JP6946578B2 - Resin composition and its manufacturing method - Google Patents

Resin composition and its manufacturing method Download PDF

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JP6946578B2
JP6946578B2 JP2020570347A JP2020570347A JP6946578B2 JP 6946578 B2 JP6946578 B2 JP 6946578B2 JP 2020570347 A JP2020570347 A JP 2020570347A JP 2020570347 A JP2020570347 A JP 2020570347A JP 6946578 B2 JP6946578 B2 JP 6946578B2
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川崎 達也
達也 川崎
重信 菊地
重信 菊地
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/281Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50Amines
    • C08G59/5046Amines heterocyclic
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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    • C08K5/00Use of organic ingredients
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    • C08L45/00Compositions of homopolymers or copolymers of compounds having no unsaturated aliphatic radicals in side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic or in a heterocyclic ring system; Compositions of derivatives of such polymers
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    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
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Description

本発明は、電子・電気部品において、高耐熱性および低誘電特性(低比誘電率、低誘電正接)を備えた、積層板、プリント配線基板、接着剤、封止剤、塗料および成形品などとして用いられる樹脂組成物およびその製造方法に関する。 The present invention relates to electronic and electrical components such as laminated boards, printed wiring boards, adhesives, sealants, paints and molded products having high heat resistance and low dielectric properties (low relative permittivity, low dielectric loss tangent). The present invention relates to a resin composition used as a material and a method for producing the same.

従来、電子材料分野における耐熱樹脂として、エポキシ樹脂、ポリイミド樹脂、不飽和ポリエステル樹脂、フェノール樹脂などの熱硬化性樹脂が用いられている。これら熱硬化性樹脂は、その用途ならび特性によって使い分けられている。この中でも特にポリイミド樹脂は、耐熱性及び耐湿熱性(吸湿後の耐熱性)に優れていることから、高い耐熱性を要する用途に広く使用されている。また、エポキシ樹脂や芳香族ジアミンなどの他の樹脂とポリイミド樹脂との組み合わせによって性能が改良された変性ポリイミド樹脂も使用されている。 Conventionally, thermosetting resins such as epoxy resins, polyimide resins, unsaturated polyester resins, and phenol resins have been used as heat-resistant resins in the field of electronic materials. These thermosetting resins are used properly according to their uses and characteristics. Among these, polyimide resin is widely used in applications requiring high heat resistance because it is excellent in heat resistance and moisture heat resistance (heat resistance after moisture absorption). Further, a modified polyimide resin whose performance has been improved by combining a polyimide resin with another resin such as an epoxy resin or an aromatic diamine is also used.

近年、半導体基板分野では、基板上へ半導体チップを直接実装する実装方法が普及してきている。このため、半導体に使用される材料には、実装工程における高温処理などに耐えられる高い耐熱性が要求される。エポキシ樹脂は半導体材料として汎用的に使用されており、耐熱性向上の要求に対応するための検討がなされ、耐熱性に優れた樹脂が提案されている。例えば、特許文献1には、ポリマレイミド化合物、フェノール樹脂、ビスフェノールA型エポキシ樹脂および他のエポキシ樹脂を溶融させた変性ポリイミド樹脂組成物が記載されている。 In recent years, in the field of semiconductor substrates, a mounting method in which a semiconductor chip is directly mounted on a substrate has become widespread. Therefore, the materials used for semiconductors are required to have high heat resistance that can withstand high temperature treatment in the mounting process. Epoxy resins are widely used as semiconductor materials, and studies have been made to meet the demand for improved heat resistance, and resins with excellent heat resistance have been proposed. For example, Patent Document 1 describes a modified polyimide resin composition obtained by melting a polymaleimide compound, a phenol resin, a bisphenol A type epoxy resin, and another epoxy resin.

特開2017−101152号公報JP-A-2017-101152

特許文献1に記載の変性ポリイミド樹脂組成物は、高耐熱性という特長を備えているものの、用途によっては、低誘電特性が十分ではない場合があった。そこで、本発明は、高耐熱性および低誘電特性を備えた樹脂組成物を提供することを目的としている。 Although the modified polyimide resin composition described in Patent Document 1 has a feature of high heat resistance, the low dielectric property may not be sufficient depending on the application. Therefore, an object of the present invention is to provide a resin composition having high heat resistance and low dielectric properties.

[1](A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られたプリント配線基板用の樹脂組成物であって、前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部であり、前記(D)クマロン樹脂は、軟化点が100℃以下であり、重量平均分子量が850以下である、樹脂組成物。 [1] A resin composition for a printed wiring substrate obtained by melting a resin mixture containing (A) a polymaleimide compound, (B) benzoxazine, (C) an epoxy resin, and (D) a kumaron resin. Te, the resin component 100 parts by weight of the resin mixture, wherein (a) the content of the polymaleimide compound is 40 to 70 parts by mass der is, the (D) coumarone resin, softening point be 100 ° C. or less , weight average molecular weight of Ru der 850 or less, the resin composition.

[2]前記樹脂混合物の樹脂成分100質量部中における、前記(D)クマロン樹脂の含有量が1〜5質量部である、[1]に記載の樹脂組成物。 [2] The resin composition according to [1], wherein the content of the (D) kumaron resin in 100 parts by mass of the resin component of the resin mixture is 1 to 5 parts by mass.

[3]前記樹脂混合物が、さらに(E)ビスフェノールA型シアネートエステルを含有しており、前記樹脂混合物の樹脂成分100質量部中における、前記(E)ビスフェノールA型シアネートエステルの含有量が3〜7質量部である、[2]に記載の樹脂組成物。 [3] The resin mixture further contains (E) bisphenol A type cyanate ester, and the content of the (E) bisphenol A type cyanate ester in 100 parts by mass of the resin component of the resin mixture is 3 to 3. The resin composition according to [2] , which is 7 parts by mass.

[4]前記(A)ポリマレイミド化合物が式(1)により表される、[1]に記載の樹脂組成物。

Figure 0006946578

(前記式(1)において、n1は0以上10以下の整数であり、X1はそれぞれ独立に炭素数1以上10以下のアルキレン基、下記式(2)で表される基、「−SO2−」で表される基、「−CO−」で表される基、酸素原子または単結合であり、R1はそれぞれ独立に炭素数1以上6以下の炭化水素基であり、aはそれぞれ独立に0以上4以下の整数であり、bはそれぞれ独立に0以上3以下の整数であり、繰り返し単位の数n1の平均値が0.01以上5以下である。)
Figure 0006946578
(前記式(2)において、Yは芳香族環を有する炭素数6以上30以下の炭化水素基であり、n2は1〜3の整数である。) [4] The resin composition according to [1], wherein the (A) polymaleimide compound is represented by the formula (1).
Figure 0006946578

(In the above formula (1), n 1 is an integer of 0 or more and 10 or less, and X 1 is an alkylene group having 1 or more and 10 or less carbon atoms independently, a group represented by the following formula (2), "-SO". A group represented by "2- ", a group represented by "-CO-", an oxygen atom or a single bond, R 1 is an independently hydrocarbon group having 1 or more carbon atoms and 6 or less carbon atoms, and a is each. Independently, it is an integer of 0 or more and 4 or less, b is an integer of 0 or more and 3 or less independently, and the average value of the number n 1 of the repeating units is 0.01 or more and 5 or less.)
Figure 0006946578
(In the above formula (2), Y is a hydrocarbon group having an aromatic ring and having 6 to 30 carbon atoms, and n 2 is an integer of 1 to 3).

[5]前記樹脂混合物の樹脂成分100質量部における、前記(B)ベンゾオキサジンの含有量が10〜30質量部である、[1]に記載の樹脂組成物。
[6]前記(C)エポキシ樹脂が、α−ナフトール型エポキシ樹脂を含有しており、前記樹脂混合物の樹脂成分100質量部中における、前記α−ナフトール型エポキシ樹脂の含有量が10〜30質量部である、[1]に記載の樹脂組成物。
[5] The resin composition according to [1], wherein the content of (B) benzoxazine in 100 parts by mass of the resin component of the resin mixture is 10 to 30 parts by mass.
[6] The (C) epoxy resin contains an α-naphthol type epoxy resin, and the content of the α-naphthol type epoxy resin in 100 parts by mass of the resin component of the resin mixture is 10 to 30 mass by mass. The resin composition according to [1], which is a part.

[7]前記樹脂混合物中に含有される前記(A)ポリマレイミド化合物100質量部のうち、溶融混合工程後の樹脂組成物中に残マレイミド化合物として残存する前記(A)ポリマレイミド化合物が30〜60質量部となるように、各成分を溶融して得られた[1]〜[6]のいずれか一項に記載の樹脂組成物。 [7] Of the 100 parts by mass of the (A) polymaleimide compound contained in the resin mixture, 30 to the (A) polymaleimide compound remaining as a residual maleimide compound in the resin composition after the melt mixing step. The resin composition according to any one of [1] to [6] , which is obtained by melting each component so as to have 60 parts by mass.

