WO2023276379A1 - Resin composition, varnish, laminated plate, printed wiring board, and molded product - Google Patents
Resin composition, varnish, laminated plate, printed wiring board, and molded product Download PDFInfo
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- WO2023276379A1 WO2023276379A1 PCT/JP2022/015425 JP2022015425W WO2023276379A1 WO 2023276379 A1 WO2023276379 A1 WO 2023276379A1 JP 2022015425 W JP2022015425 W JP 2022015425W WO 2023276379 A1 WO2023276379 A1 WO 2023276379A1
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- resin composition
- mass
- resin
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- 239000011342 resin composition Substances 0.000 title claims abstract description 114
- 239000002966 varnish Substances 0.000 title claims description 15
- -1 bismaleimide compound Chemical class 0.000 claims abstract description 111
- 229920005989 resin Polymers 0.000 claims abstract description 110
- 239000011347 resin Substances 0.000 claims abstract description 110
- 229920003192 poly(bis maleimide) Polymers 0.000 claims abstract description 72
- 239000000203 mixture Substances 0.000 claims abstract description 61
- 238000002844 melting Methods 0.000 claims abstract description 16
- 230000008018 melting Effects 0.000 claims abstract description 16
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 5
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 5
- 239000002904 solvent Substances 0.000 claims description 43
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 35
- 238000009835 boiling Methods 0.000 claims description 22
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 claims description 21
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 claims description 15
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 239000004643 cyanate ester Substances 0.000 claims description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 9
- 229930185605 Bisphenol Natural products 0.000 claims description 7
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 claims description 5
- KWOIWTRRPFHBSI-UHFFFAOYSA-N 4-[2-[3-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=CC(C(C)(C)C=2C=CC(N)=CC=2)=CC=1C(C)(C)C1=CC=C(N)C=C1 KWOIWTRRPFHBSI-UHFFFAOYSA-N 0.000 claims description 5
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 3
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- NAKOELLGRBLZOF-UHFFFAOYSA-N phenoxybenzene;pyrrole-2,5-dione Chemical compound O=C1NC(=O)C=C1.O=C1NC(=O)C=C1.C=1C=CC=CC=1OC1=CC=CC=C1 NAKOELLGRBLZOF-UHFFFAOYSA-N 0.000 claims description 3
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 6
- 239000000853 adhesive Substances 0.000 abstract description 4
- 230000001070 adhesive effect Effects 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000000565 sealant Substances 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 3
- 239000003822 epoxy resin Substances 0.000 description 32
- 229920000647 polyepoxide Polymers 0.000 description 32
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 27
- 238000002156 mixing Methods 0.000 description 20
- 238000001723 curing Methods 0.000 description 16
- 238000005259 measurement Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000945 filler Substances 0.000 description 10
- 239000007787 solid Substances 0.000 description 10
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 150000001875 compounds Chemical class 0.000 description 8
- 238000001816 cooling Methods 0.000 description 8
- 238000005227 gel permeation chromatography Methods 0.000 description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 239000003063 flame retardant Substances 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 5
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000004744 fabric Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 239000009719 polyimide resin Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- CXISKMDTEFIGTG-UHFFFAOYSA-N [4-(1,3-dioxo-2-benzofuran-5-carbonyl)oxyphenyl] 1,3-dioxo-2-benzofuran-5-carboxylate Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(OC=2C=CC(OC(=O)C=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)=O)=C1 CXISKMDTEFIGTG-UHFFFAOYSA-N 0.000 description 3
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 229920001955 polyphenylene ether Polymers 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- BGDOLELXXPTPFX-UHFFFAOYSA-N 3,4-dihydro-2h-1,2-benzoxazine Chemical class C1=CC=C2ONCCC2=C1 BGDOLELXXPTPFX-UHFFFAOYSA-N 0.000 description 2
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 239000004917 carbon fiber Substances 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 2
- 239000001095 magnesium carbonate Substances 0.000 description 2
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000012766 organic filler Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- QMTFKWDCWOTPGJ-KVVVOXFISA-N (z)-octadec-9-enoic acid;tin Chemical compound [Sn].CCCCCCCC\C=C/CCCCCCCC(O)=O QMTFKWDCWOTPGJ-KVVVOXFISA-N 0.000 description 1
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- PUKLCKVOVCZYKF-UHFFFAOYSA-N 1-[2-(2,5-dioxopyrrol-1-yl)ethyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCN1C(=O)C=CC1=O PUKLCKVOVCZYKF-UHFFFAOYSA-N 0.000 description 1
- FXEKNWLZNLIDNR-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)propyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCCN1C(=O)C=CC1=O FXEKNWLZNLIDNR-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- MXPYJVUYLVNEBB-UHFFFAOYSA-N 2-[2-(2-carboxybenzoyl)oxycarbonylbenzoyl]oxycarbonylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OC(=O)C1=CC=CC=C1C(=O)OC(=O)C1=CC=CC=C1C(O)=O MXPYJVUYLVNEBB-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- ABLCFODXAYBNID-UHFFFAOYSA-N 2-heptyl-1h-imidazole Chemical compound CCCCCCCC1=NC=CN1 ABLCFODXAYBNID-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- GGBCYXPSMLFBEG-UHFFFAOYSA-N 5-[4-[2-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)C(C=2C=CC(OC=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 GGBCYXPSMLFBEG-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 1
- 239000004113 Sepiolite Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- FMRLDPWIRHBCCC-UHFFFAOYSA-L Zinc carbonate Chemical compound [Zn+2].[O-]C([O-])=O FMRLDPWIRHBCCC-UHFFFAOYSA-L 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- OJMOMXZKOWKUTA-UHFFFAOYSA-N aluminum;borate Chemical compound [Al+3].[O-]B([O-])[O-] OJMOMXZKOWKUTA-UHFFFAOYSA-N 0.000 description 1
- VCNTUJWBXWAWEJ-UHFFFAOYSA-J aluminum;sodium;dicarbonate Chemical compound [Na+].[Al+3].[O-]C([O-])=O.[O-]C([O-])=O VCNTUJWBXWAWEJ-UHFFFAOYSA-J 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229940058905 antimony compound for treatment of leishmaniasis and trypanosomiasis Drugs 0.000 description 1
- 150000001463 antimony compounds Chemical class 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- UGGQKDBXXFIWJD-UHFFFAOYSA-N calcium;dihydroxy(oxo)silane;hydrate Chemical compound O.[Ca].O[Si](O)=O UGGQKDBXXFIWJD-UHFFFAOYSA-N 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 229910001647 dawsonite Inorganic materials 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- UQLDLKMNUJERMK-UHFFFAOYSA-L di(octadecanoyloxy)lead Chemical compound [Pb+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O UQLDLKMNUJERMK-UHFFFAOYSA-L 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- GDVKFRBCXAPAQJ-UHFFFAOYSA-A dialuminum;hexamagnesium;carbonate;hexadecahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Al+3].[Al+3].[O-]C([O-])=O GDVKFRBCXAPAQJ-UHFFFAOYSA-A 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- NJLLQSBAHIKGKF-UHFFFAOYSA-N dipotassium dioxido(oxo)titanium Chemical compound [K+].[K+].[O-][Ti]([O-])=O NJLLQSBAHIKGKF-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical class O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 229920006015 heat resistant resin Polymers 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910001701 hydrotalcite Inorganic materials 0.000 description 1
- 229960001545 hydrotalcite Drugs 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000012796 inorganic flame retardant Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 1
- GIWKOZXJDKMGQC-UHFFFAOYSA-L lead(2+);naphthalene-2-carboxylate Chemical compound [Pb+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 GIWKOZXJDKMGQC-UHFFFAOYSA-L 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 1
- SGGOJYZMTYGPCH-UHFFFAOYSA-L manganese(2+);naphthalene-2-carboxylate Chemical compound [Mn+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 SGGOJYZMTYGPCH-UHFFFAOYSA-L 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 229910052624 sepiolite Inorganic materials 0.000 description 1
- 235000019355 sepiolite Nutrition 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- JSHBSGZCGDOXSG-UHFFFAOYSA-N spiro[fluorene-9,9'-xanthene]-2',3',6',7'-tetracarboxylic acid Chemical compound C12=CC=CC=C2C2=CC=CC=C2C21C1=CC(C(O)=O)=C(C(O)=O)C=C1OC1=C2C=C(C(O)=O)C(C(=O)O)=C1 JSHBSGZCGDOXSG-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- COIOYMYWGDAQPM-UHFFFAOYSA-N tris(2-methylphenyl)phosphane Chemical compound CC1=CC=CC=C1P(C=1C(=CC=CC=1)C)C1=CC=CC=C1C COIOYMYWGDAQPM-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
- C08G73/121—Preparatory processes from unsaturated precursors and polyamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
- C08K5/18—Amines; Quaternary ammonium compounds with aromatically bound amino groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3415—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
- C08K5/34924—Triazines containing cyanurate groups; Tautomers thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/35—Heterocyclic compounds having nitrogen in the ring having also oxygen in the ring
- C08K5/357—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L45/00—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
- C08L45/02—Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers of coumarone-indene polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Definitions
- the present invention is a resin having low dielectric properties (low dielectric constant, low dielectric loss tangent), which is used as laminates, printed wiring boards, adhesives, sealants, paints, molded articles, etc. in electronic and electrical parts. Regarding the composition.
- thermosetting resins such as epoxy resins, polyimide resins, unsaturated polyester resins, and phenolic resins have been used as heat-resistant resins in the field of electronic materials. These thermosetting resins are used properly according to their uses and characteristics. Among these resins, polyimide resins are particularly excellent in heat resistance and moisture-heat resistance (heat resistance after moisture absorption), and are therefore widely used in applications requiring high heat resistance. Modified polyimide resins are also used, which are improved in performance by combining polyimide resins with other resins such as epoxy resins.
- Patent Document 1 describes a resin composition obtained by melting a component containing a polymaleimide compound.
- an object of the present invention is to provide a resin composition containing a bismaleimide compound with further improved low dielectric properties.
- Another object of the present invention is to provide a resin composition containing a bismaleimide compound that has good solubility and curability in low boiling point solvents and is easy to handle.
- the resin composition of the present invention is a resin composition obtained by melting a resin mixture containing (A) a bismaleimide compound, wherein the (A) bismaleimide compound is a fat represented by formula (1)
- a resin composition comprising a group bismaleimide compound and an aromatic bismaleimide compound represented by formula (2).
- R 1 is an alkylene group having 6 to 12 carbon atoms.
- R 2 is a hydrocarbon group having 6 to 30 carbon atoms and having an aromatic ring
- X 1 is each independently an oxygen atom or a single bond
- R 3 and R 4 each have 1 carbon atom.
- a and b are integers of 0 or more and 3 or less.
