている (H. Ishida, et al., J. Polym. Sci. , Vol. 32, p921 (1994) , H. Ishida, et al. , J. Appl. Polym. Sci. , Vol. 61, 1595 (1996)) 。 この樹脂は、 開環重合反応性を 有しているため、 低硬化収縮性を示し、 開環反応後の硬化物は、 低熱膨張 性を有しているなど様々な特徴を有することも示されている (H. I shi da, et al . , J. Pol ym. Sc i . , Vo l . 34, 1019 ( 1994) , ) 。 更に、 これは、 ェポ キシ樹脂とも反応性を示し、 硬化剤と して有効であることも示されている (特開平 4- 227922号公報) 。 In recent years, it has been reported that DHX resin is a resin having better heat resistance and moisture resistance than cured phenolic resin (H. Ishida, et al., J. Polym. Sci., Vol. 32, p921 (1994), H. Ishida, et al., J. Appl. Polym. Sci., Vol. 61, 1595 (1996)). This resin has high ring-opening polymerization reactivity. Therefore, it has also been shown that the cured product after ring-opening reaction has various characteristics, such as low thermal expansion, because it has low curing shrinkage (H. I shi da, et. al., J. Polym. Sci., Vol. 34, 1019 (1994),)). Further, it has also been shown that it shows reactivity with epoxy resins and is effective as a curing agent (Japanese Patent Application Laid-Open No. 4-227922).
'一方、 様々なポリイミ ド樹脂が開発され、 耐熱フィルム、 絶縁ワニス、 耐熱接着剤、 成型材料と して、 フレキシブルプリント回路基板用銅張積層 板、 多層プリ ン ト回路基板用接着フィルム、 プリ ン ト回路基板用カバーフ 'イルム、 半導体コーティ ング剤、 アンダーフィル剤、 TAB用封止材、 航空 宇宙分野の部材と して用いられている。 最近、 熱可塑性で成型可能なポリ ィ ミ ド樹脂や有機溶剤に可溶なポリイミ ド樹脂が開発され、 その応用分野 が広がっている。 特に、 半導体やプリ ン ト回路基板の分野では、 耐熱性と ともに高い信頼性が必要なため、 機械的特性、 電気的特性に優れたポリイ ミ ド材料が用いられるようになってきた。  On the other hand, various polyimide resins were developed and used as heat-resistant films, insulating varnishes, heat-resistant adhesives, molding materials, copper-clad laminates for flexible printed circuit boards, adhesive films for multilayer printed circuit boards, It is used as a cover film for circuit boards, a semiconductor coating agent, an underfill agent, a sealing material for TAB, and a member in the aerospace field. Recently, thermoplastic and moldable polyimide resins and polyimide resins soluble in organic solvents have been developed, and their application fields are expanding. In particular, in the field of semiconductors and printed circuit boards, high reliability as well as heat resistance are required, and polyimide materials having excellent mechanical and electrical properties have been used.
しかし、 一般にポリイ ミ ド樹脂を単独で、 接着剤あるいは接着フィルム と して用いた場合、 充分な接着強度が得られないという問題があった。 ま た、 環境問題の観点から、 鉛フ リーのハンダ材料が用いられつつあり、 高 いハンダ耐熱温度を有する材料の開発が望まれていた。 更に、 最近はハロ ゲンフリー難燃性も要求されている。 しかしながら、 これらの樹脂は、 耐 熱性や難燃性において特性が充分とはいえず、 ハロゲン系難燃剤や各種の 改質剤の配合を必要と していた。  However, in general, when polyimide resin alone is used as an adhesive or an adhesive film, there has been a problem that sufficient adhesive strength cannot be obtained. Also, from the viewpoint of environmental problems, lead-free solder materials are being used, and the development of a material having a high solder heat resistance temperature has been desired. Furthermore, recently, halogen-free flame retardancy is also required. However, these resins have insufficient properties in terms of heat resistance and flame retardancy, and require the blending of halogen-based flame retardants and various modifiers.
特公昭 49- 47378号公報、 特開平 2-69567号公報、 特開平 4-227922号公 報、 特開平 9 - 216994号公報には、 ジヒ ドロベンゾキサジン環を有する化合 物及びこれを用いた熱硬化性樹脂組成物が報告されている。 しかし、 これ らは、 いずれも低分子量の樹脂からなり、フィルムゃシートあるいは繊維 として用いることができなかったり、 また、 充分な耐熱性、 電気特性又は 機械的特性が得られなかつたり した。 発明の開示 本発明は、 耐熱性、 難燃性において優れ、 銅やステンレス等の金属に対 する密着性にも優れた特性を有する硬化性樹脂組成物を提供することを目 的とする。 また、 本発明は、 ポリイ ミ ド樹脂と D H X樹脂の特性を併せ持 つ硬化性樹脂組成物を提供することを目的とする。 JP-B-49-47378, JP-A-2-69567, JP-A-4-227922, and JP-A-9-216994 disclose a compound having a dihydrobenzoxazine ring and a compound having the same. Thermosetting resin compositions have been reported. But this All are made of low molecular weight resins and cannot be used as films / sheets or fibers, or have insufficient heat resistance, electrical properties or mechanical properties. DISCLOSURE OF THE INVENTION An object of the present invention is to provide a curable resin composition having excellent heat resistance and flame retardancy, and also having excellent properties in adhesion to metals such as copper and stainless steel. Another object of the present invention is to provide a curable resin composition having both characteristics of a polyimide resin and a DHX resin.
本発明の硬化性樹脂組成物は、 芳香族炭化水素環と縮合したジヒ ドロキ チジン環を少なく とも一つ有する熱硬化性樹脂と、 ポリイミ ド樹脂、 ポリ ィミ ド前駆体及びこれらの混合物から選択されるポリィミ ド系樹脂を重量 比で、 5〜 9 ' 5 : 9 5〜 5 の割合で含有してなることを特徴とする硬化性 樹脂組成物である。 本発明の硬化性樹脂組成物は、 少なく とも一つのジヒ ドロキサジン環を 有する熱硬化性樹脂 (D H X樹脂) と、 ポリイミ ド樹脂、 その前駆体又は それらの混合物から選択されるポリイミ ド系樹脂を必須成分と して含有す る。 樹脂組成物中の D H X樹脂の含有率が、 樹脂成分の合計量に対して、 5〜95重量。/。、 好ましく は 20〜 80重量%の範囲である。 また、 ポリイ ミ ド 系樹脂の含有率は、 樹脂成分の合計量に対して、 5〜95重量%、 好ましく は 20〜80重量%の範囲である。 D H X樹脂の含有割合が少ないと硬化物特 性の耐熱性、 難燃性、 密着性等において効果が得られず、 逆に過剰である とポリイ ミ ド樹脂の持つ可と う性が損なわれ、 硬化物の脆さが顕在化し、 材料と しての優位性が失われる。 The curable resin composition of the present invention is selected from a thermosetting resin having at least one dihydroxy pyridine ring condensed with an aromatic hydrocarbon ring, a polyimide resin, a polyimide precursor, and a mixture thereof. The curable resin composition is characterized in that it contains the polyimide resin used in a weight ratio of 5 to 9'5: 95 to 5. The curable resin composition of the present invention essentially comprises a thermosetting resin (DHX resin) having at least one dihydroxazine ring, and a polyimide resin selected from a polyimide resin, a precursor thereof, or a mixture thereof. Contains as an ingredient. The content of the DHX resin in the resin composition is 5 to 95% by weight based on the total amount of the resin components. /. It is preferably in the range of 20-80% by weight. The content of the polyimide resin is in the range of 5 to 95% by weight, preferably 20 to 80% by weight, based on the total amount of the resin components. If the content of DHX resin is too small, the cured product will not be effective in heat resistance, flame retardancy, adhesion, etc. In addition, the flexibility of the polyimide resin is impaired, the brittleness of the cured product becomes apparent, and the superiority of the material is lost.