[8](A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られた樹脂組成物であって、前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部であり、前記(D)クマロン樹脂は、軟化点が100℃以下であり、重量平均分子量が850以下である樹脂組成物を、沸点が120℃以下かつ誘電率が10〜30の溶剤に溶解させたワニス。
[9](A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られた樹脂組成物であって、前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部であり、前記(D)クマロン樹脂は、軟化点が100℃以下であり、重量平均分子量が850以下である樹脂組成物を用いて製造された積層板。
[10](A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られた樹脂組成物であって、前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部であり、前記(D)クマロン樹脂は、軟化点が100℃以下であり、重量平均分子量が850以下である樹脂組成物を用いて製造されたプリント配線基板。
[8] A resin composition obtained by melting a resin mixture containing (A) a polymaleimide compound, (B) benzoxazine, (C) an epoxy resin, and (D) a kumaron resin, wherein the resin mixture is obtained. in the resin component 100 parts by weight, the (a) content of the polymaleimide compound is 40 to 70 parts by mass der is, the (D) coumarone resin, a softening point is not more 100 ° C. or less, the weight average molecular weight 850 following der Ru resin composition having a boiling point of 120 ° C. or less and a dielectric constant was dissolved in 10 to 30 solvent varnish.
[9] A resin composition obtained by melting a resin mixture containing (A) polymaleimide compound, (B) benzoxazine, (C) epoxy resin, and (D) kumaron resin, which is the resin mixture. in the resin component 100 parts by weight, the (a) content of the polymaleimide compound is 40 to 70 parts by mass der is, the (D) coumarone resin, a softening point is not more 100 ° C. or less, the weight average molecular weight laminates manufactured using the 850 following der Ru resin composition.
[10] A resin composition obtained by melting a resin mixture containing (A) a polymaleimide compound, (B) benzoxazine, (C) an epoxy resin, and (D) a kumaron resin, wherein the resin mixture is obtained. in the resin component 100 parts by weight, the (a) content of the polymaleimide compound is 40 to 70 parts by mass der is, the (D) coumarone resin, a softening point is not more 100 ° C. or less, the weight average molecular weight printed circuit board manufactured by using a 850 or less der Ru resin composition.

(A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融することにより、高耐熱性および低誘電特性(低比誘電率、低誘電正接)を備えた硬化物となる樹脂組成物を提供することができる。 High heat resistance and low dielectric properties (low relative permittivity, low dielectric constant) by melting a resin mixture containing (A) polymaleimide compound, (B) benzoxazine, (C) epoxy resin, and (D) kumaron resin. It is possible to provide a resin composition which is a cured product having a dielectric loss tangent).

(樹脂組成物)
本発明の樹脂組成物は、(A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られた樹脂組成物であって、前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部である。以下、(A)〜(D)の各成分および含有してもよい他の成分について説明する。本発明では、各成分を溶融混合する以前のものを「樹脂混合物」といい、溶融混合した後に冷却したものを「樹脂組成物」という。
(Resin composition)
The resin composition of the present invention is a resin composition obtained by melting a resin mixture containing (A) a polymaleimide compound, (B) benzoxazine, (C) an epoxy resin, and (D) a kumaron resin. The content of the polymaleimide compound (A) in 100 parts by mass of the resin component of the resin mixture is 40 to 70 parts by mass. Hereinafter, each component (A) to (D) and other components that may be contained will be described. In the present invention, a mixture before melting and mixing of each component is referred to as a "resin mixture", and a mixture cooled after melting and mixing is referred to as a "resin composition".

(A)ポリマレイミド化合物
ポリマレイミド化合物は、マレイミド基を二つ以上有する化合物である。硬化物の高耐熱性および低誘電特性の観点から、芳香族環にマレイミド基が結合しているものが好ましい。このようなポリマレイミド化合物として、課題を解決するための手段の項に示した式(1)で表されるものが挙げられる。
(A) Polymaleimide Compound A polymaleimide compound is a compound having two or more maleimide groups. From the viewpoint of high heat resistance and low dielectric properties of the cured product, those in which a maleimide group is bonded to the aromatic ring are preferable. Examples of such a polymaleimide compound include those represented by the formula (1) shown in the section of means for solving the problem.

樹脂組成物の低沸点溶媒に対する溶解性を良好にする観点から、ポリマレイミド化合物は、式(1)における繰り返し単位の数nの平均値が、0.01以上5以下であるものが好ましい。すなわち、樹脂混合物は、式(1)においてカッコで囲まれた繰り返し単位(構造部位)を有するポリマレイミド化合物を、繰り返し単位の数nの平均値が0.01以上5以下となる割合で含有していることが好ましい。これにより、低沸点溶媒への溶解性が良好な樹脂組成物が得られる溶融温度の範囲を広くすることができる。本発明において、「nの平均値が0.01以上5以下のポリマレイミド化合物」とは、一種の化合物または二種以上の化合物の混合物からなるポリマレイミド化合物を意味する。From the viewpoint of improving the solubility of the resin composition in a low boiling point solvent, the polymaleimide compound preferably has an average value of the number n 1 of the repeating units in the formula (1) of 0.01 or more and 5 or less. That is, the resin mixture contains a polymaleimide compound having a repeating unit (structural site) enclosed in parentheses in the formula (1) at a ratio such that the average value of the number n 1 of the repeating units is 0.01 or more and 5 or less. It is preferable to do so. Thereby, the range of the melting temperature at which a resin composition having good solubility in a low boiling point solvent can be obtained can be widened. In the present invention, the " polymaleimide compound having an average value of n 1 of 0.01 or more and 5 or less" means a polymaleimide compound composed of one kind of compound or a mixture of two or more kinds of compounds.

式(1)における繰り返し単位の数nの平均値が0.01以上5以下である(A)ポリマレイミド化合物を用いることにより、低沸点溶媒であるメチルエチルケトンへの溶解性が良好な樹脂組成物になる。このため、低沸点溶媒に対する樹脂組成物の溶解性を向上させる作用があるビスフェノールA型エポキシ樹脂を用いないで、メチルエチルケトンへの溶解性の良好な樹脂組成物が得られる。A resin composition having good solubility in methyl ethyl ketone, which is a low boiling point solvent, by using the polymaleimide compound (A) in which the average value of the number n 1 of the number of repeating units in the formula (1) is 0.01 or more and 5 or less. become. Therefore, a resin composition having good solubility in methyl ethyl ketone can be obtained without using a bisphenol A type epoxy resin having an action of improving the solubility of the resin composition in a low boiling solvent.

樹脂混合物の樹脂成分中のビスフェノールA型エポキシ樹脂の含有量を抑えることにより、樹脂組成物の硬化物の耐熱性が向上する。樹脂組成物の硬化物の耐熱性を良好にする観点から、樹脂混合物はビスフェノールA型エポキシ樹脂を含有しないことが好ましい。ここで、ビスフェノールA型エポキシ樹脂を含有しないとは、実質的に含有しないことすなわち樹脂混合物の性質に影響を及ぼす量のビスフェノールA型エポキシ樹脂を含有しないことをいう。 By suppressing the content of the bisphenol A type epoxy resin in the resin component of the resin mixture, the heat resistance of the cured product of the resin composition is improved. From the viewpoint of improving the heat resistance of the cured product of the resin composition, it is preferable that the resin mixture does not contain the bisphenol A type epoxy resin. Here, the term "not containing bisphenol A type epoxy resin" means that it is substantially not contained, that is, it does not contain an amount of bisphenol A type epoxy resin that affects the properties of the resin mixture.

樹脂混合物は、樹脂混合物の樹脂成分100質量部中にポリマレイミド化合物を40〜70質量部と高い割合で含有しているため、耐熱性の良好な硬化物を形成できる樹脂組成物となる。高耐熱性と低誘電特性とを両立する観点から、樹脂混合物の樹脂成分100質量部中におけるポリマレイミド化合物の含有量は、50〜70質量部がより好ましく、55〜65質量部がさらに好ましい。なお、本発明において、数値範囲「A〜B」は「A以上B以下」を意義する。 Since the resin mixture contains the polymaleimide compound in a high proportion of 40 to 70 parts by mass in 100 parts by mass of the resin component of the resin mixture, it is a resin composition capable of forming a cured product having good heat resistance. From the viewpoint of achieving both high heat resistance and low dielectric properties, the content of the polymaleimide compound in 100 parts by mass of the resin component of the resin mixture is more preferably 50 to 70 parts by mass, further preferably 55 to 65 parts by mass. In the present invention, the numerical range "A to B" means "A or more and B or less".

式(1)で示されるポリマレイミド化合物は、Xが−CH−であり、aが0であり、bが0であるポリマレイミド化合物が好ましい。このような市販のポリマレイミド化合物としては、たとえば、BMI−2000、BMI−2300(製品名、大和化成工業(株)製、フェニレンマレイミド)が挙げられる。The polymaleimide compound represented by the formula (1) is preferably a polymaleimide compound in which X 1 is −CH 2 −, a is 0, and b is 0. Examples of such commercially available polymaleimide compounds include BMI-2000 and BMI-2300 (product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., phenylene maleimide).