- the resin composition By containing the aliphatic bismaleimide compound and the aromatic bismaleimide compound in the resin composition, it is possible to improve the heat resistance of the cured product while maintaining low dielectric properties. Therefore, it is possible to provide a resin composition having excellent low dielectric properties (low dielectric constant, low dielectric loss tangent) while maintaining heat resistance, which generally has a trade-off relationship with low dielectric properties.
- the resin composition of the present embodiment contains (A) 30 to 65 parts by mass of a bismaleimide compound, (B) 5 to 25 parts by mass of a cumarone resin, and (C) an amine compound 1 in 100 parts by mass of the resin component of the resin mixture. It is a resin composition obtained by melting a resin mixture containing up to 30 parts by mass.
- the components (A) to (C) and other components that the resin composition may contain are described below.
- the numerical range "A to B" means "above A and below B”.
- a mixture before melt-mixing each component is called a "resin mixture”
- a mixture after cooling after melt-mixing is called a "resin composition”.
- the bismaleimide compound is a compound having two maleimide groups and contains an aliphatic bismaleimide compound represented by the formula (1) shown in the section of Means for Solving the Problems.
- R 1 is preferably an alkylene group having 7 to 11 carbon atoms, and R 1 is preferably an alkylene group having 9 carbon atoms, from the viewpoint of obtaining a cured product with low dielectric properties. more preferred.
- an aliphatic bismaleimide compound having a melting point of 120° C. or less is preferable.
- aliphatic bismaleimide compounds examples include 1,6-bismaleimide(2,2,4-trimethyl)hexane, hexamethylenediaminebismaleimide, N,N'-1,2-ethylenebismaleimide, N, N'-1,3-propylenebismaleimide, N,N'-1,4-tetramethylenebismaleimide and the like.
- examples of commercially available aliphatic bismaleimide compounds include BMI-TMH (product name, manufactured by Daiwa Kasei Kogyo Co., Ltd.).
- the bismaleimide compound further contains an aromatic bismaleimide compound represented by formula (2) shown in the section of Means for Solving the Problems.
- An aromatic bismaleimide compound having a melting point of 130° C. or higher is more preferable.
- aromatic bismaleimide compound represented by formula (2) examples include 4,4′-diphenylmethanebismaleimide, bisphenol A diphenyletherbismaleimide, 3,3′-dimethyl-5,5′-diethyl-4,4′- diphenylmethane bismaleimide and the like.
- aromatic bismaleimide compounds include BMI-1000, BMI-4000, BMI-5000, and BMI-5100 (all product names, manufactured by Daiwa Kasei Kogyo Co., Ltd.).
- R 2 in formula (2) is preferably a group represented by formula (3) from the viewpoint of heat resistance of the cured product.
- aromatic bismaleimide compounds include bisphenol A diphenyl ether bismaleimide.
- the mass ratio of the content of the aliphatic bismaleimide compound to the content of the aromatic bismaleimide compound is preferably 3.0:7.0 to 7.0:3.0, more preferably 4.0:6.0 to 6.0:4.0, 4.5:5.5 to 5.5:4.5 are more preferred.
- the content of the bismaleimide compound in 100 parts by mass of the resin component of the resin mixture is 30 to 65 parts by mass.
- the content of the bismaleimide compound in 100 parts by mass of the resin component is more preferably 40 to 62 parts by mass, more preferably 50 to 60 parts by mass, from the viewpoint of achieving both high heat resistance and low dielectric properties of the cured product.
- Two or more kinds of bismaleimide compounds are used in combination.
- Components (B) to (I) and other components described below can be used singly or in combination of two or more.
- Coumaron resin is a copolymer resin composed mainly of coumarone, indene and styrene.
- Commercially available products include G-90, V-120, L-5, L-20, H-100 (all product names, manufactured by Nichinori Kagaku Co., Ltd.).
- a coumarone resin having a softening point of 100° C. or less is preferable from the viewpoint of low dielectric properties of the cured product. From the same point of view, the weight average molecular weight is preferably 850 or less, more preferably 800 or less.
- a coumarone resin that is beaded (solid) at ambient temperature is preferred over one that is liquid at ambient temperature.
- the content of the coumarone resin in 100 parts by mass of the resin component of the resin mixture is preferably 5 to 25 parts by mass, more preferably 10 to 20 parts by mass, more preferably 13 to 18 parts by mass, from the viewpoint of high heat resistance and low dielectric properties of the cured product. Parts by mass are more preferred.
- the content of the coumarone resin is more preferably 15 parts by mass or more, more preferably 20 parts by mass or more, relative to 100 parts by mass of the bismaleimide compound (A). More preferred. From the viewpoint of obtaining a cured product with good heat resistance, the content of the coumarone resin is more preferably 50 parts by mass or less, even more preferably 40 parts by mass or less with respect to 100 parts by mass of the bismaleimide compound.
- the aliphatic bismaleimide compound represented by Formula (1) has a problem that once dissolved, it does not solidify and becomes liquid.
- the resin composition of the present embodiment contains 1 to 30 parts by mass of an amine compound in 100 parts by mass of the resin component in addition to the aliphatic bismaleimide compound.
- the content of the amine compound is preferably 2 to 15 parts by mass, more preferably 3 to 8 parts by mass, from the viewpoints of curability of the resin composition and low dielectric properties and heat resistance of the cured product.
- Examples of the amine compound include aromatic amines such as bisaniline and 1,3-bis(3-aminophenoxy)benzene, and bisaniline is preferable from the viewpoint of making a resin composition with good handling properties as a prepreg.
- Commercially available products include Bisaniline M and Bisaniline-P (manufactured by Mitsui Chemicals Fine Co., Ltd.); ODA, BODA, BAPP, HFBAPP, BAPB, TPE-M and TPE-Q (both manufactured by Seika Co., Ltd.); Kayabond C -200S (manufactured by Nippon Kayaku Co., Ltd.), BAN (manufactured by Nippon Kayaku Co., Ltd.), and the like.
- Bisaniline is more preferably an aromatic amine represented by formula (4).
- R 5 is a hydrocarbon group having 6 to 30 carbon atoms and having an aromatic ring, and each X 1 is independently an oxygen atom or a single bond.
- Bisanilines represented by formula (4) include 4,4′-[dimethylmethylenebis(4,1-phenyleneoxy)]bisaniline and 4,4′-[biphenyl-4,4′-diylbis(oxy)].
- Bisaniline represented by formula (4) includes commercially available products such as Bisaniline M and Bisaniline-P (manufactured by Mitsui Chemicals Fine Co., Ltd.); BODA, BAPP and BAPB (manufactured by Seika Co., Ltd.).
- (D) Benzoxazine compound may have at least one or more benzoxazine rings in the molecule, but dihydrobenzoxazine compounds represented by the following general formula (5) or (6) A pd-type dihydrobenzoxazine represented by the following general formula (6) is preferred, and more preferred.
- R 6 and R 7 represent a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 3 carbon atoms.
- the content of the benzoxazine compound in 100 parts by mass of the resin component of the resin mixture is 5 to 20 parts by mass from the viewpoint of the high heat resistance and low dielectric properties of the cured product and the solubility of the resin composition in low boiling point solvents. is preferred, 10 to 20 parts by weight is more preferred, and 15 to 20 parts by weight is even more preferred.
- the content of the benzoxazine compound is more preferably 15 parts by mass or more, more preferably 20 parts by mass with respect to 100 parts by mass of the bismaleimide compound. The above is more preferable. From the viewpoint of obtaining a cured product with good heat resistance, the content of the benzoxazine compound is more preferably 50 parts by mass or less, still more preferably 40 parts by mass or less with respect to 100 parts by mass of the bismaleimide compound.
- Bisphenol A-type cyanate ester is a bisphenol A-type cyanate ester (triazine) that forms a triazine ring and cures. Curability of the resin mixture is improved by containing the bisphenol A type cyanate ester.
- Bisphenol A-type cyanate esters include monomers and (homo)polymers (polymers), and bisphenol A-type cyanate ester monomers are preferred from the viewpoint of obtaining cured products with excellent low dielectric properties.
- the content of the bisphenol A-type cyanate ester in 100 parts by mass of the resin component of the resin mixture is preferably 0.1 to 3 parts by mass. 0.5 to 2 parts by weight is more preferred, and 0.7 to 1.3 parts by weight is even more preferred.
- Epoxy resin The resin composition may contain an epoxy resin, if necessary, for the purpose of complementing various properties such as flame retardancy.
- the inclusion of the epoxy resin may improve the interlaminar adhesion and insulating properties of a laminate obtained by stacking prepregs, which are sheets impregnated with a resin composition, on a base material and performing pressurization and heat treatment.
- the epoxy resin may be a compound having an epoxy group, but from the viewpoint of achieving both heat resistance and low dielectric properties of the cured product, a biphenyl aralkyl type epoxy resin, an epoxy resin containing a naphthalene ring, and having three epoxy groups. Compounds and the like are preferred.
- the epoxy resin containing a naphthalene ring an ⁇ -naphthol type epoxy resin is preferable.
- Examples of commercially available epoxy resins containing naphthalene rings include ESN-475V (product name, ⁇ -naphthol type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.) in which each naphthalene ring has two epoxy groups.
- VG3101L product name, manufactured by Printec Co., Ltd.
- Epoxy resins other than the above include bisphenol A type epoxy resin, bisphenol E type epoxy resin, bisphenol F type epoxy resin, novolak type epoxy resin, cresol novolak type epoxy resin, bisphenol A novolak type epoxy resin, bisphenol F novolak type epoxy resin. , triphenylol-type epoxy resins, dicyclopentadiene-type epoxy resins, and the like.
- the heat resistance of the cured product is improved by suppressing the content of the bisphenol A type epoxy resin in the resin component of the resin mixture. Therefore, from the viewpoint of improving the heat resistance of the cured product, it is preferable that the resin mixture does not contain a bisphenol A type epoxy resin.
- “not containing a bisphenol A type epoxy resin” means substantially not containing it, that is, not containing an amount of a bisphenol A type epoxy resin that affects the properties of the resin mixture.
- the content of the bisphenol A type epoxy resin in 100 parts by mass of the resin component of the resin mixture is 1 part by mass or less, depending on the case, 0.3 parts by mass or less or 0.1 part by mass or less, a resin with low dielectric properties It has no effect on the properties of the mixture.
- the content of the epoxy resin in 100 parts by mass of the resin component of the resin mixture is preferably 1 to 12 parts by mass, more preferably 2 to 10 parts by mass, and 3 to 8 parts by mass, from the viewpoint of high heat resistance and low dielectric properties of the cured product. Parts by mass are more preferred.
- the resin composition of the present embodiment is a resin composition obtained by melting a resin mixture containing (A) a bismaleimide compound, wherein (A) the bismaleimide compound is and an aliphatic bismaleimide compound represented by formula (1) and an aromatic bismaleimide compound represented by formula (2).
- the resin composition can improve the heat resistance of the cured product while maintaining the low dielectric properties of the cured product.
- the bismaleimide compound description of items common to the first embodiment will be omitted, and different items will be described below.
- the resin composition is such that the mass ratio of the content of the two types of bismaleimide compounds in the resin mixture is 25:55 as the aliphatic bismaleimide compound:aromatic bismaleimide compound. 45:35 is preferable, and 27:53 to 47:38 is more preferable.
- the resin composition contains triallyl isocyanurate in the resin mixture from the viewpoint of increasing the solubility in low boiling point solvents.
- the content of triallyl isocyanurate in 100 parts by mass of the resin component of the resin mixture is preferably 16 to 26 parts by mass, more preferably 18 to 24 parts by mass.
- the resin composition can be prepared as a 60% by mass methyl ethyl ketone solution and has high solubility in a low boiling point solvent.
- Commercial products of triallyl isocyanurate include TAIC (trademark, manufactured by Mitsubishi Chemical Corporation).
- the resin composition preferably further contains an amine compound and a carboxylic acid dianhydride from the viewpoint of making the state in the B-stage a solid rather than a viscous solid so that it is easy to handle.
- (C) Amine Compound The same amine compound as in the first embodiment can be used as the amine compound.
- the content of the amine compound in 100 parts by mass of the resin component of the resin mixture is is preferably 8 to 20 parts by mass, more preferably 10 to 18 parts by mass, even more preferably 12 to 16 parts by mass.
- (I) Carboxylic acid dianhydride examples include BPADA, 6FDA, SFDA, BzDA: Enehyde (trademark, manufactured by ENEOS), TAHQ (see Examples for abbreviations), and the like. From the viewpoint of making a resin composition that becomes solid in the B stage and has high solubility in a low boiling point solvent, when the resin mixture contains triallyl isocyanurate, carboxylic acid dianhydride in 100 parts by mass of the resin component of the resin mixture The content is preferably 10 to 35 parts by mass, more preferably 15 to 30 parts by mass, even more preferably 20 to 27 parts by mass.
- a curing accelerator may be added. Timing for adding the curing accelerator includes, for example, when the resin composition is dissolved in a solvent to form a varnish, when the varnish is prepregized, or when a substrate or laminate is produced. The following description is common to the resin compositions of the first and second embodiments.
- Curing accelerators include, for example, imidazoles such as dicumyl peroxide, 4,4'-diaminodiphenylmethane, 2-methylimidazole, 2-ethyl-4-methylimidazole, and 2-heptylimidazole; triethanolamine, triethylenediamine, Amines such as N-methylmorpholine; Organic phosphines such as triphenylphosphine and tritolylphosphine; Tetraphenylboron salts such as tetraphenylphosphonium tetraphenylborate and triethylammonium tetraphenylborate; ,4,0) undecene-7 and its derivatives; organic metal salts such as lead naphthenate, lead stearate, zinc naphthenate, tin oleate, manganese naphthenate, cobalt naphthenate and cobalt octylate.
- the curing accelerator is blended in the varnish or prepreg at a content that gives the desired gelling time.
- the curing accelerator is used in the range of 0.01 to 5 parts by mass with respect to the total 100 parts by mass of the resin components contained in the resin composition.
- the resin composition and the resin mixture before melt mixing may contain components other than the above (A) to (I).
- organic or inorganic fillers can be used to cure the resin composition to obtain a substrate for molding.
- fillers include oxides such as silica, diatomaceous earth, alumina, zinc chloride, titanium oxide, calcium oxide, magnesium oxide, iron oxide, tin oxide, antimony oxide, and ferrites; calcium hydroxide, magnesium hydroxide, hydroxide Hydroxides such as aluminum and basic magnesium carbonate; carbonates such as calcium carbonate, magnesium carbonate, zinc carbonate, barium carbonate, dawsonite and hydrotalcite; sulfates such as calcium sulfate, barium sulfate and gypsum fiber; calcium silicate (wollastonite, xonotlite), talc, clay, mica, montmorillonite, bentonite, activated clay, sepiolite, imogolite, sericite, glass fiber, glass beads, silicates such as silic
- the shape of the filler is preferably spherical or scaly. If necessary, use a silane coupling agent with two or more different reactive groups in the molecule (one reactive group that chemically reacts with inorganic materials, the other that chemically reacts with organic materials). You may
- the content is preferably 5.0 to 250 parts by mass with respect to 100 parts by mass of the resin component of the resin mixture.
- a flame retardant can be added to the resin composition as needed.
- Flame retardants include organic flame retardants such as bromine compounds such as brominated epoxy resins and phosphorus compounds such as condensed phosphoric acid esters, and inorganic flame retardants such as aluminum hydroxide, magnesium hydroxide, tin compounds and antimony compounds. .
- the flame retardant is a content that realizes sufficient flame retardancy (for example, passing the V-0 condition in UL94 standard) without impairing the heat resistance and moist heat resistance of the cured product obtained by curing the resin composition.
- an organic flame retardant for example, 1 to 20 parts by mass with respect to a total of 100 parts by mass of the resin components including the organic flame retardant in the resin composition. It is used in an amount of 10 to 300 parts by mass.
- additives When using the resin composition, other additives can be added depending on the application.
- examples of other additives include various silicone oils, thermoplastic resins, synthetic rubbers such as NBR, and leveling agents.
- Other additives are used, for example, in a content of 0.0001 to 5 parts by mass in a total of 100 parts by mass of the other additives and the resin component in the resin composition.
- the resin composition of the present invention is produced by a melt-mixing process in which a resin mixture is heated and mixed in a molten state.
- Usual mixing means can be used for the melt-mixing step.
- a mixing means a kneader, a twin-screw kneader, or the like is preferable.
- the temperature during melt-mixing may be the temperature at which the resin mixture melts or higher and 400°C or lower, preferably 130 to 230°C, more preferably 150 to 210°C, and even more preferably 170 to 190°C.
- the melt-mixing step is preferably carried out under conditions such that the weight average molecular weight of the resin composition obtained by heating the resin mixture is 1,000 to 2,500, more preferably 1,200 to 1,800.
- the time for the melt-mixing step is, for example, about 0.1 to 10 minutes, and it is preferable to set conditions such as temperature in the melt-mixing step so as to be about 0.5 to 4 minutes.
- the resin composition of the present invention is obtained by cooling by natural cooling or forced cooling.
- the cooling method can be appropriately selected from known methods. For example, a method of natural cooling in an environment of 0 to 40° C. or a method of forced cooling using a refrigerant can be employed. Further, after melting and mixing, it may be placed in an environment of 30 to 300° C. in a constant temperature device and then cooled. After cooling, the resulting resin composition can be used in subsequent steps as a solid resin composition.
- the aliphatic bismaleimide compound, the aromatic bismaleimide compound, and other components in the resin mixture react with each other, so that at least part of the bismaleimide compound is modified.
- a resin composition having high heat resistance, low dielectric properties, good solubility in low boiling point solvents, and good curability can be produced.
- the resin composition produced by the melt-mixing process has a component with a molecular weight of 4,500 to 4,800.
- the ratio of the component having a molecular weight of 4500 to 4800 in 100% by mass of the resin composition is preferably 10 to 20% by mass, more preferably 12 to 18% by mass.
- the proportion of components with a molecular weight of 4500-4800 can be determined by gel permeation chromatography (GPC) measurement.
- the resin composition varnish according to the present invention is obtained by dissolving the resin composition obtained by the above-described production method in a solvent having a boiling point of 120° C. or less and a dielectric constant of 10 to 30.
- solvents having a boiling point of 120° C. or less and a dielectric constant of 10 to 30 include ketone solvents such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ether solvents such as propylene glycol monomethyl ether, ethanol, 1-propanol and 2-propanol. , and alcohol solvents such as 1-butanol.
- a ketone solvent is preferably used in consideration of operability and the like. Solvents other than those exemplified above may be contained.
- the content of the resin composition in 100 parts by mass of the varnish is usually 40 to 80 parts by mass, preferably 50 to 70 parts by mass.
- the varnish can be obtained by dissolving the resin composition in a solvent at normal temperature (room temperature) or under heating. When dissolving under heating, the conditions for dissolving are, for example, a temperature of about 50 to 200° C. and a time of about 0.1 to 24 hours, depending on the boiling point of the solvent.
- a prepreg is produced by coating or impregnating a base material with the above varnish and then drying it to remove the solvent.
- known substrates used in conventional prepregs such as glass nonwoven fabric, glass cloth, carbon fiber cloth, organic fiber cloth, and paper, can be used.
- the prepreg After coating or impregnating the base material with the varnish, the prepreg is manufactured through a drying process, but the coating method, impregnation method, and drying method are not particularly limited, and conventionally known methods can be adopted.
- the drying conditions are appropriately determined according to the boiling point of the solvent used, but too high a temperature is not preferable. It is desirable to dry so that the solvent remaining in 100 parts by mass of the prepreg is 3 parts by mass or less.
- a filler other than the resin composition described above may be added to the varnish when producing the prepreg.
- fillers include silica particles, alumina particles, and polyphenylene ether resins.
- the amount of the filler used in preparing the prepreg is 10 to 100 parts per 100 parts by mass of the resin component of the resin composition. Parts by weight are preferred, 10 to 50 parts by weight are more preferred, and 20 to 40 parts by weight are even more preferred.
- silica particles and alumina particle fillers examples include the ADMAFINE series (product name, manufactured by Admatechs Co., Ltd.), and commercially available polyphenylene ether resins SA90, SA120, and SA9000 (product names, all manufactured by SABIC Japan LLC. ) and the like.
- the resin composition of the present invention is suitable for printed wiring boards, and the present invention can be implemented as a molded product obtained by curing the resin composition.
- molded articles include cured products obtained by curing only the resin composition, composite materials combined with other raw materials, laminates, and the like.
- the composite material and laminate can be obtained by heating and curing one sheet of prepreg under pressure using a hot press or the like, or by laminating a plurality of prepregs and heating and integrating them under pressure.
- the heating and pressurizing conditions for producing the composite material are not particularly limited, but the heating temperature is 100 to 300° C., preferably 150 to 250° C., more preferably 200 to 250° C., and the pressure is 10 to 100 kg/ cm 2 , preferably 20 to 40 kg/cm, and heating/pressing time is 10 to 300 minutes, preferably 30 to 180 minutes.
- Copper, aluminum, iron, stainless steel, etc. can be used as the metal foil or metal plate.
- a laminate using copper as a metal foil is a copper clad laminate (CCL).
- the conditions for heat curing are preferably the same as the conditions for producing the composite material.
- the present invention can also be implemented as adhesives, sealants and paints containing the resin composition described above.
- Test method [Solvent solubility (MEK solubility)] 60 parts by mass of a measurement sample (resin composition) and 40 parts by mass of methyl ethyl ketone (solvent) are mixed under conditions of 50° C. or less, and the dissolved state after applying ultrasonic vibration for a predetermined time is measured using the following criteria. It was evaluated visually. ⁇ : Brown transparent liquid at the time of applying ultrasonic vibration for 100 minutes, with no undissolved residue, separation, or turbidity. x: Undissolved, separated or turbid after applying ultrasonic vibration for 100 minutes.
- Glass transition point (Tg)] [Thermal expansion coefficient: CTE (ppm/°C)]
- CTE thermal expansion coefficient
- Measurement mode heat flux type (TMA) Measuring equipment: Thermo plus TMA8310 manufactured by Rigaku Sample dimensions: length (vertical) 19 mm x width (horizontal) 5 mm x thickness 0.1 mm Atmosphere: N2 Measurement temperature: 30 to 350°C Temperature rising rate: 10°C/min. Measurement mode: Tensile
- Raw material (A) Polymaleimide compound BMI-TMH (product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., 1,6-bismaleimide-(2,2,4-trimethyl)hexane, melting point 73 to 110°C) ⁇ BMI-4000 (product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., bisphenol A diphenyl ether bismaleimide, melting point 134 to 163 ° C.) ⁇ BMI-2300 (product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., polyphenylmethane polymaleimide, melting point 70 to 145 ° C.)
- the glass cloth 2116 was impregnated with a filler (SC2500-SXJ) added and dispersed in a proportion of 100 parts by mass with respect to 100 parts by mass of the resin component in the resin composition in the varnish. (1 Ply) prepreg was produced. In other Examples 43 to 67 and Comparative Examples 5 to 7, prepregs were produced by impregnating the glass cloth 2116 in a single layer without adding polyphenylene ether to the varnish.
- a filler SC2500-SXJ
- the prepreg of each example and comparative example was cured under press conditions: 180 ° C. x 30 kg/cm 2 x 1 hour, main curing conditions: 230 ° C. x 2 hours.
- Tables 1 to 8 show the results of measuring dielectric constant (Dk) and dielectric loss tangent (Df). Examples 48 and 49 were not used for measurement because the resin had large scratches when the prepreg was manufactured.
- the amine compound is preferably one or more selected from the group consisting of APB-N, BAN, and BAPP, and (I) carboxylic Acid dianhydride is preferably one or more selected from the group consisting of BPDA, 6FDA and SFDA.
- a cured product with low dielectric properties is produced from a prepreg using a resin composition obtained by melting a resin mixture containing components (A) to (C) in 100 parts by mass of the resin component of the resin mixture. could be manufactured.
- a resin composition having good handleability as a prepreg was obtained.
- a resin composition obtained by melting a resin mixture containing (A) BMI-TMH and BMI-4000 as polymaleimide compounds and (C) BAPP as an amine compound has heat resistance (Tg (DSC)). and low dielectric properties (Df (after 24 hours)) were good.
- a cured product with a low CTE was obtained by setting the mass ratio of the contents of BMI-TMH and BMI-4000 to 3.0:7.0 to 7.0:3.0.
- G-90 By setting the content of G-90 to 12 parts by mass or less in 100 parts by mass of the resin mixture, it was possible to increase the heat resistance (Tg) of the cured product.
- a cured product having excellent heat resistance was obtained regardless of the triazine content. Since the resin mixture contained triazine, the viscosity (hardness) of the resin mixture was increased and the handleability was improved.
- the triazine content in 100 parts by mass of the resin mixture is preferably 2.0 parts by mass or less, and more preferably 1.0 parts by mass or less. Cured products with excellent heat resistance and low dielectric properties were obtained regardless of the epoxy content.
- Example 67 in which SC2500-SXJ was dispersed as a filler, could achieve the best low dielectric properties. This is presumed to be due to the fact that dense molecular bonding was obtained as a result of the filler inhibiting and eliminating the molecular bonding due to aggregation.
- FIG. 1 shows the results of GPC of the resin composition with a synthesis time of 2.5 minutes.
- Table 9 shows the effect of synthesis time on the properties of the resin composition.
- Synthesis conditions Resin temperature 170°C ⁇ 10°C [gel time] Measurement of curing time on a hot plate at 171°C [peak area]
- GPC gel permeation chromatography
- the weight average molecular weight of the resin composition was determined by GPC measurement. Solvent solubility was evaluated using the following criteria. 60 parts by mass of a measurement sample (resin composition) and 40 parts by mass of methyl ethyl ketone (solvent) are mixed under conditions of 50° C. or less, and the dissolved state after applying ultrasonic vibration for a predetermined time is measured using the following criteria. It was evaluated visually. [MEK solubility (168 hours)] An MEK solution of the resin was prepared by the method of solvent solubility (MEK solubility) described above, and the state of the measurement sample after standing for a predetermined time was visually evaluated using the following criteria. ⁇ : No precipitation of resin after standing at room temperature for 168 hours. x: Precipitation of resin after standing for 168 hours at room temperature.
- a resin composition with good MEK solubility was obtained by setting the ratio of the component having a molecular weight of 4500 to 4800 corresponding to the peak marked with 1 in the graph of FIG. 1 to 10 to 20% of the total. By setting the weight average molecular weight to 1100 to 2500, a resin composition having good MEK solubility was obtained.
- the resin composition of the present invention has good solubility in solvents, low dielectric properties (low dielectric constant and low dielectric loss tangent), and high heat resistance. It can be used as a raw material for adhesives, sealants, paints, moldings, laminates and printed wiring boards that are excellent in heat resistance and low dielectric properties and suitable for various electronic devices.
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Abstract
Description
そこで、本発明は、低誘電特性をさらに向上させた、ビスマレイミド化合物を含有する樹脂組成物を提供することを目的としている。また、低沸点溶剤に対する溶解性および硬化性が良く、取り扱い性に優れたビスマレイミド化合物を含有する樹脂組成物を提供することを目的としている。 2. Description of the Related Art In recent years, along with the improvement in performance, capacity, and speed of various electronic devices, the frequency of electrical signals is becoming higher. Increasing the frequency of electrical signals is advantageous for increasing the speed and capacity of communication, but there is a risk that signals will be attenuated due to increased dielectric loss and reliability will decrease. Therefore, there is a demand for further improvement in low dielectric properties as properties of resin compositions suitable for substrates compatible with high frequencies for next-generation communications.
Accordingly, an object of the present invention is to provide a resin composition containing a bismaleimide compound with further improved low dielectric properties. Another object of the present invention is to provide a resin composition containing a bismaleimide compound that has good solubility and curability in low boiling point solvents and is easy to handle.
(樹脂組成物)
本実施形態の樹脂組成物は、樹脂混合物の樹脂成分100質量部中に、(A)ビスマレイミド化合物30~65質量部、(B)クマロン樹脂5~25質量部、および(C)アミン化合物1~30質量部を含有する樹脂混合物を溶融して得られた樹脂組成物である。以下、(A)~(C)の各成分および樹脂組成物が含有してもよい他の成分について説明する。本発明において、数値範囲「A~B」は「A以上B以下」を意義する。各成分を溶融混合する以前のものを「樹脂混合物」といい、溶融混合した後に冷却したものを「樹脂組成物」という。 <First Embodiment>
(resin composition)
The resin composition of the present embodiment contains (A) 30 to 65 parts by mass of a bismaleimide compound, (B) 5 to 25 parts by mass of a cumarone resin, and (C) an amine compound 1 in 100 parts by mass of the resin component of the resin mixture. It is a resin composition obtained by melting a resin mixture containing up to 30 parts by mass. The components (A) to (C) and other components that the resin composition may contain are described below. In the present invention, the numerical range "A to B" means "above A and below B". A mixture before melt-mixing each component is called a "resin mixture", and a mixture after cooling after melt-mixing is called a "resin composition".
ビスマレイミド化合物は、マレイミド基を二つ有する化合物であり、課題を解決するための手段の項に示した式(1)により表される脂肪族ビスマレイミド化合物を含有している。脂肪族ビスマレイミド化合物を用いることにより、樹脂組成物の硬化物の低誘電特性が向上する。また、熱プレスにより硬化させた絶乾状態の後における吸水率が少ない硬化物となる。このため、製造してから時間が経過した後において、硬化物は製造直後の低誘電特性を安定的に維持することができる。 (A) Bismaleimide compound The bismaleimide compound is a compound having two maleimide groups and contains an aliphatic bismaleimide compound represented by the formula (1) shown in the section of Means for Solving the Problems. there is By using the aliphatic bismaleimide compound, the low dielectric properties of the cured product of the resin composition are improved. In addition, a cured product having a low water absorption rate after being cured by hot pressing in an absolutely dry state is obtained. For this reason, the cured product can stably maintain the low dielectric properties immediately after production even after a long period of time has passed since the production.
クマロン樹脂は、クマロン、インデンおよびスチレンを主成分とする共重合樹脂である。市販品としては、G-90、V-120、L-5、L-20、H-100(いずれも製品名、日塗化学(株)製)などが挙げられる。硬化物の低誘電特性の観点から、軟化点が100℃以下であるクマロン樹脂が好ましい。また、同様の観点から、重量平均分子量が850以下のものが好ましく、800以下のものがより好ましい。常温でビーズ状(固体)のクマロン樹脂が、常温で液体のものよりも好ましい。 (B) Coumaron resin Coumaron resin is a copolymer resin composed mainly of coumarone, indene and styrene. Commercially available products include G-90, V-120, L-5, L-20, H-100 (all product names, manufactured by Nichinori Kagaku Co., Ltd.). A coumarone resin having a softening point of 100° C. or less is preferable from the viewpoint of low dielectric properties of the cured product. From the same point of view, the weight average molecular weight is preferably 850 or less, more preferably 800 or less. A coumarone resin that is beaded (solid) at ambient temperature is preferred over one that is liquid at ambient temperature.
式(1)により表される脂肪族ビスマレイミド化合物には、一度溶解すると固化せず液状になってしまうという問題がある。取り扱いに関するこの問題を解決するために、本実施形態の樹脂組成物は、脂肪族ビスマレイミド化合物に加えて、樹脂成分100質量部中にアミン化合物1~30質量部を含有している。アミン化合物の含有量は、樹脂組成物の硬化性ならびに、硬化物の低誘電特性および耐熱性の観点から、2~15質量部が好ましく、3~8質量部がより好ましい。 (C) Amine compound The aliphatic bismaleimide compound represented by Formula (1) has a problem that once dissolved, it does not solidify and becomes liquid. In order to solve this handling problem, the resin composition of the present embodiment contains 1 to 30 parts by mass of an amine compound in 100 parts by mass of the resin component in addition to the aliphatic bismaleimide compound. The content of the amine compound is preferably 2 to 15 parts by mass, more preferably 3 to 8 parts by mass, from the viewpoints of curability of the resin composition and low dielectric properties and heat resistance of the cured product.
