WO2000060670A3 - Integrierte halbleitervorrichtung mit einem lateralen leistungselement - Google Patents
Integrierte halbleitervorrichtung mit einem lateralen leistungselement Download PDFInfo
- Publication number
- WO2000060670A3 WO2000060670A3 PCT/DE2000/000812 DE0000812W WO0060670A3 WO 2000060670 A3 WO2000060670 A3 WO 2000060670A3 DE 0000812 W DE0000812 W DE 0000812W WO 0060670 A3 WO0060670 A3 WO 0060670A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor device
- power gate
- semiconductor layer
- lateral power
- integrated semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 8
- 239000000758 substrate Substances 0.000 abstract 2
- 230000000903 blocking effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7816—Lateral DMOS transistors, i.e. LDMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/7602—Making of isolation regions between components between components manufactured in an active substrate comprising SiC compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/7605—Making of isolation regions between components between components manufactured in an active substrate comprising AIII BV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
- H01L29/0696—Surface layout of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66053—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide
- H01L29/66068—Multistep manufacturing processes of devices having a semiconductor body comprising crystalline silicon carbide the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/107—Substrate region of field-effect devices
- H01L29/1075—Substrate region of field-effect devices of field-effect transistors
- H01L29/1079—Substrate region of field-effect devices of field-effect transistors with insulated gate
- H01L29/1083—Substrate region of field-effect devices of field-effect transistors with insulated gate with an inactive supplementary region, e.g. for preventing punch-through, improving capacity effect or leakage current
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1602—Diamond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1608—Silicon carbide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00926684A EP1177576A2 (de) | 1999-03-31 | 2000-03-16 | Integrierte halbleitervorrichtung mit einem lateralen leistungselement |
JP2000610070A JP2002541668A (ja) | 1999-03-31 | 2000-03-16 | 横型パワー素子を有する集積半導体装置 |
US09/968,660 US20020070412A1 (en) | 1999-03-31 | 2001-10-01 | Integrated semiconductor device having a lateral power element |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19914803 | 1999-03-31 | ||
DE19914803.1 | 1999-03-31 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/968,660 Continuation US20020070412A1 (en) | 1999-03-31 | 2001-10-01 | Integrated semiconductor device having a lateral power element |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2000060670A2 WO2000060670A2 (de) | 2000-10-12 |
WO2000060670A3 true WO2000060670A3 (de) | 2001-07-26 |
Family
ID=7903200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2000/000812 WO2000060670A2 (de) | 1999-03-31 | 2000-03-16 | Integrierte halbleitervorrichtung mit einem lateralen leistungselement |
Country Status (4)
Country | Link |
---|---|
US (1) | US20020070412A1 (de) |
EP (1) | EP1177576A2 (de) |
JP (1) | JP2002541668A (de) |
WO (1) | WO2000060670A2 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7589007B2 (en) * | 1999-06-02 | 2009-09-15 | Arizona Board Of Regents For And On Behalf Of Arizona State University | MESFETs integrated with MOSFETs on common substrate and methods of forming the same |
AU2002246934A1 (en) * | 2001-01-03 | 2002-07-16 | Mississippi State University | Silicon carbide and related wide-bandgap transistors on semi-insulating epitaxy for high-speed, high-power applications |
US6555883B1 (en) * | 2001-10-29 | 2003-04-29 | Power Integrations, Inc. | Lateral power MOSFET for high switching speeds |
US6900477B1 (en) * | 2001-12-07 | 2005-05-31 | The United States Of America As Represented By The Secretary Of The Army | Processing technique to improve the turn-off gain of a silicon carbide gate turn-off thyristor and an article of manufacture |
US6835619B2 (en) * | 2002-08-08 | 2004-12-28 | Micron Technology, Inc. | Method of forming a memory transistor comprising a Schottky contact |
DE102004041556B4 (de) * | 2004-08-27 | 2007-09-20 | Infineon Technologies Ag | Laterale Schottky-Diode und Verfahren zu ihrer Herstellung |
