WO2003096769A1 - Systeme de traitement par reaction haute frequence - Google Patents
Systeme de traitement par reaction haute frequence Download PDFInfo
- Publication number
- WO2003096769A1 WO2003096769A1 PCT/JP2003/005662 JP0305662W WO03096769A1 WO 2003096769 A1 WO2003096769 A1 WO 2003096769A1 JP 0305662 W JP0305662 W JP 0305662W WO 03096769 A1 WO03096769 A1 WO 03096769A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- high frequency
- outer container
- processing system
- coupling section
- reaction processing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/126—Microwaves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/129—Radiofrequency
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- ing And Chemical Polishing (AREA)
Abstract
L'invention concerne un système de traitement par réaction haute fréquence, comprenant un contenant extérieur (40) constitué d'un matériau diélectrique et possédant deux faces d'extrémité fermant la cavité intérieure, une ou plusieurs sections de couplage haute fréquence (42) disposées à une position arbitraire sur la surface extérieure du contenant extérieur (40), un ou plusieurs contenants intérieurs (41) constitués d'un matériau diélectrique et possédant chacun deux faces d'extrémité fermant la cavité intérieure, ces contenants intérieurs étant disposés de façon à recevoir une onde haute fréquence arrivant par la section de couplage haute fréquence (42) sans toucher la face latérale intérieure du contenant extérieur (40), ainsi qu'une partie (43) en matériau conducteur destinée à recouvrir la surface extérieure du contenant extérieur à l'exception de la partie pourvue de la section de couplage haute fréquence (42), le potentiel étant maintenu à un niveau égal au potentiel de terre d'une ligne haute fréquence.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/513,427 US20050212626A1 (en) | 2002-05-07 | 2003-05-06 | High frequency reaction processing system |
JP2004508507A JP3637397B2 (ja) | 2002-05-07 | 2003-05-06 | 高周波反応処理装置 |
Applications Claiming Priority (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002167850 | 2002-05-07 | ||
JP2002-167849 | 2002-05-07 | ||
JP2002167849 | 2002-05-07 | ||
JP2002-167850 | 2002-05-07 | ||
JP2002-307627 | 2002-09-17 | ||
JP2002307627 | 2002-09-17 | ||
JP2002-307626 | 2002-09-17 | ||
JP2002307626 | 2002-09-17 | ||
JP2003-38959 | 2003-01-14 | ||
JP2003038959 | 2003-01-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2003096769A1 true WO2003096769A1 (fr) | 2003-11-20 |
Family
ID=29424811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2003/005662 WO2003096769A1 (fr) | 2002-05-07 | 2003-05-06 | Systeme de traitement par reaction haute frequence |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP3637397B2 (fr) |
WO (1) | WO2003096769A1 (fr) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007520880A (ja) * | 2004-01-12 | 2007-07-26 | アクセリス テクノロジーズ インコーポレーテッド | プラズマリアクター用のガス分配プレートアセンブリ |
JP2008177131A (ja) * | 2007-01-22 | 2008-07-31 | Shibaura Mechatronics Corp | プラズマ発生装置、プラズマ処理装置及びプラズマ処理方法 |
JP2013134837A (ja) * | 2011-12-26 | 2013-07-08 | Tokyo Electron Ltd | プラズマ生成装置及びプラズマ処理装置 |
JP2014524106A (ja) * | 2011-06-24 | 2014-09-18 | リカーボン,インコーポレイテッド | マイクロ波共鳴空洞 |
JP2015128742A (ja) * | 2014-01-07 | 2015-07-16 | マイクロ波化学株式会社 | 化学反応装置、及び化学反応方法 |
JP2015142904A (ja) * | 2014-11-13 | 2015-08-06 | マイクロ波化学株式会社 | 化学反応装置、及び化学反応方法 |
KR101614028B1 (ko) | 2013-05-27 | 2016-04-20 | 가부시키가이샤 아도테쿠 프라즈마 테쿠노로지 | 마이크로파 플라즈마 발생장치의 공동 공진기 |
JP2016520797A (ja) * | 2013-03-13 | 2016-07-14 | ラドム コーポレイションRadom Corporation | 誘電体共振器を使用するマイクロ波プラズマ分光計 |