ベンゾオキサジン化合物は、分子中に少なくとも一つ以上のベンゾオキサジン環を有するものであればよいが、下記一般式(5)または(6)で表されるジヒドロベンゾオキサジン化合物が好ましく、下記一般式(6)で表されるp-d型ジヒドロベンゾオキサジンがより好ましい。
ビスフェノールA型シアネートエステルは、トリアジン環を形成して硬化するビスフェノールA型シアネートエステル(トリアジン)である。樹脂混合物は、ビスフェノールA型シアネートエステルの含有により硬化性が向上する。ビスフェノールA型シアネートエステルには、モノマーと(ホモ)ポリマー(高分子)とがあるが、低誘電特性に優れた硬化物を得る観点から、ビスフェノールA型シアネートエステルのモノマーが好ましい。 (E) Bisphenol A-type cyanate ester A bisphenol A-type cyanate ester is a bisphenol A-type cyanate ester (triazine) that forms a triazine ring and cures. Curability of the resin mixture is improved by containing the bisphenol A type cyanate ester. Bisphenol A-type cyanate esters include monomers and (homo)polymers (polymers), and bisphenol A-type cyanate ester monomers are preferred from the viewpoint of obtaining cured products with excellent low dielectric properties.
樹脂組成物は、例えば難燃性などの各種特性を補完することを目的として、必要に応じてエポキシ樹脂を含有してもよい。エポキシ樹脂の含有によって、基材に樹脂組成物を含浸させたシートであるプリプレグを重ねて加圧加熱処理して得られる積層板の層間密着力や絶縁性が向上する場合がある。 (F) Epoxy resin The resin composition may contain an epoxy resin, if necessary, for the purpose of complementing various properties such as flame retardancy. The inclusion of the epoxy resin may improve the interlaminar adhesion and insulating properties of a laminate obtained by stacking prepregs, which are sheets impregnated with a resin composition, on a base material and performing pressurization and heat treatment.
(樹脂組成物)
本実施形態の樹脂組成物は、(A)ビスマレイミド化合物を含む樹脂混合物を溶融して得られた樹脂組成物であって、(A)ビスマレイミド化合物が、課題を解決するための手段の項に示す、式(1)により表される脂肪族ビスマレイミド化合物と、式(2)により表される芳香族ビスマレイミド化合物と、を含む。樹脂組成物は、樹脂組成物が脂肪族ビスマレイミド化合物および芳香族ビスマレイミド化合物を含有することで、硬化物の低誘電特性を維持しつつ、硬化物の耐熱性を向上させることができる。ビスマレイミド化合物について、第1の実施形態と共通の事項は説明を省略し、異なる事項について以下に説明する。 <Second embodiment>
(resin composition)
The resin composition of the present embodiment is a resin composition obtained by melting a resin mixture containing (A) a bismaleimide compound, wherein (A) the bismaleimide compound is and an aliphatic bismaleimide compound represented by formula (1) and an aromatic bismaleimide compound represented by formula (2). By containing the aliphatic bismaleimide compound and the aromatic bismaleimide compound, the resin composition can improve the heat resistance of the cured product while maintaining the low dielectric properties of the cured product. With respect to the bismaleimide compound, description of items common to the first embodiment will be omitted, and different items will be described below.
樹脂組成物は、低沸点溶剤に対する溶解性を高くする観点から、樹脂混合物中にトリアリルイソシアヌレートを含有している。樹脂混合物の樹脂成分100質量部中のトリアリルイソシアヌレートの含有量は、16~26質量部が好ましく、18~24質量部がより好ましい。トリアリルイソシアヌレートを含有することにより、60質量%のメチルエチルケトン溶液を調整可能な、低沸点溶剤に対する溶解性が高い樹脂組成物となる。トリアリルイソシアヌレートの市販品としては、TAIC(商標、三菱ケミカル(株)製)などが挙げられる。 (H) Triallyl isocyanurate The resin composition contains triallyl isocyanurate in the resin mixture from the viewpoint of increasing the solubility in low boiling point solvents. The content of triallyl isocyanurate in 100 parts by mass of the resin component of the resin mixture is preferably 16 to 26 parts by mass, more preferably 18 to 24 parts by mass. By containing triallyl isocyanurate, the resin composition can be prepared as a 60% by mass methyl ethyl ketone solution and has high solubility in a low boiling point solvent. Commercial products of triallyl isocyanurate include TAIC (trademark, manufactured by Mitsubishi Chemical Corporation).
アミン化合物としては、第1の実施形態と同じものが挙げられる。Bステージにおいて固体となる、低沸点溶媒に対する溶解性が高い樹脂組成物とする観点から、樹脂混合物がトリアリルイソシアヌレートを含有する場合、樹脂混合物の樹脂成分100質量部中のアミン化合物の含有量は、8~20質量部が好ましく、10~18質量部がより好ましく、12~16質量部がさらに好ましい。 (C) Amine Compound The same amine compound as in the first embodiment can be used as the amine compound. When the resin mixture contains triallyl isocyanurate, the content of the amine compound in 100 parts by mass of the resin component of the resin mixture is is preferably 8 to 20 parts by mass, more preferably 10 to 18 parts by mass, even more preferably 12 to 16 parts by mass.
テトラカルボン酸二無水物は、BPADA、6FDA、SFDA、BzDA:エネハイド(商標、ENEOS製)、TAHQ(略号は実施例参照)などが挙げられる。Bステージにおいて固体となり、低沸点溶媒に対する溶解性が高い樹脂組成物とする観点から、樹脂混合物がトリアリルイソシアヌレートを含有する場合、樹脂混合物の樹脂成分100質量部中のカルボン酸二無水物の含有量は、10~35質量部が好ましく、15~30質量部がより好ましく、20~27質量部がさらに好ましい。 (I) Carboxylic acid dianhydride Examples of tetracarboxylic acid dianhydride include BPADA, 6FDA, SFDA, BzDA: Enehyde (trademark, manufactured by ENEOS), TAHQ (see Examples for abbreviations), and the like. From the viewpoint of making a resin composition that becomes solid in the B stage and has high solubility in a low boiling point solvent, when the resin mixture contains triallyl isocyanurate, carboxylic acid dianhydride in 100 parts by mass of the resin component of the resin mixture The content is preferably 10 to 35 parts by mass, more preferably 15 to 30 parts by mass, even more preferably 20 to 27 parts by mass.
第1および第2の実施形態として説明した本発明の樹脂組成物を用いる際に、硬化促進剤を添加してもよい。硬化促進剤を添加するタイミングとしては、樹脂組成物を溶剤に溶解してワニスとした際、ワニスをプリプレグ化する際、または基材、積層板を製造する際などが挙げられる。以下の説明は、第1および第2の実施形態の樹脂組成物に共通する。 (G) Curing Accelerator When using the resin composition of the present invention described as the first and second embodiments, a curing accelerator may be added. Timing for adding the curing accelerator includes, for example, when the resin composition is dissolved in a solvent to form a varnish, when the varnish is prepregized, or when a substrate or laminate is produced. The following description is common to the resin compositions of the first and second embodiments.
本発明の樹脂組成物は、樹脂混合物を加熱して、溶融状態で混合する溶融混合工程によって製造される。溶融混合工程には、通常の混合手段を用いることができる。混合手段としては、ニーダー、2軸混練機などが好ましい。溶融混合時の温度は樹脂混合物が溶融する温度以上400℃以下とすればよいが、130~230℃が好ましく、150~210℃がより好ましく、170~190℃がさらに好ましい。 (Melting and mixing step)
The resin composition of the present invention is produced by a melt-mixing process in which a resin mixture is heated and mixed in a molten state. Usual mixing means can be used for the melt-mixing step. As a mixing means, a kneader, a twin-screw kneader, or the like is preferable. The temperature during melt-mixing may be the temperature at which the resin mixture melts or higher and 400°C or lower, preferably 130 to 230°C, more preferably 150 to 210°C, and even more preferably 170 to 190°C.
本発明に係る樹脂組成物のワニスは、上述した製造方法によって得られた樹脂組成物を、沸点が120℃以下かつ比誘電率が10~30の溶剤に溶解させたものである。
沸点が120℃以下かつ比誘電率が10~30の溶剤としては、アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン系溶剤、プロピレングリコールモノメチルエーテルなどのエーテル系溶剤、エタノール、1-プロパノール、2-プロパノール、1-ブタノールなどのアルコール系溶剤などが挙げられる。操作性などを考慮すると、例示した溶剤のうちケトン系溶剤が好ましく用いられる。上に例示したもの以外の溶剤を含有していてもよい。 (varnish)
The resin composition varnish according to the present invention is obtained by dissolving the resin composition obtained by the above-described production method in a solvent having a boiling point of 120° C. or less and a dielectric constant of 10 to 30.
Examples of solvents having a boiling point of 120° C. or less and a dielectric constant of 10 to 30 include ketone solvents such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ether solvents such as propylene glycol monomethyl ether, ethanol, 1-propanol and 2-propanol. , and alcohol solvents such as 1-butanol. Among the exemplified solvents, a ketone solvent is preferably used in consideration of operability and the like. Solvents other than those exemplified above may be contained.
本発明は、上述した樹脂組成物を含有する接着剤、封止剤および塗料として実施することもできる。 Copper, aluminum, iron, stainless steel, etc. can be used as the metal foil or metal plate. For example, a laminate using copper as a metal foil is a copper clad laminate (CCL). The conditions for heat curing are preferably the same as the conditions for producing the composite material. Moreover, it is good also as a laminated board for multilayer printed wiring boards using an inner layer core material.
The present invention can also be implemented as adhesives, sealants and paints containing the resin composition described above.
〔溶剤溶解性(MEK溶解性)〕
測定試料(樹脂組成物)60質量部とメチルエチルケトン(溶剤)40質量部とを50℃以下の条件下で混合し、所定時間、超音波振動を加えた後における溶解状態を以下の基準を用いて目視により評価した。
〇:100分間超音波振動を加えた時点で褐色透明の液体であり、溶け残り、分離、濁りが無い。
×:100分間超音波振動を加えた時点で溶け残り、分離または濁りがある。 1. Test method [Solvent solubility (MEK solubility)]
60 parts by mass of a measurement sample (resin composition) and 40 parts by mass of methyl ethyl ketone (solvent) are mixed under conditions of 50° C. or less, and the dissolved state after applying ultrasonic vibration for a predetermined time is measured using the following criteria. It was evaluated visually.
◯: Brown transparent liquid at the time of applying ultrasonic vibration for 100 minutes, with no undissolved residue, separation, or turbidity.
x: Undissolved, separated or turbid after applying ultrasonic vibration for 100 minutes.
〔熱腺膨張率:CTE(ppm/℃)〕
樹脂組成物を硬化させた硬化物を所定の大きさにカット(切り出)して、ガラス転移点測定のサンプルとした。以下の条件にて、DSC(示差走査熱量計)およびTMA(Thermomechanical Analysis、熱機械分析)法を用いて、サンプルのガラス転移点(温度、℃)および熱腺膨張率(CTE)を測定した。
(DSC)
測定機器 :リガク社製 Thermo plus EVO2 DSC8231
サンプル重量 :5mg
雰囲気 :N2
測定温度 :30~350℃
昇温速度 :10℃/min.
測定モ-ド :熱流束型
(TMA)
測定機器 :リガク社製 Thermo plus TMA8310
サンプル寸法 :長さ(縦)19mm×幅(横)5mm×厚さ0.1mm
雰囲気 :N2
測定温度 :30~350℃
昇温速度 :10℃/min.
測定モ-ド :引張 [Glass transition point (Tg)]
[Thermal expansion coefficient: CTE (ppm/°C)]
A cured product obtained by curing the resin composition was cut (cut out) into a predetermined size and used as a sample for measuring the glass transition point. The glass transition point (temperature, °C) and thermal expansion coefficient (CTE) of the samples were measured using DSC (differential scanning calorimeter) and TMA (thermomechanical analysis) methods under the following conditions.
(DSC)
Measuring instrument: Thermo plus EVO2 DSC8231 manufactured by Rigaku
Sample weight: 5mg
Atmosphere: N2
Measurement temperature: 30 to 350°C
Temperature rising rate: 10°C/min.
Measurement mode: heat flux type (TMA)
Measuring equipment: Thermo plus TMA8310 manufactured by Rigaku
Sample dimensions: length (vertical) 19 mm x width (horizontal) 5 mm x thickness 0.1 mm
Atmosphere: N2
Measurement temperature: 30 to 350°C
Temperature rising rate: 10°C/min.
Measurement mode: Tensile
製造直後および製造後24時間経過時点において、空洞共振器法により、1GHz条件または10GHz条件で測定した。空洞共振器法による測定は、1GHz条件と10GHz条件とで、略同様の結果となった。比誘電率(Dk)および誘電正接(Df)の測定試料として、硬化物および1枚のプリプレグ(2116E-glass、樹脂含侵率40±10%、厚み0.1±20%)の両面に、金属箔として銅を用いた銅張積層板(CCL)を製造した。プリプレグを加熱硬化させて一体化させる際の熱プレスの条件は、加熱温度230℃、圧力20kg/cm2、加熱加圧時間120分間とした。 [Dielectric constant (Dk), dielectric loss tangent (Df)]
Immediately after production and 24 hours after production, measurement was performed under 1 GHz or 10 GHz conditions by the cavity resonator method. The measurement by the cavity resonator method gave substantially the same results under the 1 GHz condition and the 10 GHz condition. As samples for measuring relative dielectric constant (Dk) and dielectric loss tangent (Df), A copper clad laminate (CCL) was manufactured using copper as the metal foil. The conditions of the hot press for heating and curing the prepreg for integration were a heating temperature of 230° C., a pressure of 20 kg/cm 2 , and a heating and pressurizing time of 120 minutes.
実施例43~67および比較例5~7は、CCLから銅箔を除去し、金型を用いてx:y:z=80mm×20mm×0.1mmに切り出し、切り出した部材の端部をサンドペーパー等を用いてバリを除去し平滑にしたものを測定対象物とした。切り出した部材の長手方向をxとし、短手方向をyとし、厚み方向をzとした。x方向に20mmの間隔をあけて、y及びz方向の寸法を三か所で測定し、その平均値を算出し、小数点以下3桁までの値をyおよびz方向における測定対象物の寸法とした。 For Examples 1 to 42 and Comparative Examples 1 to 4, relative permittivity (Dk) and dielectric loss tangent (Df) were measured as cured products.
In Examples 43-67 and Comparative Examples 5-7, the copper foil was removed from the CCL, cut into x: y: z = 80 mm × 20 mm × 0.1 mm using a mold, and the ends of the cut out members were sanded. An object to be measured was made smooth by removing burrs using paper or the like. The longitudinal direction of the cut member was x, the lateral direction was y, and the thickness direction was z. Measure the dimensions in the y and z directions at three locations with an interval of 20 mm in the x direction, calculate the average value, and use the values to three decimal places as the dimensions of the object to be measured in the y and z directions. did.
実施例66、67および比較例6の硬化物を幅(縦)60mm×長さ(横)60mm×高さ1.2mmにし、四辺を整面したものを用いて、85℃、湿度85%の条件下において、48時間保存する前後において重量を測定し、高温高湿度条件下における吸水率(%)を評価した。 [Water absorption]
The cured products of Examples 66, 67 and Comparative Example 6 were 60 mm in width (vertical) × 60 mm in length (horizontal) × 1.2 mm in height, and the four sides were smoothed. Under the conditions, the weight was measured before and after storage for 48 hours, and the water absorption rate (%) under high temperature and high humidity conditions was evaluated.
樹脂組成物を150-200℃になるように加熱し、その状態で3~5分間の撹拌をした後、室温条件下で十分に冷却した状態における、樹脂の状態を以下の基準により評価した。
〇:樹脂が粉体または固形物となり、容易に回収できる。
×:樹脂が粘性固体形状となり、回収が困難である。 [State of B stage (solidification)]
The resin composition was heated to 150 to 200° C., stirred for 3 to 5 minutes in that state, and then sufficiently cooled under room temperature conditions, and the state of the resin was evaluated according to the following criteria.
◯: The resin becomes powder or solid and can be easily recovered.
x: The resin becomes a viscous solid and is difficult to recover.
(A)ポリマレイミド化合物
・BMI-TMH(製品名、大和化成工業(株)製、1,6-ビスマレイミド-(2,2,4-トリメチル)ヘキサン、融点73~110℃)
・BMI-4000(製品名、大和化成工業(株)製、ビスフェノールAジフェニルエーテルビスマレイミド、融点134~163℃)
・BMI-2300(製品名、大和化成工業(株)製、ポリフェニルメタンポリマレイミド、融点70~145℃) 2. Raw material (A) Polymaleimide compound BMI-TMH (product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., 1,6-bismaleimide-(2,2,4-trimethyl)hexane, melting point 73 to 110°C)
・ BMI-4000 (product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., bisphenol A diphenyl ether bismaleimide, melting point 134 to 163 ° C.)
・BMI-2300 (product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., polyphenylmethane polymaleimide, melting point 70 to 145 ° C.)
・G-90(製品名、日塗化学(株)製、常温で固体、軟化点90℃、重量平均分子量770)
(C)アミン化合物
・BAPP(製品名、セイカ(株)製、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン)
・ビスアニリンM(三井化学ファイン(株)製)
・カヤボンド C-200S(製品名、日本化薬(株)製、4,4’-メチレンビス(2,6-ジメチルアミン))
・ODA(製品名、セイカ(株)製、4,4’-ジアミノジフェニルエーテル)
・BAPB(製品名、セイカ(株)製、4,4’-ビス(4-アミノフェノキシ)ビフェニル)
・APB-N(1,3-ビス(3-アミノフェノキシ)ベンゼン)
・BAN(製品名、日本化薬(株)製) (B) coumarone resin G-90 (product name, manufactured by Nikko Chemical Co., Ltd., solid at room temperature, softening point 90°C, weight average molecular weight 770)
(C) Amine compound BAPP (product name, manufactured by Seika Co., Ltd., 2,2-bis[4-(4-aminophenoxy)phenyl]propane)
・ Bisaniline M (manufactured by Mitsui Chemicals Fine Co., Ltd.)
・ Kayabond C-200S (product name, manufactured by Nippon Kayaku Co., Ltd., 4,4'-methylenebis (2,6-dimethylamine))
・ ODA (product name, manufactured by Seika Co., Ltd., 4,4′-diaminodiphenyl ether)
・BAPB (product name, manufactured by Seika Co., Ltd., 4,4′-bis(4-aminophenoxy)biphenyl)
・APB-N (1,3-bis(3-aminophenoxy)benzene)
・BAN (product name, manufactured by Nippon Kayaku Co., Ltd.)
・BZO:(P-d型)ベンゾオキサジン(四国化成(株)製) (D) benzoxazine compound BZO: (Pd type) benzoxazine (manufactured by Shikoku Kasei Co., Ltd.)
・トリアジン(製品名、三菱ガス化学(株)製、CAS No.1156-51-0、ビスフェノールA型シアネートエステルのモノマー、2,2-ビス(4-シアナトフェニル)プロパン)
(F)エポキシ樹脂
・ESN-475V(製品名、新日鉄住金化学(株)製、α-ナフトールアラルキル型エポキシ樹脂) (E) Bisphenol A type cyanate ester/triazine (product name, manufactured by Mitsubishi Gas Chemical Co., Ltd., CAS No. 1156-51-0, bisphenol A type cyanate ester monomer, 2,2-bis(4-cyanatophenyl )propane)
(F) Epoxy resin ESN-475V (product name, manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., α-naphthol aralkyl epoxy resin)
・タイク(製品名、三菱ケミカル(株)製、CAS No.1025-15-6) (H) triallyl isocyanurate Tyke (product name, manufactured by Mitsubishi Chemical Corporation, CAS No. 1025-15-6)
・BPADA:4,4’-(4,4’-イソプロピリデンジフェノキシ)ジフタル酸二無水物
・6FDA:4,4’-(ヘキサフルオロイソプロピリデン)ジフタルテトラカルボン酸二無水物
・SFDA:スピロ[フルオレン-9,9’-キサンテン]-2’,3’,6’,7’-テトラカルボン酸二無水物
・6FBPADA:5,5’-(((パーフルオロプロパン-2,2-ジイル)ビス(4,1-フェニレン))ビス(オキシ))ビス(イソベンゾフラン-1,3-ジオン)
・BzDA:エネハイド(商標、ENEOS製)
・TAHQ:ビス(1,3-ジオキソ-1,3-ジヒドロイソベンゾフラン-5-カルボン酸)1,4-フェニレン(CAS No.2770-49-2) (I) Tetracarboxylic dianhydride BPADA: 4,4'-(4,4'-isopropylidenediphenoxy) diphthalic dianhydride 6FDA: 4,4'-(hexafluoroisopropylidene) diphthaltetra Carboxylic dianhydride SFDA: Spiro[fluorene-9,9'-xanthene]-2',3',6',7'-tetracarboxylic dianhydride 6FBPADA: 5,5'-(((Per Fluoropropane-2,2-diyl)bis(4,1-phenylene))bis(oxy))bis(isobenzofuran-1,3-dione)
・BzDA: Enehyde (trademark, manufactured by ENEOS)
・TAHQ: Bis(1,3-dioxo-1,3-dihydroisobenzofuran-5-carboxylic acid) 1,4-phenylene (CAS No. 2770-49-2)
・SC2500-SXJ:(製品名、(株)アドマテックス製、シリカ粒子) (other ingredients: filler)
・ SC2500-SXJ: (product name, manufactured by Admatechs Co., Ltd., silica particles)
2軸混合(混練)機を用いて、表1~8に示す割合(質量部)の樹脂混合物を溶融混合(溶融混練)して樹脂組成物を製造した。溶融混合工程は2軸混混合機の樹脂組成物の出口における樹脂組成物温度が170℃±10℃となる条件で行った。 (Example, Comparative Example)
Using a twin-screw mixer (kneader), a resin composition was produced by melt-mixing (melt-kneading) resin mixtures in proportions (parts by mass) shown in Tables 1 to 8. The melt-mixing process was carried out under the condition that the temperature of the resin composition at the exit of the twin-screw mixer was 170°C ± 10°C.
