WO2001012636A1 - Procede de production d'hexamethyldisilazane - Google Patents
Procede de production d'hexamethyldisilazane Download PDFInfo
- Publication number
- WO2001012636A1 WO2001012636A1 PCT/EP2000/007437 EP0007437W WO0112636A1 WO 2001012636 A1 WO2001012636 A1 WO 2001012636A1 EP 0007437 W EP0007437 W EP 0007437W WO 0112636 A1 WO0112636 A1 WO 0112636A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ammonia
- pressure
- chlorotrimethylsilane
- hexamethyldisilazane
- temperature
- Prior art date
Links
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 title claims abstract description 44
- 238000000034 method Methods 0.000 title claims abstract description 20
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 47
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 23
- 239000011541 reaction mixture Substances 0.000 claims abstract description 10
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 239000012071 phase Substances 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 5
- 239000008346 aqueous phase Substances 0.000 claims description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims 1
- AZFVLHQDIIJLJG-UHFFFAOYSA-N chloromethylsilane Chemical compound [SiH3]CCl AZFVLHQDIIJLJG-UHFFFAOYSA-N 0.000 abstract 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 14
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 235000019270 ammonium chloride Nutrition 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 239000005051 trimethylchlorosilane Substances 0.000 description 3
- 239000007799 cork Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000010626 work up procedure Methods 0.000 description 2
- 229930186147 Cephalosporin Natural products 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229930182555 Penicillin Natural products 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229940124587 cephalosporin Drugs 0.000 description 1
- 150000001780 cephalosporins Chemical class 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- IWUHBAHBVDGXLD-UHFFFAOYSA-N hydroxysilyl(trimethyl)silane Chemical compound C[Si]([SiH2]O)(C)C IWUHBAHBVDGXLD-UHFFFAOYSA-N 0.000 description 1
- 150000002960 penicillins Chemical class 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229940088594 vitamin Drugs 0.000 description 1
- 229930003231 vitamin Natural products 0.000 description 1
- 235000013343 vitamin Nutrition 0.000 description 1
- 239000011782 vitamin Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
Definitions
- the present invention relates to an improved process for the preparation of hexamethyldisilazane of the formula (CH 3 ) 3 Si-NH-Si (CH 3 ) 3 from chlorotrimethylsilane and ammonia.
- Hexamethyldisilazane is a chemical that can be used industrially in many different ways. It is used, for example, as a silylation reagent in the manufacture of penicillins, cephalosporins and vitamins, for the hydrophobization of surfaces and polymers which have OH groups and as an aid in phosgenation.
- n-Hexane Common organic solvents, e.g. n-Hexane must be used in amounts of at least 4 parts by weight, better at least 6 parts by weight (based on 1 part by weight of chlorotrimethylsilane), because otherwise reaction mixtures which are difficult or impossible to stir are obtained. If hexamethyldisilazane which has already been prepared is used as the solvent, it can be used in small amounts. That as
- By-product resulting ammonium chloride then contains part of the hexamethyldisilazane and cannot be separated from it by normal distillation. You either have to use a thin-film evaporator or convert the hexamethyldisilazane contained in the ammonium chloride to hexamethyldisiloxane with dilute hydrochloric acid. It is also possible that the reaction mixture despite the Use of excess ammonia still contains unreacted chlorotrimethylsilane (see DE-OS 26 45 792).
- DE-OS 26 45 703 describes the preparation of hexamethyldisilazane from chlorotrimethylsilane and ammonia in hexamethyldisilazane as solvent (at least 1 part by weight of solvent per part by weight of chlorotrimethylsilane), with large amounts of water being added to work up the reaction mixture and the ammonium chloride as aqueous Solution is separated.
- Reaction vessels with special stirrers carried out a so-called high-shear agitation, so that the ammonium chloride is obtained in a more manageable form.
- extremely difficult to handle sodium amide is added to the hexamethyldisilazane prepared before the distillation in order to remove the ammonium chloride contained therein.
- Dewar vessels are used to handle liquefied gases at low temperatures and cork stoppers can only be used at normal pressure or reduced pressure, it is obvious that work was carried out at temperatures below -33 ° C and under normal pressure. There is therefore still a need for a process for the preparation of hexamethyldisilazane which does not require solvents or special apparatus, which gives the desired product in high yields and which can be used with shorter metering and reaction times.
- a process has now been found for the preparation of hexamethyldisilazane from chlorotrimethylsilane and ammonia, which is characterized in that ammonia and chlorotrimethylsilane are brought together in a pressure-resistant vessel at 60 to 150 ° C. and the reaction mixture is cooled to -10 to + 45 ° C. - is working.
- ammonia e.g. Use in 1.5 to 6 times, preferably in 2 to 4 times the amount that is theoretically required.
- Ammonia and chlorotrimethylsilane are preferably brought together at 70 to 120 ° C. You can e.g. proceed in such a way that the ammonia is placed in the pressure-resistant reaction vessel, heated to the desired temperature and then the chlorotrimethylsilane is pumped in, for example, over the course of 5-60 minutes. Ammonia and chlorotrimethylsilane can also be pumped simultaneously into the pressure-resistant reaction vessel at the desired temperature. Continuous operation is also possible, in which the starting materials are introduced simultaneously or alternately in succession into a pressure-resistant reaction tube kept at the desired temperature.
- the pressure can be, for example, 30 to 100 bar. It is preferably in the range from 35 to 80 bar. If necessary, the chlorotrimethylsilane inlet tube can be flushed or cleared with nitrogen immediately before the start of the inlet, for example by pressing 1 to 5 bar of nitrogen through the inlet tube into the pressure-resistant reaction vessel.
- the temperature can e.g. deviate from the reaction temperature by up to + 20 ° C or fall during stirring, e.g. up to room temperature or up to 10 ° C above room temperature.
- reaction mixture present is then cooled to -10 to + 45 ° C., preferably -5 to + 15 ° C.
- the workup can then be carried out in various ways.
- the pressure can now be released and the ammonium chloride formed can be separated from the present suspension by filtration and, if appropriate, the filtrate distilled.
- the cooled reaction mixture which is still under pressure, e.g. 1 to 2 equivalents, preferably 1.1 to 1.5 equivalents of aqueous alkali lye, the temperature being kept in the range from -10 to + 50 ° C, preferably -5 to + 20 ° C, e.g. by pre-cooling the alkali and / or cooling the reaction mixture. Then you can relax and separate the aqueous phase from the product phase.
- the product phase can e.g. by
- ammonium chloride present in the aqueous phase can optionally be worked up separately to form ammonia and a saline solution.
- the aqueous alkali can also be added only after partial or complete pressure release. Other processing methods are also possible.
- the inventive method allows the production of hexamethyldisilazane in a simple manner, without the use of solvents, without the use of
- the product phase contained 97.6% hexamethyldisilazane.
- the TOC value of the water phase was 340 mg / 1.
- Example 2 was repeated, but only 153 g of ammonia were used. A product phase was obtained which contained 95.5% hexamethyldisilazane.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU62790/00A AU6279000A (en) | 1999-08-13 | 2000-07-31 | Method of producing hexamethyldisilazane |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19938475.4 | 1999-08-13 | ||
DE1999138475 DE19938475A1 (de) | 1999-08-13 | 1999-08-13 | Verfahren zur Herstellung von Hexamethyldisilazan |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2001012636A1 true WO2001012636A1 (fr) | 2001-02-22 |
Family
ID=7918336
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2000/007437 WO2001012636A1 (fr) | 1999-08-13 | 2000-07-31 | Procede de production d'hexamethyldisilazane |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU6279000A (fr) |
DE (1) | DE19938475A1 (fr) |
WO (1) | WO2001012636A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106883257A (zh) * | 2017-01-19 | 2017-06-23 | 浙江硕而博化工有限公司 | 三甲基氯硅烷生产六甲基二硅氮烷新工艺 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004051899A1 (de) * | 2004-10-26 | 2006-04-27 | Wacker Chemie Ag | Verfahren zur Herstellung von Organosilazanen |
US11311952B2 (en) | 2018-01-31 | 2022-04-26 | Milwaukee Electric Tool Corporation | Reciprocating saw |
-
1999
- 1999-08-13 DE DE1999138475 patent/DE19938475A1/de not_active Withdrawn
-
2000
- 2000-07-31 WO PCT/EP2000/007437 patent/WO2001012636A1/fr active Application Filing
- 2000-07-31 AU AU62790/00A patent/AU6279000A/en not_active Abandoned
Non-Patent Citations (1)
Title |
---|
R. O. SAUER; R. H. HASEK: "Derivatives of Methylchlorosilanes. IV Amines", JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 68, 1946, pages 241 - 244, XP002149017 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106883257A (zh) * | 2017-01-19 | 2017-06-23 | 浙江硕而博化工有限公司 | 三甲基氯硅烷生产六甲基二硅氮烷新工艺 |
Also Published As
Publication number | Publication date |
---|---|
DE19938475A1 (de) | 2001-02-15 |
AU6279000A (en) | 2001-03-13 |
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