WO2003048404A3 - Verfahren zur herstellung dünner, schwer löslicher beschichtungen - Google Patents

Verfahren zur herstellung dünner, schwer löslicher beschichtungen Download PDF

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Publication number
WO2003048404A3
WO2003048404A3 PCT/DE2002/004457 DE0204457W WO03048404A3 WO 2003048404 A3 WO2003048404 A3 WO 2003048404A3 DE 0204457 W DE0204457 W DE 0204457W WO 03048404 A3 WO03048404 A3 WO 03048404A3
Authority
WO
WIPO (PCT)
Prior art keywords
solid
starting materials
starting material
starting
solid mixture
Prior art date
Application number
PCT/DE2002/004457
Other languages
English (en)
French (fr)
Other versions
WO2003048404A2 (de
Inventor
Hans-Juergen Muffler
Marcus Baer
Felix Mueller
Christian-Herbert Fischer
Martha Christina Lux-Steiner
Original Assignee
Hahn Meitner Inst Berlin Gmbh
Hans-Juergen Muffler
Marcus Baer
Felix Mueller
Christian-Herbert Fischer
Martha Christina Lux-Steiner
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hahn Meitner Inst Berlin Gmbh, Hans-Juergen Muffler, Marcus Baer, Felix Mueller, Christian-Herbert Fischer, Martha Christina Lux-Steiner filed Critical Hahn Meitner Inst Berlin Gmbh
Priority to DE50210087T priority Critical patent/DE50210087D1/de
Priority to EP02798256A priority patent/EP1448808B1/de
Publication of WO2003048404A2 publication Critical patent/WO2003048404A2/de
Publication of WO2003048404A3 publication Critical patent/WO2003048404A3/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Bei bekannten Verfahren werden zur Reaktion zum Endprodukt der kationenspendende Ausgangsstoff in Feststoffform und der anionenspendende Ausgangsstoff in Gasform als Reaktantgas zusammengeführt. Insbesondere der anionenspendende Ausgangsstoff kann jedoch hochtoxisch sein, sodass er in seiner gasförmigen Erscheinungsform verfahrenstechnisch schwer zu handhaben ist. Bei dem erfindungsgemäßen Verfahren ist deshalb vorgesehen, beide Ausgangsstoffe als gut handhabbare Feststoffe in einem is Feststoffgemisch einzusetzen, wobei die Ausgangsstoffe bei den vorherrschenden Verfahrensbedingungen im Feststoffgemisch nicht miteinander und nicht untereinander reagieren. Nach dem Aufbringen des Feststoffgemisches auf ein Substrat mit beliebiger Morphologie wird die feste und trockene Ausgangsschicht zur Auslösung der chemischen Reaktion zwischen den festen Ausgangsstoffen mit einem Aktivierungsgas begast, das möglichst ungiftig ist und dessen Bestandteile nicht im Endprodukt enthalten sind. Somit ermöglicht das erfindungsgemäße Verfahren, das je nach Wahl der Ausgangsstoffe auch zur Herstellung von Chalkogenid-Beschichtungen oder von organischen Beschichtungen geeignet ist, eine verfahrenstechnisch einfache, sichere und kostengünstige Betriebsweise, insbesondere auch in großtechnischen Anwendungen.
PCT/DE2002/004457 2001-11-30 2002-11-29 Verfahren zur herstellung dünner, schwer löslicher beschichtungen WO2003048404A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE50210087T DE50210087D1 (de) 2001-11-30 2002-11-29 Verfahren zur herstellung dünner, schwer löslicher beschichtungen
EP02798256A EP1448808B1 (de) 2001-11-30 2002-11-29 Verfahren zur herstellung dünner, schwer löslicher beschichtungen

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10160504A DE10160504C2 (de) 2001-11-30 2001-11-30 Verfahren zur Herstellung dünner, schwer löslicher Beschichtungen
DE10160504.8 2001-11-30

Publications (2)

Publication Number Publication Date
WO2003048404A2 WO2003048404A2 (de) 2003-06-12
WO2003048404A3 true WO2003048404A3 (de) 2003-11-27

Family

ID=7708607

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2002/004457 WO2003048404A2 (de) 2001-11-30 2002-11-29 Verfahren zur herstellung dünner, schwer löslicher beschichtungen

Country Status (5)

Country Link
EP (1) EP1448808B1 (de)
AT (1) ATE361380T1 (de)
DE (2) DE10160504C2 (de)
ES (1) ES2284972T3 (de)
WO (1) WO2003048404A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0524066D0 (en) * 2005-11-25 2006-01-04 Chiron Srl 741 ii
DE102009037371B3 (de) * 2009-08-13 2011-03-17 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Beschichtungsvorrichtung mit Ultraschallzerstäuber
DE102011050684A1 (de) 2011-05-27 2012-11-29 Karlsruher Institut für Technologie Vorrichtung und Verfahren zur Herstellung von hoch porösen, kristallinen Oberflächenbeschichtungen

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998019963A1 (en) * 1996-11-08 1998-05-14 Spectra Science Corporation Synthesis of metal chalcogenide quantum dots from aqueous media
JPH1167677A (ja) * 1997-08-15 1999-03-09 Star Micronics Co Ltd オキシ硫化錫膜及びその製造方法
DE19831214A1 (de) * 1998-03-19 1999-09-30 Hahn Meitner Inst Berlin Gmbh Verfahren und Anordnung zur Herstellung dünner Metallchalkogenid-Schichten
WO2000060135A2 (de) * 1999-04-06 2000-10-12 Hahn-Meitner-Institut Berlin Gmbh Verfahren zur herstellung dünner, schwer löslicher beschichtungen

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998019963A1 (en) * 1996-11-08 1998-05-14 Spectra Science Corporation Synthesis of metal chalcogenide quantum dots from aqueous media
JPH1167677A (ja) * 1997-08-15 1999-03-09 Star Micronics Co Ltd オキシ硫化錫膜及びその製造方法
DE19831214A1 (de) * 1998-03-19 1999-09-30 Hahn Meitner Inst Berlin Gmbh Verfahren und Anordnung zur Herstellung dünner Metallchalkogenid-Schichten
WO2000060135A2 (de) * 1999-04-06 2000-10-12 Hahn-Meitner-Institut Berlin Gmbh Verfahren zur herstellung dünner, schwer löslicher beschichtungen

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
MÖLLER J ET AL: "CuInS2 and extremely thin absober in an eta solar cell", 2ND WORLD CONFERENCE AND EXHIBITION ON PHOTOVOLTAIC SOLAR ENERGY CONVERSION, WIEN (AT), 6 July 1998 (1998-07-06) - 10 July 1998 (1998-07-10), pages 209 - 211, XP002110735 *
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 08 30 June 1999 (1999-06-30) *

Also Published As

Publication number Publication date
DE50210087D1 (de) 2007-06-14
WO2003048404A2 (de) 2003-06-12
EP1448808A2 (de) 2004-08-25
ATE361380T1 (de) 2007-05-15
DE10160504A1 (de) 2003-06-12
DE10160504C2 (de) 2003-11-13
EP1448808B1 (de) 2007-05-02
ES2284972T3 (es) 2007-11-16

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