D HX樹脂と しては、 芳香族炭化水素環と縮合したジヒ ドロキサジン環 を少なく とも一つ有し、 このジヒ ドロキサジン環の開環重合反応により硬 化する樹脂であれば制限はなく 、 公知の DHX樹脂等も使用可能である。 ジヒ ドロキサジン環と縮合する芳香族炭化水素環と しては、 ベンゼン環又 はナフタ レン環が好ましく挙げられ、 これらの芳香族炭化水素環はメチル 基等炭素数 3以下のアルキル基ゃハ口ゲン等の置換基を有してもよいが、 置換基を有しないものがよい。 The DHX resin is not particularly limited as long as it has at least one dihydroxazine ring condensed with an aromatic hydrocarbon ring, and is a resin that is cured by a ring-opening polymerization reaction of the dihydroxazine ring. DHX resin and the like can also be used. The aromatic hydrocarbon ring condensed with the dihydroxazine ring is preferably a benzene ring or a naphthalene ring, and these aromatic hydrocarbon rings are alkyl groups having 3 or less carbon atoms such as a methyl group. And the like, but those having no substituent are preferred.
ベンゼン環と縮合したジヒ ドロキサジン環は、 ジヒ ドロベンゾキサジン 1と称されるので、 ジヒ ドロベンゾキサジン環樹脂 (以下、 D HB樹脂) といい、 ナフタレン環と縮合したジヒ ドロキサジン環は、 ジヒ ドロナフ ト キサジン環と称されるので、 ジヒ ドロナフ トキサジン環樹脂 (以下、 DH N樹脂) とい う。 しかしなが ら、 これはいずれも D H X樹脂の 1種であ る。  The dihydroxazine ring condensed with a benzene ring is called dihydrobenzoxazine 1 and is called a dihydrobenzoxazine ring resin (hereinafter referred to as DHB resin). A dihydroxazine ring condensed with a naphthalene ring is Since it is called a dronaphthoxazine ring, it is called a dihydronaphthoxazine ring resin (hereinafter, DNH resin). However, each is a type of DHX resin.
D HX樹脂と しては、 ポリ イ ミ ド系樹脂と混ざりやすく、 硬化後の耐熱 性低下を抑える点で、 下記一般式 ( 3 ) で表される D H B樹脂又は一般式 ( 4 ) で表される D HN樹脂であることが望ま しい。  The DHX resin is a DHB resin represented by the following general formula (3) or a DHB resin represented by the following general formula (4) in that it is easily mixed with the polyimide resin and suppresses a decrease in heat resistance after curing. Preferably, it is a D HN resin.
Figure imgf000005_0001
( 3 ) (式中、 R9及び R10は炭素数 1〜 1 0の有機基、 R11は水素原子又は炭素数 1_ 〜 6の炭化水素基、 Yは存在しないか、 - C(CH3)2- , - CO- , - 0- , - S- , - S02 - - CH2 -, _C(CFJ2 -又は式 ( 5 ) で表される基示す)
Figure imgf000005_0001
(3) (Wherein, R9 and R10 are organic radicals 0 1 1 carbon atoms, R11 is a hydrogen atom or a hydrocarbon group with carbon number 1_ ~ 6, or not Y is present, - C (CH 3) 2 -, - CO -, - 0-, - S-, - S0 2 - - CH 2 - (- indicates a group represented by or formula (5) CFJ 2), _C
Figure imgf000006_0001
Figure imgf000006_0001
(式中、 R15は水素又は炭素数 1〜6のアルキル基を示し、 R16は炭素数 1〜6 のアルキル基、 シクロへキシル基、 フエニル基、 置換フエニル基、 ナフチ 基又は置換ナフチル基を示す) こ こで、 式 ( 5 ) で表される基は、 特定のフ ノール樹脂から誘導され る基であり 、 下記式 ( 5 ) で表される。 (Wherein, R15 represents hydrogen or an alkyl group having 1-6 carbon atoms, and R16 represents an alkyl group having 1-6 carbon atoms, cyclohexyl group, phenyl group, substituted phenyl group, naphthyl group or substituted naphthyl group Here, the group represented by the formula (5) is a group derived from a specific phenol resin, and is represented by the following formula (5).
Figure imgf000006_0002
Figure imgf000006_0002
( 5 ) ( Five )
(式中、 R 12は炭素数 1〜10の有機基、 R 13は水素原子又は炭素数 1〜6の 炭化水素基、 R 14はメチレン基又は P -キシリ レン基を示し、 nは 1 〜 1 0の整数を示す) 。 一般式 ( 3 ) 〜 ( 5 ) で、 R9及び R10は炭素数 1 〜 1 0の有機基である が、 好ま しく はアルキル基、 フエ-ル基、 アルキルフエニル基である。 Rllは水素原子文は炭素数 1〜 6の炭化水素基であるが、 好ましく は水素 原子又はアルキル基である。 Yは存在しないか、 - C(CH3)2-, - CO-,- 0-, - S - ,- S02_, - CH2-, _C(CF3)2-又は式 ( 5 ) で表される基を示すが、 好ましく は _C(CH3)2 -である。 R15は水素又は炭素数 1〜6のアルキル基を示し、 R16 は炭素数 1〜6のアルキル基、 シクロへキシル基、 フエニル基、 置換フエ - ル基、 ナフチル基又は置換ナフチル基を示す。 また、 R 12は炭素数 1〜10 の有機基を示すが、 好ましく はアルキル基、 フエ-ル基、 アルキルフエ二 ル基である。 R 13は水素原子又は炭素数 1〜6の炭化水素基であるが、 水素 原子又はアルキル基である、 R 14はメチレン基又は p -キシリ レン基を示 し、 nは 1〜 1 0の整数を示す。 ここで、 p -キシリ レン基は下記式で表 される。
Figure imgf000007_0001
(Wherein, R 12 represents an organic group having 1 to 10 carbon atoms, R 13 represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms, R 14 represents a methylene group or a P-xylylene group, and n represents 1 to Indicates an integer of 10). In the general formulas (3) to (5), R9 and R10 are organic groups having 1 to 10 carbon atoms, but are preferably an alkyl group, a phenyl group or an alkylphenyl group. Rll is a hydrogen atom, and is preferably a hydrocarbon group having 1 to 6 carbon atoms, but is preferably a hydrogen atom or an alkyl group. Or Y is absent, - C (CH 3) 2 -, - CO -, - 0-, - S -, - S0 2 _, - CH 2 -, _C (CF 3) 2 - or the formula (5) The group represented is represented, preferably _C (CH 3 ) 2- . R15 represents hydrogen or an alkyl group having 1 to 6 carbon atoms; R16 represents an alkyl group having 1 to 6 carbon atoms, cyclohexyl group, phenyl group, substituted phenyl group, naphthyl group or substituted naphthyl group. R12 represents an organic group having 1 to 10 carbon atoms, preferably an alkyl group, a phenyl group, or an alkylphenyl group. R 13 is a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms, but is a hydrogen atom or an alkyl group, R 14 represents a methylene group or a p-xylylene group, and n is an integer of 1 to 10 Is shown. Here, the p-xylylene group is represented by the following formula.
Figure imgf000007_0001
本発明で使用する望ましい D HX樹脂は、 上記一般式 ( 3 ) 又は一般式 ( 4 ) 'で表される樹脂のみからなるものであってもよく、 その部分重合物 を少量含む樹脂であってもよく、 これらの混合物であってもよい。 その 他、 D HX樹脂の製造の際、 副生する少量の不純物、 部分開環物、 未反応 物等を含み得る。 本発明で使用する D H B樹脂は公知の方法によ り製造することができ る。 好ましい反応原料の一例と しては、 下記一般式で示されるフエノール 化合物、 1級アミン及ぴアルデヒ ドがある。  Desirable DHX resin used in the present invention may be composed of only the resin represented by the general formula (3) or the general formula (4) ′, and is a resin containing a small amount of a partial polymer thereof. Or a mixture thereof. In addition, it may contain a small amount of impurities by-produced during the production of DHX resin, partially ring-opened products, unreacted products, and the like. The DHB resin used in the present invention can be produced by a known method. Examples of preferable reaction raw materials include a phenol compound, a primary amine and an aldehyde represented by the following general formula.
a) フエノール化合物 : H O - Ar3又は H 0- Ar4- O H a) Phenol compound: H O -Ar3 or H 0- Ar4-OH
b) 1級ァミ ン : R- N H2 c) アルデヒ ド : R' - C H O b) Primary amine: R-NH 2 c) Aldehyde: R'-CHO
ここで、 Ar3は 1価の芳香族基であり 、 Ar4は 2価の芳香族基であるが、 2環以上の多環の芳香族基であることが好ましく 、 ハロゲン、 アルキル基 等の置換基を有し得るが、 O H基に対しオルト位に置換可能な水素を少な く と も一つ有する。  Here, Ar3 is a monovalent aromatic group, and Ar4 is a divalent aromatic group, and is preferably a polycyclic aromatic group having two or more rings, and a substituent such as a halogen or an alkyl group. But has at least one hydrogen that can be substituted ortho to the OH group.
Rは、 1価の脂肪族、 芳香族等の有機基であるが、 芳香族基であること が好ましく 、 ハロゲン等の置換基を有し得る。 また、 2環以上の多環の芳 香族基であること も好ましい。 好ましく は、 炭素数 1〜10のアルキル基、 シク 口へキシル基、 フェニル基又は置换フェニル基である。  R is a monovalent aliphatic or aromatic organic group, preferably an aromatic group, and may have a substituent such as halogen. It is also preferable that the compound is a polycyclic aromatic group having two or more rings. Preferably, it is an alkyl group having 1 to 10 carbon atoms, a cyclohexyl group, a phenyl group or a substituted phenyl group.
R'は、 水素又は 1価の脂肪族、 芳香族等の有機基であるが、 水素又は低 糸及アルキノレ基が好ま しい。  R ′ is hydrogen or an organic group such as a monovalent aliphatic or aromatic group, and is preferably hydrogen, a low-fiber or alkynole group.
フエノール化合物、 1級ァミ ン及びアルデヒ ドから D H B樹脂を得る反 応の一例を下記に示す。  An example of a reaction for obtaining a DHB resin from a phenol compound, a primary amine and an aldehyde is shown below.
Figure imgf000008_0001
上記反応式からフエノール化合物、 1級ァミ ン又はアルデヒ ドを変化さ せる こ とによ り 、 種々の D H B樹脂が得られる ことが理解できる。 例え ば、 上記一般式 ( 3 ) で表される D H B樹脂を得る場合は、 フエノール化 合物、 1級ァ ン及びアルデヒ ドと して、 次に示す化合物が原料と して使 用される。 なお、 下記式において、 Φは p -フエ二レンを示し、 R9と R10は 同一であり得る。
Figure imgf000008_0001
From the above reaction formula, it can be understood that various DHB resins can be obtained by changing the phenol compound, primary amine or aldehyde. For example, when obtaining the DHB resin represented by the above general formula (3), phenol conversion The following compounds are used as raw materials as compounds, primary amines and aldehydes. In the following formula, Φ represents p-phenylene, and R9 and R10 may be the same.
a) フエノーゾレ化合物 : H O— φ— Υ_φ _Ο Η a) Phenosole compound: H O— φ— Υ_φ _Ο Η
b) 1級ァミ ン : R9- N H2又は RIO- N H2 b) 1 grade § Mi emissions: R9- NH 2 or RIO- NH 2
c) アルデヒ ド : Rll— C H O c) Aldehyde: Rll—CHO
'本発明で使用する D H B樹脂を合成するには、 フ.エノール化合物が有す る水酸基数を y と したとき、 1級ァミ ンを ( 0. 8〜 1 . 2 ) X yモル、 好ま しく は ( 0. 9〜 : L . 1 ) X yモルを使用し、 アルデヒ ドを ( 1. 6 〜 2. 4 ) X y モル、 好ま しく は ( 1 . 8〜 2. 2 ) X yモルを使用して 反応させるこ とが望ま しい。  'To synthesize the DHB resin used in the present invention, when the number of hydroxyl groups contained in the phenol compound is y, the primary amine is preferably (0.8 to 1.2) X y mol, preferably. Or (0.9 to: L.1) Xy mole, and the aldehyde is (1.6 to 2.4) Xy mole, preferably (1.8 to 2.2) Xy mole. It is desirable to carry out the reaction using.
D H B樹脂の原料となるフエノール化合物と しては、 オルソ位の少なく とも一方に水素が結合しているフエノール類、 多官能フエノール類、 ビス フエノール類、 1, 1, 1 — ト リ ス ( 4—ヒ ドロキシフエニル) ェタ ンな どの ト リスフェノール類等が挙げられる。 好ましく は、 熱硬化物特性の観 点から 1分子中にフエノール性水酸基を 2以上有する化合物である。 具体 的には、多官能フエノーノレ類と してカテコール、 レゾルシノール、 ヒ ドロ キノ ン、 ビスフエノーノレ類と してビスフエノー^/ A、 ビスフエノーノレ S、 ビ スフエノール 、 へキサフルォロビスフエノール A等が挙げられる。 また、 フエノール樹脂と しては、 フエノールノボラ ック樹脂、 レゾール樹脂、 フ ヱノール変性キシレン樹脂、 アルキルフエノール樹脂、 メ ラ ミ ンフエノー ル樹脂、 ポリ ブタジエン変性フエノール樹脂等が挙げられる。 これらは、 1種類あるいは 2種類以上を用いるこ と もできる。  The phenolic compounds used as raw materials for DHB resin include phenols having at least one ortho-bonded with hydrogen, polyfunctional phenols, bisphenols, 1,1,1-tris (4- And trisphenols such as hydroxyphenyl) ethane. Preferably, it is a compound having two or more phenolic hydroxyl groups in one molecule from the viewpoint of thermosetting properties. Specific examples include polyfunctional phenols such as catechol, resorcinol, and hydroquinone, and bisphenols such as bisphenol ^ / A, bisphenolphenol S, bisphenol and hexafluorobisphenol A. Examples of the phenol resin include a phenol novolak resin, a resole resin, a phenol-modified xylene resin, an alkyl phenol resin, a melamine phenol resin, and a polybutadiene-modified phenol resin. One or more of these can be used.
1級ァ ミ ンと しては、 メチルァ ミ ン、 ブチルァミ ン、 シク ロへキシルァ ミ ン等の脂肪族ァミ ン、 ァニリ ン、 トルイジン、 ァュシジン等の芳香族ァ ミ ンを用いることができ、 これらは、 1種あるいは 2種類以上を用いるこ と もできる。 First-class amines include methylamine, butylamine, and cyclohexylamine. Aliphatic amines such as mine, aromatic amines such as aniline, toluidine, and fusidine can be used, and one or more of these can be used.
アルデヒ ドと しては、 前記アルデヒ ドが使用できるが、 ホルムアルデヒ ドを使用する場合は、 ホルマリ ン水溶液と して、 またパラホルムアルデヒ ドと して、 いずれの形態でも用いるこ とができる。  As the aldehyde, the above-mentioned aldehyde can be used, but when formaldehyde is used, it can be used in any form as a formalin aqueous solution or as a paraformaldehyde.
D H B樹脂と して具体的には、 次のよ うな D H B樹脂が例示される。 し かし、 これらに限定されるこ となく 、 1種又は 2種以上を用いるこ とがで さる。 Specific examples of the DHB resin include the following DHB resins. However, the present invention is not limited to these, and one or more of them may be used.