(B)ベンゾオキサジン化合物
ベンゾオキサジン化合物は、分子中に少なくとも一つ以上のベンゾオキサジン環を有するものであればよいが、下記一般式(3)または(4)で表されるジヒドロベンゾオキサジン化合物が好ましく、中でも下記一般式(4)で表されるp−d型ジヒドロベンゾオキサジンがより好ましい。

Figure 0006946578


Figure 0006946578

(式(3)及び式(4)中、R、Rは水素原子、炭素数1〜3の置換もしくは無置換の炭化水素基を表す。)
これらのジヒドロベンゾオキサジン化合物は単独でまたは二種以上を組み合わせて用いることができる。(B) Benzoxazine compound The benzoxazine compound may have at least one benzoxazine ring in the molecule, but the dihydrobenzoxazine compound represented by the following general formula (3) or (4) may be used. Of these, pd-type dihydrobenzoxazine represented by the following general formula (4) is more preferable.
Figure 0006946578


Figure 0006946578

(In formulas (3) and (4), R 2 and R 3 represent hydrogen atoms and substituted or unsubstituted hydrocarbon groups having 1 to 3 carbon atoms.)
These dihydrobenzoxazine compounds can be used alone or in combination of two or more.

樹脂混合物の樹脂成分100質量部中におけるベンゾオキサジン化合物の含有量は、硬化物の高耐熱性および低誘電特性ならびに、樹脂組成物の低沸点溶媒への溶解性および溶解した状態の安定性の観点から、10〜30質量部が好ましく、12〜25質量部がより好ましく、15〜22質量部がさらに好ましい。また、低沸点溶媒への溶解性および溶解した状態の安定性の観点から、ベンゾオキサジン化合物の含有量は、(A)ポリマレイミド化合物100質量部に対して15質量部以上がより好ましく、20質量部以上がさらに好ましい。耐熱性の良好な硬化物を得る観点から、ベンゾオキサジン化合物の含有量は、(A)ポリマレイミド化合物100質量部に対して50質量部以下がより好ましく、40質量部以下がさらに好ましい。 The content of the benzoxazine compound in 100 parts by mass of the resin component of the resin mixture is from the viewpoint of high heat resistance and low dielectric properties of the cured product, as well as solubility of the resin composition in a low boiling solvent and stability of the dissolved state. Therefore, 10 to 30 parts by mass is preferable, 12 to 25 parts by mass is more preferable, and 15 to 22 parts by mass is further preferable. Further, from the viewpoint of solubility in a low boiling point solvent and stability in a dissolved state, the content of the benzoxazine compound is more preferably 15 parts by mass or more, more preferably 20 parts by mass, based on 100 parts by mass of the (A) polymaleimide compound. More than a portion is more preferable. From the viewpoint of obtaining a cured product having good heat resistance, the content of the benzoxazine compound is more preferably 50 parts by mass or less, still more preferably 40 parts by mass or less, based on 100 parts by mass of the (A) polymaleimide compound.

(C)エポキシ樹脂
エポキシ樹脂は、エポキシ基を有する化合物であればよいが、樹脂組成物の硬化物の耐熱性と低誘電特性とを両立する観点から、ビフェニルアラルキル型エポキシ樹脂、ナフタレン環を含むエポキシ樹脂、式(5)により表されるエポキシ基を三つ有する化合物などが好ましい。ナフタレン環を含むエポキシ樹脂としては、α−ナフトール型エポキシ樹脂が好ましい。市販のナフタレン環を含むエポキシ樹脂としては、各ナフタレン環がエポキシ基を二つ有するESN−475V(製品名、新日鉄住金化学(株)製、α−ナフトール型エポキシ樹脂)が挙げられる。また、式(5)により表される市販のエポキシ樹脂としては、VG3101L(製品名、(株)プリンテック製、高耐熱3官能エポキシ樹脂)が挙げられる。

Figure 0006946578
(C) Epoxy resin The epoxy resin may be a compound having an epoxy group, but includes a biphenyl aralkyl type epoxy resin and a naphthalene ring from the viewpoint of achieving both heat resistance and low dielectric properties of the cured product of the resin composition. Epoxy resins, compounds having three epoxy groups represented by the formula (5), and the like are preferable. As the epoxy resin containing a naphthalene ring, an α-naphthol type epoxy resin is preferable. Examples of commercially available epoxy resins containing naphthalene rings include ESN-475V (product name, α-naphthol type epoxy resin manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.) in which each naphthalene ring has two epoxy groups. Examples of the commercially available epoxy resin represented by the formula (5) include VG3101L (product name, manufactured by Printec Co., Ltd., highly heat-resistant trifunctional epoxy resin).
Figure 0006946578

上記以外のエポキシ樹脂としては、ビスフェノールA型エポキシ樹脂、ビスフェノールE型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、トリフェニロール型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂などが挙げられる。これらエポキシ樹脂は、一種または二種以上組み合わせて用いることができる。 Examples of epoxy resins other than the above include bisphenol A type epoxy resin, bisphenol E type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, and bisphenol F novolac type epoxy resin. , Triphenylol type epoxy resin, dicyclopentadiene type epoxy resin and the like. These epoxy resins can be used alone or in combination of two or more.

樹脂混合物の樹脂成分100質量部におけるエポキシ樹脂の含有量は、硬化物の高耐熱性および低誘電特性の観点から、10〜30質量部が好ましく、12〜25質量部がより好ましく、15〜22質量部がさらに好ましい。 The content of the epoxy resin in 100 parts by mass of the resin component of the resin mixture is preferably 10 to 30 parts by mass, more preferably 12 to 25 parts by mass, and 15 to 22 parts from the viewpoint of high heat resistance and low dielectric properties of the cured product. Parts by mass are even more preferred.

(D)クマロン樹脂
クマロン樹脂は、クマロン、インデンおよびスチレンを主成分とする共重合樹脂である。市販品としては、G−90、V−120、L−5、L−20、H−100(いずれも製品名、日塗化学(株)製)などが挙げられる。低誘電特性を備えた硬化物を実現する樹脂組成物とする観点から、軟化点が100℃以下であり、重量平均分子量が850以下であるクマロン樹脂が好ましい。
(D) Kumaron resin Kumaron resin is a copolymer resin containing Kumaron, inden and styrene as main components. Examples of commercially available products include G-90, V-120, L-5, L-20, and H-100 (all product names, manufactured by Nikko Kagaku Co., Ltd.). From the viewpoint of producing a resin composition that realizes a cured product having low dielectric properties, a kumaron resin having a softening point of 100 ° C. or lower and a weight average molecular weight of 850 or less is preferable.

樹脂混合物の樹脂成分100質量部におけるクマロン樹脂の含有量は、硬化物の高耐熱性および低誘電特性の観点から、0.1〜5質量部が好ましく、0.5〜4質量部がより好ましく、1〜3質量部がさらに好ましい。 The content of kumaron resin in 100 parts by mass of the resin component of the resin mixture is preferably 0.1 to 5 parts by mass, more preferably 0.5 to 4 parts by mass, from the viewpoint of high heat resistance and low dielectric properties of the cured product. , 1 to 3 parts by mass is more preferable.

(E)ビスフェノールA型シアネートエステル
ビスフェノールA型シアネートエステルは、トリアジン環を形成して硬化するビスフェノールA型シアネートエステルである。ビスフェノールA型シアネートエステルと(D)クマロン樹脂とを併用することにより、樹脂組成物を硬化させて得られる硬化物の比誘電率および誘電正接をさらに低くすることができる。ビスフェノールA型シアネートエステルには、モノマーと(ホモ)ポリマー(高分子)とがあるが、低誘電特性に優れた硬化物を得る観点から、ビスフェノールA型シアネートエステルのモノマーが好ましい。
(E) Bisphenol A Cyanate Ester The bisphenol A cyanate ester is a bisphenol A cyanate ester that forms a triazine ring and is cured. By using the bisphenol A type cyanate ester and the (D) kumaron resin in combination, the relative permittivity and the dielectric loss tangent of the cured product obtained by curing the resin composition can be further reduced. The bisphenol A type cyanate ester includes a monomer and a (homo) polymer (polymer), and the monomer of the bisphenol A type cyanate ester is preferable from the viewpoint of obtaining a cured product having excellent low dielectric properties.

樹脂混合物の樹脂成分100質量部における(E)ビスフェノールA型シアネートエステルの含有量は、硬化物の高耐熱性および低誘電特性の観点から、1〜10質量部が好ましく、3〜8質量部がより好ましく、4〜6質量部がさらに好ましい。 The content of the (E) bisphenol A type cyanate ester in 100 parts by mass of the resin component of the resin mixture is preferably 1 to 10 parts by mass, preferably 3 to 8 parts by mass, from the viewpoint of high heat resistance and low dielectric properties of the cured product. More preferably, 4 to 6 parts by mass is further preferable.

