WO2003017004A3 - Optische anordnung - Google Patents
Optische anordnung Download PDFInfo
- Publication number
- WO2003017004A3 WO2003017004A3 PCT/EP2002/008695 EP0208695W WO03017004A3 WO 2003017004 A3 WO2003017004 A3 WO 2003017004A3 EP 0208695 W EP0208695 W EP 0208695W WO 03017004 A3 WO03017004 A3 WO 03017004A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical element
- correction beam
- array
- optical
- correction
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/708,183 US6912077B2 (en) | 2001-08-16 | 2004-02-13 | Optical system |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10140208A DE10140208C2 (de) | 2001-08-16 | 2001-08-16 | Optische Anordnung |
DE10140208.2 | 2001-08-16 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/708,183 Continuation US6912077B2 (en) | 2001-08-16 | 2004-02-13 | Optical system |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003017004A2 WO2003017004A2 (de) | 2003-02-27 |
WO2003017004A3 true WO2003017004A3 (de) | 2003-12-11 |
Family
ID=7695634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/008695 WO2003017004A2 (de) | 2001-08-16 | 2002-08-05 | Optische anordnung |
Country Status (3)
Country | Link |
---|---|
US (1) | US6912077B2 (de) |
DE (1) | DE10140208C2 (de) |
WO (1) | WO2003017004A2 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10301799B4 (de) * | 2003-01-20 | 2005-08-11 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage und Verfahren zur Homogenisierung optischer Eigenschaften einer optischen Komponente |
DE10317662A1 (de) * | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Projektionsobjektiv, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Herstellung einer Halbleiterschaltung |
JP4378109B2 (ja) | 2003-05-30 | 2009-12-02 | キヤノン株式会社 | 露光装置、投影光学系、デバイスの製造方法 |
WO2005022614A1 (ja) | 2003-08-28 | 2005-03-10 | Nikon Corporation | 露光方法及び装置、並びにデバイス製造方法 |
KR101328356B1 (ko) | 2004-02-13 | 2013-11-11 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
DE102004046542A1 (de) | 2004-09-21 | 2006-03-23 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Einstellung optischer Abbildungseigenschaften durch Strahlungsbehandlung |
US20080049202A1 (en) * | 2006-08-22 | 2008-02-28 | Carl Zeiss Smt Ag | Projection exposure apparatus for semiconductor lithography |
DE102006039895A1 (de) * | 2006-08-25 | 2008-03-13 | Carl Zeiss Smt Ag | Verfahren zur Korrektur von durch Intensitätsverteilungen in optischen Systemen erzeugten Abbildungsveränderungen sowie entsprechendes optisches System |
DE102008016011A1 (de) | 2007-03-27 | 2008-10-02 | Carl Zeiss Smt Ag | Korrektur optischer Elemente mittels flach eingestrahltem Korrekturlicht |
DE102007032801A1 (de) * | 2007-07-10 | 2009-01-15 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Projizieren elektromagnetischer Strahlung |
EP2048540A1 (de) * | 2007-10-09 | 2009-04-15 | Carl Zeiss SMT AG | Mikrolithographisches Projektionsbelichtungsgerät |
WO2009152959A1 (en) | 2008-06-17 | 2009-12-23 | Carl Zeiss Smt Ag | Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element |
EP2169464A1 (de) * | 2008-09-29 | 2010-03-31 | Carl Zeiss SMT AG | Beleuchtungssystem eines mikrolithografischen Projektionsbelichtungsgerätes |
DE102008049616B4 (de) | 2008-09-30 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen |
DE102009029776B3 (de) * | 2009-06-18 | 2010-12-02 | Carl Zeiss Smt Ag | Optisches Element |
WO2011116792A1 (en) | 2010-03-26 | 2011-09-29 | Carl Zeiss Smt Gmbh | Optical system, exposure apparatus, and waverfront correction method |
DE102010041298A1 (de) | 2010-09-24 | 2012-03-29 | Carl Zeiss Smt Gmbh | EUV-Mikrolithographie-Projektionsbelichtungsanlage mit einer Heizlichtquelle |
NL2007498A (en) | 2010-12-23 | 2012-06-27 | Asml Netherlands Bv | Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus. |
WO2012123000A1 (en) | 2011-03-15 | 2012-09-20 | Carl Zeiss Smt Gmbh | Method of operating a microlithographic projection exposure apparatus |
DE102011113521A1 (de) * | 2011-09-15 | 2013-01-03 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsbelichtungsanlage |
CN103814331B (zh) | 2011-09-21 | 2016-06-29 | 卡尔蔡司Smt有限责任公司 | 在微光刻投射曝光设备中热致动反射镜的布置 |
KR101693950B1 (ko) | 2011-09-29 | 2017-01-06 | 칼 짜이스 에스엠테 게엠베하 | 마이크로리소그래피 투영 노광 장치의 투영 대물 렌즈 |
DE102011088740A1 (de) | 2011-12-15 | 2013-01-17 | Carl Zeiss Smt Gmbh | Optisches System, sowie Verfahren zum Manipulieren des thermischen Zustandes eines optischen Elementes in einer mikrolithographischen Projektionsbelichtungsanlage |
DE102022114974A1 (de) | 2022-06-14 | 2023-12-14 | Carl Zeiss Smt Gmbh | Verfahren zum Heizen eines optischen Elements sowie optisches System |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02185016A (ja) * | 1989-01-12 | 1990-07-19 | Nikon Corp | 投影光学装置 |