( i )  (i)
Figure imgf000010_0001
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Οΐ
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( )
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(Λΐ)( Λ ΐ)
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Figure imgf000012_0004
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また、 本発明で使用する D HX樹脂と して、 ジヒ ドロナフ トキサジン環 を有する熱硬化性樹脂 (DHN樹脂ともいう) も有利に用いることもでき る。 この DHN樹脂は、 D H X樹脂と して単独で使用することもでき、 上 記のよ うな D H B樹脂と、 併用することもできる。 D HN樹脂の具体的な 製造方法は、 上記 DHB樹脂と同様に、 1級ァミンをホルムアルデヒ ドへ 徐々に加える方法により反応させたのち、 ナフ トール系水酸基を。有する化 合物を加え、 2 0分〜 2 4時間、 7 0〜 1 2 0 °Cに保つ。 このとき、 必要 に応じて有機溶剤を用い.ることもできる。. 反応後、 生成物を抽出等の合成 化学的手法で単離■ 精製し縮合水等の揮発成分を乾燥除去することにより 目的とする D HN樹脂が得られる。 The DHX resin used in the present invention is a dihydronaphthoxazine ring. A thermosetting resin (also referred to as DHN resin) having the following can also be used advantageously. This DHN resin can be used alone as a DHX resin, or can be used in combination with the DHB resin as described above. A specific method for producing the DHN resin is, as in the case of the DHB resin described above, a reaction in which a primary amine is gradually added to formaldehyde, and then a naphthol hydroxyl group is formed. The compound is added and kept at 70-120 ° C. for 20 minutes to 24 hours. At this time, an organic solvent can be used if necessary. After the reaction, the product is isolated and purified by a synthetic chemical method such as extraction, and then purified and dried to remove volatile components such as condensed water to obtain the desired DHN resin.
DHN樹脂と しては、 具体的には、 次のよ うな樹脂が好ましく挙げられ る。 し力、し、 これらに限定されるものではない。  As the DHN resin, specifically, the following resins are preferably exemplified. The power is not limited to these.
Figure imgf000013_0001
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Ο) Ο)
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上記 D H X樹脂は、 加熱により開環重合反応を起こし、 揮発分を発生さ せることなく フエノール性水酸基を生成しながら優れた特性を有する架橋 構造を形成する。 この硬化物は低吸湿性、 高いガラス転移温度、 高強度 - 高弾性率更には低硬化収縮率を示し、 難燃性にも優れている。 なお、 D HThe DHX resin causes a ring-opening polymerization reaction upon heating, and forms a crosslinked structure having excellent properties while generating a phenolic hydroxyl group without generating volatile components. This cured product has low moisture absorption, high glass transition temperature, high strength-high elasticity, low curing shrinkage, and excellent flame retardancy. Note that D H
X樹脂は硬化前は単一の化合物である場合もあり、 少量の副反応物を含む 混合物である場合もあり、 上記化合物が部分的に重合したオリ ゴマーであ る場合もあるが、 本発明で D Η X樹脂という場合は、 いずれの場合も含 む。 The X resin may be a single compound before curing, may be a mixture containing a small amount of by-products, or may be a partially polymerized oligomer in the present invention. When referring to D Η X resin in both cases, No.
本発明の硬化性樹脂組成物のもう一つの必須成分と して用いられるポリ ィ ミ ド系樹脂と しては、 イミ ド基又はァミ ック酸又は両者を含む繰り返し 単位からなる構成成分を主とする樹脂であれば制限はなく、 公知のポリィ ミ ド樹脂やその前駆体も使用可能である。 ポリイ ミ ド系樹脂は、 テ トラ力 ルボン酸化合物とジァミン化合物から得られるものが好ましく、 よ り好ま しく は、 下記一般式 ( 1 ) 又は一般式 ( 2 ) で示される繰り返し単位構造 を含有するポリイミ ド樹脂又はその前駆体である。 樹脂組成物と したとき の物性の点で、 上記一般式 ( 2 ) 又は ( 3 ) で示される構造単位のいずれ か一つ又は両者を 5 0重量%以上含むポリイ ミ ド樹脂又はその前駆体樹脂 (ポリアミ ック酸) が好ましい。  Examples of the polyimide resin used as another essential component of the curable resin composition of the present invention include a component composed of a repeating unit containing an imido group or an amic acid or both. There is no limitation as long as it is the main resin, and known polyimide resins and precursors thereof can also be used. The polyimide resin is preferably a resin obtained from a tetracarboxylic acid compound and a diamine compound, and more preferably contains a repeating unit structure represented by the following general formula (1) or (2). It is a polyimide resin or a precursor thereof. In terms of the physical properties of the resin composition, a polyimide resin or a precursor resin containing 50% by weight or more of one or both of the structural units represented by the general formula (2) or (3) above (Polyamic acid) is preferred.
Figure imgf000017_0001
Figure imgf000017_0001
(伹し、 一般式 ( 1 ) 及ぴ ( 2 ) において、 Arl及び Ar2は少なく とも一つ の芳香族環を有する 4価の有機基、 R1及び R2は- 0H, - NH2, - SH,- C0NH2又は 炭素数 1〜 6の有機基を示し、 i及び jは 0〜 4の整数を示し、 R3及ぴ R4は 炭素数 1〜 1 0の 2価の有機基を示し、 R5〜R8は水素又は炭素数 1〜6の有 機基を示し、 Xは 2価の基を示し、 mは 1〜 1 0の数を示す) 上記一般式 ( 1 ) 及び ( 2 ) において、 Arl及び Ar2は少なく とも一つの 芳香族環を有する 4価の有機基であり 、 テ トラカルボン酸化合物の残基と もいえる。 したがって、 好ましい Arl及び Ar2は、 後記する好ましいテ トラ カルボン酸化合物から理解される。 また、 2つの Nと結合する 2価の基 は、 ジァミ ン化合物の残基ともいえる。 したがって、 一般式 ( 1 ) におい て、 好ましい R1及び R2、 i及び j、 並びに Xは、 後記する好ましいジァミ ン 化合物から理解される。 例えば、 R1及び R2は- 0H, - NH2, - SH, - C0NH2又は 炭素数 1〜 6の有機基を示すが、 好ましく は低級アルキル基である。 i 及 び jは 0 〜 4 の整数を示すが、 好ま しく は 0 〜 2である。 上記一般式 ( 2 ) において、 R3及び R4は炭素数 1〜 1 0の 2価の有機基を示すが、 好 -しく は炭素数 1〜 6のアルキレン基又はフエ二レン基である。 R5〜R8は 水素又は炭素数 1〜6の有機基を示が、 好ましく は炭素'数 1〜 6のアルキレ ン基又はフエ-レン基である。 mは 1〜 1 0の数を示すが、 好ましくは 2 〜 8である。 (伹to the general formula (1) in及Pi (2), tetravalent organic group having one aromatic ring at least the Arl and Ar @ 2, R1 and R2 - 0H, - NH 2, - SH, - C0Nh 2 or an organic group with carbon number. 1 to 6, i and j represents an integer of 0 to 4, R3及Pi R4 represents a divalent organic group of from 1 to 1 0 carbon atoms, R5 to R8 Is hydrogen or C 1-6 X represents a divalent group, m represents a number of 1 to 10) In the above general formulas (1) and (2), Arl and Ar2 have at least one aromatic ring It is a tetravalent organic group, and can be said to be a residue of a tetracarboxylic acid compound. Therefore, preferred Arl and Ar2 are understood from the preferred tetracarboxylic acid compounds described below. Further, the divalent group bonded to two Ns can be said to be a residue of a diammine compound. Therefore, in the general formula (1), preferred R1 and R2, i and j, and X are understood from the preferred diamine compounds described below. For example, R1 and R2 - 0H, - NH 2, - SH, - C0NH 2 or carbon atoms 1 shows a 6 organic group, preferably a lower alkyl group. i and j each represent an integer of 0 to 4, preferably 0 to 2. In the above general formula (2), R3 and R4 represent a divalent organic group having 1 to 10 carbon atoms, preferably an alkylene group or a phenylene group having 1 to 6 carbon atoms. R5 to R8 represent hydrogen or an organic group having 1 to 6 carbon atoms, preferably an alkylene group or a phenylene group having 1 to 6 carbon atoms. m represents a number of 1 to 10, preferably 2 to 8.
ポリイ ミ ド樹脂の原料と して用いられるテ トラカルボン酸化合物と して は、 酸二無水物が好ましい。 この具体例と しては、 ピロメ リ ッ ト酸二無水 物 (PMDA) 、 3, 3',4, 4' -ジフエニルスルホンテ ト ラカルボン酸二無水物 As the tetracarboxylic acid compound used as a raw material of the polyimide resin, an acid dianhydride is preferable. Specific examples include pyromellitic dianhydride (PMDA), 3,3 ', 4,4'-diphenylsulfonetetracarboxylic dianhydride
(DSDA) 、 3, 3',4, 4' -ビフエニルテ ト ラカルボン酸二無水物 (BPDA) 、 2,3' , 3,4' -ビフエニルテ ト ラカルボン酸二無水物(a- BPDA)、 3, 3' , 4, 4' - ベンゾフエノ ンテ ト ラカルボン酸二無水物(BTDA)、 2,2'-ビス (3,4-ジカ ルボキシフエニル) エーテル二無水物(0DPA)、 2, 2'-ビス (2, 3-ジカルポ キシフエニル) エーテル二無水物(a- 0DPA)、 2, 2, -ビス (3,4-ジカルボキ シフエニル) プロパン二無水物(BDCP)、 2, 2'-ビス (3, 4-ジカノレポキシフ ェニル) へキサフルォロプロパン二無水物(BDCF)、 1, 4, 5, 8-ナフタ レンテ トラカルボン酸二無水物(NTCA)、 シク ロペンタン- 1, 2, 3, 4-テ トラ力ルポ ン酸ニ無水物(CPTA)、 ピロ リ ジン- 2, 3, 4, 5-テ ト ラカルボン酸二無水物 (PTCA)、 1, 2, 3, 4-ブタンテ トラカルボン酸二無水物(BTCA)等をあげること ができるが、 これらに限定されることなく 、 種々のテ トラカルボン酸二無 水物を用いることができる。 また、 これらは、 1種又は 2種以上を用いる こ とができる。 + (DSDA), 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride (BPDA), 2,3', 3,4'-biphenyltetracarboxylic dianhydride (a-BPDA), 3 ', 4,4'-Benzophenonetetracarboxylic dianhydride (BTDA), 2,2'-bis (3,4-dicarboxyphenyl) ether dianhydride (0DPA), 2,2'-bis (2 , 3-Dicarboxyphenyl) ether dianhydride (a-0DPA), 2,2, -bis (3,4-dicarboxyphenyl) propane dianhydride (BDCP), 2,2'-bis (3,4-dicanolepoxif) Enyl) hexafluoropropane dianhydride (BDCF), 1,4,5,8-naphthalenetetracarboxylic dianhydride (NTCA), cyclopentane-1,2,3,4-tetrahydropropane Dianhydride (CPTA), pyrrolidine-2,3,4,5-tetracarboxylic dianhydride (PTCA), 1,2,3,4-butanetetracarboxylic dianhydride (BTCA) Although not limited thereto, various tetracarboxylic dianhydrides can be used. In addition, one or more of these can be used. +
また、 ジァミ ン化合物と しては、 アミ ノ基を 2つ以上分子内に有する化 合物であれば限定されること無く用いることができるが、 耐熱性向上の観 点から、 芳香族ジァミ ノ化合物であることが望ま しい。 ジァミノ化合物の 具体例と しては、 次のよ うなジァミンが好ましく挙げられる。 しかし、 こ しらに限定する ことなく 、 1種又は 2種以上を用いるこ とができる。 更 に、 m—フエ二レンジァミ ン、 p —フエ二レンジアミ ン等も用いることが できる。  The diamine compound can be used without limitation as long as it is a compound having two or more amino groups in the molecule, but from the viewpoint of improving heat resistance, aromatic diamine is preferred. Desirably, it is a compound. Preferred specific examples of the diamino compound include the following diamines. However, the present invention is not limited to these, and one or more kinds can be used. In addition, m-phenylenediamine, p-phenylenediamine and the like can also be used.
Figure imgf000019_0001
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また、 一般式 ( 2 ) で示される繰り返し単位を与えるシロキサン系のジ ァ ミ ンと しては、 ビス ( 3—ァ ミ ノ プロ ピル) 一 1 , 1 , 3 , 3—テ ト ラ メチルジシロ キサン、 ビス (4—ァ ミ ノ フエニル) 一 1, 1 , 3 , 3—テ ト ラ メ チルジシロ キサン、 ビス ( 3—メチノレー 4ーァ ミ ノ フエ二ノレ) 一 1, 1, 3, 3—テ トラメチルジシロキサン、 あるいは下記一般式 (6) In addition, a siloxane-based diamine providing a repeating unit represented by the general formula (2) Examples of the amine include bis (3-aminopropyl) 1-1,1,3,3-tetramethyldisiloxane and bis (4-aminophenyl) 1-1,1,3,3 —Tetramethyldisiloxane, bis (3-methinolay 4-aminophenol) 1,1,1,3,3-tetramethyldisiloxane, or the following general formula (6)
( 6 )
Figure imgf000022_0001
(6)
Figure imgf000022_0001
(式中、 R3〜R4及び nは一般式 ( 2 ) と同じである) で表されるジァミ ノ ポリシロキサンが挙げられる。 また、 一般式 ( 2 ) で好ましい R3及び R4と しては ト リ メチレン基が、 R5〜R8と してはメチル基、 ビエル基又はフエ二 'レ基が挙げられる。 (Wherein, R3 to R4 and n are the same as those in the general formula (2)). In the general formula (2), R3 and R4 are preferably a trimethylene group, and R5 to R8 are each a methyl group, a Bier group or a phenyl group.
上記ポリイ ミ ド系樹脂は、 テ トラカルボン酸二無水物とジァミ ノ化合物 とを、 ほぼ等モルで反応させることによ り合成できる。 反応条件は公知の 条件を採用するこ とができる。 ポリイ ミ ド系樹脂は、 一般式 ( 1 ) 又は The polyimide resin can be synthesized by reacting tetracarboxylic dianhydride with a diamino compound in substantially equimolar amounts. Known reaction conditions can be employed. The polyimide resin is represented by the general formula (1) or
( 2 ) で表されるポリイ ミ ド樹脂単位又はその前駆体単位が繰返し単位と して 5 0重量%以上、 好ま しく は 8 0重量%以上含まれることがよい。 一 般式 ( 1 ) 及び ( 2 ) 表されるポリイ ミ ド樹脂単位又はその前駆体単位の 両者を含み、 一般式 ( 1 ) 及び ( 2 ) で表される単位の重量割合が 2 0〜 8 0 : 8 0〜 2 0であることも有利である。 本発明の硬化性樹脂組成物は、 前記ポリィ ミ ド系樹脂と DHX樹脂を通 常のプレンド法や、 ポリイ ミ ド樹脂又はポリィ ミ ド前駆体であるポリァミ ック酸溶液に、 D HX樹脂を添加、 混合し、 必要によ り乾燥させることに よ り製造することができる。 ポリイ ミ ド系樹脂と D H X樹脂の重量比は、 5〜95 : 95〜5である 0 The polyimide resin unit represented by (2) or a precursor unit thereof may be contained as a repeating unit in an amount of 50% by weight or more, preferably 80% by weight or more. It contains both the polyimide resin units represented by the general formulas (1) and (2) or the precursor unit thereof, and the weight ratio of the units represented by the general formulas (1) and (2) is 20 to 8 0: 80 to 20 is also advantageous. The curable resin composition of the present invention is obtained by adding a DHX resin to a polyimide resin and a DHX resin by a conventional blending method or a polyimide resin or a polyimide acid solution which is a polyimide precursor. Add, mix and dry if necessary It can be manufactured more. The weight ratio of Porii Mi de resin and DHX resin is 5-95: A 95-5 0
また、 本発明の硬化 'Ιΐ樹脂組成物においては、 ·樹脂組成物の一成分と し てエポキシ樹脂を使用するこ と もできる。 本発明の硬化性樹脂組成物の一 成分と して用いられるエポキシ樹脂と しては、 ビスフエノール Α型ェポキ シ樹脂、 ビスフエノール F型エポキシ樹脂、 フエ ノールノ ポラ ック型ェポ キシ樹脂、 ク レゾールノポラ ック型エポキシ樹脂、 水素化ビスフ ノール A型エポキシ樹脂、 各種の脂環式エポキシ樹脂、 ナフタ レン構造を有する 各種エポキシ樹脂、 あるいは臭素化エポキシ樹脂等が挙げられるが、 これ らに限定することなく用いることができる。 更に、 これらは、 1種又は 2 種以上を用いることができる。  In the cured resin composition of the present invention, an epoxy resin may be used as one component of the resin composition. Examples of the epoxy resin used as one component of the curable resin composition of the present invention include bisphenol II epoxy resin, bisphenol F epoxy resin, phenol nopol epoxy resin, and Examples include, but are not limited to, resole nopolak type epoxy resin, hydrogenated bisphenol A type epoxy resin, various alicyclic epoxy resins, various epoxy resins having a naphthalene structure, and brominated epoxy resins. It can be used without. Further, one or more of these can be used.
