WO2003093903A3 - Projektionsverfahren mit pupillenfilterung und projektionsobjektiv hierfür - Google Patents

Projektionsverfahren mit pupillenfilterung und projektionsobjektiv hierfür Download PDF

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Publication number
WO2003093903A3
WO2003093903A3 PCT/EP2003/004013 EP0304013W WO03093903A3 WO 2003093903 A3 WO2003093903 A3 WO 2003093903A3 EP 0304013 W EP0304013 W EP 0304013W WO 03093903 A3 WO03093903 A3 WO 03093903A3
Authority
WO
WIPO (PCT)
Prior art keywords
mirror
projection lens
projection
filtration
pupillary
Prior art date
Application number
PCT/EP2003/004013
Other languages
English (en)
French (fr)
Other versions
WO2003093903A2 (de
Inventor
Hubert Holderer
Christian Hembd-Soellner
Buenau Rudolf Von
Ulrich Haag
Original Assignee
Zeiss Carl Smt Ag
Hubert Holderer
Christian Hembd-Soellner
Buenau Rudolf Von
Ulrich Haag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Hubert Holderer, Christian Hembd-Soellner, Buenau Rudolf Von, Ulrich Haag filed Critical Zeiss Carl Smt Ag
Priority to AU2003224089A priority Critical patent/AU2003224089A1/en
Priority to JP2004502062A priority patent/JP4398363B2/ja
Priority to EP03720487A priority patent/EP1504308A2/de
Publication of WO2003093903A2 publication Critical patent/WO2003093903A2/de
Publication of WO2003093903A3 publication Critical patent/WO2003093903A3/de
Priority to US10/975,496 priority patent/US7336342B2/en
Priority to US12/036,903 priority patent/US7791711B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Abstract

Ein katadioptrisches Projektionsobjektiv hat eine Vielzahl von optischen Elementen, die entlang einer optischen Achse angeordnet sind und mindestens einen im Bereich einer Pupillenfläche des Projektionsobjektivs angeordneten Konkavspiegel umfassen. Der Konkavspiegel ist in eine Anzahl von ringförmigen oder wabenförmigen Spiegelsegmenten unterteilt, die mit Hilfe piezoelektrischer Antriebselemente unabhängig voneinander relativ zueinander beweglich sind. Der Spiegel kann als phasenschiebender Pupillenfilter verwendet werden, wobei die Filterfunktion durch Relativverschiebung der Spiegelelemente gegeneinander eingestellt werden kann.
PCT/EP2003/004013 2002-04-29 2003-04-17 Projektionsverfahren mit pupillenfilterung und projektionsobjektiv hierfür WO2003093903A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AU2003224089A AU2003224089A1 (en) 2002-04-29 2003-04-17 Projection method comprising pupillary filtration and a projection lens therefor
JP2004502062A JP4398363B2 (ja) 2002-04-29 2003-04-17 ひとみフィルタリングを含む投影方法及びそのための投影レンズ
EP03720487A EP1504308A2 (de) 2002-04-29 2003-04-17 Projektionsverfahren mit pupillenfilterung und projektionsobjektiv hierfür
US10/975,496 US7336342B2 (en) 2002-04-29 2004-10-29 Projection method including pupillary filtering and a projection lens therefor
US12/036,903 US7791711B2 (en) 2002-04-29 2008-02-25 Projection method including pupillary filtering and a projection lens therefor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10220324A DE10220324A1 (de) 2002-04-29 2002-04-29 Projektionsverfahren mit Pupillenfilterung und Projektionsobjektiv hierfür
DE10220324.5 2002-04-29

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/975,496 Continuation US7336342B2 (en) 2002-04-29 2004-10-29 Projection method including pupillary filtering and a projection lens therefor

Publications (2)

Publication Number Publication Date
WO2003093903A2 WO2003093903A2 (de) 2003-11-13
WO2003093903A3 true WO2003093903A3 (de) 2004-07-01

Family

ID=29225081

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/004013 WO2003093903A2 (de) 2002-04-29 2003-04-17 Projektionsverfahren mit pupillenfilterung und projektionsobjektiv hierfür

Country Status (6)

Country Link
US (2) US7336342B2 (de)
EP (1) EP1504308A2 (de)
JP (1) JP4398363B2 (de)
AU (1) AU2003224089A1 (de)
DE (1) DE10220324A1 (de)
WO (1) WO2003093903A2 (de)

Cited By (1)

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JP7431319B2 (ja) 2019-09-10 2024-02-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィプロセスのサブフィールド制御及び関連する装置

