WO2002047241A1 - Dispositif micromecanique orientable a entrainement magnetique et procede permettant sa realisation - Google Patents

Dispositif micromecanique orientable a entrainement magnetique et procede permettant sa realisation Download PDF

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Publication number
WO2002047241A1
WO2002047241A1 PCT/EP2000/012414 EP0012414W WO0247241A1 WO 2002047241 A1 WO2002047241 A1 WO 2002047241A1 EP 0012414 W EP0012414 W EP 0012414W WO 0247241 A1 WO0247241 A1 WO 0247241A1
Authority
WO
WIPO (PCT)
Prior art keywords
magnetically driven
carrier
magnetic field
pivotable
layer
Prior art date
Application number
PCT/EP2000/012414
Other languages
German (de)
English (en)
Inventor
Hans-Heinrich Gatzen
Original Assignee
Gatzen Hans Heinrich
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gatzen Hans Heinrich filed Critical Gatzen Hans Heinrich
Priority to PCT/EP2000/012414 priority Critical patent/WO2002047241A1/fr
Priority to AU2001231560A priority patent/AU2001231560A1/en
Publication of WO2002047241A1 publication Critical patent/WO2002047241A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K26/00—Machines adapted to function as torque motors, i.e. to exert a torque when stalled
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K99/00—Subject matter not provided for in other groups of this subclass
    • H02K99/20—Motors

Definitions

  • the invention relates generally to micromechanical devices and, more particularly, to a micromechanical swiveling device with a magnetic drive and a method for the production thereof.
  • a micromechanically produced mirror which can be tilted upward by magnetic forces from a lying position about a tilt axis, the tilt axis of which lies essentially laterally, but in the plane defined by the mirror surface, but far outside the mirror dimensions.
  • a tilting process is extremely disadvantageous, for example for optical systems, because with one
  • Angle adjustment is always accompanied by a change in length of the optical path.
  • a change in the length of the optical path generally leads to misalignments in imaging systems or requires complex and expensive optical arrangements to compensate for them.
  • the invention is therefore based on the object to provide a generic device in which one Rotational or swiveling movements are more decoupled than with conventional systems.
  • the possibility of generating a rotary or pivoting movement independently of a translational component in and / or perpendicular to the direction of propagation of the light would be advantageous.
  • a first pivotable carrier on which forces generated by the generated magnetic field can be exerted, which cause a pivoting movement of the first pivotable carrier, a reliable arrangement can already be provided, even with a very small size of the carrier , this means that a size of a reflecting surface attached to it of less than a square millimeter provides a beam tilt without substantial lateral migration or shading of the beam.
  • pivoting or rotating movement of the carrier In contrast to the known tilting movement about an external tilting axis lying to the side of the mirror, a pivoting or rotating movement of the carrier should be referred to as pivoting of the carrier, in which the rotating or pivoting axis is not laterally adjacent to the carrier.
  • This pivot axis can advantageously run through the geometrical center of gravity of the surface of the carrier in order to thereby provide the lowest possible moment of inertia with optimal adjustment possibilities.
  • the pivot axis can also advantageously run through the physical center of gravity of the carrier in order to provide the fastest possible control with the lowest possible moment of inertia of the arrangement.
  • the pivot axis can also lie in front of or behind one of the main surfaces of the carrier, if, for example, translational adjustments are also to be made with an adjustment component in the direction of the optical axis.
  • first pivotable carrier is held by a second pivotable carrier, which is pivotable about a second pivot axis Y running perpendicular to the pivot axis X of the first carrier, since this provides an essentially gimbaled platform system with a magnetic drive, in which the pivot axes X and Y of the first and second carrier, see, for example, FIGS. 1 to 3, can run exactly in the plane of the surface of the carrier or in the vicinity thereof, as a result of which essentially no undesired migration of beam paths in one direction two pivot axes perpendicular direction Z is generated more.
  • first and second devices for generating a magnetic field each comprise at least two arrangements generating a magnetic field, the arrangements generating at least two magnetic fields being controllable separately from one another, extremely advantageous further setting options result for the setting of the position of the first carrier serving as a platform.
  • an additional, adjustable train can be developed, which leads to a defined deflection of the carrier in the negative IS direction, see for example FIGS. 1 to 3, which is more optical for adjustment purposes Paths is usable.
  • the fastening of the first and / or the second carrier comprises a web made of polysilicon
  • this creates a solid-state joint with high reliability, which provides elastic restoring forces that can be dimensioned to a large extent due to its shape.
  • this joint can be produced using the methods of semiconductor structuring from the same substrate as the remaining components of the pivotable device.
  • the first and the second carrier are part of a substrate consisting of a silicon compound and the silicon compound of the first and second carrier contain polysilicon and / or silicon dioxide which is part of the substrate or is applied thereto.
  • the effectively effective restoring force can be defined within wide limits both for a pivoting movement and for a deflection in the Z direction.
  • the first and / or second device for generating a magnetic field comprises galvanically produced coils, because this enables lithographic processes to be used whose resolution is in the micrometer range or below, which also means that the galvanically produced coils have conductor widths in the range Can have micrometers and overall dimensions in the range of a few micrometers.
  • the first and / or second device for generating a magnetic field comprises a yoke made of a soft magnetic material, because this allows geometries optimized for the purposes of the magnetic drive, in particular for the generated and guided magnetic fields and fluxes, provide.
  • a section of a soft magnetic material is arranged on the first and / or on the second carrier, which is at least partially penetrated by the magnetic field of the first or second device for generating a magnetic field, one is carried out by the respective geometric Dimensions of the field and the soft magnetic material defined force coupling between the generated magnetic field and the first and / or second carrier.
  • Preferred soft magnetic materials are advantageously selected from the group comprising nickel-iron compounds and alloys, aluminum-iron-silicon compounds and alloys, nickel-iron tantalum compounds and alloys and combinations of these compounds and alloys ,
  • a particularly preferred soft magnetic material contains nickel-iron compounds or alloys in a composition Ni: Fe of 81:19 at% or 45:55 at%.
  • the permanent or hard magnetic material is preferably selected from the group consisting of cobalt-chromium-tantalum compounds and alloys, cobalt-platinum-chromium compounds and alloys, cobalt-platinum-chromium tantalum compounds and alloys. Cobalt-samarium compounds and alloys, neodymium-iron-boron compounds and alloys and combinations of these compounds and alloys.
  • the production can be simplified and optimized, because complex three-dimensional structures can be produced from only one substrate surface and subsequently combined in a simple manner by a sandwich-like structure of the substrates.
  • Figure 1 is a perspective view of a first
  • FIG. 1 is a perspective view of a second
  • Figure 3 is a perspective view of a third
  • FIG. 4 shows a cross-sectional illustration of the first embodiment along the sectional plane A-A
  • Figure 1 is a cross-sectional view with a view of the web serving as a solid-state joint for fastening the gimbal ring acting as a second support along the section plane BB from FIG. 1.
  • FIG. 1 is a first embodiment of a magnetically driven swiveling device which is provided with the reference number 1 as a whole
  • a first device 2 for generating a magnetic field is arranged below a first pivotable carrier 3, on which 2 magnetic forces can be exerted by the magnetic field of the device.
  • the first pivotable carrier 3 which essentially consists of silicon, can be pivoted about webs 4, which preferably consist of polysilicon and define solid-state joints with an adjustable restoring torque or restoring force.
  • the first carrier 3 is surrounded by a second pivotable carrier 5, which is also pivotably held by webs 6 serving as solid-state joints.
  • the first carrier 3 is held pivotably about the pivot axis X and the second carrier 5 about the pivot axis Y perpendicular to this, so that a gimbal is created for the first carrier 3 serving as a platform, whereby an independent adjustment of a pivoting movement around the X and Y axes is made possible.
  • the swiveling movement of the first carrier about the X axis and with a second device 7 for generating a second magnetic field the swiveling movement of the first and second carriers 3, 5 about the Y- can be caused by magnetic forces with the first device 2 for generating a magnetic field. Axis are generated.
  • Each of the fire-generating devices 2, 7 each contains two yokes 8, 9, 10, 11 with an E-shaped cross section, the middle arm of which is surrounded by a coil 12, 13, 14, 15 in the first embodiment.
  • the two coils 12, 14, and 13, 15 each of a fire-generating device 2, 7 can be electrically controlled separately from one another, so that both rectified and opposed magnetic fields can be generated.
  • the magnetic field lines which are not shown in the figures but are well known to the person skilled in the art, are guided through the arms 16 of the E-shaped yokes 8, 9, 10, 11 in such a way that they run upward, sections 17 attached below the first carrier 3 , 18, 19, 20 penetrate a soft magnetic material and be guided in this soft magnetic material.
  • Pivot axis X, Y generates a one-sided magnetic field which attempts to attract the section of soft magnetic material 17, 18, 19, 20 located above and a swiveling movement is generated, which reduces the distance between the respective soft magnetic material and the associated current-carrying coil with the E-shaped yoke underneath.
  • sections which also contain permanent magnets, are used instead of the section made of soft magnetic material, depending on the direction of the magnetic field generated by the coils 12, 13, 14, 15, a repulsive or a compressive force can also be generated in addition to a tensile force. This is the case if the poles of the permanent magnet material and the E-shaped yokes face each other.
  • a coil arrangement of U-shaped yokes can also be used instead of the E-shaped yokes, coils being arranged in each case around the legs of the U-shaped yoke pointing upward.
  • the same directional magnetic fields in both coils of a field-generating arrangement can cause the first carrier 3 to be displaced in both the positive and the negative Z direction, with the use of S-shaped webs 4, 6 allowing greater elongations than in the case of the in the figures illustrated straight embodiments.
  • FIG. 2 a perspective view of a second embodiment with round first and second carriers 3, 5 is shown.
  • the gimbal suspension of this embodiment which is functionally the same in itself, is particularly well suited for systems with round apertures, such as those which arise, for example, when focusing modes guided in a single-mode fiber.
  • FIG. 3 shows an embodiment with rectangular first and second carriers, in which both the second device of a magnetic field 7 and its E-shaped yokes 9, 11 and coils 13, 15 are spaced further apart and a section of the soft magnetic material 20, 18 is arranged on the second carrier 5. This results in a larger lever with respect to the pivot axis Y and thus, with the same forces, a greater rotational acceleration with the same current strength in the coils 13, 15.
  • FIG. 4 shows a cross-sectional illustration along the sectional plane AA from FIG. 1.
  • the first and the second carrier 3, 5 are worked out from a first silicon substrate 21 by etching techniques, which are described in more detail below, and are arranged spaced apart by a spacer or spacer layer 22 on a second silicon substrate 23.
  • the coils 12, 14 comprise galvanically applied, single-layer turns, which are embedded in a photolithographically structurable epoxy resin layer 24.
  • FIG. 5 in which a cross-sectional view through an alternative embodiment to the embodiment shown in FIG. 1 along the sectional plane BB from FIG. 1 is shown.
  • the web 6, which is anchored in the upper wafer 21 and is made of polysilicon, and its connecting region or anchoring 30 on the second carrier 5 can be seen particularly well. Furthermore, the first pivotable carrier 3 is coated with a mirror layer 25 made of gold.
  • FIG. 5 also shows how the left arm 16 of a U-shaped yoke 11 "extends through a coil arrangement 15", which instead of a central arrangement, as in the embodiment shown in FIG. 1, alternatively around the two outer legs 16 of the E-shaped yoke 11 is arranged.
  • the coil arrangement 15 ′′ comprises a first coil layer 26, which was applied galvanically to the substrate 23 and is also provided with a second coil layer 27, which is arranged above the first coil layer 26.
  • Both coil layers 26, 27 each define a concentric ring system, which by means of
  • Through openings or vias 28 is electrically conductively connected.
  • the entire lower wafer 23 is covered with a passivation view 29, which is on the In a manner known to those skilled in the art, there are connection spots at which the coils 12, 13, 14, 15 can be supplied with electrical current.
  • the overall system is generally constructed on an upper wafer 21 and a lower wafer 23, each serving as a substrate
  • Structure of a magnetic drive system consisting of the yokes 8, 9, 10, 11, 12, also referred to as magnetic legs, which conduct the magnetic flux of the magnetic field and the electrically conductive coils 12, 13, 14 15, 15 ', which form a time-varying magnetic field depending on the current flowing through it.
  • the gimbal-mounted first carrier or platform 3 and the magnetic yokes 17, 18, 19, 20 consisting of a section of soft or soft and hard magnetic material are formed on the upper wafer 21.
  • the material of the lower wafer 23 consists essentially of silicon.
  • the first production step is the production of the lower part of the E- or U-shaped yokes 8, 9, 10, 11 that runs in the substrate plane.
  • Magnetic material by means of sputtering or vapor deposition
  • a planarizing insulating layer 31 is then applied, see FIG. 5, a photosensitive epoxy resin being used for this purpose.
  • the next step is to manufacture the coils 12, 13, 14, 15, 15 ', which in the particularly preferred embodiment consists of two layers 26, 27.
  • Coil layer 26 and the supply lines and connection spots are carried out by means of the following individual steps:
  • This coil layer 26 is then isolated, again using a photosensitive epoxy resin 31.
  • the layer receives suitable windows.
  • the electrically conductive bushings are then fabricated using thin-film or galvanic molding. Now follows the production of the second coil layer 27, which in the sequence of steps essentially corresponds to that for the production of the first coil layer 26.
  • An organic, photosensitive insulating layer 31 is in turn produced on the finished second coil layer 27, which in turn receives windows in the area of the magnetic poles.
  • the magnet system is completed by galvanically growing the upward-pointing arms or magnetic poles 16, followed by planarization of the wafer.
  • the conclusion is a passivation of the entire wafer 23 with the exception of the contact pads, because these are covered beforehand by means of a photomask by applying a passivation layer 29.
  • the upper wafer 21 also consists essentially of silicon, but has a layer of silicon dioxide on its surface, which serves as a sacrificial layer.
  • the gimbal-suspended platform 3 and the magnetic legs are constructed on this wafer from a section 17, 18, 19, 20 of soft or soft and hard magnetic material for driving them.
  • the platform 3 or the first and second pivotable devices serving as supports are produced by means of relevant processes in silicon mechanics.
  • the sacrificial layer is removed in areas in which the anchoring 30 of the solid-state joints of the gimbal-suspended platform 3 takes place.
  • the sequence of steps for this is:
  • a layer of polycrystalline silicon (polysilicon) is then applied over the entire surface, from which later the webs or solid joints 4, 6, the second carrier or gimbal ring 5 and the first carrier 3 or the platform structure arise.
  • the next step is to generate the cavity in the wafer 21 in the region of the first carrier 3.
  • the rear side of the wafer 21 pointing upwards in the figures is masked by means of a photomask and the cavity is shaped by means of anisotropic etching.
  • the next Manufacturing steps again take place on the wafer surface, which is shown in the figures facing downwards.
  • the structure of webs or solid-state joints 4, 6, second carrier or gimbal ring 5 and first carrier or platform 3 is defined by means of a photomask and then produced by reactive etching.
  • the upper flux guide is then applied, the sequence of steps corresponds to the sequence discussed in the manufacture of the lower magnetic legs of the lower wafer 23.
  • the sacrificial layer is removed by means of reactive etching and thus the gimbaled platform 3 is exposed.
  • the upward-facing wafer surface is coated with a reflective material 25 by means of sputtering or other suitable coating processes known to the person skilled in the art. This completes the wafer processing process for both wafers 21, 23.
  • the next step is to produce the overall system by connecting the wafers. However, due to the necessary distance between the two wafers, this does not take place directly; rather, a spacer or spacer layer 22 is introduced between the two.
  • connection of the three parts of upper wafer 21, spacer 22 and lower wafer 23 takes place by means of a semiconductor bonding process known to the person skilled in the art. Separation is used to separate them into individual systems or arrays. In the following description of the materials used, reference is first made to the materials of the magnet system.
  • a material with a high saturation flux density is preferably used as the soft magnetic material for the magnetic legs.
  • nickel iron called “Permalloy” is used, in the most preferred embodiments a composition of NiFe in at% (81:19), or NiFe in at% 45:55, called “Sendust” AlFeSi and NiFeTa. Since nickel-iron can be electrodeposited, it is a particularly preferred candidate.
  • the permanent or hard magnetic material is selected from the group consisting of cobalt-chromium-tantalum compounds and alloys, cobalt-platinum Chromium compounds and -
  • the preferred conductor material for supply lines and coil layers 26, 27 is copper, since it shows a significantly lower tendency to electromigration than other conductors.
  • other electrically conductive materials can also be used.
  • Inorganic materials such as A1 2 0 3 or Si0 2 , which can also be used as a passivation layer 29, are suitable as insulators.
  • organic materials can also be used, which are particularly advantageous if they can be structured photolithographically.
  • a photosensitive epoxy resin with the brand name SU8 is particularly well suited for photolithographic structuring without restricting generality.
  • Polycrystalline silicon polysilicon
  • silicon dioxide Si0 2
  • the surface is metallized with gold or aluminum.
  • the invention has been described with reference to a device in which the coils generating the magnetic field were not arranged to be movable, the invention also includes pivotable devices in which field-generating coils are arranged on the pivotable devices 3, 5.
  • the solid-state joints 4, 6 designed as webs can carry conductor tracks for controlling these coils.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Micromachines (AREA)

Abstract

La présente invention a pour objet, dans un dispositif orientable à entraînement magnétique, doté d'un premier système servant à produire un champ magnétique, de permettre un découplage du mouvement de rotation ou de pivotement, d'intensité supérieure à celle des dispositifs conventionnels. A cet effet, un premier support orientable sur lequel peuvent s'exercer des forces résultant du champ magnétique produit, lesdites forces produisant un mouvement de pivotement dudit support.
PCT/EP2000/012414 2000-12-08 2000-12-08 Dispositif micromecanique orientable a entrainement magnetique et procede permettant sa realisation WO2002047241A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/EP2000/012414 WO2002047241A1 (fr) 2000-12-08 2000-12-08 Dispositif micromecanique orientable a entrainement magnetique et procede permettant sa realisation
AU2001231560A AU2001231560A1 (en) 2000-12-08 2000-12-08 Micromechanical, rotating device with a magnetic drive and method for the production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2000/012414 WO2002047241A1 (fr) 2000-12-08 2000-12-08 Dispositif micromecanique orientable a entrainement magnetique et procede permettant sa realisation

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WO2002047241A1 true WO2002047241A1 (fr) 2002-06-13

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WO (1) WO2002047241A1 (fr)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10260009B4 (de) * 2002-12-18 2007-12-27 Gatzen, Hans-Heinrich, Prof. Dr.-Ing. Schreib-/Lesekopf mit integriertem Mikroaktor
EP2597859A1 (fr) 2004-11-15 2013-05-29 Scaneva Ltd. Procédé et dispositif de balayage de la lumière
US9157790B2 (en) 2012-02-15 2015-10-13 Apple Inc. Integrated optoelectronic modules with transmitter, receiver and beam-combining optics for aligning a beam axis with a collection axis
US9435638B2 (en) 2012-03-22 2016-09-06 Apple Inc. Gimbaled scanning mirror array
US9482863B2 (en) 2012-10-23 2016-11-01 Apple Inc. Production of micro-mechanical devices
US9703096B2 (en) 2015-09-30 2017-07-11 Apple Inc. Asymmetric MEMS mirror assembly
US9784838B1 (en) 2014-11-26 2017-10-10 Apple Inc. Compact scanner with gimbaled optics
US9798135B2 (en) 2015-02-16 2017-10-24 Apple Inc. Hybrid MEMS scanning module
US9835853B1 (en) 2014-11-26 2017-12-05 Apple Inc. MEMS scanner with mirrors of different sizes
US9897801B2 (en) 2015-09-30 2018-02-20 Apple Inc. Multi-hinge mirror assembly
US10018723B2 (en) 2012-07-26 2018-07-10 Apple Inc. Dual-axis scanning mirror
US10488652B2 (en) 2016-09-21 2019-11-26 Apple Inc. Prism-based scanner
US11604347B2 (en) 2019-08-18 2023-03-14 Apple Inc. Force-balanced micromirror with electromagnetic actuation

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4100358A1 (de) * 1991-01-05 1992-07-09 Robotron Bueromasch Ag Schwingspiegelanordnung
EP0657760A1 (fr) * 1993-09-15 1995-06-14 Texas Instruments Incorporated Système de simulation et projection d'images
DE19712201A1 (de) * 1997-03-24 1998-10-01 Bodenseewerk Geraetetech Mikromechanische Spiegel-Anordnung
DE19754676A1 (de) * 1997-12-10 1999-06-17 Thomas Dipl Ing Frank Vorrichtung und Verfahren zur periodischen Ablenkung von Lichtstrahlen mit vom Betrag konstanter Ablenkgeschwindigkeit
US6108117A (en) 1998-10-30 2000-08-22 Eastman Kodak Company Method of making magnetically driven light modulators
US6141139A (en) 1998-11-30 2000-10-31 Eastman Kodak Company Method of making a bistable micromagnetic light modulator

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4100358A1 (de) * 1991-01-05 1992-07-09 Robotron Bueromasch Ag Schwingspiegelanordnung
EP0657760A1 (fr) * 1993-09-15 1995-06-14 Texas Instruments Incorporated Système de simulation et projection d'images
DE19712201A1 (de) * 1997-03-24 1998-10-01 Bodenseewerk Geraetetech Mikromechanische Spiegel-Anordnung
DE19754676A1 (de) * 1997-12-10 1999-06-17 Thomas Dipl Ing Frank Vorrichtung und Verfahren zur periodischen Ablenkung von Lichtstrahlen mit vom Betrag konstanter Ablenkgeschwindigkeit
US6108117A (en) 1998-10-30 2000-08-22 Eastman Kodak Company Method of making magnetically driven light modulators
US6141139A (en) 1998-11-30 2000-10-31 Eastman Kodak Company Method of making a bistable micromagnetic light modulator

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10260009B4 (de) * 2002-12-18 2007-12-27 Gatzen, Hans-Heinrich, Prof. Dr.-Ing. Schreib-/Lesekopf mit integriertem Mikroaktor
EP2597859A1 (fr) 2004-11-15 2013-05-29 Scaneva Ltd. Procédé et dispositif de balayage de la lumière
US8797623B2 (en) 2004-11-15 2014-08-05 Scaneva Ltd. Method and device for scanning light
EP2362634A3 (fr) * 2004-11-15 2015-08-12 Scaneva Ltd. Procédé et dispositif de balayage de la lumière
US9157790B2 (en) 2012-02-15 2015-10-13 Apple Inc. Integrated optoelectronic modules with transmitter, receiver and beam-combining optics for aligning a beam axis with a collection axis
US9651417B2 (en) 2012-02-15 2017-05-16 Apple Inc. Scanning depth engine
US9435638B2 (en) 2012-03-22 2016-09-06 Apple Inc. Gimbaled scanning mirror array
US10018723B2 (en) 2012-07-26 2018-07-10 Apple Inc. Dual-axis scanning mirror
US9482863B2 (en) 2012-10-23 2016-11-01 Apple Inc. Production of micro-mechanical devices
US9784838B1 (en) 2014-11-26 2017-10-10 Apple Inc. Compact scanner with gimbaled optics
US9835853B1 (en) 2014-11-26 2017-12-05 Apple Inc. MEMS scanner with mirrors of different sizes
US9798135B2 (en) 2015-02-16 2017-10-24 Apple Inc. Hybrid MEMS scanning module
US9703096B2 (en) 2015-09-30 2017-07-11 Apple Inc. Asymmetric MEMS mirror assembly
US9897801B2 (en) 2015-09-30 2018-02-20 Apple Inc. Multi-hinge mirror assembly
US10488652B2 (en) 2016-09-21 2019-11-26 Apple Inc. Prism-based scanner
US11604347B2 (en) 2019-08-18 2023-03-14 Apple Inc. Force-balanced micromirror with electromagnetic actuation

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