表2に示すように、樹脂混合物が樹脂成分100質量部中に、(H)トリアリルイソシアヌレートを16~23質量部含有することにより、耐熱性および低誘電特性に優れるという硬化物の特長を維持しつつ、低沸点溶剤に溶解する樹脂組成物とすることができた。
As shown in Table 2, when the resin mixture contains 16 to 23 parts by mass of (H) triallyl isocyanurate in 100 parts by mass of the resin component, the cured product has excellent heat resistance and low dielectric properties. It was possible to obtain a resin composition that is soluble in a low-boiling-point solvent while maintaining the
表4および表5に示すように、樹脂混合物の樹脂成分100質量部中に8~20質量部の(C)アミン化合物および15~30質量部の(I)カルボン酸二無水物を配合することにより、Bステージにおいて固体となる、取り扱い性に優れた樹脂組成物となることが分かった。なお、低沸点溶剤への溶解性の高い樹脂組成物とする観点から、(C)アミン化合物は、APB-N、BAN、およびBAPPからなる群から選ばれる一または複数が好ましく、(I)カルボン酸二無水物は、BPDA、6FDAおよびSFDAからなる群から選ばれる一または複数が好ましい。
As shown in Tables 4 and 5, 8 to 20 parts by mass of (C) amine compound and 15 to 30 parts by mass of (I) carboxylic acid dianhydride are blended in 100 parts by mass of the resin component of the resin mixture. It was found that the resin composition becomes solid in the B stage and has excellent handleability. From the viewpoint of obtaining a resin composition highly soluble in a low boiling point solvent, (C) the amine compound is preferably one or more selected from the group consisting of APB-N, BAN, and BAPP, and (I) carboxylic Acid dianhydride is preferably one or more selected from the group consisting of BPDA, 6FDA and SFDA.
樹脂混合物の樹脂成分100質量部中に、(A)~(C)の成分を含有する樹脂混合物を溶融して得られた樹脂組成物を用いたプリプレグにより、低誘電特性を備えた硬化物を製造することができた。
(C)アミン化合物として式(4)により表されるビスアニリンを用いることにより、プリプレグとしての取り扱い性が良好な樹脂組成物が得られた。
(A)ポリマレイミド化合物としてBMI-TMHおよびBMI-4000を含有し、(C)アミン化合物としてBAPPを含有する樹脂混合物を溶融して得られた樹脂組成物は、耐熱性(Tg(DSC))および低誘電特性(Df(24時間後))が良好であった。 From the results shown in Table 6, the following can be said.
A cured product with low dielectric properties is produced from a prepreg using a resin composition obtained by melting a resin mixture containing components (A) to (C) in 100 parts by mass of the resin component of the resin mixture. could be manufactured.
By using the bisaniline represented by the formula (4) as the (C) amine compound, a resin composition having good handleability as a prepreg was obtained.
A resin composition obtained by melting a resin mixture containing (A) BMI-TMH and BMI-4000 as polymaleimide compounds and (C) BAPP as an amine compound has heat resistance (Tg (DSC)). and low dielectric properties (Df (after 24 hours)) were good.
BMI-TMHとBMI-4000との含有量の質量比を、3.0:7.0~7.0:3.0とすることにより、CTEの低い硬化物が得られた。
樹脂混合物100質量部中におけるG-90の含有量を12質量部以下とすることにより、硬化物の耐熱性(Tg)を高くすることができた。
トリアジンの含有量にかかわらず耐熱性に優れる硬化物が得られた。樹脂混合物がトリアジンを含有することで樹脂混合物の粘度(硬さ)が増し取り扱い性が向上した。
低誘電特性に優れる硬化物とする観点から、樹脂混合物100質量部中におけるトリアジンの含有量は、2.0質量部以下が好ましく、1.0質量部以下がより好ましいといえる。
エポキシの含有量に関わらず、耐熱性および低誘電特性に優れた硬化物が得られた。
フィラーとしてSC2500-SXJを分散させた実施例67により、最も優れた低誘電特性を実現することができた。これは、凝集による分子結合がフィラーにより阻害されて解消された結果として、高密な分子結合が得られたことによるものと推測できる。
ビスマレイミドとして、BMI-TMHとBMI-4000とを用いることにより、BMI-2300を用いた比較例5よりも吸水率が小さい硬化物が得られた。本発明の樹脂組成物を硬化させた硬化物は、熱プレスにより硬化させた後における吸水率が小さいため、製造直後における優れた低誘電特性を製造後において安定的に維持することができる。 From the results shown in Tables 7 and 8, the following can be said.
A cured product with a low CTE was obtained by setting the mass ratio of the contents of BMI-TMH and BMI-4000 to 3.0:7.0 to 7.0:3.0.
By setting the content of G-90 to 12 parts by mass or less in 100 parts by mass of the resin mixture, it was possible to increase the heat resistance (Tg) of the cured product.
A cured product having excellent heat resistance was obtained regardless of the triazine content. Since the resin mixture contained triazine, the viscosity (hardness) of the resin mixture was increased and the handleability was improved.
From the viewpoint of obtaining a cured product with excellent low dielectric properties, the triazine content in 100 parts by mass of the resin mixture is preferably 2.0 parts by mass or less, and more preferably 1.0 parts by mass or less.
Cured products with excellent heat resistance and low dielectric properties were obtained regardless of the epoxy content.
Example 67, in which SC2500-SXJ was dispersed as a filler, could achieve the best low dielectric properties. This is presumed to be due to the fact that dense molecular bonding was obtained as a result of the filler inhibiting and eliminating the molecular bonding due to aggregation.
By using BMI-TMH and BMI-4000 as bismaleimides, a cured product having a lower water absorption than Comparative Example 5 using BMI-2300 was obtained. Since the cured product obtained by curing the resin composition of the present invention has a low water absorption after curing by hot pressing, it is possible to stably maintain excellent low dielectric properties immediately after production.
実施例67の樹脂組成物について、溶剤溶解性の観点から最適な製造条件を検討した。
図1に合成時間を2.5分間とした樹脂組成物のGPCの結果を示す。
表9に合成時間が樹脂組成物の特性に及ぼす影響を示す。
[合成条件]
樹脂温度170℃±10℃
[ゲルタイム]
171℃熱板における硬化時間を測定
[ピーク面積]
GPC(ゲル浸透クロマトグラフィー)測定により、分子量4500~4800の成分の検出の有無および、検出された場合、全ピーク面積における分子量4500~4800の成分のピーク面積の割合(%)を求めた。
[重量平均分子量]
GPC測定により、樹脂組成物の重量平均分子量を求めた。
溶剤溶解性は、以下の基準を用いて評価した。
測定試料(樹脂組成物)60質量部とメチルエチルケトン(溶剤)40質量部とを50℃以下の条件下で混合し、所定時間、超音波振動を加えた後における溶解状態を以下の基準を用いて目視により評価した。
〔MEK溶解性(168時間)〕
上述した溶剤溶解性(MEK溶解性)の方法で樹脂のMEK溶液を調製し、所定時間放置した後における測定試料の状態を、以下の基準を用いて目視により評価した。
〇:室温条件下で168時間放置した時点において樹脂の析出なし。
×:室温条件下で168時間放置した時点において樹脂の析出あり。 [Examination of manufacturing conditions]
For the resin composition of Example 67, optimal production conditions were examined from the viewpoint of solvent solubility.
FIG. 1 shows the results of GPC of the resin composition with a synthesis time of 2.5 minutes.
Table 9 shows the effect of synthesis time on the properties of the resin composition.
[Synthesis conditions]
Resin temperature 170℃±10℃
[gel time]
Measurement of curing time on a hot plate at 171°C [peak area]
By GPC (gel permeation chromatography) measurement, the presence or absence of detection of a component with a molecular weight of 4500 to 4800 and, if detected, the ratio (%) of the peak area of the component with a molecular weight of 4500 to 4800 in the total peak area was determined.
[Weight average molecular weight]
The weight average molecular weight of the resin composition was determined by GPC measurement.
Solvent solubility was evaluated using the following criteria.
60 parts by mass of a measurement sample (resin composition) and 40 parts by mass of methyl ethyl ketone (solvent) are mixed under conditions of 50° C. or less, and the dissolved state after applying ultrasonic vibration for a predetermined time is measured using the following criteria. It was evaluated visually.
[MEK solubility (168 hours)]
An MEK solution of the resin was prepared by the method of solvent solubility (MEK solubility) described above, and the state of the measurement sample after standing for a predetermined time was visually evaluated using the following criteria.
◯: No precipitation of resin after standing at room temperature for 168 hours.
x: Precipitation of resin after standing for 168 hours at room temperature.
合成時間すなわち樹脂混合物を溶融混合する時間を長くすることにより、反応が進行し、ゲルタイムが短くなった。
合成時間の違いにより、長時間放置した場合のMEK溶解性に差が生じた。合成時間を2.5分間以上とすることでMEK溶解性が良好な樹脂組成物が得られた。
合成時間の違いにより、GPC測定による分子量4500~4800の成分のピーク面積および重量平均分子量に差が生じたことから、これらは、MEK溶解性が良好な樹脂組成物を製造するための合成時間の指標となるといえる。
図1のグラフにおける1を付したピークに対応する分子量4500~4800の成分の割合を全体の10~20%とすることで、MEK溶解性の良好な樹脂組成物が得られた。
重量平均分子量を1100~2500とすることで、MEK溶解性が良好な樹脂組成物が得られた。 From the results shown in Table 9, the following can be said.
By lengthening the synthesis time, that is, the time for melt-mixing the resin mixture, the reaction progressed and the gel time was shortened.
The difference in synthesis time caused a difference in MEK solubility when left standing for a long time. A resin composition having good MEK solubility was obtained by setting the synthesis time to 2.5 minutes or longer.
Differences in synthesis time caused differences in the peak areas and weight average molecular weights of components with molecular weights of 4500 to 4800 measured by GPC. It can be said that it serves as an index.
A resin composition with good MEK solubility was obtained by setting the ratio of the component having a molecular weight of 4500 to 4800 corresponding to the peak marked with 1 in the graph of FIG. 1 to 10 to 20% of the total.
By setting the weight average molecular weight to 1100 to 2500, a resin composition having good MEK solubility was obtained.
