WO2003046663A3 - Charakterisierung der beleuchtungswinkelverteilung einer projektionsbelichtungs anlage - Google Patents

Charakterisierung der beleuchtungswinkelverteilung einer projektionsbelichtungs anlage Download PDF

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Publication number
WO2003046663A3
WO2003046663A3 PCT/EP2002/013430 EP0213430W WO03046663A3 WO 2003046663 A3 WO2003046663 A3 WO 2003046663A3 EP 0213430 W EP0213430 W EP 0213430W WO 03046663 A3 WO03046663 A3 WO 03046663A3
Authority
WO
WIPO (PCT)
Prior art keywords
illumination
lighting system
projection lighting
light source
measured
Prior art date
Application number
PCT/EP2002/013430
Other languages
English (en)
French (fr)
Other versions
WO2003046663A2 (de
Inventor
Nils Dieckmann
Original Assignee
Zeiss Carl Smt Ag
Nils Dieckmann
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Nils Dieckmann filed Critical Zeiss Carl Smt Ag
Priority to JP2003548036A priority Critical patent/JP2005510861A/ja
Priority to AU2002356748A priority patent/AU2002356748A1/en
Publication of WO2003046663A2 publication Critical patent/WO2003046663A2/de
Publication of WO2003046663A3 publication Critical patent/WO2003046663A3/de
Priority to US10/855,252 priority patent/US6985218B2/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Abstract

Zur Bestimmung von mindestens einer Kenngrösse, die für die Beleuchtungswinkelverteilung einer der Beleuchtung eines Gegenstandes dienenden Lichtquelle einer Projektionsbelichtungsanlage, insbesondere für die Mikrolithographie, charakteristisch ist, wird zunächst ein Filterelement (8) in den Bereich einer Pupillenebene einer Beleuchtungsoptik der Projektionsbelichtungsanlage eingebracht (28). Das Filterelement (8) weist eine in zur optischen Achse der Beleuchtungsoptik azimutaler Richtung variierende Filterfunktion auf. Anschliessend wird die Beleuchtungsintensität der Lichtquelle in einer Ebene im Strahlengang nach der Pupillenebene gemessen (29). Das Filterelement (8) wird dann um die optische Achse verdreht (30) und die Beleuchtungsintensität der Lichtquelle erneut vermessen (31). Zuletzt wird die mindestens eine Kenngrösse aus der Filterfunktion, dem Drehwinkel und den gemessenen Beleuchtungsintensitäten errechnet (32). Mit diesem Verfahren lässt sich die Kenngrösse schnell und präzise bestimmen.
PCT/EP2002/013430 2001-11-30 2002-11-28 Charakterisierung der beleuchtungswinkelverteilung einer projektionsbelichtungs anlage WO2003046663A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003548036A JP2005510861A (ja) 2001-11-30 2002-11-28 投影照明システムの照明角度分布の特性化
AU2002356748A AU2002356748A1 (en) 2001-11-30 2002-11-28 Characterization of the illumination angle distribution of a projection lighting system
US10/855,252 US6985218B2 (en) 2001-11-30 2004-05-27 Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10158921.2 2001-11-30
DE10158921A DE10158921A1 (de) 2001-11-30 2001-11-30 Verfahren zum Bestimmen von mindestens einer Kenngröße, die für die Beleuchtungswinkelverteilung einer der Beleuchtung eines Gegenstandes dienenden Lichtquelle einer Projektionsbelichtungsanlage charakteristisch ist

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/855,252 Continuation US6985218B2 (en) 2001-11-30 2004-05-27 Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus

Publications (2)

Publication Number Publication Date
WO2003046663A2 WO2003046663A2 (de) 2003-06-05
WO2003046663A3 true WO2003046663A3 (de) 2003-12-18

Family

ID=7707621

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/013430 WO2003046663A2 (de) 2001-11-30 2002-11-28 Charakterisierung der beleuchtungswinkelverteilung einer projektionsbelichtungs anlage

Country Status (5)

Country Link
US (1) US6985218B2 (de)
JP (1) JP2005510861A (de)
AU (1) AU2002356748A1 (de)
DE (1) DE10158921A1 (de)
WO (1) WO2003046663A2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003249967A1 (en) * 2003-07-07 2005-01-28 Carl Zeiss Smt Ag Lighting device for a microlithographic projection exposure system
DE102004063314A1 (de) 2004-12-23 2006-07-13 Carl Zeiss Smt Ag Filtereinrichtung für die Kompensation einer asymmetrischen Pupillenausleuchtung
DE102005004216A1 (de) * 2005-01-29 2006-08-03 Carl Zeiss Smt Ag Beleuchtungssystem, insbesondere für eine Projektionsbelichtungsanlage in der Halbleiterlithographie
US20080092944A1 (en) * 2006-10-16 2008-04-24 Leonid Rubin Semiconductor structure and process for forming ohmic connections to a semiconductor structure
JP2010517310A (ja) 2007-01-30 2010-05-20 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明システム
DE102009016456A1 (de) 2008-06-03 2009-12-24 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
DE102012205181B4 (de) * 2012-03-30 2015-09-24 Carl Zeiss Smt Gmbh Messvorrichtung zum Vermessen einer Beleuchtungseigenschaft
WO2017144265A1 (en) 2016-02-25 2017-08-31 Asml Netherlands B.V. Beam homogenizer, illumination system and metrology system
DE102018201010A1 (de) 2018-01-23 2019-07-25 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102018201009A1 (de) 2018-01-23 2019-07-25 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5863712A (en) * 1996-01-16 1999-01-26 Hitachi, Ltd. Pattern forming method, projection exposure system, and semiconductor device fabrication method
JPH1187232A (ja) * 1997-07-18 1999-03-30 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
US6333777B1 (en) * 1997-07-18 2001-12-25 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6128068A (en) * 1991-02-22 2000-10-03 Canon Kabushiki Kaisha Projection exposure apparatus including an illumination optical system that forms a secondary light source with a particular intensity distribution
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
JP3937580B2 (ja) * 1998-04-30 2007-06-27 キヤノン株式会社 投影露光装置及びそれを用いたデバイスの製造方法
DE10062579A1 (de) * 1999-12-15 2001-06-21 Nikon Corp Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5863712A (en) * 1996-01-16 1999-01-26 Hitachi, Ltd. Pattern forming method, projection exposure system, and semiconductor device fabrication method
JPH1187232A (ja) * 1997-07-18 1999-03-30 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
US6333777B1 (en) * 1997-07-18 2001-12-25 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 08 30 June 1999 (1999-06-30) *

Also Published As

Publication number Publication date
US20040257559A1 (en) 2004-12-23
AU2002356748A8 (en) 2003-06-10
JP2005510861A (ja) 2005-04-21
US6985218B2 (en) 2006-01-10
DE10158921A1 (de) 2003-06-26
WO2003046663A2 (de) 2003-06-05
AU2002356748A1 (en) 2003-06-10

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