(F)硬化促進剤
本発明に係る樹脂組成物を用いる際に、硬化促進剤を添加使用してもよい。硬化促進剤を添加する時期としては、樹脂組成物を溶剤に溶解したワニスとした際、プリプレグ化する際、または基材、積層板を製造する際などが挙げられる。
(F) Curing Accelerator When using the resin composition according to the present invention, a curing accelerator may be added and used. Examples of the timing for adding the curing accelerator include when the resin composition is made into a varnish dissolved in a solvent, when the resin composition is made into a prepreg, or when a base material or a laminated board is manufactured.

硬化促進剤としては、例えば、ジクミルペルオキシド、4,4’−ジアミノジフェニルメタン、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−ヘプチルイミダゾールなどのイミダゾール類;トリエタノールアミン、トリエチレンジアミン、N−メチルモルホリンなどのアミン類;トリフェニルホスフィン、トリトリルホスフィンなどの有機ホスフィン類;テトラフェニルホスホニウムテトラフェニルボレート、トリエチルアンモニウムテトラフェニルボレートなどのテトラフェニルボロン塩類;1,8−ジアザービシクロ(5,4,0)ウンデセン−7及びその誘導体;ナフテン酸鉛、ステアリン酸鉛、ナフテン酸亜鉛、オレイン酸錫、ナフテン酸マンガン、フテン酸コバルト、オクチル酸コバルトなどの有機金属塩などが挙げられる。これらの硬化促進剤は単独で用いても二種以上を併用してもよく、また必要に応じて有機過酸化物やアゾ化合物などを併用することもできる。 Examples of the curing accelerator, dicumyl peroxide, 4,4'-diaminodiphenylmethane, 2-methylimidazole, 2-ethyl-4-methylimidazole, imidazoles such as 2-heptene chill imidazole; triethanolamine, triethylenediamine , Amines such as N-methylmorpholin; organic phosphines such as triphenylphosphine and tritrylphosphine; tetraphenylborone salts such as tetraphenylphosphonium tetraphenylborate and triethylammonium tetraphenylborate; 1,8-diazabicyclo ( 5,4,0) undecene-7 and derivatives thereof; lead naphthenate, lead stearate, zinc naphthenate, tin oleate, manganese naphthenate, Na Putian cobalt, and the like organic metal salts such as cobalt octoate is .. These curing accelerators may be used alone or in combination of two or more, and if necessary, an organic peroxide, an azo compound, or the like may be used in combination.

これら硬化促進剤の含有量は、ワニスまたはプリプレグにおいて、所望するゲル化時間が得られる範囲で配合することが望ましい。一般に、樹脂組成物に含有される樹脂成分の合計100質量部に対し、0.01〜5質量部の範囲で用いられる。 It is desirable that the content of these curing accelerators be blended in a varnish or prepreg within a range in which a desired gelation time can be obtained. Generally, it is used in the range of 0.01 to 5 parts by mass with respect to a total of 100 parts by mass of the resin components contained in the resin composition.

本発明に係る樹脂組成物および溶融混合前の樹脂混合物は、上記(A)(B)(C)(D)(E)および(F)以外の成分を含有してもよい。例えば、本発明の樹脂組成物を硬化させて成形品とする基材を得るため、有機または無機の充填剤を用いることができる。充填剤の例として、シリカ、珪藻土、アルミナ、塩化亜鉛、酸化チタン、酸化カルシウム、酸化マグネシウム、酸化鉄、酸化スズ、酸化アンチモン、フェライト類などの酸化物;水酸化カルシウム、水酸化マグネシウム、水酸化アルミニウム、塩基性炭酸マグネシウムなどの水酸化物;炭酸カルシウム、炭酸マグネシウム、炭酸亜鉛、炭酸バリウム、ドーソナイト、ハイドロタルサイトなどの炭酸塩;硫酸カルシウム、硫酸バリウム、石膏繊維などの硫酸塩;ケイ酸カルシウム(ウォラストナイト、ゾノトライト)、タルク、クレー、マイカ、モンモリロナイト、ベントナイト、活性白土、セピオライト、イモゴライト、セリサイト、ガラス繊維、ガラスビーズ、シリカ系バルンなどのケイ酸塩;窒化アルミ、窒化ホウ素、窒化珪素などの窒化物;カーボンブラック、グラファイト、炭素繊維、炭素バルン、木炭粉末などの炭素類;その他各種金属粉、チタン酸カリウム、チタン酸ジルコン酸鉛、アルミボレート、硫化モリブデン、炭化珪素、ステンレス繊維、ホウ酸亜鉛、各種磁性粉、スラグ繊維、セラミック粉などを挙げることができる。 The resin composition according to the present invention and the resin mixture before melt mixing may contain components other than the above (A), (B), (C), (D), (E) and (F). For example, an organic or inorganic filler can be used to cure the resin composition of the present invention to obtain a base material to be a molded product. Examples of fillers are oxides such as silica, diatomaceous earth, alumina, zinc chloride, titanium oxide, calcium oxide, magnesium oxide, iron oxide, tin oxide, antimony oxide, ferrites; calcium hydroxide, magnesium hydroxide, hydroxide. Hydroxides such as aluminum and basic magnesium carbonate; carbonates such as calcium carbonate, magnesium carbonate, zinc carbonate, barium carbonate, dosonite and hydrotalcite; sulfates such as calcium sulfate, barium sulfate and gypsum fiber; calcium silicate (Wollastonite, zonotrite), talc, clay, mica, montmorillonite, bentonite, active white clay, sepiolite, imogolite, sericite, glass fiber, glass beads, silica-based balun and other silicates; aluminum hydroxide, boron nitride, nitride Nitridees such as silicon; carbons such as carbon black, graphite, carbon fiber, carbon balun, charcoal powder; other various metal powders, potassium titanate, lead zirconate titanate, aluminum volate, molybdenum sulfide, silicon carbide, stainless steel fiber , Zinc borate, various magnetic powders, slag fibers, ceramic powders and the like.

充填剤の形状としては球形または燐片状が好ましく、これらを単独で用いても二種以上を併用してもよい。また必要に応じて分子中に二個以上の異なる反応基(一つは無機材料と化学反応する反応基で、もう一つは有機材料と化学反応する反応基)をもつシランカップリング剤を併用することもできる。 The shape of the filler is preferably spherical or flaky, and these may be used alone or in combination of two or more. Also, if necessary, a silane coupling agent having two or more different reactive groups in the molecule (one is a reactive group that chemically reacts with an inorganic material and the other is a reactive group that chemically reacts with an organic material) is used in combination. You can also do it.

有機または無機の充填剤を用いる場合、その含有量は、樹脂混合物の樹脂成分100質量部に対して5.0〜250質量部が好ましい。 When an organic or inorganic filler is used, the content thereof is preferably 5.0 to 250 parts by mass with respect to 100 parts by mass of the resin component of the resin mixture.

樹脂組成物には、必要に応じて難燃剤を添加することができる。難燃剤としてはブロム化エポキシ樹脂のようなブロム化合物および縮合燐酸エステルのようなリン化合物などの有機難燃剤、水酸化アルミニウム、水酸化マグネシウム、スズ化合物およびアンチモン化合物などの無機難燃剤などが挙げられる。これらの難燃剤は単独で用いても二種以上を併用してもよい。 A flame retardant can be added to the resin composition if necessary. Examples of the flame retardant include organic flame retardants such as brom compounds such as brominated epoxy resin and phosphorus compounds such as condensed phosphoric acid ester, and inorganic flame retardants such as aluminum hydroxide, magnesium hydroxide, tin compounds and antimony compounds. .. These flame retardants may be used alone or in combination of two or more.

また、難燃剤の含有量は、樹脂組成物を硬化した硬化物の耐熱性、耐湿熱性を損なわずに十分な難燃性(例えばUL94規格におけるV−0条件合格)を持つために必要な量であることが望ましい。有機難燃剤の場合、一般的には、樹脂組成物中における有機難燃剤を含めた樹脂成分の合計100質量部に対して1〜20質量部の範囲で、無機難燃剤の場合、樹脂成分の合計100質量部に対して10〜300質量部の範囲で用いられることが好ましい。 The content of the flame retardant is an amount required to have sufficient flame retardancy (for example, passing the V-0 condition in the UL94 standard) without impairing the heat resistance and moisture heat resistance of the cured product obtained by curing the resin composition. Is desirable. In the case of an organic flame retardant, generally, in the range of 1 to 20 parts by mass with respect to a total of 100 parts by mass of the resin component including the organic flame retardant in the resin composition, in the case of an inorganic flame retardant, the resin component It is preferably used in the range of 10 to 300 parts by mass with respect to 100 parts by mass in total.

本発明に係る樹脂組成物を用いるにあたって、用途に応じて他の添加剤を加えることができる。他の添加剤の例としては、各種シリコーンオイル、熱可塑性樹脂、NBRなどの合成ゴム類、レベリング剤が挙げられる。他の添加剤は、樹脂組成物中における他の添加剤と樹脂成分との合計100質量部中の上記他添加剤の含有量が0.0001〜5質量部となる配合量の範囲で用いられることが好ましい。 When using the resin composition according to the present invention, other additives can be added depending on the intended use. Examples of other additives include various silicone oils, thermoplastic resins, synthetic rubbers such as NBR, and leveling agents. The other additive is used in a blending amount range in which the content of the other additive in the total 100 parts by mass of the other additive and the resin component in the resin composition is 0.0001 to 5 parts by mass. Is preferable.

(溶融混合工程)
本発明の樹脂組成物は、(A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を加熱して、溶融状態で混合する溶融混合工程によって製造される。溶融混合工程には、通常の混合手段を用いることができる。混合手段としては、ニーダー、2軸混練機などが好ましい。溶融混合時の温度は樹脂混合物が溶融する温度以上400℃以下とすればよいが、130℃〜230℃がより好ましく、150℃〜210℃がさらに好ましい。溶融混合工程は通常0.1〜10分間程度行われる。上述したとおり、溶融混合工程における広い溶融温度範囲において、低沸点溶媒に対する溶解性の良好な樹脂組成物を得るためには、式(1)における繰り返し単位の数nの平均値が0.01以上5以下である(A)ポリマレイミド化合物を用いることが好ましい。
(Melting and mixing process)
The resin composition of the present invention is a melt mixture in which a resin mixture containing (A) polymaleimide compound, (B) benzoxazine, (C) epoxy resin, and (D) kumaron resin is heated and mixed in a molten state. Manufactured by the process. Ordinary mixing means can be used in the melt mixing step. As the mixing means, a kneader, a twin-screw kneader or the like is preferable. The temperature at the time of melting and mixing may be at least the temperature at which the resin mixture melts and 400 ° C. or lower, but is more preferably 130 ° C. to 230 ° C., still more preferably 150 ° C. to 210 ° C. The melting and mixing step is usually carried out for about 0.1 to 10 minutes. As described above, in order to obtain a resin composition having good solubility in a low boiling point solvent in a wide melting temperature range in the melting and mixing step, the average value of the number n 1 of the repeating units in the formula (1) is 0.01. It is preferable to use the (A) polymaleimide compound having a temperature of 5 or more.

溶融混合工程の後、自然冷却もしくは強制冷却によって冷却して本発明の樹脂組成物を得る。
冷却方法としては公知の方法から適宜選択して行うことができる。例えば、5〜100℃の環境下で自然冷却する方法や、−20〜80℃の冷媒を用いて強制冷却する方法を採用することができる。また、溶融混合後恒温装置内で30〜300℃の環境下に置いてから冷却する方法を採用してもよい。
After the melt-mixing step, the resin composition of the present invention is obtained by cooling by natural cooling or forced cooling.
The cooling method can be appropriately selected from known methods. For example, a method of natural cooling in an environment of 5 to 100 ° C. or a method of forced cooling using a refrigerant of -20 to 80 ° C. can be adopted. Further, a method of cooling after melting and mixing and placing the mixture in an environment of 30 to 300 ° C. in a constant temperature device may be adopted.

冷却後、得られた樹脂組成物を、粉砕してドライ状態(乾燥)で保存し、固体状の樹脂組成物として後の工程に使用することができる。 After cooling, the obtained resin composition can be pulverized and stored in a dry state (dry), and used as a solid resin composition in a later step.

溶融混合工程において、樹脂混合物に含まれる(A)ポリマレイミド化合物の少なくとも一部が、樹脂混合物中の他の成分と反応することにより変性する。これにより、高耐熱性、低誘電特性および低沸点溶媒に対する溶解性が良好な樹脂組成物を調製することができる。 In the melt mixing step, at least a part of the (A) polymaleimide compound contained in the resin mixture is modified by reacting with other components in the resin mixture. This makes it possible to prepare a resin composition having high heat resistance, low dielectric properties, and good solubility in a low boiling point solvent.

低沸点溶媒への溶解性を良好にする観点から、溶融混合工程によって製造された樹脂組成物中に残存するポリマレイミド化合物(適宜、「残マレイミド化合物」ともいう。)は、樹脂成分100質量部中に42質量部以下が好ましく、40質量部以下がより好ましい。 From the viewpoint of improving the solubility in a low boiling point solvent, the polymaleimide compound remaining in the resin composition produced by the melt mixing step (appropriately referred to as “residual maleimide compound”) is 100 parts by mass of the resin component. 42 parts by mass or less is preferable, and 40 parts by mass or less is more preferable.

溶融混合工程後の変性した樹脂組成物の低沸点溶媒への溶解性を良好にする観点から、溶融混合工程前の樹脂混合物中のポリマレイミド化合物100質量部のうち、溶融混合工程後の樹脂組成物中に残マレイミド化合物として残存するポリマレイミド化合物が30〜60質量部であることが好ましく、40〜50質量部であることがより好ましい。 From the viewpoint of improving the solubility of the modified resin composition after the melt-mixing step in a low boiling solvent, the resin composition after the melt-mixing step out of 100 parts by mass of the polymaleimide compound in the resin mixture before the melt-mixing step. The amount of the polymaleimide compound remaining as the residual maleimide compound in the product is preferably 30 to 60 parts by mass, more preferably 40 to 50 parts by mass.

(ワニス)
本発明に係る樹脂組成物のワニスは、上述した製造方法によって得られた樹脂組成物を、沸点が120℃以下かつ比誘電率が10〜30の溶剤に溶解させたものである。
沸点が120℃以下かつ比誘電率が10〜30の溶剤としては、アセトン、メチルエチルケトン、メチルイソブチルケトンなどのケトン系溶剤、プロピレングリコールモノメチルエーテルなどのエーテル系溶剤、エタノール、1−プロパノール、2−プロパノール、1−ブタノールなどのアルコール系溶剤などが挙げられる。操作性などを考慮すると、例示した溶剤のうちケトン系溶剤が好ましく用いられる。これらの溶剤は単独で用いてもよいし、二種以上を混合して用いてもよい。また、上に例示したもの以外の溶剤を含有していてもよい。
(varnish)
The varnish of the resin composition according to the present invention is obtained by dissolving the resin composition obtained by the above-mentioned production method in a solvent having a boiling point of 120 ° C. or lower and a relative permittivity of 10 to 30.
Solvents having a boiling point of 120 ° C. or lower and a specific dielectric constant of 10 to 30 include ketone solvents such as acetone, methyl ethyl ketone and methyl isobutyl ketone, ether solvents such as propylene glycol monomethyl ether, ethanol, 1-propanol and 2-propanol. , 1-Butanol and other alcoholic solvents can be mentioned. Considering operability and the like, a ketone solvent is preferably used among the exemplified solvents. These solvents may be used alone or in combination of two or more. Further, it may contain a solvent other than those exemplified above.

ワニス100質量部中の樹脂組成物の含有量は、通常40〜80質量部であり、好ましくは50〜70質量部である。ワニスは、樹脂組成物を常温(室温)または加熱下で溶剤中に溶解させて得ることができる。加熱下で溶解させる場合、溶剤の沸点にもよるが、溶解させる際の一般的な条件は、温度が50〜200℃程度であり、時間が0.1〜24時間程度である。 The content of the resin composition in 100 parts by mass of the varnish is usually 40 to 80 parts by mass, preferably 50 to 70 parts by mass. The varnish can be obtained by dissolving the resin composition in a solvent at room temperature (room temperature) or under heating. When dissolving under heating, the temperature is about 50 to 200 ° C. and the time is about 0.1 to 24 hours, although it depends on the boiling point of the solvent.

プリプレグは、上記ワニスを基材に塗布または含浸し、次いで乾燥して溶剤を除去することにより製造することができる。
基材としてはガラス不織布、ガラスクロス、炭素繊維布、有機繊維布、紙などの従来プリプレグに用いられる公知の基材を使用することができる。
The prepreg can be produced by applying or impregnating the base material with the varnish and then drying to remove the solvent.
As the base material, known base materials used for conventional prepregs such as glass non-woven fabric, glass cloth, carbon fiber cloth, organic fiber cloth, and paper can be used.

上記ワニスを上記基材に塗布または含浸した後、乾燥工程を経てプリプレグを製造するが、塗布方法、含浸方法、乾燥方法は特に限定するものではなく、従来公知の方法を採用することができる。乾燥条件については、使用する溶剤の沸点により適宜決められるが、あまり高温は好ましくない。プリプレグ100質量%中に残存する溶剤の量が3質量%以下となるように乾燥させることが望ましい。 After applying or impregnating the varnish on the substrate, a prepreg is produced through a drying step, but the coating method, the impregnation method, and the drying method are not particularly limited, and conventionally known methods can be adopted. The drying conditions are appropriately determined depending on the boiling point of the solvent used, but a very high temperature is not preferable. It is desirable to dry the prepreg so that the amount of the solvent remaining in 100% by mass is 3% by mass or less.