更に、 必要に応じて、 ジヒ ドロキサジン環を開環する効果のあるフエノ ール性水酸基を有する化合物、 例えば、 ビスフユノール A、 ノポラ ック樹 脂、 レゾール樹脂、 アミ ノ基を有する化合物を用いるこ と もできる。  Further, if necessary, a compound having a phenolic hydroxyl group which has an effect of opening the dihydroxazine ring, for example, a compound having a bisphenol A, a nopolak resin, a resole resin, or an amino group may be used. You can also.
また、 硬化反応触媒と して、 例えば、 イ ミダゾール系化合物、 ジシアン ジアミ ド系化合物、 リ ン系化合物を使用することができる。  Further, as a curing reaction catalyst, for example, an imidazole compound, a dicyandiamide compound, and a phosphorus compound can be used.
本発明の熱硬化性樹脂組成物は、 以上に記した成分以外に必要に応じ、 各種フエノール樹脂、 メ ラミ ン樹脂、 ポリアミ ド樹脂等を含有することが できる。  The thermosetting resin composition of the present invention may contain various phenolic resins, melamine resins, polyamide resins, and the like, if necessary, in addition to the components described above.
また、 充填材、 補強材、 離型剤、 カップリ ング剤、 可塑剤、 難燃剤、 硬 化助剤、 着色剤、 カップリ ング剤、 あるいはカーボンブラック等を含有す ることができる。 樹脂の難燃性を更に向上させる 目的で、 ト リ フエニルフ ォス フィ ン等のホス フィ ン類、 リ ン酸エステル、 亜ホスフ ィ ン酸エステ ル、 亜リ ン酸エステル、 ホスフィ ンオキサイ ド等の各種有機リ ン系化合物 を使用することもできる。 Further, it may contain a filler, a reinforcing material, a release agent, a coupling agent, a plasticizer, a flame retardant, a curing aid, a coloring agent, a coupling agent, or carbon black. In order to further improve the flame retardancy of the resin, phosphines such as triphenyl phosphine, phosphites, ester phosphites, ester phosphites, phosphine oxides, etc. Various organic phosphorus compounds Can also be used.
本発明の硬化性樹脂組成物は、 D H X樹脂及びポリイ ミ ド系樹脂を必須 成分と して含有する。 D H X樹脂及びポリィ ミ ド系樹脂の 2成分からなる 場合、 その配合量は前記のとおりであるが、 より好ましくはポリイ ミ ド系 樹脂 1 0 0重量部に対し、 D H X樹脂 5〜 5 0重量部である。 また、 必要 により前記のような他の樹脂成分を加える場合、 他の樹脂成分は全樹脂成 分の 4 0重量%以下、 好ま しく は 2 0重量%以下とすることがよい。 な お、.硬化性樹脂組成物中の全樹脂成分は、 充填材等の樹脂以外の成分を除 いた成分をいう。  The curable resin composition of the present invention contains a DHX resin and a polyimide resin as essential components. When it is composed of two components, a DHX resin and a polyimide resin, the amounts thereof are as described above, but more preferably 100 to 100 parts by weight of the polyimide resin, and more preferably 5 to 50 parts by weight of the DHX resin. It is. When other resin components as described above are added as necessary, the other resin components should be 40% by weight or less, preferably 20% by weight or less of the total resin component. In addition, all resin components in the curable resin composition refer to components excluding components other than resin such as filler.
本発明の硬化性樹脂組成物は、 成形材料やワニスと して用いられるだけ でなく 、 成型性にも優れるため、 フィルム、 シー ト、 繊維等の形態で利用 きる。  The curable resin composition of the present invention is not only used as a molding material and a varnish, but also has excellent moldability, so that it can be used in the form of a film, a sheet, a fiber or the like.
本発明の硬化性樹脂組成物は、 熱反応により架橋構造を形成し、 熱硬化 することが可能である。 このようにして得られる硬化物は、 耐熱性、 難燃 性において優れ、 金属に対する密着性にも優れた特性を有する硬化樹脂と なる。 発明を実施するための最良の形態 以下、 実施例により、 本発明を具体的に説明するが、 本発明はこれらの 実施例に限定されるものではない。 なお、 実施例中の樹脂原料の略号は、 酸二無水物、 ジアミン化合物、 D H B樹脂及び D H N樹脂の説明の項に記 載した略号に対応する。 その他の略号は以下のものを意味する。 BAPD: ビス (3 -ァミ ノプロ ピル) - 1,—1, 3, 3—テ トラメチルジシロ キサン PSX750 : 平均分子量 750のビス (3-ァミ ノプロ ピル) ジメチルポリ シロキ サン The curable resin composition of the present invention can form a crosslinked structure by a thermal reaction and can be thermoset. The cured product obtained in this way is a cured resin having excellent heat resistance and flame retardancy, and also having excellent adhesion to metal. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described specifically with reference to examples, but the present invention is not limited to these examples. The abbreviations of the resin raw materials in the examples correspond to the abbreviations described in the description of the acid dianhydride, the diamine compound, the DHB resin and the DHN resin. Other abbreviations mean the following. BAPD: Bis (3-aminopropyl)-1, -1,3,3-tetramethyldisiloxane PSX750: bis (3-aminopropyl) dimethylpolysiloxane with an average molecular weight of 750
PSX1000:平均分子量 1000のビス (3-ァミ ノプロ ピル) ジメチルポリ シロキ サン  PSX1000: bis (3-aminopropyl) dimethylpolysiloxane with an average molecular weight of 1000
(la) :フエノールノポラ ック (O H当量= 2 0 0 ) から合成される下記 式で示される D H B樹脂  (la): D H B resin represented by the following formula synthesized from phenol nopolak (OH equivalent = 200)
Figure imgf000025_0001
合成例 1
Figure imgf000025_0001
Synthesis example 1
Dean- Stark型脱水冷却装置、 撹拌翼を取り付けた 1 Lのセパラブルフラ スコに N-メチルー 2—ピロ リ ジノ ン (NMP) 2 0 0 m l と トルエン 1 0 0 m 1 を入れ、 氷冷により 2 5 °C以下に温度を保ち、 窒素気流下で、 ジアミ ン(1)40.1 g を溶解した後、 DSM35.4g を粉体のまま少量づっ投入した。 2時間反応し充分ポリアミ ド酸の重合を進行させた後、 トルエン還流が起 こるまで温度を徐々に上昇させ、 イ ミ ド化脱水反応によ り生成する水を重 合反応系外に除去した。 脱水イ ミ ド化反応が終了した後、 更に、 1 時間 150°Cにて撹拌を行い反応を終了させた。 得られたポリイ ミ ド溶液に NMPを 加え固形分濃度が 2 0重量%となるよ う に調整した。 In a 1 L separable flask equipped with a Dean-Stark type dehydrating and cooling device and stirring blades, add 200 ml of N-methyl-2-pyrrolidinone (NMP) and 100 ml of toluene and cool with ice. ° C or below to maintain the temperature, under a nitrogen stream, was dissolved diamines (1) 4 0.1 g, was a small amount Dzu' put DSM35.4g form of powder. After reacting for 2 hours to allow the polymerization of the polyamic acid to proceed sufficiently, the temperature was gradually raised until the reflux of toluene occurred, and the water generated by the imidization dehydration reaction was removed out of the polymerization reaction system. . After the dehydration imidization reaction was completed, the reaction was further stirred at 150 ° C for 1 hour to terminate the reaction. NMP was added to the obtained polyimide solution to adjust the solid content to 20% by weight.
