WO2001036321A9 - Appareil et procede de formation d"une membrane a pores a l"echelle nanometrique - Google Patents

Appareil et procede de formation d"une membrane a pores a l"echelle nanometrique

Info

Publication number
WO2001036321A9
WO2001036321A9 PCT/US2000/031749 US0031749W WO0136321A9 WO 2001036321 A9 WO2001036321 A9 WO 2001036321A9 US 0031749 W US0031749 W US 0031749W WO 0136321 A9 WO0136321 A9 WO 0136321A9
Authority
WO
WIPO (PCT)
Prior art keywords
layer
base layer
etch stop
sacrificial
forming
Prior art date
Application number
PCT/US2000/031749
Other languages
English (en)
Other versions
WO2001036321A1 (fr
Inventor
Derek Hansford
Mauro Ferrari
Original Assignee
Univ California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ California filed Critical Univ California
Priority to JP2001538280A priority Critical patent/JP2003514677A/ja
Priority to AU17781/01A priority patent/AU1778101A/en
Priority to EP00980528A priority patent/EP1233927A4/fr
Publication of WO2001036321A1 publication Critical patent/WO2001036321A1/fr
Publication of WO2001036321A9 publication Critical patent/WO2001036321A9/fr

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D71/00Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02Inorganic material
    • B01D71/022Metals
    • B01D71/0221Group 4 or 5 metals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/00158Diaphragms, membranes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039Inorganic membrane manufacture
    • B01D67/0053Inorganic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/0058Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by selective elimination of components, e.g. by leaching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039Inorganic membrane manufacture
    • B01D67/0053Inorganic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/006Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
    • B01D67/0062Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods by micromachining techniques, e.g. using masking and etching steps, photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039Inorganic membrane manufacture
    • B01D67/0072Inorganic membrane manufacture by deposition from the gaseous phase, e.g. sputtering, CVD, PVD
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D69/00Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/02Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor characterised by their properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D71/00Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02Inorganic material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D71/00Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02Inorganic material
    • B01D71/0215Silicon carbide; Silicon nitride; Silicon oxycarbide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D71/00Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02Inorganic material
    • B01D71/022Metals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2325/00Details relating to properties of membranes
    • B01D2325/02Details relating to pores or porosity of the membranes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2325/00Details relating to properties of membranes
    • B01D2325/02Details relating to pores or porosity of the membranes
    • B01D2325/0283Pore size
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2325/00Details relating to properties of membranes
    • B01D2325/04Characteristic thickness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2325/00Details relating to properties of membranes
    • B01D2325/08Patterned membranes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/06Bio-MEMS
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/10Microfilters, e.g. for gas or fluids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102Surface micromachining
    • B81C2201/0105Sacrificial layer
    • B81C2201/0109Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/01Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0128Processes for removing material
    • B81C2201/013Etching
    • B81C2201/0135Controlling etch progression
    • B81C2201/014Controlling etch progression by depositing an etch stop layer, e.g. silicon nitride, silicon oxide, metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00Manufacture or treatment of microstructural devices or systems
    • B81C2201/05Temporary protection of devices or parts of the devices during manufacturing
    • B81C2201/053Depositing a protective layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)

Abstract

L"invention concerne un procédé de formation d"une membrane à pores à l"échelle nanométrique, qui consiste à former, sur un substrat, une couche (50) d"arrêt de gravure perdue. Sur cette dernière, on construit une couche de base (52), dans laquelle on forme des pores (54) à l"échelle micrométrique. Sur la couche de base, on construit une couche de base perdue, laquelle est enlevée de zones choisies de la couche de base afin d"y définir des pores à l"échelle nanométrique. La membrane résultante présente des pores de 50 nanomètres au maximum.
PCT/US2000/031749 1999-11-17 2000-11-17 Appareil et procede de formation d"une membrane a pores a l"echelle nanometrique WO2001036321A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2001538280A JP2003514677A (ja) 1999-11-17 2000-11-17 ナノメートルスケールの細孔のある膜を形成するための装置及び方法
AU17781/01A AU1778101A (en) 1999-11-17 2000-11-17 Apparatus and method for forming a membrane with nanometer scale pores
EP00980528A EP1233927A4 (fr) 1999-11-17 2000-11-17 Appareil et procede de formation d'une membrane a pores a l'echelle nanometrique

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16604999P 1999-11-17 1999-11-17
US60/166,049 1999-11-17

Publications (2)

Publication Number Publication Date
WO2001036321A1 WO2001036321A1 (fr) 2001-05-25
WO2001036321A9 true WO2001036321A9 (fr) 2002-07-04

Family

ID=22601590

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2000/031749 WO2001036321A1 (fr) 1999-11-17 2000-11-17 Appareil et procede de formation d"une membrane a pores a l"echelle nanometrique

Country Status (4)