プリプレグを調製する際、ワニスに上述した樹脂組成物以外の樹脂を添加してもよい。当該樹脂としては、ポリフェニレンエーテル樹脂などが挙げられる。プリプレグを硬化させた硬化物の高耐熱性、低比誘電率及び低誘電正接を付与する観点から、ポリフェニレンエーテル樹脂が好ましい。同様の観点から、プリプレグを調製する際に用いるポリフェニレンエーテル樹脂の添加量は、本発明の樹脂組成物の樹脂成分100質量部に対して、10〜100質量部が好ましく、10〜50質量部がより好ましく、20〜40質量部がさらに好ましい。市販のポリフェニレンエーテル樹脂としては、SA90、SA120、SA9000(製品名、いずれもSABICジャパン合同会社製)などが挙げられる。 When preparing the prepreg, a resin other than the resin composition described above may be added to the varnish. Examples of the resin include polyphenylene ether resin and the like. A polyphenylene ether resin is preferable from the viewpoint of imparting high heat resistance, low relative permittivity and low dielectric loss tangent to the cured product obtained by curing the prepreg. From the same viewpoint, the amount of the polyphenylene ether resin used when preparing the prepreg is preferably 10 to 100 parts by mass, preferably 10 to 50 parts by mass with respect to 100 parts by mass of the resin component of the resin composition of the present invention. More preferably, 20 to 40 parts by mass is further preferable. Examples of commercially available polyphenylene ether resins include SA90, SA120, and SA9000 (product names, all manufactured by SABIC Japan LLC).

本発明の樹脂組成物はプリント配線基板用に好適であり、また樹脂組成物を硬化させてなる成形品として本発明を実施することができる。成形品としては、樹脂組成物のみを硬化させてなる硬化物や、他の原料と複合した複合材、積層体などが挙げられる。 The resin composition of the present invention is suitable for a printed wiring board, and the present invention can be carried out as a molded product obtained by curing the resin composition. Examples of the molded product include a cured product obtained by curing only the resin composition, a composite material composited with other raw materials, and a laminate.

複合材および積層体は、プリプレグ1枚を熱プレスなどで加圧下に加熱し硬化させるか、プリプレグ複数枚を積層して加圧下に加熱して一体化させることによって得ることができる。複合材を製造する時の加熱加圧条件は特に限定されるものではないが、加熱温度が100〜300℃、好ましくは150〜250℃であり、圧力が10〜100kg/cmであり、加熱加圧時間が10〜300分程度である。 The composite material and the laminated body can be obtained by heating one prepreg with a hot press or the like to cure it, or by laminating a plurality of prepregs and heating them under pressure to integrate them. The heating and pressurizing conditions for producing the composite material are not particularly limited, but the heating temperature is 100 to 300 ° C., preferably 150 to 250 ° C., the pressure is 10 to 100 kg / cm 2 , and the heating is performed. The pressurization time is about 10 to 300 minutes.

積層材の片面または両面に、金属箔または金属板を積層一体化させて多層プリント配線板用などに使用可能な積層体とすることができる。このような積層体は、1枚のプリプレグの片面もしくは両面に金属箔もしくは金属板を積層し熱プレスするか、または複数枚積層されたプリプレグの最外層となる片面または両面に金属箔または金属板を積層し熱プレスすることにより、プリプレグを加熱硬化させ一体化させることにより製造することができる。 A metal foil or a metal plate can be laminated and integrated on one side or both sides of the laminated material to form a laminated body that can be used for a multilayer printed wiring board or the like. Such a laminate can be obtained by laminating a metal foil or a metal plate on one or both sides of one prepreg and heat-pressing it, or by heat-pressing, or by laminating a plurality of prepregs on one or both sides which is the outermost layer of the metal foil or the metal plate. Can be produced by laminating and heat-pressing the prepregs to heat-cure and integrate them.

金属箔または金属板としては、銅、アルミニウム、鉄、ステンレスなどが使用できる。例えば、金属箔として銅を用いた積層板が銅張積層板(Copper Clad Laminate、CCL)である。加熱硬化させる際の条件は、複合材を製造する際の条件と同様の条件が好ましい。また、内層コア材を用いて多層プリント配線板用積層板としてもよい。
本発明は、上述した樹脂組成物を含有する接着剤、封止剤および塗料として実施することもできる。
As the metal foil or metal plate, copper, aluminum, iron, stainless steel or the like can be used. For example, a laminated plate using copper as a metal foil is a copper-clad laminate (CCL). The conditions for heat curing are preferably the same as the conditions for producing a composite material. Further, the inner layer core material may be used as a laminated board for a multilayer printed wiring board.
The present invention can also be carried out as an adhesive, a sealant and a paint containing the above-mentioned resin composition.

以下、実施例を示して本発明を説明するが、これらの実施例により本発明が限定されるものではない。実施例および比較例において用いた試験方法および原料は以下のとおりである。 Hereinafter, the present invention will be described with reference to examples, but the present invention is not limited to these examples. The test methods and raw materials used in Examples and Comparative Examples are as follows.

1.試験方法
〔溶剤溶解性〕
測定試料(樹脂組成物)60質量部とメチルエチルケトン(溶剤)40質量部とを室温条件下で混合し、所定時間、超音波振動を加えた後における溶解状態を以下の基準を用いて目視により評価した。
〇:1時間以内に透明の液体になる(室温)
△:5時間以内に透明の液体になる(室温)
×:5時間経過後も混濁状態の液体または半液体状態(室温)
1. 1. Test method [solvent solubility]
60 parts by mass of the measurement sample (resin composition) and 40 parts by mass of methyl ethyl ketone (solvent) are mixed under room temperature conditions, and the dissolved state after applying ultrasonic vibration for a predetermined time is visually evaluated using the following criteria. bottom.
〇: Becomes a transparent liquid within 1 hour (room temperature)
Δ: Becomes a transparent liquid within 5 hours (room temperature)
X: Liquid or semi-liquid state (room temperature) in a turbid state even after 5 hours have passed

〔ガラス転移点(Tg)〕
〔熱膨張率:CTE(ppm/℃)〕
樹脂組成物を硬化させた硬化物を所定の大きさにカット(切り出)して、ガラス転移点測定のサンプルとした。以下の条件にて、TMA(Thermomechanical Analysis、熱機械分析)法を用いて、サンプルのガラス転移点(温度、℃)および熱膨張率(CTE)を測定した。
測定機器 :リガク社製 Thermo plus TMA8310
サンプル寸法 :幅(縦)5mm×長さ(横)5mm×高さ4mm
雰囲気 :N2
測定温度 :30〜350℃
昇温速度 :10℃/min.
測定モ−ド :圧縮
[Glass transition point (Tg)]
[Thermal linear expansion coefficient: CTE (ppm / ℃)]
A cured product obtained by curing the resin composition was cut (cut out) to a predetermined size to prepare a sample for measuring the glass transition point. Under the following conditions, using TMA (Thermomechanical Analysis, thermomechanical analysis) the method, the glass transition point of the sample (temperature, ° C.) and thermal linear expansion rate (CTE) was measured.
Measuring equipment: Rigaku's Thermo plus TMA8310
Sample dimensions: width (length) 5 mm x length (width) 5 mm x height 4 mm
Atmosphere: N 2
Measurement temperature: 30-350 ° C
Temperature rise rate: 10 ° C./min.
Measurement mode: compression

〔熱重量変化〕
JIS K7120に準じて、硬化物を30℃から毎分10℃の速度で昇温し、質量が1%減となる温度(Td(1%))および5%減となる温度(Td(5%))を測定した。
[Thermogravimetric change]
According to JIS K7120, the cured product is heated from 30 ° C. to 10 ° C. per minute to reduce the mass by 1% (Td (1%)) and 5% (Td (5%)). )) Was measured.

〔比誘電率(Dk)、誘電正接(Df)〕
空洞共振器法により、1GHz条件で測定した。
[Relative permittivity (Dk), dielectric loss tangent (Df)]
The measurement was performed under the condition of 1 GHz by the cavity resonator method.