実施例 1 Example 1
上記のポリイ ミ ド溶液に、 ジヒ ドロベンゾキサジン環を有する熱硬化性 樹脂 l O gを混合した後、 ガラス基板上に流延し、 ドクターブレードを用い てキャス ト した。 更に、 これを窒素気流下のイナー トオーブン中で、Thermosetting with dihydrobenzoxazine ring in the above polyimide solution After mixing the resin lOg, it was cast on a glass substrate and cast using a doctor blade. Furthermore, this is placed in an inert oven under a stream of nitrogen,
100°Cで 60分、 150°Cで 60分で乾燥させた後、 樹脂層をガラス基板から隔離 し、 ステンレス製の金属枠に固定した。 これを、 180 °Cで 10分間乾燥さ せ、 硬化性樹脂組成物のフィルムを得た。 このフィルムを用いて、 銅、 ス テ ン レス と の接着強度の測定を行った。 また、 こ のフ ィ ルムを更に、 180°Cで 60分の熱処理を行った後、 物性測定を行った。 After drying at 100 ° C for 60 minutes and at 150 ° C for 60 minutes, the resin layer was separated from the glass substrate and fixed to a stainless steel metal frame. This was dried at 180 ° C. for 10 minutes to obtain a curable resin composition film. Using this film, the adhesive strength with copper and stainless steel was measured. The film was further heat-treated at 180 ° C. for 60 minutes, and then its physical properties were measured.
なお、 ガラス転移温度 (Tg) は動的粘弾性測定装置 (DMA) を用い、 熱 膨張係数は、 熱機械分析装置 (TMA) を用い、 熱分解開始温度 (5%重量減 少温度) は熱重量分析装置 (TGA) を用いて、 曲げ強度及び曲げ弾性率は JIS K 691 1に準じて測定を行った。  The glass transition temperature (Tg) was measured using a dynamic viscoelasticity analyzer (DMA), the thermal expansion coefficient was measured using a thermomechanical analyzer (TMA), and the thermal decomposition onset temperature (5% weight loss temperature) Flexural strength and flexural modulus were measured using a gravimetric analyzer (TGA) according to JIS K6911.
吸水率は、 3mra厚の硬化物を作成した後、 硬化物を PCT ( 121 °C、 2atm) 処理時間 20時間の条件で処理した後、 PCT処理前後の重量変化を測定し、 吸水率を求めた。 更に、 難燃性は UL規格の方法に従って、 1. 6mm厚の硬化 物の難燃性を評価した。  After preparing a cured product with a thickness of 3 mra, the cured product was treated under PCT (121 ° C, 2 atm) treatment time of 20 hours, and the change in weight before and after PCT treatment was measured to determine the water absorption. Was. Furthermore, the flame retardancy of the 1.6 mm thick cured product was evaluated according to the UL standard method.
接着強度については、 加圧プレスを用いて圧着温度 (ガラス転移温度 + 50°C ) 、 圧着圧力 (19. 6MPa) にて JIS K 6850に従って評価を行った。 な お、 接着強度(1 )は対銅を示し、 接着強度(2)は対ステンレスを示す。 ポリイ ミ ド樹脂の原料組成及び樹脂組成物の配合組成を表 1に、 得られ た硬化物の物性を表 2に示す。  The adhesive strength was evaluated according to JIS K 6850 using a pressure press at a compression temperature (glass transition temperature + 50 ° C) and a compression pressure (19.6 MPa). Note that the adhesive strength (1) indicates copper, and the adhesive strength (2) indicates stainless steel. Table 1 shows the raw material composition of the polyimide resin and the compounding composition of the resin composition, and Table 2 shows the physical properties of the obtained cured product.
実施例 2〜 8 Examples 2 to 8
ポリイ ミ ド樹脂の製造原料組成及び硬化性樹脂組成物の配合組成を表 1 に示す組成と した以外は、 実施例 1の記載と同様の方法により評価を行つ た。 W The evaluation was performed in the same manner as described in Example 1 except that the raw material composition of the polyimide resin and the composition of the curable resin composition were as shown in Table 1. W
比較例 1〜 2 Comparative Examples 1-2
D H X樹脂の代わり にエポキシ樹脂(ェピコー ト 828)を用い、 ポリ イ ミ ド'樹脂の製造原料組成及び硬化性樹脂組成物の配合組成を表 1に示す組成 と した以外は、 実施例 1の記載と同様の方法によ り評価を行った。 なお、 エポキシ樹脂の硬化剤と してフエノールノポラ ック樹脂、 硬化促進剤と し て ト リ フエニルフォスフィ ンをそれぞれ用いた。 ポリイ ミ ド樹脂の原料組成及び樹脂組成物の配合組成を表 1に、 得られ た硬化物の物性を表 2にま とめて示す。 . The description of Example 1 was repeated except that the epoxy resin (Epicoat 828) was used instead of the DHX resin, and the raw material composition of polyimide 'resin and the composition of the curable resin composition were as shown in Table 1. The evaluation was performed in the same manner as described above. A phenol nopolak resin was used as a curing agent for the epoxy resin, and triphenyl phosphine was used as a curing accelerator. Table 1 shows the raw material composition of the polyimide resin and the composition of the resin composition. Table 2 shows the physical properties of the obtained cured product. .