US8017978B2 (en) * | 2006-03-10 | 2011-09-13 | International Rectifier Corporation | Hybrid semiconductor device |
JP5214154B2 (ja) * | 2007-01-19 | 2013-06-19 | 住友電気工業株式会社 | プリント配線板およびその製造方法 |
JP2009164460A (ja) * | 2008-01-09 | 2009-07-23 | Renesas Technology Corp | 半導体装置 |
JP5017303B2 (ja) * | 2009-03-25 | 2012-09-05 | 株式会社東芝 | 半導体装置 |
US20100308340A1 (en) * | 2009-06-04 | 2010-12-09 | General Electric Company | Semiconductor device having a buried channel |
JP5365872B2 (ja) | 2009-06-24 | 2013-12-11 | 株式会社デンソー | 駆動装置 |
JP5435286B2 (ja) | 2009-06-24 | 2014-03-05 | 株式会社デンソー | 駆動装置 |
JP4985757B2 (ja) * | 2009-12-25 | 2012-07-25 | 株式会社デンソー | 炭化珪素半導体装置 |
JP5056883B2 (ja) | 2010-03-26 | 2012-10-24 | サンケン電気株式会社 | 半導体装置 |
JP5167323B2 (ja) * | 2010-09-30 | 2013-03-21 | トヨタ自動車株式会社 | 半導体装置 |
JP5672500B2 (ja) * | 2011-10-18 | 2015-02-18 | トヨタ自動車株式会社 | 半導体装置 |
US20150097328A1 (en) * | 2013-10-08 | 2015-04-09 | Win Semiconductors Corp. | Wafer holding structure |
KR101964153B1 (ko) * | 2014-08-28 | 2019-04-03 | 한국전기연구원 | 절연 또는 반절연 SiC 기판에 구현된 SiC 반도체 소자 및 그 제조 방법 |
DE102015107680B4 (de) * | 2015-05-15 | 2020-07-30 | Infineon Technologies Ag | Integrierte Schaltung mit lateralem Feldeffekttransistor mit isoliertem Gate |
KR102030465B1 (ko) * | 2018-04-18 | 2019-10-10 | 현대오트론 주식회사 | 레터럴 타입의 전력 반도체 소자 |
JP7210979B2 (ja) * | 2018-09-28 | 2023-01-24 | 株式会社豊田中央研究所 | 窒化物半導体装置および窒化物半導体装置の製造方法 |
JP7411465B2 (ja) * | 2020-03-18 | 2024-01-11 | 日産自動車株式会社 | 半導体装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5070377A (en) * | 1990-02-15 | 1991-12-03 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device and method of manufacturing the same |
US5385855A (en) * | 1994-02-24 | 1995-01-31 | General Electric Company | Fabrication of silicon carbide integrated circuits |
JPH0888283A (ja) * | 1994-09-16 | 1996-04-02 | Fuji Electric Co Ltd | 炭化ケイ素相補形mosfet |
US5510630A (en) * | 1993-10-18 | 1996-04-23 | Westinghouse Electric Corporation | Non-volatile random access memory cell constructed of silicon carbide |
US5710455A (en) * | 1996-07-29 | 1998-01-20 | Motorola | Lateral MOSFET with modified field plates and damage areas |
DE19638620A1 (de) * | 1996-09-20 | 1998-04-02 | Siemens Ag | Speicherladungsarme, selbstgeführte Stromrichterschaltung |
WO1998059374A2 (en) * | 1997-06-23 | 1998-12-30 | Cooper James Albert Jr | Insulated gate power semiconductor device having a semi-insulating semiconductor substrate |
-
2000
- 2000-03-16 WO PCT/DE2000/000812 patent/WO2000060670A2/de not_active Application Discontinuation
- 2000-03-16 JP JP2000610070A patent/JP2002541668A/ja active Pending
- 2000-03-16 EP EP00926684A patent/EP1177576A2/de not_active Withdrawn
-
2001
- 2001-10-01 US US09/968,660 patent/US20020070412A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5070377A (en) * | 1990-02-15 | 1991-12-03 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device and method of manufacturing the same |
US5510630A (en) * | 1993-10-18 | 1996-04-23 | Westinghouse Electric Corporation | Non-volatile random access memory cell constructed of silicon carbide |
US5385855A (en) * | 1994-02-24 | 1995-01-31 | General Electric Company | Fabrication of silicon carbide integrated circuits |
JPH0888283A (ja) * | 1994-09-16 | 1996-04-02 | Fuji Electric Co Ltd | 炭化ケイ素相補形mosfet |
US5710455A (en) * | 1996-07-29 | 1998-01-20 | Motorola | Lateral MOSFET with modified field plates and damage areas |
DE19638620A1 (de) * | 1996-09-20 | 1998-04-02 | Siemens Ag | Speicherladungsarme, selbstgeführte Stromrichterschaltung |
WO1998059374A2 (en) * | 1997-06-23 | 1998-12-30 | Cooper James Albert Jr | Insulated gate power semiconductor device having a semi-insulating semiconductor substrate |
Non-Patent Citations (3)
Title |
---|
K. ENDO: "A 500 V 1 A 1-Chip Inverter IC on SOI Wafer", PROCEEDINGS OF POWER CONVERSION, May 1998 (1998-05-01), pages 145 - 150, XP000952318 * |
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 08 30 August 1996 (1996-08-30) * |
SPITZ J ET AL: "2.6 KV 4H-SIC LATERAL DMOSFET'S", IEEE ELECTRON DEVICE LETTERS,US,IEEE INC. NEW YORK, vol. 19, no. 4, 1 April 1998 (1998-04-01), pages 100 - 102, XP000738787, ISSN: 0741-3106 * |
Also Published As
Publication number | Publication date |
---|---|
JP2002541668A (ja) | 2002-12-03 |
WO2000060670A2 (de) | 2000-10-12 |
US20020070412A1 (en) | 2002-06-13 |
EP1177576A2 (de) | 2002-02-06 |
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