2.原料
(A)ポリマレイミド化合物
・BMI−2300(製品名、大和化成工業(株)製、ポリフェニルメタンポリマレイミド)
・BMI−4000(製品名、大和化成工業(株)製、ビスフェノールAジフェニルエーテルビスマレイミド)
2. Raw material (A) Polymaleimide compound, BMI-2300 (Product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., polyphenylmethane polymaleimide)
・ BMI-4000 (Product name, manufactured by Daiwa Kasei Kogyo Co., Ltd., bisphenol A diphenyl ether bismaleimide)

(B)ベンゾオキサジン化合物
・BZO:(P−d型)ベンゾオキサジン(四国化成(株)製)
(C)エポキシ樹脂
・VG3101L(製品名、(株)プリンテック製、高耐熱3官能エポキシ樹脂)
・ESN−475V(製品名、新日鉄住金化学(株)製、下記の式(6)で示されるα−ナフトールアラルキル型エポキシ樹脂)

Figure 0006946578
(B) Benzodiazepine compound-BZO: (P-d type) benzoxazine (manufactured by Shikoku Chemicals Corporation)
(C) Epoxy resin, VG3101L (Product name, manufactured by Printec Co., Ltd., high heat resistant trifunctional epoxy resin)
-ESN-475V (Product name, manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., α-naphthol aralkyl type epoxy resin represented by the following formula (6))
Figure 0006946578

(D)クマロン樹脂
・G−90(製品名、日塗化学(株)製、常温で固体、軟化点90℃、重量平均分子量770)
・H−100(製品名、日塗化学(株)製、常温で固体、軟化点100℃、重量平均分子量710)
・L−5(製品名、日塗化学(株)製、常温で液体、重量平均分子量160)
(D) Kumaron resin G-90 (product name, manufactured by Nikko Kagaku Co., Ltd., solid at room temperature, softening point 90 ° C., weight average molecular weight 770)
H-100 (Product name, manufactured by Nikko Kagaku Co., Ltd., solid at room temperature, softening point 100 ° C., weight average molecular weight 710)
・ L-5 (Product name, manufactured by Nikko Kagaku Co., Ltd., liquid at room temperature, weight average molecular weight 160)

(E)ビスフェノールA型シアネートエステル
・モノマー:ビスフェノールA型シアネートエステルのモノマー(製品名:トリアジン、三菱ガス化学(株)製、CAS No.1156−51−0、2,2−ビス(4−シアナトフェニル)プロパン)
・ポリマー:ビスフェノールA型シアネートエステルの(ホモ)ポリマー(製品名:TA1500、三菱ガス化学(株)製、CAS No.1156−51−0、25722−6
6−1、2,2−ビス(4−シアナトフェニル)プロパンの単独重合体)
(他の成分)
・SA120:(製品名、SABICイノベーティブプラスチックス社製、ポリフェニレンエーテル)
(E) Bisphenol A type cyanate ester monomer: Bisphenol A type cyanate ester monomer (Product name: Triazine, manufactured by Mitsubishi Gas Chemical Company, Inc., CAS No. 1156-51-0, 2,2-bis (4-shi) Anatophenyl) Propane)
-Polymer: (homo) polymer of bisphenol A type cyanate ester (Product name: TA1500, manufactured by Mitsubishi Gas Chemical Company, Inc., CAS No. 1156-51-0, 25722-6
A homopolymer of 6-1 and 2,2-bis (4-cyanatophenyl) propane)
(Other ingredients)
-SA120: (Product name, manufactured by SABIC Innovative Plastics, polyphenylene ether)

(実施例1〜5、比較例1〜4)
2軸混合(混練)機を用いて、表1に示す割合(質量部)の樹脂混合物を溶融混合(溶融混練)して樹脂組成物を調製した。溶融混合工程の条件は、バレル温度270℃、樹脂組成物温度185〜195℃(2軸混合機の樹脂組成物の出口における温度)とした。本実施例で用いた2軸混合機では、上記条件により、樹脂混合物中に含有される(A)ビスマレイミド100質量部中の30〜60質量部を重合させないで樹脂組成物中に残存させ、メチルエチルケトンに対する溶解性が高い樹脂組成物を調製することができた。
(Examples 1 to 5, Comparative Examples 1 to 4)
A resin composition was prepared by melt-mixing (melt-kneading) the resin mixture having the ratio (parts by mass) shown in Table 1 using a twin-screw mixer (kneading). The conditions of the melt mixing step were a barrel temperature of 270 ° C. and a resin composition temperature of 185 to 195 ° C. (the temperature at the outlet of the resin composition of the twin-screw mixer). In the twin-screw mixer used in this example, under the above conditions, 30 to 60 parts by mass of (A) bismaleimide contained in the resin mixture was left in the resin composition without being polymerized. A resin composition having high solubility in methyl ethyl ketone could be prepared.

上記のようにして調製した樹脂組成物45質量部と溶媒55質量部とを常温条件下で混合し、樹脂組成物のワニスを調製した。
実施例1〜5および比較例1〜2は、ワニス中の樹脂組成物(樹脂成分)100質量部に対して50質量部の割合でポリフェニレンエーテル(SA120)を添加したものを、ガラスクロス2116に一層で含浸させて(1Ply)プリプレグを調製した。比較例3〜4は、ワニスにポリフェニレンエーテルを添加せず、そのままでガラスクロス2116に一層で含浸させてプリプレグを調製した。各実施例および比較例のプリプレグを、プレス条件;180℃×30kg/cm2×1時間、本硬化条件;230℃×2時間の条件で硬化させた各硬化物について、ガラス転移点(Tg)、比誘電率(Dk)、および誘電正接(Df)を測定した結果を表1に示す。
And above way tree butter sets Narubutsu 45 parts by weight of solvent 55 parts by mass was prepared by mixing at ambient temperature conditions, to prepare a varnish of the resin composition.
In Examples 1 to 5 and Comparative Examples 1 to 2, the glass cloth 2116 was prepared by adding polyphenylene ether (SA120) at a ratio of 50 parts by mass to 100 parts by mass of the resin composition (resin component) in the varnish. A prepreg was prepared by impregnation with one layer (1Ply). In Comparative Examples 3 and 4, a prepreg was prepared by impregnating the glass cloth 2116 with a single layer as it was without adding polyphenylene ether to the varnish. The glass transition point (Tg) for each cured product obtained by curing the prepregs of each Example and Comparative Example under the conditions of pressing conditions: 180 ° C. × 30 kg / cm 2 × 1 hour and main curing conditions: 230 ° C. × 2 hours. The results of measuring the relative permittivity (Dk) and the dielectric loss tangent (Df) are shown in Table 1.

Figure 0006946578
Figure 0006946578

表1の結果から、以下のことがいえる。
クマロン樹脂を含有する樹脂混合物を溶融して調製した樹脂組成物を用いたプリプレグにより、高い耐熱性(Tg)と、低い比誘電率(Dk)および低い誘電正接(Df)とを備えた硬化物が得られた。
クマロン樹脂は常温で液体のものよりも常温でビーズ状(固体)のもののほうが、また、重量平均分子量が800以下のもののほうが、低い比誘電率(Dk)および低い誘電正接(Df)を備えた硬化物を得るために有効であった。
硬化物の比誘電率(Dk)および誘電正接(Df)をさらに低くするには、クマロン樹脂と(E)ビスフェノールA型シアネートエステルとを併用することが有効であった。
(E)ビスフェノールA型シアネートエステルは、ポリマーよりもモノマーのほうが硬化物の誘電正接を低くするために有効であった。
From the results in Table 1, the following can be said.
A cured product having high heat resistance (Tg), low relative permittivity (Dk) and low dielectric loss tangent (Df) by prepreg using a resin composition prepared by melting a resin mixture containing kumaron resin. was gotten.
The kumaron resin has a lower relative permittivity (Dk) and a lower dielectric loss tangent (Df) when it is beaded (solid) at room temperature than when it is liquid at room temperature, and when the weight average molecular weight is 800 or less. It was effective for obtaining a cured product.
In order to further reduce the relative permittivity (Dk) and the dielectric loss tangent (Df) of the cured product, it was effective to use the kumaron resin and the (E) bisphenol A type cyanate ester in combination.
In the bisphenol A type cyanate ester, the monomer was more effective than the polymer in order to lower the dielectric loss tangent of the cured product.

表2、表3に示す割合(質量部)の樹脂混合物を、2軸混機を用いて溶融混合して樹脂組成物を調製した。樹脂組成物を230℃条件において4時間硬化させて作製した硬化物を評価した結果を表2、表3に示す。樹脂組成物の調製条件は表1と同様にした。

Figure 0006946578
表2に示すように、(D)クマロン樹脂を配合することにより、硬化物の高い耐熱性を維持したまま、比誘電率および誘電正接を低くすることができた。 Table 2, the resin mixture proportions (parts by weight) shown in Table 3, and melt mixed using a biaxial mixing kneader to prepare a resin composition. Tables 2 and 3 show the results of evaluating the cured product prepared by curing the resin composition at 230 ° C. for 4 hours. The preparation conditions for the resin composition were the same as in Table 1.
Figure 0006946578
As shown in Table 2, by blending the (D) kumaron resin, the relative permittivity and the dielectric loss tangent could be lowered while maintaining the high heat resistance of the cured product.