実施例 ポリイ ミ ド樹脂原料 ポリイ ミ ド D H X樹脂 酸二無水物 ; ジアミ ン 樹脂 (重量部) (モル% ) (重量部) Examples Polyimide resin raw material Polyimide DH X resin dianhydride; diamine resin (parts by weight) (mol%) (parts by weight)
1 DSDA /100 (D/100 100 (ii ) /10 1 DSDA / 100 (D / 100 100 (ii) / 10
2 0DPA /100 (a)/100 100 (ii ) /102 0DPA / 100 (a) / 100 100 (ii) / 10
3 BTDA /100 (s)/100 100 ( i ) /203 BTDA / 100 (s) / 100 100 (i) / 20
4 ODPA/100 (i)100 100 (iv ) /204 ODPA / 100 (i) 100 100 (iv) / 20
5 BPDA/100 ; (1)/90, BADP/10 100 ( i ) 305 BPDA / 100; (1) / 90, BADP / 10 100 (i) 30
6 DSDA/100 ; (1)/70, PSX750 100 ( i ) /306 DSDA / 100; (1) / 70, PSX750 100 (i) / 30
7 ODPA/90, PMDA/10; (i)/100 100 ( i ) /107 ODPA / 90, PMDA / 10; (i) / 100 100 (i) / 10
8 DSDA/90, 0DPA/10; (i) /70, 100 (ix) /10 8 DSDA / 90, 0DPA / 10; (i) / 70, 100 (ix) / 10
(a)/20, PSX1000 /10  (a) / 20, PSX1000 / 10
9 0DPA /100 ; (a)/100 100 (la) /10 9 0DPA / 100; (a) / 100 100 (la) / 10
1 0 0DPA /100 ; (a)/100 100 (C) /10 比較例 エホ。キシ樹脂 100 DPA / 100; (a) / 100 100 (C) / 10 Comparative Example Eho. Xy resin
1 DSDA/100 ; (D/100 100 100  1 DSDA / 100; (D / 100 100 100
2 DSDA/90, 0DPA/10; (i)/70, 100 100  2 DSDA / 90, 0DPA / 10; (i) / 70, 100 100
(a) /20, PSX1000/10 表 2 (a) / 20, PSX1000 / 10 Table 2
Figure imgf000028_0001
Figure imgf000028_0001
産業上の利用可能性 本発明の硬化性樹脂組成物は、 熱反応により架橋構造を有するため耐熱 性、 難燃性において優れ、 銅やステンレス等の金属に対する密着性にも優 れる。 本発明の硬化性樹脂組成物から生じる硬化物は、 電気特性や機械的 特性も良好なため、 プリ ン ト配線板用積層板、 プリ ン ト配線板、 半導体封 止材、 半導体搭载用モジュール、 その他各種電子部品周辺部材と して有用 である。 また、 自動車、 航空機部材、 建築部材等、 炭素繊維や炭素電極、 各種複合材料等のバインダーやマ トリ ツタス樹脂と して用いることができ る。 更に、 本発明の硬化性樹脂組成物は、 ワニスと して用いられるだけで なく、 成型性にも優れるため、 フィルム、 シー ト、 繊維等の形態で利用で きる。 INDUSTRIAL APPLICABILITY The curable resin composition of the present invention has excellent heat resistance and flame retardancy because of having a crosslinked structure by a thermal reaction, and also has excellent adhesion to metals such as copper and stainless steel. Since the cured product produced from the curable resin composition of the present invention also has good electrical and mechanical properties, it can be used as a laminate for a printed wiring board, a printed wiring board, a semiconductor sealing material, a semiconductor mounting module, It is also useful as a peripheral component for various electronic components. In addition, carbon fiber and carbon electrodes, such as automobiles, aircraft components, and building components, It can be used as a binder for various composite materials and as a matrix resin. Further, the curable resin composition of the present invention is not only used as a varnish, but also has excellent moldability, so that it can be used in the form of a film, a sheet, a fiber or the like.

Claims

請求の範囲 The scope of the claims
( 1 ) 芳香族炭化水素環と縮合したジヒ ドロキサジン環を有する熱硬 化性樹脂と、 ポリイ ミ ド樹脂及び/又はポリイ ミ ド前駆体を重量比で、 5 〜 9 5 : 9 5〜 5の割合で含有してなることを特徴とする硬化性樹脂組成 物。 (1) A thermosetting resin having a dihydroxazine ring condensed with an aromatic hydrocarbon ring and a polyimide resin and / or a polyimide precursor in a weight ratio of 5 to 95: 95 to 5 A curable resin composition which is contained in a proportion.
( 2 ) ポリイ ミ ド樹脂又はポリイ ミ ド前駆体が、 下記一般式(ί)及び/ 又は下記一般式(2)で表される繰り返し単位を 5 0重量%以上含むポリィ ミ ド樹脂又はそのポリイ ミ ド前駆体である請求項 1記載の硬化性樹脂組成 物。  (2) A polyimide resin or a polyimide precursor containing 50% by weight or more of the repeating unit represented by the following general formula (II) and / or the following general formula (2) or a polyimide resin thereof. 2. The curable resin composition according to claim 1, which is a mid precursor.
Figure imgf000030_0001
Figure imgf000030_0001
(但し、 一般式 ( 1 ) 及び ( 2 ) において、 Arl及び Ar2は少なく とも一つ の芳香族環を有する 4価の有機基、 R1及び R2は- OH, -NH2, - SH,- C0NH2又は 炭素数 1〜 6の有機基を示し、 i及び jは 0〜 4の整数を示し、 R3及び R4は 炭素数 1〜 1 0の 2価の有機基を示し、 R5〜R8は水素又は炭素数 1〜6の有 機基を示し、 Xは 2価の基を示し、 mは 1〜 1 0の数を示す) (However, in the general formula (1) and (2), tetravalent organic group having one aromatic ring at least the Arl and Ar @ 2, R1 and R2 - OH, -NH 2, - SH, - C0NH 2 or an organic group having 1 to 6 carbon atoms, i and j each represent an integer of 0 to 4, R3 and R4 each represent a divalent organic group having 1 to 10 carbon atoms, and R5 to R8 represent hydrogen or With 1 to 6 carbon atoms X represents a divalent group, and m represents a number from 1 to 10)
( 3 ) ジヒ ドロキサジン環を有する熱硬化性樹脂が下記一般式(3) (3) The thermosetting resin having a dihydroxazine ring has the following general formula (3)
Figure imgf000031_0001
Figure imgf000031_0001
(式中、 R9及び R10は炭素数 1〜 1 0の有機基、 R11は水素原子又は炭素数 1〜 6の炭ィ匕水素基、 Yは存在しなレヽ力、、 一C(CH3)2— , — CO—,一 0—,一 S—,一 S02— ,- CH2 -, - C(CF3)2 -又は式(5)で表される基示す) で表される熱硬化性樹脂 である請求項 1記載の硬化性樹脂組成物。 (In the formula, R9 and R10 are an organic group having 1 to 10 carbon atoms, R11 is a hydrogen atom or a carbon hydride group having 1 to 6 carbon atoms, Y is a non-existent reductive force, 1 C (CH 3 ) 2 —, — CO—, 1 0—, 1 S—, 1 S0 2 —, —CH 2 —, —C (CF 3 ) 2 — or heat represented by the formula (5)) The curable resin composition according to claim 1, which is a curable resin.
Figure imgf000031_0002
Figure imgf000031_0002
(式中、 R 12は炭素数 1〜 1 ◦の有機基、 R 13は水素原子又は炭素数 1〜 6の炭化水素基、 R 14はメチレン基又は p -キシリ レン基を示し、 nは 1 〜 : L 0の整数を示す)  (Wherein, R 12 represents an organic group having 1 to 1 ° carbon atoms, R 13 represents a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms, R 14 represents a methylene group or a p-xylylene group, and n represents 1 ~: Indicates an integer of L 0)
( 4 ) ジヒ ドロキサジン環を有する熱硬化性樹脂が下記一般式(4)  (4) The thermosetting resin having a dihydroxazine ring has the following general formula (4)
Figure imgf000031_0003
(式中、 R15は水素又は炭素数 1〜6のアルキル基を示し、 R16は炭素数 1〜6 のアルキル基、 シク ロへキシル基、 フエ-ル基、 置換フエニル基、 'ナフチ ル基又は置換ナフチル基を示す) で表される熱硬化性樹脂である請求項 1 記載の硬化性樹脂組成物。
Figure imgf000031_0003
(In the formula, R15 represents hydrogen or an alkyl group having 1 to 6 carbon atoms, and R16 represents an alkyl group having 1 to 6 carbon atoms, a cyclohexyl group, a phenyl group, a substituted phenyl group, a 'naphthyl group or The curable resin composition according to claim 1, which is a thermosetting resin represented by the following formula:
( 5 ) . 請求項 〜 4のいずれかに記載の硬化性樹脂組成物を硬化してな る硬化物。  (5) A cured product obtained by curing the curable resin composition according to any one of claims 4 to 4.
PCT/JP2002/007360 2002-07-19 2002-07-19 Curable resin composition WO2004009708A1 (en)

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