WO2003098701A1 - Diode varactor semi-conductrice et circuit oscillant la comprenant - Google Patents
Diode varactor semi-conductrice et circuit oscillant la comprenant Download PDFInfo
- Publication number
- WO2003098701A1 WO2003098701A1 PCT/EP2003/005132 EP0305132W WO03098701A1 WO 2003098701 A1 WO2003098701 A1 WO 2003098701A1 EP 0305132 W EP0305132 W EP 0305132W WO 03098701 A1 WO03098701 A1 WO 03098701A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor
- varactor
- varactor according
- voltage
- semiconductor varactor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 75
- 239000000758 substrate Substances 0.000 claims description 17
- 239000012212 insulator Substances 0.000 claims description 5
- 238000004904 shortening Methods 0.000 abstract description 4
- 239000003990 capacitor Substances 0.000 description 21
- 230000003071 parasitic effect Effects 0.000 description 20
- 239000000463 material Substances 0.000 description 16
- 238000009413 insulation Methods 0.000 description 13
- 239000004020 conductor Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000002800 charge carrier Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000013641 positive control Substances 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000012995 silicone-based technology Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/0805—Capacitors only
- H01L27/0808—Varactor diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors with potential-jump barrier or surface barrier
- H01L29/93—Variable capacitance diodes, e.g. varactors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors with potential-jump barrier or surface barrier
- H01L29/94—Metal-insulator-semiconductors, e.g. MOS
Abstract
L'invention concerne une diode varactor semi-conductrice comportant une première capacité (103, 107) asservie en tension et une deuxième capacité (103, 109) asservie en tension et couplée en série avec la première. Ces deux capacités asservies en tension comprennent chacune une électrode collectrice (107, 109) ainsi qu'une zone semi-conductrice commune (103), par laquelle lesdites capacités asservies en tension sont couplées en série. Le couplage en série des capacités asservies en tension permet de disposer les électrodes collectrices (107, 109) à faible distance l'une de l'autre et de réduire ainsi le cheminement du signal dans son ensemble.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10222764.0 | 2002-05-15 | ||
DE2002122764 DE10222764B4 (de) | 2002-05-15 | 2002-05-15 | Halbleitervaraktor und damit aufgebauter Oszillator |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003098701A1 true WO2003098701A1 (fr) | 2003-11-27 |
Family
ID=29285650
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/005132 WO2003098701A1 (fr) | 2002-05-15 | 2003-05-15 | Diode varactor semi-conductrice et circuit oscillant la comprenant |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE10222764B4 (fr) |
WO (1) | WO2003098701A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7323763B2 (en) | 2004-07-08 | 2008-01-29 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device having an improved voltage controlled oscillator |
WO2018194743A1 (fr) * | 2017-04-21 | 2018-10-25 | Qualcomm Incorporated | Structures de condensateur variable ayant une résistance de canal réduite |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CZ2012939A3 (cs) * | 2012-12-20 | 2014-08-20 | Vysoké Učení Technické V Brně | Elektronicky přeladitelné oscilátory s fraktálními prvky |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1541097A (fr) * | 1967-08-23 | 1968-10-04 | Europ Des Semiconducteurs Soc | Perfectionnements aux diodes semiconductrices à capacité variable et à leurs procédés de fabrication |
US4005466A (en) * | 1975-05-07 | 1977-01-25 | Rca Corporation | Planar voltage variable tuning capacitors |
GB2060250A (en) * | 1979-03-12 | 1981-04-29 | Clarion Co Ltd | Controllable Semiconductor Capacitors |
EP0169122A1 (fr) * | 1984-07-03 | 1986-01-22 | Thomson-Csf | Elément à capacité variable, commandable par une tension continue |
US5220194A (en) * | 1989-11-27 | 1993-06-15 | Motorola, Inc. | Tunable capacitor with RF-DC isolation |
US5283462A (en) * | 1991-11-04 | 1994-02-01 | Motorola, Inc. | Integrated distributed inductive-capacitive network |
EP0893831A1 (fr) * | 1997-07-23 | 1999-01-27 | STMicroelectronics S.r.l. | Condensateur à haute tension |
US6100770A (en) * | 1997-09-11 | 2000-08-08 | Telefonaktiebolaget Lm Ericsson (Publ) | MIS transistor varactor device and oscillator using same |
EP1113498A2 (fr) * | 1999-12-29 | 2001-07-04 | Motorola, Inc. | Condensateur variable en fonction de la tension avec C-V linéarité améliorée |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2327810B (en) * | 1997-02-07 | 1999-06-09 | United Microelectronics Corp | Manufacturing integrated circuit devices with different gate oxide thicknesses |
-
2002
- 2002-05-15 DE DE2002122764 patent/DE10222764B4/de not_active Expired - Fee Related
-
2003
- 2003-05-15 WO PCT/EP2003/005132 patent/WO2003098701A1/fr not_active Application Discontinuation
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1541097A (fr) * | 1967-08-23 | 1968-10-04 | Europ Des Semiconducteurs Soc | Perfectionnements aux diodes semiconductrices à capacité variable et à leurs procédés de fabrication |
US4005466A (en) * | 1975-05-07 | 1977-01-25 | Rca Corporation | Planar voltage variable tuning capacitors |
GB2060250A (en) * | 1979-03-12 | 1981-04-29 | Clarion Co Ltd | Controllable Semiconductor Capacitors |
EP0169122A1 (fr) * | 1984-07-03 | 1986-01-22 | Thomson-Csf | Elément à capacité variable, commandable par une tension continue |
US5220194A (en) * | 1989-11-27 | 1993-06-15 | Motorola, Inc. | Tunable capacitor with RF-DC isolation |
US5283462A (en) * | 1991-11-04 | 1994-02-01 | Motorola, Inc. | Integrated distributed inductive-capacitive network |
EP0893831A1 (fr) * | 1997-07-23 | 1999-01-27 | STMicroelectronics S.r.l. | Condensateur à haute tension |
US6100770A (en) * | 1997-09-11 | 2000-08-08 | Telefonaktiebolaget Lm Ericsson (Publ) | MIS transistor varactor device and oscillator using same |
EP1113498A2 (fr) * | 1999-12-29 | 2001-07-04 | Motorola, Inc. | Condensateur variable en fonction de la tension avec C-V linéarité améliorée |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7323763B2 (en) | 2004-07-08 | 2008-01-29 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device having an improved voltage controlled oscillator |
DE102005030658B4 (de) * | 2004-07-08 | 2015-01-15 | Mitsubishi Denki K.K. | Halbleitervorrichtung mit einer verbesserten spannungsgesteuerten Oszillatorschaltung |
WO2018194743A1 (fr) * | 2017-04-21 | 2018-10-25 | Qualcomm Incorporated | Structures de condensateur variable ayant une résistance de canal réduite |
Also Published As
Publication number | Publication date |
---|---|
DE10222764A1 (de) | 2003-11-27 |
DE10222764B4 (de) | 2011-06-01 |
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