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DE102006018928A1 (de) * 2006-04-24 2007-11-08 Carl Zeiss Smt Ag Projektionsbelichtungssystem und Verwendung desselben
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EP1890191A1 (de) 2006-08-14 2008-02-20 Carl Zeiss SMT AG Katadioptrisches Projektionsobjektiv mit einem Pupillenspiegel
DE102006045075A1 (de) * 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
US7817252B2 (en) * 2006-09-29 2010-10-19 Intel Corporation Holder for carrying a photolithography mask in a flattened condition
US20080259304A1 (en) * 2007-04-20 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and method
JP5579063B2 (ja) * 2007-08-24 2014-08-27 カール・ツァイス・エスエムティー・ゲーエムベーハー 制御可能な光学素子、熱アクチュエータによる光学素子の操作方法および半導体リソグラフィのための投影露光装置
DE102008022014B3 (de) * 2008-05-02 2009-11-26 Trumpf Laser- Und Systemtechnik Gmbh Dynamische Strahlumlenkung eines Laserstrahls
CA2731109C (en) * 2008-07-30 2017-05-09 Micro Motion, Inc. Optimizing processor operation in a processing system including one or more digital filters
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WO2011044463A1 (en) * 2009-10-09 2011-04-14 Massachusetts Institute Of Technology System, method and apparatus for contrast enhanced multiplexing of images
DE102010040108A1 (de) * 2010-09-01 2012-03-01 Carl Zeiss Smt Gmbh Obskurationsblende
DE102011081259A1 (de) 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Anordnung zur Spiegeltemperaturmessung und/oder zur thermischen Aktuierung eines Spiegels in einer mikrolithographischen Projektionsbelichtungsanlage
DE102010043498A1 (de) * 2010-11-05 2012-05-10 Carl Zeiss Smt Gmbh Projektionsobjektiv einer für EUV ausgelegten mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum optischen Justieren eines Projektionsobjektives
JP6093753B2 (ja) 2011-03-23 2017-03-08 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖミラー機構、ｅｕｖミラー機構を備えた光学系、及びｅｕｖミラー機構を備えた光学系を操作する方法
DE102011005940A1 (de) * 2011-03-23 2012-09-27 Carl Zeiss Smt Gmbh EUV-Spiegelanordnung, optisches System mit EUV-Spiegelanordnung und Verfahren zum Betreiben eines optischen Systems mit EUV-Spiegelanordnung
JP6209518B2 (ja) 2011-09-21 2017-10-04 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置のミラーの熱作動用の構成体
DE102011086665A1 (de) * 2011-11-18 2013-05-23 Carl Zeiss Smt Gmbh Projektionsobjektiv einer mikrolithographischen Projektonsbelichtungsanlage
DE102013101711A1 (de) * 2013-02-21 2014-08-21 Carl Zeiss Microscopy Gmbh Objektiv und optisches Beobachtungsgerät
JP6339658B2 (ja) 2013-03-28 2018-06-06 カール・ツァイス・エスエムティー・ゲーエムベーハー 可変透過フィルタを有する対物系を含むマイクロリソグラフィ装置
WO2015007298A1 (en) 2013-07-17 2015-01-22 Carl Zeiss Smt Gmbh Microlithographic apparatus and method of varying a light irradiance distribution
DE102014206589A1 (de) 2014-04-04 2015-10-08 Carl Zeiss Smt Gmbh Verfahren zum Justieren eines Spiegels einer mikrolithographischen Projektionsbelichtungsanlage
DE102017208364A1 (de) * 2017-05-18 2018-11-22 Carl Zeiss Smt Gmbh Optisches system sowie verfahren
DE102022109577A1 (de) 2022-04-20 2023-10-26 Carl Zeiss Industrielle Messtechnik Gmbh Verfahren und Messkamera zur zweidimensionalen Vermessung von Gegenständen

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Publication number Priority date Publication date Assignee Title
JP7431319B2 (ja) 2019-09-10 2024-02-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィプロセスのサブフィールド制御及び関連する装置

Also Published As

Publication number Publication date
US7791711B2 (en) 2010-09-07
US20080143984A1 (en) 2008-06-19
JP2005524237A (ja) 2005-08-11
US7336342B2 (en) 2008-02-26
JP4398363B2 (ja) 2010-01-13
AU2003224089A1 (en) 2003-11-17
EP1504308A2 (de) 2005-02-09
US20050146701A1 (en) 2005-07-07
DE10220324A1 (de) 2003-11-13
AU2003224089A8 (en) 2003-11-17
WO2003093903A2 (de) 2003-11-13

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