US10337998B2 (en) | 2017-02-17 | 2019-07-02 | Radom Corporation | Plasma generator assembly for mass spectroscopy |
JPWO2021192810A1 (fr) * | 2020-03-23 | 2021-09-30 | ||
WO2024024817A1 (fr) * | 2022-07-27 | 2024-02-01 | 株式会社アビット・テクノロジーズ | Dispositif de génération de plasma à micro-ondes, dispositif de traitement au plasma à micro-ondes et procédé de traitement au plasma à micro-ondes |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6471097A (en) * | 1987-09-10 | 1989-03-16 | Mitsubishi Electric Corp | Plasma device |
US5082517A (en) * | 1990-08-23 | 1992-01-21 | Texas Instruments Incorporated | Plasma density controller for semiconductor device processing equipment |
US5235251A (en) * | 1991-08-09 | 1993-08-10 | The United States Of America As Represented By The Secretary Of The Air Force | Hydraulic fluid cooling of high power microwave plasma tubes |
US5262610A (en) * | 1991-03-29 | 1993-11-16 | The United States Of America As Represented By The Air Force | Low particulate reliability enhanced remote microwave plasma discharge device |
JPH0760111A (ja) * | 1993-08-26 | 1995-03-07 | Toshiba Corp | 光反応装置 |
JPH09115894A (ja) * | 1995-07-10 | 1997-05-02 | Applied Materials Inc | マイクロ波プラズマベースアプリケータ |
JPH09312285A (ja) * | 1996-02-14 | 1997-12-02 | Applied Materials Inc | 二重壁式マイクロ波プラズマアプリケータ |
JP2000260596A (ja) * | 1999-03-11 | 2000-09-22 | Hitachi Ltd | プラズマ装置 |
JP2003096570A (ja) * | 2001-09-20 | 2003-04-03 | Kobe Steel Ltd | プラズマ処理方法及び装置 |
JP2003159314A (ja) * | 2001-11-27 | 2003-06-03 | Hitachi Ltd | 紫外線殺菌処理装置 |
-
2003
- 2003-05-06 WO PCT/JP2003/005662 patent/WO2003096769A1/fr active Application Filing
- 2003-05-06 JP JP2004508507A patent/JP3637397B2/ja not_active Expired - Lifetime
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6471097A (en) * | 1987-09-10 | 1989-03-16 | Mitsubishi Electric Corp | Plasma device |
US5082517A (en) * | 1990-08-23 | 1992-01-21 | Texas Instruments Incorporated | Plasma density controller for semiconductor device processing equipment |
US5262610A (en) * | 1991-03-29 | 1993-11-16 | The United States Of America As Represented By The Air Force | Low particulate reliability enhanced remote microwave plasma discharge device |
US5235251A (en) * | 1991-08-09 | 1993-08-10 | The United States Of America As Represented By The Secretary Of The Air Force | Hydraulic fluid cooling of high power microwave plasma tubes |
JPH0760111A (ja) * | 1993-08-26 | 1995-03-07 | Toshiba Corp | 光反応装置 |
JPH09115894A (ja) * | 1995-07-10 | 1997-05-02 | Applied Materials Inc | マイクロ波プラズマベースアプリケータ |
JPH09312285A (ja) * | 1996-02-14 | 1997-12-02 | Applied Materials Inc | 二重壁式マイクロ波プラズマアプリケータ |
JP2000260596A (ja) * | 1999-03-11 | 2000-09-22 | Hitachi Ltd | プラズマ装置 |
JP2003096570A (ja) * | 2001-09-20 | 2003-04-03 | Kobe Steel Ltd | プラズマ処理方法及び装置 |
JP2003159314A (ja) * | 2001-11-27 | 2003-06-03 | Hitachi Ltd | 紫外線殺菌処理装置 |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007520880A (ja) * | 2004-01-12 | 2007-07-26 | アクセリス テクノロジーズ インコーポレーテッド | プラズマリアクター用のガス分配プレートアセンブリ |
JP2008177131A (ja) * | 2007-01-22 | 2008-07-31 | Shibaura Mechatronics Corp | プラズマ発生装置、プラズマ処理装置及びプラズマ処理方法 |
JP2014524106A (ja) * | 2011-06-24 | 2014-09-18 | リカーボン,インコーポレイテッド | マイクロ波共鳴空洞 |
JP2013134837A (ja) * | 2011-12-26 | 2013-07-08 | Tokyo Electron Ltd | プラズマ生成装置及びプラズマ処理装置 |
US10285256B2 (en) | 2013-03-13 | 2019-05-07 | Radom Corporation | Microwave plasma spectrometer using dielectric resonator |
US10863611B2 (en) | 2013-03-13 | 2020-12-08 | Radom Corporation | Microwave plasma spectrometer using dielectric resonator |
