EP1269265A2 - Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern - Google Patents
Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlernInfo
- Publication number
- EP1269265A2 EP1269265A2 EP01925392A EP01925392A EP1269265A2 EP 1269265 A2 EP1269265 A2 EP 1269265A2 EP 01925392 A EP01925392 A EP 01925392A EP 01925392 A EP01925392 A EP 01925392A EP 1269265 A2 EP1269265 A2 EP 1269265A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- exposure
- light modulator
- image processing
- printing plate
- processing electronics
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
Definitions
- the invention relates to an exposure device for exposing an image of an electronically stored original onto a base, in particular a printing plate, with image processing electronics in which the image data can be stored, with a light modulator, in particular an LCD screen or a micromirror arrangement, which can be controlled electronically by the image processing electronics an illumination device for illuminating the light modulator and with imaging optics for imaging the light modulator on the base.
- the invention further relates to a method for
- Such an exposure device which is used for exposing printing plates with ultraviolet light, is known for example from DE 195 45 821 AI.
- the template to be imaged is broken down into partial images by means of a computer and the partial images are successively brought to an electronically controllable light modulator, for example a irradiated LCD screen or a micromirror arrangement.
- the exposure device is then gradually moved over the printing plate to be exposed, the light modulator being controlled with the associated partial image.
- Micromirror arrangements also called digital mirror devices or DMD for short, consist of an arrangement of tiny mirrors with edge lengths of a few micrometers on the surface of an electronic chip, each individual mirror being individually tiltable by electronic control, so that an incident light beam can be guided either into an imaging lens or past it, depending on the tilt angle.
- the image exposed on the base to be exposed deviates from the electronic original. In particular, there are shadows on the edges and corners of the individual images.
- the object of the invention is that the image processing electronics have a
- This electronic compensation device has the advantage that it can be implemented with simple means and inexpensively, essentially on the basis of software, since the image processing electronics, preferably in the form of a computer, are usually already present and therefore do not cause any additional costs.
- the compensation device it is provided that by means of the compensation device the total amount of light falling on each point of the base to be exposed during the exposure process can be modulated. The effect of the exposure, i.e.
- the photochemical effect ultimately produced on the substrate to be exposed which corresponds to the brightness of the respective point in a photographic depiction, essentially depends on the total amount of light incident, which in the simplest case of constant light intensity is the product of the intensity with the exposure time. If each point of the substrate to be exposed can now be individually modulated, overall almost complete compensation can be carried out down to all details of the image.
- a location-dependent intensity modulation of the stored template with an electronically stored gray mask is provided during the exposure process.
- the gray mask consists of a set of multiplication factors for each individual pixel.
- the intensity of each individual pixel transmitted by the light modulator is increased or decreased in accordance with the stored multiplication factor, and the differences in brightness, which are inadvertently generated by errors and / or tolerances in the illumination and / or imaging optics, are compensated for.
- an LCD screen as a light modulator, this can be done in that the angle of rotation of the circular polarized light is changed by appropriate control of the LCD screen.
- Intensity modulation is not possible because the micromirrors can only be set in two fixed tilt positions, so that the intensity of a single point can only be switched on or off 100%.
- the total amount of light incident on a single point during the exposure of the base can only be modulated by varying the "switch-on time" of each individual micromirror. Therefore, in a modified embodiment of the invention, the switch-on times of individual pixels of the light modulator are provided for the location-dependent light quantity modulation of the exposure process can be varied in accordance with an electronically stored gray mask.
- the brightness distribution of the developed test printing plate is fed into the image processing electronics in a simple manner by scanning the printing plate by an electronic camera or an electronic scanner, the data of the thus digitized gray values simply being imported into the image processing electronics and there in a suitable way to the digital values of the Gray mask processed and saved.
- the gradation of the printing plate can be precisely taken into account in connection with the exposure spectrum used and the developer used in each case, all other influences on the brightness distribution also being able to be "eliminated".
- Such further factors can, for example, relate to the illuminance, the exposure time, the development time, the composition, the temperature,
- Brightness distribution in the printing plate exposure can be compensated for by means of the method according to the invention through the electronic gray mask generated in a single calibration run. Exemplary embodiments of the invention are explained in more detail below with reference to the drawing. It shows:
- FIG. 1 is a schematic representation of an exposure device according to the invention
- the original to be imaged on a printing plate 1 is stored in an image memory 3 in a computer serving as processing electronics 2.