Country Link
EP (1) EP1233927A4 (fr)
JP (1) JP2003514677A (fr)
AU (1) AU1778101A (fr)
WO (1) WO2001036321A1 (fr)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1432500B1 (fr) * 2001-10-02 2007-03-07 Sophion Bioscience A/S Pompe a ecoulement electroosmotique a tamis
WO2003028861A1 (fr) * 2001-10-02 2003-04-10 Sophion Bioscience A/S Pompe a debit electro-osmotique a disque corbino
FR2844725B1 (fr) * 2002-09-24 2005-01-07 Commissariat Energie Atomique Procede de fabrication d'une membrane biomimetique, membrane biomimetique et ses applications
US7578954B2 (en) * 2003-02-24 2009-08-25 Corium International, Inc. Method for manufacturing microstructures having multiple microelements with through-holes
DE10353894B4 (de) * 2003-07-11 2007-02-15 Nft Nanofiltertechnik Gmbh Filterelement und Verfahren zu dessen Herstellung
US7632406B2 (en) * 2004-04-20 2009-12-15 Lawrence Livermore National Security, Llc Smart membranes for nitrate removal, water purification, and selective ion transportation
US20080248182A1 (en) * 2004-05-03 2008-10-09 Tjeerd Jongsma Device with a Membrane on a Carrier, as Well as a Method for Manufacturing Such a Membrane
NL1026530C2 (nl) * 2004-06-30 2006-01-02 Friesland Brands Bv Membraan op drager, alsmede werkwijze ter vervaardiging van een dergelijk membraan.
JP2008540070A (ja) * 2005-04-29 2008-11-20 ユニバーシティー オブ ロチェスター 超薄多孔質ナノスケール膜、その製造方法および使用
EP1721657A1 (fr) * 2005-05-13 2006-11-15 SONY DEUTSCHLAND GmbH Méthode de fabrication d'une membrane polymère ayant au moins un pore
US8911749B2 (en) 2007-04-16 2014-12-16 Corium International, Inc. Vaccine delivery via microneedle arrays
EP2146689B1 (fr) 2007-04-16 2020-08-12 Corium, Inc. Réseaux de micro-aiguilles coulées dans un solvant contenant un actif
EP2566501B1 (fr) 2010-05-04 2019-03-13 Corium International, Inc. Méthode et dispositif permettant l'administration transdermique d'hormone parathyroïdienne au moyen d'un réseau de microprojections
EP2517779A1 (fr) * 2011-04-26 2012-10-31 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Membrane composite de nanopores
CA2896188C (fr) 2012-12-21 2021-02-23 Corium International, Inc. Micro-reseau pour la distribution d'un agent therapeutique et ses procedes d'utilisation
ES2921481T3 (es) 2013-03-12 2022-08-26 Corium Inc Aplicadores para microproyecciones
AU2014237279B2 (en) 2013-03-15 2018-11-22 Corium Pharma Solutions, Inc. Microarray with polymer-free microstructures, methods of making, and methods of use
AU2014233695A1 (en) 2013-03-15 2015-10-01 Corium International, Inc. Microarray for delivery of therapeutic agent and methods of use
EP2968751B1 (fr) 2013-03-15 2022-11-30 Corium, Inc. Applicateurs de microprojection d'impacts multiples
WO2014144973A1 (fr) 2013-03-15 2014-09-18 Corium International, Inc. Micro-réseau pour administrer un agent thérapeutique, procédés d'utilisation et procédés de fabrication
WO2016036866A1 (fr) 2014-09-04 2016-03-10 Corium International, Inc. Matrice de microstructures, procédé de production et procédés d'utilisation
US10857093B2 (en) 2015-06-29 2020-12-08 Corium, Inc. Microarray for delivery of therapeutic agent, methods of use, and methods of making
JP7417545B2 (ja) * 2018-05-18 2024-01-18 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア 生体内血液濾過膜およびデバイス

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801380A (en) * 1987-12-23 1989-01-31 The Texas A&M University System Method of producing a silicon film with micropores
NL9401260A (nl) * 1993-11-12 1995-06-01 Cornelis Johannes Maria Van Ri Membraan voor microfiltratie, ultrafiltratie, gasscheiding en katalyse, werkwijze ter vervaardiging van een dergelijk membraan, mal ter vervaardiging van een dergelijk membraan, alsmede diverse scheidingssystemen omvattende een dergelijk membraan.
US5798042A (en) * 1994-03-07 1998-08-25 Regents Of The University Of California Microfabricated filter with specially constructed channel walls, and containment well and capsule constructed with such filters
US5770076A (en) * 1994-03-07 1998-06-23 The Regents Of The University Of California Micromachined capsules having porous membranes and bulk supports
US5651900A (en) * 1994-03-07 1997-07-29 The Regents Of The University Of California Microfabricated particle filter
US5919364A (en) * 1996-06-24 1999-07-06 Regents Of The University Of California Microfabricated filter and shell constructed with a permeable membrane
US5938923A (en) * 1997-04-15 1999-08-17 The Regents Of The University Of California Microfabricated filter and capsule using a substrate sandwich
US6405066B1 (en) * 2000-03-17 2002-06-11 The Regents Of The University Of California Implantable analyte sensor

Also Published As

Publication number Publication date
EP1233927A1 (fr) 2002-08-28
WO2001036321A1 (fr) 2001-05-25
JP2003514677A (ja) 2003-04-22
AU1778101A (en) 2001-05-30
EP1233927A4 (fr) 2003-01-08

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