WO2001069320A3 - Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern - Google Patents

Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern Download PDF

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Publication number
WO2001069320A3
WO2001069320A3 PCT/EP2001/002591 EP0102591W WO0169320A3 WO 2001069320 A3 WO2001069320 A3 WO 2001069320A3 EP 0102591 W EP0102591 W EP 0102591W WO 0169320 A3 WO0169320 A3 WO 0169320A3
Authority
WO
WIPO (PCT)
Prior art keywords
exposure device
light modulator
image processing
processing electronics
compensating optical
Prior art date
Application number
PCT/EP2001/002591
Other languages
English (en)
French (fr)
Other versions
WO2001069320A2 (de
Inventor
Friedrich Luellau
Original Assignee
Basysprint Gmbh Sys Druckind
Friedrich Luellau
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basysprint Gmbh Sys Druckind, Friedrich Luellau filed Critical Basysprint Gmbh Sys Druckind
Priority to CA002391042A priority Critical patent/CA2391042A1/en
Priority to JP2001568136A priority patent/JP2003527641A/ja
Priority to US10/149,298 priority patent/US6844920B2/en
Priority to EP01925392A priority patent/EP1269265A2/de
Publication of WO2001069320A2 publication Critical patent/WO2001069320A2/de
Publication of WO2001069320A3 publication Critical patent/WO2001069320A3/de

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Abstract

Eine Belichtungsvorrichtung zur Belichtung eines Abbilds einer elektronisch gespeicherten Vorlage auf eine Unterlage, insbesondere Druckplatte (1), mit einer Bildverarbeitungselektronik (2), in der die Bilddaten speicherbar sind, mit einem durch die Bildverarbeitungselektronik (2) elektronisch ansteuerbaren Lichtmodulator (7), insbesondere einem LCD-Bildschirm (7) oder einer Mikrospiegelanordnung, mit einer Beleuchtungseinrichtung (8, 9) zur Beleuchtung des Lichtmodulators (7) und mit einer Abbildungsoptik (11) zur Abbildung des Lichtmodulators (7) auf die Unterlage (1) wird erfindungsgemäss dadurch verbessert, dass die Bildverarbeitungselektronik (2) eine Kompensationseinrichtung (4, 5) zur Kompensation von optischen Fehlern und/oder Toleranzen im Strahlengang der Belichtungsvorrichtung umfasst.
PCT/EP2001/002591 2000-03-11 2001-03-08 Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern WO2001069320A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CA002391042A CA2391042A1 (en) 2000-03-11 2001-03-08 Exposure device and method for compensating optical defects
JP2001568136A JP2003527641A (ja) 2000-03-11 2001-03-08 光学的エラーを補償する露光装置および方法
US10/149,298 US6844920B2 (en) 2000-03-11 2001-03-08 Exposure device and method for compensating optical defects
EP01925392A EP1269265A2 (de) 2000-03-11 2001-03-08 Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10012017.2 2000-03-11
DE10012017A DE10012017A1 (de) 2000-03-11 2000-03-11 Belichtungsvorrichtung und Verfahren zur Kompensation von optischen Fehlern

Publications (2)

Publication Number Publication Date
WO2001069320A2 WO2001069320A2 (de) 2001-09-20
WO2001069320A3 true WO2001069320A3 (de) 2001-12-06

Family

ID=7634437

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2001/002591 WO2001069320A2 (de) 2000-03-11 2001-03-08 Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern

Country Status (6)

Country Link
US (1) US6844920B2 (de)
EP (1) EP1269265A2 (de)
JP (1) JP2003527641A (de)
CA (1) CA2391042A1 (de)
DE (1) DE10012017A1 (de)
WO (1) WO2001069320A2 (de)