EP0678768A2 (de) * | 1994-04-22 | 1995-10-25 | Canon Kabushiki Kaisha | Projektionsbelichtungsgerät und Herstellungsverfahren für eine Mikrovorrichtung |
JPH0982599A (ja) * | 1995-09-11 | 1997-03-28 | Nikon Corp | 投影露光装置 |
EP0823662A2 (de) * | 1996-08-07 | 1998-02-11 | Nikon Corporation | Projektionsbelichtungsapparat |
US20020000507A1 (en) * | 2000-06-19 | 2002-01-03 | Leica Microsystems Heidelberg Gmbh | Method, apparatus and scanning microscope with means for stabilizing the temperature of optical components |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3548464B2 (ja) * | 1999-09-01 | 2004-07-28 | キヤノン株式会社 | 露光方法及び走査型露光装置 |
-
2001
- 2001-08-16 DE DE10140208A patent/DE10140208C2/de not_active Expired - Fee Related
-
2002
- 2002-08-05 WO PCT/EP2002/008695 patent/WO2003017004A2/de not_active Application Discontinuation
-
2004
- 2004-02-13 US US10/708,183 patent/US6912077B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02185016A (ja) * | 1989-01-12 | 1990-07-19 | Nikon Corp | 投影光学装置 |
EP0678768A2 (de) * | 1994-04-22 | 1995-10-25 | Canon Kabushiki Kaisha | Projektionsbelichtungsgerät und Herstellungsverfahren für eine Mikrovorrichtung |
JPH0982599A (ja) * | 1995-09-11 | 1997-03-28 | Nikon Corp | 投影露光装置 |
EP0823662A2 (de) * | 1996-08-07 | 1998-02-11 | Nikon Corporation | Projektionsbelichtungsapparat |
US20020000507A1 (en) * | 2000-06-19 | 2002-01-03 | Leica Microsystems Heidelberg Gmbh | Method, apparatus and scanning microscope with means for stabilizing the temperature of optical components |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 014, no. 457 (E - 0986) 2 October 1990 (1990-10-02) * |
PATENT ABSTRACTS OF JAPAN vol. 1997, no. 07 31 July 1997 (1997-07-31) * |
Also Published As
Publication number | Publication date |
---|---|
US20050018269A1 (en) | 2005-01-27 |
DE10140208A1 (de) | 2003-03-13 |
WO2003017004A2 (de) | 2003-02-27 |
US6912077B2 (en) | 2005-06-28 |
DE10140208C2 (de) | 2003-11-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2003017004A3 (de) | Optische anordnung | |
WO2003057100A3 (en) | Device and procedure for refractive laser surgery | |
TW490597B (en) | Multi-mirror-system for an illumination system, and the illumination system, EUV-projection exposure unit for microlithography, and process for producing microelectronic devices comprising and using the same | |
EP0827004A3 (de) | Korrigiertes optisches Abtastgerät | |
EP1318427A3 (de) | Vielstrahl-Belichtungseinheit | |
BR0203391A (pt) | Conjunto eletro-óptico e método para projeção de imagem, especialmente em instrumentos portáteis | |
EP1237034A3 (de) | Optisches System mit elektronischer Punktgrössensteuerung und Fokussierungskontrol | |
WO1999042885A3 (de) | Anordnung zum kalibrieren eines laserscanmikroskops | |
WO2002027400A3 (en) | Illumination system particularly for microlithography | |
EP1317142A3 (de) | Bilderzeugungsgerät mit verbesserten Grauabstufungen | |
WO2003098349A3 (en) | Illumination system for microlithography | |
WO2004010224A3 (en) | Projection objective for a projection exposure apparatus | |
IL148602A0 (en) | Image-recording device for a printing form, having an array of vcsel light sources | |
EP0713323A3 (de) | Vielpunkt-Polygonrasterausgabeabtaster mit optimierter Linienabstandsschärfentiefe | |
EP0797343A3 (de) | Abtaststrahlpositionssteuerungsgerät zur Abtaststrahlpositionssteuerung und Bilderzeugungsgerät zu deren Verwendung | |
EP1045329A3 (de) | Optische Vorrichtung mit einer von der optischen Achse verschobenen Linse | |
EP0703088A3 (de) | Bilderzeugungsvorrichtung mit optischer Zweistrahlabtasteinheit | |
EP0987114A3 (de) | Mehrstrahlabtastgerät | |
EP1300702A3 (de) | Mehrstrahliges System zum Lichtabtasten und Bilderzeugungsvorrichtung unter Verwendung desselben | |
WO2004006021A3 (de) | Optische vorrichtung mit einer beleuchtungsquelle | |
WO2001069320A3 (de) | Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern | |
EP1345062A3 (de) | Optische Abtastvorrichtung und damit versehenes Bilderzeugungsgerät | |
EP1393115A4 (de) | Systeme und verfahren zum scannen einer probe mit einem lichtstrahl | |
US6975443B2 (en) | Multi-beam pattern generator | |
WO2003068051A3 (en) | Flexible scanning beam imaging system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): JP US Kind code of ref document: A2 Designated state(s): JP |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LU MC NL PT SE SK TR Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FR GB GR IE IT LU MC NL PT SE SK TR |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 10708183 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase | ||
NENP | Non-entry into the national phase |
Ref country code: JP |
|
WWW | Wipo information: withdrawn in national office |
Country of ref document: JP |