Figure 0006946578


表3の結果から、以下のことがいえる。
式(1)で示される化合物のnの平均値が0.01以上5以下であり、Xが−CH−で表される基であり、aが0であり、bが0であるポリマレイミド化合物BMI−2300を用いることにより、メチルエチルケトンに対する溶解性の良好な樹脂組成物となった。
軟化点85〜105℃、重量平均分子量700〜800のクマロン樹脂を用いることにより、樹脂組成物の樹脂成分100質量部中に1〜3質量部程度の少ない配合量で、高い耐熱性(Tg)と、低い誘電率(Dk)および低い誘電正接(Df)とを備えた硬化物が得られた。
Figure 0006946578


From the results in Table 3, the following can be said.
The average value of n 1 of the compound represented by the formula (1) is 0.01 or more and 5 or less, X 1 is a group represented by −CH 2 −, a is 0, and b is 0. By using the polymaleimide compound BMI-2300, a resin composition having good solubility in methyl ethyl ketone was obtained.
By using a kumaron resin having a softening point of 85 to 105 ° C. and a weight average molecular weight of 700 to 800, high heat resistance (Tg) can be achieved with a small amount of about 1 to 3 parts by mass in 100 parts by mass of the resin component of the resin composition. A cured product having a low dielectric weight (Dk) and a low dielectric loss tangent (Df) was obtained.

本発明は、高耐熱性および低誘電特性(低比誘電率、低誘電正接)を備えた硬化物となる樹脂組成物であり、当該樹脂組成物は、耐熱性および低誘電特性に優れた接着剤、封止剤、塗料、成形品、積層体およびプリント配線基板の原料として利用できる。
The present invention, high heat resistance Contact and low dielectric properties (low dielectric constant, low dielectric loss tangent) is a resin composition comprising a cured product having a said resin composition has excellent heat resistance and low dielectric properties It can be used as a raw material for adhesives, sealants, paints, molded products, laminates and printed wiring substrates.

Claims (10)

(A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られたプリント配線基板用の樹脂組成物であって、
前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部であり、
前記(D)クマロン樹脂は、軟化点が100℃以下であり、重量平均分子量が850以下である、樹脂組成物。
A resin composition for a printed wiring substrate obtained by melting a resin mixture containing (A) a polymaleimide compound, (B) benzoxazine, (C) an epoxy resin, and (D) a kumaron resin.
Wherein the resin component 100 parts by weight of the resin mixture, Ri content 40 to 70 parts by mass der of the (A) polymaleimide compound,
Wherein (D) coumarone resin, a softening point is not more 100 ° C. or less, the weight average molecular weight of Ru der 850 or less, the resin composition.
前記樹脂混合物の樹脂成分100質量部中における、前記(D)クマロン樹脂の含有量が0.1〜5質量部である、請求項1に記載の樹脂組成物。 The resin composition according to claim 1, wherein the content of the (D) kumaron resin in 100 parts by mass of the resin component of the resin mixture is 0.1 to 5 parts by mass. 前記樹脂混合物が、さらに(E)ビスフェノールA型シアネートエステルを含有しており、
前記樹脂混合物の樹脂成分100質量部中における、前記(E)ビスフェノールA型シアネートエステルの含有量が3〜7質量部である、請求項2に記載の樹脂組成物。
The resin mixture further contains (E) bisphenol A type cyanate ester.
The resin composition according to claim 2 , wherein the content of the (E) bisphenol A type cyanate ester in 100 parts by mass of the resin component of the resin mixture is 3 to 7 parts by mass.
前記(A)ポリマレイミド化合物が式(1)により表される、請求項1に記載の樹脂組成物。
Figure 0006946578
(前記式(1)において、n1は0以上10以下の整数であり、 1 はそれぞれ独立に炭素数1以上10以下のアルキレン基、下記式(2)で表される基、「−SO2−」で表される基、「−CO−」で表される基、酸素原子または単結合であり、R1はそれぞれ独立に炭素数1以上6以下の炭化水素基であり、aはそれぞれ独立に0以上4以下の整数であり、bはそれぞれ独立に0以上3以下の整数であり、繰り返し単位の数n1の平均値が0.01以上5以下である。)
Figure 0006946578
(前記式(2)において、Yは芳香族環を有する炭素数6以上30以下の炭化水素基であり、n2は1〜3の整数である。)
The resin composition according to claim 1, wherein the (A) polymaleimide compound is represented by the formula (1).
Figure 0006946578
(In the above formula (1), n 1 is an integer of 0 or more and 10 or less, and X 1 is an alkylene group having 1 or more and 10 or less carbon atoms independently, a group represented by the following formula (2), "-SO". A group represented by "2- ", a group represented by "-CO-", an oxygen atom or a single bond, R 1 is an independently hydrocarbon group having 1 or more carbon atoms and 6 or less carbon atoms, and a is each. Independently, it is an integer of 0 or more and 4 or less, b is an integer of 0 or more and 3 or less independently, and the average value of the number n 1 of the repeating units is 0.01 or more and 5 or less.)
Figure 0006946578
(In the above formula (2), Y is a hydrocarbon group having an aromatic ring and having 6 to 30 carbon atoms, and n 2 is an integer of 1 to 3).
前記樹脂混合物の樹脂成分100質量部における、前記(B)ベンゾオキサジンの含有量が10〜30質量部である、請求項1に記載の樹脂組成物。 The resin composition according to claim 1, wherein the content of (B) benzoxazine in 100 parts by mass of the resin component of the resin mixture is 10 to 30 parts by mass. 前記(C)エポキシ樹脂が、α−ナフトール型エポキシ樹脂を含有しており、
前記樹脂混合物の樹脂成分100質量部中における、前記α−ナフトール型エポキシ樹脂の含有量が10〜30質量部である、請求項1に記載の樹脂組成物。
The (C) epoxy resin contains an α-naphthol type epoxy resin, and the epoxy resin (C) contains an α-naphthol type epoxy resin.
The resin composition according to claim 1, wherein the content of the α-naphthol type epoxy resin in 100 parts by mass of the resin component of the resin mixture is 10 to 30 parts by mass.
前記樹脂混合物中に含有される前記(A)ポリマレイミド化合物100質量部のうち、溶融混合工程後の樹脂組成物中に残マレイミド化合物として残存する前記(A)ポリマレイミド化合物が30〜60質量部となるように、各成分を溶融して得られた請求項1〜6のいずれか一項に記載の樹脂組成物。 Of the 100 parts by mass of the (A) polymaleimide compound contained in the resin mixture, 30 to 60 parts by mass of the (A) polymaleimide compound remaining as a residual maleimide compound in the resin composition after the melt mixing step. The resin composition according to any one of claims 1 to 6 , which is obtained by melting each component so as to be. (A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られた樹脂組成物であって、
前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部であり、前記(D)クマロン樹脂は、軟化点が100℃以下であり、重量平均分子量が850以下である樹脂組成物を、沸点が120℃以下かつ誘電率が10〜30の溶剤に溶解させたワニス。
A resin composition obtained by melting a resin mixture containing (A) a polymaleimide compound, (B) benzoxazine, (C) an epoxy resin, and (D) a kumaron resin.
Wherein the resin component 100 parts by weight of the resin mixture, Ri is 40 to 70 parts by der content of the (A) polymaleimide compound, the (D) coumarone resin, a softening point is not more 100 ° C. or less, by weight varnishes average molecular weight of 850 or less der Ru resin composition having a boiling point of 120 ° C. or less and a dielectric constant was dissolved in 10 to 30 solvents.
(A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られた樹脂組成物であって、
前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部であり、前記(D)クマロン樹脂は、軟化点が100℃以下であり、重量平均分子量が850以下である樹脂組成物を用いて製造された積層板。
A resin composition obtained by melting a resin mixture containing (A) a polymaleimide compound, (B) benzoxazine, (C) an epoxy resin, and (D) a kumaron resin.
Wherein the resin component 100 parts by weight of the resin mixture, Ri is 40 to 70 parts by der content of the (A) polymaleimide compound, the (D) coumarone resin, a softening point is not more 100 ° C. or less, by weight laminates average molecular weight was prepared using a 850 or less der Ru resin composition.
(A)ポリマレイミド化合物、(B)ベンゾオキサジン、(C)エポキシ樹脂、および(D)クマロン樹脂を含有する樹脂混合物を溶融して得られた樹脂組成物であって、
前記樹脂混合物の樹脂成分100質量部中における、前記(A)ポリマレイミド化合物の含有量が40〜70質量部であり、前記(D)クマロン樹脂は、軟化点が100℃以下であり、重量平均分子量が850以下である樹脂組成物を用いて製造されたプリント配線基板。
A resin composition obtained by melting a resin mixture containing (A) a polymaleimide compound, (B) benzoxazine, (C) an epoxy resin, and (D) a kumaron resin.
Wherein the resin component 100 parts by weight of the resin mixture, Ri is 40 to 70 parts by der content of the (A) polymaleimide compound, the (D) coumarone resin, a softening point is not more 100 ° C. or less, by weight printed circuit board having an average molecular weight was prepared using a der Ru resin composition 850 or less.
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