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US6976426B2 (en) 2002-04-09 2005-12-20 Day International, Inc. Image replication element and method and system for producing the same
US7339148B2 (en) * 2002-12-16 2008-03-04 Olympus America Inc. Confocal microscope
US20040197672A1 (en) * 2003-04-01 2004-10-07 Numerical Technologies, Inc. Programmable aperture for lithographic imaging systems
US6831768B1 (en) 2003-07-31 2004-12-14 Asml Holding N.V. Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
KR100796582B1 (ko) * 2003-12-26 2008-01-21 후지필름 가부시키가이샤 노광방법 및 장치
TWI505329B (zh) * 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
US7153616B2 (en) * 2004-03-31 2006-12-26 Asml Holding N.V. System and method for verifying and controlling the performance of a maskless lithography tool
US7259829B2 (en) * 2004-07-26 2007-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7102733B2 (en) * 2004-08-13 2006-09-05 Asml Holding N.V. System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool
US7202939B2 (en) * 2004-12-22 2007-04-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7728956B2 (en) * 2005-04-05 2010-06-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data
EP1987047B1 (de) * 2006-02-03 2015-07-01 ExxonMobil Chemical Patents Inc. Verfahren zur herstellung von alpha-olefin-comonomeren
US7982085B2 (en) * 2006-02-03 2011-07-19 Exxonmobil Chemical Patents Inc. In-line process for generating comonomer
US8003839B2 (en) * 2006-02-03 2011-08-23 Exxonmobil Chemical Patents Inc. Process for generating linear apha olefin comonomers
US8404915B2 (en) * 2006-08-30 2013-03-26 Exxonmobil Chemical Patents Inc. Phosphine ligand-metal compositions, complexes, and catalysts for ethylene trimerizations
KR20160092053A (ko) * 2007-11-06 2016-08-03 가부시키가이샤 니콘 조명 광학계, 노광 장치 및 노광 방법
US9561622B2 (en) 2008-05-05 2017-02-07 Georgia Tech Research Corporation Systems and methods for fabricating three-dimensional objects
US8636496B2 (en) 2008-05-05 2014-01-28 Georgia Tech Research Corporation Systems and methods for fabricating three-dimensional objects

Citations (6)

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Publication number Priority date Publication date Assignee Title
DE3813398A1 (de) * 1988-04-21 1989-11-02 Heidelberger Druckmasch Ag Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte
US5369499A (en) * 1991-11-13 1994-11-29 Eastman Kodak Company Calibration method for video image reproduction with electronic printer and video monitor
DE19545821A1 (de) * 1995-12-08 1997-06-12 Friedrich Dipl Ing Luellau Vorrichtung zum Belichten von Druckplatten
DE19703063A1 (de) * 1997-01-29 1998-08-06 Agfa Gevaert Ag Verfahren zum Erzeugen eines Bildes von einer transparenten Vorlage
EP0875386A1 (de) * 1993-08-30 1998-11-04 Texas Instruments Incorporated Verbesserung in oder bezüglich des Druckens
EP0953877A1 (de) * 1998-04-29 1999-11-03 Deltron Computer Produkte GmbH Verfahren zur Herstellung von Siebdruckformen sowie eine Belichtungsvorrichtung hierfür

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DE3402127A1 (de) * 1984-01-23 1985-07-25 Harald 6070 Langen Küppers Verfahren zur gleichmaessigen ausleuchtung einer flaeche durch eine punktlichtquelle
US4675702A (en) * 1986-03-14 1987-06-23 Gerber Scientific Inc. Photoplotter using a light valve device and process for exposing graphics
US5122831A (en) * 1990-06-25 1992-06-16 Fuji Photo Film Co., Ltd. Photographic printer
US5473409A (en) * 1993-09-21 1995-12-05 Sony Corporation Semiconductor light exposure device
JPH09318891A (ja) * 1996-05-30 1997-12-12 Fuji Photo Film Co Ltd 画像露光装置
DE19752479A1 (de) * 1996-12-03 1998-06-04 Eastman Kodak Co Verfahren und Vorrichtung zum Korrigieren der Lichtungsgleichmäßigkeit in einem fotografischen Flüssigkristallprinter
DE19845821B4 (de) 1998-09-25 2005-01-20 Fahrzeugausrüstung Berlin GmbH Stromrichtereinheit in Modulbauweise, insbesondere für Schienenfahrzeuge
US6567205B1 (en) * 1998-12-11 2003-05-20 Basys Print Systeme Fuer Die Druckindustrie Exposure device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3813398A1 (de) * 1988-04-21 1989-11-02 Heidelberger Druckmasch Ag Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte
US5369499A (en) * 1991-11-13 1994-11-29 Eastman Kodak Company Calibration method for video image reproduction with electronic printer and video monitor
EP0875386A1 (de) * 1993-08-30 1998-11-04 Texas Instruments Incorporated Verbesserung in oder bezüglich des Druckens
DE19545821A1 (de) * 1995-12-08 1997-06-12 Friedrich Dipl Ing Luellau Vorrichtung zum Belichten von Druckplatten
DE19703063A1 (de) * 1997-01-29 1998-08-06 Agfa Gevaert Ag Verfahren zum Erzeugen eines Bildes von einer transparenten Vorlage
EP0953877A1 (de) * 1998-04-29 1999-11-03 Deltron Computer Produkte GmbH Verfahren zur Herstellung von Siebdruckformen sowie eine Belichtungsvorrichtung hierfür

Also Published As

Publication number Publication date
EP1269265A2 (de) 2003-01-02
JP2003527641A (ja) 2003-09-16
WO2001069320A2 (de) 2001-09-20
US20030077089A1 (en) 2003-04-24
DE10012017A1 (de) 2001-09-13
CA2391042A1 (en) 2001-09-20
US6844920B2 (en) 2005-01-18

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