- An overlay file which is used to generate an electronic gray mask, is stored in an overlay memory 4.
- An image from the image memory 3 or a partial image of the overall image is loaded into a compensator 5 and corrected pixel by pixel with the overlay data originating from the overlay memory 4, i.e. the control data provided for controlling the light intensity and / or the duration of the exposure of each individual pixel are modified by multiplication with the correction values of the overlay file in accordance with the desired correction. As a rule, their value is increased or decreased.
- the corrected image or partial image then arrives via the data line 6 to the light modulator, here an irradiated LCD screen, in the image plane of which the actual image is created.
- An illumination device for illuminating the light modulator 7 consists of a light source 8 and a condenser 9.
- the light coming from the light source 8 is concentrated on the light modulator 7 by means of the condenser 9.
- the modulated light falls on a mirror 10, which directs the beam path downwards into an imaging optics 11.
- the imaging optics 11 forms the image plane of the light modulator 7 onto the printing plate 1.
- the mirror 10 can be replaced by a micromirror arrangement which then serves as a light modulator.
- the LCD screen 7 can be omitted.
- the errors in the beam path of the exposure device caused by optical errors in the illumination device 8, 9 of the imaging optics 11 or also by other optical elements 7, 10 are compensated for by the electronic gray mask described above, so that a largely error-free and with regard to the Brightness reproduction creates a uniform image of the electronic template.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10012017 | 2000-03-11 | ||
DE10012017A DE10012017A1 (de) | 2000-03-11 | 2000-03-11 | Belichtungsvorrichtung und Verfahren zur Kompensation von optischen Fehlern |
PCT/EP2001/002591 WO2001069320A2 (de) | 2000-03-11 | 2001-03-08 | Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1269265A2 true EP1269265A2 (de) | 2003-01-02 |
Family
ID=7634437
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01925392A Withdrawn EP1269265A2 (de) | 2000-03-11 | 2001-03-08 | Belichtungsvorrichtung und verfahren zur kompensation von optischen fehlern |
Country Status (6)
Country | Link |
---|---|
US (1) | US6844920B2 (de) |
EP (1) | EP1269265A2 (de) |
JP (1) | JP2003527641A (de) |
CA (1) | CA2391042A1 (de) |
DE (1) | DE10012017A1 (de) |
WO (1) | WO2001069320A2 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6976426B2 (en) * | 2002-04-09 | 2005-12-20 | Day International, Inc. | Image replication element and method and system for producing the same |
US7339148B2 (en) * | 2002-12-16 | 2008-03-04 | Olympus America Inc. | Confocal microscope |
US20040197672A1 (en) * | 2003-04-01 | 2004-10-07 | Numerical Technologies, Inc. | Programmable aperture for lithographic imaging systems |
US6831768B1 (en) | 2003-07-31 | 2004-12-14 | Asml Holding N.V. | Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography |
US7253882B2 (en) * | 2003-12-26 | 2007-08-07 | Fujifilm Corporation | Exposure method and exposure system |
TWI494972B (zh) * | 2004-02-06 | 2015-08-01 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
US7153616B2 (en) * | 2004-03-31 | 2006-12-26 | Asml Holding N.V. | System and method for verifying and controlling the performance of a maskless lithography tool |
US7259829B2 (en) * | 2004-07-26 | 2007-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7102733B2 (en) * | 2004-08-13 | 2006-09-05 | Asml Holding N.V. | System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool |
US7202939B2 (en) * | 2004-12-22 | 2007-04-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7728956B2 (en) | 2005-04-05 | 2010-06-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data |
WO2007092136A2 (en) * | 2006-02-03 | 2007-08-16 | Exxonmobil Chemical Patents, Inc. | Process for generating alpha olefin comonomers |
US7982085B2 (en) * | 2006-02-03 | 2011-07-19 | Exxonmobil Chemical Patents Inc. | In-line process for generating comonomer |
US8003839B2 (en) * | 2006-02-03 | 2011-08-23 | Exxonmobil Chemical Patents Inc. | Process for generating linear apha olefin comonomers |
US8404915B2 (en) * | 2006-08-30 | 2013-03-26 | Exxonmobil Chemical Patents Inc. | Phosphine ligand-metal compositions, complexes, and catalysts for ethylene trimerizations |
KR20160092053A (ko) * | 2007-11-06 | 2016-08-03 | 가부시키가이샤 니콘 | 조명 광학계, 노광 장치 및 노광 방법 |
US8636496B2 (en) * | 2008-05-05 | 2014-01-28 | Georgia Tech Research Corporation | Systems and methods for fabricating three-dimensional objects |
US9561622B2 (en) | 2008-05-05 | 2017-02-07 | Georgia Tech Research Corporation | Systems and methods for fabricating three-dimensional objects |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3402127A1 (de) * | 1984-01-23 | 1985-07-25 | Harald 6070 Langen Küppers | Verfahren zur gleichmaessigen ausleuchtung einer flaeche durch eine punktlichtquelle |
US4675702A (en) * | 1986-03-14 | 1987-06-23 | Gerber Scientific Inc. | Photoplotter using a light valve device and process for exposing graphics |
DE3813398A1 (de) | 1988-04-21 | 1989-11-02 | Heidelberger Druckmasch Ag | Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte |
US5122831A (en) * | 1990-06-25 | 1992-06-16 | Fuji Photo Film Co., Ltd. | Photographic printer |
US5369499A (en) | 1991-11-13 | 1994-11-29 | Eastman Kodak Company | Calibration method for video image reproduction with electronic printer and video monitor |
US5459492A (en) | 1993-08-30 | 1995-10-17 | Texas Instruments Incorporated | Method and apparatus for printing stroke and contone data together |
US5473409A (en) * | 1993-09-21 | 1995-12-05 | Sony Corporation | Semiconductor light exposure device |
DE19545821A1 (de) * | 1995-12-08 | 1997-06-12 | Friedrich Dipl Ing Luellau | Vorrichtung zum Belichten von Druckplatten |
JPH09318891A (ja) * | 1996-05-30 | 1997-12-12 | Fuji Photo Film Co Ltd | 画像露光装置 |
DE19752479A1 (de) * | 1996-12-03 | 1998-06-04 | Eastman Kodak Co | Verfahren und Vorrichtung zum Korrigieren der Lichtungsgleichmäßigkeit in einem fotografischen Flüssigkristallprinter |
DE19703063C2 (de) | 1997-01-29 | 2000-05-04 | Agfa Gevaert Ag | Verfahren zum Erzeugen eines Bildes von einer transparenten Vorlage |
ATE256303T1 (de) | 1998-04-29 | 2003-12-15 | Cst Gmbh | Verfahren zur herstellung von siebdruckformen sowie eine belichtungsvorrichtung hierfür |
DE19845821B4 (de) | 1998-09-25 | 2005-01-20 | Fahrzeugausrüstung Berlin GmbH | Stromrichtereinheit in Modulbauweise, insbesondere für Schienenfahrzeuge |
EP1141780B1 (de) * | 1998-12-11 | 2004-02-25 | Basys Print GmbH Systeme für die Druckindustrie | Belichtungsvorrichtung |
-
2000
- 2000-03-11 DE DE10012017A patent/DE10012017A1/de not_active Withdrawn
-
2001
- 2001-03-08 JP JP2001568136A patent/JP2003527641A/ja active Pending
- 2001-03-08 EP EP01925392A patent/EP1269265A2/de not_active Withdrawn
- 2001-03-08 CA CA002391042A patent/CA2391042A1/en not_active Abandoned
- 2001-03-08 US US10/149,298 patent/US6844920B2/en not_active Expired - Lifetime
- 2001-03-08 WO PCT/EP2001/002591 patent/WO2001069320A2/de not_active Application Discontinuation
Non-Patent Citations (1)
Title |
---|
See references of WO0169320A2 * |
Also Published As
Publication number | Publication date |
---|---|
DE10012017A1 (de) | 2001-09-13 |
US6844920B2 (en) | 2005-01-18 |
JP2003527641A (ja) | 2003-09-16 |
WO2001069320A3 (de) | 2001-12-06 |
CA2391042A1 (en) | 2001-09-20 |
US20030077089A1 (en) | 2003-04-24 |
WO2001069320A2 (de) | 2001-09-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20020611 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
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RIC1 | Information provided on ipc code assigned before grant |
Free format text: 7G 03F 7/20 A, 7G 03B 27/72 B, 7H 04N 1/407 B |
|
17Q | First examination report despatched |
Effective date: 20051020 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: G03B 27/72 20060101AFI20070504BHEP |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
18W | Application withdrawn |
Effective date: 20070824 |