JP2016520797A (ja) * | 2013-03-13 | 2016-07-14 | ラドム コーポレイションRadom Corporation | 誘電体共振器を使用するマイクロ波プラズマ分光計 |
JP2016522533A (ja) * | 2013-03-13 | 2016-07-28 | ラドム コーポレイションRadom Corporation | 誘電体共振器を使用するプラズマ発生器 |
KR101614028B1 (ko) | 2013-05-27 | 2016-04-20 | 가부시키가이샤 아도테쿠 프라즈마 테쿠노로지 | 마이크로파 플라즈마 발생장치의 공동 공진기 |
JP2015128742A (ja) * | 2014-01-07 | 2015-07-16 | マイクロ波化学株式会社 | 化学反応装置、及び化学反応方法 |
JP2015142904A (ja) * | 2014-11-13 | 2015-08-06 | マイクロ波化学株式会社 | 化学反応装置、及び化学反応方法 |
US10337998B2 (en) | 2017-02-17 | 2019-07-02 | Radom Corporation | Plasma generator assembly for mass spectroscopy |
US10900907B2 (en) | 2017-02-17 | 2021-01-26 | Radom Corporation | Portable plasma source for optical spectroscopy |
JPWO2021192810A1 (fr) * | 2020-03-23 | 2021-09-30 | ||
WO2021192810A1 (fr) * | 2020-03-23 | 2021-09-30 | 株式会社エス・エス・ティ | Dispositif de traitement par réaction à haute fréquence et système de traitement par réaction à haute fréquence |
JP7289170B2 (ja) | 2020-03-23 | 2023-06-09 | 株式会社エス・エス・ティ | 高周波反応処理装置および高周波反応処理システム |
WO2024024817A1 (fr) * | 2022-07-27 | 2024-02-01 | 株式会社アビット・テクノロジーズ | Dispositif de génération de plasma à micro-ondes, dispositif de traitement au plasma à micro-ondes et procédé de traitement au plasma à micro-ondes |
Also Published As
Publication number | Publication date |
---|---|
JP3637397B2 (ja) | 2005-04-13 |
JPWO2003096769A1 (ja) | 2005-09-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2001073892A3 (fr) | Antenne ou antenne reseau, a rayonnement longitudinal, dotee d'une impedance reglable | |
WO2005101286A3 (fr) | Traitement de signaux au moyen de circuits optoelectroniques regenerateurs | |
AU2001276986A1 (en) | Tunable microwave devices with auto-adjusting matching circuit | |
WO2003096769A1 (fr) | Systeme de traitement par reaction haute frequence | |
EP1109251A3 (fr) | Unité d'antenne et appareil de communication l'utilisant | |
TW343323B (en) | Thin radio frequency transponder with leadframe antenna structure | |
EP1052722A3 (fr) | Antenne | |
EP1291954A3 (fr) | Dispositif radiofréquence et appareil de communication l' utilisant | |
EP1376669A4 (fr) | Dispositif de traitement au plasma | |
AU2001271788A1 (en) | Hydrophobic coating with dlc and fas on substrate | |
WO2002016973A3 (fr) | Dispositifs electroniques et optiques et procedes de realisation | |
WO2005043670A3 (fr) | Dispositif de communication dote d'un systeme d'antenne interne | |
AU2003288453A1 (en) | Frequency shift keying radar with ambiguity detection | |
EP1375004A4 (fr) | Electrode pour appareil de broyage et appareil de broyage | |
WO2008068351A3 (fr) | Tube electronique a cathode froide a commande optique | |
EP1589603A3 (fr) | Dispositif diélectrique | |
AU9449998A (en) | Composite resonator | |
EP2077603A3 (fr) | Antenne rayonnante diélectrique à fuites | |
AU4702699A (en) | Pivotable multiple frequency band antenna with capacitive coupling | |
TW200503321A (en) | High frequency filter in the form of a duplex filter | |
AU2001273465A1 (en) | Integrated tunable surface acoustic wave technology and systems provided thereby | |
WO1998033243A3 (fr) | Connecteur enfichable coaxial hf | |
USD496655S1 (en) | Keyboard of an electronic communication device | |
WO2002101774A3 (fr) | Fenetre segmentee a infrarouge, geree par signature rf | |
WO2004051787A3 (fr) | Couplage accordable |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): CN JP KR US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2004508507 Country of ref document: JP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10513427 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase |