WO2002006560A1 - Materiau calibre et ses procedes de synthese et de traitement - Google Patents
Materiau calibre et ses procedes de synthese et de traitement Download PDFInfo
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- WO2002006560A1 WO2002006560A1 PCT/JP2001/006138 JP0106138W WO0206560A1 WO 2002006560 A1 WO2002006560 A1 WO 2002006560A1 JP 0106138 W JP0106138 W JP 0106138W WO 0206560 A1 WO0206560 A1 WO 0206560A1
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- Prior art keywords
- etching
- film
- graded
- rate
- additive
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- 239000000463 material Substances 0.000 title claims abstract description 74
- 238000000034 method Methods 0.000 title claims description 22
- 230000015572 biosynthetic process Effects 0.000 title description 14
- 238000003786 synthesis reaction Methods 0.000 title description 2
- 238000005530 etching Methods 0.000 claims abstract description 50
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000654 additive Substances 0.000 claims abstract description 10
- 239000011521 glass Substances 0.000 claims abstract description 10
- 230000000996 additive effect Effects 0.000 claims abstract description 9
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 8
- 239000011737 fluorine Substances 0.000 claims abstract description 8
- 239000000126 substance Substances 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- 238000001308 synthesis method Methods 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- -1 composed of Si 2 Substances 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- 238000010189 synthetic method Methods 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 47
- 238000005516 engineering process Methods 0.000 description 10
- 239000013078 crystal Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000011651 chromium Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3694—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer having a composition gradient through its thickness
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
- H01L21/02131—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being halogen doped silicon oxides, e.g. FSG
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/31604—Deposition from a gas or vapour
- H01L21/31629—Deposition of halogen doped silicon oxide, e.g. fluorine doped silicon oxide
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/213—SiO2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/91—Coatings containing at least one layer having a composition gradient through its thickness
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/328—Partly or completely removing a coating
- C03C2218/33—Partly or completely removing a coating by etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/316—Inorganic layers composed of oxides or glassy oxides or oxide based glass
- H01L21/31604—Deposition from a gas or vapour
- H01L21/31608—Deposition of SiO2
- H01L21/31612—Deposition of SiO2 on a silicon body
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
Definitions
- the present invention relates to a gradient material in which an etching rate changes in a depth direction, and a synthesis method and a processing method thereof.
- a material called a functionally graded material has been known, and its development is being actively conducted.
- Japanese Patent Application Laid-Open No. 5-345977 discloses a material structure and a manufacturing apparatus. According to the disclosure, "in the functionally graded material, the composition distribution inside changes continuously. Material ".
- An effect that can be expected for a material in which such a composition distribution is continuously changing is to increase the heat resistance, and many developments have been made from this viewpoint.
- it is receiving attention as a material that can respond to extreme temperature changes.
- Japanese Patent Application Laid-Open No. H5-18316 discloses that also in the field of electronics, a material whose composition distribution changes in a gradient manner is effective for forming an insulating layer. I have.
- Japanese Patent Application Laid-Open No. H08-231128 discloses that an antireflection film is formed by manufacturing a material whose refractive index changes in a gradient manner on a glass substrate or the like.
- a thin film is formed on the surface of a glass substrate having a refractive index of about 1.5, and the refractive index near the substrate of the thin film is about 2.0, and the refractive index gradually approaches the outermost surface of the film.
- a structure has been proposed in which the outermost surface is reduced to about 1.55.
- the reflectivity can be reduced to 1.5% or less on a glass surface showing a reflectance of about 4% when such a thin film is formed.
- an anti-reflection film has a high refractive index material and a low refractive index material deposited alternately. This is generally achieved by performing The method disclosed here is expected as a technique that can realize an antireflection function more easily and in a wide wavelength range.
- functionally graded materials are materials that attract attention in many fields. However, most of the applications fall into the category of utilizing the characteristics exhibited by the sloping composition distribution.
- microfabrication technology is widely used not only in semiconductors but also in the optical field.
- lenses with a diameter of 1 mm or less which are very small compared to conventional lenses, and diffraction gratings with a concavo-convex structure of about 1 ⁇ m, etc., are manufactured using microfabrication technology.
- microoptics the field of dealing with such microscopic optical elements has been referred to as microoptics.
- the general manufacturing method of Microoptics Technology (published in 1999 by Maecel Dekker, Inc.) An overview of all the optical elements that are available is provided.
- Optical elements are often manufactured using plastic molds, glass molds, etc., as well as micro-lenses, diffraction gratings, diffraction lenses, etc. by combining photolithography and reactive etching techniques. Thus, three-dimensional bulges (lenses) and grooves (diffractive optical elements) are necessary to obtain specific optical characteristics.
- Japanese Patent Application Laid-Open No. H11-123 771 discloses a method for chemically etching a material in a solution (wet etching) which can be used most easily. The formation of a stamper is disclosed. This technology forms a spherical recess, but when isotropic material such as glass is etched, a shape with a spherical surface due to the isotropic nature of the etching is obtained.
- a crystal having no isotropic etching characteristics can realize an etching shape due to the symmetry of the crystal.
- anisotropic etching there is a method of forming a V-shaped groove using a Si single crystal. In this case, a shape can be formed at a specific angle in a specific direction, and it is used as a fixing groove for an optical fiber. I have.
- etching depends on the intrinsic properties of those materials, realizing various desired shapes. There was a limit. For example, a lens cannot essentially form an aspherical lens. Diffraction gratings with V-grooves can secure various degrees of freedom by changing the angle of the grooves.However, etching that depends on the nature of the material can form only a limited angle, and the degree of freedom is greatly reduced Limited.
- the present invention has been made to solve such a problem, and an object of the present invention is to relieve the limitation on the shape obtained by etching by using a gradient material.
- the present invention provides a gradient material in which the etching rate by a specific chemical substance changes continuously or stepwise from the top surface to the inside.
- an additive capable of changing the etching rate is added to the main material, and the concentration of the additive is changed continuously or stepwise.
- the main material is a glass material containing Sio 2 as a main component and the additive is fluorine
- a gradient material in which the etching rate by a hydrofluoric acid aqueous solution changes in the depth direction can be obtained. Its synthesis is carried out by a method of mixing a fluorine while deposition of the S I_ ⁇ 2 film on the substrate.
- a gradient material can be synthesized by using a chemical vapor deposition method and changing the ratio of the flow rate of the fluorine source gas to the flow rate of the sio 2 source gas in the growth tank over time. .
- a feature of the present invention is that anisotropic etching is realized by using an originally isotropic material, glass, and changing the etching rate inward. Also, the anisotropy is not predetermined as in the case of a single crystal, but can be set arbitrarily. The point is that the impossible shape can be realized by the well-known technology of wet etching.
- FIG. 1 is a schematic diagram of a gradient material film forming apparatus of the present invention.
- FIG. 2 is a diagram showing the relationship between the etching time and the residual film thickness in the example.
- FIG. 3 is a diagram showing a relationship between an etching time and a residual film thickness in another example.
- FIG. 4 is a flowchart of a method for processing a gradient material according to the present invention.
- FIG. 5 is a simulated view of an electron micrograph showing an example of the method for processing a gradient material according to the present invention.
- 10 is a reaction vessel
- 20, 21 and 22 are mass flow controllers
- 30, 31 are electrodes
- 40 and 42 are substrates
- 50 is a high frequency power supply
- 60 is a heater
- 80 Is a gradient material film
- 82 is a chromium film
- 84 is a photoresist.
- PC VD method plasma chemical vapor deposition method
- the PCVD method is a well-established technique and is not a technology that constitutes the main part of the present invention, it is necessary to synthesize a material in which the etching rate intended by the present invention changes obliquely to the internal direction.
- Other methods for example, a vacuum evaporation method, a sputtering method, and the like can be used to realize the purpose of the present invention.
- FIG. 1 shows a schematic view of the PCVD apparatus used in the present invention.
- Material mainly laminate is S i 0 2
- additives to change the etch rate (dopant) is fluorine (F).
- TEOS is a liquid at room temperature, but the required vapor pressure can be obtained by heating. It was introduced into the reaction vessel 10. Since CF 4 is a gas, it was introduced as is. Oxygen was mixed and introduced to decompose TEOS and obtain Si ⁇ ⁇ 2 . When introducing these source gases, the mass flow controllers 20, 21, and 22 controlled the respective flow rates.
- the reaction vessel 10 is provided with parallel plate electrodes 30 and 31, and the substrate 40 can be placed on one of the electrodes 30.
- the raw material was allowed to enter the reaction vessel 10 from the vicinity of the other electrode 31, so that it was easier to turn into plasma and the in-plane uniformity was improved.
- the frequency of the high frequency (R F) supplied to the electrode from the high frequency power supply 50 was 13.4 MHz.
- the substrate was heated by a heater 60 to about 400 ° C.
- the substrate is not particularly limited, but an Si single crystal wafer, a glass substrate, or the like was used.
- the etching was performed for a predetermined time, and the step difference from the region where the film was not present was measured with a stylus-type step meter to determine the thickness of the film after the etching. Since silicon is not affected by hydrofluoric acid, the masked area was treated as the reference height.
- Figure 2 shows the change in film thickness depending on the etching time.
- the etching rate is 25 On mZ near the surface where the etching time is short, but as the etching proceeds inside, the etching rate drops to 62 nm / min. Have different materials.
- Example 2 Film formation was performed using the same apparatus as in Example 1.
- Example 1 a material whose etching speed changes stepwise was obtained, but in this example, a material that changes continuously was manufactured.
- TEOS flow rate 7 sccm
- ⁇ 2 flow 2 3 3 sccm
- RF power 2 5 0 W
- basic and the substrate temperature 4 0 0 ° C
- the film thickness was changed continuously to 50 sccm at the end of the film formation to obtain a film of about 6 m.
- Figure 4 shows a flow chart of the steps from the fabrication of the graded material to the processing.
- a metal Cr film 82 is formed on the surface of such a gradient material film 80 by a sputtering method, and a photoresist 84 is applied.
- a lattice pattern 90 was formed.
- RIE reactive 'ion ion etching
- Fig. 5 is a simulated view of a scanning electron microscope (SEM) photograph of the obtained structure. A three-dimensional shape with an umbrella on top was created. This is because the upper part has a lower etching rate and the lower part has a high etching rate. Although the extreme case is shown here, it can be seen that any side shape can be obtained depending on the doping method.
- SEM scanning electron microscope
- the number is limited to the range of several /, but the thickness is not an essential issue, and a thick film can be applied.
- the present invention it is possible to easily obtain a material capable of arbitrarily forming a three-dimensional shape by wet etching. That is, in accordance with the gist of the present invention, by creating a gradient material in which the etching speed is changed in the depth direction of the material, it is possible to control the processing shape beyond the range of conventional isotropic materials and crystal materials. Is possible.
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Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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EP01948029A EP1306464A4 (en) | 2000-07-18 | 2001-07-16 | CALIBER MATERIAL AND METHODS OF SYNTHESIS AND PROCESSING |
US10/333,206 US6984436B2 (en) | 2000-07-18 | 2001-07-16 | Graded material and method for synthesis thereof and method for processing thereof |
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JP2000216824A JP2002030440A (ja) | 2000-07-18 | 2000-07-18 | 傾斜材料およびその合成、加工方法 |
JP2000-216824 | 2000-07-18 |
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WO2002006560A1 true WO2002006560A1 (fr) | 2002-01-24 |
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PCT/JP2001/006138 WO2002006560A1 (fr) | 2000-07-18 | 2001-07-16 | Materiau calibre et ses procedes de synthese et de traitement |
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US (1) | US6984436B2 (ja) |
EP (1) | EP1306464A4 (ja) |
JP (1) | JP2002030440A (ja) |
WO (1) | WO2002006560A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1329432A1 (en) * | 2002-01-18 | 2003-07-23 | Nippon Sheet Glass Co., Ltd. | Method for producing aspherical structure, and aspherical lens array molding tool and aspherical lens array produced by the same method |
Families Citing this family (7)
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WO2004078667A1 (ja) * | 2003-03-03 | 2004-09-16 | Olympus Corporation | ガラス基材の加工方法、加工ガラス製品及び応力印加装置 |
US8481417B2 (en) | 2007-08-03 | 2013-07-09 | Micron Technology, Inc. | Semiconductor structures including tight pitch contacts and methods to form same |
US7723240B2 (en) * | 2008-05-15 | 2010-05-25 | Macronix International Co., Ltd. | Methods of low temperature oxidation |
US20110223385A1 (en) * | 2010-03-15 | 2011-09-15 | Ming Liang Shiao | Roofing granules with high solar reflectance, roofing products with high solar reflectance, and process for preparing same |
CA2783777A1 (en) | 2011-08-18 | 2013-02-18 | Certainteed Corporation | System, method and apparatus for increasing average reflectance of a roofing product for sloped roof |
JP6929021B2 (ja) * | 2016-04-25 | 2021-09-01 | Sppテクノロジーズ株式会社 | シリコン酸化膜の製造方法 |
US20240111078A1 (en) | 2022-09-29 | 2024-04-04 | Visera Technologies Company Limited | Method forming grating device |
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JPS63131542A (ja) * | 1986-11-20 | 1988-06-03 | Nec Kansai Ltd | 半導体装置の製造方法 |
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JPH1187310A (ja) * | 1997-08-13 | 1999-03-30 | Korea Electron Telecommun | 緩やかな傾斜を有する酸化膜パターン形成のための半導体素子の製造方法 |
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US5200024A (en) * | 1990-02-28 | 1993-04-06 | At&T Bell Laboratories | Wet chemical etching technique for optical fibers |
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JP3180921B2 (ja) | 1991-07-11 | 2001-07-03 | トヨタ自動車株式会社 | アルコール系燃料を使用する内燃機関用のシリンダ |
JPH05345977A (ja) | 1991-09-12 | 1993-12-27 | Toshio Hirai | 傾斜機能材料の製造方法及び製造装置 |
US5811191A (en) | 1994-12-27 | 1998-09-22 | Ppg Industries, Inc. | Multilayer antireflective coating with a graded base layer |
JPH11217237A (ja) * | 1996-03-25 | 1999-08-10 | Nippon Sheet Glass Co Ltd | レーザ加工用ガラス基材及びレーザ加工方法 |
JP2873937B2 (ja) * | 1996-05-24 | 1999-03-24 | 工業技術院長 | ガラスの光微細加工方法 |
TW335511B (en) * | 1996-08-02 | 1998-07-01 | Applied Materials Inc | Stress control by fluorination of silica film |
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- 2000-07-18 JP JP2000216824A patent/JP2002030440A/ja active Pending
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2001
- 2001-07-16 US US10/333,206 patent/US6984436B2/en not_active Expired - Fee Related
- 2001-07-16 EP EP01948029A patent/EP1306464A4/en not_active Withdrawn
- 2001-07-16 WO PCT/JP2001/006138 patent/WO2002006560A1/ja active Application Filing
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EP1329432A1 (en) * | 2002-01-18 | 2003-07-23 | Nippon Sheet Glass Co., Ltd. | Method for producing aspherical structure, and aspherical lens array molding tool and aspherical lens array produced by the same method |
US7329372B2 (en) | 2002-01-18 | 2008-02-12 | Nippon Sheet Glass Co., Ltd. | Method for producing aspherical structure, and aspherical lens array molding tool and aspherical lens array produced by the same method |
Also Published As
Publication number | Publication date |
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EP1306464A1 (en) | 2003-05-02 |
JP2002030440A (ja) | 2002-01-31 |
US6984436B2 (en) | 2006-01-10 |
EP1306464A4 (en) | 2008-01-16 |
US20050064197A1 (en) | 2005-03-24 |
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