合成時間を2.5分間とした実施例67の樹脂組成物(ピーク面積12.3%、Mw=1257)について、MEK以外の他の溶剤に対する溶解性を評価した。その結果、PGM(プロピレングリコールモノメチルエーテル)、PGM-Ac(プロピレングリコールモノメチルエーテルアセテート)、DMAc(ジメチルアセトアミド)、NMP(N-メチルピロリドン)、γ―ブチロラクトン、エチルアセテート、アセトン、トルエン、THF(テトラヒドロフラン)、シクロヘキサノン、DMF(ジメチルホルムアミド)、メトキシベンゼン(アニソール)、2-(2-ブトキシエトキシ)エタノール(知エチレングリコールモノエチルエーテル)および2-(2-エトキシエトキシ)エチルアセテート(エチルカルビトールアセテート)について、100分間超音波振動を加えた時点で褐色透明の液体であり、溶け残り、分離、濁りが無く、溶解性が良好であった。 [Solvent solubility]
The solubility in solvents other than MEK was evaluated for the resin composition of Example 67 (peak area: 12.3%, Mw = 1257) with a synthesis time of 2.5 minutes. As a result, PGM (propylene glycol monomethyl ether), PGM-Ac (propylene glycol monomethyl ether acetate), DMAc (dimethylacetamide), NMP (N-methylpyrrolidone), γ-butyrolactone, ethyl acetate, acetone, toluene, THF (tetrahydrofuran) ), cyclohexanone, DMF (dimethylformamide), methoxybenzene (anisole), 2-(2-butoxyethoxy)ethanol (ethylene glycol monoethyl ether) and 2-(2-ethoxyethoxy)ethyl acetate (ethyl carbitol acetate) When ultrasonic vibration was applied for 100 minutes, it was a brown transparent liquid with no undissolved residue, separation, or turbidity, and had good solubility.
Claims (20)
- (A)ビスマレイミド化合物を含む樹脂混合物を溶融して得られた樹脂組成物であって、
前記(A)ビスマレイミド化合物が、
式(1)により表される脂肪族ビスマレイミド化合物と、
式(2)により表される芳香族ビスマレイミド化合物と、を含むことを特徴とする、
樹脂組成物。
The (A) bismaleimide compound is
an aliphatic bismaleimide compound represented by formula (1);
and an aromatic bismaleimide compound represented by formula (2),
Resin composition.
- 前記脂肪族ビスマレイミド化合物が、1,6-ビスマレイミド(2,2,4-トリメチル)ヘキサンであり、
前記芳香族ビスマレイミド化合物が、ビスフェノールAジフェニルエーテルビスマレイミドである、
請求項1に記載の樹脂組成物。 the aliphatic bismaleimide compound is 1,6-bismaleimide(2,2,4-trimethyl)hexane,
The aromatic bismaleimide compound is bisphenol A diphenyl ether bismaleimide,
The resin composition according to claim 1. - 前記樹脂混合物における、前記脂肪族ビスマレイミド化合物の含有量と、前記芳香族ビスマレイミド化合物の含有量との質量比、前記脂肪族ビスマレイミド化合物:前記芳香族ビスマレイミド化合物が25:55~45:35である、
請求項3に記載の樹脂組成物。 The mass ratio of the content of the aliphatic bismaleimide compound to the content of the aromatic bismaleimide compound in the resin mixture, the aliphatic bismaleimide compound: the aromatic bismaleimide compound being 25:55 to 45: is 35;
The resin composition according to claim 3. - 前記樹脂混合物は、(H)トリアリルイソシアヌレートをさらに含有しており、
樹脂成分100質量部中における、前記(H)トリアリルイソシアヌレートの含有量が16~23質量部である、
請求項4に記載の樹脂組成物。 The resin mixture further contains (H) triallyl isocyanurate,
The content of the (H) triallyl isocyanurate in 100 parts by mass of the resin component is 16 to 23 parts by mass.
The resin composition according to claim 4. - 前記樹脂混合物は、(C)アミン化合物および(I)カルボン酸二無水物を、さらに含有しており、
樹脂成分100質量部中における、前記(C)アミン化合物の含有量が10~20質量部であり、
樹脂成分100質量部中における、前記(I)カルボン酸二無水物の含有量が15~30質量部である、
請求項5に記載の樹脂組成物。 The resin mixture further contains (C) an amine compound and (I) a carboxylic acid dianhydride,
The content of the (C) amine compound in 100 parts by mass of the resin component is 10 to 20 parts by mass,
In 100 parts by mass of the resin component, the content of the (I) carboxylic acid dianhydride is 15 to 30 parts by mass.
The resin composition according to claim 5. - 前記樹脂混合物は、(B)クマロン樹脂および(C)アミン化合物を、さらに含有しており、
前記樹脂混合物の樹脂成分100質量部中における、
前記(A)ビスマレイミド化合物の含有量が30~65質量部であり、
前記(B)クマロン樹脂の含有量が5~25質量部であり、
前記(C)アミン化合物の含有量が1~30質量部である、
請求項1に記載の樹脂組成物。 The resin mixture further contains (B) a coumarone resin and (C) an amine compound,
In 100 parts by mass of the resin component of the resin mixture,
The content of the (A) bismaleimide compound is 30 to 65 parts by mass,
The content of the (B) coumarone resin is 5 to 25 parts by mass,
The content of the (C) amine compound is 1 to 30 parts by mass,
The resin composition according to claim 1. - 前記脂肪族ビスマレイミド化合物の含有量と、前記芳香族ビスマレイミド化合物の含有量との質量比、前記脂肪族ビスマレイミド化合物:前記芳香族ビスマレイミド化合物が3.0:7.0~7.0:3.0である、
請求項7に記載の樹脂組成物。 The mass ratio of the content of the aliphatic bismaleimide compound to the content of the aromatic bismaleimide compound, the aliphatic bismaleimide compound: the aromatic bismaleimide compound is 3.0:7.0 to 7.0. : is 3.0;
The resin composition according to claim 7. - 前記(C)アミン化合物が、ビスアニリンである、
請求項7に記載の樹脂組成物。 The (C) amine compound is bisaniline,
The resin composition according to claim 7. - 前記(C)アミン化合物が、式(4)により表されるビスアニリンである、
請求項7に記載の樹脂組成物。
The resin composition according to claim 7.
- (C)アミン化合物が、ビスアニリンM、4,4’-[ジメチルメチレンビス(4,1-フェニレンオキシ)]ビスアニリンまたは(4,4’-[ビフェニル-4,4’-ジイルビス(オキシ)]ビスアニリン)である、
請求項7に記載の樹脂組成物。 (C) the amine compound is bisaniline M, 4,4′-[dimethylmethylenebis(4,1-phenyleneoxy)]bisaniline or (4,4′-[biphenyl-4,4′-diylbis(oxy)]bisaniline ) is
The resin composition according to claim 7. - 前記樹脂混合物が、さらに(D)ベンゾオキサジンを含有しており、
前記樹脂混合物100質量部における、前記(D)ベンゾオキサジンの含有量が5~20質量部である、
請求項7に記載の樹脂組成物。 The resin mixture further contains (D) benzoxazine,
The content of the (D) benzoxazine in 100 parts by mass of the resin mixture is 5 to 20 parts by mass.
The resin composition according to claim 7. - 前記樹脂混合物が、さらに(E)ビスフェノールA型シアネートエステルを含有しており、
前記樹脂混合物100質量部における、(E)ビスフェノールA型シアネートエステルの含有量が0.5~2質量部である、
請求項12に記載の樹脂組成物。 The resin mixture further contains (E) a bisphenol A cyanate ester,
The content of (E) bisphenol A-type cyanate ester in 100 parts by mass of the resin mixture is 0.5 to 2 parts by mass,
The resin composition according to claim 12. - 前記樹脂混合物が、さらに(F)エポキシを含有しており、
前記樹脂混合物100質量部における、(F)前記エポキシの含有量が1~9質量部である、
請求項13に記載の樹脂組成物。 The resin mixture further contains (F) epoxy,
In 100 parts by mass of the resin mixture, the content of (F) the epoxy is 1 to 9 parts by mass.
The resin composition according to claim 13. - 重量平均分子量が1000~2500であり、
分子量4500~4800の成分を有しており、前記成分の割合が10~20%である、
請求項7に記載の樹脂組成物。 A weight average molecular weight of 1000 to 2500,
It has a component with a molecular weight of 4500 to 4800, and the proportion of the component is 10 to 20%.
The resin composition according to claim 7. - プリント配線基板用である請求項1に記載の樹脂組成物。 The resin composition according to claim 1, which is for printed wiring boards.
- 請求項5に記載の樹脂組成物を、沸点が120℃以下かつ誘電率が10~30の溶剤に溶解させたワニス。 A varnish obtained by dissolving the resin composition according to claim 5 in a solvent having a boiling point of 120°C or less and a dielectric constant of 10 to 30.
- 請求項1に記載の樹脂組成物を用いて製造された積層板。 A laminate manufactured using the resin composition according to claim 1.
- 請求項1に記載の樹脂組成物を用いて製造されたプリント配線基板。 A printed wiring board manufactured using the resin composition according to claim 1.
- 請求項1に記載の樹脂組成物を硬化させてなる成形品。 A molded article obtained by curing the resin composition according to claim 1.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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KR1020237040786A KR20240026127A (en) | 2021-06-29 | 2022-03-29 | Resin compositions, varnishes, laminates, printed wiring boards and molded products |
JP2023531448A JPWO2023276379A1 (en) | 2021-06-29 | 2022-03-29 | |
CN202280042315.5A CN117500880A (en) | 2021-06-29 | 2022-03-29 | Resin composition, varnish, laminated plate, printed wiring board and molded article |
TW111116145A TW202319481A (en) | 2021-06-29 | 2022-04-28 | Resin composition, varnish, laminated plate, printed wiring board, and molded product |
Applications Claiming Priority (2)
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JP2021107813 | 2021-06-29 | ||
JP2021-107813 | 2021-06-29 |
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WO2023276379A1 true WO2023276379A1 (en) | 2023-01-05 |
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PCT/JP2022/015425 WO2023276379A1 (en) | 2021-06-29 | 2022-03-29 | Resin composition, varnish, laminated plate, printed wiring board, and molded product |
Country Status (5)
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JP (1) | JPWO2023276379A1 (en) |
KR (1) | KR20240026127A (en) |
CN (1) | CN117500880A (en) |
TW (1) | TW202319481A (en) |
WO (1) | WO2023276379A1 (en) |
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2022
- 2022-03-29 CN CN202280042315.5A patent/CN117500880A/en active Pending
- 2022-03-29 WO PCT/JP2022/015425 patent/WO2023276379A1/en active Application Filing
- 2022-03-29 JP JP2023531448A patent/JPWO2023276379A1/ja active Pending
- 2022-03-29 KR KR1020237040786A patent/KR20240026127A/en unknown
- 2022-04-28 TW TW111116145A patent/TW202319481A/en unknown
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Also Published As
Publication number | Publication date |
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KR20240026127A (en) | 2024-02-27 |
CN117500880A (en) | 2024-02-02 |
JPWO2023276379A1 (en) | 2023-01-05 |
TW202319481A (en) | 2023-05-16 |
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