AU2002318602A1 - Curable resin composition - Google Patents
Curable resin compositionInfo
- Publication number
- AU2002318602A1 AU2002318602A1 AU2002318602A AU2002318602A AU2002318602A1 AU 2002318602 A1 AU2002318602 A1 AU 2002318602A1 AU 2002318602 A AU2002318602 A AU 2002318602A AU 2002318602 A AU2002318602 A AU 2002318602A AU 2002318602 A1 AU2002318602 A1 AU 2002318602A1
- Authority
- AU
- Australia
- Prior art keywords
- resin composition
- curable resin
- curable
- composition
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2002/007360 WO2004009708A1 (en) | 2002-07-19 | 2002-07-19 | Curable resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002318602A1 true AU2002318602A1 (en) | 2004-02-09 |
Family
ID=30490763
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002318602A Abandoned AU2002318602A1 (en) | 2002-07-19 | 2002-07-19 | Curable resin composition |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2004009708A1 (en) |
AU (1) | AU2002318602A1 (en) |
WO (1) | WO2004009708A1 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2218748B1 (en) * | 2005-09-03 | 2012-10-10 | Samsung SDI Co., Ltd. | Polybenzoxazine-based compound, electrolyte membrane including the same, and fuel cell employing the electrolyte membrane |
KR100818255B1 (en) | 2006-05-29 | 2008-04-02 | 삼성에스디아이 주식회사 | Polybenzoxazines, an electrolyte membrane comprising the same and fuel cell employing the electrolyte membrane |
KR100745741B1 (en) | 2006-08-22 | 2007-08-02 | 삼성에스디아이 주식회사 | Membrane and electrode assembly for fuel cell and fuel cell employing the same |
EP2036910B1 (en) | 2007-09-11 | 2012-06-27 | Samsung Electronics Co., Ltd. | Benzoxazine-based monomer, polymer thereof, electrode for fuel cell including the same, electrolyte membrane for fuel cell includind the same, and fuel cell using the same |
EP2036912B1 (en) | 2007-09-11 | 2012-08-08 | Samsung Electronics Co., Ltd. | Phosphorous containing benzoxazine-based monomer, polymer thererof, electrode for fuel cell including the same, electrolyte membrane for fuel cell including the same, and fuel cell employing the same |
KR101366808B1 (en) | 2007-10-11 | 2014-02-25 | 삼성전자주식회사 | Polybenzimidazole-base complex, crosslinked material of polybenzoxazines formed thereof, and fuel cell using the same |
US8227138B2 (en) | 2007-11-02 | 2012-07-24 | Samsung Electronics Co., Ltd. | Phosphorus containing benzoxazine-based monomer, polymer thereof, electrode for fuel cell including the polymer, electrolyte membrane for fuel cell including the polymer, and fuel cell using the electrode |
EP2357185B1 (en) | 2007-11-02 | 2014-04-23 | Samsung Electronics Co., Ltd. | Naphthoxazine Benzoxazine-Based Monomer and Polymer Thereof |
KR101537311B1 (en) | 2007-11-02 | 2015-07-17 | 삼성전자주식회사 | Electrolyte Membrane for fuel cell and fuel cell using the same |
KR101037795B1 (en) * | 2007-11-02 | 2011-05-27 | 삼성전자주식회사 | Naphthoxazine benzoxazine-based monomer, polymer thereof, electrode for fuel cell including the same, electrolyte membrane for fuel cell including the same, and fuel cell using the same |
EP2221302B1 (en) | 2007-11-06 | 2012-03-21 | Samsung Electronics Co., Ltd. | Pyrido-oxazine-based monomer, polymer thereof, electrode for fuel cell including the polymer, electrolyte membrane for fuel cell including the polymer, and fuel cell using the electrode |
JP7054459B2 (en) | 2017-05-15 | 2022-04-14 | 三菱瓦斯化学株式会社 | Lithographic film forming material, lithographic film forming composition, lithographic underlayer film and pattern forming method |
JP7360630B2 (en) | 2018-02-28 | 2023-10-13 | 三菱瓦斯化学株式会社 | Compounds, resins, compositions, and film-forming materials for lithography using the same |
CN112400138A (en) | 2018-06-26 | 2021-02-23 | 三菱瓦斯化学株式会社 | Material for forming film for lithography, composition for forming film for lithography, underlayer film for lithography, and pattern formation method |
US20210309595A1 (en) | 2018-07-31 | 2021-10-07 | Mitsubishi Gas Chemical Company, Inc. | Composition for forming optical component, optical component, compound, and resin |
US20210165327A1 (en) | 2018-08-20 | 2021-06-03 | Mitsubishi Gas Chemical Company, Inc. | Film forming material for lithography, composition for film formation for lithography, underlayer film for lithography, and method for forming pattern |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1437814A (en) * | 1972-05-09 | 1976-06-03 | Sued West Chemie Gmbh | Polymerisable and or hardenable products |
JP3893648B2 (en) * | 1996-10-25 | 2007-03-14 | 日立化成工業株式会社 | High dielectric constant resin composition, high dielectric constant prepreg, and high dielectric constant laminate |
JPH11282155A (en) * | 1998-03-27 | 1999-10-15 | Hitachi Chem Co Ltd | Photosensitive resin composition and production of solder resist using that |
-
2002
- 2002-07-19 JP JP2004522700A patent/JPWO2004009708A1/en active Pending
- 2002-07-19 AU AU2002318602A patent/AU2002318602A1/en not_active Abandoned
- 2002-07-19 WO PCT/JP2002/007360 patent/WO2004009708A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JPWO2004009708A1 (en) | 2005-11-17 |
WO2004009708A1 (en) | 2004-01-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |